JPH04164240A - Sample setting pedestal and fluorescent x-ray analyzing method using the pedestal - Google Patents

Abstract

PURPOSE:To conveniently and rapidly perform analysis by including an element which emits fluorescent X-rays having a wavelength that is shorter in the vicinity of an absorption end of an element to be analyzed contained in a sample, then that at the absorption end. CONSTITUTION:When a primary X-rays 3 are made to irradiate a sample 2 set on a pedestal 1, first fluorescent X-rays 4 are emitted from the sample 2. Further, the X-rays 3 transmits through the sample 2 and into the pedestal 1, and accordingly, second fluorescent X-rays 5 are emitted also from the pedestal 1. Further, X-rays 5, 6 as analyzing rays are led into spectrometric crystal which diffract the X-rays that are then introduced into a detecting pipe. Since the pedestal 1 contains therein an element, as a main component, located in the vicinity of an absorption end of an element to be analyzed in the sample 2 and emitting fluorescent X-rays having a wavelength shorter than that at the absorption end, not only the X-rays 4 but also the X-rays 6 are emitted from the surface of the sample 2. Accordingly, the analyzing rays are amplified, thereby it is possible to increase the sensitivity of the analysis.

Description

Detailed Description of the Invention The present invention relates to a sample mounting pedestal on which a minute amount of a sample of metal, ceramic, etc. is placed, and a fluorescence xm analysis method using the pedestal.

One of the methods to analyze the elements and composition of a sample by utilizing the spectroscopic properties of the sample substance is called the X-ray fluorescence analysis method, which utilizes the phenomenon of X-ray emission. There is.

Generally, when a material is irradiated with a rapidly accelerated electron beam or It is formed. and,
Since the arrangement state of the electrons becomes unstable, the outer shell electrons transition and try to fill the vacancies in the inner shell, and the energy difference is emitted as X-rays. This X-ray is called characteristic X-ray.
The characteristic X-rays generated when a substance is irradiated with X-rays are particularly called fluorescent X-rays. The energy of characteristic X-rays (including fluorescent X-rays) is specified by the energy difference between inner shell orbitals such as K shell and L shell, through which electrons transition, and has a value unique to the element.

FIG. 5 is a conceptual diagram schematically showing the principle of the fluorescent X-ray analysis method.

That is, a tube 5 in which a target (not shown) is installed.
When a predetermined voltage is applied to X-ray tube 1 , X-rays (-th order X-rays) 52 having a predetermined wavelength distribution are emitted from tube 51 and irradiated onto sample 53 . Then, the sample 53 emits fluorescent X-rays (including analytical lines) 54 specific to the elements contained in the sample 53, and then the fluorescent X-rays 54 enter the spectroscopic crystal 55. Then, the fluorescent X-rays 54 are diffracted by the spectroscopic crystal 55, and only the fluorescent X-rays 57, which are analysis lines, enter the detection tube 56. That is, since the sample 53 emits other X-rays such as scattered X-rays in addition to the fluorescent X-rays 54, a spectroscopic crystal 55 with a known crystal lattice spacing d is used to detect the fluorescent X-rays as the analysis line. Only the intensity of 57 is measured by the detection tube 56. In other words, the following Bragg equation n λ = 2 d sin θ (θ Black angle, n / natural number) holds between the wavelength 9 of fluorescent X-rays 54 and scattered X-rays and the lattice spacing d. . Therefore, by arranging the detection tube 56 in the direction regulated by the Black angle θ, only the intensity of the fluorescent X-rays 57 can be measured to perform desired analysis such as element identification.

By the way, in the above-mentioned fluorescent X-ray analysis method, it is important to increase the ratio of the intensity of fluorescent X-rays (analytical lines) emitted from a sample to the amount of analyte in the sample, that is, the "analytical line sensitivity." This is important for improving accuracy.

On the other hand, the energy of the fluorescent X-rays 54 is specified by the energy difference between the inner orbits to which electrons transition, as described above.

