JPH0386478A - Masking sheet for sand blast - Google Patents

Masking sheet for sand blast

Info

Publication number
JPH0386478A
JPH0386478A JP22618589A JP22618589A JPH0386478A JP H0386478 A JPH0386478 A JP H0386478A JP 22618589 A JP22618589 A JP 22618589A JP 22618589 A JP22618589 A JP 22618589A JP H0386478 A JPH0386478 A JP H0386478A
Authority
JP
Japan
Prior art keywords
synthetic resin
photosensitive synthetic
resin layer
photosensitive
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22618589A
Other languages
Japanese (ja)
Inventor
Shinji Kanda
真治 神田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Manufacturing Co Ltd
Original Assignee
Fuji Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Manufacturing Co Ltd filed Critical Fuji Manufacturing Co Ltd
Priority to JP22618589A priority Critical patent/JPH0386478A/en
Publication of JPH0386478A publication Critical patent/JPH0386478A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To engrave a precise shape by sand blasting even in the case of the work surface being a curved face, by forming a photosensitive synthetic resin layer via a support layer on a base film and forming further the photosensitive synthetic resin layer having stickiness on this photosensitive synthetic resin layer. CONSTITUTION:The specific place of the photosensitive synthetic resin layer 2 surface is hardened with its light exposure, the washing is performed and the unexposed and unhardened part of the photosensitive synthetic resin layer 2 and those part of the photosensitive synthetic resin layer 3 having stickiness thereunder are removed. Thereafter, a protection film 4 is peeled off, a masking sheet 5 is sticked to the work 6 surface via the exposed and hardened part 3A of the photosensitive synthetic resin layer 3, sand blasting is performed and the part excepting those subjected to masking by the exposed and hardened parts 2A, 3A of the photosensitive synthetic resin layers 2, 3 of the work 6 surface is ground. In this case, the exposed and hardened parts 2A, 3A of the photosensitive synthetic resin layers 2, 3 of the masking sheet 5 are supported by a support layer 1A and not slided nor deformed at the sand blasting time.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は木、石、ガラス、金属等からなるワークの表面
にサンドブラストによって所定の形状の彫刻する際に用
いられるサンドブラスト用マスキングシートに関するも
のである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a masking sheet for sandblasting used when engraving a predetermined shape on the surface of a workpiece made of wood, stone, glass, metal, etc. by sandblasting. be.

〔従来の技術] 従来から感光性合成樹脂はサンドブラストの際のマスキ
ング材料として用いられていた。即ちワーク表面に感光
性合成樹脂塗布して感光性合成樹脂層を形成し、該感光
性合成樹脂層上にポジフィルムを密着させて紫外線を照
射し、該感光性合成樹脂層の露光部分を硬化させ、その
後眩惑光性合成樹脂層の非露光部分である未硬化部分を
洗い流した上でサンドブラストを行ない、該感光性合成
樹脂層の硬化部分によってマスキングされている個所以
外のワーク表面を研削してポジフィルムの形状に対応し
た形状の彫刻をワーク表面に形成する。
[Prior Art] Photosensitive synthetic resins have conventionally been used as masking materials during sandblasting. That is, a photosensitive synthetic resin layer is formed by applying a photosensitive synthetic resin to the surface of the workpiece, a positive film is closely attached to the photosensitive synthetic resin layer, and ultraviolet rays are irradiated to harden the exposed portion of the photosensitive synthetic resin layer. After that, the uncured portion of the dazzling synthetic resin layer that is not exposed to light is washed away, and then sandblasting is performed, and the surface of the workpiece other than the portion masked by the hardened portion of the photosensitive synthetic resin layer is ground. An engraving with a shape corresponding to the shape of the positive film is formed on the work surface.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら上記従来方法ではワーク表面が曲面である
ような場合には感光性合成樹脂を均一に塗布することが
困難であり、均一な感光性合成樹脂層が形成されにくい
からサンドブラストにより精密な形状を彫刻することは
困難であった。
However, with the above conventional method, it is difficult to uniformly apply photosensitive synthetic resin when the workpiece surface is curved, and it is difficult to form a uniform photosensitive synthetic resin layer, so sandblasting is used to carve a precise shape. It was difficult to do so.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は上記従来の課題を解決するための手段として、
ベースフィルム上に支持層を介して感光性合成樹脂層を
形成し、更に該感光性合成樹脂層上に粘着性を有する感
光性合成樹脂層を形成したサンドブラスト用マスキング
シートを提供するものである。
The present invention, as a means for solving the above-mentioned conventional problems,
The present invention provides a masking sheet for sandblasting, in which a photosensitive synthetic resin layer is formed on a base film via a support layer, and an adhesive photosensitive synthetic resin layer is further formed on the photosensitive synthetic resin layer.

