JP3650143B2 - Photomicroscope - Google Patents

Description

[0001]
[Industrial application fields]
The present invention relates to a microphotographing apparatus capable of designating a desired photometric part while observing a specimen image with an eyepiece.
[0002]
[Prior art]
2. Description of the Related Art Fluorescent microscopes are widely known in which proteins, genes, and the like are fluorescently labeled on biological tissues and cells so that proteins, genes, etc. can be observed with the naked eye or photographed.
In particular, in recent years, even if a substance emits only weak fluorescence, the positional correlation with other substances can be examined by the multiple staining method, and the location of the fluorescently stained substance in the cell structure can be determined. It can be examined by a combination with phase difference microscopy or differential interference microscopy.
[0003]
When photographing an observation image in the above-mentioned fluorescence observation, the photograph is taken with an exposure time determined based on a value obtained by averaging the illuminance of the entire field of view with respect to the fluorescence observation image in which a bright fluorescence image exists in a dark background. When executed, there is a problem that the fluorescent image portion is overexposed and collapses.
[0004]
In view of this, an apparatus has been developed that selects an arbitrary part in an observation image while viewing it with an eyepiece, and determines the exposure time using a photometric signal obtained by photometry of the selected part. This type of photomicrograph apparatus is described in JP-A-5-164971.
[0005]
FIG. 10 shows the configuration of the optical system of the photomicrograph apparatus described in the publication. FIG. 11 shows the configuration of the electrical system of the apparatus.
In this microphotographing apparatus, illumination light generated by a light source 11 is incident on a reflecting mirror 15 via a collector lens 12, a relay lens 13, and a field stop 14, and the optical path of the illumination light is directed upward. The illumination light is incident on the condenser lens 18 through the relay lens 16 and the aperture stop 17, and the specimen 19 is uniformly illuminated by the condenser lens 18. An objective lens 20 is disposed oppositely above the specimen 19, and a light beam from the specimen 19 incident on the objective lens 20 is incident on a semi-transmissive prism 22 as an observation optical member via an imaging lens 21. The semi-transmissive prism 22 reflects a part of the incident light beam by the semi-transmissive surface 22 a so that the image can be enlarged and observed through the eyepiece lens 23. Further, the light beam that has passed through the semi-transmissive surface 22 a of the semi-transmissive prism 22 is imaged on the film surface 26 via the photographing lens 24 and the shutter 25.
[0006]
The light source unit 27 includes an index light source 28 that is controlled to be turned on by an external lighting signal, and an index plate 29 in which holes such as pin holes that determine the shape of an index image that designates a photometric part are formed. The indicator plate 29 is provided so as to be movable in an arbitrary direction within a plane orthogonal to the optical axis. A semi-transmissive mirror 30 is provided on the optical path between the objective lens 20 and the semi-transmissive prism 22 so as to be detachable with respect to the optical path. The semi-transmissive mirror 30 is inserted into the optical path, receives the light beam from the index light source unit 27 through the relay lens 31 and enters the semi-transmissive prism 22.
[0007]
On the optical path between the semi-transmissive prism 22 and the film surface 26, a quick return mirror 32 as an optical member for photometry is provided so as to be freely inserted into and removed from the optical path. The quick return mirror 32 is inserted into the optical path to reflect the light beam from the semi-transmissive prism 22 in a predetermined direction and guide it to the optical path for photometry when determining the photometric area. An area sensor 34 is disposed at a position conjugate with the film surface 26 of the photometric light path. The area sensor 34 is composed of an interline type CCD two-dimensional sensor, and is read out line by line by an external CCD drive pulse.
[0008]
On the other hand, in the electrical system of the microscopic photographing apparatus, operation control signals are given from the CPU 40 to the mirror driver 41 and the prism driver 42 in accordance with each operation stage such as detection of a photometric area and photographing. The mirror driver 41 receives the operation control signal from the CPU 40, and inserts and removes the semi-transmissive mirror 30 and the quick return mirror 32 from the optical path. In response to the operation control signal from the CPU 40, the prism driver 42 operates to repel the transflective prism 22 from the optical path during photography and insert an optical member for optical path length correction instead. As the optical member for correcting the optical path length, an optical member that transmits the sample image to the 100% photographing optical system side is used.
