JPH04171038A - Apparatus for continuously supplying treatment solution with constant concentration - Google Patents
Apparatus for continuously supplying treatment solution with constant concentrationInfo
- Publication number
- JPH04171038A JPH04171038A JP2300670A JP30067090A JPH04171038A JP H04171038 A JPH04171038 A JP H04171038A JP 2300670 A JP2300670 A JP 2300670A JP 30067090 A JP30067090 A JP 30067090A JP H04171038 A JPH04171038 A JP H04171038A
- Authority
- JP
- Japan
- Prior art keywords
- concentration
- tank
- supply
- supply tank
- processing liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims abstract description 101
- 238000005070 sampling Methods 0.000 claims abstract description 7
- 238000005259 measurement Methods 0.000 claims description 11
- 238000003756 stirring Methods 0.000 claims description 8
- 238000001514 detection method Methods 0.000 claims description 3
- 239000000243 solution Substances 0.000 abstract description 46
- 239000007864 aqueous solution Substances 0.000 abstract description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 28
- 239000004372 Polyvinyl alcohol Substances 0.000 description 47
- 229920002451 polyvinyl alcohol Polymers 0.000 description 47
- 239000000463 material Substances 0.000 description 11
- 239000004745 nonwoven fabric Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 5
- 239000003085 diluting agent Substances 0.000 description 4
- 239000000835 fiber Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000007865 diluting Methods 0.000 description 1
- 239000002649 leather substitute Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/80—Forming a predetermined ratio of the substances to be mixed
- B01F35/82—Forming a predetermined ratio of the substances to be mixed by adding a material to be mixed to a mixture in response to a detected feature, e.g. density, radioactivity, consumed power or colour
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Coating Apparatus (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、基材を処理する工程で連続的に供給される
処理液の濃度を一定の濃度に保つ一定濃度処理液の連続
供給装置に関するものである。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a continuous supply device for a constant concentration treatment liquid that maintains the concentration of the treatment liquid continuously supplied in a process of treating a substrate at a constant concentration. It is something.
従来、人工皮革を製造するために、前工程で温水槽に浸
漬した基材となる不織布を、所定濃度に希釈したポリビ
ニルアルコール（以下、ＰＶＡと略す）水溶液の処理液
が入れられた処理槽に導入することが行なわれている。Conventionally, in order to produce artificial leather, a nonwoven fabric that serves as a base material is soaked in a hot water tank in the previous step, and is placed in a treatment tank containing a treatment solution of polyvinyl alcohol (hereinafter abbreviated as PVA) diluted to a predetermined concentration. It is being introduced.
不織布にＰＶＡを含浸付与させる工程において、処理槽
に入れられるＰＶＡ水溶液からなる処理液は、あらかじ
め作業者が高濃度のＰＶＡ溶液を攪拌槽に給液し、アタ
ゴ式ハンド型屈折計で観察される屈折率を基に濃度を測
定しながら希釈液となる水を攪拌槽に給水してＰＶＡ溶
液と水とを攪拌混合し、ＰＶＡ溶液を所定濃度のＰＶＡ
水溶液に希釈した後、供給ポンプて処理槽に供給してい
た。In the process of impregnating nonwoven fabric with PVA, the processing liquid consisting of a PVA aqueous solution is placed in a processing tank.The operator supplies a highly concentrated PVA solution to a stirring tank in advance, and the processing liquid is observed with an Atago hand-type refractometer. While measuring the concentration based on the refractive index, water to be used as a diluent is supplied to a stirring tank, and the PVA solution and water are stirred and mixed, and the PVA solution is mixed with PVA at a predetermined concentration.
After diluting it into an aqueous solution, it was supplied to the treatment tank using a supply pump.
しかしなから、屈折率を基にして濃度を測定しなからＰ
ＶＡ溶液に水を給水して希釈し、所定濃度のＰＶＡ水溶
液に調整する人為的作業では、屈折率の測定や水の給水
量の誤差か大きく、ＰＶＡ水溶液を供給する毎に濃度か
異なり、目的とする所定濃度のＰＶＡ水溶液の濃度範囲
のばらつきか大きくなる。However, since the concentration is not measured based on the refractive index, P
In the manual work of supplying water to the VA solution to dilute it and adjusting it to a PVA aqueous solution of a predetermined concentration, there are large errors in the measurement of the refractive index and the amount of water supplied, and the concentration differs each time the PVA aqueous solution is supplied, which may result in a difference in the intended concentration. The variation in the concentration range of a PVA aqueous solution with a predetermined concentration increases.
