JP2737023B2 - Vibration type scratch tester - Google Patents

Vibration type scratch tester

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Publication number
JP2737023B2
JP2737023B2 JP11521690A JP11521690A JP2737023B2 JP 2737023 B2 JP2737023 B2 JP 2737023B2 JP 11521690 A JP11521690 A JP 11521690A JP 11521690 A JP11521690 A JP 11521690A JP 2737023 B2 JP2737023 B2 JP 2737023B2
Authority
JP
Japan
Prior art keywords
sample
contact needle
contact
displacement
sample surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP11521690A
Other languages
Japanese (ja)
Other versions
JPH0412244A (en
Inventor
誠 亀山
修司 村上
淳一 坂本
仁 立川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP11521690A priority Critical patent/JP2737023B2/en
Publication of JPH0412244A publication Critical patent/JPH0412244A/en
Application granted granted Critical
Publication of JP2737023B2 publication Critical patent/JP2737023B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、固体表面や固体表面上に形成された薄膜の
力学的特性を測定する振動型引っかき試験機に関するも
のである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vibration type scratch tester for measuring mechanical properties of a solid surface or a thin film formed on the solid surface.

[従来の技術] 真空蒸着、スパッタ、イオンプレーティング等各種の
薄膜形成手段により形成された固体表面上の薄膜の品質
向上のため、その薄膜の基材に対する密着力を正確に測
定することが重要な課題となってきている。
[Prior art] To improve the quality of a thin film on a solid surface formed by various thin film forming means such as vacuum deposition, sputtering, and ion plating, it is important to accurately measure the adhesion of the thin film to a substrate. Has become a major challenge.

従来、薄膜の密着力を測定する手段として特開昭63−
140939号公報による装置が知られている。この装置につ
き第3図を用いて説明する。
Conventionally, as a means for measuring the adhesion of a thin film,
A device according to 140 939 is known. This device will be described with reference to FIG.

この装置は加振装置102と、加振装置102により加振さ
れる接触針110と、試料台112とを備え、試験に際して
は、試料台112上に試料111を載置し、接触針110を試料
表面に接触させた後、接触針110を低周波加振させる。
そして、その間に接触針110と試料表面との間で発生す
る摩擦力に対応する振動出力を検出し、この検出出力の
大きさおよび波形とその変化によって力学特性を測定す
ることを特徴とする。以下、このような装置を水平振動
型引っかき試験機という。
This apparatus includes a vibrating device 102, a contact needle 110 vibrated by the vibrating device 102, and a sample table 112. During a test, a sample 111 is placed on the sample table 112, and the contact needle 110 is After being brought into contact with the sample surface, the contact needle 110 is vibrated at a low frequency.
Then, a vibration output corresponding to a frictional force generated between the contact needle 110 and the sample surface during that time is detected, and the dynamic characteristics are measured based on the magnitude and waveform of the detected output and its change. Hereinafter, such a device is referred to as a horizontal vibration type scratch tester.

この試験機において、薄膜の基材に対する密着力を求
めるには、接触針110によって薄膜に対し負荷する荷重
を測定することが不可欠であり、この荷重の測定精度が
この密着力の測定精度を決定する。
In this tester, in order to determine the adhesion of the thin film to the substrate, it is essential to measure the load applied to the thin film by the contact needle 110, and the measurement accuracy of this load determines the measurement accuracy of this adhesion. I do.

[発明が解決しようとする課題] しかしながら、このような従来技術においては、試料
に負荷される接触針の荷重を測定する有効な手段が存在
せず、したがって測定精度が十分でない。
[Problems to be Solved by the Invention] However, in such a conventional technique, there is no effective means for measuring the load of the contact needle applied to the sample, and thus the measurement accuracy is not sufficient.

本発明の目的は、このような従来技術の問題点に鑑
み、振動型引っかき試験機において、接触針によって試
料に負荷される荷重を測定する有効な手段を提供し、試
験機の測定精度を向上させることにある。
An object of the present invention is to provide an effective means for measuring the load applied to a sample by a contact needle in a vibration-type scratch tester in view of the problems of the related art, and improve the measurement accuracy of the tester. To make it happen.

また、本発明の他の目的は、このような試験機におい
て、フラットでない試験表面の測定をも可能にすること
にある。
Another object of the present invention is to enable measurement of a non-flat test surface in such a testing machine.