[0009]
In response to a command from the CPU 40, the timing generator 43 sends a timing signal for controlling the lighting of the index light source 28 to the index light source driver 44, and sends a timing signal for instructing reading of the area sensor 34 to the CCD driver 45. To do.
[0010]
The index light source driver 44 performs lighting control by inputting a lighting control signal to the index light source 28 based on the timing signal. The CCD driver 45 applies a CCD driving pulse to the area sensor 34 based on the timing signal, sequentially converts the accumulated charge of each pixel into an illuminance signal (hereinafter referred to as “photometric signal”), and reads it out. .
[0011]
The photometric signal read from the area sensor 34 by the CCD driver 45 is input to the correction circuit 47 via the preamplifier 46. The correction circuit 47 performs correction processing of fixed pattern noise and dark output on the photometric signal, and then stores the corrected photometric signal in the image memory 48.
[0012]
The CPU 40 determines the photometry area from the photometry signal read from the image memory 48 by the function as the photometry area determination means, and detects the illuminance of the photometry area by the exposure time calculation function to calculate the exposure time at the time of shooting. . Then, the shutter driver 49 is controlled to open the shutter 25 for the determined time.
[0013]
With the configuration as described above, the index image can be projected at an arbitrary position of the sample image while observing the sample image from the eyepiece lens 23. Then, the same image as the image observed by the eyepiece lens 23 is formed on the area sensor 34, and the output of the light receiving element at the position where the index image is formed becomes significantly larger than the output of other portions. This output signal is processed to detect a pixel that is saturated or a pixel that exceeds a predetermined threshold, and a photometric part is detected.
[0014]
[Problems to be solved by the invention]
However, the above-described microscopic photographing apparatus has a problem that the balance between the sample image and the index image is deteriorated depending on the brightness of the sample image because the brightness of the index image is fixed. That is, if the index image is too bright in a dark sample, the sample image may be crushed by the brightness of the index image. On the other hand, in a bright sample, the index image is buried due to the brightness of the sample image, which may make it difficult to recognize the position of the index image.
[0015]
In addition, after receiving the shutter release signal, the photometric area determination process is executed, the exposure calculation is performed, the shutter is opened and closed based on the exposure time that is the result of the exposure calculation, and the photo is taken. It takes extra time to finish shooting and is inefficient.
[0016]
The present invention has been made in view of the above circumstances, can automatically adjust the brightness balance between the sample image and the index image, and can easily recognize the position of both the sample image and the index image, and can change the photometric position. An object of the present invention is to provide a photomicrograph apparatus that can shorten the time required for determination.
[0017]
[Means for Solving the Problems]
  In order to achieve the above object, the present invention has taken the following measures.
  According to the first aspect of the present invention, there is provided an optical path between an objective lens disposed opposite to a specimen to be magnified and photographed and a film surface on which a specimen image of the specimen is formed.aboveA photometric optical member arranged to guide the light beam from the objective lens to the photometric optical path, and a plurality of light receiving elements arranged in a conjugate manner with the film surface on the photometric optical path. And an optical path between the objective lens and the optical member for photometryaboveAn optical member for observation that guides the light beam from the objective lens to the optical path for observation, and an index image for designating a photometric part on the specimen image, and the index image is formed on a surface orthogonal to the optical axis. Photometric part designating means for moving to a desired position, and an optical path between the objective lens and the observation optical memberaboveA semi-transparent mirror that is arranged and guides the index image formed by the photometric part designating means to the observation optical path and the photometric optical path;From the first photometric value measured by the area sensor with the photometric part designating means turned on, the second photometric value measured by the area sensor with the photometric part designating means turned off, or a predetermined threshold value or , At least based on one of the saturation levels 1 A photometric area determining means for determining a photometric area consisting of areas of pixels or more;Photometry of the photometric area determining meansvalueExposure calculating means for calculating the exposure time from the above and means for suppressing the exposure time from being calculated from the photometric value when the photometric area is wider than a predetermined index formation area.