また、攪拌槽から処理槽に供給されたＰＶＡ水溶液は供
給された時点では一定濃度であるか、前工程で温水槽に
浸けた不織布を処理槽に導入し、不織布にＰＶＡの含浸
を連続的に継続していると、不織布に含まれている水分
が浸透作用でＰＶＡ水溶液の中に浸入して残存し、ＰＶ
Ａ水溶液の濃度を除々に低下させる。In addition, the PVA aqueous solution supplied from the stirring tank to the treatment tank has a constant concentration at the time of supply, or the nonwoven fabric soaked in the hot water tank in the previous step is introduced into the treatment tank, and the nonwoven fabric is continuously impregnated with PVA. If this continues, the water contained in the nonwoven fabric will penetrate into the PVA aqueous solution by osmosis and remain, causing the PV
A Gradually lower the concentration of the aqueous solution.
このように、処理槽のＰＶＡ水溶液は、供給毎の濃度範
囲のばらつきや不織布に含まれる水分の影響による濃度
低下により、一定濃度のＰＶＡ水溶液による不織布の処
理か行なえず、不織布へのＰＶＡの含浸量が異り、含浸
後の不織布の厚さか変化したり、波打ちや表面状態か変
化する等の問題を有していた。In this way, the PVA aqueous solution in the treatment tank can only be treated with a PVA aqueous solution of a fixed concentration due to variations in the concentration range for each supply and a decrease in concentration due to the influence of water contained in the nonwoven fabric, and it is difficult to impregnate the nonwoven fabric with PVA. The amounts were different, and there were problems such as changes in the thickness of the nonwoven fabric after impregnation, waving, and changes in surface condition.
この発明の目的は、連続的に供給する処理液の濃度を一
定に保ち、被処理材に対し悪影響を与えない一定濃度処
理液の連続供給装置を提供することである。SUMMARY OF THE INVENTION An object of the present invention is to provide an apparatus for continuously supplying a constant concentration processing liquid that maintains a constant concentration of a processing liquid that is continuously supplied and does not have an adverse effect on a material to be processed.
この発明の請求項＋１１の一定濃度処理液の連続供給装
置は、高濃度溶液槽からの高濃度溶液と希釈液とを攪拌
混合して調液した処理液を処理槽に供給する供給槽を設
け、この供給槽に液面レベル計を設け、この液面レベル
計の出力に基ついて高濃度溶液槽から供給槽に高濃度溶
液を給液するレベル調節装置を設け、供給槽の内部の処
理液の濃度を測定する濃度検出器を設け、この濃度検出
器の出力に基づいて希釈液を給液する濃度調節装置を設
けたものである。The continuous supply device for constant concentration processing liquid according to claim +11 of the present invention is provided with a supply tank for supplying the processing liquid prepared by stirring and mixing the high concentration solution and diluted solution from the high concentration solution tank to the processing tank. A liquid level meter is provided in this supply tank, and a level adjustment device is provided to supply high concentration solution from the high concentration solution tank to the supply tank based on the output of this liquid level meter, and the processing liquid inside the supply tank is A concentration detector is provided to measure the concentration of the liquid, and a concentration adjustment device is provided to supply a diluent based on the output of the concentration detector.
請求項（２）の一定濃度処理液の連続供給装置は、請求
項（１１記載の一定濃度処理液の連続供給装置において
、供給槽の内部にフィルタを設け、このフィルタを介在
させて供給槽の処理液を循環させる濃度測定循環流路を
設け、この濃度測定循環流路中にサンプリングポンプと
濃度検出器と背圧弁とを直列に設けたものである。The continuous supply device for a constant concentration processing liquid according to claim (2) is the continuous supply device for a constant concentration processing liquid according to claim (11), wherein a filter is provided inside the supply tank, and the filter is interposed between the supply tank and the supply tank. A concentration measurement circulation channel for circulating the processing liquid is provided, and a sampling pump, a concentration detector, and a back pressure valve are provided in series in this concentration measurement circulation channel.
