JPH0412244A - Vibration type scratch test machine - Google Patents
Vibration type scratch test machineInfo
- Publication number
- JPH0412244A JPH0412244A JP11521690A JP11521690A JPH0412244A JP H0412244 A JPH0412244 A JP H0412244A JP 11521690 A JP11521690 A JP 11521690A JP 11521690 A JP11521690 A JP 11521690A JP H0412244 A JPH0412244 A JP H0412244A
- Authority
- JP
- Japan
- Prior art keywords
- contact needle
- sample
- sample surface
- displacement
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000012360 testing method Methods 0.000 title description 7
- 238000006073 displacement reaction Methods 0.000 claims abstract description 45
- 239000000523 sample Substances 0.000 claims description 94
- 230000003287 optical effect Effects 0.000 claims description 13
- 238000001514 detection method Methods 0.000 claims description 8
- 230000005284 excitation Effects 0.000 claims description 2
- 239000010409 thin film Substances 0.000 abstract description 23
- 239000010408 film Substances 0.000 abstract description 8
- 230000007423 decrease Effects 0.000 abstract description 2
- 238000005259 measurement Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Investigating Strength Of Materials By Application Of Mechanical Stress (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、固体表面や固体表面上に形成された薄膜の力
学的特性を測定する振動型引っかき試験機に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a vibratory scratch tester for measuring the mechanical properties of a solid surface or a thin film formed on a solid surface.
[従来の技術]
真空蒸着、スパッタ、イオンブレーティング等各種の薄
膜形成手段により形成された固体表面上の薄膜の品質向
上のため、その薄膜の基材に対する密着力を正確に測定
することが重要な課題となってきている。[Prior Art] In order to improve the quality of thin films formed on solid surfaces by various thin film forming methods such as vacuum evaporation, sputtering, and ion blating, it is important to accurately measure the adhesion of the thin film to the substrate. This is becoming a major issue.
従来、薄膜の密着力を測定する手段として特開昭63−
140939号公報による装置が知られている。この装
置につき第3図を用いて説明する。Conventionally, as a means of measuring the adhesion of thin films, Japanese Patent Laid-Open No. 63-
A device according to Japanese Patent No. 140939 is known. This device will be explained using FIG. 3.
この装置は加振装置102と、加振装置102により加
振される接触針110と、試料台112とを備え、試験
に際しては、試料台112上に試料111を載置し、接
触針110を試料表面に接触させた後、接触針110を
低周波加振させる。This device includes a vibrating device 102, a contact needle 110 that is vibrated by the vibrating device 102, and a sample stage 112. During testing, a sample 111 is placed on the sample stage 112, and the contact needle 110 is After contacting the sample surface, the contact needle 110 is vibrated at low frequency.
そして、その間に接触針110と試料表面との間て発生
ずる摩擦力に対応する振動出力を検出し、この検出出力
の大きさおよび波形とその変化によりて力学特性を測定
することを特徴とする。以下、このような装置を水平振
動型引っかき試験機という。During this period, a vibration output corresponding to the frictional force generated between the contact needle 110 and the sample surface is detected, and the mechanical characteristics are measured based on the magnitude, waveform, and change of this detected output. . Hereinafter, such a device will be referred to as a horizontal vibration type scratch tester.
この試験機において、薄膜の基材に対する密着力を求め
るには、接触針110によって薄膜に対し負荷する荷重
を測定することか不可欠であり、この荷重の測定精度か
この密着力の測定精度を決定する。In this testing machine, in order to determine the adhesion force of the thin film to the base material, it is essential to measure the load applied to the thin film by the contact needle 110, and the measurement accuracy of this load or the measurement accuracy of this adhesion force is determined. do.
[発明が解決しようとする課題]
しかしながら、このような従来技術においては、試料に
負荷される接触針の荷重を測定する有効な手段が存在せ
ず、したがって測定精度か十分でない。[Problems to be Solved by the Invention] However, in such conventional techniques, there is no effective means for measuring the load of the contact needle applied to the sample, and therefore the measurement accuracy is insufficient.
本発明の目的は、このような従来技術の問題点に鑑み、
振動型引っかき試験機において、接触針によって試料に
負荷される荷重を測定する有効な手段を提供し、試験機
の測定精度を向上させることにある。In view of the problems of the prior art, an object of the present invention is to
An object of the present invention is to provide an effective means for measuring the load applied to a sample by a contact needle in a vibratory scratch tester, and to improve the measurement accuracy of the tester.
