JPH04110713A - Scanning type probe microscope - Google Patents

Abstract

PURPOSE:To measure the surface of sample accurately be deflecting the optical beam to three directions with an optical deflecting element provided in a photowaveguide passage, and detecting displacement of a probe supporting member with the electrical signal from photoelectric transfer elements receiving the light. CONSTITUTION:The optical beam deflected to three directions by an optical deflecting element provided in a photowaveguide passage is converged on photoelectric transfer elements 17 - 19 to form image-formations O8, O12, O13. The elements 17 - 19 output the electrical signal corresponding to positions of the image-formations O8, O12, O13 to differential circuits 25 - 27. The differential circuits 25 - 27 output the differential signal output Stheta, SH, SV in response to the received electrical signal. The output SV is supplied to a comparison/switch circuit 30, in which the reference signal Ry is input, to stop a coarse adjustment 22 in response to the signal Ry, and drive a Z servo 31 to control a three- dimensional fine adjustment 23. The output Stheta, SH are respectively output to a theta servo 32, a epsilonH servo 33. Servo control in Z direction of a probe and servo control for compensating a shift quantity in X, Y directions can be thereby performed.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a scanning probe microscope for observing minute surface shapes of samples.

[Prior Art] Conventionally, scanning tunneling microscopes (STM), atomic force microscopes (AFM), magnetic force microscopes (MFM), and the like are known as scanning probe microscopes.

The scanning tunneling microscope (STM) is manufactured by Binnig.
nig), Rohrer et al. in 1982
This device was proposed in 2012, and is capable of observing the surface shape of conductive samples on the atomic order.

For more information about this scanning tunneling microscope, see r G, B.
i nni ng, H., Rohrer, Ch., Ger.
ber, and , E, Weibel ;5urra
ce 5tudies by Scanning Tu
nneling old croscope, Phys, Rev
, Lett, Vol. 4957 (1982) J. A scanning tunneling microscope has a conductive probe that is supported near a conductive sample.

For example, by bringing the tip of the probe as close as ins to the sample surface,
When a voltage is applied between the probe and the sample, a tunnel current flows between the two. This tunneling current changes depending on the distance between the tip and the sample, and its magnitude is 0.1r++
The fold diameter changes by one degree with respect to a distance change in g. The probe is moved (e.g. raster scanned) along the sample surface,
During this movement, a control voltage is applied to the piezoelectric body that adjusts the distance between the tip and the sample so that the value of the tunneling current flowing between the tip and the sample remains constant. Keep the distance between them constant. As a result, the tip of the probe moves on a curved surface that reflects the surface shape of the sample. Therefore, a three-dimensional image showing the surface shape of the sample is constructed based on the position data of the tip of the probe calculated from the control voltage applied to the piezoelectric body.

Furthermore, an atomic force microscope (AFM) has been proposed as a device capable of observing the surface shape of an insulator on the atomic order. The details are r G, B1nn1g, C, F,
Quant; Atomic Force Micros
copy.

Phys, Rev. Lett., Vol. 58930 (
198B) Described in J. In this atomic force microscope, the probe is supported by a flexible cantilever. When the probe approaches the sample surface, there is a van der Waals (va) gap between the atoms at the tip of the probe and the atoms on the sample surface.
(under vals) interaction acts, and when the atoms are brought closer to the bond distance, 1. <Uri (P
auli)'s exclusion law works. These attractive forces and repulsive forces (atomic forces) are very small at 10-9 to IQ-12 [N]. When the atom at the tip of the probe receives an atomic force,
The cantilever is displaced depending on its size. When the probe is scanned along the sample surface, the distance between the probe and the sample changes in accordance with the unevenness of the sample surface, causing the cantilever to be displaced.

The amount of displacement of the cantilever is detected, and a fine movement element such as a piezoelectric body is feedback-controlled to keep the amount of displacement of the cantilever constant. Since the voltage applied to the piezoelectric body at this time depends on the surface shape, an uneven image of the sample surface can be obtained from the applied voltage information.

Further, a magnetic force microscope (MFM) has a probe made of a magnetic material, and this configuration is basically the same as that of an atomic force microscope. In this case, as in the case of an atomic force microscope, by keeping the magnetic force acting between the probe and the magnetic particles of the sample constant and scanning the sample surface with the probe, an uneven image of the sample surface can be obtained. I can do it.