Further, the fluorescent X-rays 54 are such that the wavelength of the −th order X-rays 52
It is known that this phenomenon occurs only when the wavelength is shorter than the so-called absorption edge wavelength of No. 3. The smaller the difference between the wavelength of the -th order X-ray 52 and the absorption edge wavelength, the more the intensity of the fluorescent X-ray 54 is amplified. Therefore, in order to improve the analysis accuracy, it is effective to increase the primary X-ray intensity near the absorption edge of the analysis element and at a shorter wavelength than this absorption edge.

Therefore, in the past, the wavelength distribution of the primary X-ray intensity irradiated to the sample was changed using the following method, and fluorescent X-rays (
analysis line) had increased intensity.

■Change the type of tube depending on the type of analysis element (hereinafter, the type of tube has the same meaning as the type of element that makes up the target).

FIG. 6 shows the wavelength distribution of primary X-ray intensity when the voltage applied to the tube (tube voltage) is constant.

In the figure, the vertical axis indicates the -order X-ray intensity of each tube (target scandium, chromium, molybdenum, rhodium, etc.),
The horizontal axis indicates the absorption edge wavelength (in) of each element. Here, the K-absorption edge wavelength refers to the longest wavelength of the primary X-rays necessary to ionize the electrons in the L-shell, and the L-absorption edge wavelength refers to the longest wavelength of the primary X-rays necessary to ionize the electrons in the L-shell. The longest wavelength.

Further, the -order X-rays include continuous X-rays and characteristic X-rays, and the mountain-like waveform indicates the wavelength distribution of the continuous X-rays, and the pulse-like waveform indicates the wavelength distribution of the characteristic X-rays.

As is clear from Fig. 6, under conditions where the tube voltage is constant, the wavelength distribution of continuous X-rays exhibits approximately the same characteristics regardless of the type of tube, but the wavelength distribution of characteristic X-rays ( (appearance position) differs depending on the type of tube. Therefore, for example, when measuring the intensity of CaKa radiation, C
S that emits characteristic X-rays near the absorption edge of a (calcium) and at a wavelength shorter than the absorption edge.
By using the c (scandium) tube, the intensity of the CaKa rays emitted from the sample is maximized. In this way, by changing the type of tube depending on the analysis element in the sample, it is possible to set conditions where the analytical line sensitivity is maximized.

■Change the tube voltage depending on the type of analysis element.

FIG. 7 shows the wavelength distribution of primary X-ray intensity when a Mo (molybdenum) tube is used and the current (tube current) applied to the tube is constant.

As is clear from this figure 7, the tube voltage is 10 kV or 6
As the voltage gradually increases to 35 kV, the wavelength corresponding to the peak of continuous X-ray intensity becomes shorter. In addition, characteristic X-rays are generated above a certain voltage value specified by the type of tube (in the figure, the pulse-like waveform is characteristic X-rays (
Figure 2 shows the occurrence of MoKα and MoKβ). Therefore, by selecting a tube voltage that maximizes the primary X-ray intensity in a wavelength range slightly shorter than the absorption edge wavelength of the analysis element, it is possible to increase the analysis line sensitivity.

■Use a filter to reduce the so-called background intensity.

As shown in FIG. 8, a filter 65 is placed between the tube 61 and the sample 63. insert. As a result, the primary X-rays 62 emitted from the tube 61 pass through the sample 65 through the filter 65.
3, and fluorescent X-rays 6 of a predetermined wavelength are emitted from this sample 63.
4 is emitted. The filter 65 attenuates the primary X-ray intensity mainly on the longer wavelength side than the absorption edge wavelength of the analysis element.

Figure 9 shows a Zn (zinc) filter 65 with a thickness of 50 LLm.
This figure shows the wavelength distribution of the primary X-ray intensity in the case where the analysis element is As (arsenic). Moreover, a Mo tube is used, and the tube voltage is set to 40 kV. In the figure, the solid line indicates the case where the filter 65 is inserted,
The broken line shows the case where the filter 65 is not inserted.

As is clear from FIG. 9, the filter 65 is connected to the tube 6.
1 and the sample 63, the primary X-ray intensity on the longer wavelength side than the absorption edge of As is significantly reduced.

