JPH04152345A - Photosensitive layer for planographic printing plate - Google Patents
Photosensitive layer for planographic printing plateInfo
- Publication number
- JPH04152345A JPH04152345A JP27755590A JP27755590A JPH04152345A JP H04152345 A JPH04152345 A JP H04152345A JP 27755590 A JP27755590 A JP 27755590A JP 27755590 A JP27755590 A JP 27755590A JP H04152345 A JPH04152345 A JP H04152345A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- photosensitive layer
- printing plate
- weight
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 organic acid salt Chemical class 0.000 claims abstract description 50
- 150000001875 compounds Chemical class 0.000 claims abstract description 27
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims abstract description 21
- 239000011347 resin Substances 0.000 claims abstract description 18
- 229920005989 resin Polymers 0.000 claims abstract description 18
- 229920006243 acrylic copolymer Polymers 0.000 claims abstract description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 12
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims description 8
- 125000002843 carboxylic acid group Chemical group 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 150000002391 heterocyclic compounds Chemical group 0.000 claims description 2
- 238000002156 mixing Methods 0.000 abstract description 3
- QWHZYKBDVSLXAE-UHFFFAOYSA-N 2,3,4-tribromobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Br)C(Br)=C1Br QWHZYKBDVSLXAE-UHFFFAOYSA-N 0.000 abstract 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 125000000623 heterocyclic group Chemical group 0.000 abstract 1
- 125000000547 substituted alkyl group Chemical group 0.000 abstract 1
- XHMRPECKDMZLOH-UHFFFAOYSA-N trichloromethyl 2,4-dichlorobenzenesulfonate Chemical compound ClC1=CC=C(S(=O)(=O)OC(Cl)(Cl)Cl)C(Cl)=C1 XHMRPECKDMZLOH-UHFFFAOYSA-N 0.000 abstract 1
- QBTKZDLOWUAQFF-UHFFFAOYSA-N trichloromethyl benzenesulfonate Chemical compound ClC(Cl)(Cl)OS(=O)(=O)C1=CC=CC=C1 QBTKZDLOWUAQFF-UHFFFAOYSA-N 0.000 abstract 1
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 18
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000004094 surface-active agent Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 150000002009 diols Chemical class 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 229920000728 polyester Polymers 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 239000002841 Lewis acid Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 4
- 239000004014 plasticizer Substances 0.000 description 4
- 239000003755 preservative agent Substances 0.000 description 4
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 4
- 239000011975 tartaric acid Substances 0.000 description 4
- 235000002906 tartaric acid Nutrition 0.000 description 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 2
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- IRIAEXORFWYRCZ-UHFFFAOYSA-N Butylbenzyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCC1=CC=CC=C1 IRIAEXORFWYRCZ-UHFFFAOYSA-N 0.000 description 2
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Chemical compound CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- HVUMOYIDDBPOLL-XWVZOOPGSA-N Sorbitan monostearate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O HVUMOYIDDBPOLL-XWVZOOPGSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 239000003945 anionic surfactant Substances 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 2
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 2
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 2
- VZUBRRXYUOJBRS-UHFFFAOYSA-N trichloromethylsulfonylbenzene Chemical compound ClC(Cl)(Cl)S(=O)(=O)C1=CC=CC=C1 VZUBRRXYUOJBRS-UHFFFAOYSA-N 0.000 description 2
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 1
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical compound OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- ZORQXIQZAOLNGE-UHFFFAOYSA-N 1,1-difluorocyclohexane Chemical compound FC1(F)CCCCC1 ZORQXIQZAOLNGE-UHFFFAOYSA-N 0.000 description 1
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 1
- BRRSNXCXLSVPFC-UHFFFAOYSA-N 2,3,4-Trihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C(O)=C1O BRRSNXCXLSVPFC-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- UECGJSXCVLTIMQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxycarbonyl)cyclohexane-1-carboxylic acid Chemical compound OC(=O)C1CCCCC1C(=O)OCCOC(=O)C=C UECGJSXCVLTIMQ-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 1
- DKHZGIKPBFMBBY-UHFFFAOYSA-N 2-cyano-n-[4-(diethylamino)phenyl]-2-phenylacetamide Chemical compound C1=CC(N(CC)CC)=CC=C1NC(=O)C(C#N)C1=CC=CC=C1 DKHZGIKPBFMBBY-UHFFFAOYSA-N 0.000 description 1
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- CWBAMDVCIHSKNW-UHFFFAOYSA-N 2-iminonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(=N)CC(=O)C2=C1 CWBAMDVCIHSKNW-UHFFFAOYSA-N 0.000 description 1
- WRMNZCZEMHIOCP-UHFFFAOYSA-N 2-phenylethanol Chemical compound OCCC1=CC=CC=C1 WRMNZCZEMHIOCP-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- OALHHIHQOFIMEF-UHFFFAOYSA-N 3',6'-dihydroxy-2',4',5',7'-tetraiodo-3h-spiro[2-benzofuran-1,9'-xanthene]-3-one Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 OALHHIHQOFIMEF-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- MGVDSBGNZUMFRD-UHFFFAOYSA-N 3-benzoylbenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(C(=O)C=2C=CC=CC=2)=C1 MGVDSBGNZUMFRD-UHFFFAOYSA-N 0.000 description 1
- JCYHHICXJAGYEL-UHFFFAOYSA-N 3-butoxypropane-1,2-diol Chemical compound CCCCOCC(O)CO JCYHHICXJAGYEL-UHFFFAOYSA-N 0.000 description 1
- UPMIEBBZKWZYEZ-UHFFFAOYSA-N 3-chloro-4-methylbenzenesulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1Cl UPMIEBBZKWZYEZ-UHFFFAOYSA-N 0.000 description 1
- OLQIKGSZDTXODA-UHFFFAOYSA-N 4-[3-(4-hydroxy-2-methylphenyl)-1,1-dioxo-2,1$l^{6}-benzoxathiol-3-yl]-3-methylphenol Chemical compound CC1=CC(O)=CC=C1C1(C=2C(=CC(O)=CC=2)C)C2=CC=CC=C2S(=O)(=O)O1 OLQIKGSZDTXODA-UHFFFAOYSA-N 0.000 description 1
- QXLACVKAPZRSPF-UHFFFAOYSA-N 4-chloro-1-[4-chloro-2-(trichloromethyl)phenyl]sulfonyl-2-(trichloromethyl)benzene Chemical compound ClC(Cl)(Cl)C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1C(Cl)(Cl)Cl QXLACVKAPZRSPF-UHFFFAOYSA-N 0.000 description 1
- ABGIMZAVRHBVRH-UHFFFAOYSA-N 4-nitro-1-[4-nitro-2-(tribromomethyl)phenyl]sulfonyl-2-(tribromomethyl)benzene Chemical compound BrC(Br)(Br)C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)C1=CC=C([N+]([O-])=O)C=C1C(Br)(Br)Br ABGIMZAVRHBVRH-UHFFFAOYSA-N 0.000 description 1
- FGYJRDLDBSPMBO-UHFFFAOYSA-N 4-nitro-1-[4-nitro-2-(trichloromethyl)phenyl]sulfonyl-2-(trichloromethyl)benzene Chemical compound [N+](=O)([O-])C1=CC(=C(C=C1)S(=O)(=O)C1=C(C=C(C=C1)[N+](=O)[O-])C(Cl)(Cl)Cl)C(Cl)(Cl)Cl FGYJRDLDBSPMBO-UHFFFAOYSA-N 0.000 description 1
- XZIIFPSPUDAGJM-UHFFFAOYSA-N 6-chloro-2-n,2-n-diethylpyrimidine-2,4-diamine Chemical compound CCN(CC)C1=NC(N)=CC(Cl)=N1 XZIIFPSPUDAGJM-UHFFFAOYSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 208000006558 Dental Calculus Diseases 0.000 description 1
- 239000004803 Di-2ethylhexylphthalate Substances 0.000 description 1
- ZVFDTKUVRCTHQE-UHFFFAOYSA-N Diisodecyl phthalate Chemical compound CC(C)CCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC(C)C ZVFDTKUVRCTHQE-UHFFFAOYSA-N 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-N Metaphosphoric acid Chemical compound OP(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-N 0.000 description 1
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- 239000004677 Nylon Substances 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
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- 239000004111 Potassium silicate Substances 0.000 description 1
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Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
a、 産業上の利用分野
本発明は、平版印刷版用感光層に関し、さらに詳しくは
経時安定性と焼き出し性が改良された平版印刷版用感光
層に関する。DETAILED DESCRIPTION OF THE INVENTION a. Field of Industrial Application The present invention relates to a photosensitive layer for lithographic printing plates, and more particularly to a photosensitive layer for lithographic printing plates with improved stability over time and printout properties.