[0018]
  The present invention corresponding to claim 2Arranged on the optical path between the objective lens disposed opposite to the specimen to be magnified and photographed and the film surface on which the specimen image of the specimen is formed, and guides the light beam from the objective lens to the optical path for photometry A photometric optical member, an area sensor comprising a plurality of light receiving elements arranged in a two-dimensional arrangement at a position conjugate with the film surface on the photometric optical path, the objective lens, and the photometric optical member; And an observation optical member for guiding the light beam from the objective lens to the observation optical path, and an index image for designating a photometric part on the specimen image, and generating the index image as a light beam A photometric part designating means for moving to a desired position on a surface orthogonal to the axis; and an index image formed by the photometric part designating means arranged on the optical path between the objective lens and the optical member for observation. Optical path and said A semi-transmission mirror that leads to an optical path for light, a first photometric value measured by the area sensor with the photometric part designating unit turned on, and a first photometric value measured by the area sensor with the photometric part designating unit turned off. From the photometric value of 2 or the result of comparison with one of the predetermined threshold or saturation level, at least 1 A photometric area determining means for determining a photometric area consisting of pixels or more, an exposure calculating means for calculating an exposure time from a photometric value of the photometric area determining means, and the photometric part designating means in a lighting state by the area sensor. Sampling control means for changing the sampling time of the area sensor in accordance with a comparison result between the first photometric value measured and the predetermined threshold value or saturation level;It was set as the structure which comprises.
[0019]
According to a third aspect of the present invention, a series of processing sequences in which a photometric area is determined by the photometric area determining means and the exposure calculating means calculates an exposure time from a photometric signal in the photometric area is repeated.
[0020]
[Action]
The present invention has the following effects by taking the above-described means.
According to the first aspect of the present invention, the sample image taken through the objective lens is imaged on the observation optical path by the observation optical member and guided to the photometry optical path by the photometry optical member. The image is formed on the area sensor. When an index image is generated in this state, the index image is incident on the optical path between the objective lens and the observation optical member by the semi-transparent mirror, and the observation optical path and photometry are measured by the observation optical member and the photometry optical member. Projected onto the optical path. As a result, the index image is superimposed on the same position of the sample image in both optical systems. In this state, when the index image is moved in the direction orthogonal to the optical axis by the photometric part designating means, the index image projected on the observation optical path and the area sensor moves on the sample image.
[0021]
When the image on which the index image is projected at an arbitrary position on the sample image is picked up by the area sensor, the output signal of the area sensor is input to the photometric area determining means. The illuminance value of the index image projection position on the sample image is greatly different from the surrounding area. A position where the illuminance value greatly changes from the output of the area sensor is detected as the index image forming position by the photometric area determining means, and the photometric area is determined from the detected position.
[0022]
When the photometric area is determined, the photometric signal of the photometric area is taken into the index luminance control means, and the brightness according to the brightness of the photometric area is determined as the brightness of the index image. The index image is adjusted to the determined brightness.
[0023]
According to the present invention corresponding to claim 2, after the photometric area is determined by the same operation as described above and the index image is determined, the sampling time of the area sensor is controlled so that the photometric signal level in the photometric area is optimized. The
[0024]
According to the present invention corresponding to claim 3, since a series of processes from the determination of the photometric area to the calculation of the exposure time are repeatedly executed, the photography operation at the time of release is made efficient and the photography time is shortened. Is achieved.
[0025]
【Example】
Examples of the present invention will be described below.
FIG. 1 shows the configuration of a photomicrograph apparatus according to an embodiment of the present invention. The same parts as those in the apparatus shown in FIGS. 10 and 11 are denoted by the same reference numerals to avoid duplication of explanation.
[0026]
The microscopic photographing apparatus according to the present embodiment has a function of obtaining the optimum luminance of the index image from the photometric signal in the photometric area in the CPU 40 ′, and controls the index light source driver 44 based on the luminance control signal from the CPU 40 ′. An index luminance control unit 70 is provided.
