JPH04129662A - Polishing device - Google Patents

Polishing device

Info

Publication number
JPH04129662A
JPH04129662A JP24736790A JP24736790A JPH04129662A JP H04129662 A JPH04129662 A JP H04129662A JP 24736790 A JP24736790 A JP 24736790A JP 24736790 A JP24736790 A JP 24736790A JP H04129662 A JPH04129662 A JP H04129662A
Authority
JP
Japan
Prior art keywords
tank
polishing
separation tank
polishing tank
support base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24736790A
Other languages
Japanese (ja)
Other versions
JP3115584B2 (en
Inventor
Toshio Ando
安藤 壽雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EE I KK
Original Assignee
EE I KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EE I KK filed Critical EE I KK
Priority to JP24736790A priority Critical patent/JP3115584B2/en
Publication of JPH04129662A publication Critical patent/JPH04129662A/en
Application granted granted Critical
Publication of JP3115584B2 publication Critical patent/JP3115584B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To input a medal and polishing material into a polishing tank via a selective cylinder, by rotating a support base around a horizontal shaft to a machine frame and tilting a polishing tank so as to position under a separation tank. CONSTITUTION:A polishing tank 3 is tilted so as to position at the lower part of a separation tank 4 according to the rotation of a support base 2, by rotating the support base 2 arranged on a machine frame l around a horizontal shaft. A polishing tank 4 is then rotated around the axial line crossed with the horizontal shaft to the support base 2, after inputting a medal 34 and polishing material 35 inside the polishing tank 4 via a selective cylinder 5 arranged inside the separation tank 4 adjacently provided on the polishing tank 3, the medal 34 and polishing material 35 are stirred while mixing them according to the rotation of the polishing tank 3, and the dirt sticked to the surface of the medal 34 is removed by the polishing material 35. Also the separation tank 4 is tilted so as to locate at the lower part of the polishing tank 3 according to the rotation of the support base 2, the medal 34 and polishing material 35 are flowed down toward the selective cylinder 5, the medal 34 is discharged to the external part of the separation tank 4 through the selective cylinder 5, and the polishing material 35 is stored in a storage part 7.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、特に、メダル遊技機等で使用するメダルの研
磨に適した研磨装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention particularly relates to a polishing device suitable for polishing medals used in medal game machines and the like.

従来の技術 従来、筒体の内部に弾性を有する螺条線輪体を垂直軸の
まわりに回動自在に配設し、螺条線輪体を筒体に対して
回転させることにより、螺条線輪体がメダル及び合成樹
脂製の研磨材を混合しながら筒体の下端から上端に向か
って移送すると同時に、メダルと研磨材とを螺条線輪体
の回転に伴って撹拌し、メダルの表面に付着した汚れを
研磨材により除去するようにした研磨装置が知られてい
る。
2. Description of the Related Art Conventionally, an elastic spiral ring body is disposed inside a cylindrical body so as to be rotatable around a vertical axis. The thread wheel mixes the medals and the synthetic resin abrasive and transfers them from the lower end of the cylinder toward the upper end.At the same time, the medals and the abrasive are agitated as the spiral wire rotates, and the medals are mixed. 2. Description of the Related Art A polishing device is known that uses an abrasive material to remove dirt attached to a surface.

発明が解決しようとする課題 ところが、従来の研磨装置では、メダル及び研磨材の螺
条線輪体による筒体の上方への送り量が一定であるので
、多量のメダルの研磨を行えず、メダルと研磨材との螺
条線輪体の回転による撹拌が十分に行えないので、メダ
ルの表面の汚れを完全に除去することが困難で、筒体の
下端寄りの内部のメダルに上方から大きな圧力が加わる
ので、メダルが変形するおそれがあった。
Problems to be Solved by the Invention However, in conventional polishing devices, the amount of upward feeding of medals and abrasive material by the spiral wheel body is constant, and therefore it is not possible to polish a large number of medals. Since the abrasive material cannot be stirred sufficiently by the rotation of the spiral ring body, it is difficult to completely remove dirt from the surface of the medal, and the medal inside near the bottom end of the cylinder is subjected to large pressure from above. , there was a risk that the medal would become deformed.