請求項（３）の一定濃度処理液の連続供給装置は、請求
項（２）記載の一定濃度処理液の連続供給装置において
、供給槽から処理槽の底部に処理液を供給する処理液供
給配管を設け、処理槽のオーバーフローを供給槽に戻す
余剰処理液流路を設けたものである。The constant concentration processing liquid continuous supply device according to claim (3) is the constant concentration processing liquid continuous supply device according to claim (2), which includes a processing liquid supply pipe that supplies the processing liquid from the supply tank to the bottom of the processing tank. A surplus processing liquid flow path is provided for returning overflow from the processing tank to the supply tank.
この発明の請求項（１）の一定濃度処理液の連続供給装
置は、液面レベル計の出力に基づいてレベル調節装置で
高濃度溶液槽から供給槽に給液される高濃度溶液と、濃
度検出器の出力に基づいて濃度調節装置で供給槽に給液
される所定容量の希釈液とを攪拌混合して一定濃度に調
液した処理液を供給槽から処理槽に連続的に供給するの
で、常に一定濃度の処理液を供給槽から処理槽に供給す
ることかできる。The continuous supply device for constant concentration processing liquid according to claim (1) of the present invention includes a high concentration solution supplied from a high concentration solution tank to a supply tank by a level adjustment device based on the output of a liquid level meter, and a high concentration solution supplied to a supply tank based on the output of a liquid level meter. Based on the output of the detector, a predetermined volume of diluent is supplied to the supply tank by a concentration adjustment device, and the processing solution is stirred and mixed to a constant concentration, and the processing solution is continuously supplied from the supply tank to the processing tank. , it is possible to always supply the processing liquid at a constant concentration from the supply tank to the processing tank.
請求項（２）の一定濃度処理液の連続供給装置は、供給
槽で調液した処理液をフィルタを介在させて濃度測定循
環流路を循環させ、フィルタと背圧弁との間に設けた濃
度検出器で処理液の濃度を測定し、この濃度に基づき濃
度調整装置で給液する希釈液の給液容量を制御するので
、処理液中に混在する気泡や繊維等の影響を受けること
なく、供給槽の処理液を一定かつ所定の濃度に保持する
ことができる。The continuous supply device for constant concentration processing liquid according to claim (2) circulates the processing liquid prepared in the supply tank through a concentration measuring circulation channel with a filter interposed, and a concentration measuring liquid provided between the filter and a back pressure valve. A detector measures the concentration of the processing liquid, and a concentration adjustment device controls the volume of the diluted liquid supplied based on this concentration, so it is not affected by air bubbles or fibers mixed in the processing liquid. The processing liquid in the supply tank can be maintained at a constant and predetermined concentration.
請求項（３）の一定濃度処理液の連続供給装置は、処理
液供給配管で供給槽から処理槽の底部に供給された処理
液の余剰分をオーバーフローさせ、余剰処理液流路で供
給槽に戻すので、処理槽には常に所定濃度の処理液が満
たされた状態となる。The continuous supply device for constant concentration processing liquid according to claim (3) allows the surplus processing liquid supplied from the supply tank to the bottom of the processing tank to overflow through the processing liquid supply piping, and supplies the processing liquid to the supply tank through the surplus processing liquid flow path. Since the processing liquid is returned, the processing tank is always filled with the processing liquid at a predetermined concentration.
この発明の一定濃度処理液の連続供給装置の一実施例を
第１図に基づいて説明する。An embodiment of a continuous supply device for a constant concentration processing liquid according to the present invention will be described with reference to FIG.
第１図は、一定濃度のＰＶＡ水溶液からなる処理液を供
給槽２から処理槽３に供給し、不織布からなる基材１２
にＰＶＡを含浸させる装置の構成を説明する概略図であ
る。FIG. 1 shows a process in which a treatment liquid consisting of a PVA aqueous solution with a constant concentration is supplied from a supply tank 2 to a treatment tank 3, and a base material 12 made of a nonwoven fabric is
It is a schematic diagram explaining the composition of the apparatus which impregnates PVA into.