b、 従来の技術
水酸基およびカルボン酸基を有するアクリル共重合体と
感光性ジアゾ樹脂とを主成分とする感光性組成物を、親
水化処理したアルミニウム支持体上に塗布したネガ型感
光性平版印刷版は、従来よく知られている。この印刷版
は、像を露光することにより露光部を硬化させて現像液
に不溶化し、未露光部を現像液で溶解除去することによ
り親水性の支持体表面上に親油性画像部を形成するもの
であり、水およびインキを用いた平版印刷に供されてい
る。b. Prior art Negative photosensitive lithographic printing in which a photosensitive composition whose main components are an acrylic copolymer having hydroxyl groups and carboxylic acid groups and a photosensitive diazo resin is coated on an aluminum support treated to make it hydrophilic. The edition is well known in the art. In this printing plate, by exposing the image to light, the exposed areas are cured and made insoluble in a developer, and the unexposed areas are dissolved and removed by the developer to form a lipophilic image area on the surface of the hydrophilic support. It is used for lithographic printing using water and ink.
このような平版印刷版において用いられている感光性ジ
アゾ樹脂は、はとんどの場合、芳香族ジアゾニウム化合
物とカルボニル含有有機化合物との縮合物の有機酸塩(
主として芳香族スルホン酸塩)である。The photosensitive diazo resin used in such lithographic printing plates is, in most cases, an organic acid salt of a condensate of an aromatic diazonium compound and a carbonyl-containing organic compound (
mainly aromatic sulfonates).
そして、このようなジアゾ樹脂を含有する感光層中に塩
形成能を有する染料を混合させることによって、露光後
直ちに画像が判別できる焼き出し性が付与されている。By mixing a dye having a salt-forming ability into the photosensitive layer containing such a diazo resin, print-out properties are imparted that allow images to be recognized immediately after exposure.
C1発明が解決しようとする課題
しかしながら、上記の如きジアゾ樹脂を用いた場合は焼
き出し性が劣る。このため、特公昭39−17602号
や特開昭54−98613号では、ジアゾ樹脂の有機酸
塩に代えてジアゾ樹脂のハロゲン化ルイス酸塩(例えば
、4−ジアゾジフェニルアミンとホルムアルデヒドの縮
合物のヘキサフルオルリン酸塩)を用いることによって
、焼き出し性の改善が図られてる。C1 Problems to be Solved by the Invention However, when the above-mentioned diazo resin is used, the print-out properties are poor. For this reason, in Japanese Patent Publication No. 39-17602 and Japanese Patent Application Laid-open No. 54-98613, halogenated Lewis acid salts of diazo resins (for example, hexate of a condensate of 4-diazodiphenylamine and formaldehyde) are used instead of organic acid salts of diazo resins. By using fluorophosphate, the bake-out property is improved.
ところが、ジアゾ樹脂のハロゲン化ルイス酸塩を用いた
場合、これと水酸基およびカルボン酸基を有するアクリ
ル共重合体からなる感光層を存する感光性平版印刷版は
、経時安定性が劣っている。However, when a halogenated Lewis acid salt of a diazo resin is used, a photosensitive lithographic printing plate having a photosensitive layer made of this and an acrylic copolymer having a hydroxyl group and a carboxylic acid group has poor stability over time.
すなわち、経時によって現像不良が発生し、印刷時に非
画像部が汚れやすくなるという欠点がある。That is, there are disadvantages in that developing defects occur over time and non-image areas are likely to become stained during printing.
この欠点を解消するために、ジアゾ樹脂のハロゲン化ル
イス酸塩に代わる光酸発生化合物が提案されており、例
えば特開昭59−148784号および特開昭63−2
61352号には、オキサジアゾール化合物、トリハロ
メチル化合物が開示されているが、焼き出し性において
、著しい向上は見られなかった。In order to overcome this drawback, photoacid generating compounds have been proposed to replace the halogenated Lewis acid salts of diazo resins, such as JP-A Nos. 59-148784 and 63-2.
No. 61352 discloses an oxadiazole compound and a trihalomethyl compound, but no significant improvement was observed in printout properties.
そこで本発明者は、このような欠点を改良すべく鋭意研
究した結果、感光性ジアゾ樹脂としてジアゾ樹脂のハロ
ゲン化ルイス酸塩などの光酸発生化合物を用いるのでは
なく、ジアゾ樹脂の有機酸塩を含有する感光層に、特定
の光酸発生化合物を混合することにより、優れた焼き出
し性および経時安定性を有する感光層が得られることを
見いだし、本発明に到ったものである。Therefore, as a result of intensive research to improve these drawbacks, the inventors of the present invention discovered that, instead of using a photoacid-generating compound such as a halogenated Lewis acid salt of a diazo resin as a photosensitive diazo resin, an organic acid salt of a diazo resin was used. The inventors have discovered that a photosensitive layer having excellent print-out properties and stability over time can be obtained by mixing a specific photoacid-generating compound into a photosensitive layer containing .
d、 課題を解決するための手段
すなわち本発明は、水酸基およびカルボン酸基を有する
アクリル共重合体、ジアゾ樹脂の有機酸塩および染料を
含有する平版印刷版用感光層中に、下記−船蔵(I)で
表わされる光酸発生化合物を0.3〜10重量%混合さ
せたことを特徴とする平版印刷版用感光層を提供するも
のである。d. Means for solving the problem, that is, the present invention, provides the following method in a photosensitive layer for a lithographic printing plate containing an acrylic copolymer having a hydroxyl group and a carboxylic acid group, an organic acid salt of a diazo resin, and a dye. The present invention provides a photosensitive layer for a lithographic printing plate, characterized in that the photoacid generating compound represented by (I) is mixed in an amount of 0.3 to 10% by weight.
