JPH0414217A - Dry thin film processing device - Google Patents

Dry thin film processing device

Info

Publication number
JPH0414217A
JPH0414217A JP11719590A JP11719590A JPH0414217A JP H0414217 A JPH0414217 A JP H0414217A JP 11719590 A JP11719590 A JP 11719590A JP 11719590 A JP11719590 A JP 11719590A JP H0414217 A JPH0414217 A JP H0414217A
Authority
JP
Japan
Prior art keywords
cylindrical body
chamber
gas
body
pieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11719590A
Other versions
JP2650465B2 (en
Inventor
Hiroshi Sagara
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP11719590A priority Critical patent/JP2650465B2/en
Publication of JPH0414217A publication Critical patent/JPH0414217A/en
Application granted granted Critical
Publication of JP2650465B2 publication Critical patent/JP2650465B2/en
Anticipated expiration legal-status Critical
Application status is Expired - Fee Related legal-status Critical

Links

Abstract

PURPOSE: To contrive to make even the density of gas particles on a plasma transport road by a method wherein the route of a plasma flow is surrounded with a coaxial double cylinder- shaped cylindrical body, four pieces or more of gas introducing ports are provided in the inner wall surface of the cylindrical body in a rotationally symmetrical state and four pieces or more and even pieces of vacuum exhaust vents are provided in the inner wall surface of another coaxial double cylinder-shaped cylindrical body arranged coaxially with the above cylindrical body on the side closer to a substrate of this cylindrical body in a rotationally symmetrical state.
CONSTITUTION: A coaxial double cylinder-shaped cylindrical body 24 is arranged between a plasma producing chamber 3 and a substrate 11 in such a way that the axial line of the cylindrical body 24 is made to coincide with the axial line of the chamber 3. The body 24 is connected to a gas line 12 penetrating a treating chamber 9 and four pieces or more of gas introducing ports 24a are formed in the inner wall surface of the body 24 in a rotationally symmetrical state so that reaction gas is turned into a viscous flow in the interior of the body 24 and can be uniformly introduced in the chamber 9 at a low speed in the peripheral direction of the chamber 9. A coaxial double cylinder-shaped cylindrical body 25 is arranged in such a way that the axial line of the cylindrical body 25 is made to coincide with the axial line of the chamber 3. The flow of evacuation of air from a vacuum exhaust vent 25d is prevented from concentrating on a vacuum exhaust vent on the side closer to a vacuum pump 23, bypasses along a rack surface and exhaust gas is made to evenly flow around the substrate.
COPYRIGHT: (C)1992,JPO&Japio
JP11719590A 1990-05-07 1990-05-07 Dry thin film processing equipment Expired - Fee Related JP2650465B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11719590A JP2650465B2 (en) 1990-05-07 1990-05-07 Dry thin film processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11719590A JP2650465B2 (en) 1990-05-07 1990-05-07 Dry thin film processing equipment

Publications (2)

Publication Number Publication Date
JPH0414217A true JPH0414217A (en) 1992-01-20
JP2650465B2 JP2650465B2 (en) 1997-09-03

Family

ID=14705752

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11719590A Expired - Fee Related JP2650465B2 (en) 1990-05-07 1990-05-07 Dry thin film processing equipment

Country Status (1)

Country Link
JP (1) JP2650465B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06275544A (en) * 1993-03-19 1994-09-30 Agency Of Ind Science & Technol Semiconductor working device
JP2006120974A (en) * 2004-10-25 2006-05-11 Sakigake Handotai:Kk Plasma cvd device
JP2009177178A (en) * 1998-04-09 2009-08-06 Foundation For Advancement Of International Science Process system
JP2015122355A (en) * 2013-12-20 2015-07-02 東京エレクトロン株式会社 Substrate processing apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06275544A (en) * 1993-03-19 1994-09-30 Agency Of Ind Science & Technol Semiconductor working device
JP2009177178A (en) * 1998-04-09 2009-08-06 Foundation For Advancement Of International Science Process system
JP2006120974A (en) * 2004-10-25 2006-05-11 Sakigake Handotai:Kk Plasma cvd device
JP2015122355A (en) * 2013-12-20 2015-07-02 東京エレクトロン株式会社 Substrate processing apparatus

Also Published As

Publication number Publication date
JP2650465B2 (en) 1997-09-03

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