JPH0388250A - Mass sorting ion source box - Google Patents

Mass sorting ion source box

Info

Publication number
JPH0388250A
JPH0388250A JP1222322A JP22232289A JPH0388250A JP H0388250 A JPH0388250 A JP H0388250A JP 1222322 A JP1222322 A JP 1222322A JP 22232289 A JP22232289 A JP 22232289A JP H0388250 A JPH0388250 A JP H0388250A
Authority
JP
Japan
Prior art keywords
wall surface
paperizer
mass
probe
high mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1222322A
Other languages
Japanese (ja)
Inventor
Yoshiki Uratani
浦谷 吉樹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1222322A priority Critical patent/JPH0388250A/en
Publication of JPH0388250A publication Critical patent/JPH0388250A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To guide high mass quantity material to an MS guide port of a mass analyzer in an ionizing chamber and improve the analysis sensitivity for the high mass quantity material by providing the MS guide port in a curved surface properly apart from a sample gas jet port. CONSTITUTION:An MS guide port 2B is provided in an inner wall of a curved surface of an ionizing chamber properly apart from a jet port of a vaporizer probe 1, so that gas of a high mass quantity moving close to the wall surface passes around the MS guide port 2B. A repeller electrode is provided at a close position facing the guide port 2B, so ions of a high mass quantity are guided to MS effectively. The measuring precision of the high mass ions can thus be increased at the MS.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、質量分析計等に用いられる質量分別型イオン
源ボックスに関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a mass fractionating ion source box used in a mass spectrometer or the like.

(従来の技術) 従来の液体クロマトグラフ質量分析器(LC・MS)の
イオン源ボックスを第2図に示す、LCから流出する試
料液をペーパライザープローブ1でガス化して、イオン
化室2Aに噴出する。イオン化室に噴入された試料ガス
は、電子銃3から放出される加速電子と衝突してイオン
化される。イオン化された試料分子は、イオン化室内に
拡散されており、拡散されたイオンをリペラ電極4によ
る電界の力により質量分析器(MS)の方へ押出し、押
出されたイオンがMS導入孔2Bを通過して、MSに導
入されるが、質量数の大きい試料イオンは加速されにく
いために、質量数の大きい試料イオンは質量分析器の方
へ導入される量が少なく、高質量物質を分析する場合に
測定感度が低くなると云う問題があった。
(Prior art) The ion source box of a conventional liquid chromatograph mass spectrometer (LC/MS) is shown in Fig. 2.The sample liquid flowing out from the LC is gasified by a paperizer probe 1 and then jetted into an ionization chamber 2A. do. The sample gas injected into the ionization chamber collides with accelerated electrons emitted from the electron gun 3 and is ionized. The ionized sample molecules are diffused in the ionization chamber, and the force of the electric field by the repeller electrode 4 pushes the diffused ions toward the mass spectrometer (MS), and the pushed ions pass through the MS introduction hole 2B. However, since sample ions with a large mass number are difficult to accelerate, a small amount of sample ions with a large mass number are introduced into the mass spectrometer, and when analyzing high-mass substances. However, there was a problem in that the measurement sensitivity decreased.

〈発明が解決しようとする課題〉 本発明は、高質量物質の分析に対する測定感度を向上さ
せることを目的とする。
<Problems to be Solved by the Invention> An object of the present invention is to improve measurement sensitivity for analysis of high-mass substances.

(課題を解決するための手段) イオン源ボックスにおいて、ペーパライザープローブの
噴出口に対向する壁面をペーパライザー側から見て凹面
に湾曲させ、上記ペーパライザープローブのノズル軸を
上記湾曲壁面に接するように配直し、上記ペーパライザ
ー10−プの噴出口から適当に離れた上記湾曲壁面にM
S導入孔を設け、上記湾曲壁面の内側で上記MS導入孔
に対向する位lにリペラ電極を設け、上記MS導入孔に
対して上記ペーパライザープローブの噴出口とは反対側
から排気するようにした。
(Means for Solving the Problem) In the ion source box, the wall surface facing the ejection port of the paperizer probe is curved concavely when viewed from the paperizer side, and the nozzle axis of the paperizer probe is brought into contact with the curved wall surface. M is arranged on the curved wall surface appropriately away from the spout of the paper riser 10-p.
An S introduction hole is provided, and a repeller electrode is provided inside the curved wall surface at a position opposite to the MS introduction hole, so as to exhaust air from the opposite side of the paperizer probe to the MS introduction hole. did.