本発明の目的は、上述する問題点に対処して、支持台を
機枠に対して水平軸のまわりに回動することにより、研
磨槽が支持台の回動に伴って分離槽の下部に位置するよ
うに傾き、メダル及び研磨材を選別筒を介して研磨槽の
内部に投入し、研磨槽が支持台に対して水平軸と交差す
る軸線のまわりに回動し、メダルと研磨材との撹拌を研
磨槽の回動により十分に行い、メダルの表面に付着した
汚れを研磨材により除去し、多量のメダルの研磨槽によ
る研磨を行い、従来のように研磨槽の内部のメダルに上
方より大きな圧力が加わらず、メダルの変形を防止し、
分離槽を支持台の回動に伴って研磨槽の下部に位置する
ように傾け、研磨槽の内部のメダル及び研磨材を選別筒
に向かって流下し、メダルを選別筒を通って分離槽の外
部へと排出すると同時に、研磨材が選別筒の通孔を通っ
て貯留部に貯留し、研磨材のみを選別筒によりメダルか
ら分離し、メダルから研磨材を分離した後、分離槽を支
持台の回動により研磨槽の上部に位置させるのみで、貯
留部の研磨材を選別筒の通孔を通って研磨槽に迅速に戻
すことが可能な研磨装置を提供することにある。
An object of the present invention is to solve the above-mentioned problems by rotating the support stand around a horizontal axis with respect to the machine frame, so that the polishing tank can be moved to the lower part of the separation tank as the support stand rotates. The medals and abrasive material are put into the polishing tank through the sorting cylinder, and the polishing tank rotates with respect to the support base around an axis that intersects with the horizontal axis, separating the medals and the abrasive material. The polishing tank is sufficiently stirred by rotation of the polishing tank, dirt adhering to the surface of the medals is removed with an abrasive material, and a large amount of medals are polished in the polishing tank. This prevents the medal from deforming without applying greater pressure.
The separation tank is tilted so as to be located at the bottom of the polishing tank as the support base rotates, and the medals and abrasive material inside the polishing tank flow down toward the sorting tube, and the medals pass through the sorting tube and into the separation tank. At the same time as being discharged to the outside, the abrasive passes through the through hole of the sorting tube and is stored in the storage section.Only the abrasive is separated from the medals by the sorting tube.After separating the abrasive from the medal, the separation tank is moved to a support stand. It is an object of the present invention to provide a polishing device capable of quickly returning abrasive material in a storage portion to a polishing tank through a through hole of a sorting cylinder simply by positioning the polishing material in the upper part of the polishing tank by rotating the polishing device.

課題を解決するための手段 本発明の研磨装置は、機枠に支持台を水平軸のまわりに
回動自在に配設すると共に、前記支持台に研磨槽を前記
水平軸と交差する軸線のまわりに回動自在に配設し、前
記研磨槽に隣接して分離槽を設け、前記分離槽の内部に
前記研磨槽と連通ずる選別筒を配設し、前記選別筒の周
壁に多数の通孔を設け、前記分離槽と前記選別筒との間
に貯留部を形成したことを特徴とする構成を有するもの
である。
Means for Solving the Problems The polishing apparatus of the present invention includes a support base rotatably disposed on the machine frame around a horizontal axis, and a polishing tank mounted on the support base around an axis intersecting the horizontal axis. A separating tank is provided adjacent to the polishing tank, a sorting cylinder communicating with the polishing tank is arranged inside the separating tank, and a number of through holes are provided in the peripheral wall of the sorting cylinder. The present invention is characterized in that a storage portion is formed between the separation tank and the sorting cylinder.

作用 機枠に配設した支持台を水平軸のまわりに回動すること
により、研磨槽を支持台の回動に伴って分離槽の下部に
位置するように傾け、メダル及び研磨材を研磨槽に隣接
して設けた分離槽の内部に配設した選別筒を介して研磨
槽の内部に投入した後、研磨槽を支持台に対して水平軸
と交差する軸線のまわりに回動し、メダルと研磨材とを
研磨槽の回動に伴って混合しながら撹拌し、メダルの表
面に付着した汚れを研磨材により除去する。
By rotating the support base disposed on the working machine frame around the horizontal axis, the polishing tank is tilted to be located at the bottom of the separation tank as the support base rotates, and the medals and abrasive material are placed in the polishing tank. After the medals are fed into the polishing tank through a sorting tube installed inside a separation tank installed adjacent to the medallion, the polishing tank is rotated with respect to the support base around an axis that intersects with the horizontal axis. and the abrasive material are mixed and stirred as the polishing tank rotates, and dirt adhering to the surface of the medal is removed by the abrasive material.

