JPH04110457A - Film forming device - Google Patents
Film forming deviceInfo
- Publication number
- JPH04110457A JPH04110457A JP2227562A JP22756290A JPH04110457A JP H04110457 A JPH04110457 A JP H04110457A JP 2227562 A JP2227562 A JP 2227562A JP 22756290 A JP22756290 A JP 22756290A JP H04110457 A JPH04110457 A JP H04110457A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- pallet
- magnet
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 75
- 239000000696 magnetic material Substances 0.000 claims abstract description 6
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 abstract 1
- BGPVFRJUHWVFKM-UHFFFAOYSA-N N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] Chemical compound N1=C2C=CC=CC2=[N+]([O-])C1(CC1)CCC21N=C1C=CC=CC1=[N+]2[O-] BGPVFRJUHWVFKM-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 25
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 241000824268 Kuma Species 0.000 description 1
- 229910000808 amorphous metal alloy Inorganic materials 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 235000020004 porter Nutrition 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は例えば光ディスク等の記録媒体の製造に用いら
れる成膜装置ｉこ係わるっ
〔発明の概要〕
本発明は、マスクを被成膜基板ｊ、こ当接させた状態で
パレット上ｊこ配置してその基板面；、こ成膜処理がな
される成膜装置において、パｌ／ ソトに対する被成膜
基板とマスクとを着脱する着脱手段が設けられ、マスク
を磁性体によって構成し、一方パレットには、マスクを
磁気的に吸着保持する第１のマグネットが配置される。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a film forming apparatus used for manufacturing recording media such as optical disks. A means for attaching and detaching the substrate to be deposited and the mask from the pallet/soto in a film forming apparatus where the film forming process is performed by placing the substrate on the pallet in contact with the mask. The mask is made of a magnetic material, and the pallet is provided with a first magnet that magnetically attracts and holds the mask.
そして、着脱手段としては、磁性マスクを磁気的に吸着
保持する第２のマグネットが背部に配置された磁性マス
クの配置面を有するホルダーと、この配置面に磁性マス
クを介して被成膜基板を吸引する真空吸引手段とが設（
・ブられる。第２のマクネッｌ、 （ま、磁性マスクの
配置面に対する吸引力をパレットに対する第１のマグネ
ットによる吸引力に比し犬なる第１の吸弓力と小なる第
２の吸引力とに調整する調整手段が設けられる。このよ
うな構成による成膜装置によってマスクを被成膜基板の
所定位置に配置した状態でこれと共にパレッｌ’ ＋こ
対して着脱するようにして作業性の向上をはかることが
できるようにするものである。The attachment/detachment means includes a holder having a magnetic mask placement surface on the back of which a second magnet for magnetically attracting and holding the magnetic mask, and a substrate to be deposited onto this placement surface via the magnetic mask. A vacuum suction means for suction is provided (
・Being beaten. The second magnet (well, the attraction force on the surface where the magnetic mask is placed is adjusted to be a first suction force and a second suction force that are smaller than the suction force of the first magnet on the pallet. Adjustment means is provided.With the film forming apparatus having such a configuration, the mask is placed at a predetermined position on the substrate to be film-formed, and the mask is attached to and removed from the pallet along with the mask, thereby improving workability. This is to make it possible to do this.
通常、光ディスク等の記録媒体は、蒸着法あるいはスパ
ックリング法等によってその記録薄膜例えば多層膜によ
る記録膜を基板上に被着して記録あるいは再生の機能膜
を形成させる。この薄膜形成において、この媒体の環境
に対する信頼性を確保する上で基板全面に薄膜形成を行
わずにその中心部及び外周部をマスクで遮蔽して基板上
に蒸着あるいはスパフク等によってリング状に薄膜パタ
ーンの形成を行うことが屡々行われる。Generally, for recording media such as optical disks, a thin recording film, such as a multilayer recording film, is deposited on a substrate by a vapor deposition method, a spuckling method, or the like to form a recording or reproducing functional film. In this thin film formation, in order to ensure the reliability of this medium against the environment, the thin film is not formed on the entire surface of the substrate, but the center and outer periphery are shielded with a mask, and a thin film is formed in a ring shape by vapor deposition or sputtering on the substrate. Pattern formation is often performed.
特に書換え可能な光磁気ディスクにおいては、酸化し易
い遷移金属−希土類非晶質合金をその機能膜として用い
るために、この中心部及び外周の保護は重要となる。Particularly in rewritable magneto-optical disks, protection of the center and outer periphery is important because a transition metal-rare earth amorphous alloy, which is easily oxidized, is used as the functional film.