In addition, if the probe attached to the cantilever used in an atomic force microscope or magnetic force microscope is made of a conductive material and can detect tunnel current, it is possible to combine the atomic force microscope or magnetic force microscope with scanning tunneling. It can also be used as a microscope.

[Problems to be Solved by the Invention] A cantilever used in AFM or MFM as described above will be explained with reference to FIGS. 6 and 7.

In the figure, reference numeral 1 indicates a cantilever made of 5in2 (or 5i3N4) and having a rectangular outer shape. The cantilever 1 in Fig. 6 is on the proximal end side (hereinafter referred to as the bottom side).
is attached to Pyrex glass 2. The probe 3 is
It is provided on the back surface of the tip end of the cantilever 1 on the opposite side to the bottom side so as to extend downward by a small amount. After depositing SiO2(')m, this probe 3 places an aperture mask on the vapor deposition surface with a distance of about the length of the needle, and in the process of depositing the vapor deposition material from above this mask. , which is shaped like a cone and pointed toward the center.

Further, the cantilever 1 is formed into a thin plate shape using a material that is as light as possible and has a large elastic modulus in order to obtain a large displacement in response to a minute force such as an atomic force or a magnetic force.

By the way, for example, when an external force F is applied to the tip of a cantilever spring having a thickness a1, a base part b1, and a length 1, the displacement ε7 of the tip in the Z direction is εv-413F/a' bE--- ----(1) Also, in Fig. 6, the displacement εH in the Y direction is εo −413F/
a b3E--= (2) E: Represented as the elastic modulus of the cantilever in the longitudinal direction.

From equations (1) and (2), if 1 is made longer, a is made thinner, and b is made smaller, εV and ε□ can be made larger.

However, when the cantilever 1 is lengthened in this way, the natural frequency is lowered, and the response to follow the irregularities of the sample during scanning is lowered.

Here, the natural frequency f of the elastic material. is f o = (E/ mo ) ”' / 2 yr−
(3) mo: Calculated using the formula for the effective mass serving as the load on the elastic material.

Therefore, as is clear from equation (3), cantilever 1
By making the overall thin and narrow rectangular shape and downsizing the probe 3 provided at the tip, the effective mass can be reduced and the natural frequency can be increased.

Today, the shape of a cantilever is such that (thickness a1 base part b, length l) are (0, 3, 80, 100) [μm
Or (0, 6, 120, 200) [μm], etc., and the length of the probe is about 2 μm.

However, if the tip of the probe 3 is shortened to make it smaller, when the tip of the probe 3 comes close to the sample by about 0.1 to 10 nm, the surface of the cantilever 1 and the bottom surface of the Pyrex glass 2 will be Get close to about 2 μm. As a result, in the case of a sample having an uneven surface shape, there is a risk that the cantilever 1 and the substrate of the Pyrex glass 2 will collide with the sample.

Therefore, maintain a sufficient distance between the sample and the cantilever 1,
In order to measure the sample surface without causing the above-mentioned collision, the probe 3 needs to have a sufficient length.

However, if the probe 3 is lengthened, not only will the above-mentioned problem of increase in mass occur, but when the probe 3 is operated along the sample surface by AFM or MFM, there will be distortion in the fabrication of the cantilever 1, and the probe from the sample may be Due to atomic forces such as intermolecular adsorption force and van der Waals force acting on the needle tip, the tip position of the probe 3 shifts toward the sample surface, which may result in measurement errors.

As a countermeasure against this problem, there is a method of minimizing the amount of torsional rotation in the R direction as shown in FIG. 7 by increasing the bottom side of the cantilever 1 shown in FIG.

The displacement angle θ of the tip of the cantilever 1 due to the rotational moment T caused by the shearing force acting on the tip of the cantilever through the probe is: θ-31T/ a ' b G ------・-(
4) G: Represented by the transverse elastic modulus of the cantilever.

The shift amount ΔM of the tip of the probe at this time is 6M − d Sinθ ・・・・・・・・・(
5) is calculated.

However, even if the base part is made larger as described above, it is impossible to completely eliminate the effect of the shearing force, and in this case, the large base part increases the mass of the cantilever. This causes a problem in that the natural frequency of the cantilever decreases and the response to irregularities on the surface of the material deteriorates.

The present invention was made to solve these problems, and its purpose is to reduce the atomic force applied to the tip of the cantilever even when the probe is lengthened and the cantilever is lengthened. The corresponding tip displacement ε9, ε□,
It accurately detects the rotational displacement angle θ corresponding to the rotational moment T in the direction of the sample surface caused by external forces such as atomic forces acting on the tip of the probe. The object of the present invention is to provide a scanning probe microscope that can precisely measure the surface of a sample by taking advantage of the advantages of a long probe by accurately detecting the amount of shift and correcting measurement errors caused by the shift.

