JPH04107463A - Applying method for photosensitive liquid - Google Patents
Applying method for photosensitive liquidInfo
- Publication number
- JPH04107463A JPH04107463A JP22697690A JP22697690A JPH04107463A JP H04107463 A JPH04107463 A JP H04107463A JP 22697690 A JP22697690 A JP 22697690A JP 22697690 A JP22697690 A JP 22697690A JP H04107463 A JPH04107463 A JP H04107463A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- liquid
- photosensitive
- support
- slit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 42
- 238000000034 method Methods 0.000 title claims description 7
- 238000000576 coating method Methods 0.000 claims abstract description 61
- 239000011248 coating agent Substances 0.000 claims abstract description 58
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229920003169 water-soluble polymer Polymers 0.000 claims description 3
- 238000001125 extrusion Methods 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 9
- 229920000642 polymer Polymers 0.000 abstract description 5
- 239000012530 fluid Substances 0.000 abstract description 2
- 238000009736 wetting Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 230000008602 contraction Effects 0.000 description 5
- 238000007765 extrusion coating Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 3
- 235000021240 caseins Nutrition 0.000 description 3
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 2
- 239000005018 casein Substances 0.000 description 2
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000004832 casein glue Substances 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000004833 fish glue Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920005615 natural polymer Polymers 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、フォトレジストとしての重クロム酸感光液の
塗布方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for applying a dichromic acid photosensitive solution as a photoresist.
近年、いわゆるフォトファブリケーションに対する関心
が非常に高まって来ている。In recent years, interest in so-called photofabrication has increased significantly.
７オトフアプリケーシヨンとは、金属や非金属の精密加
工法として、特に化学的加工法は、材料表面を部分的に
化学的または電気化学的に溶解さゼたり、金属をデポジ
ットさせたりする場合、マスキングが必要となるが、こ
のような精密加工に際して写真的技法を応用するのが効
果的であり、このような精密加工法をフォトファブリケ
ーションと称している。7. Otoff application is a precision processing method for metals and non-metals, especially chemical processing, in which the surface of the material is partially chemically or electrochemically dissolved or metal is deposited. Although masking is required, it is effective to apply photographic techniques for such precision processing, and this precision processing method is called photofabrication.
その応用範囲はがなりひろく、例えば計測部品、コンピ
ューター関連部品、表示デバイス電子管用部品、プリン
ト配線板、半導体部品、治具、家電カメラ部品等の生産
に利用されている。Its application range is wide-ranging, and is used in the production of measuring parts, computer-related parts, display device electron tube parts, printed wiring boards, semiconductor parts, jigs, home appliance camera parts, etc.
その工程は、まずフォトマスクとしての露光用原版を銀
塩感光材料あるいは金属画像の薄膜により作成する。一
方加工品を前処理し、フォトレジストを塗布し、これに
露光用原版を用いて露光し、フォトエツチングあるい１
よ７オトボーミングを行うのである。In this process, first, an original plate for exposure as a photomask is created using a silver salt photosensitive material or a thin film of a metal image. On the other hand, the processed product is pretreated, coated with photoresist, exposed to light using an exposure master plate, and subjected to photoetching or 1
Yo7 Otoboming is performed.
このようなフォトレジスＩ・とじては、光や放射線の照
射により溶解度、接着性、軟化点などの変化、あるいは
液体がら固体、固体から気体への変化などさまざまな物
理的、化学的性質の変化を示す高分子材料が開発されて
おり、いわゆる感光性樹脂とよばれているものが用いら
れる。Photoresist I/Finding undergoes various changes in physical and chemical properties such as changes in solubility, adhesiveness, softening point, etc., or changes from liquid to solid, solid to gas, etc. due to irradiation with light or radiation. Polymer materials have been developed that exhibit the following properties, and so-called photosensitive resins are used.
例えは、セラチン、カゼイン、フィシュグルなどの水溶
性天然高分子溶液に重クロム酸アンモニウムを数％混合
し、支持体に塗布、乾燥した薄膜に紫外線を照射すると
、これら高分子が不溶化し、水洗を行うことにより高分
子の画像が形成される。For example, when a few percent of ammonium dichromate is mixed with a solution of water-soluble natural polymers such as ceratin, casein, and fishglue, and the mixture is applied to a support and the dried thin film is irradiated with ultraviolet light, these polymers become insolubilized, making it difficult to wash with water. By doing so, an image of the polymer is formed.