この連続供給装置は、内部をフィルタ２Ａにより分割し
た供給槽２のレベル調節装置となる液面レベル計４と電
磁弁５とにより、内部に貯液したＰＶＡの高濃度溶液を
溶液配管Ａて供給槽２に給液する高濃度溶液槽１か設け
られ、希釈液となる水を供給槽２に給水する給水配管り
の途中には、濃度調節装置を構成する濃度コントローラ
ｌＯと流量計１０Ａと電磁弁１０Ｂとが設けられ、ＰＶ
Ａ水溶液の濃度か一定になるように給水量を制御してい
る。なお、供給槽２には、給液および給水されるＰＶＡ
の高濃度溶液と水とを均一に攪拌混合し、一定濃度のＰ
ＶＡ水溶液にする攪拌機６か設置されている。This continuous supply device supplies a high concentration solution of PVA stored inside through a solution pipe A using a liquid level meter 4 and a solenoid valve 5, which serve as a level adjustment device for a supply tank 2 whose interior is divided by a filter 2A. A high concentration solution tank 1 is provided to supply liquid to the tank 2, and a concentration controller 10, a flow meter 10A, and an electromagnetic device that constitute a concentration adjustment device are installed in the middle of the water supply piping that supplies water as a diluent to the supply tank 2. A valve 10B is provided, and the PV
The amount of water supplied is controlled so that the concentration of aqueous solution A remains constant. In addition, the supply tank 2 includes PVA to be supplied with liquid and water.
A high concentration solution of P and water are uniformly stirred and mixed to obtain a constant concentration of P.
A stirrer 6 is installed to make a VA aqueous solution.
そして、供給槽２の一方の下部には、ごみや基材１２の
繊維（糸くず）を除去するためのフィルタ２Ａを介して
処理液をサンプリングポンプ７てサンプリングし、処理
液の濃度を濃度検出器８て検出して背圧弁９を通過させ
、供給槽２に戻す濃度測定循環流路Ｂを設けられている
。この濃度測定循環流路Ｂのフィルタ２Ａと背圧弁９と
の間に設けた濃度検出器８て測定される濃度検出信号に
基づき、給水配管りに設けた濃度調節装置の流量計１０
Ａと電磁弁１０Ｂとの動作か濃度コントローラＩＯで制
御される。Then, at the bottom of one side of the supply tank 2, a sampling pump 7 samples the processing liquid through a filter 2A for removing dust and fibers (lint) from the base material 12, and the concentration of the processing liquid is detected. A concentration measuring circulation channel B is provided which detects the concentration of the liquid in the container 8, passes it through a back pressure valve 9, and returns it to the supply tank 2. Based on the concentration detection signal measured by the concentration detector 8 installed between the filter 2A of the concentration measurement circulation flow path B and the back pressure valve 9, a flowmeter 10 of a concentration adjustment device installed in the water supply piping
The operations of the solenoid valve A and the solenoid valve 10B are controlled by the concentration controller IO.
また、供給槽２の他方の下部には、攪拌混合して一定濃
度にしたＰＶＡ水溶液の処理液を、途中に設けた供給ポ
ンプ１１て処理槽３の底部に連続的に供給する処理液供
給配管Ｅか接続されている。In addition, at the other lower part of the supply tank 2, there is a processing liquid supply pipe that continuously supplies a processing liquid of a PVA aqueous solution that has been stirred and mixed to a constant concentration to the bottom of the processing tank 3 using a supply pump 11 installed in the middle. E is connected.
この処理液供給配管Ｅか接続された処理槽３は、連続的
に供給される反物状の基材１２に処理液を含浸させ、Ｐ
ＶＡを基材１２に含浸付与（付着）させるものであり、
供給される処理液の濃度を常に一定の濃度にする必要か
ある。したかって、供給槽３で濃度調整された処理液か
供給される処理槽３は、処理液を連続的に供給する供給
槽２の容量よりも小さい容量とし、容量以上に供給され
余剰となる処理液をオーバーフローさせ、供給槽２に戻
す余剰処理液流路Ｃか設けられている。The processing tank 3 connected to the processing liquid supply pipe E impregnates the continuously supplied cloth-like base material 12 with the processing liquid.
It impregnates (adheres) VA to the base material 12,
Is it necessary to always keep the concentration of the supplied processing liquid constant? Therefore, the processing tank 3 to which the processing liquid whose concentration has been adjusted in the supply tank 3 is supplied has a smaller capacity than the capacity of the supply tank 2 that continuously supplies the processing liquid, and the processing liquid is supplied in excess of the capacity and becomes surplus. A surplus processing liquid channel C is provided for overflowing the liquid and returning it to the supply tank 2.