[Means for Solving the Problems] In order to solve such problems, the scanning probe microscope of the present invention has a free end portion and a fixed end portion, and a probe is provided on the free end portion. a probe support member; a laser light source provided at a fixed end of the probe support member; an optical waveguide that guides a laser beam from the laser light source to a free end of the probe support member; an optical element that is installed in the laser beam and separates the laser beam into three laser beams perpendicular to each other; and a photoelectric conversion element that receives each of the separated laser beams, converts them into corresponding electrical signals, and outputs them. The present invention is characterized by comprising: a calculation means for receiving each of the electric signals and performing predetermined calculation processing on the received electric signals.

The present invention also provides a probe support member having a free end portion and a fixed end portion, and a probe provided at the free end portion, and a laser light source provided at the fixed end portion of the probe support member. an optical waveguide that guides the laser beam from the laser light source to an aperture provided at the tip of the free end of the probe support member; and receives the laser beam emitted from the aperture;
a first photoelectric conversion element that converts into an electrical signal and outputs it; and first and second photoelectric conversion elements that are provided in the optical waveguide and deflect the laser beam in directions perpendicular to the longitudinal direction of the optical waveguide. an optical element; second and third photoelectric conversion elements that respectively receive the laser beams deflected by the first and second optical elements, convert them into electrical signals, and output the electrical signals; The present invention is characterized in that it includes a calculation means for performing predetermined calculation processing on each received signal.

Furthermore, the present invention is characterized in that the probe support member is a cantilever.

[Operation] With this configuration, the scanning probe microscope of the present invention detects three displacements of the free end of the probe support member and performs predetermined calculations. As a result, it becomes possible to correct measurement errors on the sample surface due to the shift of the probe, allowing precise measurement of the sample surface.

[Example] Hereinafter, an example of the scanning probe microscope of the present invention will be described with reference to FIGS. 1 to 5.

As shown in FIGS. 1 to 4, a laser light source 4 made of a semiconductor laser is provided in the Pyrex glass 2, and a thin rectangular cantilever 1 is inserted into an aperture (not shown) of the laser light source 4. A fixed end is attached. An optical waveguide 6 is formed on the upper surface of the central portion of the cantilever 1, extending along the longitudinal axis from the fixed end to the free end, and having openings 11.11 on both sides of the end surface of the free end. There is. At the center in the width direction of the optical waveguide 6, a half mirror 7 and a Fresnel lens body 8 are provided as optical elements in order when viewed from the fixed end to the free end. The half mirror 7 has a transmittance of 50% and is arranged at an angle of 45° with respect to the longitudinal axis of the optical waveguide 6. The Fresnel lens body 8 has a prism shape or a Fresnel lens shape, and placed on the top.

Both the half mirror 7 and the Fresnel lens body 8 are formed by processing the optical waveguide 6 using an electron beam drawing device (not shown). Further, on the reflective surface side of the half mirror 7, an optical waveguide 6 is arranged perpendicularly to the longitudinal axis of the cantilever 1.
An optical waveguide 6a extending from the cantilever 1 and having an opening 9 on the side surface of the cantilever 1 is formed. Further, on the back side of the free end of the cantilever 1, a probe 3 is attached which is tapered downward toward the center.

A concave mirror 13 is placed in front of the cantilever 1 facing the aperture 11.11, and a concave mirror 12 is placed on the side of the cantilever 1 facing the aperture 9. The laser beam incident on these concave mirrors 12.13 is It is arranged so that it reflects the light upward. Further, vertically above the double concave mirrors 12 and 13, photoelectric conversion elements 18 and 19, which are divided into two and facing each other, are disposed, respectively. Further, a photoelectric conversion element 1 facing the Fresnel lens body 8 and separated upwardly by a distance from the Fresnel lens body 8 and divided into two parts.
7 are arranged.

The biconcave mirrors 12 and 13 are respectively connected to a block 15.
and 16, it is attached to a silicon substrate 14 arranged above and in parallel with the Pyrex glass 2. Note that anodic bonding is preferred as this mounting method. Further, the photoelectric conversion elements 17, 18, and 19 are all mounted on the inner surface of the silicon substrate 14. In addition, Pyrex glass 2
are attached to the silicon substrate 14 via spacers or piezoelectric bodies 21 (see FIG. 3) similar to the blocks 15 and 16.