一方、光ディスクに機能膜等の薄膜を形成する場合、生
産性の上からバレントと呼称される搬送治具に多数枚の
基板を取付け、このバｌノットを蒸着あるいはスパック
リングをなず処理室例えば真空室に搬入する。この場合
、パレットは回転するようになっているものもあるが、
その光ディスクの基板すなわち被成膜基板は、パレット
上におがれ、各被成膜基板上にその中心部及び外周部の
マスクが被せられるものである。On the other hand, when forming thin films such as functional films on optical disks, a large number of substrates are mounted on a transport jig called a balent from the viewpoint of productivity, and the balnot is deposited in a processing chamber such as a processing chamber without vapor deposition or spackling. Transport it to the vacuum chamber. In this case, some pallets are designed to rotate,
The substrates of the optical disk, that is, the substrates to be film-formed, are placed on a pallet, and a mask is placed on each film-forming substrate at its center and outer periphery.
一般にこのパレットは、はぼ垂直方向（重力方向）に立
てられ、その被成膜基板表面に塵埃等が付着する確率を
減じるようになされている。このため被成膜基板と中心
部及び外周部のマスクは機械的なロック機構あるいは磁
石による吸引力でバレントに保持するようになされてい
る。そして、このようなパレ７）に対する成膜前の被成
膜基板の装着あるいは成膜処理後の基板の離脱は次のよ
うな方法が一般に採られている。Generally, this pallet is erected in a vertical direction (in the direction of gravity) to reduce the probability that dust or the like will adhere to the surface of the substrate on which a film is to be formed. For this reason, the substrate to be film-formed and the mask at the center and outer periphery are held in a valent state by a mechanical locking mechanism or an attractive force by a magnet. The following method is generally adopted for mounting a film-forming substrate before film formation on such a panel 7) or removing the substrate after film-forming processing.
まず、基板面に配置された中心部及び外周部のマスクの
みを取去る。このとき、基板のパレットから落下するの
を防止するためパレットには、マスクがとり除かれた状
態の基板をパ１ノットに保持させるだめのロック機構ま
たは真空吸引手段等の基板保持手段が設けられている。First, only the center and outer peripheral masks placed on the substrate surface are removed. At this time, in order to prevent the substrate from falling from the pallet, the pallet is provided with substrate holding means such as a locking mechanism or a vacuum suction means to hold the substrate with the mask removed in the pallet. ing.
このようにしてマスクが排除されて後、基板がパレット
から離脱される。すなわち、マスクと基板は別々のハン
ドリング機構でその離脱が行われる。また、パレットに
対する被成膜基板及びマスクの取代けは、上述したよう
にこのパレット」−において成膜処理を行って後にその
マスク及び基板を取去ってその後に、他の成膜のなされ
ていない被成膜基板を、パレット上に持ち来して、これ
を上述したパレットに設けた基板の保持手段で保持する
。次に、マスクを同様にパレットに装着する。このよう
な動作を繰り返し行って順次成膜すなわち機能膜の形成
をなして目的とする光ディスク等の記録媒体の類１告が
行われる。After the mask is removed in this manner, the substrate is removed from the pallet. That is, the mask and the substrate are separated by separate handling mechanisms. In addition, when replacing a substrate to be deposited and a mask on a pallet, as described above, after performing a deposition process on this pallet, the mask and substrate are removed, and then other depositions are not performed. The substrate to be film-formed is brought onto the pallet and held by the substrate holding means provided on the pallet described above. Next, the mask is similarly attached to the pallet. Such operations are repeated to sequentially form a film, that is, a functional film, to form a target recording medium such as an optical disk.
このように通常の成膜装置においては、パレットに対し
てここにその基板と被成膜基板とこれに対するマスクの
取代（）、取外しをそれぞれ独立のハンドリング機構に
よって行うものであり、したがってパレットにおいても
、側音をそれぞれ装脱自在に保持するだめの保持手段を
設ける必要がある。したがってパレッ１−に対する装Ｍ
離脱には時間が掛り生産性の向」二が明害され、またそ
の機構が複雑であることから、ハンドリング機構スが多
く発生し、信頼性の向」二と稼働率の向上を阻害してい
る。In this way, in a normal film deposition system, the removal () and removal of the substrate, the substrate to be deposited, and the mask for this are performed on the pallet using independent handling mechanisms. , it is necessary to provide holding means for removably holding the side sounds. Therefore, the loading M for pallet 1-
Separation takes time and reduces productivity, and since the mechanism is complex, there are many handling mechanisms, which impedes reliability and operational efficiency. There is.
本発明は、上述した被成膜装置において、その構成の簡
略化、動作の簡素化をはかって作業性の向」二と信頼性
の向」二をはかることをユの目的とする。An object of the present invention is to simplify the structure and operation of the above-mentioned film forming apparatus, thereby improving workability and reliability.