−船蔵:
(式中、Rは置換もしくは未置換のアルキル基、アリー
ル基または異節環状化合物残基を表わし、X、、X、お
よびx3はそれぞれハロゲン原子を表わす、)
上記水酸基およびカルボン酸基を有するアクリル共重合
体は、水酸基を有する付加重合性不飽和化合物と、カル
ボン酸基を有する付加重合性不飽和化合物を共重合させ
ることにより作製できる。- Shipura: (In the formula, R represents a substituted or unsubstituted alkyl group, aryl group, or heterocyclic compound residue, and X, , X, and x3 each represent a halogen atom) The above hydroxyl group and carboxylic acid The acrylic copolymer having a group can be produced by copolymerizing an addition polymerizable unsaturated compound having a hydroxyl group and an addition polymerizable unsaturated compound having a carboxylic acid group.
水酸基を有する付加重合性化合物としては、例えば次の
ものが挙げられる。Examples of the addition polymerizable compound having a hydroxyl group include the following.
(1) 水酸基を有するアクリレートおよびメタクリ
レート、
例えば2−ヒドロキシエチルアクリレート、2−ヒドロ
キシプロピルアクリレート、およびヒドロキシドデシル
、エチレングリコール、ジエチレングリコール、プロピ
レングリコール、ブチレングリコール、ジプロピレング
リコール、ポリエチレングリコール、ポリプロピレング
リコール、トリメチロールプロパンペンタエリスリトー
ル、2−ヒドロキシ−3−フェノキシプロピル、2−ヒ
ドロキシ−3=メチルフエノキシプロビルなどのアクリ
レートまたはメタクリレート類。(1) Acrylates and methacrylates having hydroxyl groups, such as 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, and hydroxydodecyl, ethylene glycol, diethylene glycol, propylene glycol, butylene glycol, dipropylene glycol, polyethylene glycol, polypropylene glycol, trimethylol Acrylates or methacrylates such as propanepentaerythritol, 2-hydroxy-3-phenoxypropyl, 2-hydroxy-3-methylphenoxyprovil.
(2) 水酸基を有するオリゴエステルのアクリレー
トおよびメタクリレート、
例えばコハク酸とプロピレングリコールとのポリエステ
ルジオール、マレイン酸とプロピレングリコールとのポ
リエステルジオール、フタル酸とプロピレングリコール
とのポリエステルジオール、ヘキサヒドロフタル酸とプ
ロピレングリコールとのポリエステルジオール、テトラ
ヒドロフタル酸とプロピレングリコールとのポリエステ
ルジオール、テトラヒドロフタル酸とプロピレングリコ
ールおよびグリセリン−1−ブチルエーテルとのポリエ
ステルジオールなどのアクリレートおよびメタクリレー
ト類。(2) Acrylates and methacrylates of oligoesters having hydroxyl groups, such as polyester diols of succinic acid and propylene glycol, polyester diols of maleic acid and propylene glycol, polyester diols of phthalic acid and propylene glycol, hexahydrophthalic acid and propylene Acrylates and methacrylates such as polyester diols with glycols, polyester diols with tetrahydrophthalic acid and propylene glycol, polyester diols with tetrahydrophthalic acid and propylene glycol and glycerin-1-butyl ether.
(3) 水酸基を有するアクリルアミドおよびメタク
リルアミドあるいはその誘導体、
例えばヒドロキシエチル、ヒドロキシフェニル、ヒドロ
キシナフチル、N−ヒドロキシエチル−N−メチルなど
のアクリルアミドまたはメタクリルアミド類。(3) Acrylamide and methacrylamide having a hydroxyl group or derivatives thereof, such as acrylamide or methacrylamide such as hydroxyethyl, hydroxyphenyl, hydroxynaphthyl, N-hydroxyethyl-N-methyl.
また、カルボン酸基を有する付加重合性不飽和化合物と
しては、例えばアクリル酸、メタクリル酸、モノ(2−
メタクリロキシエチル)へキサヒドロフタレート、モノ
(2−アクリロキシエチル)へキサヒドロフタレートな
どを挙げることができる。Examples of addition-polymerizable unsaturated compounds having a carboxylic acid group include acrylic acid, methacrylic acid, mono(2-
Examples include methacryloxyethyl) hexahydrophthalate and mono(2-acryloxyethyl)hexahydrophthalate.
上記アクリル共重合体には、さらに他の付加重合性不飽
和化合物を共重合させることもできる。The above acrylic copolymer can also be copolymerized with other addition polymerizable unsaturated compounds.
他の付加重合性不飽和化合物としては、−船釣な不飽和
化合物を任意に用いることができる。As other addition-polymerizable unsaturated compounds, any unsaturated compounds can be used.
例えば、メチル、エチル、n−プロピル、イソプロピル
、n−ブチル、ターシャルブチル、nアミル、n−ヘキ
シル、2−エチルヘキシル、オクチル、ラウリル、ドデ
シル、シクロヘキシル、テトラヒドロフリル、ベンジル
、ステアリル、ジメチルアミノエチル、ジエチルアミノ
エチル、クロルエチル、アリール(例えばフェニル、ト
リル、ナフチルなど)、グリシジル類のアクリル酸エス
テルまたはメタクリル酸エステル類、あるいはアクリル
ニトリル、メタクリルニトリルなどのニトリル類が挙げ
られる。For example, methyl, ethyl, n-propyl, isopropyl, n-butyl, tert-butyl, n-amyl, n-hexyl, 2-ethylhexyl, octyl, lauryl, dodecyl, cyclohexyl, tetrahydrofuryl, benzyl, stearyl, dimethylaminoethyl, Examples include diethylaminoethyl, chloroethyl, aryl (eg, phenyl, tolyl, naphthyl, etc.), acrylic esters or methacrylic esters of glycidyl, or nitriles such as acrylonitrile and methacrylnitrile.
上記アクリル共重合体において、水酸基を有する付加重
合性不飽和化合物の含有量は、該アクリル共重合体全量
に対して10〜70重量%が好ましく、より好ましくは
20〜60重量%である。10重量%以下ではアルミニ
ウム支持体との接着性が悪くなり、70重量%以上では
現像時における画像部の膨潤が起こりやすい。In the above acrylic copolymer, the content of the addition polymerizable unsaturated compound having a hydroxyl group is preferably 10 to 70% by weight, more preferably 20 to 60% by weight, based on the total amount of the acrylic copolymer. If it is less than 10% by weight, the adhesion to the aluminum support will be poor, and if it is more than 70% by weight, swelling of the image area during development is likely to occur.
また、カルボン酸基を有する付加重合性不飽和化合物の
含有量は、該アクリル共重合体全量に対して2.0〜4
0重量%が好ましく、より好ましくは3.0〜30重量
%である。2.0重量%以下では現像液であるアルカリ
性水溶液に溶解しずらく、現像性が悪い、また40重量
%以上では反応条件によりゲル化する。In addition, the content of the addition polymerizable unsaturated compound having a carboxylic acid group is 2.0 to 4% based on the total amount of the acrylic copolymer.
