JPH0377617A - Gas generator - Google Patents
Gas generatorInfo
- Publication number
- JPH0377617A JPH0377617A JP1213159A JP21315989A JPH0377617A JP H0377617 A JPH0377617 A JP H0377617A JP 1213159 A JP1213159 A JP 1213159A JP 21315989 A JP21315989 A JP 21315989A JP H0377617 A JPH0377617 A JP H0377617A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- concentration
- valve
- oxygen
- adsorption tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001179 sorption measurement Methods 0.000 claims abstract description 52
- 238000010992 reflux Methods 0.000 claims abstract description 19
- 239000003463 adsorbent Substances 0.000 claims description 18
- 238000003795 desorption Methods 0.000 claims description 8
- 239000007789 gas Substances 0.000 abstract description 58
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 47
- 229910052760 oxygen Inorganic materials 0.000 abstract description 47
- 239000001301 oxygen Substances 0.000 abstract description 47
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 abstract description 5
- 229910001882 dioxygen Inorganic materials 0.000 abstract description 5
- 238000000605 extraction Methods 0.000 description 9
- 239000002808 molecular sieve Substances 0.000 description 9
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- 229910052799 carbon Inorganic materials 0.000 description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 241000238631 Hexapoda Species 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000005408 paramagnetism Effects 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000002336 sorption--desorption measurement Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Landscapes
- Oxygen, Ozone, And Oxides In General (AREA)
- Separation Of Gases By Adsorption (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は気体生成装置に係り、特にＰＳＡ式％式％
に係り、特に気体濃度変更時に吸着剤の脱＠粘度を高め
吸着剤の再生を確実に行なうよう構成した気体生成装置
に関する。[Detailed Description of the Invention] Industrial Application Field The present invention relates to a gas generation device, and particularly to a PSA type % formula %, which improves the deviscosity of an adsorbent and ensures the regeneration of the adsorbent when the gas concentration is changed. The present invention relates to a gas generation device configured to perform.
従来の技術
一般に、ＰＳＡ式気体分離装璽は、分子ふるいカーボン
からなる吸着剤を用いて、低１本濃度ガス等の体濃度の
ガスを取出そうとするものである。2. Description of the Related Art In general, a PSA type gas separation device attempts to extract a gas having a body concentration, such as a gas having a low concentration of one molecule, by using an adsorbent made of molecular sieve carbon.
ＰＳＡ式は、＠着Ｍを充填した吸着槽に圧縮空気を導入
して酸素を吸着剤に吸着する吸着］Ｌ程と、該吸着槽内
を大気開放し又は真空ポンプで減圧して吸着した酸素を
ｗｅｔｓするＩ２１！工程とを繰返し、脱着工程では吸
着槽内の吸着剤に酸素分子を吸着させ、一方、脱着工程
では吸着された酸素を脱着し、次の工程に備えるように
なっている。The PSA method involves introducing compressed air into an adsorption tank filled with M and adsorbing oxygen onto the adsorbent. I21 to wets! The steps are repeated, and in the desorption step, the adsorbent in the adsorption tank adsorbs oxygen molecules, while in the desorption step, the adsorbed oxygen is desorbed in preparation for the next step.
また、このような装置で酸素濃度を変更するためには吸
着工程及び脱着工程の時間を変えたり、圧縮空気の圧力
を変える方法が考えられる。In addition, in order to change the oxygen concentration in such an apparatus, it is possible to change the time of the adsorption step and the desorption step, or to change the pressure of compressed air.
発明が解決しようとする課題
しかるに、従来のＰＳＡ式の気体生成装置で濃度をある
一定濃度からより低い濃度に変更しようとする場合、吸
脱着のサイクルｖｔ間等のＰＳＡ条件の変更だけでは吸
着剤の気体の１２１１の条件が変更した状態に達するま
でに時間がかかるため設定した濃度に達するまでに長い
１９間がかかってしまう等の問題点があった。Problems to be Solved by the Invention However, when trying to change the concentration from a certain concentration to a lower concentration in a conventional PSA type gas generator, it is difficult to change the adsorbent by simply changing the PSA conditions such as during the adsorption/desorption cycle vt. Since it takes time for the conditions of 1211 of the gas to reach the changed state, there are problems such as it takes a long time to reach the set concentration.
本発明は上記の点に鑑みてなされたもので、濃度の変更
時により短時間で設定した濃度を得ることができる気体
生成装置を提供することを目的とする。The present invention has been made in view of the above points, and an object of the present invention is to provide a gas generating device that can obtain a set concentration in a shorter time when changing the concentration.