また、本発明の他の目的は、このような試験機において
、フラットでない試料表面の測定をも可能にすることに
ある。Another object of the present invention is to enable measurement of non-flat sample surfaces using such a testing machine.
[課題を解決するための手段]
上記目的を達成するため本発明の振動型引っかき試験機
は、試料に接触する接触針と、該接触針を保持し、該接
触針の試料面に垂直方向の変位が時間的に可変となる力
を前記接触針に負荷して試料に接触針を接触させる弾性
体レバー部材と、試料を該弾性体レバー部材に対し相対
的に試料面に沿った所定方向に移動させる移動手段と、
前記弾性体レバー部材を保持して前記移動手段による移
動方向に垂直な試料面に沿フた方向に振動させる加振手
段と、前記弾性体レバー部材のねじれ状態を検出するね
じれ状態検出手段と、前記弾性体レバー部材に保持され
た接触針の試料面と略垂直方向の変位量を検出する変位
量検出手段とを備える。[Means for Solving the Problems] In order to achieve the above object, the vibrating scratch tester of the present invention includes a contact needle that contacts a sample, a contact needle that is held, and a vertical direction perpendicular to the sample surface of the contact needle. an elastic lever member for bringing the contact needle into contact with the sample by applying a force whose displacement is variable over time to the contact needle; and an elastic lever member for moving the sample in a predetermined direction along the sample surface relative to the elastic lever member. A means of transportation for moving;
vibrating means for holding the elastic lever member and vibrating it in a direction along a sample surface perpendicular to the direction of movement by the moving means; a torsion state detection means for detecting a twist state of the elastic lever member; A displacement detection means is provided for detecting the displacement of the contact needle held by the elastic lever member in a direction substantially perpendicular to the sample surface.
変位検出手段としては、例えば、接触針に対して位置が
固定された反射鏡と、この反射鏡による反射光を受光し
て接触針の変位を検出するための光学式変位計用プロー
ブとを備えた光学式の検出手段や、接触針に対して位置
が固定された設置電極と、これと対になって電荷を蓄積
し、その容量を検出するための静電容量測定用プローブ
とを備えた、静電容量型のものを用いることができる。The displacement detection means includes, for example, a reflecting mirror whose position is fixed with respect to the contact needle, and an optical displacement meter probe for detecting the displacement of the contact needle by receiving the reflected light from the reflecting mirror. It is equipped with an optical detection means, an installed electrode whose position is fixed with respect to the contact needle, and a capacitance measuring probe that is paired with this to accumulate electric charge and detect the capacitance. , a capacitive type can be used.
[作用]
この構成において、弾性体レバー部材を振動させながら
、接触針を試料に接触させつつ、接触針の試料方向位置
が減少するように試料を所定方向に移動させると、試料
面上へ接触針が負荷する力か増加し、それにともなって
試料面と接触針間の摩擦力による弾性体レバー部材のね
じれ量(レバー部材の1回振動中あるいは1回片道啓動
中の振動方向最大変位量)が接触針の試料方向位置の変
位に対しほぼ一定の率で増加する。そして、試料面上へ
接触針が負荷する力が一定値を超えると、試料面上の被
膜が剥離されるなどの試料面上の変化が生じ、これによ
って試料面と接触針間の摩擦力か急激に変化して弾性体
レバー部材のねじれ量も不規則に変動する。このときの
試料面上へ接触針が負荷する力が、弾性体レバー部材の
弾性係数および接触針の試料面と略垂直方向の変位量か
ら正確に求められ、これに基づいて、試料面に対する薄
膜の密着強度などの試料表面の力学的特性か得られる。[Operation] In this configuration, when the contact needle is brought into contact with the sample while vibrating the elastic lever member and the sample is moved in a predetermined direction so that the position of the contact needle in the sample direction decreases, contact is made onto the sample surface. As the force applied by the needle increases, the amount of twisting of the elastic lever member due to the frictional force between the sample surface and the contacting needle (maximum displacement in the vibration direction during one vibration or one-way movement of the lever member) increases at a nearly constant rate with respect to the displacement of the contact needle in the sample direction. When the force applied by the contact needle on the sample surface exceeds a certain value, changes occur on the sample surface such as peeling off of the coating on the sample surface, and this causes the frictional force between the sample surface and the contact needle to increase. The amount of twist of the elastic lever member also changes irregularly due to the sudden change. The force applied by the contact needle onto the sample surface at this time can be accurately determined from the elastic modulus of the elastic lever member and the amount of displacement of the contact needle in a direction approximately perpendicular to the sample surface. Mechanical properties of the sample surface, such as adhesion strength, can be obtained.