It is preferably 0% by weight, more preferably 3.0 to 30% by weight. If it is less than 2.0% by weight, it will be difficult to dissolve in an alkaline aqueous developer solution, resulting in poor developability, and if it is more than 40% by weight, it will gel depending on the reaction conditions.
上記ジアゾ樹脂の有機酸塩としては、特公昭40−86
11号、米国特許2922715号、米国特許2946
683号などに記載されたジアゾジアリールアミンとホ
ルムアルデヒド、アセトアルデヒドなどの活性カルボニ
ル化合物との縮合物の有機酸塩を用いることができる。As the organic acid salt of the above-mentioned diazo resin, Japanese Patent Publication No. 40-86
No. 11, U.S. Patent No. 2922715, U.S. Patent No. 2946
Organic acid salts of condensates of diazodiarylamines and active carbonyl compounds such as formaldehyde and acetaldehyde, as described in No. 683, can be used.
上記ジアゾアリールアミンとしては、例えば4ジアゾジ
フエニルアミン、4−ジアゾ−3−メチルジフェニルア
ミン、4−ジアゾ−3′−メチルジフェニルアミン、4
−ジアゾ−4′−メトキシジフェニルアミン、4−ジア
ゾ−3−メトキシジフェニルアミンなどを挙げることが
できる。Examples of the diazoarylamine include 4-diazodiphenylamine, 4-diazo-3-methyldiphenylamine, 4-diazo-3'-methyldiphenylamine, 4-diazo-3'-methyldiphenylamine,
Examples include -diazo-4'-methoxydiphenylamine and 4-diazo-3-methoxydiphenylamine.
上記縮合物と反応させて有機酸塩を形成する化合物の例
としては、特公昭40−2203号、特公昭41−68
13号、特公昭47−1167号などに記載の化合物が
挙げられる。Examples of compounds that form organic acid salts by reacting with the above condensates include Japanese Patent Publication No. 40-2203, Japanese Patent Publication No. 41-68
13, Japanese Patent Publication No. 47-1167, and the like.
具体的には、ベンゼンスルホン酸、p−1ルエンスルホ
ン酸、2,5−キシレンスルホン酸、直鎖あるいは側鎖
型ドデシルベンゼンスルホン酸(通称ドデシルベンゼン
スルホン#)、2−メトキシ−4−ヒドロキシ−5−ベ
ンゾイルベンゼンスルホン酸、メタニルエロー 2−ク
ロルトルエン4−スルホン酸、およびこれらのアルカリ
金属塩、アルカリ土類金属塩、アンモニウム塩などを挙
げることができる。Specifically, benzenesulfonic acid, p-1 luenesulfonic acid, 2,5-xylenesulfonic acid, linear or side chain dodecylbenzenesulfonic acid (commonly known as dodecylbenzenesulfone #), 2-methoxy-4-hydroxy- Examples include 5-benzoylbenzenesulfonic acid, methanyl yellow 2-chlorotoluene 4-sulfonic acid, and alkali metal salts, alkaline earth metal salts, and ammonium salts thereof.
上記ジアゾ樹脂の有IsI酸塩は感光層の全重量に対し
て好ましくは5〜30重量%含有される。The IsI salt of the diazo resin is preferably contained in an amount of 5 to 30% by weight based on the total weight of the photosensitive layer.
本発明において用いる染料は、露光によって発生する酸
によって無色から有色に発色するもの、逆に有色から無
色に消色するもの、あるいは色相を変えるものである。The dye used in the present invention is one that develops color from colorless to colored by the acid generated by exposure to light, one that fades from color to colorless, or one that changes hue.
このような染料の具体例として、ビクトリアピュアーブ
ルー〇〇FI (保土谷化学社製)、オイルブルー16
03 (オリエント化学工業社製)、パテントピュアー
ブルー(住友三国化学工業社製)、クリスタルバイオレ
ット、ブリリアントグリーン、エチルバイオレフト、メ
チルバイオレット、メチルグリーン、エリスロシンB、
ペイシックツクシン、マラカイトグリーン、オイルレッ
ド、m−クレゾールパープル、ローダミンB、オーラミ
ン、4p−ジエチルアミ、lフェニルイミノナフトキノ
ン、シアノ−p−ジエチルアミノフェニルアセトアニリ
ドなどに代表されるトリフェニルメタン系、ジフェニル
メタン系、オキサジン系、キサンチン系、イミノナフト
キノン系、アゾメチン系またはアントラキノン系などの
染料を挙げることができる。Specific examples of such dyes include Victoria Pure Blue〇〇FI (manufactured by Hodogaya Chemical Co., Ltd.) and Oil Blue 16.
03 (manufactured by Orient Chemical Industries, Ltd.), Patent Pure Blue (manufactured by Sumitomo Mikuni Chemical Industries, Ltd.), Crystal Violet, Brilliant Green, Ethyl Bioleft, Methyl Violet, Methyl Green, Erythrosin B,
Triphenylmethane-based, diphenylmethane-based, represented by Pesic Tsuksin, malachite green, oil red, m-cresol purple, rhodamine B, auramine, 4p-diethylamide, l-phenyliminonaphthoquinone, cyano-p-diethylaminophenylacetanilide, etc. Examples include oxazine-based, xanthine-based, iminonaphthoquinone-based, azomethine-based, and anthraquinone-based dyes.
本発明の感光層中には、前記一般式(I)で表わされる
光酸発住化合物が混合される。In the photosensitive layer of the present invention, a photoacid-generating compound represented by the general formula (I) is mixed.
この光酸発生化合物としては、例えばトリクロロメチル
−フェニルスルホン、トリブロモメチル−フェニルスル
ホン、トリクロロメチル−p−クロロフェニルスルホン
、トリブロモメチル−p −ニトロフェニルスルホン、
トリクロロメチル−p−二トロフェニルスルホン、トリ
クロロメチル=2.4−ジクロロフェニルスルホン、ト
リブロモメチル−2,4−ジクロロフェニルスルホン、
2−トリクロロメチルベンゾチアゾールスルホン、46
−シメチルピリジンー2−トリブロモメチルスルホン、
4.6−シメチルー3−シアノピリジン−2−トリブロ
モメチルスルホンなどを挙げることができる。Examples of the photoacid generating compound include trichloromethyl-phenylsulfone, tribromomethyl-phenylsulfone, trichloromethyl-p-chlorophenylsulfone, tribromomethyl-p-nitrophenylsulfone,
Trichloromethyl-p-nitrophenylsulfone, trichloromethyl-2,4-dichlorophenylsulfone, tribromomethyl-2,4-dichlorophenylsulfone,
2-Trichloromethylbenzothiazole sulfone, 46
-dimethylpyridine-2-tribromomethylsulfone,
Examples include 4,6-dimethyl-3-cyanopyridine-2-tribromomethylsulfone.