[課題を解決するための手段] 上記目的を達成するため本発明の振動型引っかき試験
機は、試料に接触する接触針と、該接触針を保持し、該
接触針の試料面に垂直方向の変位が時間的に可変となる
力を前記接触針に負荷して試料に接触針を接触させる弾
性体レバー部材と、試料を該弾性体レバー部材に対し相
対的に試料面に沿った所定方向に移動させる移動手段
と、前記弾性体レバー部材を保持して前記移動手段によ
る移動方向に垂直な試料面に沿った方向に振動させる加
振手段と、前記弾性体レバー部材のねじれ状態を検出す
るねじれ状態検出手段と、前記弾性体レバー部材に保持
された接触針の試料面と略垂直方向の変位量を検出する
変位量検出手段とを備える。
[Means for Solving the Problems] In order to achieve the above object, a vibration-type scratch tester of the present invention includes a contact needle that contacts a sample, and holds the contact needle. An elastic lever member that applies a force whose displacement is temporally variable to the contact needle to contact the contact needle with the sample, and moves the sample in a predetermined direction along the sample surface relative to the elastic lever member. Moving means for moving, vibrating means for holding the elastic lever member and vibrating in a direction along a sample surface perpendicular to the moving direction of the moving means, and torsion detecting a torsion state of the elastic lever member State detecting means; and a displacement amount detecting means for detecting a displacement amount of the contact needle held by the elastic lever member in a direction substantially perpendicular to the sample surface.

変位検出手段としては、例えば、接触針に対して位置
が固定された反射鏡と、この反射鏡による反射光を受光
して接触針の変位を検出するための光学式変位計用プロ
ーブとを備えた光学式の検出手段や、接触針に対して位
置が固定された設置電極と、これと対になって電荷を蓄
積し、その容量を検出するための静電容量測定用プロー
ブとを備えた、静電容量型のものを用いることができ
る。
The displacement detecting means includes, for example, a reflecting mirror whose position is fixed with respect to the contact needle, and an optical displacement meter probe for receiving light reflected by the reflecting mirror and detecting displacement of the contact needle. Optical detection means, an installation electrode whose position is fixed with respect to the contact needle, and an electrostatic capacitance measurement probe for detecting the capacitance by pairing with the storage electrode and storing the charge. Alternatively, a capacitance type can be used.

[作用] この構成において、弾性体レバー部材を振動させなが
ら、接触針を試料に接触させつつ、接触針の試料方向位
置が減少するように試料を所定方向に移動させると、試
料面上へ接触針が負荷する力が増加し、それにともなっ
て試料面と接触針間の摩擦力による弾性体レバー部材の
ねじれ量(レバー部材の1回振動中あるいは1回片道移
動中の振動方向最大変位量)が接触針の試料方向位置の
変位に対しほぼ一定の率で増加する。そして、試料面上
へ接触針が負荷する力が一定値を超えると、試料面上の
被膜が剥離されるなどの試料面上の変化が生じ、これに
よって試料面と接触針間の摩擦力が急激に変化して弾性
体レバー部材のねじれ量も不規則に変動する。このとき
の試料面上へ接触針が負荷する力が、弾性体レバー部材
の弾性係数および接触針の試料面と略垂直方向の変位量
から正確に求められ、これに基づいて、試料面に対する
薄膜の密着強度などの試料表面の力学的特性が得られ
る。
[Operation] In this configuration, when the elastic body lever member is vibrated and the contact needle is brought into contact with the sample and the sample is moved in a predetermined direction so that the position of the contact needle in the sample direction is reduced, the contact on the sample surface occurs. The force applied by the needle increases, and the amount of torsion of the elastic lever member due to the frictional force between the sample surface and the contact needle (the maximum displacement in the vibration direction during one-time vibration of the lever member or one-way movement of the lever member) Increases at a substantially constant rate with respect to the displacement of the contact needle in the direction of the sample. When the force applied by the contact needle onto the sample surface exceeds a certain value, a change occurs on the sample surface such as peeling of the coating on the sample surface, and the frictional force between the sample surface and the contact needle is reduced. Abruptly changing, the amount of twist of the elastic lever member also fluctuates irregularly. The force applied by the contact needle onto the sample surface at this time is accurately determined from the elastic modulus of the elastic lever member and the amount of displacement of the contact needle in a direction substantially perpendicular to the sample surface. The mechanical properties of the sample surface such as the adhesion strength of the sample can be obtained.

