JPH0413657U - - Google Patents
Info
- Publication number
- JPH0413657U JPH0413657U JP5228090U JP5228090U JPH0413657U JP H0413657 U JPH0413657 U JP H0413657U JP 5228090 U JP5228090 U JP 5228090U JP 5228090 U JP5228090 U JP 5228090U JP H0413657 U JPH0413657 U JP H0413657U
- Authority
- JP
- Japan
- Prior art keywords
- target
- relatively
- ion beam
- beam sputtering
- consumed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 3
- 230000002093 peripheral effect Effects 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5228090U JPH0413657U (ru) | 1990-05-18 | 1990-05-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5228090U JPH0413657U (ru) | 1990-05-18 | 1990-05-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0413657U true JPH0413657U (ru) | 1992-02-04 |
Family
ID=31572452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5228090U Pending JPH0413657U (ru) | 1990-05-18 | 1990-05-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0413657U (ru) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001295038A (ja) * | 2000-04-11 | 2001-10-26 | Toshiba Corp | モザイク型スパッタリングターゲット |
| EP1332512A2 (en) * | 2000-11-09 | 2003-08-06 | Williams Advanced Materials Inc. | Ion beam deposition targets having an interlocking interface and a replaceable insert |
-
1990
- 1990-05-18 JP JP5228090U patent/JPH0413657U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001295038A (ja) * | 2000-04-11 | 2001-10-26 | Toshiba Corp | モザイク型スパッタリングターゲット |
| EP1332512A2 (en) * | 2000-11-09 | 2003-08-06 | Williams Advanced Materials Inc. | Ion beam deposition targets having an interlocking interface and a replaceable insert |