The curvature of each of these concave mirrors 12 and 13 is configured in accordance with the distance at which the central beam B (see FIG. 2) refracted by the Fresnel lens body 8 is focused on the photoelectric conversion element 17. be done. Furthermore, a silicon substrate 1 is located at the focusing position of these concave mirrors 12 and 13 and the Fresnel lens body 8.
4 is positioned, and the above-mentioned photoelectric conversion elements 17, 18, and 19 are provided on this inner surface, respectively.

In addition, in these photoelectric conversion elements 17, 18, and 19, the respective bisecting lines are relative to the longitudinal axis of the cantilever 1, respectively.
They are positioned parallel, perpendicular, or perpendicular.

Furthermore, as shown in FIG. 3, the scanning probe microscope of this embodiment has a structure in which the sample 20 for observation is accurately positioned under the probe 3 when viewed from the probe 3 side in the Z direction. In order, 2
A directional fine movement device 23 and a two-way coarse movement device 22 are provided side by side. The Z direction coarse movement device 22 has a function of bringing the sample 20 close to the probe 3 in the Z direction. Further, the Z-direction fine movement device 23 has a function of keeping the distance between the probe 3 and the sample 20 constant.

Next, an example of a manufacturing method for the main components of the scanning probe microscope having such a configuration will be briefly described.

First, the photoelectric conversion elements 17, 18, and 19 are each made of a pair of well-known PIN type photoelectric diodes to have the same characteristics in advance, and these are bonded to the silicon substrate 14. Alternatively, it is preferable to form another type of photodetector element directly on the silicon substrate 14 together with a circuit for amplifying the detection output or discriminating the signal.

The concave mirrors 12 and 13 are micromirrors, respectively.
Or, with an L-shaped glass member 40 as shown in FIG.
It is formed into a plate material of a size that does not interfere with the cantilever 1 and the Pyrex glass 2. These concave surfaces are, respectively,
It does not necessarily have to be a spherical shape, but may be a cylindrical shape as shown in FIG.

The cantilever 1 is made of 5i02 on a silicon substrate.
(or SL, 04) is deposited through a rectangular mask pattern, and then anisotropic etching is performed to remove the silicon substrate and form a desired thin plate shape.

The probe 3 is attached to the cantilever 1 at a distance of 5in2 (or 5i
3N4), an aperture mask is placed on the back surface of the free end of the cantilever 1 at a distance of approximately the length of a needle, and as the vapor deposition material is deposited from above the aperture mask, a conical point is formed. Form the head.

The optical waveguide 6 is formed by depositing Corning 7059 glass (refractive index 1.5) by sputtering on the substrate of the cantilever 1 of 5iOz (refractive index 1.46), and propagates light waves to a portion with a high refractive index. Construct using properties.

In the scanning probe microscope having such a configuration, the laser beam 5 emitted from the aperture of the laser light source 4 is guided through the optical waveguide 6 toward the free end. The cross section of the laser beam 5 in the optical waveguide 6 at this time is
It is shown in FIG. 2 as a cross section along a line. As shown in FIG. 2, the laser beam 5 in the optical waveguide 6 is divided into a central beam BC and beams B, , B on both sides thereof. The central beam Bc is set to occupy about 70% of the entire cross-sectional area of the laser beam 5, and the beams B on both sides are set to occupy about 15% each. When the laser beam 5 reaches the vicinity of the free end in this state, 50% of the central beam Be is reflected by the half mirror 7 and the remaining 50% is transmitted. At this time, the beams B, , B on both sides pass through as they are without being affected by the half mirror 7. Central beam B reflected by half mirror 7
c exits from the aperture 9 via the optical waveguide 6a and enters the concave mirror 12. The central beam Bc reflected here converges on the opposing photoelectric conversion element 18 to form an image 01□. On the other hand, the central beam B transmitted through the half mirror 7 is incident on the Fresnel lens body 8 with a reflection angle of 90''.The central beam Be deflected here is converged on the photoelectric conversion element 17 above the Fresnel lens body 8. to form an image 08. Also, beams B, , B on both sides.

go straight through the optical waveguide 6, exit from the openings 11 and 11 on the end face of the cantilever 1, and enter the concave mirror 13, respectively. The beams B1 and B reflected here converge on the opposing photoelectric conversion element 19 to form an image 013.