[0027]
In the present embodiment, in order to determine the photometric area, the semi-transmissive mirror 30 and the quick return mirror 32 are inserted on the respective optical paths, and the light source 11 and the index light source 28 are turned on.
[0028]
When the light source 11 and the index light source 28 are turned on, the specimen 19 is uniformly illuminated by the illumination light from the light source 11. The specimen image of the specimen 19 is incident on the semi-transmissive prism 22, and a part of the specimen image is reflected by the semi-transmissive surface 22a and is formed in front of the eyepiece lens 23 disposed in the observation optical path. Further, the remaining light beam passes through the semi-transmissive surface 22a and enters the quick return mirror 32, and is reflected and guided to the photometric optical path and forms an image on the area sensor 34 disposed on the optical path.
[0029]
As a result, an image in which the index image is superimposed on the sample image is formed at each connection position of the observation optical path and the photometry optical path, and the image can be observed from the eyepiece lens 23.
Since the index image created by the pinhole in the index light source unit 27 is spot light, the index image formation position on the image planes of both optical paths has a significantly higher luminance than the surroundings.
[0030]
The index image displayed so as to be superimposed on the sample image in this way moves on the sample image in accordance with the movement of the index plate 29 in a direction perpendicular to the optical axis. Therefore, while observing the sample image from the eyepiece lens 23, the index image can be projected at an arbitrary position on the sample image.
[0031]
As described above, the same image as that observed by the eyepiece lens 23 is formed on the area sensor 34. Therefore, if an image obtained by projecting the index image at an arbitrary position on the specimen image is picked up, the output of the light receiving element at the position where the index image is formed shows significantly higher luminance than the output of other parts. It is expected that.
[0032]
For example, if the area sensor output of a certain line when the index image is not projected onto the sample image is as shown in FIG. 3A, an image obtained by projecting the index image on the same line is captured. The area sensor output of the same line at that time has the value shown in FIG.
[0033]
Here, normally, the area sensor 34 is set to have a dynamic range so as not to saturate even when a specimen image showing normal brightness is captured. However, when a markedly bright index image is formed as described above, Pixels are saturated. By detecting a pixel that has reached this saturation level, it is possible to detect the photometric part indicated by the index image.
[0034]
In addition to the method of detecting the photometric part from the pixel that has reached the saturation level, a method of subtracting the area sensor output shown in FIG. 3B from the area sensor output shown in FIG. There is a method of detecting by setting a predetermined threshold for the area sensor output shown in b). With such a method, the photometric position can be detected if there is a certain level of brightness, even if the brightness of the index image does not become so bright that it reaches the saturation level.
[0035]
When the index formation position is detected in this way, an area of at least one pixel or more with the detected position as the center is determined as the photometric area.
Next, the specific operation of the present embodiment will be described with reference to the flowchart of FIG. First, the semi-transmissive mirror 30, the semi-transmissive prism 22, and the quick return mirror 32 are respectively inserted in the optical path, the light source 11 and the index light source 28 are turned on, and an image in which the index image is projected on the specimen image is obtained as the eyepiece 23. (Step 101).
[0036]
In this state, the index plate 29 is moved in an arbitrary direction orthogonal to the optical axis, an index image is formed at an arbitrary position on the sample image, and an arbitrary photometric part is indicated by the index image. The index light source 28 is turned on for a time t necessary to saturate the output during the accumulation time T of one field (step 101), and the index image is positioned as shown in FIG. 2B, as shown in FIG. In synchronism with the field shift pulse immediately after the indicator light source 28 is turned on at the timing, the photometric signal for one field is read from the area sensor 34 and stored in the image memory 48 (step 102).
