JPH0379786A - Chromium-plating bath - Google Patents
Chromium-plating bathInfo
- Publication number
- JPH0379786A JPH0379786A JP22476989A JP22476989A JPH0379786A JP H0379786 A JPH0379786 A JP H0379786A JP 22476989 A JP22476989 A JP 22476989A JP 22476989 A JP22476989 A JP 22476989A JP H0379786 A JPH0379786 A JP H0379786A
- Authority
- JP
- Japan
- Prior art keywords
- plating bath
- acid
- chromium
- chromium plating
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 57
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 50
- -1 Na2SO4 Chemical compound 0.000 claims abstract description 16
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims abstract description 12
- AGGIJOLULBJGTQ-UHFFFAOYSA-N sulfoacetic acid Chemical compound OC(=O)CS(O)(=O)=O AGGIJOLULBJGTQ-UHFFFAOYSA-N 0.000 claims abstract description 11
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims abstract description 9
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 claims abstract description 8
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims abstract description 8
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims abstract description 8
- ICSNLGPSRYBMBD-UHFFFAOYSA-N 2-aminopyridine Chemical compound NC1=CC=CC=N1 ICSNLGPSRYBMBD-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000004471 Glycine Substances 0.000 claims abstract description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims abstract description 6
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 claims abstract description 6
- TWBYWOBDOCUKOW-UHFFFAOYSA-N isonicotinic acid Chemical compound OC(=O)C1=CC=NC=C1 TWBYWOBDOCUKOW-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229960003512 nicotinic acid Drugs 0.000 claims abstract description 4
- 235000001968 nicotinic acid Nutrition 0.000 claims abstract description 4
- 239000011664 nicotinic acid Substances 0.000 claims abstract description 4
- PWRBCZZQRRPXAB-UHFFFAOYSA-N 3-chloropyridine Chemical compound ClC1=CC=CN=C1 PWRBCZZQRRPXAB-UHFFFAOYSA-N 0.000 claims abstract description 3
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229930024421 Adenine Natural products 0.000 claims abstract description 3
- 229960000643 adenine Drugs 0.000 claims abstract description 3
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 42
- 239000011651 chromium Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 9
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 claims description 6
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 229940081066 picolinic acid Drugs 0.000 claims description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 2
- DXTIKTAIYCJTII-UHFFFAOYSA-N guanidine acetate Chemical compound CC([O-])=O.NC([NH3+])=N DXTIKTAIYCJTII-UHFFFAOYSA-N 0.000 claims description 2
- 229910052711 selenium Inorganic materials 0.000 claims description 2
- 239000011669 selenium Substances 0.000 claims description 2
- 239000010953 base metal Substances 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-N iodic acid Chemical class OI(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-N 0.000 claims 1
- 229910021653 sulphate ion Inorganic materials 0.000 claims 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 abstract description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 abstract description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 abstract description 2
- BPMFZUMJYQTVII-UHFFFAOYSA-N guanidinoacetic acid Chemical compound NC(=N)NCC(O)=O BPMFZUMJYQTVII-UHFFFAOYSA-N 0.000 abstract 2
- 239000007832 Na2SO4 Substances 0.000 abstract 1
- UDOXKBJCUVONJD-UHFFFAOYSA-N [4-[(4-phosphonooxyphenyl)-pyridin-2-ylmethyl]phenyl] dihydrogen phosphate Chemical compound C1=CC(OP(O)(=O)O)=CC=C1C(C=1N=CC=CC=1)C1=CC=C(OP(O)(O)=O)C=C1 UDOXKBJCUVONJD-UHFFFAOYSA-N 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 3
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 3
- SUMDYPCJJOFFON-UHFFFAOYSA-N isethionic acid Chemical compound OCCS(O)(=O)=O SUMDYPCJJOFFON-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- 239000011696 chromium(III) sulphate Substances 0.000 description 2
- 239000002659 electrodeposit Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 235000010893 Bischofia javanica Nutrition 0.000 description 1
- 240000005220 Bischofia javanica Species 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000002999 depolarising effect Effects 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229940045996 isethionic acid Drugs 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
発明の背景
１、 発！しとも夏
本発明は電着層に関し、更に詳しく言えば有利な性能特
性を有する機能性の（ｆｕｎｃｔｉｏｎａｌ）クロム電
着層に関し、且つクロムメッキ浴及びか＼る有用なりロ
ム電着層を形成する方法に関する。[Detailed Description of the Invention] Background of the Invention 1, Release! FIELD OF THE INVENTION This invention relates to electrodeposited layers, and more particularly to functional chromium electrodeposited layers having advantageous performance properties and for forming chromium plating baths and such useful chromium electrodeposited layers. Regarding the method.