〔作用〕[Effect]

本発明のサンドブラスト用マスキングシート(5)は感
光性合成樹脂層(2)表面所定個所を露光硬化させ、洗
い流しを行なうと該感光性合成樹脂層(2)の未露光未
硬化部分とその下の粘着性を有する感光性合成樹脂層(
3)の未露光未硬化部分が除去される。露光洗い流し後
保護フィルム(4)を剥離して感光性合成樹脂層(3)
の露光硬化部分(3)A介してワーク(6)表面に該マ
スキングシート(5)を貼着しサンドブラストを行なう
と、該ワーク(6)表面の感光性合成樹脂層(2)、(
3)の露光硬化部分(2)A。
The masking sheet for sandblasting (5) of the present invention is made by exposing and curing predetermined areas on the surface of the photosensitive synthetic resin layer (2) and washing it off. Adhesive photosensitive synthetic resin layer (
The unexposed and uncured portions of 3) are removed. After exposure and washing, remove the protective film (4) and remove the photosensitive synthetic resin layer (3).
When the masking sheet (5) is attached to the surface of the workpiece (6) through the exposed and hardened portion (3) A and sandblasting is performed, the photosensitive synthetic resin layer (2) on the surface of the workpiece (6) (
3) Exposure hardening part (2)A.

(3)Aとによりマスキングされている部分以外の部分
が研削される。上記マスキングシート(5)の感光性合
成樹脂層(2)、(3)の露光硬化部分(2)A、(3
)Aは支持層(1)Aにより支持されており、ワーク(
6)貼着時やサンドブラスト時にずれや変形を起さない
し、また上記マスキングシート(5)はワーク(6)の
曲面にも追従可能である。
(3) The parts other than the parts masked by A are ground. The exposed and hardened portions (2)A, (3) of the photosensitive synthetic resin layers (2) and (3) of the masking sheet (5)
)A is supported by the support layer (1)A, and the workpiece (
6) No displacement or deformation occurs during pasting or sandblasting, and the masking sheet (5) can also follow the curved surface of the workpiece (6).

〔発明の効果〕〔Effect of the invention〕

したがって本発明においてはワーク表面が曲面であって
も精密な形状をサンドブラストによって彫刻することが
出来る。
Therefore, in the present invention, even if the workpiece surface is a curved surface, a precise shape can be engraved by sandblasting.