(作用) 本発明の構成によると、試料ガスは、凹曲面にその接線
方向から噴出されて、ガス流は、巨視的には、この曲面
に沿って流れる。この流れにおいて、凹曲面に沿いガス
流の粘性に基づく境界層が形式されている。しかし、イ
オン源ボックス内は排気されているので、その流れは大
気圧下の空気力学的な流れとは相当異なっていて、境界
層は厚くなっている。境界層は壁面に垂直の方向に壁面
に垂直方向のガス粒子の運動量が拡散している場であっ
て、運動量の拡散に伴ってガス粒子つまり物質の拡散も
起こるが、その拡散速度は重い粒子より成る物質程遅い
、即ち、低質量の試料ガス程拡散し易く、従って、低質
量の試料ガスは高質量の試料ガスと比べて曲面から早く
離れて拡散する、言い換えれば、境界層内では、高質量
の試料ガス程、拡散速度が遅く境界層内に留まる時間が
長い、従って、慣性が大きい高質量の試料成分ガスは、
低質量の試料成分ガスより長く曲面に沿って移動する率
が高く、境界層内の成分比率は壁面に沿ってペーパライ
ザー噴出口から遠ざかるにつれて、重い成分比率が高ま
る。そこでMS導入口を、試料ガス噴出口から適当に離
れた曲面に設けることにより、高質量物質をイオン化室
のMS導入孔に効率的に導かれる。こ1で、イオン源ボ
ックス内は減圧されていて、境界層が厚くなっているの
で、MS導入口の口径をこの境界層の厚さより小さくで
き、リペラも境界層内に配置できるから質量によるイオ
ン選別ができることになる。
(Function) According to the configuration of the present invention, the sample gas is ejected from the tangential direction of the concave curved surface, and the gas flow macroscopically flows along this curved surface. In this flow, a boundary layer is formed along the concave curved surface based on the viscosity of the gas flow. However, because the ion source box is evacuated, the flow is quite different from the aerodynamic flow at atmospheric pressure, and the boundary layer is thicker. The boundary layer is a field where the momentum of gas particles in the direction perpendicular to the wall surface is diffused. Along with the diffusion of momentum, gas particles, or substances, also diffuse, but the diffusion rate is faster than that of heavier particles. In other words, in the boundary layer, the sample gas with lower mass diffuses more easily, and therefore, the sample gas with lower mass diffuses away from the curved surface faster than the sample gas with higher mass. The higher the mass of the sample gas, the slower the diffusion rate and the longer it stays in the boundary layer. Therefore, the higher the inertia of the sample component gas, the higher the inertia.
It has a higher rate of movement along a curved surface for a longer time than a sample component gas with a lower mass, and the ratio of heavier components in the boundary layer increases as it moves away from the paperizer jet port along the wall surface. Therefore, by providing the MS inlet on a curved surface appropriately away from the sample gas outlet, high-mass substances can be efficiently guided to the MS inlet of the ionization chamber. In this step, the pressure inside the ion source box is reduced and the boundary layer is thick, so the diameter of the MS inlet can be made smaller than the thickness of this boundary layer, and the repeller can also be placed within the boundary layer, so ions due to mass can be reduced. You will be able to make a selection.

(実施例) 第1図に本発明の一実施例を示す、第1図において、1
はLCから流出する試料をガスイオン化し、イオン化室
2Aに液状をガス化して噴出させるペーパライザープロ
ーブである。3は電子銃で、イオン化室2Aに噴出する
試料ガスに電子を衝突させて、試料ガスをイオン化する
。2はイオン源ボックスで、上記ペーパライザープロー
ブ1に対向する側の内壁を湾曲面でrigしてイオン化
室2Aを設け、上記ペーパライザープローブ1をそのノ
ズル軸がイオン化室2Aの曲面に接するように配置し、
試料ガスをイオン化室2Aの湾曲した壁面に沿わせて高
速で噴出させる。高速で噴出された試料ガスは、作用の
項の説明による慣性作用によって、質量数の高いガス程
壁面に沿って遠くまで移動するようになる。ペーパライ
ザープローブ1の噴出口から適当に離れたイオン化室の
湾曲面内壁(本実施例では曲面の中間点)にMS導入孔
2Bを設け、壁面近くを移動している高質量のガスが、
該MS導入孔2B近くを通過するようにする。その導入
孔2Bと対向する近傍位置にりペラ電極4を設け、MS
導入孔2B近くを通過する高質IのイオンをMS方向に
加速させ、高質量のイオンを効率的にMSに導入し、M
Sで高質量イオンの測定精度が上がるようにしている。
(Example) FIG. 1 shows an example of the present invention.
is a paperizer probe that gas-ionizes the sample flowing out from the LC and gasifies the liquid into the ionization chamber 2A and jets it out. 3 is an electron gun that ionizes the sample gas by colliding electrons with the sample gas ejected into the ionization chamber 2A. Reference numeral 2 denotes an ion source box, and an ionization chamber 2A is provided by rigging the inner wall of the side facing the paperizer probe 1 with a curved surface. place,
The sample gas is ejected at high speed along the curved wall surface of the ionization chamber 2A. The sample gas ejected at high speed moves farther along the wall surface as the gas has a higher mass number due to the inertial action explained in the action section. An MS introduction hole 2B is provided on the inner wall of the curved surface of the ionization chamber (in this example, at the midpoint of the curved surface) at an appropriate distance from the ejection port of the paperizer probe 1, so that the high-mass gas moving near the wall surface can be
It is made to pass near the MS introduction hole 2B. A propeller electrode 4 is provided in the vicinity of the introduction hole 2B, and the MS
High-quality I ions passing near the introduction hole 2B are accelerated in the MS direction, and high-mass ions are efficiently introduced into the MS.
S is used to increase the measurement accuracy of high-mass ions.