That is, since the background intensity near the absorption edge of As decreases, the sensitivity of the analytical line of As (AsKα line) increases.

■Use a secondary target to reduce the background intensity in the same way as in ■ above.

As shown in FIG. 10, a secondary target 75 is irradiated with primary X-rays 72 emitted from a tube 71. Fluorescence X specific to this secondary target 75 is emitted from the secondary target 75.
A ray 74 is emitted and irradiated onto the sample 73, and the sample 73 emits fluorescent X-rays 76 (analysis line) specific to the sample.

FIG. 11(a) shows the intensity distribution of the -th order X-ray 72, and
FIG. 1(b) shows the intensity distribution of the fluorescent X-rays 74. The element to be analyzed for sample 73 is As, and an R1 (rhodium) tube is used. Further, as the secondary target 75, Mo was used as an element capable of exciting the fluorescent X-rays 76 of As.

As is clear from FIGS. 11(a) and (b), near the absorption edge of As, continuous X-rays appear in the wavelength distribution of -th order X-rays 72, but in the wavelength distribution of fluorescent X-rays 74, Since no light has appeared, it is possible to reduce the background intensity in the vicinity of the absorption edge of As. Furthermore, the Mo fluorescence X-rays 74 used for the secondary target 75 appear closer to the absorption edge of As than the characteristic X-rays of Rh, so it is possible to further increase the analytical line sensitivity. .

Ming is the answer? Lesson 8 However, in the method of changing the type of tube described in ■ above,
There are limits to the optimal selection of the type of tube corresponding to the analysis element, and a great deal of effort is required to replace the tube. Moreover, when the tube is replaced, it takes time for the analyzer to reach a steady state, such as stabilization of the -order X-ray intensity. In other words, there was a problem in that it was not possible to easily and quickly analyze a large number of samples with different constituent elements.

In addition, in the method of changing the tube voltage in (2) above, there is a limit to the optimum setting of the tube voltage, and furthermore, after setting the optimum tube voltage for each analysis element, the analyzer reaches a steady state as in the conventional example in (2) above. It takes time. Therefore, there was a problem that it was not suitable for analyzing a large number of samples having different constituent elements.

Furthermore, even when using the filter 65 or secondary target 75 described in ■ or ■ above, there is a limit to the optimal selection of the filter 65 or secondary target 75 corresponding to the analysis element, and the analysis device It takes time for it to reach a steady state. Also, if the background intensity is already sufficiently low compared to the analysis line intensity. It is not possible to expect a significant increase in analytical line sensitivity. especially,
In the method (2) above in which the analytical ray sensitivity is increased using the secondary target 75, it is necessary to shorten the path length of the X-rays in order to prevent a decrease in the X-ray intensity. In other words, in this method, when the spectroscopic crystal 55 (Fig. 5) is used, the intensity of the fluorescent X-rays (analytical line) that enters the detection tube is extremely reduced. In addition, there was a problem that a semiconductor detector had to be used instead of a detection tube, resulting in deterioration of energy resolution.

The present invention was invented in view of the above problems, and includes a pedestal for mounting a sample provided for a simple, rapid, and highly accurate fluorescent X-ray analysis method, and a fluorescence X1ji! that uses the pedestal.
The purpose is to provide an analytical method.
:: Means for Solving the Problems In order to achieve the above object, the pedestal for mounting a sample according to the present invention has the following features: When a sample is irradiated with X-rays, the absorption edge of the analytical element contained in the sample is The first feature is that it contains as a main component an element that is close to the absorption edge and emits fluorescent X-rays with a shorter wavelength than the absorption edge.

The second feature is that the pedestal is mainly composed of light elements. Here, the light element refers to an element having an atomic number of 9 or less, specifically, H, C, N, OlF, etc.

Further, in the fluorescent X-ray analysis method according to the present invention, a thin sample is placed on the pedestal described in the first feature section, the sample is irradiated with X-rays, and the first The sample is analyzed using the total intensity of the fluorescent X-rays emitted from the pedestal and the second fluorescent X-rays excited by the fluorescent X-rays emitted from the pedestal and emitted from the sample.