本発明は、第１図Ａ−Ｃに本発肋装首の各動作部での断
面図を示し、第２図にパレットの一半部の断面図を示す
ように、マスク（］）を被成膜基板（２）の基板面（２
ａ）に当接させた状態でバｌ／ ツ） （３）上に配設
して基板面（２ａ）に成膜処理がなされる成膜装置にお
いて、パレッＩ−（３）に対する被成膜基板（２）とマ
スク（］）とを着脱する着脱手段（４）が設けられる。The present invention provides a mask (]) as shown in FIG. Substrate surface (2) of membrane substrate (2)
(3) In a film forming apparatus that is disposed above and performs a film forming process on the substrate surface (2a), the film to be formed on pallet I-(3) is Attachment/detachment means (4) for attaching and detaching the substrate (2) and the mask (]) is provided.
そして、マスク（］）は磁性体によって構成する。The mask ( ) is made of a magnetic material.
また、パレット（３）には、マスク（１）を磁気的に吸
着保持する第１のマグネッｌ−（５）が配置される。Further, a first magnet l-(5) that magnetically attracts and holds the mask (1) is arranged on the pallet (3).
また、着脱手段（４）は、磁性マスク（１）を磁気的に
吸着保持する第２のマグネット（６）が背部に配置され
た磁性マスク（］）の配置面（７ａ）を有するホルダー
（７）と、この配置面（７ａ）に磁性マスク（１）を介
して被成膜基板（２）を吸引する真空吸引手段（８）を
設けてなる。The attachment/detachment means (4) also includes a holder (7) having a magnetic mask (]) placement surface (7a) on the back of which a second magnet (6) for magnetically attracting and holding the magnetic mask (1) is disposed. ), and a vacuum suction means (8) for suctioning the film-forming substrate (2) through the magnetic mask (1) is provided on this arrangement surface (7a).
この第２のマグネット（６）には、磁性マスク（１）に
対するその配置面（７ａ）での吸引力をパレット（３）
に対する第１のマグネット（５）による吸引力に比し犬
なる第１の吸引力と小なる第２の吸引力とを調整し得る
調整手段（９）が設けられる。This second magnet (6) has an attractive force on the magnetic mask (1) on its placement surface (7a) on the pallet (3).
Adjustment means (9) is provided which can adjust the first attraction force and the second attraction force, which is smaller than the attraction force by the first magnet (5).
上述の本発明構成によれば、ホルダー（７）の配置面（
７ａ）に第２のマグネッｌ−（６）を上述した第１の吸
引力とし、かつ真空吸引手段（８）による吸引力によっ
て磁性マスク（１）とこれの上から成膜を行おうとする
被成膜基板（２）を吸引する第１図Ａに示す第１の態様
と、ホルダー（７）をパ１ノット（３）と対向する位置
に持ち来して第２のマグネン）（６）を上述の第２の吸
引力に調整すると共に上述の真空吸引力を解除して、パ
レッｌ−（３）の第１のマグネット（５）によって磁性
マスク（１）をパレッｌ−（３）に被成膜基板（２）を
挟み込んでこの基板（２）と共に吸着保持させる第１図
Ｃに示す第２の態様と、第２のマグネット（６）の吸引
力を第ｆの吸引力にすると共に、真空吸引力を作用させ
ることによって被成膜基板（２）と磁性マスク（１）と
をホルダー（７）に吸引移行させてパレット（３）から
の離脱を行う第１図已に示す第３の態様と、ホルダー（
７）を真空吸引手段（８）による吸引力を解除して基板
（２）をホルダー（７）より離脱させる第４の態様と、
ホルダー（７）の第２のマグネット（６）の吸引力を第
２の吸引力とすることによって磁性マスク（１）をホル
ダー（７）から離脱させ得る第５の態様とを採ることが
できる。According to the above-described configuration of the present invention, the arrangement surface of the holder (7) (
7a), the second magnet l-(6) is set to the above-mentioned first attraction force, and the attraction force of the vacuum suction means (8) is used to connect the magnetic mask (1) and the object on which film formation is to be performed. The first mode shown in FIG. 1A is to suction the film-forming substrate (2), and the second mode (6) is carried out by bringing the holder (7) to a position facing the P1 knot (3). Adjusting the above-mentioned second attraction force and canceling the above-mentioned vacuum attraction force, the magnetic mask (1) is covered with the pallet l-(3) by the first magnet (5) of the pallet l-(3). A second aspect shown in FIG. 1C in which the film-forming substrate (2) is sandwiched and held together with the substrate (2) by suction, and the suction force of the second magnet (6) is set to the f-th suction force, In the third step shown in Figure 1, the film-forming substrate (2) and the magnetic mask (1) are attracted and transferred to the holder (7) by applying a vacuum suction force and removed from the pallet (3). aspect and holder (
7), a fourth aspect in which the suction force by the vacuum suction means (8) is released and the substrate (2) is removed from the holder (7);
A fifth aspect can be adopted in which the magnetic mask (1) can be detached from the holder (7) by using the second attractive force of the second magnet (6) of the holder (7).