２、えｉ挟血二旦鳳
６価クロムのメッキ浴は米国特許第２，７５０，３３７
号；第３．３１０，４８０号；第３，３１１，５４８号
；第３．７４５゜０９７号；第３．６５４，１０１号：
第４，２３４，３９６号；第４．４０１＋、７５６号；
第４，４５０．０５０号；第４，４７２，２４９号：及
び第４，５８８，４８１号明細書に記載されている。・
これらのメッキ浴は一般に「装飾用Ｊクロムメッキに又
は「機能性」 （硬質）クロム電着に意図される。装飾
用クロムメッキ浴は不規則な形状の物品を完全に被覆し
得るように広いメッキ範囲に亘ってメッキすることに関
する。他方、機能性のクロムメッキは規則正しい形状の
物品に意図され、その場合高電流効率で且つ高電流密度
でのメッキは特別な重要性を有する。2. The hexavalent chromium plating bath is disclosed in U.S. Patent No. 2,750,337.
No. 3.310,480; No. 3,311,548; No. 3.745°097; No. 3.654,101:
No. 4,234,396; No. 4.401+, 756;
No. 4,450.050; No. 4,472,249; and No. 4,588,481.・
These plating baths are generally intended for "decorative J chrome plating" or "functional" (hard) chrome electrodeposition. Decorative chrome plating baths are concerned with plating over a wide plating area to provide complete coverage of irregularly shaped articles. On the other hand, functional chrome plating is intended for regularly shaped articles, in which case plating with high current efficiency and high current density is of special importance.
クロム酸と触媒としての硫酸塩とを含有する機能性の６
価クロムメッキ浴によると、一般に約１〜６ ａｓｉの
電流密度で約１２％〜王６％のカソード効率で金属基材
上にクロムをメッキすることができる。硫酸塩とフッ素
イオンとを含有する混合触媒のクロム酸メッキ浴による
と、一般により高いカソード効率で例えば２２％〜２６
％のカソード効率でしかもより高い速度でクロムメッキ
を可能とする。しかしながら、クロムメッキ浴にフッ素
イオンが存在すると鉄質金属基材を腐蝕させるものであ
る。Functional 6 containing chromic acid and sulfate as a catalyst
A valent chromium plating bath can typically plate chromium on metal substrates with cathodic efficiencies of about 12% to about 6% at current densities of about 1 to 6 asi. Mixed catalyst chromate plating baths containing sulfate and fluoride ions generally provide higher cathode efficiencies, e.g.
% cathode efficiency and at higher speeds. However, the presence of fluorine ions in the chromium plating bath corrodes the ferrous metal substrate.
添加剤としてヨウ素、臭素又は塩素イオンを用いる他の
クロムメッキ浴は更に高い電流効率で作動できるが、こ
れらのメッキ浴は基材に対して充分に接着してないクロ
ム電着層を生じてしまい且つ外観が艶消ししであるか又
はせいぜい半光沢であるに過ぎないクロム電着層を生じ
てしまう。例えば、米国特許第４．４７２，２４９号明
細書でケシン（Ｃｈｅｓｓｌｎ）はきわめて高い電流効
率で例えば約５０％で作動する高エネルギーで有効な機
能性のクロムメッキ浴を記載している。このメッキ浴は
一般にクロム酸と硫酸塩とヨウ化物とカルボキシレート
とよりなり；例えば約１〜６ ａｓｉの慣用の電流密度
で使用される。不運にも、このメッキ浴は接着性の問題
があり、半光沢のメッキ層を与えるに過ぎない。Other chromium plating baths using iodine, bromine or chloride ions as additives can operate at even higher current efficiencies, but these baths produce electrodeposited chromium layers that do not adhere well to the substrate. This results in a chromium electrodeposition layer that is matte or at most semi-glossy in appearance. For example, Chessln in US Pat. No. 4,472,249 describes a high energy efficient functional chromium plating bath that operates at very high current efficiencies, for example about 50%. The plating baths generally consist of chromic acid, sulfate, iodide, and carboxylate; for example, conventional current densities of about 1 to 6 asi are used. Unfortunately, this plating bath has adhesion problems and provides only a semi-gloss plating layer.