Alternatively, instead of the above-mentioned fluorescent X-ray analysis method, a thin sample is placed on the pedestal described in the second characteristic section, and the sample is irradiated with X-rays. With the total intensity of the fluorescent X-rays and the second fluorescent X-rays excited and emitted by the scattered X-rays emitted from the pedestal,
The method is characterized in that the sample is analyzed.

mm According to the pedestal according to the first feature described above, when a sample is irradiated with X-rays, fluorescence
Since it contains an element that emits radiation as a main component, the X-rays that have passed through the sample cause the pedestal to emit fluorescent X-rays.

Furthermore, it is known that light elements having an atomic number of 9 or less have high X-ray scattering ability. Therefore, according to the pedestal according to the second feature described above, since the pedestal is composed mainly of light elements, the X-rays that penetrate the pedestal emit scattered X-rays with relatively high intensity.

Furthermore, when a thin sample is placed on the pedestal described in the first feature section and the sample is irradiated with X-rays, first fluorescent X-rays are directly emitted from the surface of the sample. Furthermore, the X-rays penetrate the pedestal and cause the pedestal to emit fluorescent X-rays. Thereafter, the fluorescent X-rays reaching the sample cause the sample to emit second fluorescent X-rays. That is, the first fluorescent X-ray and the second
The fluorescent X-rays together form an analysis line, and by measuring their total intensity, highly accurate sample analysis is performed.

In addition, even when a thin sample is placed on the pedestal described in the second feature section and the sample is irradiated with X-rays, the first fluorescence is directly emitted from the sample surface, similar to the fluorescent X-rays are emitted. Additionally, the X-rays penetrate the pedestal and emit scattered X-rays within the pedestal. The scattered X-rays reaching the sample cause the sample to emit second fluorescent X-rays. That is, the fluorescent X&? ! Similar to the analysis method, both the first fluorescent X-ray and the second fluorescent X-ray serve as analytical lines,
Highly accurate sample analysis is performed by measuring the total intensity.

Contribution torso Examples according to the present invention will be described below.

FIG. 1 is a conceptual diagram for explaining the fluorescent X-ray analysis method according to the present invention, in which a sample 2 is placed on a pedestal 1. The pedestal 1 contains as a main component an element that, when irradiated with X-rays, emits fluorescent X-rays that are near the absorption edge of the analysis element contained in the sample and have a shorter wavelength than this absorption edge.

For example, when measuring the line (analysis line) intensity of the analysis element, the pedestal 1 is equipped with fluorescent X that is near the absorption edge of the analysis element and has a slightly shorter wavelength than the absorption edge. Contains an element that emits lines as a main component. That is, as stated in the "Prior Art" section, the absorption edge wavelength is unique to each element, and the pedestal 1 is an element that emits fluorescent X-rays with a wavelength slightly shorter than the absorption edge wavelength of the analysis element. It is composed of Specifically, for example, when exciting the line of the analysis element with a line that is slightly shorter than the absorption edge of the analysis element, Between the atomic number of possible elements (excited elements) and 2°, Z' = Z + 1 (5≦Z≦21)...
・■Z' =Z+2 (22≦Z≦33)−・・■
Z' =Z+3 (34≦Z≦42)...■Z'
=Z+4 (43≦Z)・・・・・・・・・・・・
- There is a relationship of (■), and the pedestal 1 is formed of a substance containing an element with an atomic number Z° that satisfies the conditions (■) to (■) above. Further, in the case where the L line (analysis line) of the analysis element is excited by a line or L line slightly shorter than the absorption line of the analysis element, the conditions corresponding to the above items 1 to 2 are different.

When the sample 2 placed on the pedestal 1 is irradiated with the primary X-rays 3, the sample 2 emits first fluorescent X-rays 4. Further, the -order X-rays 3 pass through the sample 2 and penetrate into the pedestal 1, and the pedestal 1 also emits fluorescent X-rays 5. This fluorescent X-ray 5 is absorbed by the sample 2, and a second fluorescent X-ray 6 is emitted from the sample 2. The first fluorescent X-ray 4 and the second fluorescent X-ray 6 together form an analysis line and are incident on the spectroscopic crystal, and further diffracted by the spectroscopic crystal and incident on the detection tube.