また、分離槽を支持台の回動に伴って研磨槽の下部に位
置するように傾け、研磨槽の内部のメダル及び研磨材が
選別筒に向かって流下し、メダルを選別筒を通って分離
槽の外部へと排出すると同時に、研磨材が選別筒の周壁
に設けた多数の通孔を通って分離槽と選別筒との間に形
成した貯留部に貯留し、選別筒がメダルから分離し、メ
ダルから研磨材を分離する。
In addition, as the support base rotates, the separation tank is tilted so that it is located at the bottom of the polishing tank, and the medals and abrasive material inside the polishing tank flow down toward the sorting tube, and the medals are separated through the sorting tube. At the same time as being discharged to the outside of the tank, the abrasive passes through a number of holes provided in the peripheral wall of the sorting tube and is stored in the storage section formed between the separation tank and the sorting tube, and the sorting tube separates from the medals. , to separate the abrasive material from the medallion.

さらに、分離槽を支持台の回動により研磨槽の上部に位
置させ、貯留部の研磨材が選別筒の通孔を通って研磨槽
に戻る。
Further, the separation tank is positioned above the polishing tank by rotating the support base, and the abrasive material in the storage section returns to the polishing tank through the through hole of the sorting cylinder.

実施例 以下、本発明の実施例を図面に基づいて詳細に説明する
Embodiments Hereinafter, embodiments of the present invention will be described in detail based on the drawings.

第1図において、1は機枠であり、機枠1には、第2図
に示すように、支持台2が水平軸のまわりに回動自在に
配設されると共に、支持台2には研磨槽3が水平軸と交
差する軸線のまわりに回動自在に配設され、研磨槽3に
は隣接して分離槽4が設けられ、分離槽4の内部には、
第3図に示すように、研磨槽3と連通ずる選別筒5が配
設され、選別筒5の周壁には多数の通孔6が設けられ、
分離槽4と選別筒5との間には貯留部7が形成されてい
る。
In FIG. 1, 1 is a machine frame, and the machine frame 1 has a support base 2 rotatably disposed around a horizontal axis, as shown in FIG. A polishing tank 3 is rotatably arranged around an axis intersecting a horizontal axis, a separation tank 4 is provided adjacent to the polishing tank 3, and inside the separation tank 4,
As shown in FIG. 3, a sorting tube 5 is provided which communicates with the polishing tank 3, and a large number of through holes 6 are provided in the peripheral wall of the sorting tube 5.
A storage section 7 is formed between the separation tank 4 and the sorting tube 5.

機枠1の台板8の両側には、第1図に示すように、側部
支持体9,10がそれぞれ立設され、側部支持体9と側
部支持体10との間の台板8の上方には支持台2が配置
され、側部支持体9の中央には、第2図に示すように、
シャフト11が回動自在に横架され、シャフト11の側
部にはモータM1が配設され、モータM1のモータ軸に
は継手12を介してシャフト11の端部が連結され、シ
ャフト11の長手方向中央付近にはウオーム13が固定
され、シャフト11の両端が軸受14゜14に回動自在
にそれぞれ軸支されている。
As shown in FIG. 1, side supports 9 and 10 are respectively erected on both sides of the base plate 8 of the machine frame 1, and the base plate between the side supports 9 and 10 A support stand 2 is arranged above the support 8, and in the center of the side support 9, as shown in FIG.
A shaft 11 is rotatably suspended horizontally, a motor M1 is disposed on the side of the shaft 11, and an end of the shaft 11 is connected to the motor shaft of the motor M1 via a joint 12. A worm 13 is fixed near the center in the direction, and both ends of the shaft 11 are rotatably supported by bearings 14 degrees 14, respectively.

機枠1の側部支持体9と側部支持体10との間には、第
1図に示すように、台板8の上方に支持杆15が回動自
在に横架され、支持杆15には支持台2が固定され、側
部支持体9及び側部支持体10には支持台2の両側に軸
受16.16がそれぞれ配設され、支持杆15の一端に
はウオーム13と噛合うウオームホイール17が固定さ
れ、支持杆15の一端寄り及び他端が軸受16,16に
回動自在にそれぞれ軸支されている。
Between the side supports 9 and 10 of the machine frame 1, as shown in FIG. A support stand 2 is fixed to the support stand 2, and bearings 16 and 16 are provided on both sides of the support stand 2 on the side support members 9 and 10, respectively, and the support rod 15 engages with the worm 13 at one end. A worm wheel 17 is fixed, and one end and the other end of the support rod 15 are rotatably supported by bearings 16, 16, respectively.

