JPH04133430U - Gas pipe connection equipment for semiconductor manufacturing equipment - Google Patents

Abstract

(57) [Summary] [Purpose] To prevent gas leaks and facilitate position adjustment of gas introduction pipes and exhaust pipes. [Structure] The connection parts 9 and 10 between the reaction tube 1 and the gas introduction pipe 2 and the connection part between the reaction tube 1 and the exhaust pipe are connected with an O-ring 3 interposed therebetween.

Description

[Detailed explanation of the idea]

0001

[Industrial application field]

This invention is an oxidation diffusion device that forms various thin films on semiconductors, which are semiconductor material. Regarding gas pipe connection devices for gas introduction pipes and exhaust pipes used in semiconductor manufacturing equipment such as It is.

0002

[Conventional technology]

In the conventional device, as shown in FIG. It was connected to the exhaust pipe by a tapered sliding fitting 8. In addition, reaction tube 1 and exhaust The connections with the pipes are also configured in exactly the same way.

0003

[Problem that the idea aims to solve]

With such a connection device, gas leakage cannot be completely stopped, and HCl If you use a gas such as, the leaked gas may corrode the external metal. A problem arises. In addition, in the case of a tapered sliding connection, the mutual position of the pipes is uniquely defined. Therefore, it is necessary to adjust the positions of gas inlet pipe 2 and exhaust pipe to match reaction tube 1. be.

0004

[Means to try to solve the problem]

In order to solve the above-mentioned problems, the device of the present invention has a reaction tube inside the reaction tube 1 as shown in Fig. 1. Gas is introduced through the gas introduction pipe 2 and exhausted through the exhaust pipe to oxidize the semiconductor in the reaction tube 1. In a semiconductor manufacturing apparatus that performs film formation processing such as diffusion, the reaction tube 1 and the gas introduction tube 2 The connections 9 and 10 between the reaction tube 1 and the exhaust pipe are connected through O-rings 3 It connects.

[0005]

[Effect]

Since the connecting parts 9 and 10 were connected through the O-ring 3 in this way, gas leakage was avoided. This makes it possible to easily adjust the position of the gas introduction pipe 2 and the exhaust pipe with respect to the reaction tube 1. This means that you can do this.

[0006]

【Example】

FIG. 1 is a sectional view showing the configuration of the main parts of a first embodiment of the device of the present invention. Figure 1 Smell 1 is a quartz reaction tube, and 2 is a gas introduction tube for introducing a reaction gas into the reaction tube 1. anti Connection portions 9 and 10 of the reaction tube 1 and the gas introduction tube 2 are connected by a spherical sliding joint 4. In this first embodiment, the connection part 10 of the gas introduction tube 2 is attached to the concave spherical surface of the connection part 9 of the reaction tube 1. The convex spherical surfaces of are connected by sliding. O-ring groove 3A on the convex spherical surface of the sliding connection part is provided, and the O-ring 3 is inserted into this O-ring groove 3A. Reaction tube 1 and Flanges 5 and 6 are provided on the gas introduction pipe 2 and the gas introduction pipe 2, respectively, and these flanges 5 and 6 The gap is clamped with a spring 7. Also, the connection between reaction tube 1 and exhaust pipe is exactly the same. The connection configuration is as follows.

[0007] This first embodiment is arranged between the reaction tube 1 and the gas introduction tube 2 and between the reaction tube 1 and the gas introduction tube 2 as described above. Connect to the exhaust pipes with uneven spherical sliding joints 4, and connect O to each sliding connection part. Insert ring 3 and install flan into reaction tube 1, gas introduction tube 2 and exhaust tube. Since the flanges 5 and 6 were provided and the spring 7 was used to clamp the space between the flanges 5 and 6, the reaction Even if the pipe 1, gas inlet pipe 2, and exhaust pipe are not arranged in a straight line, the spring 7 and sealed with O-ring 3, so there is no risk of gas leakage. Not only is it easy to adjust the position of the gas introduction pipe 2 and the exhaust pipe with respect to the reaction tube 1. It will be possible to do it.

[0008] In addition, the position of the gas introduction pipe 2 and exhaust pipe can be easily adjusted with respect to the reaction tube 1. time can be reduced.

[0009] FIG. 2 is a cross-sectional view showing the configuration of essential parts of the second embodiment. In this second embodiment, the connecting portions 9 and 10 of the reaction tube 1 and the gas introduction tube 2 are connected to flanges, respectively. and insert the O-ring 3 and outer ring 11 between these flanges 9 and 10. , both flanges 9 and 10 are sandwiched between blocks 12 and 13, and both blocks 12 and 13 are One end of the shaft 14 passed through is fixed to one block 12, and this shaft An elastic member receiver 15 is attached to the other end of the block 14, and the elastic member receiver 15 is connected to the other block 13. A spring 7 is inserted between the grooves 15. The reaction tube 1 and the exhaust pipe are also connected in exactly the same way.