In this way, the pedestal l contains as a main component an element that is near the absorption edge of the analysis element of the sample 2 and emits fluorescent X-rays with a shorter wavelength than this absorption edge, so the pedestal l is Not only the fluorescent X-rays 4 but also the second fluorescent X-rays 6 are emitted. Therefore, the analytical line is amplified,
It is possible to increase the analytical line sensitivity. This is particularly effective when the amount of sample is so small that sufficient analytical line intensity cannot be obtained with the first fluorescent X-ray 4 alone. In addition, the pedestal 1 can be replaced easily and quickly, and can be configured with multiple types of excitation elements, which eliminates the need for time and effort for analysis and increase in linear sensitivity, unlike conventional tube replacement. Analysis can be performed easily and quickly without any problems.

The composition was analyzed. Sample 2 was prepared by dripping a predetermined amount of sample solution onto a filter paper and uniformly dispersing the sample solution only within a diameter of 20 mm. Table 1 shows the measurement conditions for fluorescent X-rays.

Table 1 In addition, the pedestal l has the above-mentioned conditions, and Z
r, Y, SrTiO3 were used.

Figure 2 shows analytical line sensitivity (=analytical line intensity/concentration of analytical sample)
are shown together with comparative examples, where the vertical axis is Tl2La
The line (analysis line) intensity and the horizontal axis represent the amount of T and f2N03.

As is clear from Fig. 2, the case without a pedestal and the Tβ
When Cu, which does not excite Lα rays, is used as the pedestal, the analytical line sensitivity is 57 (kcps/μmol), whereas the analytical line sensitivity is increased in all of the pedestals according to the present invention. For example, in pedestal 1 using Zr, the analytical line sensitivity is 8.6 (kcps/umol)
It can be seen that the analytical line sensitivity is increased by about 50% compared to the comparative example. That is, since the content of Tβ, which is an analytical element, is in a trace amount, it is not possible to obtain sufficient T°C Lα ray (analytical line) intensity with only the first fluorescent X-ray 4, but with the second fluorescent X-ray 6. This makes it possible to amplify the intensity of the '12La line (analytical line) and perform analysis with sufficient accuracy.

Table 2 shows the analysis accuracy when Zr is used for the pedestal 1, the Tl2Lα ray intensity is measured, and the quantitative analysis of Tρ is repeated 10 times, together with comparative examples. Analysis accuracy 0
゜-, (wt%) is C) n-1'-Σ(x, -Xav
It is defined as e12/(n l). In addition, Xl is the quantitative value (wt%) of T42 in the superconductor sample, x□. is X
, is the average value of .

Table 2 As is clear from this Table 2, it was confirmed that the analysis accuracy also improved as the analysis line intensity increased.

Next, another example will be described.

In FIG. 3, 11 is a pedestal, and this pedestal 11 is made of a light element compound such as acrylic resin or fluororesin, or a compound with a high light element content. here,
Specifically, the light element refers to an element having an atomic number of 9 or less, such as H, C, N, 0, F, and the like.

When the sample 12 placed on the pedestal 11 is irradiated with the primary X-rays 13, the sample 12 emits first fluorescent X-rays 14. Furthermore, the -order X-rays 13 pass through the sample 12 and penetrate into the pedestal 11, causing the pedestal 1 to emit scattered X-rays 15. That is, the light element constituting the pedestal 11 is primary
The scattering ability for the rays 13 is high, and the scattered X-rays 15 are
radiate from. Then, this scattered X-ray 15 is transmitted to the sample 12.
This sample 12 emits second fluorescent X-rays 16. The first fluorescent X-ray 14 and the second fluorescent X-ray 16 together constitute an analytical line and are incident on the spectroscopic crystal, diffracted by the spectroscopic crystal, and incident on the detection tube.

