JPH04172429A - Microphotographic aparatus - Google Patents

Abstract

PURPOSE:To clarify a position of photometry so as to enable simple and quick exposure measurement by providing an additional demonstrating means, first and second light flux dividers, a means for detecting the position of photometry, and a processing portion. CONSTITUTION:An operator moves an LED 10 being turned on and decides a position of photometry while observing a sample with his eyes close to a lens. The distance by which the LED 10 is moved is detected by a linear encoder 9 so that a position coordinate is decided. After the position is decided, the LED 10 is turned off. Then an area sensor 8 receives only a sample image and information about it is stored in a memory 14 and a picture element coordinate of the sensor 8 corresponding to a photometric position of a target is read out by the linear encoder 9 from a memory 13 and supplied as address information of the memory 14 and information about reception of the picture element of the area sensor 8 corresponding to the photometric position is read out from the memory 14 and supplied to an arithmetic circuit 15 and the arithmetic circuit calculates the optimum exposure time for photographing according to this information about reception. Actual image pickup is carried out by using a shutter control portion 16 to open and close a shutter 6 according to this exposure time.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a microscopic photographing apparatus equipped with means for measuring the brightness of an object and determining a photographing exposure time.

(Prior Art) This type of microscopic photographing device is known from the past, for example, Japanese Patent Application Laid-Open No. 58-214121 and Japanese Patent Publication No. 1-3.
It is disclosed in Japanese Patent No. 9082. Japanese Patent Publication No. 58-214
In the device disclosed in No. 121, in order to confirm the position of the photometric portion on an object, only the photometric portion can be observed darkly within the same field of view as the observation field.

For this purpose, the beam from the object is divided by a beam splitter to form an object image on a reticle plate, and a photometric prism is provided adjacent to the reticle plate. This prism has an oblique semi-transparent surface inside, and the light beam reflected by this semi-transparent surface enters the light receiving element and its light intensity is measured, and the light beam that has passed through this prism is incident on the eyepiece.

The semi-transparent surface provided obliquely within this prism is composed of a semi-transparent film deposited in an elliptical shape on the inclined surface so that it has a circular shape when viewed in the optical axis direction. Therefore, a circular semi-transparent surface image can be observed along with the object image in the field of view observed through the eyepiece. This semi-transparent surface image is the photometric area, and this image appears slightly darker than the surrounding area due to the amount of light reflected for photometry, so the position of the photometric area can be confirmed within the same field of view as the observation field. .

In the apparatus disclosed in Japanese Patent Publication No. 1-39082, in order to confirm the position of the photometric portion, only the photometric portion can be observed brightly in the same field of view as the observation field. Additional lighting is used for this purpose. This additional illumination illuminates the measuring field diaphragm via the first reflector and is incident on the eyepiece via the second reflector (here the deflection reflector) into the field of view of the eyepiece. The photometric area is brightly observed in the object image, and the photometric position can be moved by tilting the second reflecting mirror.

For exposure measurement, it is necessary to rotate the first reflector to remove it from the measurement optical path.

However, these known devices have significant drawbacks. First, the former device uses light reflected from a semi-transparent surface for photometry,
The transmitted light is returned to the observation optical system. For this reason, the photometering area is attenuated by the amount of light reflected for photometry and appears slightly darker than the surrounding area.However, when performing partial metering to measure light over a narrow area, the difference in brightness between the photometry area and the surroundings becomes small, so the photometry position is The disadvantage is that it cannot be observed clearly. Another drawback is that photometry is not possible at low illuminances because the amount of light incident on the light receiving element is small.

Secondly, in the latter device, the photometric area can be brightly highlighted in the same field of view as the observation field by means of additional illumination;
When measuring exposure, rotate the reflector to remove it from the optical path.
Additionally, it is necessary to cover the illumination light source with a moving member to prevent any light from reaching the light receiving element. Therefore, the configuration for exposure measurement becomes complicated, the operation becomes complicated, and there is a disadvantage that measurement cannot be performed at high speed.

In order to eliminate the above-mentioned drawbacks, the present invention provides a microscopic photographing device that can clearly confirm the photometric position in the observation field during microscopic photography, and can also perform exposure measurement at high speed with simple operations. The purpose is to provide.

(Means for Solving the Problems) In order to achieve the above-mentioned object, the microphotographing apparatus of the present invention includes additional illumination means that can be turned on and off for determining the measurement position, and an additional illumination means that is parallel to the specimen image. a first beam splitter that projects the light representing the measurement position from the additional illumination means onto the eyepiece together with the specimen image; and a second beam splitter that divides the specimen image into the camera and the area sensor. a means for detecting a photometric position by detecting the amount of movement of the additional illumination means; and a means for extracting light reception information at a position corresponding to the photometric position of the area sensor based on the photometric position information;
The present invention is characterized in that it includes a processing section that processes this.

(Function) In the apparatus of the present invention, when determining a photometric position, the additional illumination means is turned on, and the illumination means is moved while observing the specimen image with a tangent N mirror to determine the desired photometry position. Next, when performing photometry, this illumination means is turned off. At this time, based on the determined measurement position information from the photometry position detection means, the light reception information of the corresponding position of the area sensor onto which the specimen image is projected is extracted, and the optimum exposure time is calculated based on this.