米国特許第４．５８８，４８１号明細書においてケシン
及びニューバイ（Ｎｅｗｂｙ）は低い電流密度での腐蝕
を生起することなく高効率で、虹色でない、接着してい
る、光沢のあるクロムメッキ層を製造する方法を記載し
ている。この方法はカルボン酸又はジカルボン酸の不在
下にクロム酸と硫酸塩と〉ｌ／３のＳ／Ｃ比を有する非
置換アルキルスルホン酸とより木質的になる機能性のク
ロムメッキ浴から４５〜７０℃の温度でメッキすること
に在る。In U.S. Pat. No. 4,588,481, Keshin and Newby provide highly efficient, non-iridescent, adhesive, shiny chrome plating layers without corrosion at low current densities. The manufacturing method is described. This method uses chromic acid and sulfate in the absence of carboxylic or dicarboxylic acids and unsubstituted alkyl sulfonic acids with an S/C ratio of >1/3 from a functional chromium plating bath that becomes more woody. It consists in plating at a temperature of ℃.
従って、本明細書における目的は接着性で光沢のある平
滑で硬質なりロム電着層を提供するものでありしかも高
効率で形成できしかも有用な電流密度値内で作動できる
クロム電着層を提供するものである。Accordingly, it is an object herein to provide a chromium electrodeposit layer that is adhesive, glossy, smooth, hard, and which can be formed with high efficiency and still operate within useful current density values. It is something to do.
これらの目的及び他の目的は本発明の次の詳細な記載か
ら明らかとなるであろう。These and other objects will become apparent from the following detailed description of the invention.
本発明の要約
本発明の前記目的によると、慣用のメッキ用電流密度で
光沢のある平滑な機能性のクロムを電着するための改良
したクロムメッキ浴が提供される。SUMMARY OF THE INVENTION In accordance with the foregoing objects of the present invention, an improved chromium plating bath is provided for electrodepositing bright, smooth, functional chromium at conventional plating current densities.
本発明のクロムメッキ浴はクロム酸と約４０ｇ／ｌ〜１
５０ ｇ／ｆ１．の濃度範囲のスルホ酢酸とヨウ素放出
剤と減極剤としての含窒有機化合物とより木質的になる
。The chromium plating bath of the present invention contains about 40 g/l to 1 chromic acid.
50 g/f1. becomes more woody with a concentration range of sulfoacetic acid and nitrogen-containing organic compounds as iodine release agents and depolarizers.
本発明のクロム電着層は約１〜１０ａｓｔの作ａ電流密
度範囲内で平滑で光沢があることを特に特徴としている
。The chromium electrodeposited layer of the present invention is particularly characterized by being smooth and glossy within the production current density range of about 1 to 10 ast.
本明細書におけるメッキ浴は有害なカルボン酸、フッ素
イオン、臭素イオン及びセレンイオンを実質的に含有し
ないことを更に特徴としている。The plating bath herein is further characterized in that it is substantially free of harmful carboxylic acids, fluorine ions, bromide ions, and selenium ions.
本発明の詳細な記載
本発明の代表的な機能性のクロムメッキ浴は次の成分を
含有する。DETAILED DESCRIPTION OF THE INVENTION A typical functional chrome plating bath of the present invention contains the following components.