これによれば、接触針の試料面と略垂直方向の変位が
直接正確に計測され、試料表面変化時における接触針の
負荷が正確に求められるため、試料表面が凹面や凸面等
平面でない場合でも、正確に試料表面の力学的特性が得
られる。
According to this, the displacement of the contact needle in a direction substantially perpendicular to the sample surface is directly and accurately measured, and the load of the contact needle when the sample surface changes is accurately determined. Therefore, even when the sample surface is not a flat surface such as a concave surface or a convex surface. The mechanical properties of the sample surface can be accurately obtained.

[実施例] 以下、図面を用いて本発明の実施例を説明する。Embodiment An embodiment of the present invention will be described below with reference to the drawings.

第1図は本発明の一実施例に係る水平振動型引っかき
試験機を示す模式図である。同図において、弾性体レバ
ー109は圧電素子107に固定されており、弾性体レバー10
9の先端下部には下方へ伸びる接触針110が、先端上部に
は上方を向いた反射鏡108がそれぞれ固定されている。
加振装置取付台101は試験機本体(図示せず)に固定さ
れており、加振装置取付台101には加振装置102が取り付
けてある。加振装置102は発振器103によりX軸方向へ低
周波振動させられる。弾性体レバー109が固定された圧
電素子107は加振装置102に固定されている。弾性体レバ
ー109がX軸方向の荷重によりX軸方向に変位を生じる
と圧電素子107が電位を生じ、この電位は圧電素子107と
電気的に接続されているアンプ105によって増幅され
る。反射鏡108のほぼ直上には光学式変位計用プローブ1
06が設置されている。光学式変位計用プローブ106は光
学式変位計104に電気的に接続されている。
FIG. 1 is a schematic view showing a horizontal vibration type scratch tester according to one embodiment of the present invention. In the figure, the elastic lever 109 is fixed to the piezoelectric element 107, and the elastic lever 10
A contact needle 110 extending downward is fixed to the lower end of the tip 9 and a reflecting mirror 108 facing upward is fixed to the upper end of the tip.
The vibration device mounting base 101 is fixed to a test machine main body (not shown), and a vibration device 102 is mounted on the vibration device mounting table 101. The vibration device 102 is oscillated by the oscillator 103 at a low frequency in the X-axis direction. The piezoelectric element 107 to which the elastic lever 109 is fixed is fixed to the vibration device 102. When the elastic body lever 109 is displaced in the X-axis direction due to a load in the X-axis direction, the piezoelectric element 107 generates a potential, and this potential is amplified by the amplifier 105 electrically connected to the piezoelectric element 107. Almost directly above the reflector 108, an optical displacement meter probe 1
06 is installed. The optical displacement meter probe 106 is electrically connected to the optical displacement meter 104.

一方、接触針110下方のXYZ軸微動装置112上には固定
機構(図示せず)により試料111が固定して載置されて
いる。XYZ軸微動装置112は図に示すX,YおよびZ軸方向
に微動可能となっており、試料111と接触針110との位置
関係を自在に設定できる。またY軸方向へは所望の速度
にて移動可能となっている。さらにθ方向に回動可能と
なっている。
On the other hand, the sample 111 is fixedly mounted on the XYZ axis fine movement device 112 below the contact needle 110 by a fixing mechanism (not shown). The XYZ axis fine movement device 112 is capable of fine movement in the X, Y and Z axis directions shown in the figure, and can freely set the positional relationship between the sample 111 and the contact needle 110. Further, it can move at a desired speed in the Y-axis direction. Furthermore, it is rotatable in the θ direction.

次に、この装置を用いて試料表面の薄膜の密着力を測
定する方法を述べる。
Next, a method for measuring the adhesion of the thin film on the sample surface using this apparatus will be described.