このような構成において、各部位の具体的な動作を説明
する。 −
高濃度溶液槽ｌの内部に貯液した高濃度（２５％または
１５％）のＰＶＡ溶液を、レベル調節装置の電磁弁５を
操作して溶液配管Ａから供給槽２に給液を開始し、液面
レベル計４に設定したレベルまでＰＶＡ溶液を給液して
所定容量のＰＶＡ溶液を供給槽２に貯液した後、フィル
タ２人を介して供給槽２に貯液したＰＶＡ溶液をサンプ
リングポンプ７で濃度測定循環流路Ｂに送り、濃度検出
器８と背圧弁９とを通過させて供給槽２に戻すＰＶＡ溶
液の循環流路を形成する。In such a configuration, specific operations of each part will be explained. - Start supplying the high concentration (25% or 15%) PVA solution stored inside the high concentration solution tank l to the supply tank 2 from the solution pipe A by operating the solenoid valve 5 of the level adjustment device. After the PVA solution is supplied to the level set on the liquid level meter 4 and a predetermined volume of PVA solution is stored in the supply tank 2, the PVA solution stored in the supply tank 2 is sampled through two filters. A circulation channel is formed in which the PVA solution is sent to the concentration measurement circulation channel B by the pump 7, passes through the concentration detector 8 and the back pressure valve 9, and is returned to the supply tank 2.
そして、濃度測定循環流路Ｂの途中の濃度検出器８でＰ
ＶＡ溶液の濃度を測定し、このＰＶＡ溶液の濃度検出信
号を濃度コントローラ１０で処理して目的とする所定濃
度（１８，２±２％または８．１±１％）のＰＶＡ水溶
液にするのに必要な水の容量を決定し、給水する水の容
量を計量する流量計１０Ａと電磁弁１０Ｂとの間の給水
配管りの容量も考慮し、電磁弁１０Ｂを操作して所定容
量の水か給水配管りから供給槽２に給水され、攪拌機６
で供給槽２のＰＶＡ溶液と水とを均一に攪拌混合する。Then, the concentration detector 8 in the middle of the concentration measurement circulation flow path B
To measure the concentration of the VA solution and process the concentration detection signal of this PVA solution with the concentration controller 10 to obtain a PVA aqueous solution with a desired predetermined concentration (18.2 ± 2% or 8.1 ± 1%). Determine the required capacity of water, consider the capacity of the water supply piping between the flowmeter 10A that measures the volume of water to be supplied, and the solenoid valve 10B, and operate the solenoid valve 10B to supply a predetermined volume of water. Water is supplied from the piping to the supply tank 2, and the agitator 6
The PVA solution in supply tank 2 and water are uniformly stirred and mixed.
このとき、サンプリングポンプ７の送り圧力（排出圧力
）を７ （ｋｇ／ｃｍ）以上に設定し、背圧弁９の最小
動作圧力を７ （ｋｇ／ｃｄ）に設定することにより、
サンプリングポンプ７と背圧弁９との間の濃度測定循環
流路Ｂの内部に気泡か残存するのを防止し、濃度検出器
８において測定するＰＶＡ水溶液の濃度の値を正確に測
定できるようにしている。At this time, by setting the feeding pressure (discharge pressure) of the sampling pump 7 to 7 (kg/cm) or more and setting the minimum operating pressure of the back pressure valve 9 to 7 (kg/cd),
Preventing any air bubbles from remaining inside the concentration measurement circulation flow path B between the sampling pump 7 and the back pressure valve 9, so that the concentration value of the PVA aqueous solution measured by the concentration detector 8 can be accurately measured. There is.
そして、供給槽２で希釈されて所定濃度に達したＰＶＡ
水溶液は、処理液供給配管Ｅの供給ポンプ１１で処理槽
３の底部から連続的に供給されて一定容量が貯液され、
前工程で温水槽に浸漬処理して送りローラで連続的に導
入される基材１２の処理（含浸）液となる。Then, PVA is diluted in supply tank 2 and reaches a predetermined concentration.
The aqueous solution is continuously supplied from the bottom of the processing tank 3 by the supply pump 11 of the processing liquid supply pipe E, and a certain volume is stored.
The treatment (impregnation) liquid for the base material 12 is immersed in a hot water tank in the previous step and is continuously introduced by a feed roller.