これによれば、接触針の試料面と略垂直方向の変位が直
接正確に計測され、試料表面変化時における接触針の負
荷が正確に求められるため、試料表面が凹面や凸面等平
面でない場合でも、正確に試料表面の力学的特性が得ら
れる。According to this method, the displacement of the contact needle in a direction approximately perpendicular to the sample surface can be directly and accurately measured, and the load on the contact needle when the sample surface changes can be accurately determined, even when the sample surface is not flat, such as concave or convex. , the mechanical properties of the sample surface can be accurately obtained.
[実施例] 以下、図面を用いて本発明の詳細な説明する。[Example] Hereinafter, the present invention will be explained in detail using the drawings.
第1図は本発明の一実施例に係る水平振動型引っかき試
験機を示す模式図である。同図において、弾性体レバー
109は圧電素子107に固定されており、弾性体レバ
ー109の先端下部には下方へ伸びる接触針110が、
先端上部には上方を向いた反射鏡108がそれぞれ固定
されている。加振装置取付台101は試験機本体(図示
せず)に固定されており、加振装置取付台101には加
振装置102が取り付けである。加振装置102は発振
器103によりX軸方向へ低周波振動させられる。弾性
体レバー109が固定された圧電素子107は加振装置
102に固定されている。弾性体レバー109がX軸方
向の荷重によりX軸方向に変位を生じると圧電素子10
7が電位を生じ、この電位は圧電素子107と電気的に
接続されているアンプ105によって増幅される。FIG. 1 is a schematic diagram showing a horizontal vibration type scratch tester according to an embodiment of the present invention. In the figure, an elastic lever 109 is fixed to a piezoelectric element 107, and a contact needle 110 extending downward is provided at the lower end of the elastic lever 109.
A reflecting mirror 108 facing upward is fixed at the top of each tip. The vibration device mount 101 is fixed to the test machine main body (not shown), and the vibration device 102 is attached to the vibration device mount 101. The vibration device 102 is caused to vibrate at low frequency in the X-axis direction by an oscillator 103. A piezoelectric element 107 to which an elastic lever 109 is fixed is fixed to a vibrating device 102. When the elastic lever 109 is displaced in the X-axis direction due to a load in the X-axis direction, the piezoelectric element 10
7 generates a potential, which is amplified by an amplifier 105 electrically connected to the piezoelectric element 107.
反射鏡108のほぼ直上には光学式変位計用プローブ1
06が設置されている。光学式変位計用プローブ106
は光学式変位計104に電気的に接続されている。Almost directly above the reflecting mirror 108 is an optical displacement meter probe 1.
06 is installed. Optical displacement meter probe 106
is electrically connected to the optical displacement meter 104.
一方、接触針110下方のxyz軸微動装置112上に
は固定機構(図示せず)により試料111が固定して載
置されている。XYZ軸微動装置112は図に示すX、
YおよびZ軸方向に微動可能となっており、試料111
と接触針110との位置関係を自在に設定できる。また
Y軸方向へは所望の速度にて移動可能となっている。さ
らにθ方向に回動可能となっている。On the other hand, a sample 111 is fixedly placed on an xyz-axis fine movement device 112 below the contact needle 110 by a fixing mechanism (not shown). The XYZ axis fine movement device 112 is
It is possible to move slightly in the Y and Z axis directions, and the sample 111
The positional relationship between the contact needle 110 and the contact needle 110 can be freely set. Furthermore, it is movable in the Y-axis direction at a desired speed. Furthermore, it is rotatable in the θ direction.
次に、この装置を用いて試料表面の薄膜の密着力を測定
する方法を述へる。Next, a method for measuring the adhesion of a thin film on a sample surface using this device will be described.