課題を解決するための手段
本発明は内部に一の気体を＠着する吸着剤が充填された
吸着槽に一の気体を含む混合気体を供給し、一の気体を
吸着剤に＠着する吸着工程と、前記吸着剤に吸着した前
記一の気体を前記吸着剤よりｌ１２Ｗする脱着工程とを
くり返えすことにより前記吸着槽から前記一の気体の濃
度が前記吸着［［程を行なう前の前記混合気体中に占め
る前記一の基体の濃度とは異なる濃度の混合基体を得る
気体生成装置において、前記吸着槽から得た気体の一部
を前記吸着槽に還流するｌＩ！流丁段を設け、前記一の
気体の濃度を所定の濃度から他の濃度に変更する際、前
記脱着工程時にだけ前記還流手段により前記吸＠槽より
得た気体を前記吸着槽に還流する。Means for Solving the Problems The present invention provides an adsorption system in which a mixed gas containing one gas is supplied to an adsorption tank filled with an adsorbent into which one gas is deposited, and one gas is deposited on the adsorbent. By repeating the step of desorption of the first gas adsorbed on the adsorbent from the adsorbent, the concentration of the first gas from the adsorption tank is reduced to the same level as before the adsorption process. In the gas generating device for obtaining a mixed substrate having a concentration different from the concentration of the one substrate in the mixed gas, a portion of the gas obtained from the adsorption tank is returned to the adsorption tank. A flow stage is provided, and when the concentration of the one gas is changed from a predetermined concentration to another concentration, the gas obtained from the suction tank is refluxed to the adsorption tank by the reflux means only during the desorption step.
■用
混合気体中に占める〜の気体の濃度を所定の濃度から他
の濃度とする際、吸着槽より得た気体を吸着槽に還流す
ることにより吸着剤からの一の気体の脱着がより効率よ
く行なわれる。■ When changing the concentration of the gas in the mixed gas from a predetermined concentration to another concentration, the gas obtained from the adsorption tank can be refluxed to the adsorption tank to make the desorption of the gas from the adsorbent more efficient. It is often done.
実施例 第１図に本発明になる気体生成装置の一実施例を示す。Example FIG. 1 shows an embodiment of the gas generating device according to the present invention.
同図中、２．３は第１．第２の吸着槽で、各吸着槽２，
３内にはそれぞれ分子ふるいカーボン２Ａ、３Ａが充填
されている。In the figure, 2.3 is the first. In the second adsorption tank, each adsorption tank 2,
3 is filled with molecular sieve carbons 2A and 3A, respectively.
１は圧縮空気供給源となるコンプレッサで、コンプレッ
サ１からの圧縮空気は空気吐出配管４及び配管７．８を
介して吸着槽２．３にそれぞれ突耳に供給されるように
なっており、このため該配管７，８の途中にはそれぞれ
電磁弁からなる空気供給用弁５，６が設けられている。1 is a compressor serving as a compressed air supply source, and the compressed air from the compressor 1 is supplied to an adsorption tank 2.3 via an air discharge pipe 4 and a pipe 7.8, respectively. Therefore, air supply valves 5 and 6 made of electromagnetic valves are provided in the middle of the pipes 7 and 8, respectively.
１０．１１は１２着時に吸着槽２．３からの気体は配管
７．８より、共通排出配管２５に接続されており、前記
配管ｉｏ、１ｉの途中にはそれぞれ吸着槽２．３内のＥ
！？排ガスを半サイクル毎に交互に排出する電磁弁から
なる気体排出用弁９゜１０が設けられている。10.11 is connected to the common exhaust pipe 25 from the pipe 7.8 when the gas from the adsorption tank 2.3 arrives on the 12th, and the E in the adsorption tank 2.3 is connected to the pipes io and 1i, respectively.
! ? Gas exhaust valves 9 and 10 are provided which are electromagnetic valves that alternately exhaust exhaust gas every half cycle.
１３．１４は吸着槽２．３の出口信に接続され吸着槽２
．３内で生成された低濃度酸素をそれぞれ取出す取出配
管、１７は各配管１３．１４と連結した取出配管で、配
管１３．１４の途中には半サイクルの悶だけ後°述のｌ
１ｌｌの下に交互に開弁する電磁弁からなる取出用弁１
５，１６がそれぞれ設けられている。また前記取出配管
１７はバッファタンク１９に接続されている。13.14 is connected to the outlet signal of adsorption tank 2.3 and
．． 3, 17 is an extraction pipe connected to each pipe 13.14, and in the middle of pipe 13.14 there is a half cycle of 1, which will be described later.