[0037]
When the photometric signal is read in this way, the photometric signal is read from the image memory 48, and it is determined whether or not the output signal of the index image has reached the saturation level of the area sensor 34 (step 103). As shown in FIG. 5C, when the output signal of the index image does not reach the saturation level due to insufficient brightness, the sampling time (accumulation) of the area sensor 34 such as thinning out the field shift pulse is performed. Control is performed to increase the time) (step 106), and the output based on the index image is increased equivalently. On the other hand, if the state is supersaturated, the output is equivalently reduced to the electronic shutter mode (step 106). After executing the process of step 106, the process returns to the process of step 102. Then, the processing of step 102 to step 106 is repeated until the output level of the index image falls within an appropriate range. If there is a pixel that has reached the saturation level, a predetermined area including the detected pixel is determined as a photometric area, and the pixel address of the determined photometric area is stored.
[0038]
Here, since the photometric area detection operation is always performed during the observation period, there is a possibility that the index image is executed while the index image is moving. When the above operation is performed while the index image is moving, the output level of the index image exists in a wider range than the original index formation region (FIGS. 5A and 5B). That is, if the index image position is detected while the index image is moving, an error is included.
[0039]
In this embodiment, if the output level based on the index image (the signal superimposed on the output level based on the sample image) is in a wider range than the index formation area, it is determined that the index is moving (step 104). 4. By repeating the process from step 102 again, the index position is always detected from the output signal when the index is stopped.
[0040]
When it is determined that the index is stopped, the lighting operation of the index light source 28 is prohibited (step 107), a sample image on which no index is projected is captured by the area sensor 34, and the index image is not projected. 2 is stored in the image memory 48 (step 108).
[0041]
The CPU 40 reads out the pixel output of the photometric area obtained in the above step 103 from the second photometric signal on which the index image is not projected from the image memory 48. The CPU 40 determines the brightness of the index light source most suitable when observed from the eyepiece lens 23 based on the relational expression or correspondence table of “pixel output−index brightness” prepared in advance (step 109). A control signal indicating the brightness of the index light source is sent to the index brightness control unit 70 (step 110).
[0042]
The index luminance control unit 70 converts the control signal from the CPU 40 into a brightness control signal and outputs it to the index light source driver 44. As a result, the index light source driver 44 controls the index light source 28, and the index light source 28 is turned on with the brightness instructed by the CPU 40.
[0043]
Here, the control of the index luminance includes dynamic lighting (repeating ON / OFF in a cycle shorter than the lighting time) and other cases. When the dynamic lighting is not performed, the voltage or current supplied to the index light source 28 in the index brightness control unit 70 is controlled by changing the peak value as shown in FIG. In the case of dynamic lighting, the voltage or current supplied to the index light source 28 is equivalently changed by changing the ON time at a constant lighting cycle without changing the peak value as shown in FIG. Change the high value and change the brightness.
[0044]
Next, the exposure time is calculated from the following equation based on the pixel output in the photometric area.
Exposure time = K / (α × film sensitivity × illuminance × exposure time × correction value)
Here, K is a constant value, α is a reciprocity failure, illuminance is a value obtained by multiplying a photometric signal by sensitivity, and a correction value indicates a correction value corresponding to the transmittance of a semi-transparent mirror, an objective lens, or the like.
[0045]
When the CPU 40 receives the release signal, the CPU 40 performs photography. That is, when the release signal is received, the transflective mirror 30, the transflective prism 22, and the quick return mirror 32 are repelled from the optical path to the dotted line position in the drawing, and the optical path correcting optical that transmits 100% of the sample image instead of the transflective prism 22 Arrange the members. Then, by opening the shutter 25 for the exposure time calculated immediately before receiving the release signal, the photographing is finished.
[0046]
In the process shown in FIG. 4, the saturation level is detected in order to detect the index image formation position on the sample image. However, when the other two detection methods described above are performed, the following process is performed. It becomes contents.
[0047]
FIG. 6 shows an operation of subtracting the photometric signal when the index image is not projected from the photometric signal when the index image is projected to detect the index image formation position. It is assumed that the index image position on the CCD screen is the same as that in FIG. 2B, and the CCD output reading and index lighting timing as the output signal of the area sensor 34 is the timing shown in FIG.