支持台2の前端寄りの上部には、第1図及び第2図に示
すように、側部支持体9.10の内側にブラケット18
.18がそれぞれ立設され、ブラケット18には支軸1
9がそれぞれ固定され、支軸19には係合ローラ20が
回動自在に軸支され、係合ローラ20,20の外周面に
は研磨槽3の外周面が係合され、研磨槽3は係合ローラ
19に回動自在に支持されている。
At the upper part of the support base 2 near the front end, there is a bracket 18 inside the side supports 9.10, as shown in FIGS. 1 and 2.
.. 18 are respectively erected, and the bracket 18 has a support shaft 1.
9 are fixed respectively, an engagement roller 20 is rotatably supported on the support shaft 19, and the outer circumferential surface of the polishing tank 3 is engaged with the outer circumferential surface of the engagement rollers 20, 20. It is rotatably supported by an engagement roller 19.

支持台2の後端寄りの上部には、第2図に示すように、
保持枠21が立設され、保持枠21には支持台2の上部
にモータM2が配設され、モータM2の側部にはモータ
M2の回転速度を変速する変速機構を収納したギアボッ
クス22が設けられ、モータM2の上方には軸受23が
配設され、ギアボックス22の駆動軸24には駆動用ス
プロケット25が固定されている。
As shown in FIG. 2, the upper part of the support base 2 near the rear end has
A holding frame 21 is installed upright, and a motor M2 is disposed on the upper part of the support base 2 in the holding frame 21, and a gear box 22 housing a transmission mechanism for changing the rotational speed of the motor M2 is installed on the side of the motor M2. A bearing 23 is disposed above the motor M2, and a drive sprocket 25 is fixed to a drive shaft 24 of the gearbox 22.

支持台2の上部には、第2図に示すように、研磨槽3が
配置され、研磨槽3の内部には複数の突条片26が配設
され、研磨槽3の一端には保持枠21に向かって突出し
た回転軸27が固定されると共に、回転軸27の先端に
は従動用スプロケット28が固定され、駆動用スプロケ
ット25と従動用スプロケット28との間にはチェーン
29が巻き掛けられ、回転軸27は保持枠21の軸受2
3に回動自在に軸支されている。
As shown in FIG. 2, a polishing tank 3 is arranged on the upper part of the support base 2, a plurality of protrusions 26 are arranged inside the polishing tank 3, and a holding frame is provided at one end of the polishing tank 3. A rotating shaft 27 protruding toward 21 is fixed, and a driven sprocket 28 is fixed to the tip of the rotating shaft 27, and a chain 29 is wound between the driving sprocket 25 and the driven sprocket 28. , the rotating shaft 27 is connected to the bearing 2 of the holding frame 21.
3 is rotatably supported.

研磨槽3の他端には、第2図及び第3図に示すように、
分離槽4が配置され、分離槽4の内部には研磨槽3の側
部に円錐台形の選別筒5が配設されると共に、選別筒5
の研磨槽3と反対側の側部には選別筒5と連通する筒体
30が配設され、分離槽4の内部の選別筒5及び筒体3
0の周囲には貯留部7が形成され、分離槽4の一端が研
磨槽3の他端に固着され、研磨槽3と分離槽4との間に
は環状突部31が形成されている。
At the other end of the polishing tank 3, as shown in FIGS. 2 and 3,
A separation tank 4 is arranged, and inside the separation tank 4, a truncated conical sorting cylinder 5 is arranged on the side of the polishing tank 3.
A cylindrical body 30 communicating with the sorting cylinder 5 is disposed on the side opposite to the polishing tank 3, and the sorting cylinder 5 and the cylinder 3 inside the separation tank 4 are connected to each other.
A storage section 7 is formed around the polishing tank 0, one end of the separation tank 4 is fixed to the other end of the polishing tank 3, and an annular protrusion 31 is formed between the polishing tank 3 and the separation tank 4.

選別筒5の一端には筒体30が連結され、選別筒5の他
端が分離槽4の一端の内周面に固着されている。
A cylinder 30 is connected to one end of the sorting tube 5, and the other end of the sorting tube 5 is fixed to the inner peripheral surface of one end of the separation tank 4.

分離槽4の他端には、第1図に示すように、蓋体32が
固着され、蓋体32の中央には筒体30と連通ずる投入
口33が設けられ、分離槽4の貯留部7が蓋体32によ
り閉塞されている。
As shown in FIG. 1, a lid 32 is fixed to the other end of the separation tank 4, and an input port 33 communicating with the cylinder 30 is provided at the center of the lid 32, and the storage part of the separation tank 4 is 7 is closed by a lid body 32.

次に、この実施例の作用について説明する。Next, the operation of this embodiment will be explained.

まず、支持台2が第2図に示す機枠1に対して水平な状
態において、モータM1を駆動すると、シャフト11が
機枠1の側部支持体9の軸受14゜14に対してモータ
M1の駆動により回転し、ウオーム13がシャフト11
の回転に伴って同方向に回動する。
First, when the motor M1 is driven in a state where the support stand 2 is horizontal to the machine frame 1 shown in FIG. The worm 13 is rotated by the drive of the shaft 11.
It rotates in the same direction as the .