このような重クロム酸感光液は現在でも金属の精密加工
やエレクトロニックス工業の分野では重要な感光材料と
して使用されている。例えばカラブラウン管の蛍光体ス
トライブの形成にはポリヒニルアルコールー重クロム酸
塩、シャドーマスクの製造にはカゼイン−重クロム酸塩
が用いられる。また、最近開発が進んでいる液晶カラー
デイスプレィや固体撮像素子の微細カラーフィルターあ
るいはホログラム感光材料にはゼラチン−重クロム酸塩
感光材料が優れた特性を示す。Such dichromic acid photosensitive solutions are still used as important photosensitive materials in the fields of metal precision processing and the electronics industry. For example, polyhinyl alcohol-dichromate is used to form phosphor stripes in color cathode ray tubes, and casein-dichromate is used to make shadow masks. Furthermore, gelatin-dichromate photosensitive materials exhibit excellent properties for liquid crystal color displays, fine color filters for solid-state imaging devices, and hologram photosensitive materials, which have recently been developed.
ところでこのような重クロム酸感光液の塗布にあたって
は、従来いわゆるディッピング法が一般的に用いられて
いる。By the way, in applying such a dichromic acid photosensitive solution, a so-called dipping method has been generally used.
第３図はこのようなディッピング法の１例を示す断面図
である。FIG. 3 is a sectional view showing an example of such a dipping method.
支持体Ｂは、感光液りを入れたバット４に浸したデイン
ピングロール３を抱いて矢印方向に走行する。バット中
の感光液りはポンプ７及びフィルター６を介して循環さ
せる。感光液りは図示しない系からバット４の液位が一
定になるように補給される。The support B runs in the direction of the arrow while holding the damping roll 3 immersed in a vat 4 containing photosensitive liquid. The photosensitive liquid in the vat is circulated through a pump 7 and a filter 6. The photosensitive liquid is replenished from a system (not shown) so that the liquid level in the vat 4 is constant.
ディッピング法による塗布では、塗布膜厚は塗布液の粘
度、塗布速度、塗布温度等により規定される。したがっ
て例えばシャドーマスク製造の際に、カゼインのように
比較的粘度が高いバインダーを用いた感光液の場合には
塗布速度に制限ができ、あるいは希釈率を上げ、粘度を
下げると乾燥負荷が高まるという問題が生じ、また例え
ば支持体による空気の持ち込み等により、泡による故障
もで易い。In coating by dipping, the coating thickness is determined by the viscosity of the coating liquid, coating speed, coating temperature, etc. Therefore, for example, when manufacturing a shadow mask, if a photosensitive liquid uses a binder with a relatively high viscosity such as casein, the coating speed can be limited, or if the dilution rate is increased and the viscosity is lowered, the drying load will increase. Problems arise and failures are also likely to occur due to bubbles, for example due to air being introduced by the support.
さらに、カゼイン−重クロム酸塩感光液は保存性が悪く
、温度により感光液の粘度変化が大きいことにより安定
して連続長尺塗布が困難である。Furthermore, the casein-dichromate photosensitive solution has poor storage stability, and the viscosity of the photosensitive solution changes greatly depending on temperature, making it difficult to stably and continuously coat the photosensitive solution over a long length.
また６価クロムによる有害性の問題もあり、塗布残液の
処理も問題となる。There is also the problem of the toxicity of hexavalent chromium, and the treatment of coating residue also becomes a problem.
上記のような問題に対して本発明の目的は、重クロム酸
塩を含む水溶性高分子感光液の塗布において、膜厚変動
が少なく、泡等による塗布故障も少なく、安定に連続長
尺塗布可能な塗布方法を提供する事である。In order to solve the above-mentioned problems, the purpose of the present invention is to achieve stable continuous long-length coating with less variation in film thickness, fewer coating failures due to bubbles, etc., when coating a water-soluble polymer photosensitive liquid containing dichromate. The objective is to provide a possible coating method.
本発明の上記目的は、重クロム酸塩を含む水溶性高分子
液よりなる感光液の塗布において、支持体上に幅方向に
沿うスリットから感光液を押し出す押出ノズルにより感
光液を塗布し、かつ塗布に当たり塗布液の収縮圧力を利
用することを特徴とする感光液の塗布方法により達成さ
れる。The above-mentioned object of the present invention is to apply a photosensitive liquid made of a water-soluble polymer solution containing dichromate by applying the photosensitive liquid onto a support using an extrusion nozzle that extrudes the photosensitive liquid from a slit along the width direction, and This is achieved by a photosensitive liquid coating method characterized in that the contraction pressure of the coating liquid is used during coating.