このような各態様を採ることによって共通の着脱手段（
４）にマスク（１）と被成膜基板（２）とを同時にパレ
ット（３）に対し着脱することができるし、さらにパレ
ット（３）においては、１つのマグネットすなわち第１
のマグネット（５）によって被成膜基板（２）をも保持
することができるようにしたので、その構成の簡略化と
動作の簡素化がはかられ、したがって作業時間の短縮化
したがって生産性の向」二と、さらにハンドリング時の
基板の破損、成膜の破損等が回避され信頼性の高い成膜
を行うことができる、。By adopting each of these aspects, a common attachment/detachment means (
4), the mask (1) and the substrate to be film-formed (2) can be attached to and detached from the pallet (3) at the same time.
Since the substrate (2) to be coated can also be held by the magnet (5) of the magnet (5), the structure and operation are simplified, which reduces working time and improves productivity. In addition, damage to the substrate and film formation during handling can be avoided and highly reliable film formation can be performed.
第１図及び第２図を参照してさらに本発明の一実施例を
詳細に説明する。An embodiment of the present invention will be further described in detail with reference to FIGS. 1 and 2.
本発明においては、マスク（１）をステンレス等の磁性
材によって構成する。このマスク（１）は中心マスク（
ＩＣ）と外周マスク（ＩＳ）とを有してなる。中心マス
ク（ＩＣ）は例えば断面Ｔ字型をなし中心部に突起（ｌ
ｃ、） が設けられ、その周縁に円形フランジ部（ｌ
ｃ２） が一体に有してなる。フランジ部＜ＩＣ２＞
はその相対向する主面（ｌｃａ） 及び（ＩＣｂ
） がそれぞれ平行平坦面に形成されろ。外周マスク
（ＩＳ）は口形リング状の例えば断面口字状に形成され
中心マスク（ＩＣ）のフランジ部（ｌｃ２） に対応
して両生面（ｌｓａ）及び（ＩＳｂ） がそれぞれフ
ランジ部（ｌｃ２） と同一の厚さをなしかつフラン
ジ部（ＩＣ２＞ の各主面（ＩＣａ）及び（ＩＣｂ）
とそれぞれ同一平面を形成、シ得る平坦面を形成す
る。In the present invention, the mask (1) is made of a magnetic material such as stainless steel. This mask (1) is the center mask (
IC) and an outer peripheral mask (IS). The center mask (IC) has, for example, a T-shaped cross section and a protrusion (l) at the center.
c,) is provided, and a circular flange portion (l) is provided around its periphery.
c2) are integrally included. Flange part <IC2>
are its opposite principal surfaces (lca) and (ICb
) are formed on parallel flat surfaces. The outer peripheral mask (IS) is formed into a ring shape, for example, a mouth-shaped cross section, and has amphiphilic surfaces (lsa) and (ISb) corresponding to the flange part (lc2) of the center mask (IC), respectively. The main surfaces (ICa) and (ICb) of the flange portion (IC2>) have the same thickness and have the same thickness.
They form the same plane, respectively, and form a flat surface that can be obtained.
着脱手段（４）は、マスク（１）が配置される平坦な配
置面（７ａ）を有する例えばステンレス等。つ磁１生体
よりなる。この配置面（７ａ）の背部ｊこは例え：よ゛
永久磁石による第２のマグネット（６）が配置され、−
の第２のマグネット（６）にはこれの配置面（７，ｊ
ｌごおける磁性体すなわぢマスク（］）の吸引力を調整
する調整手段（９）が設けられる。The attachment/detachment means (4) is made of stainless steel, for example, and has a flat placement surface (7a) on which the mask (1) is placed. It consists of one living body. For example, on the back side of this arrangement surface (7a), a second magnet (6) made of a permanent magnet is arranged, and -
The second magnet (6) has its placement surface (7,j
An adjustment means (9) is provided for adjusting the attraction force of the magnetic material, i.e., the mask ().