ウオーム13のシャフト11の回転に伴う回動により、
ウオームホイール17がウオーム13と噛合いながら第
2図の時計方向に回動と同時に、支持杆15が機枠1の
側部支持体9,1oの軸受16.16に対してウオーム
ホイール17と共に第2図の時計方向に回転し、支持台
2が支持杆15と共に第2図の時計方向に回動し、第4
図に示すように、支持台2を機枠1の側部支持体9゜1
0に対して鉛直方向に向けた後、モータM1を停止する
ことにより、研磨槽3及び分離槽4が支持台2に沿って
垂直な状態となり、研磨槽3が保持枠21の上部に位置
すると共に、分離槽4が研磨槽3の上部に位置し、保持
枠21が研磨槽3及び分離槽4を受け、第5図に示すよ
うに、メダル34及び合成樹脂製の研磨材35を蓋体3
2の投入口33から筒体30及び選別筒5を介して研磨
槽3の内部へと投入する。
Due to the rotation of the worm 13 as the shaft 11 rotates,
At the same time as the worm wheel 17 rotates clockwise in FIG. The support base 2 rotates clockwise in FIG. 2 together with the support rod 15, and the fourth
As shown in the figure, the support stand 2 is attached to the side support 9°1 of the machine frame 1.
0, the motor M1 is stopped, and the polishing tank 3 and separation tank 4 become vertical along the support base 2, and the polishing tank 3 is positioned above the holding frame 21. At the same time, the separation tank 4 is located above the polishing tank 3, the holding frame 21 receives the polishing tank 3 and the separation tank 4, and as shown in FIG. 3
2 into the polishing tank 3 through the cylinder 30 and the sorting cylinder 5.

その後、モータM1を逆転すると、シャフト11が機枠
1の側部支持体9の軸受14.14に対してモータM1
の逆転により回転し、ウオーム13がシャフト11の回
転に伴って同方向に回動する。
Thereafter, when the motor M1 is reversed, the shaft 11 is moved against the bearing 14.14 of the side support 9 of the machine frame 1.
The worm 13 rotates in the same direction as the shaft 11 rotates.

ウオーム13のシャフト110回転に伴う回動により、
ウオームホイール17がウオーム13と噛合いながら第
4図の反時計方向に回動と同時に、支持杆15が機枠1
の側部支持体9,1oの軸受16.16に対してウオー
ムホイール17と共に第4図の反時計方向に回転し、支
持台2が支持杆15と共に第2図の反時計方向に回動し
、第6図に示すように、支持台2をメダル34の量に応
じて機枠1の側部支持体9,1oに対して30’〜45
″ に傾けた後、モータM1を停止することにより、研
磨槽3及び分離槽4が支持台2に沿って傾斜した状態と
なり、研磨槽3が保持枠21の斜め上部に位置すると共
に、分離槽4が研磨槽3の斜め上部に位置し、保持枠2
1が研磨槽3及び分離槽4を受ける。
Due to the rotation of the worm 13 as the shaft rotates 110 times,
The worm wheel 17 engages with the worm 13 and rotates counterclockwise in FIG.
The support base 2 rotates together with the support rod 15 in the counterclockwise direction in FIG. , as shown in FIG.
'', by stopping the motor M1, the polishing tank 3 and separation tank 4 are tilted along the support base 2, and the polishing tank 3 is located diagonally above the holding frame 21, and the separation tank 4 is located diagonally above the polishing tank 3, and the holding frame 2
1 receives the polishing tank 3 and the separation tank 4.

次いで、モータM2を駆動すると、駆動軸24がギアボ
ックス22の内部の変速機構を介してモータM2の駆動
により回転し、駆動用スプロケ、。
Next, when the motor M2 is driven, the drive shaft 24 is rotated by the drive of the motor M2 via the transmission mechanism inside the gear box 22, and the drive sprocket is rotated.