上記光酸発住化合物は、本発明の平版印刷版用感光層の
総重量に対して0.3〜10重量%の範囲で混合される
。0.3重置%以下では、優れた焼き出し効果が得られ
ない。一方、10重量%以上では、優れた焼き出し効果
を示すが、耐剛力が悪化する。The above-mentioned photoacid-generating compound is mixed in an amount of 0.3 to 10% by weight based on the total weight of the photosensitive layer for a lithographic printing plate of the present invention. If the overlaying amount is less than 0.3%, an excellent printout effect cannot be obtained. On the other hand, if it is 10% by weight or more, an excellent bakeout effect is exhibited, but stiffness resistance is deteriorated.
本発明の感光層には他の親油性高分子重合体あるいは共
重合体を加えることもできる。Other lipophilic polymers or copolymers can also be added to the photosensitive layer of the present invention.
その例としては、フェノール樹脂、置換フェノール樹脂
、ポリヒドロキシスチレン、ハロゲン化ポリヒドロキン
スチレン、ヒドロキシスチレンとアクリル化合物との共
重合体、スチレン−無水マレイン酸共重合体、アクリル
樹脂、変性アクリル共重合体などを挙げることができる
。Examples include phenolic resins, substituted phenolic resins, polyhydroxystyrenes, halogenated polyhydroquinestyrenes, copolymers of hydroxystyrene and acrylic compounds, styrene-maleic anhydride copolymers, acrylic resins, modified acrylic copolymers. Examples include merging.
また、本発明の感光層中には、保存剤を加えることもで
きる。Furthermore, a preservative may be added to the photosensitive layer of the present invention.
保存剤としては、例えばクエン酸、酒石酸、乳酸、5−
スルホサリチル酸、シュウ酸、DL−リンゴ酸、2−メ
トキシ−4−ヒドロキシ−5−ベンゾイル−ベンゼンス
ルホン酸などが挙げられる。Examples of preservatives include citric acid, tartaric acid, lactic acid, 5-
Examples include sulfosalicylic acid, oxalic acid, DL-malic acid, and 2-methoxy-4-hydroxy-5-benzoyl-benzenesulfonic acid.
これら保存剤の含有量は、感光層中の全重量に対して好
ましくは約0.1〜4.0重量%であり、より好ましく
は0.5〜3.0重量%である。The content of these preservatives is preferably about 0.1 to 4.0% by weight, more preferably 0.5 to 3.0% by weight, based on the total weight of the photosensitive layer.
さらに、感光層の着肉性を向上させるために、あるいは
均一な塗布面を得るために、可塑剤や界面活性剤を加え
ることもできる。Furthermore, in order to improve the adhesion of the photosensitive layer or to obtain a uniform coating surface, a plasticizer or a surfactant may be added.
可塑剤としては、例えばジメチルフタレート、ジエチル
フタレート、ジブチルフタレート、ジエチルフタレート
、ジー2−エチルへキシルフタレート、ジ−n−オクチ
ルフタレート、ジイソデシルフタレート、ブチルベンジ
ルフタレート、ジイソノニルフタレート、エチルフタリ
ルエチルグリコール、ジメチルイソフタレートなどを挙
げることができる。Examples of the plasticizer include dimethyl phthalate, diethyl phthalate, dibutyl phthalate, diethyl phthalate, di-2-ethylhexyl phthalate, di-n-octyl phthalate, diisodecyl phthalate, butylbenzyl phthalate, diisononyl phthalate, ethyl phthalylethyl glycol, dimethyl Examples include isophthalate.
上記可塑剤の含有量は、感光層の全重量に対して、約0
.5〜3.0重量%であり、より好ましくは0.6〜2
.0重量%の範囲である。The content of the plasticizer is approximately 0 based on the total weight of the photosensitive layer.
.. 5 to 3.0% by weight, more preferably 0.6 to 2% by weight
.. It is in the range of 0% by weight.
界面活性剤としては、ソルビタンモノオレエイト、ソル
ビタンステアリレイト、ソルビタンモノステアレイト、
ソルビタンセキスオレイト、ソルビタンモノラウレイト
、ポリオキンエチレンノニリフェニルエーテル、ポリオ
キシエチレンオクチルフェニルエーテルなどを挙げるこ
とができる。As surfactants, sorbitan monooleate, sorbitan stearate, sorbitan monostearate,
Examples include sorbitan sekisuoleate, sorbitan monolaurate, polyoxyethylene nonylphenyl ether, and polyoxyethylene octylphenyl ether.
上記界面活性剤の含有量は、感光層中の全重量に対して
、約0.4〜2.0重量%であり、より好ましくは0.
6〜1,6重量%である。The content of the surfactant is about 0.4 to 2.0% by weight, more preferably 0.4 to 2.0% by weight, based on the total weight of the photosensitive layer.
It is 6-1.6% by weight.
本発明の感光層を支持体上に形成させる場合、アクリル
共重合体、ジアゾ樹脂の有機酸塩、染料、光酸発生化合
物、および必要に応して添加する保存剤、可塑剤、界面
活性剤などを、有機溶削、例えばメタノール、メチレン
クロライド、酢酸エチル、テトラヒドロフラン、N−N
−ジメチルホルムアミド、エチレングリコールモノメチ
ルエーテル、エチレングリコールモノエチルエーテル、
プロピレングリコールモノメチルエーテルなどの1種あ
るいは2種以上の混合溶削に溶解させ、各種塗布機(例
えばホヮイラー ロールコータ−、バ−コーター、押し
出し型コーターなど〕を用いマ支持体上に塗布し、乾燥
させる。When the photosensitive layer of the present invention is formed on a support, an acrylic copolymer, an organic acid salt of a diazo resin, a dye, a photoacid generating compound, and a preservative, a plasticizer, and a surfactant added as necessary. etc., by organic cutting, such as methanol, methylene chloride, ethyl acetate, tetrahydrofuran, N-N
-dimethylformamide, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether,
It is dissolved in one or more mixed solvents such as propylene glycol monomethyl ether, coated on a matrix support using various coating machines (e.g., Wheeler roll coater, bar coater, extrusion type coater, etc.), and dried. let
本発明の感光層を塗布する支持体としては、艇プラスチ
ックフィルム、あるいは銅、亜鉛、アルミニウム、ステ
ンレスなどの金属板、さらにこtらを2種以上組み合わ
せた複合材料を用いるこ2ができ、これらの中で、特に
ブラシまたはボール研磨したアルミニウム板、ブラシ研
磨したのち開極酸化処理を旋したアルミニウム板、電解
研磨したのち陽極酸化を旋したアルミニウム板、あるい
はこれらを組み合わせた処理を旋したアルミニウム板が
好ましい。The support to which the photosensitive layer of the present invention is coated can be a plastic film, a metal plate made of copper, zinc, aluminum, stainless steel, etc., or a composite material combining two or more of these. In particular, aluminum plates that have been brushed or ball polished, aluminum plates that have been brush polished and then subjected to open oxidation treatment, aluminum plates that have been electrolytically polished and then anodized, or aluminum plates that have been treated with a combination of these. is preferred.
