JPH04102099U - Electron beam irradiation device - Google Patents

Abstract

(57) [Summary] [Configuration] The other end of the intermediate conductor 11 and the shield flange 17
A one-turn spiral plate 20 is arranged between the spiral plate 20, the outer end of the spiral plate 20 is fixed to the insulating support 7, and the inner end is fixed to the intermediate conductor 11. A voltage dividing resistor 16 is arranged in a one-turn spiral shape, and a constant voltage diode 21 for potential fixing connected in parallel to the first voltage dividing resistor 15 is held in a holding collar 18a in the middle of an insulating column 18. be. [Effect] A large number of second voltage dividing resistors 16 can be installed without meandering between the other end of the intermediate conductor 11 and the shield flange 17.
and the constant voltage diode 21, a large number of the second voltage dividing resistors 16 and the constant voltage diode 21 can be arranged with good connection, and the intermediate conductor 11
And the electric field of the shield flange 17 is not disturbed.

Description

[Detailed explanation of the idea]

0001

[Industrial application field]

This idea is based on an electron beam irradiation device that irradiates various objects such as paint and resin with electron beams. It is related to.

0002

[Conventional technology]

An example of a conventional electron beam irradiation device will be explained based on FIG. 4. Figure 4 shows the electron beam irradiation system. FIG. This electron beam irradiation device includes a cathode 3 placed inside a vacuum chamber 1. A metal foil film made of titanium (Ti) or the like is applied to prevent the electron beam emitted from the shield electrode 2 The light is emitted from an irradiation window 4 toward the outside.

This electron beam irradiation device includes a vacuum chamber 1 that can be kept in a vacuum state from an exhaust section 9 by a vacuum pump 10, and a tank that is filled with an insulating gas such as SF ₆ and is grounded. 8, and an insulating support 7 is provided between the vacuum chamber 1 and the tank 8. A hollow cylindrical intermediate conductor 11 is inserted through the center of the insulating support 7 so as to be insulated from the vacuum chamber 1, and a high voltage conductor 6 is inserted and arranged inside the intermediate conductor 11, so that the inside of the vacuum chamber 1 and A shield electrode 2 is fixed to one end of the intermediate conductor 11, which is provided with a terminal 5a to which a power supply line 5 for supplying heating power is connected, with an insulator 13 interposed therebetween. 2a is a flange of the shield electrode 2. A plurality of insulating columns 18 are erected on the end surface of the other end of the intermediate conductor 11, and an accelerating voltage (-HV ) is fixed to the shield flange 17.

0004 A first and second voltage dividing resistor 1 is provided between the shield flange 17 and the tank 8. 5 and 16, and connect the connection point of the first and second voltage dividing resistors 15 and 16 in the middle. It is connected to the intermediate conductor 11. Furthermore, a constant voltage diode is connected in parallel with the first voltage dividing resistor 15. 21 is connected. 22 is a protection gap. Note that the insulating support 7 does not mechanically connect the intermediate conductor 11 or the shield electrode 2 as described above. In addition to supporting the intermediate conductor 11 or shield electrode 2 and the vacuum chamber 1, By partitioning the vacuum chamber 1 and the tank 8, It functions to maintain the inside of the chamber 1 in a vacuum. In addition, the insulating support 18 , the tension caused by the gas pressure of the insulating gas sealed in the tank 8 on the insulator 13 The effect of reducing the bending moment due to force and the weight of the shield electrode 3 is fulfilled.

[0005] In the electron beam irradiation device with such a configuration, the power supplied by the power supply line 5 Thermionic electrons emitted from the heated cathode 3 are transferred to the shield electrode 2 through the high voltage conductor 6. It is accelerated by the supplied accelerating voltage (-HV) and taken into the atmosphere through the irradiation window 4. and irradiates a sample (not shown). At this time, the connection point is connected between the high voltage conductor 6 and the tank 8, and the intermediate conductor The first and second voltage dividing resistors 15 and 16 connected to the body 11 are The applied accelerating voltage (-HV) is divided into parts, and the insulating support 7, the insulator 13, and the insulating It functions to fix the potential applied to the pillar 18. Also, constant voltage diode 21 is the insulator 13 and insulation support due to contamination and other factors. Even when the insulation resistance of the body 7 and the insulating column 18 decreases, the second voltage dividing resistor 16 This is to fix the potential so that the applied voltage does not exceed a predetermined value.