なお、供給ポンプ１１で処理槽３に供給されるＰＶＡ水
溶液の容量は、基材１２に含浸する容量や自然蒸発する
水分の量より十分に多い容量とし、処理槽３の容量以上
に供給され余剰となるＰＶＡ水溶液は、処理槽３の上部
からオーバーフローして余剰処理液流路Ｃにより供給槽
２に戻される。The volume of the PVA aqueous solution supplied to the treatment tank 3 by the supply pump 11 is set to be sufficiently larger than the capacity to impregnate the base material 12 and the amount of naturally evaporated water, so that the volume of the PVA aqueous solution supplied to the treatment tank 3 by the supply pump 11 is sufficiently larger than that of the water to be naturally evaporated. The PVA aqueous solution overflows from the upper part of the processing tank 3 and is returned to the supply tank 2 through the surplus processing liquid flow path C.
このとき、処理槽３に貯液されているＰＶＡ水溶液は、
処理液供給配管Ｅの供給ポンプ１１て連続的に供給され
るＰＶＡ水溶液の対流により、十分に攪拌されるととも
に常に一定濃度に保持される。また、供給槽２において
も余剰処理液流路Ｃにより戻されるＰＶＡ水溶液により
、攪拌機６による攪拌混合作用とは別の供給槽２におけ
るＰＶＡ水溶液の攪拌混合作用として働く。At this time, the PVA aqueous solution stored in the treatment tank 3 is
Due to the convection of the PVA aqueous solution that is continuously supplied by the supply pump 11 of the processing liquid supply pipe E, the PVA aqueous solution is sufficiently stirred and is always maintained at a constant concentration. Further, in the supply tank 2 as well, the PVA aqueous solution returned through the surplus processing liquid channel C acts as a stirring and mixing action for the PVA aqueous solution in the supply tank 2, which is different from the stirring and mixing action by the stirrer 6.
このように一定濃度のＰＶＡ水溶液の連続供給装置を構
成したので、供給槽２に給液されるＰＶＡ溶液の濃度を
濃度検出器８で測定し、所定濃度になるように濃度コン
トローラｌＯで流量計１０Ａと電磁弁１０Ｂとを制御し
て水を給水し、攪拌混合して所定濃度のＰＶＡ水溶液を
処理槽３に供給し、余剰のＰＶＡ水溶液を供給槽２に戻
すというサイクルを繰り返すことにより、処理槽３て基
材１２か浸漬されＰＶＡを含浸（付着）させるためのＰ
ＶＡ水溶液の濃度の値を常に一定とすることかできるの
で、基材１２に含浸（付着）するＰＶＡの量か変動せず
、含浸後の基材１２の厚さか変化したり、波打ちや表面
状態か変化する等の悪影響を与えない。Since the device for continuously supplying a PVA aqueous solution with a constant concentration is configured in this way, the concentration of the PVA solution supplied to the supply tank 2 is measured by the concentration detector 8, and the concentration controller 1O is used to measure the concentration of the PVA solution supplied to the supply tank 2 using a flow meter to maintain a predetermined concentration. 10A and solenoid valve 10B, water is supplied by stirring and mixing, a PVA aqueous solution of a predetermined concentration is supplied to the treatment tank 3, and the surplus PVA aqueous solution is returned to the supply tank 2. By repeating the cycle, the treatment is carried out. P for impregnating (adhering) PVA in which the base material 12 is immersed in tank 3.
Since the concentration of the VA aqueous solution can always be kept constant, the amount of PVA impregnated (adhered) to the base material 12 does not change, and the thickness of the base material 12 after impregnation does not change, or the surface condition such as waving or It does not cause any adverse effects such as changes in the
〔発明の効果〕
この発明の請求項（１）の一定濃度処理液の連続供給装
置は、液面レベル計の出力に基ついてレベル調節装置で
高濃度溶液槽から供給槽に給液される高濃度溶液と、濃
度検出器の出力に基づいて濃度調節装置で供給槽に給液
される所定容量の希釈液とを攪拌混合して一定濃度に調
液した処理液を供給槽から処理槽に連続的に供給するの
で、常に一定濃度の処理液を供給槽から処理槽に供給す
るこにより、常に一定濃度の処理液を供給槽から処理槽
に供給することができるので、処理槽で安定した処理を
行なうことができる。[Effects of the Invention] The continuous supply device for constant concentration processing liquid according to claim (1) of the present invention provides a continuous supply system for supplying a constant concentration processing liquid from a high concentration solution tank to a supply tank using a level adjustment device based on the output of a liquid level meter. The concentrated solution and a predetermined volume of diluted solution supplied to the supply tank by a concentration adjustment device based on the output of the concentration detector are stirred and mixed to have a constant concentration, and the processing solution is continuously transferred from the supply tank to the processing tank. Since the processing liquid is always supplied at a constant concentration from the supply tank to the processing tank, it is possible to always supply the processing liquid at a constant concentration from the supply tank to the processing tank, allowing stable processing in the processing tank. can be done.