このような前処理を施したアルミニウム板に、さらにケ
イ酸アルカリ、フン化ジルコニウム、アルキルチタネー
ト、トリヒドロキシ安息香酸などによる化成処理や、ベ
ーマイト処理あるいは酢酸ストロンチウム、酢酸亜鉛、
酢酸マグネシウム、安息香酸カルシウムなどの水溶液に
よる被覆処理ポリビニルピロリドン、ポリアミンスルボ
ン酸、ポリアクリル酸、ポリメタクリル酸、ポリ−2ヒ
ドロキシエチルアクリレートなどによる被覆処理を後処
理として行なうこともできる。The pretreated aluminum plate is further subjected to chemical conversion treatment with alkali silicate, zirconium fluoride, alkyl titanate, trihydroxybenzoic acid, boehmite treatment, strontium acetate, zinc acetate, etc.
Coating treatment with an aqueous solution of magnesium acetate, calcium benzoate, etc. Coating treatment with polyvinylpyrrolidone, polyamine sulfonic acid, polyacrylic acid, polymethacrylic acid, poly-2-hydroxyethyl acrylate, etc. can also be carried out as a post-treatment.
支持体上に塗布された本発明の感光層は、紫外線などの
活性光線で露光し、現像液としてアルカリ性水溶液を用
いて現像することにより、画像を得ることができる。An image can be obtained by exposing the photosensitive layer of the present invention coated on a support to actinic rays such as ultraviolet rays and developing it using an alkaline aqueous solution as a developer.
現像液として使用するアルカリ性水fJ液としては、例
えば
(1) 水酸化ナトリウム、水酸化カリウム;(2)
弱酸の金属塩、例えばケイ酸、メタケイ酸、オルト
ケイ酸、リン酸、ビロリン酸、メタリン酸、ヘキサメタ
リン酸、炭酸、酒石酸、ホウ酸などのナトリウム塩、リ
チウム塩、カリウム塩などの金属塩;
(3) アンモニアおよびその誘導体、例えばアルキ
ルアミン類(例えばモノメチル、ジメチル、トリメチル
、モノエチル、ジエチル、トリエチルなどのアミン化合
物)、またはアルカノールアミン類(例えばモノエタノ
ールアミン、ジェタノールアミン、トリエタノールアミ
ン、ジイソプロパツールアミン)などのアルカリ性化合
物の水溶液;
を挙げることができる。Examples of the alkaline aqueous fJ solution used as a developer include (1) sodium hydroxide, potassium hydroxide; (2)
Metal salts of weak acids, such as sodium salts, lithium salts, potassium salts, etc. of silicic acid, metasilicic acid, orthosilicic acid, phosphoric acid, birophosphoric acid, metaphosphoric acid, hexametaphosphoric acid, carbonic acid, tartaric acid, boric acid; (3 ) Ammonia and its derivatives, such as alkylamines (e.g. amine compounds such as monomethyl, dimethyl, trimethyl, monoethyl, diethyl, triethyl, etc.) or alkanolamines (e.g. monoethanolamine, jetanolamine, triethanolamine, diisopropylamine) Aqueous solutions of alkaline compounds such as amines);
上記のアルカリ性水溶液中に活性剤および/または溶剤
を添加することができる。活性剤としては、陰イオン界
面活性剤、あるいは両性界面活性剤が使用できる。An activator and/or a solvent can be added to the above alkaline aqueous solution. As the active agent, an anionic surfactant or an amphoteric surfactant can be used.
陰イオン界面活性剤としては、例えば炭素数が8〜22
のアルコールの硫酸エステル類(例えばポリオキシエチ
レンアルキルサルフェートソーダ塩)アルキルアリール
スルホン酸塩類(例えばドデシルベンゼンスルホン酸ソ
ーダ、ポリオキシエチレンドデシルフェニルサルフェー
トソーダ類、アルキルナフタレンスルホン酸ソーダ、ナ
フタレンスルホン酸ソーダ、ナフタレンスルホン酸ソー
ダのホルマリン縮合?l)、ソジウムジアルキルスルホ
サクソネート、脂肪酸アミドスルホネート、アルキルリ
ン酸エステル、アルキルエーテルリン酸エステルなどを
用いることができる。Examples of anionic surfactants include those having 8 to 22 carbon atoms.
Sulfuric esters of alcohols (e.g. polyoxyethylene alkyl sulfate soda salt), alkylaryl sulfonates (e.g. sodium dodecylbenzenesulfonate, polyoxyethylene dodecylphenyl sulfate soda, alkylnaphthalene sodium sulfonate, naphthalene sodium sulfonate, naphthalene) Formalin condensation of sodium sulfonate (1), sodium dialkyl sulfosaxonate, fatty acid amide sulfonate, alkyl phosphate, alkyl ether phosphate, etc. can be used.
また両性界面活性剤としては、例えばアルキルベタイン
型、アルキルイミダシリン型活性剤を用いることができ
る。Further, as the amphoteric surfactant, for example, an alkyl betaine type surfactant or an alkylimidacillin type surfactant can be used.
溶剤としては、アルコール類、エーテル類が好ましいが
、水中(20℃)に10%以上溶解しない溶剤が最も好
ましい。この種の溶剤としては、例えばアルコール類と
してベンジルアルコール、nc−α−フェニルエチルア
ルコール、2−フェニルエチルアルコールなどがあり、
エーテル類としてはフェニルグリコール、プロピレング
リコールモノブチルエーテルなどを挙げることができる
。As the solvent, alcohols and ethers are preferable, but a solvent that does not dissolve 10% or more in water (20° C.) is most preferable. Examples of this type of solvent include alcohols such as benzyl alcohol, nc-α-phenylethyl alcohol, and 2-phenylethyl alcohol.
Examples of ethers include phenyl glycol and propylene glycol monobutyl ether.
現像液の組成としては、上記アルカリ性化合物0.5〜
10重量%、界面活性剤0〜10重量%、および溶剤0
〜10重量%を含むものが好ましい。The composition of the developer is 0.5 to 0.5% of the above alkaline compound.
10 wt%, surfactant 0-10 wt%, and solvent 0
Preferably, it contains up to 10% by weight.
なお、本発明の感光層は、微細加工用レジスト用あるい
は他の画像形成用感光層としても使用することができる
。The photosensitive layer of the present invention can also be used as a resist for fine processing or as a photosensitive layer for forming other images.
00作用
本発明の平版印刷版用感光層は、未露光部と露光部の色
相の変化が著しい、そのため、画像の認識が容易となり
、また、経時による感光層の劣化も従来のものより少な
い。00 Effect The photosensitive layer for a lithographic printing plate of the present invention has a remarkable change in hue between the unexposed area and the exposed area, making it easier to recognize the image, and deterioration of the photosensitive layer over time is less than that of conventional ones.
f、 実施例
以下に、本発明を実施例によりさらに詳しく説明するが
、本発明はこれに限定されるものではない。f. Examples The present invention will be explained in more detail by Examples below, but the present invention is not limited thereto.