〔実施例〕〔Example〕

本発明を第1図〜第6図に示す一実施例によって説明す
れば、(1)はベースフィルムでありポリエステル、ポ
リエチレン、ポリプロピレン等のプラスチックを材料と
し、該ベースフィルム(1)上には支持層(1)Aが設
けられ、該支持層(1)A上には感光性合成樹脂層(2
)が形成される。該支持M(1)Aはポリエステル系、
アクリル系、スチレン系、ビニル系等のサンドブラスト
性の良好な硬調のプラスチック層である。該感光性合成
樹脂層(2)は例えばアクリル系、ウレタン系、ウレタ
ン−アクリル系等の感光性合成樹脂(七ツマ−、オリゴ
マー、プレポリマー等を含む)とアクリル系、スチレン
系、酢酸ビニル系等のアルカリ可溶性合成樹脂との混合
物の溶液をを該ベースフィルム(1)上に塗布、乾燥す
ることにより形成され、膜厚は通常20〜100μ程度
とされ、該感光性合成樹脂と該アルカリ可溶性合成樹脂
との混合比率は通常5:5〜9:上型量比、望ましくは
6:4〜8:2重量比程度とされる。該感光性合成樹脂
層(2)上には更に粘着性を有する感光性合成樹脂層(
3)が形成される。該感光性合成樹脂層(3)は硬化し
た時に粘着性を有するようなアクリル系、ウレタン系、
ウレタン−アクリル系等の感光性合成樹脂(七ツマ−、
オリゴマー、プレポリマー等を含む)とアルカリ可溶性
合成樹脂との混合物を該感光性合成樹脂層(2)上に塗
布することにより形成され、膜厚は通常5〜20μ程度
とされ、該感光性合成樹脂と該アルカリ可溶性合成樹脂
との混合比率は通常5:5〜9:1重量比、望ましくは
6:4〜8:2重量比程度とされる。該感光性合成樹脂
層(3)表面にはポリエチレン、ポリプロピレン、ポリ
エステル、離型紙等の離型性を有する保護フィルム(4
)が被覆される。
To explain the present invention with reference to an embodiment shown in FIGS. 1 to 6, (1) is a base film made of plastic such as polyester, polyethylene, polypropylene, etc. A layer (1)A is provided, and a photosensitive synthetic resin layer (2) is provided on the support layer (1)A.
) is formed. The support M(1)A is polyester-based,
This is a high-contrast plastic layer made of acrylic, styrene, vinyl, etc. that has good sandblasting properties. The photosensitive synthetic resin layer (2) is made of, for example, a photosensitive synthetic resin such as acrylic, urethane, or urethane-acrylic (including hexamer, oligomer, prepolymer, etc.), acrylic, styrene, or vinyl acetate. It is formed by applying a solution of a mixture of the photosensitive synthetic resin and the alkali-soluble synthetic resin onto the base film (1) and drying it, and the film thickness is usually about 20 to 100 μm. The mixing ratio with the synthetic resin is usually about 5:5 to 9: upper mold weight ratio, preferably about 6:4 to 8:2 weight ratio. On the photosensitive synthetic resin layer (2), there is further a photosensitive synthetic resin layer (
3) is formed. The photosensitive synthetic resin layer (3) is made of acrylic, urethane, or acrylic resin that becomes sticky when cured.
Photosensitive synthetic resins such as urethane-acrylic (Nanatsumar,
(including oligomers, prepolymers, etc.) and an alkali-soluble synthetic resin on the photosensitive synthetic resin layer (2), and the film thickness is usually about 5 to 20 μm. The mixing ratio of the resin and the alkali-soluble synthetic resin is usually about 5:5 to 9:1 by weight, preferably about 6:4 to 8:2 by weight. The surface of the photosensitive synthetic resin layer (3) is coated with a protective film (4) having release properties such as polyethylene, polypropylene, polyester, release paper, etc.
) is coated.

上記マスキングシート(5)は使用に際してベースフィ
ルム(1)を剥離し、所定の形状、模様、文字等の不透
光部(7)Aを有するポジフィルム(7)を該マスキン
グシート(5)上に密着させ紫外線、太陽光線等を照射
すると、ポジフィルム(7)の不透光部(7)A当接部
分以外の感光性合成樹脂層(2)、(3)が露光され硬
化する。露光後はポジフィルム(7)を除去してアルカ
リ液で洗滌すると、該マスキングシート(5)の感光性
合成樹脂層(2)、(3)の露光硬化部分(2)A、 
(3)A以外は該アルカリ液によって洗い出される。そ
して第3図に示すように保護フィルム(4)を剥離する
と支持層(1)A上に露光硬化部分(2)A、(3)A
が形成される。これを第4図に示すように粘着性感光性
合成樹脂層(3)Aを介して木、石、金属、陶磁器等か
らなるワーク(6)の表面に貼着する。ワーク(6)表
面は感光性合成樹脂層(2)。
When the masking sheet (5) is used, the base film (1) is peeled off, and a positive film (7) having an opaque area (7) A of a predetermined shape, pattern, character, etc. is placed on the masking sheet (5). When the photosensitive synthetic resin layers (2) and (3) other than the portion of the positive film (7) that is in contact with the opaque portion (7) A are exposed and hardened, the photosensitive synthetic resin layers (2) and (3) are exposed and cured. After exposure, when the positive film (7) is removed and washed with an alkaline solution, the exposed and cured portions (2)A of the photosensitive synthetic resin layers (2) and (3) of the masking sheet (5) are
(3) All substances other than A are washed out by the alkaline solution. Then, as shown in Fig. 3, when the protective film (4) is peeled off, the exposed and hardened portions (2)A and (3)A appear on the support layer (1)A.
is formed. As shown in FIG. 4, this is adhered to the surface of a workpiece (6) made of wood, stone, metal, ceramics, etc. via an adhesive photosensitive synthetic resin layer (3)A. The surface of the workpiece (6) is a photosensitive synthetic resin layer (2).