[0048]
In the detection method shown in FIG. 6, the operation until the first photometric signal is read is the same as the detection method shown in FIG. If the first photometric signal is read, the lighting operation of the index light source 28 is prohibited (step 107), and the second photometric signal (B in FIG. 13) is read (step 108). Then, the first photometric signal projecting the index image is subtracted from the second photometric signal not projecting the index image. Since the first and second photometric signals have substantially the same signal value except for the index image formation position, the subtraction value is substantially 0, and only the pixel output at the index image formation position is at a predetermined level as shown in FIG. The absolute value is shown above. A pixel having an absolute value equal to or higher than the predetermined level is detected, and a photometric area centered on the pixel is determined (step 112).
[0049]
Next, if the signal level of the photometric area determined in step 112 does not show an absolute value greater than or equal to a predetermined level, the sampling of the area sensor 34 is extended (step 106), and the process returns to the routine of step 101 again.
[0050]
Further, when the index is moving, the output level of the index image is wider than the original index image formation range, so whether or not the index is moved is determined from the output signal width (step 104). Returns to the routine of step 101 again.
[0051]
If the photometric area is correctly detected, the brightness of the index image is optimized (step 109, step 110). Next, the pixel output of the photometric area is read out from the second photometric signal stored in the image memory 48 on which the index image is not projected, and the exposure time is calculated in the same manner as described above (step 111).
[0052]
In addition, when the photometric signal when the index image is projected is compared with a threshold of a predetermined level to detect the index image formation position, a predetermined value is used instead of the saturation level in step 103 in the flowchart shown in FIG. Set the threshold. If the threshold value is exceeded and the index image forming range is determined to be correct, the pixel exceeding the threshold value is determined as the index image forming region.
[0053]
The above series of processing is repeatedly executed. When a photography release signal is input, photography is performed based on the exposure time calculated immediately before.
As described above, according to the present embodiment, the index image projected on the specimen image can be adjusted to the optimum luminance balanced with the brightness of the specimen image, so that the photometric region selection operation using the eyepiece 23 is easy. Thus, the observation efficiency can be improved.
[0054]
Further, according to this embodiment, the determination of the photometric area by always detecting the index image position and the determination of the exposure time based on the photometric signal of the photometric area are always repeatedly performed during the observation period. Immediately after receiving the signal, the photograph can be taken immediately based on the exposure time immediately before the signal, so that the efficiency of the photograph taking and the operability can be improved.
[0055]
Next, another embodiment will be described using the flowchart shown in FIG.
The configuration of the optical system and electrical system of the present embodiment is basically the same as that of the above-described photography apparatus of FIG. 1 except for the processing contents of the CPU 40 '.
[0056]
The processing contents of this embodiment will be described with reference to the flowchart of FIG. The processing from step 101 to step 108 is the same as the processing of FIG. 4 described above. In this embodiment, if the second photometry signal in the photometry area determined in step 108 is read, the S / N ratio can be sufficiently obtained from the signal level of the second photometry signal, and highly accurate calculation can be performed. It is determined whether or not there is (T1). If the second photometric signal is a value within a range that allows highly accurate calculation, the process proceeds to determination of the index luminance (step 109), control of the index luminance (step 110), and calculation of the exposure time (step 111). To migrate. On the other hand, if the second photometric signal is out of the range where high-precision calculation is possible, a signal is sent to the timing generator 43 so as to extend the sampling time of the area sensor (T2). Next, the process proceeds to step 108 and the second photometric signal is read again. By repeating the processes in steps 108, T1, and T2, the signal level of the second photometric signal is optimized so that the exposure calculation with a high S / N ratio and high accuracy can be performed. The sampling time can be changed by thinning out the field shift pulse to increase the signal level equivalently as in the previous embodiment, or by setting the electronic shutter mode to reduce the signal level equivalently. Is done.
[0057]
According to the present embodiment, the same effects as those of the above-described embodiment can be obtained, and the signal level of the photometric signal at the photometric portion is optimized, so that the exposure time of the photometric portion and the brightness of the index image are obtained. There is an advantage that the determination accuracy is improved.