この調整手段（９）；ま、例えば第１図Ｃに示すように
例えはエアンリンダ構成を採ｊつ、圧縮空気■供給及び
解除によって第２のマグネット（６）を取着したピスト
ン（９ａ）を配置面（７）に向って近接ないしは離間さ
せるようにして配置面（７ａ）における第２のマグネッ
ト（６）の実質的磁気的吸引力の調整を行うことができ
るようにし得る３、
一方、ボルダ−（７）の配置面（７ａ）に臨んで真空吸
引手段（８）を設ける。３二の吸引手段（８）は外端が
真空ポンプ（図示せず）に連結された吸引管の吸引口（
８ａ）が配置面（７ａ）の夕）面に臨むように設けられ
、第２のマグネｙ ｌ・（６）によって配置面（７ａ）
上に、マスク（ＩＩ）の中心マスク（ＩＣ）及び外周マ
スク（ＩＳ）がそれぞれ吸引された状態で被成膜基板（
２）をこれの−ヒにすなわぢ各主面（Ｉ Ｃ＋））
及び（ＩＳｂ） 上に乗せたとき、この吸引手段（８
）によって基板（２）と配置面（７ａ）間の空間を負圧
にして基板（２）をマスク（１）に向って吸着保持し得
るようになされる。この場合、被成膜基板（２）の中心
孔（２ｈ’１が中心マスク（ＩＣ）の間柱突起＜ＩＣ，
） に嵌合するようになされる。This adjustment means (9); for example, as shown in FIG. The substantial magnetic attraction force of the second magnet (6) on the arrangement surface (7a) can be adjusted by moving the second magnet (6) closer to or away from the arrangement surface (7)3. - Vacuum suction means (8) is provided facing the arrangement surface (7a) of (7). No. 32 suction means (8) is a suction port (8) of a suction tube whose outer end is connected to a vacuum pump (not shown).
8a) is provided so as to face the side of the arrangement surface (7a), and the arrangement surface (7a) is provided by the second magnet (6).
Above, the film-forming substrate (
2) on each main surface (I C+))
and (ISb) when placed on this suction means (8
), the space between the substrate (2) and the arrangement surface (7a) is made to have a negative pressure so that the substrate (2) can be suctioned and held toward the mask (1). In this case, the center hole (2h'1) of the substrate to be film-formed (2) is the stud protrusion of the center mask (IC) <IC,
).
この着脱手段（４）は、パレ：／）（３）に対して第１
図、・へ、Ｂ及びＣに示すように、順次その位置を離間
、近接するように移動可能に構成される。This attachment/detachment means (4) is the first
As shown in Figures B and C, it is configured to be movable in order to move away from and approach the position.
一方、パｌ／ツｌ−（３）には、第１のマグネット（５
）が設けられる。この第１のマグネット（５）は、第２
図に示すように中心マスク（ＩＣ）を吸引する中心マグ
ネソｈ（５ｃ）と、外周マスク（１ｓ）を吸引する外周
マクネン１１５ｓ）とを有し、それぞれとめねじ（１６
）によってパレ７１・（３）に取着されマグネットホル
ダー（１５Ｃ） 及び（１５Ｓ）ｊ、こよって所定位
置、すなわちパ１／ ン） （３：ｌの中心部と外周部
とに１配役されろ。On the other hand, the first magnet (5
) is provided. This first magnet (5)
As shown in the figure, it has a central magneto h (5c) that suctions the central mask (IC) and an outer magenta 115s that suctions the peripheral mask (1s), and each has a female screw (16
) is attached to the pallet 71 (3), and the magnetic holders (15C) and (15S) j are placed in the predetermined positions, that is, the pa- 1/ pin) (3: 1 is placed at the center and the outer periphery of l. .
このような構成によって、パレット（１）に対する被成
膜基板（２）の着脱操作について説明する。この場合、
まず初期の状態においてバレ７）（３）の所定部に第１
のマグネット（５）によってマスク０）がすなわち中心
マスク（ＩＣ）と外周マスク（ＩＳ）が、それぞれ所定
位置に配置される。この場合、まず着脱手段（４）がバ
レンｌ−（３）側に近つき図示しなし）がパｌ／ ソ）
（３）ｊ二のマスク（１）をそのホルダー（７）の配置
面（７ａ）に第１の吸引力状態とされてし）る第２のマ
グネット（６）によって吸引させる。この場合、第２の
マグ不ン）・（６）は、配置面（７ａ）側に近接する位
置に界１整手段（９）によって持ぢ来され、第１の吸引
力が与えられるようにしてマスク（］）の吸引を行う。With such a configuration, the operation of attaching and detaching the film-forming substrate (2) to and from the pallet (1) will be explained. in this case,
First, in the initial state, the first
The magnet (5) causes the mask 0), that is, the center mask (IC) and the outer mask (IS), to be placed at predetermined positions. In this case, first, the attachment/detachment means (4) approaches the valve L-(3) side and the P/L (not shown)
(3) The second mask (1) is attracted to the placement surface (7a) of the holder (7) by the second magnet (6) which is in the first attractive force state. In this case, the second magnet (6) is brought to a position close to the placement surface (7a) by the field adjustment means (9) so that the first attraction force is applied to it. to perform suction on the mask (]).