表
■
適当な値
好ましい値
クロム酸
スルホ酢酸゛
ヨウ素酸塩
含窒有機化合物
１５０−４５０
０−１５０
０．５−１０
−４０
２００−３５０
０−１２０
−３
３−工５
住ａＳ住
電流密度（ａｓｉ） １−１０ １−
４温 度（ｔ ） ４５−７０
５０−６０中スルホ酢酸はスルホ酢酸塩又はイセチ
オン酸又はイセチオネートとしても存在でき、これらは
メッキ洛中で酸化して所望濃度のスルホ酢酸を与える。Table ■ Appropriate Values Preferred Values Chromate Sulfoacetate Iodate Nitrogen-containing Organic Compound 150-450 0-150 0.5-10 -40 200-350 0-120 -3 3-Technical 5 Sum aS Sum Current Density ( asi) 1-10 1-
4 Temperature (t) 45-70
The sulfoacetic acid in 50-60 can also be present as sulfoacetate or isethionic acid or isethionate, which are oxidized in the plating solution to give the desired concentration of sulfoacetic acid.
本発明のメッキ浴組成を用いて得られた電流効率は約２
１％の付近である。The current efficiency obtained using the plating bath composition of the present invention is approximately 2
It is around 1%.
前記した条件下で本発明のメッキ浴から金属基材例えば
鋼材上に形成した代表的なりロム電着層は次の物理特性
と化学組成と性能特性とを有する。A typical ROM electrodeposited layer formed on a metal substrate, such as steel, from the plating bath of the present invention under the conditions described above has the following physical properties, chemical composition, and performance characteristics.
表 ■
物」目り牲
基材に対する接着性 優秀
光 沢 優秀表
面 平滑惺艙旦１
硬 度 ＫＮ、。。＞ １１００、例えば１１００
Ｎ１４００ ”摩擦係数 優秀
耐摩耗性 優秀
中ＫＮ、。。は１００ ｇの錘りを用いてのヌープ硬度
である。Table ■ Adhesion to visible substrates Excellent gloss Excellent table
Surface: Smooth and polished 1 Hardness: KN. . > 1100, e.g. 1100
N1400 "Coefficient of Friction Excellent Abrasion Resistance Excellent Medium KN... is the Knoop hardness using a 100 g weight.
全ての硬度値はヌープ硬度単位（Ｋ）Ｉ）で表わす。All hardness values are expressed in Knoop hardness units (K)I).
本発明のクロムメッキ浴で用いる代表的な含窒有機化合
物にはグリシン、ニコチン酸、イソニコチン酸、ピリジ
ン、２−アミノピリジン、３−クロルピリジン、ピコリ
ン酸、グアニン、グアニジン酢酸、アデニンがある。Typical nitrogen-containing organic compounds used in the chromium plating bath of the present invention include glycine, nicotinic acid, isonicotinic acid, pyridine, 2-aminopyridine, 3-chloropyridine, picolinic acid, guanine, guanidine acetate, and adenine.
本発明のクロムメッキ浴中の含窒有機化合物はメッキ処
理における減極剤として作用する。The nitrogen-containing organic compound in the chromium plating bath of the present invention acts as a depolarizing agent in the plating process.
本発明を、次の実施例を参照して以下に詳細に記載する
。The invention will be described in detail below with reference to the following examples.
表３１１±
次の組成ニ
クロム酸 ２５０ｇ／ｆｌ
スルホ酢酸 ｔｏｏｇ／角ヨウ素酸塩″
１ｇ／ｊＺ硫酸塩′″′″ ２．
５ｇ／Ｊ２
ニコチン酸 １０ｇ／角中ヨウ素酸
カリウムとして添加した
◆◆硫酸ナトリウムとして添加した
を有するクロムメッキ浴を製造した。このメッキ浴から
、３ ａｓｉで５５℃で１０分間ニッケルメッキ済みの
鋼製心軸上にクロムをメッキして、該６軸上に０．５ミ
ルの厚さを有する光沢のある平滑な接着しているクロム
層を製造した。電流効率は２０％であった。クロム電着
層は前記表Ｈに与えた物理特性と性能特性とを有した。Table 311± The following composition dichromic acid 250g/fl sulfoacetic acid toog/horniodate''
1g/jZ sulfate′″′″2.
A chromium plating bath was prepared having 5g/J2 nicotinic acid 10g/added as potassium iodate and ◆◆added as sodium sulfate. From this plating bath, chromium was plated onto nickel-plated steel mandrels at 3 asi for 10 minutes at 55°C to form a glossy smooth bond having a thickness of 0.5 mil on the 6 axles. A chromium layer was produced. Current efficiency was 20%. The chromium electrodeposit layer had the physical and performance characteristics given in Table H above.