Take-out valve 1 consisting of a solenoid valve that opens alternately under 1 liter
5 and 16 are provided, respectively. Further, the extraction pipe 17 is connected to a buffer tank 19.
また、取出用弁１５．１６は吸着ｆＩ２．３による半サ
イクルの終了時に所定の短時間だけ同時に開弁し、各吸
着槽２，３間を均圧にする。Further, the take-out valves 15 and 16 are simultaneously opened for a predetermined short time at the end of the half cycle due to the adsorption fI2.3 to equalize the pressure between the adsorption tanks 2 and 3.
２４はバッフ７タンク１９に接続された取出配管で、そ
の途中には電磁弁からなる取出用弁２０が設けられてい
る。24 is a take-out pipe connected to the buff 7 tank 19, and a take-out valve 20 made of a solenoid valve is provided in the middle thereof.
２６はｍ素センリで、バッファタンク１９に貯溜された
気体の酸ｓｍ度（組成値）を検出する。Reference numeral 26 is an m element sensor that detects the acid degree (composition value) of the gas stored in the buffer tank 19.
又、酸素センサ２６からの酸素濃度検出信号は後述する
酸素濃度計２７を介して１１１１１１回路２８に入力さ
れる。Further, the oxygen concentration detection signal from the oxygen sensor 26 is input to the 111111 circuit 28 via an oxygen concentration meter 27, which will be described later.
なお、酸素センサ２６としては酸素分子の常磁性を利用
した磁気式酸素センサ、酸素が透過膜を介して電界液に
入ると電極で鹸化還元反応が起きｇ＆流が流れるのを利
用したガルバニ電池式＃！２糸センサ、ジルコニア磁器
の内外面に電極を設け、酸素濃度によって起電力が発生
するのを利用したジルコニア式酸素センサ等が用いられ
る。The oxygen sensor 26 is a magnetic type oxygen sensor that utilizes the paramagnetism of oxygen molecules, and a galvanic cell type that utilizes the fact that when oxygen enters the electrolyte through a permeable membrane, a saponification-reduction reaction occurs at the electrodes and G& current flows. #! A two-thread sensor, a zirconia oxygen sensor, etc. that utilizes the fact that electrodes are provided on the inner and outer surfaces of zirconia porcelain and electromotive force is generated depending on the oxygen concentration are used.
２９は取出配管２４から取出される［濃度を設定する濃
度設定スイッチで、バッフ７タンク１９から取出すべぎ
酸素ガス濃度に応じて適宜に設定されるものである。Reference numeral 29 is a concentration setting switch for setting the concentration of oxygen gas taken out from the take-out pipe 24, and is set appropriately according to the concentration of oxygen gas to be taken out from the buffer 7 tank 19.
２３は還流用配管で、上記取出配管１３．１４に逆止弁
１１．１２を介して接続されている。Reference numeral 23 denotes a reflux pipe, which is connected to the above-mentioned take-out pipe 13.14 via a check valve 11.12.
還流用配管２３には絞り弁２１と還流用弁２２とが配設
されている。還流用弁２２は後述するように１１度の換
時に開弁され、バッファタンク１９内のガス（低濃度酸
素ガス）を吸着槽２．３へ還流させる。又、絞り弁２１
はガスが圧縮されているので、還流されるガスの流量を
調整している。The reflux pipe 23 is provided with a throttle valve 21 and a reflux valve 22 . As will be described later, the reflux valve 22 is opened at the 11th exchange, and the gas (low concentration oxygen gas) in the buffer tank 19 is refluxed to the adsorption tank 2.3. Also, the throttle valve 21
Since the gas is compressed, the flow rate of the gas being refluxed is adjusted.
また、制ｔｌｌ１０１路２８は例えば？イクロコンビ１
−夕等によって構成される弁ｔｉ制御手段で、入力側に
は酸素＋１度計２７．濃度設定スイッチ２９が接続され
ている。Also, for example, what is the control tll101 road 28? Ikro combination 1
- Valve ti control means consisting of an oxygen +1 degree meter 27. A concentration setting switch 29 is connected.
ＩＪｔｌ１１回路２８は予め人力されたプログラムに従
い、空気供給用弁５．６．気体掴出用弁９．１０゜取出
用弁１５．１６．１８．還流用弁２２を開閉制御する。The IJtl11 circuit 28 operates according to a preprogrammed program to supply air to the air supply valves 5, 6, . Gas grabbing valve 9.10° extraction valve 15.16.18. Controls the opening and closing of the reflux valve 22.