ト25が駆動軸24の回転に伴って同方向に回動すると
同時に、従動用スプロケット28がチェーン29を介し
て駆動用スプロケット25と同方向に回動し、研磨槽3
の回転軸27が保持枠21の軸受23に対して従動スプ
ロケット28と同方向に回転し、研磨槽3が係合ローラ
20と係合しながら回転軸27の回転に伴って同方向に
回動し、分離槽4が研磨槽3と共に回動し、第7図に示
すように、研磨槽3の内部の複数の突条片26がメダル
34と研磨材35とを混合しながら攪拌し、メダル34
の表面に付着した汚れを研磨材35により除去する。
At the same time, the driven sprocket 28 rotates in the same direction as the driving sprocket 25 through the chain 29, and the polishing tank 3 rotates in the same direction as the drive shaft 24 rotates.
The rotating shaft 27 rotates in the same direction as the driven sprocket 28 with respect to the bearing 23 of the holding frame 21, and the polishing tank 3 rotates in the same direction as the rotating shaft 27 rotates while engaging with the engagement roller 20. Then, the separation tank 4 rotates together with the polishing tank 3, and as shown in FIG. 34
The dirt adhering to the surface is removed by the abrasive material 35.

研磨槽3の内部のメダル34の研磨材35による研磨が
終了した後、モータM2を停止すると共に、モータM1
を逆転することにより、シャフト11が機枠1の側部支
持体9の軸受14.14に対してモータM1の逆転によ
り回転し、ウオーム13がシャフト11の回転に伴って
同方向に回動する。
After polishing the medals 34 inside the polishing tank 3 with the abrasive material 35, the motor M2 is stopped, and the motor M1 is stopped.
By reversing the motor M1, the shaft 11 rotates with respect to the bearings 14, 14 of the side support 9 of the machine frame 1, and the worm 13 rotates in the same direction as the shaft 11 rotates. .

ウオーム13のシャフト11の回転に伴う回動により、
ウオームホイール17がウオーム13と噛合いながら第
6図の反時計方向に回動と同時に、支持杆15が機枠1
の側部支持体9,10の軸受16.16に対してウオー
ムホイール】−7と共に第6図の反時計方向に回転し、
支持台2が支持杆15と共に第6図の反時計方向に回動
し、第8図に示すように、支持台2を機枠1の側部支持
体9゜10に対して第6図と反対方向に傾けた後、モー
タM1を停止することにより、研磨槽3及び分離槽4が
支持台2に沿って第6図と反対方向に傾斜した状態とな
り、研磨槽3が保持枠21の斜め下部に位置すると共に
、分離槽4が研磨槽3の斜め下部に位置する。
Due to the rotation of the worm 13 as the shaft 11 rotates,
At the same time as the worm wheel 17 rotates counterclockwise in FIG. 6 while meshing with the worm 13, the support rod 15 moves toward the machine frame 1
The worm wheel ]-7 rotates counterclockwise in FIG.
The support stand 2 rotates counterclockwise in FIG. 6 together with the support rod 15, and as shown in FIG. After tilting in the opposite direction, by stopping the motor M1, the polishing tank 3 and the separation tank 4 are tilted along the support base 2 in the opposite direction to that shown in FIG. The separation tank 4 is located diagonally below the polishing tank 3.

研磨槽3及び分離槽4を支持台2に沿って第6図と反対
方向に傾斜した状態とすることにより、第9図に示すよ
うに、研磨槽3の内部のメダル34及び研磨材35が分
離槽4の内部の選別筒5に流下し、メダル34を選別筒
5及び筒体30を通って蓋体32の投入口33より分離
槽4の外部へと排出し、研磨材35が選別筒5の通孔6
を通って分離槽4の内部の貯留部7に貯留し、選別筒5
がメダル34から研磨材35を分離する。
By tilting the polishing tank 3 and the separation tank 4 in the opposite direction to that shown in FIG. 6 along the support base 2, as shown in FIG. The medals 34 flow down into the sorting tube 5 inside the separation tank 4, pass through the sorting tube 5 and the cylinder 30, and are discharged to the outside of the separation tank 4 from the input port 33 of the lid 32, and the abrasive material 35 flows into the sorting tube. 5 through hole 6
through the separation tank 4 and stored in the storage section 7 inside the separation tank 4.
separates the abrasive material 35 from the medal 34.

メダル34を分離槽4の外部へと排出した後、モータM
1を駆動すると、シャフト11が機枠1の側部支持体9
の軸受14.14に対してモータM1の駆動により回転
し、ウオーム13がシャフト11の回転に伴って同方向
に回動する。
After discharging the medals 34 to the outside of the separation tank 4, the motor M
1, the shaft 11 moves to the side support 9 of the machine frame 1.
The worm 13 rotates in the same direction with the rotation of the shaft 11.