以下本発明について具体的に説明する。The present invention will be specifically explained below.
第１図は本発明に用いられる押出塗布装置の１例を示す
断面図である。FIG. 1 is a sectional view showing one example of an extrusion coating apparatus used in the present invention.
支持体Ｂはパックロール２に抱かれて矢印方向に走行す
る。液槽５の感光性塗布液りはポンプ７によりフィルタ
ー６を通り、流入孔２４より塗布機１に入り、塗布液り
はスリットを通って支持体の全幅にわたって塗布される
。第２図は、押出塗布機の詳細斜視図である。支持体Ｂ
の幅方向に沿う１対のノズルヘッド２１Ａ、 ２１Ｂを
あわせ、かつヘッド２１Ａ、 ２１Ｂの両端には端板２
５Ａ、 ２５Ｂを当てる。塗布側に狭いスリット２２を
有し、このスリット２２はポケット２３に連結し、ポケ
ット２３に対して感光性塗布液りの流入孔２４を形成す
る。The support B is held by the pack roll 2 and travels in the direction of the arrow. The photosensitive coating liquid in the liquid tank 5 passes through the filter 6 by the pump 7 and enters the coating machine 1 through the inflow hole 24, and the coating liquid passes through the slit and is coated over the entire width of the support. FIG. 2 is a detailed perspective view of the extrusion coating machine. Support B
A pair of nozzle heads 21A and 21B along the width direction are aligned, and end plates 2 are provided at both ends of the heads 21A and 21B.
Guess 5A and 25B. A narrow slit 22 is provided on the coating side, and this slit 22 is connected to a pocket 23 to form an inflow hole 24 for the photosensitive coating liquid to the pocket 23.
このような塗布装置によれば、ポンプにより塗布液を一
定の供給速度で送り、それが塗布されるため比較的粘度
の影響を受は難く、したがって塗布速度の向上がはから
れ、また、かりに泡があっても単発でおわる。また塗布
膜厚が安定し、かつ塗布装置の構造上、塗布残液も少な
くでき前記公害対策としても有効である。According to such a coating device, the pump sends the coating liquid at a constant supply rate, and the coating is relatively unaffected by viscosity, so the coating speed can be improved. Even if there are bubbles, it will end in one shot. In addition, the coating film thickness is stable, and the amount of remaining coating liquid can be reduced due to the structure of the coating device, which is effective as a countermeasure against the above-mentioned pollution.
さらに本発明においては、このような塗布機の使用にあ
たり、収縮圧力を適用することによりさらに安定な塗布
を可能とした。Furthermore, in the present invention, when using such a coating machine, more stable coating is made possible by applying contraction pressure.
即ち単なる押し出し塗布方法では支持体を塗布液で濡ら
す力は塗布液の表面張力に基づく力のみであるため、塗
布しづらく、泡の発生あるいは筋故障がで易い。そこで
表面張力に基づく力の他に支持体が移動することにより
発生する流体力学上の収縮圧力を濡らす力としてさらに
付加することにより安定な塗布を可能とした。That is, in a simple extrusion coating method, the force that wets the support with the coating liquid is based only on the surface tension of the coating liquid, so coating is difficult and tends to cause bubbles or streak failure. Therefore, in addition to the force based on surface tension, stable application was made possible by adding hydrodynamic shrinkage pressure generated by the movement of the support as a wetting force.
以下に本発明における収縮圧力について説明する。The contraction pressure in the present invention will be explained below.
第４図は、塗布機］のスリット２２の先端部を示す断面
図である。塗布液りは２ＯＡ、２０Ｂで構成されるスリ
ット２２を通り、矢印方向に走行する支持体Ｂ上に塗布
される。この際、支持体に対し走行側のエツジ２ＯＡの
先端面を角度θをもたせることにより、液の粘性により
下記式で表される圧力を発生する。この圧力を収縮圧力
という。FIG. 4 is a sectional view showing the tip of the slit 22 of the coating machine. The coating liquid passes through the slit 22 composed of 2OA and 20B and is coated onto the support B running in the direction of the arrow. At this time, by making the tip end surface of the edge 2OA on the running side at an angle θ with respect to the support, a pressure expressed by the following formula is generated due to the viscosity of the liquid. This pressure is called contraction pressure.