次に、このマスク（」）を吸引したポルター（７）すな
わち着脱手段（４）を、第１図へに示ずパレ７１・（３
）から離間した所定位置に持ち来し、この状態で被成膜
基板（２）をマスク（コ）」−に、その中心マスク（Ｉ
Ｃ）に被成膜基板（２）の中心孔（２ＩＩ ）を嵌合さ
ぜると共にリング状の外周マスク（ＩＳ）内に、その基
板面（２ａ）が中心マスク（ＩＣ）及び外周マスク（Ｉ
Ｓ）の各上面（ｌｃｂ）及び（ｌｓｂ） 上に当接さ
せるように載置し、この基板（２）を吸引手段（８）に
よって吸引保持する第１の態様（第１図△）とする。Next, the porter (7) that sucked this mask (''), that is, the attachment/detachment means (4), is attached to the pallet 71 (3), which is not shown in FIG.
) and bring it to a predetermined position away from the center mask (I
C) is fitted into the center hole (2II) of the substrate to be film-formed (2), and the substrate surface (2a) is inserted into the ring-shaped outer peripheral mask (IS) and the center mask (IC) and the outer peripheral mask (IS). I
In the first embodiment (△ in Fig. 1), the substrate (2) is placed so as to be in contact with the upper surfaces (lcb) and (lsb) of S), and this substrate (2) is suctioned and held by the suction means (8). .
このようにしてホルダー（７）の配置面（７ａ）上にマ
スク（」）及びこれの上に被成膜基板（２）が載置され
た着脱手段（４）を、バ１／ツト（３）の面に持来し、
吸引手段（８）の真空ポンプの動作を停止して基板（２
）と配置面（７ａ）間の空間を例えは大気圧程度とし、
さらに調整手段（９）においてそのシリンダー内の空気
を排除してピストンを後退させる。つまり第２のマグネ
ット（６）を後退させて配置面（７ａ）におけるマスク
（１）に対する吸引力を弱めたすなわち第２の吸引力例
えば吸引力が零の状態にする。このようにすることによ
って第１のマグネット（５：ｌが支配的にマスク（１）
に作用するようにし、基板（２）を挟み込んだ状態で、
つまりマスク（１）と基板（２）とを共にパ１ツノ＋−
（３）に保持させる第２の態様（第１図Ｂ）とする。In this way, the attachment/detachment means (4), on which the mask ('') and the film-forming substrate (2) are placed on the mask (''), are placed on the placement surface (7a) of the holder (7). ),
The operation of the vacuum pump of the suction means (8) is stopped and the substrate (2
) and the arrangement surface (7a), for example, the space is about atmospheric pressure,
Further, in the adjusting means (9), the air in the cylinder is removed and the piston is moved back. That is, the second magnet (6) is moved back to weaken the attraction force on the mask (1) on the placement surface (7a), that is, to bring the second attraction force, for example, to zero. By doing this, the first magnet (5:l is dominantly masked (1)
with the substrate (2) sandwiched between them.
In other words, the mask (1) and the substrate (2) are both part 1 +-.
(3) The second mode (FIG. 1B) is maintained.
このようにしてパｌ／ント（３）に基板（２）をマスク
（１）と共に保持させて後、保持着脱手段（４）をパレ
ｙ ｔ・（３）から離間させる。After the substrate (2) is held together with the mask (1) by the pallet (3) in this manner, the holding attachment/detachment means (4) is separated from the pallet (3).
一方、バレンｌ−（３）上にマスク（」〕が所定位置に
配置されて保持された被成膜基Ｖｊ、（２）は、バレン
１． ｉこよって例えばスパッタないしは真空蒸着によ
って成膜がなされる成膜処理部に搬送されてここにおい
て基板（２）に対しマスク（１）によって遮才゛うれた
所定のパクーンの成膜が施されて、再び第１図Ｃに示す
位置に持ち来される。On the other hand, the film-forming group Vj, (2), which is held by placing a mask ('') at a predetermined position on the ballen l-(3), can be film-formed by sputtering or vacuum evaporation, for example. The substrate (2) is transported to a film forming processing unit where a predetermined film is formed on the substrate (2) with a mask (1), and then brought back to the position shown in FIG. 1C. be done.