請求項（２）の一定濃度処理液の連続供給装置は、供給
槽で調液した処理液をフィルタを介在させて濃度測定循
環流路を循環させ、フィルタと背圧弁との間に設けた濃
度検出器で処理液の濃度を測定し、この濃度に基づき濃
度調整装置て給液する希釈液の給液容量を制御するので
、処理液中に混在する気泡や繊維等の影響を受けること
なく、供給槽の処理液を一定かつ所定の濃度に保持する
ことにより、処理液の中に混在する気泡や繊維等のごみ
の影響を受けることなく、濃度測定の精度を向上させて
供給槽の処理液を所定の一定濃度に保持することができ
るので、供給槽から処理槽に供給する処理液の濃度を常
に一定濃度に保持し、処理槽で処理を行なうことができ
る。The continuous supply device for constant concentration processing liquid according to claim (2) circulates the processing liquid prepared in the supply tank through a concentration measuring circulation channel with a filter interposed, and a concentration measuring liquid provided between the filter and a back pressure valve. A detector measures the concentration of the processing liquid, and a concentration adjustment device controls the volume of diluted liquid supplied based on this concentration, so it is not affected by air bubbles, fibers, etc. mixed in the processing liquid. By maintaining the processing liquid in the supply tank at a constant and predetermined concentration, the accuracy of concentration measurement is improved without being affected by dust such as air bubbles and fibers mixed in the processing liquid. can be maintained at a predetermined constant concentration, so that the concentration of the processing liquid supplied from the supply tank to the processing tank can always be maintained at a constant concentration, and the processing can be performed in the processing tank.
請求項（３）の一定濃度処理液の連続供給装置は、処理
液供給配管で供給槽から処理槽の底部に供給された処理
液の余剰分をオーバーフローさせ、余剰処理液流路で供
給槽に戻すことにより、処理槽には常に一定濃度の処理
液が満たされた状態となるので、処理液の濃度変動に伴
い基材の厚さが変化したり、波打ちや表面状態か変化す
る等の悪影響を与えることなく、−層安定した処理を行
なえる。The continuous supply device for constant concentration processing liquid according to claim (3) allows the surplus processing liquid supplied from the supply tank to the bottom of the processing tank to overflow through the processing liquid supply piping, and supplies the processing liquid to the supply tank through the surplus processing liquid flow path. By returning the treatment tank, the treatment tank is always filled with a constant concentration of treatment liquid, so there is no possibility of adverse effects such as changes in the thickness of the substrate, waving, or changes in the surface condition due to fluctuations in the concentration of the treatment liquid. -layer stable processing can be performed without giving any
第１図はこの発明の一定濃度処理液の連続供給装置の一
実施例の構成を説明する概略図である。
１・・・高濃度溶液槽、２・・・供給槽、２Ａ・・・フ
ィルタ、３・・・処理槽、４・・・液面レベル計、５・
・・電磁弁、７・・・サンプリングポンプ、８・・・濃
度検出器、９・・・背圧弁、ｌＯ・・・濃度コントロー
ラ、ＩＯＡ・・・流量計、ＩＯＢ・・・電磁弁、１１・
・・供給ポンプ、Ｂ・・・濃度測定循環流路、Ｃ・・・
余剰処理液流路、Ｅ・・・処理液供給配管FIG. 1 is a schematic diagram illustrating the structure of an embodiment of a continuous supply device for a constant concentration processing liquid according to the present invention. DESCRIPTION OF SYMBOLS 1... High concentration solution tank, 2... Supply tank, 2A... Filter, 3... Processing tank, 4... Liquid level meter, 5...