実施例1〜3.比較例1
厚さ0.24m、幅1000■のウェブ状アルミニウム
板(材質1050)をアルカリ脱脂したのち、バーミス
トンの水懸濁液をかけながらナイロンブラシで表面を研
磨し、その後よく水洗した。Examples 1-3. Comparative Example 1 A web-shaped aluminum plate (Material 1050) with a thickness of 0.24 m and a width of 1000 mm was degreased with alkali, and then the surface was polished with a nylon brush while applying a water suspension of vermiston, and then thoroughly washed with water.
次いで70℃、20%のカセイソーダ液を5秒間かけ流
し、表面を3g/イエッチングしたのち、流水で水洗し
、塩酸(35g/ l )、ホウ酸(20g/ l )
およびアルミニウムイオン(20g/ 1 )からなる
電解液中25℃で25A/d++”の電流密度で6秒間
電解研磨し、水洗した。Next, a 20% caustic soda solution was poured over the surface for 5 seconds at 70°C to etch 3 g/yet on the surface, and then washed with running water and treated with hydrochloric acid (35 g/l) and boric acid (20 g/l).
and aluminum ions (20 g/1) at 25° C. for 6 seconds at a current density of 25 A/d++”, followed by washing with water.
次いで70℃、20%のカセイソーダ液をかけ流して表
面をエツチングし、さらに水洗を行ない、次いで30℃
の10%硫酸水溶液中で陽極酸化処理を行なって、2.
0g/s’の酸化被膜を形成させた。Next, the surface was etched by pouring a 20% caustic soda solution at 70°C, further washed with water, and then heated at 30°C.
2. Perform anodizing treatment in a 10% sulfuric acid aqueous solution.
An oxide film of 0 g/s' was formed.
次に、水洗したのち、JTSa号珪酸ナトリウム5%を
含む水溶液で、70℃、10秒間浸漬処理し、水洗乾燥
した。このようにして得られたアルミニウム板に下記組
成からなる感光液を乾燥塗布重量が1.8g/m” と
なるように塗布し、100℃で1分間乾燥させて、感光
性平版印刷版を得た。Next, after washing with water, it was immersed in an aqueous solution containing 5% sodium silicate No. JTSa at 70°C for 10 seconds, and then washed with water and dried. A photosensitive solution having the composition shown below was applied to the aluminum plate thus obtained so that the dry coating weight was 1.8 g/m'', and it was dried at 100°C for 1 minute to obtain a photosensitive lithographic printing plate. Ta.
記
5JL遭二り2二と
アクリル共重合体(1)
ジアゾ系感光側(1)(4−ジアゾジフェニルアミンと
ホル
ムアルデヒドの縮
金物の2−メトキ
シ−4−ヒドロキ
シ−5−ベンゾイ
ルベンゼンスルホ
ン酸塩)
一般式(1)で表わされる化合物
ビクトリアピュアーブルー80H(保土谷化学工業■製
)
3.0g
0.3g
χ g
0.1g
酒石酸 0.03gプロピ
レングリコールモノメチルエー
テル 45gエチレン
グリコールモノメチルエーテ
ル
45gN−N−ジメチルホルムアミド
10g上記アクリル共重合体(1)は、次ぎのように
して製造した。5 JL Enjiri 22 and acrylic copolymer (1) Diazo-based photosensitive side (1) (2-methoxy-4-hydroxy-5-benzoylbenzene sulfonate of a condensate of 4-diazodiphenylamine and formaldehyde) General Compound represented by formula (1) Victoria Pure Blue 80H (manufactured by Hodogaya Chemical Industry ■) 3.0g 0.3g χ g 0.1g Tartaric acid 0.03g Propylene glycol monomethyl ether 45g Ethylene glycol monomethyl ether
45gN-N-dimethylformamide
10g of the above acrylic copolymer (1) was produced as follows.
窒素気流下で、反応溶媒としてジメチルホルムアミド1
50g中に、アゾビスイソブチロニトリル0.3gを加
えて、80〜85℃に加熱して、撹拌しながら、その中
へ下記組成の混合物を滴下した。Under a nitrogen stream, dimethylformamide 1 was used as the reaction solvent.
0.3 g of azobisisobutyronitrile was added to 50 g, heated to 80 to 85° C., and a mixture having the following composition was dropped therein while stirring.
記
2−ヒドロキシエチルメタクリレート
4−ヒドロキシフェニルメタクリルア
マイド
メチルメタクリート
モノ(2−メタクリロキシエチル)へ
キサヒドロフタレート
0g
0g
5g
5g
アクリルニトリル
0g
滴下終了後、5時間撹拌を続け、ジメチルホルムアミド
150gを加えたのち、水中に投入して共重合体を沈澱
させた。その沈澱物を2−メトキシエタノールに再溶解
したのち、水中に滴下して精製し、真空乾燥(70”C
) してアクリル共重合体(1)を得た。2-Hydroxyethyl methacrylate 4-hydroxyphenyl methacrylamide Methyl methacrylate Mono(2-methacryloxyethyl) hexahydrophthalate 0 g 0 g 5 g 5 g Acrylic nitrile 0 g After the dropwise addition, stirring was continued for 5 hours, and 150 g of dimethylformamide was added. Thereafter, it was poured into water to precipitate the copolymer. The precipitate was redissolved in 2-methoxyethanol, purified by dropping it into water, and vacuum-dried (70"C).
) to obtain an acrylic copolymer (1).
この共重合体の重量平均分子量はゲルバーミネーシぢン
クロマトグラフィー(GPC)にて測定した結果、約1
02.000であった。The weight average molecular weight of this copolymer was measured by gel vermi- nation chromatography (GPC), and was approximately 1.
It was 02.000.
得られた感光性平版印刷版を2KW高圧水銀灯で1−の
距離下で30秒露光し、露光部と未露光部の感光層の表
面反射率を村上色彩技術研究断裂CM−53Pを用いて
測定した。その結果を表−1に示す。The resulting photosensitive lithographic printing plate was exposed to light for 30 seconds at a distance of 1 - with a 2KW high-pressure mercury lamp, and the surface reflectance of the photosensitive layer in the exposed and unexposed areas was measured using Murakami Color Technology Research Fracture CM-53P. did. The results are shown in Table-1.
比較例1には、比較感光液として、−船蔵(1)の化合
物を添加しないものを用いた。In Comparative Example 1, a comparative photosensitive liquid to which the compound (1) of Funagura (1) was not added was used.
表−1に示す結果から明らかなように、感光液中に一般
式(1)で表わされる化合物を添加することにより、反
射率の差ΔRが大きくなり、画像が鮮明になる。As is clear from the results shown in Table 1, by adding the compound represented by the general formula (1) to the photosensitive liquid, the difference ΔR in reflectance increases and the image becomes clearer.
実施例4.比較例2
実施例1〜3で用いたアルミニウム板に次の感光液4ま
たは比較用感光液2を乾燥塗布重量が1.8g/■2に
なるように塗布し、100 ”Cで1分間乾燥させて、
感光性平版印刷版を得た。Example 4. Comparative Example 2 The following photosensitive liquid 4 or comparative photosensitive liquid 2 was applied to the aluminum plate used in Examples 1 to 3 at a dry coating weight of 1.8 g/■2, and dried at 100 ''C for 1 minute. Let me,
A photosensitive lithographic printing plate was obtained.