[0006]

[Problem that the idea aims to solve]

However, since the voltage regulator diode 21 has a low withstand voltage per piece, it is usually Use multiple units connected in series. In this case, the rate at which the accelerating voltage (-HV) increases The number of such devices has increased accordingly, and the installation space has become a problem. The purpose of this invention is to avoid disturbing the electric field of the shield flange and intermediate conductor. A large number of second voltage dividing resistors and constant voltage diodes can be arranged with good connection. An object of the present invention is to provide an electron beam irradiation device that can perform

[0007]

[Means to solve the problem] The electron beam irradiation device of this invention has a structure between the other end of the intermediate conductor and the shield flange. Place one turn of the spiral plate, and connect the outer end of this spiral plate to the insulating support and the inner Each end is fixed to an intermediate conductor, and a second voltage dividing resistor is connected along the surface of this spiral plate. At the same time, a constant voltage diode for potential fixing is installed in the middle of the insulating column. It is characterized by being held in a holding tsuba.

[0008]

[Effect]

The electron beam irradiation device of this invention uses an insulating support for the spiral plate at its outer and inner ends. and the intermediate conductor, the connection between the other end of the intermediate conductor and the shield flange is A second voltage dividing resistor is arranged in a spiral shape along the surface of the spiral plate. At the same time, a potential is applied to the retaining flange installed in the middle of the insulating column erected at the other end of the intermediate conductor. Since the constant voltage diode was kept fixed, the other end of the intermediate conductor and the shield flange A large number of second voltage divider resistors and constant voltage diodes can be connected without disturbing the electric field between the can be supported.

[0009]

【Example】

An embodiment of the electron beam irradiation device of this invention will be described based on FIGS. 1 and 2. Figure 1 shows a conventional electron beam irradiation device (Figure 4) with the other end of the intermediate conductor 11 attached. 2 is an enlarged longitudinal sectional view of the main part of the 4 is a sectional view showing the arrangement of the odes, and the same or equivalent parts as in FIG. A detailed explanation thereof will be omitted.

0010 An intermediate conductor 11 passes through the insulating support 7, and this intermediate conductor 11 is connected to a vacuum chamber. is supported by a member (not shown) and a tank (not shown). A plurality of insulating columns 18 are erected on the end surface of the other end of the intermediate conductor 11, and these insulating columns 18 An accelerating voltage ( -HV) is fixed, and this shield flange 17 and between the tank (not shown) and the insulating support 7 and the insulator (not shown) in parallel. A plurality of first and second voltage dividing resistors 15 and 16 are connected, and this first voltage dividing resistor A plurality of constant voltage diodes 21 are connected in parallel with the resistor 15.

[0011] The plurality of second voltage dividing resistors 16 have an outer end 20a connected to the insulating support 7 and an inner end 20b connected to the insulating support 7. By fixing each to the intermediate conductor 11, the other end of the intermediate conductor 11 and the shield of the one-turn spiral plate 20 disposed between the flange 17 and the flange 17; Place it along the surface. In addition, a plurality of constant voltage diodes are connected in parallel to the first voltage dividing resistor 15 to fix the potential. The board 21 is a retainer provided at the middle part of the insulating column 18 erected at the other end of the intermediate conductor 11. It is held by the collar 18a. In this case, each voltage regulator diode 21 is connected to the same voltage regulator as shown in FIG. located on one circumference and spirally formed between the shield flange 17 and the intermediate conductor 11 It is preferable that the electric field distribution between the two electrodes is arranged between the two electrodes to improve the electric field distribution therebetween. In addition, 22 is A protective gap connected in parallel to the constant voltage diode 21 and the first voltage dividing resistor 15 be.