まず、試料表面の被測定カ所において接触針110が試
料111と適当な間隔を置いて対向するように試料11
1の位置を調節する。さらに試料表面か、接触針110
の長平方向に対して垂直な位置から僅かに傾き、試料表
面が図において右上がりとなるように試料をθ方向に回
転する。そして、加振装置102をX軸方向に低周波振
動させて、接触針110を試料表面上でX軸方向に低周
波振動させる。そして、この低周波振動と共に試料11
1をマイナスY方向(紙面の左側)へ等速で移動させる
。試料111がY方向に移動するにつれ接触針110と
接する試料表面はZ軸方向(紙面上方)へ向うため、弾
性体レバー109も同一方向へと変位を生じる。この時
の変位量は光学式変位計104により反射鏡108と光
学式変位計用プローブ106との距離の変化から検出さ
れる。また、接触針110により試料表面上の薄膜にか
かる荷重は前記変位量と弾性体レバー109のばね常数
より求められる。First, place the sample 111 so that the contact needle 110 faces the sample 111 with an appropriate distance at the location to be measured on the sample surface.
Adjust position 1. Furthermore, the surface of the sample or the contact needle 110
The sample is rotated in the θ direction so that the sample surface is tilted slightly from a position perpendicular to the longitudinal direction of the sample and the sample surface is upward-slanted to the right in the figure. Then, the vibration device 102 is caused to vibrate at a low frequency in the X-axis direction, and the contact needle 110 is caused to vibrate at a low frequency in the X-axis direction on the sample surface. Along with this low frequency vibration, the sample 11
1 in the minus Y direction (left side of the page) at a constant speed. As the sample 111 moves in the Y direction, the surface of the sample in contact with the contact needle 110 moves in the Z-axis direction (upward in the paper), and therefore the elastic lever 109 is also displaced in the same direction. The amount of displacement at this time is detected by the optical displacement meter 104 from a change in the distance between the reflecting mirror 108 and the optical displacement meter probe 106. Further, the load applied to the thin film on the sample surface by the contact needle 110 is determined from the amount of displacement and the spring constant of the elastic lever 109.
このとき、薄膜にかかる荷重が小さいときは加振装置1
02と弾性体レバー109は一体としてX軸方向に振動
する。しかし、試料111の移動にともなって、試料表
面の薄膜にかかる荷重が多きくなるため、接触針110
と試料表面上の薄膜との間の摩擦力が増加する。すると
、加振装置102の振動に弾性体レバー109の振動が
追随しなくなるため、弾性体レバー109と圧電素子1
07間にねじりの変位が生じる。このねじりの変位は、
アンプ105によって検出される。At this time, if the load applied to the thin film is small, the vibration device 1
02 and the elastic lever 109 vibrate together in the X-axis direction. However, as the sample 111 moves, the load applied to the thin film on the sample surface increases, so the contact needle 111
The frictional force between the sample and the thin film on the sample surface increases. Then, since the vibration of the elastic lever 109 no longer follows the vibration of the vibration excitation device 102, the elastic lever 109 and the piezoelectric element 1
A torsional displacement occurs between 0.07 and 0.07. This torsional displacement is
Detected by amplifier 105.
ここで、ねじりの変位量は前記荷重の増加につれて増加
するが、前記荷重がある値に達すると、ねじりの変位量
は急激に変化する。これは、接触針110の接している
部分の薄膜が破断することにより前記摩擦力が下地の摩
擦力に変わることによる。したがって、ねじり変位の激
変した箇所の荷重によりその薄膜の密着力が測定できる
のである。Here, the amount of torsional displacement increases as the load increases, but when the load reaches a certain value, the amount of torsional displacement changes rapidly. This is because the frictional force changes to the frictional force of the base when the thin film in the area in contact with the contact needle 110 is broken. Therefore, the adhesion force of the thin film can be measured by the load at the location where the torsional displacement has drastically changed.
第2図は本発明の別の実施例に係る水平振動型引っかき
試験機を示す模式図である。FIG. 2 is a schematic diagram showing a horizontal vibration type scratch tester according to another embodiment of the present invention.
上述実施例と異なるのは、反射鏡108および光学式変
位計用プローブ106の代りに接地側電極208および
静電容量測定用プローブ206を設け、これらにより両
者間の距離を測定し、静電容量ブリッジ204aを介し
てアンプ204bよりこの距離が電流値の変化として検
出される。他の動作は上述実施例の場合と同様である。The difference from the above embodiment is that a grounding electrode 208 and a capacitance measuring probe 206 are provided in place of the reflecting mirror 108 and the optical displacement meter probe 106, and the distance between them is measured using these, and the capacitance is measured. This distance is detected as a change in current value by the amplifier 204b via the bridge 204a. Other operations are the same as in the above embodiment.