硬度値ＫＮ、。。は１３５０であった。Hardness value KN,. . was 1350.
実施例２
次の組成ニ
クロム酸 ２５０ｇ／Ｊ２
スルホ酢酸 ８０ｇ／ＩＬヨウ素酸塩
３ｇ／氾硫酸塩 ２ｇ／旦
グリシン ５ｇ ／ｌ
を有するクロムメッキ浴を製造した。このメッキ浴から
２ａｓｉで６０℃で３０分間不銹鋼製の６軸上にクロム
をメッキして、該６軸上に１．０ミルの厚さを有するク
ロム層を製造した。電流効率は２２％であった。Example 2 A chromium plating bath was prepared having the following composition: dichromic acid 250 g/J2 sulfoacetic acid 80 g/IL iodate 3 g/flood sulfate 2 g/glycine 5 g/l. From this plating bath, chromium was plated on 6 stainless steel shafts at 2 asi for 30 minutes at 60° C. to produce a 1.0 mil thick chromium layer on the 6 shafts. Current efficiency was 22%.
クロム電着層は前記表Ｈに与えた物理特性及び性能特性
を有した。硬度値ＫＮ＋ｏｏは１３００であった。The chromium electrodeposited layer had the physical and performance properties given in Table H above. The hardness value KN+oo was 1300.
実１饗生１
クロムメッキ浴は次の組成ニ
クロム酸 ２２５ｇ／Ｊ２
スルホ酢酸 ６０ｇ／Ｊ２ヨウ素酸塩
２ｇ／互硫酸塩 ２．０ｇ
／角
ピコリン酸 １０ｇ／ＩＬを有した
。Mitsu 1 Gyousei 1 The chromium plating bath has the following composition: dichromic acid 225g/J2 sulfoacetic acid 60g/J2 iodate 2g/mutual sulfate 2.0g
/ angle picolinic acid 10g/IL.
鋼製心軸上で５ ａｓｉで６０℃で６０分間クロムをメ
ッキして、 ２，０ミルの厚さを有するクロム層を製造
した。電流効率は２０％であった。クロム電着層の物理
特性及び化学組成は前記衣Ｈに与えたものと同様であっ
た。硬度値にＮｌ００は１３２５であった。A chromium layer having a thickness of 2.0 mils was produced by plating chromium on a steel mandrel at 5 asi for 60 minutes at 60°C. Current efficiency was 20%. The physical properties and chemical composition of the chromium electrodeposited layer were similar to those given to Coating H above. The hardness value Nl00 was 1325.
Claims (1)
ヨウ素酸塩と含窒有機化合物とより実質的になる機能性
のクロムメッキ浴。 ２、メッキ浴が別のカルボン酸とフッ素イオンと臭素イ
オンとセレンイオンとを実質的に含有しない請求項１記
載のクロムメッキ浴。 ３、クロム酸が約１５０ｇ／ｌ〜４５０ｇ／ｌの量で存
在する請求項１記載のクロムメッキ浴。 ４、スルホ酢酸が約８０〜１２０ｇ／ｌの量で存在する
請求項１記載のクロムメッキ浴。５、メッキ浴が約４．
５ｇ／ｌまでの量で硫酸塩も含有する請求項１記載のク
ロムメッキ浴。 ６、含窒有機化合物は約１〜４０ｇ／ｌの量で存在する
請求項１記載のクロムメッキ浴。７、含窒有機化合物は
グリシン、ニコチン酸、イソニコチン酸、ピリジン、２
−アミノピリジン、３−クロロピリジン、ピコリン酸、
グアニン、グアニジン酢酸及びアデニンから選ばれる請
求項１記載のクロムメッキ浴。 ８、含窒有機化合物はグリシンである請求項１記載のク
ロムメッキ浴。 ９、請求項１のメッキ浴から電着することからなる、基
材金属上に機能性のクロム層をメッキする方法。 １０、電着は約５０〜７０℃の温度で行なう請求項９記
載の方法。 １１、電着したクロム層の厚さは約０．１〜２ミルであ
る請求項９記載の方法。 １２、電着は約１〜１０ａｓｉのメッキ用電流密度で行
なう請求項９記載の方法。 １３、電着したクロム層の厚さは少なくとも０．１ミル
である請求項１２記載の方法。 １４、電流効率は少なくとも約２０％である請求項９記
載の方法。[Claims] 1. Chromic acid and 40 to 150 g/l of sulfoacetic acid;
A functional chromium plating bath made more substantial with iodates and nitrogen-containing organic compounds. 2. The chromium plating bath according to claim 1, wherein the plating bath does not substantially contain another carboxylic acid, fluorine ions, bromide ions, and selenium ions. 3. The chromium plating bath of claim 1, wherein chromic acid is present in an amount of about 150 g/l to 450 g/l. 4. The chromium plating bath of claim 1, wherein sulfoacetic acid is present in an amount of about 80 to 120 g/l. 5. The plating bath is about 4.