0010 Since this second embodiment has the above-mentioned configuration, the reaction tube 1 and the gas introduction tube 2 are An O-ring 3 and an aperture between the flanges 9 and 10 and between the flanges of the reaction tube 1 and the exhaust pipe, respectively. Insert the outer ring 11, sandwich both flanges 9 and 10 between blocks 12 and 13, Since both blocks 12 and 13 are clamped with spring 7, reaction tube 1 and gas guide Clamp with spring 7 even if the inlet pipe 2 and exhaust pipe are not arranged in a straight line gas leakage occurs because it is sealed with O-ring 3 and outer ring 11. Not only is there no risk, but the position of the gas introduction pipe 2 and exhaust pipe relative to the reaction pipe 1 is adjusted. can be done easily.

[0011] Also, if you hold the block 13 and the elastic body receiver 15 between your fingers and compress the spring 7, The space between the blocks 12 and 13 is expanded, and the blocks 12 and 13, the shaft 14, and the elastic body support are expanded. The retainer 15 and the spring 7 can be easily attached and detached together from the flanges 9 and 10. Detachment Since maintenance is easy, equipment maintenance time can be reduced.

0012

[Effect of the idea]

According to the present invention, the connection portions 9 and 10 between the reaction tube 1 and the gas introduction tube 2, and the connection portions 9 and 10 between the reaction tube 1 and the gas inlet tube 2 and the Each trachea connection can be sealed with an O-ring 3, completely preventing gas leaks. There is no risk of corrosion of the external metal. Also, for reaction tube 1 To easily adjust the position of a gas inlet pipe 2 and an exhaust pipe to shorten the time for position adjustment. I can do it.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional view showing the configuration of essential parts of a first embodiment of the device of the present invention.

FIG. 2 is a cross-sectional view showing the configuration of essential parts of a second embodiment.

FIG. 3 is a sectional view showing the configuration of essential parts of an example of a conventional device.

[Explanation of symbols]

1 (quartz) reaction tube 2 Gas introduction pipe 3 O-ring 3A O-ring groove 4 Spherical sliding 5,6 Flange 7 Elastic body (spring) 9,10 Connection part (flange) 11 Outer ring 12,13 blocks 14 Shaft 15 Elastic body receiver

Continuing from the front page (51) Int.Cl. ⁵ Identification code Internal reference number FI Technical display location // C23C 14/58 8414−4K H01L 21/205 7739−4M (72) Inventor Mikio Koizumi Toranomon, Minato-ku, Tokyo 2-3-13 Kokusai Electric Co., Ltd.

Claims (4)

[Scope of utility model registration request] Claim 1: A semiconductor in which a reaction gas is introduced into a reaction tube (1) through a gas introduction tube (2) and exhausted through an exhaust tube to perform film formation processes such as oxidation and diffusion on the semiconductor inside the reaction tube (1). In the production apparatus, the connecting portions (9, 10) between the reaction tube (1) and the gas introduction tube (2) and the connecting portion between the reaction tube (1) and the exhaust tube are connected with an O-ring (3) interposed therebetween. Gas pipe connection equipment for semiconductor manufacturing equipment. 2. The connecting portions (9, 10) between the reaction tube (1) and the gas introduction tube (2) and the connecting portion between the reaction tube (1) and the exhaust tube are connected by spherical sliding fittings (4), respectively. 2. A gas pipe connection for semiconductor manufacturing equipment according to claim 1, wherein O-ring grooves (3A) are provided in the sliding surface of the sliding connection part, and O-rings (3) are inserted into these O-ring grooves (3A). Device. 3. The reaction tube (1), the gas introduction tube (2), and the exhaust tube are provided with flanges (5, 6), respectively, and the flange (5) of the reaction tube (1) and the flange of the gas introduction tube (2) are provided. 3. A gas pipe connection device for a semiconductor manufacturing apparatus according to claim 2, wherein elastic bodies (7) are clamped between the flange (5) of the reaction tube (1) and the flange of the exhaust pipe. 4. The connecting portion (9, 10) between the reaction tube (1) and the gas introduction tube (2) and the connecting portion between the reaction tube (1) and the exhaust tube are respectively flanges, and a gap between these flanges (9, 10) is provided. Insert the O-ring (3) and outer ring (11) into the holder, sandwich the flanges (9, 10) between the blocks (12, 13), and insert the elastic body (7) between the blocks (12, 13). 2. A gas pipe connection device for semiconductor manufacturing equipment according to claim 1, which is formed by pressing.