なお、リペラ電極2Bは導入孔2Bとの距離を調整でき
るように輪方向に摺動可能に設け1分析したい高質量の
試料ガスの拡散状態によって導入孔2Bとの距離を調整
している。上記ペーパライザープローブ1の反対側に排
気口2Cを設けて、排気口2Cをロータリーポンプ5に
接続し、MS導入孔2Bを通過しなかった残留試料ガス
をイオン化室2人から排出させている。6はレンズで、
MS導入孔2Bを通過した試料ガスを収束させてMSに
導く。
The repeller electrode 2B is provided so as to be slidable in the ring direction so that the distance from the introduction hole 2B can be adjusted.1 The distance from the introduction hole 2B is adjusted depending on the diffusion state of the high mass sample gas to be analyzed. An exhaust port 2C is provided on the opposite side of the paperizer probe 1, and the exhaust port 2C is connected to a rotary pump 5 to discharge residual sample gas that has not passed through the MS introduction hole 2B from the two ionization chambers. 6 is the lens,
The sample gas that has passed through the MS introduction hole 2B is converged and guided to the MS.

(発明の効果) 本発明によれば、高質量物質を選択的効率的にMSに導
入させるようにしたことで、高質量物質の分析感度が向
上し、それによって分析精度も向上した。また、低質量
イオンのMSへの侵入が抑制されることで、キャリア物
質のイオンの導入量が減少し、キャリアによるMSの汚
染も低減する
(Effects of the Invention) According to the present invention, by selectively and efficiently introducing high-mass substances into the MS, the analysis sensitivity of high-mass substances is improved, and thereby the analysis accuracy is also improved. Additionally, by suppressing the entry of low-mass ions into the MS, the amount of carrier material ions introduced is reduced, and contamination of the MS by carriers is also reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の側断面図、第2図は従来例
の構成図である。 1・・・ペーパライザープローブ、2・・・イオン源ボ
ックス、2A・・・イオン化室、2B・・・MS導入孔
、2C・・・排気口、3・・・電子銃、4・・・リペラ
電極、5・・・ロータリポンプ、6・・・レンズ。
FIG. 1 is a side sectional view of an embodiment of the present invention, and FIG. 2 is a configuration diagram of a conventional example. 1... Paperizer probe, 2... Ion source box, 2A... Ionization chamber, 2B... MS introduction hole, 2C... Exhaust port, 3... Electron gun, 4... Repeller Electrode, 5... rotary pump, 6... lens.

Claims (1)

【特許請求の範囲】[Claims] ペーパライザープローブの噴出口に対向する壁面をペー
パライザー側から見て凹面に湾曲させ、上記ペーパライ
ザープローブのノズル軸を上記湾曲壁面に接するように
配置し、上記ペーパライザープローブの噴出口から適当
に離れた上記湾曲壁面にMS導入孔を設け、上記湾曲壁
面の内側で上記MS導入孔に対向する位置にリペラ電極
を設け、上記MS導入孔に対して上記ペーパライザープ
ローブの噴出口とは反対側から排気するようにしたこと
を特徴とする質量分別型イオン源ボックス
The wall surface facing the spout of the paperizer probe is curved concavely when viewed from the paperizer side, the nozzle axis of the paperizer probe is arranged so as to be in contact with the curved wall surface, and the nozzle axis of the paperizer probe is arranged to be in contact with the curved wall surface. An MS introduction hole is provided in the curved wall surface that is separated from the curved wall surface, a repeller electrode is provided at a position opposite to the MS introduction hole inside the curved wall surface, and a side opposite to the jet port of the paperizer probe with respect to the MS introduction hole is provided. A mass fractionating ion source box characterized by exhausting air from the
JP1222322A 1989-08-29 1989-08-29 Mass sorting ion source box Pending JPH0388250A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1222322A JPH0388250A (en) 1989-08-29 1989-08-29 Mass sorting ion source box

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1222322A JPH0388250A (en) 1989-08-29 1989-08-29 Mass sorting ion source box

Publications (1)

Publication Number Publication Date
JPH0388250A true JPH0388250A (en) 1991-04-12

Family

ID=16780540

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1222322A Pending JPH0388250A (en) 1989-08-29 1989-08-29 Mass sorting ion source box

Country Status (1)

Country Link
JP (1) JPH0388250A (en)

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