... Solenoid valve, 7... Sampling pump, 8... Concentration detector, 9... Back pressure valve, lO... Concentration controller, IOA... Flow meter, IOB... Solenoid valve, 11.
... Supply pump, B... Concentration measurement circulation channel, C...
Surplus processing liquid flow path, E...processing liquid supply piping
Claims (3)
混合して調液した処理液を処理槽に供給する供給槽を設
け、この供給槽に液面レベル計を設け、この液面レベル
計の出力に基づいて前記高濃度溶液槽から前記供給槽に
高濃度溶液を給液するレベル調節装置を設け、前記供給
槽の内部の処理液の濃度を測定する濃度検出器を設け、
この濃度検出器の出力に基づいて希釈液を給液する濃度
調節装置を設けた一定濃度処理液の連続供給装置。(1) A supply tank is provided to supply the processing liquid prepared by stirring and mixing the high concentration solution and diluted liquid from the high concentration solution tank, and a liquid level meter is installed in this supply tank. A level adjustment device is provided for supplying a high concentration solution from the high concentration solution tank to the supply tank based on the output of the surface level meter, and a concentration detector is provided for measuring the concentration of the processing liquid inside the supply tank,
A continuous supply device for a constant concentration processing liquid, which is equipped with a concentration adjustment device that supplies a diluted liquid based on the output of the concentration detector.
タを介在させて前記供給槽の処理液を循環させる濃度測
定循環流路を設け、この濃度測定循環流路中にサンプリ
ングポンプと前記濃度検出器と背圧弁とを直列に設けた
請求項（１）記載の一定濃度処理液の連続供給装置。(2) A filter is provided inside the supply tank, and a concentration measurement circulation channel is provided in which the processing liquid in the supply tank is circulated through the filter, and a sampling pump and the concentration detection circuit are provided in the concentration measurement circulation channel. 2. The continuous supply device for constant concentration processing liquid according to claim 1, wherein the container and the back pressure valve are provided in series.
する処理液供給配管を設け、前記処理槽のオーバーフロ
ーを前記供給槽に戻す余剰処理液流路を設けた請求項（
２）記載の一定濃度処理液の連続供給装置。(3) A processing liquid supply pipe for supplying processing liquid from the supply tank to the bottom of the processing tank is provided, and a surplus processing liquid flow path is provided for returning overflow from the processing tank to the supply tank.
2) Continuous supply device for constant concentration processing liquid as described above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2300670A JPH04171038A (en) | 1990-11-05 | 1990-11-05 | Apparatus for continuously supplying treatment solution with constant concentration |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2300670A JPH04171038A (en) | 1990-11-05 | 1990-11-05 | Apparatus for continuously supplying treatment solution with constant concentration |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04171038A true JPH04171038A (en) | 1992-06-18 |
Family
ID=17887658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2300670A Pending JPH04171038A (en) | 1990-11-05 | 1990-11-05 | Apparatus for continuously supplying treatment solution with constant concentration |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04171038A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0871494A (en) * | 1994-08-31 | 1996-03-19 | Mitsubishi Chem Corp | Automatic preparation of dyestuff solution |
| EP0716879A2 (en) * | 1994-12-14 | 1996-06-19 | FSI International, Inc. | Apparatus for blending chemical and diluent liquids |
| CN102553489A (en) * | 2011-12-31 | 2012-07-11 | 钦州华成自控设备有限公司 | Automatic acid preparation method and device for phosphoric acid in sugar refinery |
-
1990
- 1990-11-05 JP JP2300670A patent/JPH04171038A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0871494A (en) * | 1994-08-31 | 1996-03-19 | Mitsubishi Chem Corp | Automatic preparation of dyestuff solution |
| EP0716879A2 (en) * | 1994-12-14 | 1996-06-19 | FSI International, Inc. | Apparatus for blending chemical and diluent liquids |
| EP0716879A3 (en) * | 1994-12-14 | 1997-02-05 | Fsi Int Inc | Apparatus for blending chemical and diluent liquids |
| CN102553489A (en) * | 2011-12-31 | 2012-07-11 | 钦州华成自控设备有限公司 | Automatic acid preparation method and device for phosphoric acid in sugar refinery |
| CN102553489B (en) * | 2011-12-31 | 2015-11-25 | 钦州华成自控设备有限公司 | Sugar refinery phosphoric acid automatic mixing acid method and device |
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