次に、第1図に示した試験機を用いてガラス表面上の蒸
着膜の密着力を測定した例を説明する。Next, an example in which the adhesion of a vapor deposited film on a glass surface was measured using the testing machine shown in FIG. 1 will be described.
測定した試料は下記a ’−cの3種類である。The samples measured were of the following three types: a' to c.
試料a:片面がフラットで他の面が曲率半径10mmの
凸面であるレンズ(材質はBK−7)にMgF2の薄膜
を真空蒸着により形成したものである。薄膜形成の際の
基板温度は300℃であり、形成された薄膜の膜厚は1
000人である。Sample a: A thin film of MgF2 was formed by vacuum evaporation on a lens (material: BK-7) with one side flat and the other side convex with a radius of curvature of 10 mm. The substrate temperature during thin film formation was 300°C, and the thickness of the formed thin film was 1
000 people.
試料b・片面かフラットで他の面が極率半径10n+m
の凹面であるレンズに上記と同一条件で成膜を行なった
ものである。Sample B: One side or flat, the other side has a polarity radius of 10n+m
The film was formed on a concave lens under the same conditions as above.
試料C:両面がフラットであるBK−7(直径30mm
)の板材に上記と同一条件で成膜を行なったものである
。Sample C: BK-7 with flat both sides (diameter 30 mm
) The film was formed on the plate material under the same conditions as above.
接触針としては、ダイヤモンド製で先端の半径が15μ
mのものを用いた。弾性体レバーとしてはそのZ方向の
変位と荷重の関係が0.1グラムの荷重に対し1μmの
変位をリニアに示すものを使用した。スクラッチスピー
ドは試料のマイナスY方向の移動速度を8μm/SeC
とした。弾性体レバーの水平振動周波数は30Hzとし
た。The contact needle is made of diamond and has a tip radius of 15μ.
m was used. The elastic lever used had a relationship between the displacement in the Z direction and the load, which showed a linear displacement of 1 μm for a load of 0.1 gram. The scratch speed is the moving speed of the sample in the minus Y direction at 8 μm/SeC.
And so. The horizontal vibration frequency of the elastic lever was 30 Hz.
測定に際しては、まず、試料aをフラット面が下となる
ように試験機のXYZ微動移動装置上に載置する。ただ
し、XYZ微動移動装置の傾きθはθ=0°とする。そ
して、XYZ微動移動装置の位置調節をした後、試料a
をマイナスY方向に等速で移動させる。このとき接触針
の上方向変位に対応して光学式変位計より検出される荷
重をX軸にとり、アンプから得られるゲインの相対値を
Y軸にとって連続的にプロットし、ゲインの相対値の激
変ケ所すなわち、試料表面の薄膜の破壊点を求める。In the measurement, first, sample a is placed on the XYZ fine movement device of the testing machine so that the flat side faces down. However, the inclination θ of the XYZ fine movement device is θ=0°. After adjusting the position of the XYZ fine movement device, sample a
is moved at a constant speed in the minus Y direction. At this time, the load detected by the optical displacement meter corresponding to the upward displacement of the contact needle is plotted on the X-axis, and the relative value of the gain obtained from the amplifier is plotted continuously on the Y-axis. In other words, find the breaking point of the thin film on the sample surface.
同様にして、試料すおよび試料Cについてもゲインの激
変個所を求める。ただし試料Cにおいてはθ=2’
とする。Similarly, for sample S and sample C, locations where the gain changes drastically are determined. However, in sample C, θ=2'
shall be.
このようにして求めた試料aNCについての荷重−アン
プゲイン相対値のグラフを重ね合わせたものか、第4図
である。図中、曲線5Il−3cはそれぞれ試料a ”
−’ cについての結果を示す。FIG. 4 is a superimposed graph of the load-amplifier gain relative value for the sample aNC obtained in this manner. In the figure, curves 5Il-3c are for sample a''
-' The results for c are shown.
これによれは、同一材料でかつ同一成膜条件であれば、
たとえ試料面形状が異なる場合であっても再現性よく膜
の密着力を測定することができることがわかる。This means that if the material is the same and the film formation conditions are the same,
It can be seen that the adhesion of the film can be measured with good reproducibility even when the sample surface shape is different.