As shown in FIG. 5, the above-mentioned photoelectric conversion elements 17, 18.
19 outputs electrical signals corresponding to the imaging positions 08.01□ and 019, respectively, to differential circuits 25, 26, and 27, respectively. Corresponding differential circuit 25.26 receiving each electrical signal
．． 27 output differential signal outputs Sa, SI(, Sv). The second servo 31 drives the piezoelectric body 21 according to the output signal from the device 22 or the Z servo 31.The signal outputs S6 and SI (are also output to the θ servo 32 and ε□ servo, respectively) as appropriate. 33. Thus, servo control of the probe in the Z direction and servo control for compensating for the amount of shift in the XY force direction is performed.

Further, the photoelectric conversion elements 17, 18, and 19 are for detecting the displacement of the cantilever 1, respectively. That is, the photoelectric conversion element 17 detects the displacement angle θ caused by the torsional rotation of the cantilever 1 in the R direction due to the rotational moment T (see FIG. 7) acting on the cantilever 1. Further, the photoelectric conversion elements 18 and 19 are configured to have a displacement ε7 of the cantilever 1,
Detect ε□. Thus, the displacement of the cantilever 1 can be detected three-dimensionally.

Next, the operation of the scanning probe microscope as described above will be explained.

In the initial state where the probe 3 of the cantilever 1 is separated from the sample 20, the above-mentioned images 08.01□, 0.3 are as follows.
The photoelectric conversion elements 17, 18, and 19 are formed equally in two divided regions, respectively.

Therefore, the same electrical signals are input to the differential circuits 25, 26, and 27, respectively.

Similar to the operation of a general STM, the coarse movement device 22 moves the sample 20 in the Z direction to approach the probe 3 of the cantilever 1. At this time, an attractive force due to van der Waals force acts between the probe 3 and the sample 20. The cantilever 1 is formed into a lightweight thin plate shape, and one end is fixed to the Pyrex glass 2, so the other end of the cantilever 1 is pulled by the above-mentioned attractive force and warped downward by a displacement ε when viewed in two directions. Then, a state is maintained in which this attractive force and the restoring force of the cantilever 1 corresponding to the displacement ε1 are balanced. The setting of the attractive force region of the cantilever 1 that maintains this balanced state can be defined by calculating the displacement ε1−ε1 due to the warpage of the cantilever 1 in advance based on the characteristics of the cantilever 1. Furthermore, when the sample 20 is brought close to the probe 3, a repulsive force due to the Pauli exclusion law acts between the sample 20 and the probe 3. At this time, sample 2
0 acts to push back the probe 3, and the εl−ε! A smaller displacement ε1−εR1 occurs at the distance D−DR, between the sample 20 and the probe 3. Furthermore, when the sample 20 and the probe 3 are brought closer together and the open circuit #D between them continues to be small, the repulsive force exceeds the attractive force and the displacement of the cantilever 1 disappears. be returned.

At this time, the displacement ε1−εR2, this pushed back state is
This is a repulsive region setting where Pauli's exclusion law acts. These displacements εR1 and εR2 can also be calculated in advance based on the characteristics of the cantilever 1.

The beams B1 and B emitted from the aperture 11.11 are focused on the photoelectric conversion element 19 in accordance with the above-mentioned displacement ε1. At this time, the imaging area 013 is shifted relative to the dividing line of the photoelectric conversion element 19 divided into two. Therefore, the output values of the two electrical signals outputted from the two regions of the charging conversion element 19 are also relatively displaced.

By inputting these two output values to the differential circuit 27, the displacement ε1 of the cantilever 1 can be detected as the signal output S1. can be detected. That is, the signal output S1 corresponding to the displacement ε1 due to the warpage of the cantilever 1 when the sample 20 approaches the probe 3 by the Z-direction coarse movement device 22 is compared with the reference signal RI''=SRI by the comparison/switch circuit 30. , displacement ε1−εR1 is detected.

Here, the Z-direction coarse movement device 22 is stopped and switched to the two-direction fine movement device 23. Then, the two servos 31 perform a servo control operation to keep the distance between the probe and the sample constant. The two-way fine movement device 23 is operated by two-way driving of a cylindrical actuator or a tri-pot type piezoelectric body.

Next, the two-direction fine movement device 23 is driven in the XY force directions to scan the probe 3 along the surface of the sample 20.