Note that the pedestal 11 in this embodiment does not need to be composed only of light elements. X-rays scattered by light elements (Scattered X-rays 1
5) may contain elements other than light elements as long as they pass through the pedestal 11 and are absorbed by the sample 12.

Since the pedestal 11 is composed mainly of light elements, it is possible to obtain an analytical line whose intensity is amplified through the scattered X-rays 15 emitted from the pedestal 11, thereby increasing the analytical line sensitivity. It is possible to increase the amount of Also, pedestal 1
The sensitivity of the analytical line increases simply by placing the sample on the sample, so it does not take much time or effort to increase the sensitivity of the analytical line, unlike conventional tube replacements, and analysis can be performed easily and quickly. can be done.

Next, a sample 12 prepared in the same manner as in the above example is placed on a pedestal 11 to generate B emitted from Ba contained in the sample.
The aKa line intensity was measured. Furthermore, the pedestal 11 was made of acrylic resin and fluororesin as it satisfies the above-mentioned conditions. Note that the measurement conditions for fluorescent X-rays are the same as those in Table 1, and Figure 4, which is omitted, shows the analytical line sensitivity along with comparative examples, where the vertical axis is the BaKα ray (analytical line) intensity and the horizontal axis is is Ba (N
o,) represents the amount of 2.

As is clear from Fig. 4, there are cases where there is no pedestal and Ba
When Cu, which does not excite Ka rays, is used as the pedestal, the analytical line sensitivity is 0.9 (kcps/μm01), whereas in the pedestal according to this example, the analytical line sensitivity increases, and the acrylic resin The analytical line sensitivity of the pedestal used was 1.1. (k c p s / u
m o 1 ), and it can be seen that the analytical line sensitivity is increased by about 20% compared to the comparative example. In other words, since the content of Ba, which is an analytical element, is in a trace amount in the sample,
The first fluorescent X-ray 14 alone is insufficient to obtain the aKa ray (analytical line) intensity. However, since the pedestal 11 has a high X-ray scattering ability, when the -order X-rays 13 penetrate into the pedestal 11, scattered X-rays 15 are generated, and these scattered X-rays 15 are further absorbed by the sample 12, and the 2 fluorescent X-rays 1
6 occurs. Then, the intensity of BaKα (analysis line) can be amplified by emitting the second fluorescent X-ray 16, and analysis with sufficient accuracy can be performed.

Table 3 uses an acrylic resin base, and the above 13aK
The analysis accuracy when quantitative analysis of Ba was repeated 10 times using α rays is shown together with a comparative example.

Table 3 As clearly shown in Table 3, it was confirmed that the analytical accuracy was improved by using the pedestal.

Further, Table 4 shows the lower limit of Ba content in the solution together with comparative examples, and shows the minimum value that can quantify the amount of Ba when the nitric acid solution of the superconductor is diluted with water. Incidentally, the dripping amount of the solution was 50 μC.

Table 4 As is clear from Table 4, the lower limit of quantification is lower than that of the comparative example.

It should be noted that the present invention is not limited to the above-mentioned examples and can be modified without departing from the gist, and in the above-mentioned examples, a case was explained in which the composition of oxide powder was analyzed by the filter paper drip method. The present invention can also be applied to the composition analysis of thin film samples such as plated films and vapor deposited films having a film thickness that allows the -order X-rays to pass through.

As is clear from the above explanation, the pedestal (A) for placing a sample according to the present invention absorbs the analytical elements eaten in the sample when the sample is irradiated with X-rays. The main component is an element that is located near the edge and emits fluorescent X-rays with a shorter wavelength than the absorption edge. Therefore, the desired fluorescent X-rays corresponding to the sample can be emitted without replacing the pedestal (A) by easily and quickly replacing the pedestal (A) or by forming the pedestal with multiple types of elements. This saves the effort of setting measurement conditions for each sample, making it possible to perform analysis simply and quickly.