(3)の所定形状の露光硬化部分(2)A、 (3)A
によりマスキングされ、この状態でサンドブラストを施
せば、第5図に示すようにワーク(6)表面のマスキン
グ部分(6)A以外は研削され、かくして第6図に示す
ように表面に彫刻(6)Bが施された製品(6)を得る
(3) Predetermined shape of exposed and hardened portion (2)A, (3)A
If sandblasting is performed in this state, the surface of the workpiece (6) other than the masked part (6) A will be ground as shown in Figure 5, and thus the surface will be engraved (6) as shown in Figure 6. A product (6) to which B has been applied is obtained.

本実施例以外、保護フィルム(4)は必須のものではな
い。
The protective film (4) is not essential except in this example.

【図面の簡単な説明】[Brief explanation of drawings]

第1図〜第5図は本発明の一実施例を示すものであり、
第1図はマスキングシート側断面図、第2図は露光状態
側断面図、第3図は洗い出し状態側断面図、第4図はサ
ンドブラスト後の側断面図、第S図は製品の側断面図で
ある。 11ffl中、 (1)・・・・・ベースフィルム。 (1)A・・・・支持層、(2)・・・・・感光性合成
樹脂層、(3)・・・・・粘着性感光性合成樹脂層第1
1 to 5 show an embodiment of the present invention,
Figure 1 is a side sectional view of the masking sheet, Figure 2 is a side sectional view of the exposed state, Figure 3 is a side sectional view of the washed out state, Figure 4 is a side sectional view after sandblasting, and Figure S is a side sectional view of the product. It is. In 11ffl, (1)...Base film. (1) A... Support layer, (2)... Photosensitive synthetic resin layer, (3)... Adhesive photosensitive synthetic resin layer first
figure

Claims (1)

【特許請求の範囲】 1、ベースフィルム上に支持層を介して感光性合成樹脂
層を形成し、更に該感光性合成樹脂層上に粘着性を有す
る感光性合成樹脂層を形成したことを特徴とするサンド
ブラスト用マスキングシート 2、該粘着性感光性合成樹脂フィルム層は保護フィルム
によって被覆されている特許請求の範囲1に記載のサン
ドブラスト用マスキングシート
[Claims] 1. A photosensitive synthetic resin layer is formed on the base film via a support layer, and a photosensitive synthetic resin layer with adhesive properties is further formed on the photosensitive synthetic resin layer. Sandblasting masking sheet 2 according to claim 1, wherein the adhesive photosensitive synthetic resin film layer is covered with a protective film.
JP22618589A 1989-08-30 1989-08-30 Masking sheet for sand blast Pending JPH0386478A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22618589A JPH0386478A (en) 1989-08-30 1989-08-30 Masking sheet for sand blast

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22618589A JPH0386478A (en) 1989-08-30 1989-08-30 Masking sheet for sand blast

Publications (1)

Publication Number Publication Date
JPH0386478A true JPH0386478A (en) 1991-04-11

Family

ID=16841223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22618589A Pending JPH0386478A (en) 1989-08-30 1989-08-30 Masking sheet for sand blast

Country Status (1)

Country Link
JP (1) JPH0386478A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101686935B1 (en) * 2015-08-10 2016-12-15 (주)화인엔코 Device for chamfering multi chip module printed circuit board and method for controllng the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101686935B1 (en) * 2015-08-10 2016-12-15 (주)화인엔코 Device for chamfering multi chip module printed circuit board and method for controllng the same

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