この状態で再び着脱手段（４）がパｌ／ ン） （３）
に近づくようになされ、調整手段（８）のシリンダー内
に空気が供給されピストン（９ａ）が配置面（７ａ）側
に向って押し出されて第２のマグネット（６）が第１の
マグネット（５）の吸引力に勝つ大きい第１の吸引力と
され、これによってマク、り（１）をバｌノット（３）
イ汚離脱させて配置面（７ａ）側に吸引する。このとき
それと共こ吸引手段（９）の真空ポンプを作用させて吸
引口（８ａ）から吸引し、配置面（７ａ）と基板（２）
間の空間を可び負圧にして基板（２）の吸引をなし、着
脱手段をパｌ／ット（３）から離間させた第１図Ｂに示
す第３の態様とする。このようにしてマスク（１）及び
基板（２）をホルダー（７）の配置面（７ａ） ｊ：に
保持した着脱手段（４）を、例えば第１図Ａに示す位置
に持ぢ来して吸引口（８ａ）からの吸引を停止し、基板
（２）を他のロポ７）によって着脱手段（４）から取り
はずして他の所定位置に搬送させろ第４の態様と、調整
手段（９）によって上述した第２の吸引力として、この
マスク（］）をロボ７１’ｉこよってとりはずす第５の
態様を採る。In this state, press the attachment/detachment means (4) again) (3)
air is supplied into the cylinder of the adjusting means (8), the piston (9a) is pushed out toward the placement surface (7a), and the second magnet (6) approaches the first magnet (5). ) is considered to be a large first suction force that overcomes the suction force of
The dirt is removed and suctioned to the placement surface (7a) side. At this time, the vacuum pump of the suction means (9) is activated to draw suction from the suction port (8a), and the arrangement surface (7a) and the substrate (2) are
A third embodiment shown in FIG. 1B is obtained in which the space between the two is made to have a slightly negative pressure to attract the substrate (2), and the attachment/detachment means is separated from the pallet (3). The attachment/detachment means (4) thus holding the mask (1) and the substrate (2) on the placement surface (7a) of the holder (7) is brought to the position shown in FIG. 1A, for example. Suction from the suction port (8a) is stopped, and the substrate (2) is removed from the attachment/detachment means (4) by another robot 7) and transported to another predetermined position. As the above-mentioned second suction force, a fifth mode is adopted in which the mask ( ) is removed by the robot 71'i.
尚、上述した例においては、第１及び第２のマグネット
（５）及び（６）が永久マグネットである場合について
説明したが、これらを電磁コイルとすることによって例
えば第２のマグネット（５）に対するその通電の制御に
よって第１の吸引力と第２の吸弓力を得るようにして調
整手段（９）を構成することもできる。In the above example, the case where the first and second magnets (5) and (6) are permanent magnets has been explained, but by using these as electromagnetic coils, for example, the second magnet (5) The adjusting means (9) can also be configured to obtain the first suction force and the second suction force by controlling the energization.
その他、」二連した例に限らず種々の変形変更をなし得
る。In addition, various modifications and changes can be made without being limited to the two-part example.
上述したように本発明構成によれば、共通の着脱手段（
４）によってマスク（」）と被成膜基板（２）とをパレ
ット（３）に対し同時に着脱することができるようにし
、さらにパレット（３）においては、第１のマグネット
（５）によって被成膜基板（２）をも保持することがで
きるようにしたのでその構成の簡略化と動作の簡素化が
はかられてしたがって作業時間の短縮化したがって生産
性の向上と、さらに信頼性の向上ずなわぢハンドリング
時の基板の破損、成膜の破損等が回避され信頼性の高い
成膜を行うことができる。As described above, according to the configuration of the present invention, the common attachment/detachment means (
4) allows the mask ('') and the substrate to be deposited (2) to be attached to and removed from the pallet (3) at the same time, and furthermore, in the pallet (3), the first magnet (5) Since it is now possible to hold the membrane substrate (2) as well, its structure and operation are simplified, resulting in shorter working time and improved productivity as well as improved reliability. Damage to the substrate and damage to the film formed during rope handling can be avoided, allowing highly reliable film formation.
第１図Ａ−Ｃは本発明装置の一例の各動作部ての路線的
断面図、第２図はそのパレｙ ’ｌ・の−半部の断面図
である。
（１）はマスク、（２）は被成膜基板、（３）はパレッ
ト、（４）は着脱手段、（５）及び（６）は第１及び第
２のマグネット、（７）はホルダー、（７ａ）は配置面
、（８）は吸引手段、（９）は調整手段である。
代 理 人
松 隈 秀 盛FIGS. 1A to 1C are line sectional views of each operating section of an example of the apparatus of the present invention, and FIG. 2 is a sectional view of the -half part of the pallet. (1) is a mask, (2) is a substrate to be film-formed, (3) is a pallet, (4) is an attachment/detachment means, (5) and (6) are first and second magnets, (7) is a holder, (7a) is an arrangement surface, (8) is a suction means, and (9) is an adjustment means. Deputy Hide Mori Hitomatsu Kuma
Claims (1)
に配置して上記基板面に成膜処理がなされる成膜装置に
おいて、 上記パレットに対する上記被成膜基板と上記マスクとを
着脱する着脱手段が設けられ、 上記マスクは磁性体よりなり、 上記パレットには、上記マスクを磁気的に吸着保持する
第１のマグネットが配置され、 上記着脱手段は、上記磁性マスクを磁気的に吸着保持す
る第２のマグネットが背部に配置された磁性マスクの配
置面を有するホルダーと、この配置面に上記磁性マスク
を介して上記被成膜基板を吸引する真空吸引手段とを有
し、 上記第２のマグネットは、上記磁性マスクに対する上記
磁性マスクの配置面における吸引力を、上記パレットに
対する上記第１のマグネットによる吸引力に比し大なる
第１の吸引力と小となる第２の吸引力とに調整し得る調