なお、実施例においては、接触針と試料表面との間の摩
擦力により生じる弾性体レバーの変位を圧電素子により
検出しているが、本発明はこの方法に限定されるもので
はなく、前記変位を高感度に検出できる手段であればど
のような方法でもよい。他の方法として例えばレコード
ブレヤーのカートリッジのようにレバーに磁性体を設は
前記変位をコイルで検出する方法でもよい。In the examples, the displacement of the elastic lever caused by the frictional force between the contact needle and the sample surface is detected by a piezoelectric element, but the present invention is not limited to this method, and the displacement Any method that can detect with high sensitivity may be used. Another method may be to provide a magnetic body on the lever, such as in a record player cartridge, and detect the displacement using a coil.
次に、比較例として、接触針にかかる荷重を次に示す方
法を用いた以外は全ての条件を前記実施例と同一にして
同一の試料について第3図に示す従来例の装置を用いて
ゲインの激変ケ所を求めた。Next, as a comparative example, all conditions were the same as in the previous example except that the load applied to the contact needle was changed using the method shown below. I was looking for a place of drastic change.
すなわちここでは、XYz微動装置のθを2゜に設定し
て試料表面は近似的にフラットなものとみなし、したか
つて、試料表面自体もθ=2°であるとみなす。そして
、接触針にかかる荷重は、試料かZ方向へ移動した量を
試料がマイナスY方向へ移動した量から計算により求め
、さらにこれにばね常数をかけあわせることにより求め
る。That is, here, the sample surface is assumed to be approximately flat by setting θ of the XYZ fine movement device to 2°, and the sample surface itself is also assumed to be θ=2°. Then, the load applied to the contact needle is calculated by calculating the amount by which the sample has moved in the Z direction and the amount by which the sample has moved in the minus Y direction, and then by multiplying this by a spring constant.
第5図は、これによって求められた荷重−アンプゲイン
相対値のグラフである。FIG. 5 is a graph of the load-amplifier gain relative value obtained in this manner.
これによれば、同一材料同一成膜条件であっても試料面
形状が異なる場合は再現性よく膜の密着力を測定するこ
とができないことがわかる。According to this, it can be seen that even if the film is formed using the same material and under the same conditions, it is not possible to measure the adhesion of the film with good reproducibility if the sample surface shape is different.
[発明の効果]
以上説明したように、振動型引っかき試験機において、
接触針の試料方向の変位を検出し、それに基づき接触針
にかかる荷重を求めるようにしたため、接触針下にある
試料表面上の薄膜の密着力を精度よく測定することがで
きる。[Effect of the invention] As explained above, in the vibrating scratch tester,
Since the displacement of the contact needle in the sample direction is detected and the load applied to the contact needle is determined based on the detected displacement, the adhesion force of the thin film on the sample surface under the contact needle can be measured with high accuracy.
また、例えば凸レンズ等、平面以外の形状の表面上の薄
膜についても同様に精度良く測定を行なうことができる
。Further, thin films on surfaces of shapes other than flat surfaces, such as convex lenses, can also be measured with high precision.
第1図は、本発明の一実施例に係る水平振動型引っかき
試験機てあフて光学式変位計を用いたものの構成を示し
た正面図、
第2図は、本発明の別の実施例に係る水平振動型引っか
き試験機であって静電容量ブリッジを用いた試験機の構
成を示した正面図、
第3図は、従来例に係る水平振動型引っかき試験機の構
成を示した正面図、
第4図は、第1図の試験機により試料表面の薄膜の破断
点を求めたグラフ、そして
第5図は、比較例として従来の荷重測定方法を用いて試
料表面の薄膜の破断点を求めたグラフである。
101・加振装置取付台、
102 加振装置、
103 発振器、
104・光学式変位計、
105:アンプ、
106:光学式変位計用プローブ、
107・圧電素子、
108 反射鏡、
110 :
111 :
112 :
204 a
204 b
206 :
208 ・
312 :
弾性体レバー
接触針、
試料、
XYZ軸微動装置、
静電容量ブリッジ、
アンプ、
静電容量測定用プローブ、
接地側電極、
オシロスコープ、
試料台。FIG. 1 is a front view showing the configuration of a horizontal vibration type scratch tester according to an embodiment of the present invention using an optical displacement meter, and FIG. 2 is another embodiment of the present invention. FIG. 3 is a front view showing the configuration of a horizontal vibration scratch tester using a capacitance bridge, which is a horizontal vibration scratch tester according to the prior art. , Figure 4 is a graph of the breaking point of the thin film on the sample surface determined using the tester shown in Figure 1, and Figure 5 is a graph showing the breaking point of the thin film on the sample surface determined using the conventional load measurement method as a comparative example. This is the graph I found. DESCRIPTION OF SYMBOLS 101. Vibration device mounting base, 102 Vibration device, 103 Oscillator, 104. Optical displacement meter, 105: Amplifier, 106: Probe for optical displacement meter, 107. Piezoelectric element, 108 Reflector, 110: 111: 112 : 204 a 204 b 206 : 208 ・312 : Elastic lever contact needle, sample, XYZ axis fine movement device, capacitance bridge, amplifier, capacitance measurement probe, ground side electrode, oscilloscope, sample stand.