0012 In the electron beam irradiation device with such a configuration, as in the conventional example, the power is supplied by the power supply line 5. Thermionic electrons emitted from the cathode 3 heated by the electric power caused by the high voltage conductor 6 The irradiation window is accelerated by the accelerating voltage (-HV) supplied to the shield electrode 2 through the irradiation window. 4 into the atmosphere and irradiates a sample (not shown). In this way, the acceleration voltage (-HV) applied to the shield electrode 2 is divided into multiple A second voltage dividing resistor 16 is disposed between the other end of the intermediate conductor 11 and the shield flange 17. While arranging it along the surface of the one-turn spiral plate 20, A plurality of constant voltage dies are installed to prevent the voltage applied to the insulator 13 from exceeding a predetermined value. The wire 21 is held in a spiral shape by a holding collar 18a provided at the middle of the insulating support 18. By doing so, the narrow space between the other end of the intermediate conductor 11 and the shield flange 17 is Since it is possible to support a plurality of constant voltage diodes 21 without meandering, It does not disturb the electric field of the intermediate conductor 11 and the shield flange 17, and prevents discharge accidents. It can be prevented.

[0013]

[Effect of the idea] The electron beam irradiation device of this invention has a structure between the other end of the intermediate conductor and the shield flange. Place a spiral plate with one turn and fix the outer end of this spiral plate to an insulating support. At the same time, the inner end is fixed to the intermediate conductor, and a second portion is attached along the surface of this spiral plate. For potential fixing, piezoresistors are arranged in a one-turn spiral and connected in parallel to the first voltage dividing resistor. By holding the constant voltage diode in the retaining collar in the middle of the insulating column, the A large number of second dividing resistors can be connected without meandering between the other end of the body and the shield flange. A large number of second voltage dividing resistors can support resistors and constant voltage diodes. and voltage regulator diodes can be arranged with good connection, and the intermediate conductor and It does not disturb the electric field of the field flange.

[Brief explanation of drawings]

FIG. 1 is an enlarged vertical cross-sectional view of a main part of an embodiment of an electron beam irradiation device of this invention.

FIG. 2 is a longitudinal sectional view taken along line AA' in FIG. 1;

FIG. 3 is a cross-sectional view showing the arrangement of voltage regulating diodes.

FIG. 4 is a schematic vertical cross-sectional view of a conventional electron beam irradiation device.

[Explanation of symbols]

6 High voltage conductor 7 Insulating support 11 Intermediate conductor 15 First voltage dividing resistor 16 Second voltage dividing resistor 17 Shield flange 18 Insulating support 18a Holding guard 20 Swirl plate 21 Constant voltage diode

Claims (1)

[Scope of utility model registration request] 1. An insulating support for partition is provided between the vacuum chamber and the tank, a hollow cylindrical intermediate conductor is supported through the center of the insulating support, and a high voltage conductor is installed inside the intermediate conductor. A shield electrode is fixed to one end of the intermediate conductor inserted and protruded into the vacuum chamber with an insulator interposed therebetween, an insulating column is erected at the other end of the intermediate conductor, and the intermediate conductor A shield flange is fixed to an end of the high voltage conductor protruding from the other end, a first voltage dividing resistor is provided between the shield flange and the intermediate conductor, and a second voltage dividing resistor is provided between the intermediate conductor and the tank. An electron beam irradiation device is provided in which a one-turn spiral plate is arranged between the other end of the intermediate conductor and the shield flange, and the outer end of the spiral plate is connected to the insulating support. fixing the inner ends to the intermediate conductor, respectively;
The second voltage dividing resistor is connected along the surface of this spiral plate to 1
An electron beam irradiation device characterized in that a constant voltage diode for potential fixing, which is arranged in a spiral shape of turns and connected in parallel to the first voltage dividing resistor, is held in a holding collar in the middle part of the insulating column.