2. A chromium plating bath according to claim 1, which also contains sulphate in an amount of up to 5 g/l. 6. The chromium plating bath of claim 1, wherein the nitrogen-containing organic compound is present in an amount of about 1 to 40 g/l. 7. Nitrogen-containing organic compounds include glycine, nicotinic acid, isonicotinic acid, pyridine, 2
-aminopyridine, 3-chloropyridine, picolinic acid,
A chromium plating bath according to claim 1, wherein the chromium plating bath is selected from guanine, guanidine acetate and adenine. 8. The chromium plating bath according to claim 1, wherein the nitrogen-containing organic compound is glycine. 9. A method for plating a functional chromium layer on a base metal, comprising electrodeposition from the plating bath of claim 1. 10. The method of claim 9, wherein the electrodeposition is carried out at a temperature of about 50-70°C. 11. The method of claim 9, wherein the electrodeposited chromium layer has a thickness of about 0.1 to 2 mils. 12. The method of claim 9, wherein the electrodeposition is carried out at a plating current density of about 1 to 10 asi. 13. The method of claim 12, wherein the electrodeposited chromium layer has a thickness of at least 0.1 mil. 14. The method of claim 9, wherein the current efficiency is at least about 20%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22476989A JPH0379786A (en) | 1989-09-01 | 1989-09-01 | Chromium-plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22476989A JPH0379786A (en) | 1989-09-01 | 1989-09-01 | Chromium-plating bath |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0379786A true JPH0379786A (en) | 1991-04-04 |
Family
ID=16818936
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22476989A Pending JPH0379786A (en) | 1989-09-01 | 1989-09-01 | Chromium-plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0379786A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10168593A (en) * | 1996-12-12 | 1998-06-23 | Teikoku Piston Ring Co Ltd | Chromium alloy plating coating, plating method therefor and member having this coating |
| KR20030047407A (en) * | 2001-12-10 | 2003-06-18 | 주식회사 포스코 | Electrolysis chromate solution for anti-finger printing steel sheet and the method for preparing anti-finger printing steel sheet using it |
| JP2007162123A (en) * | 2005-12-13 | 2007-06-28 | Enthone Inc | Process for depositing crack-free, corrosion resistant and hard chromium and chromium alloy layer |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4810336A (en) * | 1988-06-21 | 1989-03-07 | M&T Chemicals Inc. | Electroplating bath and process for depositing functional, at high efficiencies, chromium which is bright and smooth |
-
1989
- 1989-09-01 JP JP22476989A patent/JPH0379786A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4810336A (en) * | 1988-06-21 | 1989-03-07 | M&T Chemicals Inc. | Electroplating bath and process for depositing functional, at high efficiencies, chromium which is bright and smooth |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10168593A (en) * | 1996-12-12 | 1998-06-23 | Teikoku Piston Ring Co Ltd | Chromium alloy plating coating, plating method therefor and member having this coating |
| KR20030047407A (en) * | 2001-12-10 | 2003-06-18 | 주식회사 포스코 | Electrolysis chromate solution for anti-finger printing steel sheet and the method for preparing anti-finger printing steel sheet using it |
| JP2007162123A (en) * | 2005-12-13 | 2007-06-28 | Enthone Inc | Process for depositing crack-free, corrosion resistant and hard chromium and chromium alloy layer |
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