ｃ２（Ｘ１＋Ｘｏ） ｘ２ここで第４図
（１〕）に図示したようにＵｏ＝支持体の移動速度
Ｘ ：エノン２０Ａの先端の傾斜を延長して８面と交わ
る点を０とした時、２ＯＡの先端下流側の位置をＸ。と
じ、同上流側をｘｌとした。Ｘは任意の位置を表す。c2 (X1 + Xo) x2 Here, as shown in Fig. 4 (1), Uo = moving speed of the support body X is the position of the downstream side of the tip. The upstream side was designated as xl. X represents an arbitrary position.
：Ｘの位置におけるＢと２ＯＡ先端部との間隔をｈとし
たとき、ｈ−σＸで表したときの係数である。: It is a coefficient when expressed as h-σX, where h is the distance between B and the tip of the 2OA at the position of X.
μ ：塗布液粘度
好適な収縮圧力の値は、塗布液物性、塗布条件により異
なるため、それぞれの場合により適宜決定されるが、０
．１ｍｍＡｑ以上、好ましくはｌ −１０００１００Ｏ
の範囲である。μ: Coating liquid viscosity The suitable shrinkage pressure value varies depending on the physical properties of the coating liquid and coating conditions, so it is determined as appropriate for each case, but 0
．． 1 mmAq or more, preferably l -1000100O
is within the range of
尚、収縮圧力について詳しくは、流体力学（武助著、養
賢堂発行）に記載されている。Further, details regarding contraction pressure are described in Fluid Dynamics (authored by Takesuke, published by Yokendo).
本発明は前記、フォトレジストとじて感光性樹脂等の塗
布液に適用することができるが、特に重クロム酸塩の高
分子水溶液、例えばシャドーマスク用のカゼイン−重ク
ロム酸塩感光液の塗布等に好ましく適用される。The present invention can be applied to coating liquids for photosensitive resins as well as photoresists, and in particular, for coating dichromate polymer aqueous solutions, such as casein-dichromate photosensitive liquids for shadow masks. It is preferably applied to.
適用される支持体はニッケル、鉄−ニッケル、鉄、アル
ミニウム、クロム、銅、ステンレス、銀、チタン、ガラ
ス、シリコン、ポリエステル等、目的に応して金属、弁
金属の各種素材を使用することができる。Applicable supports include nickel, iron-nickel, iron, aluminum, chromium, copper, stainless steel, silver, titanium, glass, silicon, and polyester, and various materials such as metals and valve metals can be used depending on the purpose. can.
上記、カゼイン−重クロム酸塩感光液の場合の例では、
具体的には次ぎのような条件が考えられる。In the casein-dichromate photosensitive solution example above,
Specifically, the following conditions can be considered.
支持体二表面粗度Ｒａ Ｏ，２〜０．８ 鉄板塗布
液：
カゼインー重りロム酸アンモニウム水溶液粘 度
＝ ５〜１００ ｃｐｓ表面張力＋ ３０−５０ ｄ
ｙｎｅ／ｃｍ膜 厚 ： ５−１５μｍ （ｄｒ
ｙ）速 度 ＝ ５〜３０ｍ／ｍｉｎ〔実施例〕
以下、実施例により本発明の効果を具体的に例証するが
本発明はこれらの実施例に限定されるものではない。Support surface roughness Ra O, 2 to 0.8 Iron plate coating liquid: casein-weight ammonium romate aqueous solution viscosity
= 5-100 cps surface tension + 30-50 d
yne/cm film thickness: 5-15 μm (dr
y) Speed = 5 to 30 m/min [Example] The effects of the present invention will be specifically illustrated by Examples below, but the present invention is not limited to these Examples.
実施例
第１図に示す本発明の押出塗布装置を用い、下記条件に
よりシャドーマスク用フォトレジストを作成した。EXAMPLE Using the extrusion coating apparatus of the present invention shown in FIG. 1, a photoresist for a shadow mask was prepared under the following conditions.
塗布液：
カゼインー重クロム酸アンモニウム水溶液を下記方法に
より調製した。Coating solution: A casein-ammonium dichromate aqueous solution was prepared by the following method.
８％カゼイン水溶液と５％重クロム酸アンモニウム水溶
液を４９：ｌ（容積比）の割合で混合し、塗布液を調製
した。A coating solution was prepared by mixing an 8% casein aqueous solution and a 5% ammonium dichromate aqueous solution at a ratio of 49:1 (volume ratio).