まず、試料表面の被測定カ所において接触針110が試
料111と適当な間隔を置いて対向するように111の位置を
調節する。さらに試料表面が、接触針110の長手方向に
対して垂直な位置から僅かに傾き、試料表面が図におい
て右上がりとなるように試料をθ方向に回転する。そし
て、加振装置102をX軸方向に低周波振動させて、接触
針110を試料表面上でX軸方向に低周波振動させる。そ
して、この低周波振動と共に試料111をマイナスY方向
(紙面の左側)へ等速で移動させる。試料111がY方向
に移動するにつれ接触針110と接する試料表面はZ軸方
向(紙面上方)へ向うため、弾性体レバー109も同一方
向へと変位を生じる。この時の変位量は光学式変位計10
4により反射鏡108と光学式変位計用プローブ106との距
離の変化から検出される。また、接触針110により試料
表面上の薄膜にかかる荷重は前記変位量と弾性体レバー
109のばね常数より求められる。
First, the position of the contact needle 110 is adjusted so that the contact needle 110 faces the sample 111 at an appropriate distance at the measurement point on the sample surface. Further, the sample surface is slightly tilted from a position perpendicular to the longitudinal direction of the contact needle 110, and the sample is rotated in the θ direction so that the sample surface rises to the right in the figure. Then, the vibration device 102 is vibrated at a low frequency in the X-axis direction, and the contact needle 110 is vibrated at a low frequency in the X-axis direction on the sample surface. Then, along with the low-frequency vibration, the sample 111 is moved at a constant speed in the minus Y direction (left side of the drawing). As the sample 111 moves in the Y direction, the surface of the sample in contact with the contact needle 110 is directed in the Z-axis direction (upward on the paper), and the elastic lever 109 is also displaced in the same direction. The amount of displacement at this time is an optical displacement meter 10
4 detects the change in the distance between the reflecting mirror 108 and the optical displacement meter probe 106. The load applied to the thin film on the sample surface by the contact needle 110 is the displacement amount and the elastic lever.
Obtained from 109 spring constants.

このとき、薄膜にかかる荷重が小さいときは加振装置
102と弾性体レバー109は一体としてX軸方向に振動す
る。しかし、試料111の移動にともなって、試料表面の
薄膜にかかる荷重が多きくなるため、接触針110と試料
表面上の薄膜との間の摩擦力が増加する。すると、加振
装置102の振動に弾性体レバー109の振動が追随しなくな
るため、弾性体レバー109と圧電素子107間にねじりの変
位が生じる。このねじりの変位は、アンプ105によって
検出される。
At this time, if the load on the thin film is small,
The 102 and the elastic lever 109 vibrate integrally in the X-axis direction. However, the load applied to the thin film on the sample surface increases with the movement of the sample 111, so that the frictional force between the contact needle 110 and the thin film on the sample surface increases. Then, since the vibration of the elastic body lever 109 does not follow the vibration of the vibration device 102, a torsional displacement occurs between the elastic body lever 109 and the piezoelectric element 107. This torsional displacement is detected by the amplifier 105.

ここで、ねじりの変位量は前記荷重の増加につれて増
加するが、前記荷重がある値に達すると、ねじりの変位
量は急激に変化する。これは、接触針110の接している
部分の薄膜が破断することにより前記摩擦力が下地の摩
擦力に変わることによる。したがって、ねじり変位の激
変した箇所の荷重によりその薄膜の密着力が測定できる
のである。
Here, the torsional displacement increases as the load increases, but when the load reaches a certain value, the torsional displacement rapidly changes. This is because the frictional force is changed to the frictional force of the substrate when the thin film of the portion in contact with the contact needle 110 is broken. Therefore, the adhesive force of the thin film can be measured based on the load at the place where the torsional displacement has drastically changed.

第2図は本発明の別の実施例に係る水平振動型引っか
き試験機を示す模式図である。
FIG. 2 is a schematic view showing a horizontal vibration type scratch tester according to another embodiment of the present invention.

上述実施例と異なるのは、反射鏡108および光学式変
位計用プローブ106の代りに接地側電極208および静電容
量測定用プローブ206を設け、これらにより両者間の距
離を測定し、静電容量ブリッジ204aを介してアンプ204b
よりこの距離が電流値の変化として検出される。他の動
作は上述実施例の場合と同様である。
The difference from the above-described embodiment is that a ground electrode 208 and a capacitance measuring probe 206 are provided in place of the reflecting mirror 108 and the optical displacement meter probe 106, and the distance between them is measured. Amplifier 204b via bridge 204a
This distance is detected as a change in the current value. Other operations are the same as those in the above embodiment.

次に、第1図に示した試験機を用いてガラス表面上の
蒸着膜の密着力を測定した例を説明する。
Next, an example in which the adhesion of the deposited film on the glass surface is measured using the tester shown in FIG. 1 will be described.

測定した試料は下記a〜cの3種類である。 The measured samples are the following three types a to c.

