JPH04100044A - Device and method for collating mask pattern - Google Patents

Abstract

PURPOSE:To accomplish accurate collation and to drastically improve reliability on a mask by using the mask or a reticle which is recognized as an accurate one by a producing manager as a reference mask pattern in a mask main body having the mask pattern which is produced the same as design. CONSTITUTION:A mask pattern collating device 1 is provided with a reference data supply means 4 constituted of a conversion means 2 for converting the shape of the mask pattern from the mask main body P, which is previously recognized and guaranteed, into digital data and a storage means 3 for storing the data converted in the means 2, and a conversion storage means 7 constituted of a conversion means 5 for converting the mask pattern of the mask Q for inspection into the digital data and a storage means 6 storing the converted data, and it is also provided with a comparison means 8 for comparing the mask pattern data supplied from the means 4 with the pattern data supplied from the means 7, a collating means 9 for detecting coincidence/noncoincidence between the pattern data from both means based on the result of arithmetic processing of the means 8, and a display means 10 for displaying the output of the means 9.

Description

[Detailed Description of the Invention] [Summary] The present invention relates to a mask pattern matching device and a mask pattern matching method, and is capable of constantly supplying and using a mask body having the same mask pattern as a certified and guaranteed mask pattern. For the purpose of Conversion storage means for storing,
It is comprised of a comparing means for comparing the mask pattern data of the reference data supply means and the mask pattern data from the converting means, and a means for displaying the result of the comparison process.

[Industrial application field]

The present invention relates to a mask pattern matching device and a mask pattern matching method.

[Conventional technology]

BACKGROUND ART Conventionally, when forming semiconductor elements or wiring between semiconductor elements, a mask having a predetermined pattern is usually used to perform patterning by exposure, and then processes such as ion implantation are performed.

Therefore, in this process, the pattern shape and contents of the mask used are important, and if the mask pattern is deformed or has scratches, the quality of the product will deteriorate. Not only that, but it also causes a large number of defective products and an increase in costs.

Therefore, when manufacturing a mask for the first time, it is necessary to form a mask pattern on the mask body with great care to manufacture a mask having a pattern completely identical to the desired mask pattern.

However, in the past, the current situation is to judge whether or not the mask patterns are the same based on the mask that has already been manufactured. It has been difficult to manufacture masks with

Furthermore, even if it happens to be possible to manufacture a mask with a pattern that is completely the same as the desired mask pattern, the condition of the mask pattern is frequently changed because the mask pattern is deformed or damaged during use. It was necessary to check and verify.

However, as mentioned above, in the past, judgments were made based on the mask once manufactured, so it was not possible to judge whether the pattern was exactly the same as the desired mask pattern. .

Conventionally, methods for inspecting and matching the mask patterns include a method of directly comparing a standard mask pattern and a mask to be inspected using an actual size mask, and a method of inspecting and matching the mask pattern by directly comparing it with the mask to be inspected using an actual size mask. There is a method of inspection and verification using a so-called reticle, which is a mask pattern that has been enlarged to about 5 to 10 times that size, and there is also a method of digitizing the pattern of the mask or reticle. There are methods for inspection and verification by directly comparing the data obtained, and methods for inspection and verification by comparing the actual mask or reticle and digitized data of the pattern. There are fundamental problems in this, such as the lack of reliability of the standard mask pattern itself, and problems with accuracy and stability as the standard itself is constantly changing.

(Problems to be Solved by the Invention) The purpose of the present invention is to improve the drawbacks of the prior art,
Because certified masks with pre-designed mask patterns can be manufactured and used at any time,
The object of the present invention is to provide a mask pattern inspection/verification device and an inspection/verification method that are simple and efficient.

[Means for Solving the Problems] In order to achieve the above-mentioned object, the present invention adopts the technical configuration as described below.

That is, a reference data supply means converts a mask pattern shape from a mask body certified and guaranteed in advance into digital data and stores it, and a conversion means converts a mask pattern of a mask to be inspected into digital data and stores it. A mask pattern matching device comprising a storage means, a comparison means for comparing the mask pattern data of the reference data supply means and the mask pattern data from the conversion means, and a means for displaying the result of the comparison processing. be.

That is, in view of the problems of conventional mask pattern inspection and verification methods, the present invention provides a mask body having a mask pattern that is actually manufactured according to a predetermined design, so that a manufacturing manager can accurately A mask or reticle that has been certified as a standard mask pattern is used as a reference mask pattern.

Conventionally, when inspecting such mask patterns, reference data for inspection and mask pattern drawing data used for inspection verification are created at the same time, so even if there is a defect in the drawing data, If the inspection data itself contains defects, there are problems with accuracy, precision, reliability, etc. as described above, but in the present invention, Using a pre-certified mask pattern of a completed mask or reticle with an accurate pattern as a reference, the pattern of the mask is converted into digital data and registered in the storage means as reference inspection verification data. Inspection verification data can be used to match the pattern of masks in use, and the verification data can also be used to produce multiple masks with exactly the same pattern as the certified and guaranteed mask pattern. becomes possible.

A specific example of the mask pattern matching device according to the present invention will be described with reference to FIG.