Claims (3)
接触針の試料面に垂直方向の変位が時間的に可変となる
力を前記接触針に負荷して試料に接触針を接触させる弾
性体レバー部材と、試料を該弾性体レバー部材に対し相
対的に試料面に沿った所定方向に移動させる移動手段と
、前記弾性体レバー部材を保持して前記移動手段による
移動方向に垂直な試料面に沿った方向に振動させる加振
手段と、前記弾性体レバー部材のねじれ状態を検出する
ねじれ状態検出手段と、前記弾性体レバー部材に保持さ
れた接触針の試料面と略垂直方向の変位量を検出する変
位量検出手段とを具備することを特徴とする振動型引っ
かき試験機。(1) A contact needle that contacts the sample; holding the contact needle; and applying a force to the contact needle that causes the displacement of the contact needle in a direction perpendicular to the sample surface to vary over time; an elastic lever member brought into contact; a moving means for moving the sample in a predetermined direction along the sample surface relative to the elastic lever member; and a moving means for holding the elastic lever member in a direction of movement by the moving means. an excitation means for vibrating in a direction along a vertical sample surface; a torsion state detection means for detecting a twist state of the elastic lever member; and a contact needle held by the elastic lever member substantially perpendicular to the sample surface. 1. A vibratory scratch tester comprising: displacement amount detection means for detecting a displacement amount in a direction.
れた反射鏡と、この反射鏡による反射光を受光して接触
針の変位を検出するための光学式変位計用プローブとを
備えた請求項1記載の振動型引っかき試験機。(2) The displacement detection means includes a reflecting mirror whose position is fixed with respect to the contact needle, and an optical displacement meter probe for detecting the displacement of the contact needle by receiving the reflected light from the reflecting mirror. The vibrating scratch tester according to claim 1, further comprising:
れた設置電極と、これと対になって電荷を蓄積し、その
容量を検出するための静電容量測定用プローブとを備え
た、請求項1記載の振動型引っかき試験機。(3) The displacement amount detection means includes an installed electrode whose position is fixed with respect to the contact needle, and a capacitance measuring probe that is paired with the installed electrode to accumulate electric charge and detect the capacitance. A vibrating scratch tester according to claim 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11521690A JP2737023B2 (en) | 1990-05-02 | 1990-05-02 | Vibration type scratch tester |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11521690A JP2737023B2 (en) | 1990-05-02 | 1990-05-02 | Vibration type scratch tester |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0412244A true JPH0412244A (en) | 1992-01-16 |
JP2737023B2 JP2737023B2 (en) | 1998-04-08 |
Family
ID=14657239
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11521690A Expired - Fee Related JP2737023B2 (en) | 1990-05-02 | 1990-05-02 | Vibration type scratch tester |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2737023B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100471677B1 (en) * | 2002-11-30 | 2005-03-09 | 한국표준과학연구원 | A scratch tester using three axis-load cell |
JP2009300410A (en) * | 2008-06-12 | 2009-12-24 | Resuka:Kk | Scratch testing method and device using acceleration detection method |
KR20180080015A (en) * | 2017-01-03 | 2018-07-11 | 주식회사 엘지화학 | Manufacturing system for secondary battery electrode with scratch tester |
-
1990
- 1990-05-02 JP JP11521690A patent/JP2737023B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100471677B1 (en) * | 2002-11-30 | 2005-03-09 | 한국표준과학연구원 | A scratch tester using three axis-load cell |
JP2009300410A (en) * | 2008-06-12 | 2009-12-24 | Resuka:Kk | Scratch testing method and device using acceleration detection method |
KR20180080015A (en) * | 2017-01-03 | 2018-07-11 | 주식회사 엘지화학 | Manufacturing system for secondary battery electrode with scratch tester |
Also Published As
Publication number | Publication date |
---|---|
JP2737023B2 (en) | 1998-04-08 |
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