試料a:片面がフラットで他の面が曲率半径10mmの凸面で
あるレンズ(材質はBK−7)にMgF2の薄膜を真空蒸着に
より形成したものである。薄膜形成の際の基板温度は30
0℃であり、形成された薄膜の膜厚は1000Åである。
Sample a: A MgF 2 thin film was formed on a lens (material: BK-7) having a flat surface on one side and a convex surface with a radius of curvature of 10 mm by vacuum evaporation. Substrate temperature for thin film formation is 30
The temperature was 0 ° C., and the thickness of the formed thin film was 1000 °.

試料b:片面がフラットで他の面が極率半径10mmの凹面で
あるレンズに上記と同一条件で成膜を行なったものであ
る。
Sample b: A film formed on a lens having a flat surface on one side and a concave surface with a radius of curvature of 10 mm on the other side under the same conditions as described above.

試料c:両面がフラットであるBK−7(直径30mm)の板材
に上記と同一条件で成膜を行なったものである。
Sample c: A film was formed on a BK-7 (30 mm diameter) plate material having flat surfaces on both sides under the same conditions as above.

接触針としては、ダイヤモンド製で先端の半径が15μ
mのものを用いた。弾性体レバーとしてはそのZ方向の
変位と荷重の関係が0.1グラムの荷重に対し1μmの変
位をリニアに示すものを使用した。スクラッチスピード
は試料のマイナスY方向の移動速度を8μm/secとし
た。弾性体レバーの水平振動周波数は30Hzとした。
The contact needle is made of diamond and has a tip radius of 15μ.
m. As the elastic lever, a lever having a relationship between the displacement in the Z direction and the load linearly showing a displacement of 1 μm with respect to a load of 0.1 gram was used. As for the scratch speed, the moving speed of the sample in the minus Y direction was 8 μm / sec. The horizontal vibration frequency of the elastic lever was 30 Hz.

測定に際しては、まず、試料aをフラット面が下とな
るように試験機のXYZ微動移動装置上に載置する。ただ
し、XYZ微動移動装置の傾きθはθ=0゜とする。そし
て、XYZ微動移動装置の位置調節をした後、試料aをマ
イナスY方向に等速で移動させる。このとき接触針の上
方向変位に対応して光学式変位計より検出される荷重を
X軸にとり、アンプから得られるゲインの相対値をY軸
にとって連続的にプロットし、ゲインの相対値の激変ヶ
所すなわち、試料表面の薄膜の破壊点を求める。
At the time of measurement, first, the sample a is placed on the XYZ fine movement moving device of the testing machine such that the flat surface faces down. However, the inclination θ of the XYZ fine movement moving device is θ = 0 °. Then, after adjusting the position of the XYZ fine movement moving device, the sample a is moved at a constant speed in the minus Y direction. At this time, the load detected by the optical displacement meter corresponding to the upward displacement of the contact needle is set on the X-axis, and the relative value of the gain obtained from the amplifier is continuously plotted on the Y-axis. In other words, the breaking point of the thin film on the sample surface is determined.

同様にして、試料bおよび試料cについてもゲインの
激変個所を求める。ただし試料cにおいてはθ=2゜と
する。
In the same manner, for the sample b and the sample c, a drastic change point of the gain is obtained. However, for sample c, θ = 2 °.

このようにして求めた試料a〜cについての荷重−ア
ンプゲイン相対値のグラフを重ね合わせたものが、第4
図である。図中、曲線Sa〜Scはそれぞれ試料a〜cにつ
いての結果を示す。
The graph obtained by superimposing the graphs of the load-amplifier relative values for the samples a to c obtained in this manner is the fourth.
FIG. Figure shows the results for each curve S a to S c samples a to c.

これによれば、同一材料でかつ同一成膜条件であれ
ば、たとえ試料面形状が異なる場合であっても再現性よ
く膜の密着力を測定することができることがわかる。
According to this, it can be seen that under the same material and under the same film forming conditions, even if the sample surface shape is different, the adhesion of the film can be measured with good reproducibility.

なお、実施例においては、接触針と試料表面との間の
摩擦力により生じる弾性体レバーの変位を圧電素子によ
り検出しているが、本発明はこの方法に限定されるもの
ではなく、前記変位を高感度に検出できる手段であれば
どのような方法でもよい。他の方法として例えばレコー
ドプレヤーのカートリッジのようにレバーに磁性体を設
け前記変位をコイルで検出する方法でもよい。
In the embodiment, the displacement of the elastic lever caused by the frictional force between the contact needle and the sample surface is detected by the piezoelectric element. However, the present invention is not limited to this method. Any method can be used as long as it is a means capable of detecting the stake with high sensitivity. As another method, for example, a method may be used in which a magnetic material is provided on a lever, such as a record player cartridge, and the displacement is detected by a coil.