[0058]
The present invention is not limited to the optical system shown in FIG. 1, but can be applied to an optical system including the optical system shown in FIGS.
In the photomicrograph apparatus shown in FIG. 8, a semi-transmissive prism 50 is arranged on the optical path between the objective lens 20 and the quick return mirror 32, and the index image from the index light source 27 is the relay lens 51, the reflecting members 52, 53. The light enters the transflective prism 50 through the like. The semi-transmissive prism 50 divides the sample image light beam incident from the first surface S1 on the objective lens 20 side and the index image light beam incident from the second surface S2 into a reflection component and a transmission component by the semi-transmission surface 50a, respectively. To do. Then, the reflection component of the sample image is guided to the observation optical path on the eyepiece lens 23 side, and the transmission component is guided toward the photographing optical system. Further, the reflection component of the index image is guided toward the photographing optical system, and the transmission component is guided to the observation optical path.
[0059]
That is, the second surface S2 is provided on the semi-transmissive prism 50, and the index image is incident thereon, so that the index image can be projected onto the sample image without using a semi-transmissive mirror.
[0060]
If such an optical system is used, the number of transflective mirrors can be reduced, and the control content can be simplified.
The microscopic photography apparatus shown in FIG. 9 divides the light beam of the sample image from the objective lens 20 into a transmission component and a reflection component, guides the transmission component to the observation optical path, and guides the reflection component toward the imaging optical system. In addition, a semi-transmission mirror 60 is provided which divides the luminous flux of the index image from the index light source unit 27 into a transmission component and a reflection component, guides the transmission component toward the photographing optical system, and guides the reflection component to the observation optical path. . That is, the semi-transmissive mirror 60 performs the same function as the semi-transmissive prism 50 of the second embodiment.
[0061]
Then, the semi-transmissive mirror 60 and the quick return mirror 32 are arranged on the optical path during photometry, and the semi-transmissive mirror 60 and the quick return mirror 32 are removed from the optical path at the time of photographing, and instead of the semi-transmissive mirror 60, the objective lens 20 is used. A mirror that reflects 100% of the sample image toward the photographing optical system side is disposed.
[0062]
If such an optical system is used, only the quick return mirror 32 and the semi-transmissive mirror 60 are driven, and the mirror control is simplified.
The above optical system uses a transmission illumination system, but can also be applied to an epi-illumination system. For example, an epi-illumination system can be applied by inserting an epi-illumination system in the optical path between the objective lens 20 and the semi-transmissive mirror 30 shown in FIG. In the case of the optical system shown in FIG. 8, an epi-illumination system may be inserted between the objective lens 20 and the imaging lens 21. Furthermore, in the case of the optical system shown in FIG. 9, an epi-illumination system may be inserted between the objective lens 20 and the semi-transmissive mirror 60.
The present invention is not limited to the above embodiments, and various modifications can be made without departing from the scope of the present invention.
[0063]
【The invention's effect】
As described above in detail, according to the present invention, it is possible to obtain an index image of brightness that is balanced with the brightness of the sample image, and to facilitate the selection operation of the photometric part.
[0064]
Further, according to the present invention, since the S / N ratio of the photometric signal in the determined photometric area is improved, the exposure time can be calculated with higher accuracy and the brightness of the index image can be determined.
Further, according to the present invention, the photography operation at the time of release can be completed efficiently and in a short time.
[Brief description of the drawings]
FIG. 1 is a configuration diagram of a photomicrograph apparatus according to an embodiment of the present invention.
FIG. 2 is an operation timing chart regarding an area sensor provided in the photomicrograph apparatus shown in FIG.
FIG. 3 is a diagram showing an area sensor output according to the presence or absence of an index image.
4 is a diagram showing an overall image capturing operation of the photomicrograph apparatus shown in FIG. 1. FIG.
FIG. 5 is an area sensor output waveform diagram according to the waveform when the index is moving and when the index image output is insufficient, and the light accumulation time of the area sensor.
FIG. 6 is an operation explanatory diagram of an embodiment according to another photometric part detection method.