The cantilever 1 of this embodiment has a thin rectangular shape,
The probe 3 is formed long. When the cantilever 1 is operated in the repulsive force region, the cantilever 1 is displaced by the combined vector-shaped elastic force along the do. As a result, from equation (1) mentioned above, 2
The displacement in the Y direction is calculated from equation (2), and the amount of shift of the tip of the probe in the direction of the sample surface is calculated from equations (4) and (5).

When the displacement angle θ occurs due to the twisting of the cantilever 1,
The central beam Bc refracted in the vertical direction by the Fresnel lens body 8 has its convergence position shifted in the Y direction on the photoelectric conversion element 17. A signal output S corresponding to this shift is detected,
The displacement angle θ is detected by performing a predetermined calculation. Also,
Similarly, the signal output 5vs from the differential circuits 27 and 26 which received the electric signals from the photoelectric conversion elements 19 and 18, respectively
By detecting S)l and performing a predetermined calculation, the displacement ε
ν and εH are detected respectively. At this time, the Z sabot 31, the ε□ servo 33, and the θ servo 32 act to keep the displacements ε9, εH and the displacement angle θ constant.

Note that this embodiment is not limited to the above.

For example, in this embodiment, the probe 3 scans in the XY directions while performing servo control to maintain a constant distance from the sample 20 in the Z direction, but the displacement ε7 of the cantilever 1,
It is preferable to incorporate piezoelectric drives for the 2 servo 31, the εH servo 33, and the θ servo 32 to restore ε8 and displacement angle θ to predetermined positions. Further, in this embodiment, a rectangular cantilever has been described, but the present invention is not limited to this.
A triangular cantilever as shown in the figure may also be used. However, in that case, the calculations of equations (1) to (4) are different.

[Effects of the Invention] The scanning probe microscope of the present invention deflects a light beam in three directions with an optical deflection element provided in an optical waveguide, and converts these three light beams into electrical signals from the received photoelectric conversion elements. The configuration is such that the displacement of the probe support member is detected. As a result, the probe support member can be controlled in three directions, allowing precise observation of the sample surface.

[Brief explanation of the drawing]

FIG. 1 is a partially cutaway perspective view schematically showing the entire scanning probe microscope of the present invention, and FIG.
3 is a side view of the scanning probe microscope shown in FIG. 1, FIG. 4 is a perspective view of a concave mirror that is a component of the scanning probe microscope shown in FIG. FIG. 5 is a block diagram showing a control system for controlling the scanning probe microscope shown in FIG. 1 from three directions, and FIGS. 6 to 8 each partially show a conventional scanning probe microscope. A bottom view showing a rectangular cantilever attached to Pyrex glass, a front view of the tip of a rectangular cantilever, and a hollow cantilever with a triangular outer shape attached to Pyrex glass. It is a perspective view showing a state. 1... Cantilever 2... Pyrex glass,
3... Probe, 4... Laser light source, 6.6a...
Optical waveguide, 7... Half mirror 8... Fresnel lens body, 12.13... Concave mirror 17.18.19
...Photoelectric conversion element. Applicant's agent Patent attorney Atsushi Tsuboi Figure 1; J

Claims (1)

[Claims] 1. A probe support member having a free end and a fixed end, and a probe provided at the free end; and a probe support member provided at the fixed end of the probe support member. a laser light source, an optical waveguide that guides the laser beam from the laser light source to the free end of the probe support member, and an optical system provided in the optical waveguide that separates the laser beam into three laser beams orthogonal to each other. a photoelectric conversion element that receives each of these separated laser beams, converts them into corresponding electrical signals, and outputs them; and a calculation means that receives each of the electrical signals and performs predetermined calculation processing. A scanning probe microscope characterized by: 2. A probe support member having a free end and a fixed end, and a probe provided at the free end; a laser light source provided at the fixed end of the probe support member; and the laser. an optical waveguide that guides a laser beam from a light source to an aperture provided at the tip of the free end of the probe support member; and receives the laser beam emitted from the aperture;
a first photoelectric conversion element that converts into an electric signal and outputs it; and first and second photoelectric conversion elements that are provided in the optical waveguide and deflect the laser beam in directions perpendicular to each other with respect to the longitudinal axis of the optical waveguide. optical elements, and these first and second optical elements.
second and third photoelectric conversion elements each receiving the laser beam deflected by the optical element, converting it into an electric signal and outputting it; and a calculation unit receiving the electric signal and performing predetermined calculation processing on the received electric signal. A scanning probe microscope comprising: means. 3. The scanning probe microscope according to claim 1 or 2, wherein the probe support member is a cantilever.