次に、比較例として、接触針にかかる荷重を次に示す
方法を用いた以外は全ての条件を前記実施例と同一にし
て同一の試料について第3図に示す従来例の装置を用い
てゲインの激変ヶ所を求めた。
Next, as a comparative example, all conditions were the same as in the above-mentioned embodiment except that the load applied to the contact needle was used in the following manner, and the same sample was gained using the conventional apparatus shown in FIG. Sought a place of sudden change.

すなわちここでは、XYZ微動装置のθを2゜に設定し
て試料表面は近似的にフラットなものとみなし、したが
って、試料表面自体もθ=2゜であるとみなす。そし
て、接触針にかかる荷重は、試料がZ方向へ移動した量
を試料がマイナスY方向へ移動した量から計算により求
め、さらにこれにばね常数をかけてあわせることにより
求める。
That is, here, the θ of the XYZ fine movement device is set to 2 °, and the sample surface is regarded as approximately flat, so that the sample surface itself is also regarded as θ = 2 °. The load applied to the contact needle is determined by calculating the amount by which the sample has moved in the Z direction from the amount by which the sample has moved in the minus Y direction, and further multiplying this by a spring constant.

第5図は、これによって求められた荷重−アンプゲイ
ン相対値のグラフである。
FIG. 5 is a graph of the load-amplifier gain relative value thus obtained.

これによれば、同一材料同一成膜条件であっても試料
面形状が異なる再現性よく膜の密着力を測定することが
できないことがわかる。
According to this, it can be seen that even under the same material and the same film forming condition, the adhesion of the film cannot be measured with good reproducibility with different sample surface shapes.

[発明の効果] 以上説明したように、振動型引っかき試験機におい
て、接触針の試料方向の変位を検出し、それに基づき接
触針にかかる荷重を求めるようにしたため、接触針下に
ある試料表面上の薄膜の密着力を精度よく測定すること
ができる。
[Effects of the Invention] As described above, in the vibration-type scratch tester, the displacement of the contact needle in the sample direction is detected, and the load applied to the contact needle is determined based on the displacement. The adhesion of the thin film can be accurately measured.

また、例えば凸レンズ等、平面以外の形状の表面上の
薄膜についても同様に精度良く測定を行なうことができ
る。
Similarly, measurement can be performed with high accuracy on a thin film on a surface other than a flat surface such as a convex lens.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、本発明の一実施例に係る水平振動型引っかき
試験機であって光学式変位計を用いたものの構成を示し
た正面図、 第2図は、本発明の別の実施例に係る水平振動型引っか
き試験機であって静電容量ブリッジを用いた試験機の構
成を示した正面図、 第3図は、従来例に係る水平振動型引っかき試験機の構
成を示した正面図、 第4図は、第1図の試験機により試料表面の薄膜の破断
点を求めたグラフ、そして 第5図は、比較例として従来の荷重測定方法を用いて試
料表面の薄膜の破断点を求めたグラフである。 101:加振装置取付台、 102:加振装置、 103:発振器、 104:光学式変位計、 105:アンプ、 106:光学式変位計用プローブ、 107:圧電素子、 108:反射鏡、 109:弾性体レバー、 110:接触針、 111:試料、 112:XYZ軸微動装置、 204a:静電容量ブリッジ、 204b:アンプ、 206:静電容量測定用プローブ、 208:接地側電極、 301:オシロスコープ、 312:試料台。
FIG. 1 is a front view showing a configuration of a horizontal vibration type scratch tester using an optical displacement meter according to one embodiment of the present invention. FIG. 2 is a front view showing another embodiment of the present invention. FIG. 3 is a front view showing a configuration of a horizontal vibration type scratch tester according to the related art, which is a horizontal vibration type scratch tester and a configuration of a tester using a capacitance bridge; FIG. 4 is a graph showing the breaking point of the thin film on the sample surface obtained by the tester shown in FIG. 1, and FIG. 5 is a comparative example showing the breaking point of the thin film on the sample surface using the conventional load measuring method. FIG. 101: Vibration device mounting base, 102: Vibration device, 103: Oscillator, 104: Optical displacement meter, 105: Amplifier, 106: Optical displacement meter probe, 107: Piezoelectric element, 108: Reflecting mirror, 109: Elastic lever, 110: contact needle, 111: sample, 112: XYZ axis fine movement device, 204a: capacitance bridge, 204b: amplifier, 206: capacitance measurement probe, 208: ground electrode, 301: oscilloscope, 312: Sample table.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 立川 仁 東京都大田区下丸子3丁目30番2号 キ ヤノン株式会社内 (56)参考文献 特開 平3−87637(JP,A) ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hitoshi Tachikawa 3-30-2 Shimomaruko, Ota-ku, Tokyo Inside Canon Inc. (56) References JP-A-3-87637 (JP, A)