記
1−【j:(
アクリル共重合体(1) 3.0gジ
アゾ系感光剤(1)(4−ジアゾジフェニルアミンとホ
ル
ムアルデヒドの縮
合物の2−メトキ
シ−4−ヒドロ牛
シー5−ベンゾイ
ルベンゼンスルホ
ン酸塩) 0.3g
トリクロロメチル−フェニルスルホン0.1gビクトリ
アピュアーブルーBol+ (保土谷化学工業■製)
0.1g酒石酸
0.03 gプロピレングリコールモノ
メチルエー
テル 45gエチレン
グリコールモノメチルエーテ
ル
45gN−N−ジメチルホルムアミド
10g上−71ELj:L
アクリル共重合体(113,(1g
ジアゾ系感光1(2)(4−ジアゾジフェニルアミンと
ホル
ムアルデヒドの縮
合物のヘキサフル
オルリン酸塩) 0.3g
ビクトリアビニアープルーBOB (保土谷化学工業■
製) 0.1g酒石M1
0.03gプロピレングリコー
ルモノメチルエー
テル 45gエチレン
グリコールモノメチルエーテ
ル
45gN−N−ジメチルホルムアミド
10g二のようにして得られた感光性平版印刷版を
2に一高圧水銀灯で1−の距離下で30秒露光し、露光
部と未露光部の感光層の表面反射率を実施例1〜3と同
様にして測定した。その結果を表−2に示す。Note 1-[j:( Acrylic copolymer (1) 3.0g Diazo photosensitizer (1) (2-methoxy-4-hydro-5-benzoylbenzenesulfonic acid, a condensate of 4-diazodiphenylamine and formaldehyde) Salt) 0.3g Trichloromethyl-phenylsulfone 0.1g Victoria Pure Blue Bol+ (manufactured by Hodogaya Chemical Industry ■)
0.1g tartaric acid
0.03 g Propylene glycol monomethyl ether 45 g Ethylene glycol monomethyl ether
45gN-N-dimethylformamide
10g Top-71ELj:L Acrylic copolymer (113, (1g Diazo-based photosensitive 1(2) (hexafluorophosphate of condensate of 4-diazodiphenylamine and formaldehyde) 0.3g Victoria vinyl blue BOB (preserved) Tsuchiya Chemical Industry■
(manufactured by) 0.1g tartar stone M1
0.03g Propylene glycol monomethyl ether 45g Ethylene glycol monomethyl ether
45gN-N-dimethylformamide
10g of the photosensitive lithographic printing plate obtained as in Example 1 was exposed to light for 30 seconds using a high-pressure mercury lamp at a distance of 1-1, and the surface reflectance of the photosensitive layer in the exposed and unexposed areas was measured as shown in Example 1- Measurement was carried out in the same manner as in 3. The results are shown in Table-2.
また、これらの感光性平版印刷版を高温、高温中(35
℃、80%)に数日間放置し、上記のように露光し、次
ぎに示す現像液で25℃、30秒間現像し、水洗後、ア
ラビアガム液で不惑脂化してから印刷機にかけ、汚れの
有無を調べた。汚れが発生するまでの放置日数(保存性
)を表−2に示す、この放置日数が多いほど経時安定性
に優れた感光性印刷版といえる。In addition, these photosensitive lithographic printing plates were heated at high temperatures (35
℃, 80%) for several days, exposed as above, developed with the following developer at 25℃ for 30 seconds, washed with water, made fat-free with gum arabic solution, and then applied to a printing machine to remove stains. I checked to see if it existed. The number of days left until staining (preservability) is shown in Table 2. It can be said that the longer the number of days left, the more excellent the photosensitive printing plate is in terms of stability over time.
3U/UL組」良
ケイ酸カリウム20%水溶液 50gフェ
ニルグリコールPCI+ (日本乳化剤■製)40gイ
ソプロピルナフタ
レンジスルホン酸
カリウム
g
亜硫酸カリウム
g
水
03g
表−2に示す結果から明らかなように、実施例4の平版
印刷版用感光層は、感光剤としてジアゾ樹脂のハロゲン
化ルイス酸塩を使用した比較例2の感光層よりも未露光
部と露光部の反射率の差ΔRが大きく、焼き出し画像は
鮮明である。また、経時安定性も優れている。3U/UL group" Good potassium silicate 20% aqueous solution 50g Phenyl glycol PCI+ (manufactured by Nippon Nyukazai ■) 40g Potassium isopropyl naphthalene disulfonate g Potassium sulfite g Water 03g As is clear from the results shown in Table 2, Example 4 The photosensitive layer for a lithographic printing plate had a larger difference ΔR in reflectance between the unexposed area and the exposed area than the photosensitive layer of Comparative Example 2, which used a halogenated Lewis acid salt of a diazo resin as a photosensitizer, and the printed image was clear. It is. It also has excellent stability over time.
f、 発明の効果
本発明によれば、焼き出し画像が鮮明で、しかも経時安
定性に優れた平版印刷版用感光層が得られる。f. Effects of the Invention According to the present invention, a photosensitive layer for a lithographic printing plate with a clear printed image and excellent stability over time can be obtained.
特許出願人 岡本化学工業株式会社 (ばか4名)Patent applicant: Okamoto Chemical Industry Co., Ltd. (4 idiots)
Claims (1)
合体、ジアゾ樹脂の有機酸塩および染料を含有する平版
印刷版用感光層中に、下記一般式( I )で表わされる
光酸発生化合物を0.3〜10重量%混合させたことを
特徴とする平版印刷版用感光層。 一般式: R−SO_2−C▲数式、化学式、表等があります▼(
I ) (式中、Rは置換もしくは未置換のアルキル基、アリー
ル基または異節環状化合物残基 を表わし、X_1、X_2およびX_3はそれぞれハロ
ゲン原子を表わす。)(1) A photoacid-generating compound represented by the following general formula (I) is added to the photosensitive layer for a lithographic printing plate containing an acrylic copolymer having a hydroxyl group and a carboxylic acid group, an organic acid salt of a diazo resin, and a dye. A photosensitive layer for a lithographic printing plate, characterized in that it contains a mixture of 3 to 10% by weight. General formula: R-SO_2-C▲There are mathematical formulas, chemical formulas, tables, etc.▼(
I) (In the formula, R represents a substituted or unsubstituted alkyl group, aryl group or heterocyclic compound residue, and X_1, X_2 and X_3 each represent a halogen atom.)
Priority Applications (1)
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---|---|---|---|
JP27755590A JP2944734B2 (en) | 1990-10-16 | 1990-10-16 | Photosensitive layer for lithographic printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27755590A JP2944734B2 (en) | 1990-10-16 | 1990-10-16 | Photosensitive layer for lithographic printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04152345A true JPH04152345A (en) | 1992-05-26 |
JP2944734B2 JP2944734B2 (en) | 1999-09-06 |
Family
ID=17585162
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JP (1) | JP2944734B2 (en) |
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1990
- 1990-10-16 JP JP27755590A patent/JP2944734B2/en not_active Expired - Fee Related
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