In addition, if the pedestal (B) for mounting the sample is composed mainly of light elements, the scattered X-rays emitted from the pedestal (B) will cause the sample to emit fluorescent X-rays specific to the sample. Furthermore, when a thin sample is placed on the pedestal (A) and the sample is irradiated with X-rays, it is possible to emit X-rays directly from the surface of the sample. A first fluorescent X-ray is emitted, and a second fluorescent X-ray is excited and emitted from the pedestal (A).
The fluorescent X-rays together form an analysis line, and the analysis line is amplified, making it possible to perform measurements with increased analysis line sensitivity and improving the reliability of analysis results.

In addition, the above pedestal (B) made of light elements can be used to hold a thin sample.
Even in the case where the sample is irradiated with X-rays by placing the sample on a By measuring, highly reliable analytical results can be obtained.

[Brief explanation of the drawing]

Figure 1 is a conceptual diagram for explaining an example of the fluorescent X-ray analysis method according to the present invention, and Figure 2 is a characteristic diagram showing an example of the relationship between the amount of analyte and the intensity of the analytical line, together with a comparative example. , FIG. 3 is a conceptual diagram for explaining another example of the fluorescent X-ray analysis method according to the present invention, and FIG. 4 shows another example of the relationship between the amount of analyte and the intensity of analytical rays together with a comparative example. The characteristic diagram shown in Figure 5 is a conceptual diagram for explaining the measurement principle of the fluorescent X-ray analysis method, and Figure 6 is a conceptual diagram for explaining the measurement principle of the fluorescent X-ray analysis method.
The figure shows an example of the wavelength distribution of X-ray intensity to explain the first conventional example, and FIG. 7 shows an example of the wavelength distribution of X-ray intensity to explain the second conventional example. 8 is a conceptual diagram schematically showing the third conventional example, FIG. 9 is a diagram showing an example of the wavelength distribution of X-ray intensity in the third conventional example, and FIG. 10 is a conceptual diagram schematically showing the third conventional example. Conceptual diagram schematically showing a conventional example, No. 11
Figure (a) shows an example of the wavelength distribution of primary X-ray intensity in the fourth conventional example, and Figure 11 (b) shows an example of the wavelength distribution of fluorescent X-ray intensity in the fourth conventional example. It is a diagram. 1.11...Pedestal, 2.12...Sample, 3.13...
- order X-rays, 4.14... first fluorescent X-rays, 5... fluorescent X-rays, 6.16... second fluorescent X-rays, 15... scattered X-rays. Patent applicant, Sumitomo Metal Industries, Ltd. agent:
Patent Attorney Ryunia Bennai (sd kousoku 2 & illusion G') F9 (SdD column) 1 6 books p1r,, L ≦ μ 1 - Oshito KX ko (de- Procedural amendment (method) % formula % 1. Indication of the case 1990 Patent Application No. 14191 3
, Relationship with the case of the person making the amendment Patent applicant address 4-5-33 Kitahama, Chuo-ku, Osaka-shi, Osaka (2
11) Sumitomo Metal Industries Co., Ltd. Tamimei Representative: K. Takigi 4, Agent 7, Contents of amendment: 3rd and 4th lines of page 1 of the specification: “For sample placement or above”

Claims (4)

[Claims] (1) When a sample is irradiated with X-rays, an element that is near the absorption edge of the analytical element contained in the sample and that emits fluorescent X-rays with a shorter wavelength than the absorption edge is contained as a main component. A pedestal for placing a sample. (2) A pedestal for mounting a sample, characterized in that the main component is a light element. (3) A thin sample is placed on the pedestal according to claim 1 and the sample is irradiated with X-rays, whereby first fluorescent X-rays are directly emitted from the sample and fluorescent X-rays are emitted from the pedestal. A fluorescent X-ray analysis method, characterized in that the sample is analyzed based on the total intensity of the second fluorescent X-ray excited by and emitted from the sample. (4) A thin sample is placed on the pedestal according to claim 2, and the sample is irradiated with X-rays, whereby first fluorescent X-rays are directly emitted from the sample and scattered X-rays are emitted from the pedestal. A fluorescent X-ray analysis method, characterized in that the sample is analyzed using the total intensity of the second fluorescent X-ray excited and emitted by the X-ray fluorescence.