(Embodiment) FIG. 1 schematically shows the structure of a first embodiment of the microscopic photographing apparatus of the present invention. In FIG. 1, 1 is a specimen, 2 is an objective lens, and 7 is a camera, and in the optical path between the objective lens 2 and the camera 7 are first and second beam splitters 3.
and 5, an eyepiece 4 is provided in the optical path divided by the first beam splitter 3, and an area is provided in the optical path divided by the second beam splitter H5 at the same optical position as the camera 7, that is, a conjugate position. A sensor 8 is provided. Furthermore, an additional illumination means, for example an LED 10, which can be turned on/off, is provided on the opposite side of the first beam splitter 3 from the eyepiece 4, and the light from this LHD 10 is transmitted through a pinhole 11 provided immediately in front of it. through the beam splitter 3 and projected onto the eyepiece 4 together with the specimen image. This LED 10 is movable in two orthogonal directions, X and Y, and the amount of movement is measured by linear encoders 9 in the X and Y directions. Further, a first memory 13 for storing the amount of movement, that is, position information of the photometry point, a second memory 13 for storing image information from the area sensor 8, and an arithmetic circuit 15 for calculating the exposure time.
A processing section 12 is provided. In addition, 6 is an arithmetic circuit 15
The camera shutter is opened and closed by a shutter control unit 16 connected to the camera 7, and is provided in the optical path between the second beam splitter 5 and the camera 7.

When using this device, it is first necessary to determine which address of the area sensor 8 the position of the LED 10 corresponds to, and this is generally done at the factory. First, the LED 10 is turned on and moved to scan the entire specimen image screen.

First, position the LED 10 at the reference position (0, O),
Which pixel coordinate of the area sensor 8 corresponds to this reference position is determined from the storage position in the second memory 14 where the received light information is stored. Since the pixel coordinates of this area sensor 8 differ depending on the light diameter, it may consist of a plurality of pixels.

The pixel coordinates of this area sensor 8, that is, the corresponding storage position information on the second memory 14 are transferred to the X and Y linear encoder 9.
The storage location of the first memory 13 addressed by (0,
0). Next, move the position of the LED 10 from the reference position by one position in the is stored in the storage location (1, O) of the first memory 13 addressed by the X and Y linear encoder 9. This operation is repeated in the X direction, and the pixel coordinates of the area sensor 8 corresponding to the LEDIO position (m, , O) are set to the storage position (m, O) of the first memory 13.
After storing, the same operation is performed in the X direction, and finally the corresponding pixel coordinates on the area sensor 8 up to the position (m, n) are stored in the first memory 13. Like this L
The ED 10 is sequentially moved, and the position information of the area sensor 8 corresponding to each position of the LED is mapped to each storage position of the first memory 13 addressed by the X and Y linear encoders 9, and the position coordinates of the LED and the area sensor are mapped. The pixel coordinates of 8 correspond to 1:l. After that, the second memory 14
The transmission path for location information from to the first memo January 3 will be cut off.

Actual photometry is performed as follows. The sample is moved with the LED 10 turned on, and the photometry position is determined while observing the sample with the eyepiece. At this time, the X and Y linear encoder 9
The amount of movement of the LED 10 is detected, and the position coordinates of the LED at the target photometry position are determined. After determining this photometry position, the LED 10 is turned off.

At this time, the area sensor 8 receives only the specimen image, and the information about the received light is stored in the second memo τ4, and the X and Y
The pixel coordinates of the area sensor 8 corresponding to the desired photometric position are read out from the first memory 13 by the linear encoder 9, and this is supplied as address information to the second memory 14, and the coordinates corresponding to the photometric position are read from the second memory 14. The light reception information of the pixels of the area sensor 8 is read out and supplied to the arithmetic circuit 15, which calculates the optimum exposure time for photographing based on this light reception information.

Actual photographic imaging is performed by opening and closing the shutter 6 by the shutter control section 16 based on this exposure time.

FIG. 2 shows a second embodiment of the device of the present invention.

In this example, the first and second beam splitters 3 and 5 shown in FIG.
The other components are the same as the first embodiment shown in FIG. 1 and operate in the same manner. According to this example, the optical system becomes even simpler.

(Effect of the invention) According to the device of the present invention, the additional lighting means (LHD 10)
This allows you to clearly check the photometry position in the same field of view while observing the specimen with the eyepiece. Further, since photometry is performed electronically by simply turning off the illumination means after confirming the photometry position, exposure measurement can be performed quickly with a simple configuration and operation. Further, since the position coordinates of the LED 10 and the pixel coordinates of the area sensor 8 can be electronically made to correspond one-to-one through factory adjustment, strict positional accuracy is no longer required for the area sensor's installation.

[Brief explanation of the drawing]

FIG. 1 is a schematic diagram of a first embodiment of a microscopic photographing apparatus of the present invention, and FIG. 2 is a schematic diagram of a second embodiment of a microscopic photographing apparatus of the present invention. 1...Specimen 2...Objective lens 3...
・First beam splitter 4... Eyepiece 5... Second beam splitter 6... Shutter 7... Camera
8... Area sensor 9... X and Y linear encoder 10... Additional lighting means (LED) 11... Pinhole 12... Processing section 13.
...First memory 14...Second memory 15...
・Arithmetic circuit 16...Shutter control section Fig. 1'', 1

Claims (1)

[Claims] 1. Additional illumination means that can be turned on and off for determining the measurement position, means for moving the additional illumination means in a direction parallel to the specimen image, and light representing the measurement position from the additional illumination means together with the specimen image. a first beam splitter that projects onto the eyepiece, a second beam splitter that divides the specimen image into a camera and an area sensor, a means for detecting a photometric position by detecting the amount of movement of the additional illumination means, and photometric position information. What is claimed is: 1. A microscopic photographing apparatus comprising: a processing unit that extracts light reception information at a position corresponding to the photometric position of an area sensor based on the above, and processes the information.