FIG. 7 is an operation explanatory diagram of an embodiment according to still another photometric part detection method.
FIG. 8 is a configuration diagram of another optical system of the microscopic photographing apparatus.
FIG. 9 is a configuration diagram of still another optical system of the microscopic photographing apparatus.
FIG. 10 is a configuration diagram of an optical system of a conventional photomicrograph apparatus.
FIG. 11 is a configuration diagram of an electric system of the photomicrograph apparatus shown in FIG.
FIGS. 12A and 12B are diagrams showing a case where dynamic lighting is not performed and dynamic lighting. FIGS.
FIG. 13 is a diagram showing CCD output reading and indicator lighting timing.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 20 ... Objective lens, 22 ... Semi-transmission prism, 23 ... Eyepiece lens, 25 ... Shutter, 26 ... Film surface, 27 ... Indicator light source unit, 30 ... Semi-transmission mirror, 32 ... Quick return mirror, 34 ... Area sensor, 40 ' ... CPU, 48 ... image memory, 70 ... index luminance control section.

Claims (3)

Specimen image of the magnification observation and an objective lens disposed opposite the specimen to be photographed of the subject and the sample is placed in the optical path on between the film surface be imaged, directing the light beam from the objective lens to the light measurement optical path A photometric optical member;
An area sensor comprising a plurality of light receiving elements arranged in a two-dimensional manner at a position conjugate with the film surface on the photometric optical path;
Wherein arranged in the optical path on between the objective lens and the photometric optical member, and the observation optical member for guiding the light beam to the observation optical path from the objective lens,
Generating an index image for designating a photometric site on the sample image, and moving the index image to a desired position on a surface orthogonal to the optical axis;
Said arranged in the optical path on between the objective lens and the observation optical member, wherein the metering site index image formed by the designating means, the observation leads to the optical path and the optical path for photometric semitransparent mirror,
From the first photometric value measured by the area sensor with the photometric part designating means turned on, the second photometric value measured by the area sensor with the photometric part designating means turned off, or a predetermined threshold value or A photometric area determining means for determining a photometric area consisting of at least one pixel area based on one of the saturation levels ;
Exposure calculating means for calculating an exposure time from the photometric value of the photometric area determining means;
In the case where the photometric area is wider than a predetermined index formation area, means for suppressing the exposure time from being calculated from the photometric value;
A photomicrograph apparatus comprising: Arranged on the optical path between the objective lens disposed opposite to the specimen to be magnified and photographed and the film surface on which the specimen image of the specimen is formed, and guides the light beam from the objective lens to the optical path for photometry A photometric optical member;
An area sensor comprising a plurality of light receiving elements arranged in a two-dimensional manner at a position conjugate with the film surface on the photometric optical path;
An observation optical member that is disposed on an optical path between the objective lens and the photometric optical member and guides a light beam from the objective lens to an observation optical path;
Generating an index image for designating a photometric site on the sample image, and moving the index image to a desired position on a surface orthogonal to the optical axis;
A semi-transmissive mirror disposed on the optical path between the objective lens and the optical member for observation, and guiding the index image formed by the photometric part designating means to the optical path for observation and the optical path for photometry;
A first photometric value measured by the area sensor with the photometric part designating means turned on, and a second photometric value measured by the area sensor with the photometric part designating means turned off, or a predetermined threshold value or A photometric area determining means for determining a photometric area consisting of an area of at least one pixel from a comparison result with one of the saturation levels ;
Exposure calculating means for calculating an exposure time from the photometric value of the photometric area determining means;
Sampling control means for changing the sampling time of the area sensor in accordance with a comparison result between the first photometric value measured by the area sensor in a lighting state of the photometric part specifying means and a predetermined threshold value or saturation level;
A photomicrograph apparatus comprising: 3. The process according to claim 1, wherein the photometric area is determined by the photometric area determining unit, and a series of processing sequences in which the exposure calculating unit calculates an exposure time from a photometric signal of the photometric area are repeated. Microscope photography equipment.

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