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】試料に接触する接触針と、該接触針を保持
し、該接触針の試料面に垂直方向の変位が時間的に可変
となる力を前記接触針に負荷して試料に接触針を接触さ
せる弾性体レバー部材と、試料を該弾性体レバー部材に
対し相対的に試料面に沿った所定方向に移動させる移動
手段と、前記弾性体レバー部材を保持して前記移動手段
による移動方向に垂直な試料面に沿った方向に振動させ
る加振手段と、前記弾性体レバー部材のねじれ状態を検
出するねじれ状態検出手段と、前記弾性体レバー部材に
保持された接触針の試料面と略垂直方向の変位量を検出
する変位量検出手段とを具備することを特徴とする振動
型引っかき試験機。
1. A contact needle for contacting a sample, the contact needle being held by the contact needle, and a force that makes a displacement of the contact needle in a direction perpendicular to a sample surface temporally variable is applied to the contact needle to contact the sample. An elastic lever member for bringing the needle into contact, moving means for moving the sample in a predetermined direction along the sample surface relative to the elastic lever member, and movement by the moving means while holding the elastic lever member Vibrating means for vibrating in a direction along a sample surface perpendicular to the direction, torsion state detecting means for detecting a torsion state of the elastic lever member, and a sample surface of a contact needle held by the elastic lever member. A vibration type scratch tester comprising: a displacement amount detecting means for detecting a displacement amount in a substantially vertical direction.
【請求項2】変位量検出手段は、接触針に対して位置が
固定された反射鏡と、この反射鏡による反射光を受光し
て接触針の変位を検出するための光学式変位計用プロー
ブとを備えた請求項1記載の振動型引っかき試験機。
2. A displacement amount detecting means, comprising: a reflecting mirror fixed in position with respect to the contact needle; and a probe for an optical displacement meter for detecting a displacement of the contact needle by receiving light reflected by the reflecting mirror. The vibration-type scratch tester according to claim 1, comprising:
【請求項3】変位量検出手段は、接触針に対して位置が
固定された設置電極と、これと対になって電荷を蓄積
し、その容量を検出するための静電容量測定用プローブ
とを備えた、請求項1記載の振動型引っかき試験機。
3. The displacement amount detecting means includes an installation electrode whose position is fixed with respect to the contact needle, an electrostatic capacitance measuring probe for accumulating electric charge in pair with the installation electrode, and detecting the capacitance. The vibration-type scratch tester according to claim 1, further comprising:
JP11521690A 1990-05-02 1990-05-02 Vibration type scratch tester Expired - Fee Related JP2737023B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11521690A JP2737023B2 (en) 1990-05-02 1990-05-02 Vibration type scratch tester

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11521690A JP2737023B2 (en) 1990-05-02 1990-05-02 Vibration type scratch tester

Publications (2)

Publication Number Publication Date
JPH0412244A JPH0412244A (en) 1992-01-16
JP2737023B2 true JP2737023B2 (en) 1998-04-08

Family

ID=14657239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11521690A Expired - Fee Related JP2737023B2 (en) 1990-05-02 1990-05-02 Vibration type scratch tester

Country Status (1)

Country Link
JP (1) JP2737023B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100471677B1 (en) * 2002-11-30 2005-03-09 한국표준과학연구원 A scratch tester using three axis-load cell
JP5070146B2 (en) * 2008-06-12 2012-11-07 株式会社レスカ Test method and test apparatus
KR102075098B1 (en) * 2017-01-03 2020-02-07 주식회사 엘지화학 Manufacturing system for secondary battery electrode with scratch tester

Also Published As

Publication number Publication date
JPH0412244A (en) 1992-01-16

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