塗布条件：
粘 度 ： ６０ｃ ｐ （２５°Ｃ）表面
張カニ ４４ｄｙｎｅ／ｃｍ
塗布速度： ｌＯｍ／ｍｉｎ
コーターエツジ角度＝８度
コーターと支持体の間隔： １００μｍ収縮圧カニ ８
５ｍｍＡｑ
塗布温度：２５°Ｃ
支持体：
厚さ０．１５ｍｍの鉄板ロールを前処理として脱脂、整
面（表面粗度、Ｒａ Ｏ，５） した。Coating conditions: Viscosity: 60cp (25°C) Surface tension 44dyne/cm Coating speed: 1Om/min Coater edge angle = 8 degrees Distance between coater and support: 100μm Shrinkage pressure 8
5 mmAq Coating temperature: 25°C Support: A 0.15 mm thick iron plate roll was pretreated by degreasing and surface smoothing (surface roughness, Ra O, 5).
尚、塗布は片面を塗布乾燥後、反対面を塗布乾燥し、支
持体の両面にフォトレジストを塗布した。Incidentally, one side was coated and dried, and then the other side was coated and dried, and photoresist was coated on both sides of the support.
この結果、安定した膜厚で泡故障もない良好なフォトレ
ジストを得ることができた。As a result, a good photoresist with a stable film thickness and no bubble failure could be obtained.
本発明により、重クロム酸塩を含む高分子水溶液を安定
にかつ高速で塗布し、良好なフォトレジストを得ること
のできる塗布方法を提供することかできた。また本発明
は６価クロムの公害対策どしても有効である。According to the present invention, it has been possible to provide a coating method that can stably and rapidly coat an aqueous polymer solution containing dichromate and obtain a good photoresist. The present invention is also effective as a countermeasure against hexavalent chromium pollution.
第１図は本発明の塗布装置の１例を示す断面図である。
第２図は同じく本発明の塗布装置の部分拡大斜視図であ
る。第３図は従来の塗布装置を示す断面図である。第４
図はコーターエツジの断面図である。
１：塗布袋Ｒ２：バック口−ル
３：デイツプロール ４・塗布液バット５：塗布液槽
６：フィルター
７＝ポンプ
Ｂ：支持体 Ｌ：塗布液
２１Ａ、 ２１Ｂ、側板 ２５Ａ、 ２５Ｂ：端板
２３：ポケット ２４：流入孔２ＯＡ、２ＱＢ
：コ
ターエツジFIG. 1 is a sectional view showing an example of the coating apparatus of the present invention. FIG. 2 is a partially enlarged perspective view of the coating device of the present invention. FIG. 3 is a sectional view showing a conventional coating device. Fourth
The figure is a sectional view of the coater edge. 1: Coating bag R2: Back opening 3: Date roll 4 Coating liquid vat 5: Coating liquid tank 6: Filter 7 = Pump B: Support L: Coating liquid 21A, 21B, side plate 25A, 25B: End plate 23: Pocket 24: Inflow hole 2OA, 2QB
:Kotaetsuji
Claims (1)
塗布において、支持体上に幅方向に沿うスリットから感
光液を押し出す押出ノズルにより感光液を塗布し、かつ
塗布に当たり塗布液の収縮圧力を利用することを特徴と
する感光液の塗布方法。In coating a photosensitive liquid made of a water-soluble polymer solution containing dichromate, the photosensitive liquid is applied onto the support using an extrusion nozzle that extrudes the photosensitive liquid through a slit along the width direction, and the shrinkage pressure of the coating liquid is applied during coating. A method for applying a photosensitive liquid, characterized by using.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22697690A JPH04107463A (en) | 1990-08-28 | 1990-08-28 | Applying method for photosensitive liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22697690A JPH04107463A (en) | 1990-08-28 | 1990-08-28 | Applying method for photosensitive liquid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04107463A true JPH04107463A (en) | 1992-04-08 |
Family
ID=16853567
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22697690A Pending JPH04107463A (en) | 1990-08-28 | 1990-08-28 | Applying method for photosensitive liquid |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04107463A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103246165A (en) * | 2013-04-25 | 2013-08-14 | 深圳市华星光电技术有限公司 | Photoresist coating device and coating method thereof |
-
1990
- 1990-08-28 JP JP22697690A patent/JPH04107463A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103246165A (en) * | 2013-04-25 | 2013-08-14 | 深圳市华星光电技术有限公司 | Photoresist coating device and coating method thereof |
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