整手段が設けられて成ることを特徴とする成膜装置。[Scope of Claims] A film forming apparatus in which a mask is placed on a pallet with a mask in contact with the surface of the substrate, and a film is formed on the surface of the substrate, wherein the substrate on which the film is formed relative to the pallet is Attaching and detaching means for attaching and detaching the mask is provided, the mask is made of a magnetic material, a first magnet for magnetically attracting and holding the mask is disposed on the pallet, and the attaching and detaching means is provided for attaching and detaching the mask to the magnetic mask. a holder having a magnetic mask arrangement surface on the back of which a second magnet for magnetically attracting and holding the substrate, and a vacuum suction means for attracting the film-forming substrate to the arrangement surface via the magnetic mask. and the second magnet has a first attraction force that is larger than the attraction force of the first magnet against the pallet, and the second magnet has a first attraction force that is smaller than the attraction force of the first magnet on the pallet. A film forming apparatus characterized in that it is provided with an adjusting means capable of adjusting the second suction force.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22756290A JP3282181B2 (en) | 1990-08-29 | 1990-08-29 | Film forming equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22756290A JP3282181B2 (en) | 1990-08-29 | 1990-08-29 | Film forming equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04110457A true JPH04110457A (en) | 1992-04-10 |
| JP3282181B2 JP3282181B2 (en) | 2002-05-13 |
Family
ID=16862857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22756290A Expired - Fee Related JP3282181B2 (en) | 1990-08-29 | 1990-08-29 | Film forming equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3282181B2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003085659A1 (en) * | 2002-04-04 | 2003-10-16 | Tdk Corporation | Method of delivering substrates to a film forming device for disk-like substrates, substrate delivering mechanism and mask used in such method, and disk-like recording medium producing method using such method |
| JP2004022154A (en) * | 2002-06-20 | 2004-01-22 | Tdk Corp | Receiving and transferring method of substrate for disk substrate film depositing device, substrate receiving and transferring mechanism used in the method and substrate holder and manufacturing method of disk recording medium using the method |
| JP2004022153A (en) * | 2002-06-20 | 2004-01-22 | Tdk Corp | Method for transferring substrate to disk substrate film forming device, substrate transferring mechanism and substrate holder used in the method, and manufacturing method of disk recording medium using the method |
| WO2006025336A1 (en) * | 2004-08-30 | 2006-03-09 | Ulvac, Inc. | Film forming equipment |
| JP2012503714A (en) * | 2008-09-24 | 2012-02-09 | アイクストロン、エスイー | Shadow mask magnetically held on a substrate support |
| JP2018066987A (en) * | 2016-10-17 | 2018-04-26 | 株式会社昭和真空 | Annular film formation method, annular film formation tool, and annular film formation mask |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03101206A (en) * | 1989-09-14 | 1991-04-26 | Fuji Photo Film Co Ltd | Sputtering device |
-
1990
- 1990-08-29 JP JP22756290A patent/JP3282181B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03101206A (en) * | 1989-09-14 | 1991-04-26 | Fuji Photo Film Co Ltd | Sputtering device |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003085659A1 (en) * | 2002-04-04 | 2003-10-16 | Tdk Corporation | Method of delivering substrates to a film forming device for disk-like substrates, substrate delivering mechanism and mask used in such method, and disk-like recording medium producing method using such method |
| JP2004022154A (en) * | 2002-06-20 | 2004-01-22 | Tdk Corp | Receiving and transferring method of substrate for disk substrate film depositing device, substrate receiving and transferring mechanism used in the method and substrate holder and manufacturing method of disk recording medium using the method |
| JP2004022153A (en) * | 2002-06-20 | 2004-01-22 | Tdk Corp | Method for transferring substrate to disk substrate film forming device, substrate transferring mechanism and substrate holder used in the method, and manufacturing method of disk recording medium using the method |
| WO2006025336A1 (en) * | 2004-08-30 | 2006-03-09 | Ulvac, Inc. | Film forming equipment |
| US7967961B2 (en) | 2004-08-30 | 2011-06-28 | Ulvac, Inc | Film forming apparatus |
| JP2012503714A (en) * | 2008-09-24 | 2012-02-09 | アイクストロン、エスイー | Shadow mask magnetically held on a substrate support |
| JP2018066987A (en) * | 2016-10-17 | 2018-04-26 | 株式会社昭和真空 | Annular film formation method, annular film formation tool, and annular film formation mask |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3282181B2 (en) | 2002-05-13 |
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