FIG. 1 is a block diagram showing an example of a mask pattern matching device according to the present invention, and the mask pattern matching device 1 is a converting means for converting a mask pattern shape into digital data from a mask body P that has been certified and guaranteed in advance. 2 and a storage means 3 for storing the digital data converted by the conversion means 2; and a conversion for converting the mask pattern of the mask Q to be inspected into digital data. It has conversion storage means 7 composed of means 5 and storage means 6 for storing the digital data converted by the conversion means 5, and further includes a mask pattern supplied from the reference data supply means 4. Comparing means 8 for comparing data and the mask pattern data supplied from the converting means 7; collating means 9 for detecting coincidence or mismatch between the pattern data of the two based on the arithmetic processing results of the comparing means 8; It is composed of a display means 10 for displaying the output of the collation means 9.

In the present invention, the converting means 2 may be configured to decompose the mask pattern into pixels of an appropriate size using an appropriate optical sensor or the like, and convert the pixel into digital data.

As a method of converting and storing the mask pattern data of the certified mask body P, for example, optically magnifying the pattern of the actual certified mask or reticle,
A light receiving unit such as a photomultiplier receives the signal, converts it into a digital signal, and registers the signal.

Furthermore, the storage means 3 and 6 used in the present invention may be of any type as long as it has an appropriate memory function.

Furthermore, in the present invention, the mask pattern data of the mask body P that has been certified and guaranteed can be stored in the storage means 3 provided in the mask pattern matching device.
It is also possible to store the digital data in a storage means separate from the mask pattern matching device, such as a magnetic tape or a magnetic disk. In this case, the digital data is stored in a predetermined location. By using it at the required time, you can not only easily produce a mask with the same pattern as the certified mask pattern, but also easily match the mask to be inspected with the certified mask pattern. It becomes possible to do so.

In addition, the reference verification data consisting of the mask pattern data of the certified mask body P in the present invention may be compared and verified with the data used to manufacture the mask or reticle, and may be compared with the data used to manufacture the mask or reticle. It may also be compared with conversion data regarding masks and reticles.

Next, a specific example of the mask pattern matching method according to the present invention will be explained with reference to FIG.

First, a mask body or reticle P having a standard pattern certified and guaranteed in advance is prepared (first step). Next, the mask pattern shape of the certified mask body P is converted from a real pattern to digital data using an appropriate conversion means, and the converted data is stored on an appropriate storage means, such as a magnetic tape (MT-3). ) etc. (second step).

On the other hand, a mask or reticle which is stored in the reference data supply means or which is separately created using the reference reference data and converted and recorded on a magnetic tape (MT-1), etc. The mask Q is actually manufactured using digital data related to the mask Q using, for example, an electron beam exposure device. Then, the newly produced mask is transferred to an inspection process to check whether or not it has a pattern that matches a predetermined certified standard pattern. In other words, a mask to be inspected is prepared. (Third step) Also, this step does not only target newly manufactured masks, but also samples previously manufactured masks that are used in the actual manufacturing stage at an appropriate time. In some cases, the inspection and verification process is carried out.

In this way, the mask to be inspected that has been transferred to the inspection and verification process is first converted into digital data using the same method as when creating the reference verification data above, and then converted to appropriate data. It is stored in the conversion storage means (fourth step). In this case, the conversion storage means may be constituted by an appropriate storage means, such as a magnetic tape (MT-2).

Thereafter, the mask pattern data, which is the reference verification data of the reference data supply means, and the mask pattern data of the mask to be inspected of the conversion storage means are compared (fifth step). Such a comparison operation can be performed using normal image processing technology and pattern recognition technology to determine whether the two mask patterns completely match.

Furthermore, even if the two do not match, it is possible to make a judgment based on the degree of mismatch as to whether the error is allowable or whether the product should be identified as a defective product.

Furthermore, even if the two do not match, it is possible to determine which portion is the mismatch, making it easier to identify defective locations and making process control easier.

Finally, the results of the comparison process are displayed using an appropriate display means, thereby making it possible to visually understand the relationship between both patterns and efficiently performing mask pattern matching. (Sixth step).

〔effect〕

Since the present invention adopts the technical configuration as described above, it is possible to perform more accurate matching than conventional pattern inspection and matching methods, which greatly improves the reliability of masks. In addition, storage and management of mask patterns, as well as production management of manufacturing processes, can be easily and centrally performed.

[Brief explanation of the drawing]

FIG. 1 is a diagram explaining the principle of a mask pattern matching device according to the present invention, and is a schematic diagram showing an integrated example of the mask pattern matching device according to the present invention. FIG. 2 is a block diagram showing an example of the mask pattern matching method according to the present invention. 1-... 2, 5 3, 6 4, 8-... ・Mask pattern matching device conversion means 111111 storage means reference data supply means conversion storage means comparison means collation means display means

Claims (1)

[Claims] 1. Reference data supply means for converting the shape of a mask pattern from a mask body certified and guaranteed in advance into digital data and storing it; and a conversion storage means for storing the mask pattern data, a comparison means for comparing the mask pattern data of the reference data supply means and the mask pattern data from the conversion means, and a means for displaying the results of the comparison processing. A mask pattern matching device characterized by: 2. A first step of preparing a mask body that has been certified and guaranteed in advance; a second step of converting the mask pattern shape of the mask body that has been certified and guaranteed into digital data and storing it in a reference data supply means; a third step of preparing a mask for inspection; a fourth step of converting the mask pattern of the mask to be inspected into digital data and storing it in a conversion storage means;
a fifth step of comparing the mask pattern data of the reference data supply means and the mask pattern data of the conversion storage means;
and a sixth step of displaying the results of the comparison process.