ウオーム13のシャフト11の回転に伴う回動により、
ウオームホイール17がウオーム13と噛合いながら第
8図の時計方向に回動と同時に、支持杆15が機枠1の
側部支持体9,10の軸受16.16に対してウオーム
ホイール17と共に第8図の時計方向に回転し、支持台
2が支持杆15と共に第8図の時計方向に回動し、第4
図に示すように、支持台2を機枠1の側部支持体9゜1
0に対して鉛直方向に向けた後、モータM1を停止する
ことにより、研磨槽3及び分離槽4が支持台2に沿って
垂直な状態となり、分離槽4の内部の貯留部7の研磨材
35が選別筒5の通孔6を通って研磨槽3の内部へと戻
る。
Due to the rotation of the worm 13 as the shaft 11 rotates,
At the same time as the worm wheel 17 rotates clockwise in FIG. 8, the support base 2 rotates clockwise in FIG. 8 together with the support rod 15, and the fourth
As shown in the figure, the support stand 2 is attached to the side support 9°1 of the machine frame 1.
0, the motor M1 is stopped, and the polishing tank 3 and separation tank 4 become vertical along the support base 2, and the abrasive material in the storage section 7 inside the separation tank 4 is 35 returns to the interior of the polishing tank 3 through the through hole 6 of the sorting cylinder 5.

発明の効果 以上に述べたように、本発明の研磨装置によれば、支持
台を機枠に対して水平軸のまわりに回動することにより
、研磨槽が支持台の回動に伴って分離槽の下部に位置す
るように傾くので、メダル及び研磨材を選別筒を介して
研磨槽の内部に投入することができ、研磨槽が支持台に
対して水平軸と交差する軸線のまわりに回動するので、
メダルと研磨材との撹拌を研磨槽の回動により十分に行
ってメダルの表面に付着した汚れを研磨材により除去す
ることができ、多量のメダルの研磨槽による研磨が行え
、従来のように研磨槽の内部のメダルに上方より大きな
圧力が加わらないので、メダルの変形を防止することが
でき、しかも、分離槽が支持台の回動に伴って研磨槽の
下部に位置するように傾くので、研磨槽の内部のメダル
及び研磨材が選別筒に向かって流下し、メダルを選別筒
を通って分離槽の外部へと排出すると同時に、研磨材が
選別筒の通孔を通って貯留部に貯留し、研磨材のみを選
別筒によりメダルから分離することができ、メダルから
研磨材を分離した後、分離槽を支持台の回動により研磨
槽の上部に位置させるのみで、貯留部の研磨材を選別筒
の通孔を通って研磨槽に迅速に戻すことができる。
Effects of the Invention As described above, according to the polishing apparatus of the present invention, by rotating the support base around the horizontal axis with respect to the machine frame, the polishing tank can be separated as the support base rotates. Since the tank is tilted to be located at the bottom, medals and abrasive material can be introduced into the polishing tank through the sorting tube, and the polishing tank rotates around the axis that intersects the horizontal axis with respect to the support base. Because it moves,
The rotation of the polishing tank sufficiently stirs the medals and the abrasive material, and the dirt adhering to the surface of the medals can be removed by the abrasive material.A large amount of medals can be polished using the polishing tank. Since no greater pressure is applied to the medals inside the polishing tank from above, deformation of the medals can be prevented.Moreover, the separating tank tilts to be located at the bottom of the polishing tank as the support base rotates. , the medals and abrasive material inside the polishing tank flow down toward the sorting tube, and at the same time the medals are discharged to the outside of the separation tank through the sorting tube, the abrasive material passes through the holes in the sorting tube and enters the storage section. Only the abrasives can be stored and separated from the medals using a sorting cylinder. After separating the abrasives from the medals, the storage part can be polished by simply positioning the separation tank at the top of the polishing tank by rotating the support base. Materials can be quickly returned to the polishing tank through the holes in the sorting tube.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の実施例の研磨装置の正面図、第2図
は、第1図の右側面図、 第3図は、第2図の研磨槽及び分離槽の拡大側面図、 第4図は、メダル及び研磨材の研磨槽に対する投入時の
研磨装置の側面図、 第5図は、第4図の研磨槽及び分離槽の要部切断図、 第6図は、メダルの研磨槽による研磨状態を示す研磨装
置の側面図、 第7図は、第6図の研磨槽及び分離槽の要部切断拡大図
、 第8図は、メダルの研磨槽からの排出状態を示す研磨装
置の側面図、 第9図は、第8図の研磨槽及び分離槽の要部切断拡大図
である。 1・・・機枠、2・・・支持台、3・・・研磨槽、4・
・・分離槽、5・・・選別筒、6・・・通孔、7・・・
貯留部、8・・・台板、9・・・側部支持体、10・・
・側部支持体、11・・・シャフト、12・・・継手、
13・・・ウオーム、14・・・軸受、15・・・支持
杆、16・・・軸受、17・・・ウオームホイール、1
8・・・ブラケット、19・・・支軸、20・・・係合
ローラ、21・・・保持枠、22・・・ギアボックス、
23・・・軸受、24・・・駆動軸、25・・・駆動用
スプロケット、26・・・突条片、27・・・回転軸、
28・・・従動用スプロケット、29・・・チェーン、
30・・・筒体、31・・・環状突部、32・・・蓋体
、33・・・投入口、34・・・メダル、35・・・研
磨材、Ml・・・モータ、M2・・・モータ。
1 is a front view of a polishing apparatus according to an embodiment of the present invention, FIG. 2 is a right side view of FIG. 1, and FIG. 3 is an enlarged side view of the polishing tank and separation tank of FIG. Figure 4 is a side view of the polishing device when medals and abrasive material are put into the polishing tank, Figure 5 is a cutaway view of essential parts of the polishing tank and separation tank in Figure 4, and Figure 6 is the medal polishing tank. FIG. 7 is an enlarged cutaway view of the main parts of the polishing tank and separation tank in FIG. The side view, FIG. 9, is an enlarged cutaway view of essential parts of the polishing tank and separation tank shown in FIG. 8. 1... Machine frame, 2... Support stand, 3... Polishing tank, 4...
...Separation tank, 5...Sorting cylinder, 6...Through hole, 7...
Storage part, 8... Base plate, 9... Side support, 10...
・Side support body, 11...shaft, 12...coupling,
13...Worm, 14...Bearing, 15...Support rod, 16...Bearing, 17...Worm wheel, 1
8... Bracket, 19... Support shaft, 20... Engagement roller, 21... Holding frame, 22... Gear box,
23... Bearing, 24... Drive shaft, 25... Drive sprocket, 26... Protruding strip, 27... Rotating shaft,
28... Driven sprocket, 29... Chain,
30... Cylindrical body, 31... Annular protrusion, 32... Lid, 33... Inlet, 34... Medal, 35... Abrasive material, Ml... Motor, M2... ··motor.

Claims (1)

【特許請求の範囲】[Claims] 機枠に支持台を水平軸のまわりに回動自在に配設すると
共に、前記支持台に研磨槽を前記水平軸と交差する軸線
のまわりに回動自在に配設し、前記研磨槽に隣接して分
離槽を設け、前記分離槽の内部に前記研磨槽と連通する
選別筒を配設し、前記選別筒の周壁に多数の通孔を設け
、前記分離槽と前記選別筒との間に貯留部を形成したこ
とを特徴とする研磨装置。
A support stand is disposed on the machine frame so as to be freely rotatable around a horizontal axis, and a polishing tank is disposed on the support stand so as to be rotatable around an axis intersecting the horizontal axis, and the polishing tank is adjacent to the polishing tank. A separation tank is provided, a sorting tube communicating with the polishing tank is arranged inside the separation tank, a large number of through holes are provided in the peripheral wall of the sorting tube, and a separation tank is provided between the separation tank and the sorting tube. A polishing device characterized in that a reservoir is formed.
JP24736790A 1990-09-19 1990-09-19 Polishing equipment Expired - Fee Related JP3115584B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24736790A JP3115584B2 (en) 1990-09-19 1990-09-19 Polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24736790A JP3115584B2 (en) 1990-09-19 1990-09-19 Polishing equipment

Publications (2)

Publication Number Publication Date
JPH04129662A true JPH04129662A (en) 1992-04-30
JP3115584B2 JP3115584B2 (en) 2000-12-11

Family

ID=17162372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24736790A Expired - Fee Related JP3115584B2 (en) 1990-09-19 1990-09-19 Polishing equipment

Country Status (1)

Country Link
JP (1) JP3115584B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07314323A (en) * 1994-03-29 1995-12-05 Shinwa Plant Kiko Kk Polisher of rough stone, etc.
JP2009046852A (en) * 2007-08-17 2009-03-05 Taiyu Kk Drum type scraping device
WO2023185707A1 (en) * 2022-03-29 2023-10-05 成都利君实业股份有限公司 Stirring mill with cylinder having material-distributing function, and closed-circuit and open-circuit grinding systems

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07314323A (en) * 1994-03-29 1995-12-05 Shinwa Plant Kiko Kk Polisher of rough stone, etc.
JP2009046852A (en) * 2007-08-17 2009-03-05 Taiyu Kk Drum type scraping device
WO2023185707A1 (en) * 2022-03-29 2023-10-05 成都利君实业股份有限公司 Stirring mill with cylinder having material-distributing function, and closed-circuit and open-circuit grinding systems

Also Published As

Publication number Publication date
JP3115584B2 (en) 2000-12-11

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