尚、上記ｆ、ｌＪｔ［１回路２８により開閉制御される
各電磁弁は、開弁信号の供給により励磁されたとき開弁
じ、励磁されないときにはバネ力で閉弁するようになっ
ている。The solenoid valves whose opening and closing are controlled by the f, lJt[1 circuit 28 are opened when excited by the supply of a valve opening signal, and closed by spring force when not excited.
次に装置の動ｎについて説明する。まず、酸素！１１１
設定スイッチ２９で酸素濃度を５％とするように設定し
て装置の運転を開始すると、ｔｉｌｌｌｏ回路２８は以
下に述べるステップで低濃度酸素ガスを得る。Next, the operation of the device will be explained. First, oxygen! 111
When the oxygen concentration is set to 5% using the setting switch 29 and the operation of the apparatus is started, the tillo circuit 28 obtains low concentration oxygen gas through the steps described below.
空気供給弁６．排気弁９．取出用弁１６．共通取出用弁
１８を開弁、他の弁を閉弁する。したがって、コンプレ
ッサ１からの圧縮空気は空気吐出配管４．空気供給用弁
６．空気供給配管８を通って吸着槽３に供給される。吸
着槽３では分子ふるいカーボン３Ａが圧縮空気中よりＩ
Ｉ素を吸着する。Air supply valve6. Exhaust valve9. Take-out valve 16. The common take-out valve 18 is opened and the other valves are closed. Therefore, the compressed air from the compressor 1 is transferred to the air discharge pipe 4. Air supply valve6. The air is supplied to the adsorption tank 3 through an air supply pipe 8. In adsorption tank 3, molecular sieve carbon 3A is absorbed by I from compressed air.
Adsorbs I element.
したがって、吸着槽３からは低Ｓ累濃度のガスが摺出さ
れ、この低酸素濃度のガスは取出用配管１４、取出用弁
１６．共通取出用配管１７．共通取出弁１８を通ってバ
ッフ７タンク１９に供給される。低酸素濃度ガスはバッ
フ７タンク１９で経過時間によらず略均−な濃度とされ
、バッフタンク１９より取出用絞り弁２０．最終取出用
配管２４を通って製品ガスとして取り出される。Therefore, gas with a low cumulative S concentration is slid out from the adsorption tank 3, and this gas with a low oxygen concentration is removed from the extraction pipe 14, the extraction valve 16. Common extraction piping 17. It is supplied to the buffer 7 tank 19 through the common take-out valve 18. The low oxygen concentration gas is brought to a substantially uniform concentration regardless of the elapsed time in the buff tank 19, and is taken out from the buff tank 19 by a throttle valve 20. It passes through the final extraction piping 24 and is extracted as a product gas.
一方、このとき、吸着槽２は再生中で排気用弁９が開、
空気供給弁５及び取出用弁１５が閏であるため、その内
部の分子ふるいカーボン２Ａは大気圧にさらされ、吸着
していた酸素を吐き出す。On the other hand, at this time, the adsorption tank 2 is being regenerated and the exhaust valve 9 is opened.
Since the air supply valve 5 and the take-out valve 15 are screws, the molecular sieve carbon 2A inside them is exposed to atmospheric pressure, and the adsorbed oxygen is discharged.
吐き出された酸素は排気用弁９．排気用配管を通って外
部に排気される。The exhaled oxygen is discharged through the exhaust valve 9. It is exhausted to the outside through exhaust piping.
次に取出用弁１５．１６を開弁とし、空気供給用弁６．
祷気用弁９．共通取出用弁１８を閉弁とし、吸着槽２と
３との圧力を均一にして＠着槽３のガスの一部を吸着槽
２に回収し収率を上げる。Next, take-out valves 15 and 16 are opened, and air supply valves 6 and 6 are opened.
Prayer valve 9. The common extraction valve 18 is closed to equalize the pressures in the adsorption tanks 2 and 3, and a part of the gas in the adsorption tank 3 is recovered to the adsorption tank 2 to increase the yield.
次に空気供給用弁５．排気用弁１０．取出用弁１５、共
通取出用弁１８を開弁し、他の弁を閉弁する。圧縮空気
は空気供給用弁５．空気供給配管７を通り、吸着槽２に
供給される。吸着槽２では分子ふるいカーボン２Ａに酸
素が吸着され、低酸素濃度ガスが取り出される。低酸素
濃度ガスは吸着槽２より取出用配管１３．取出用弁１５
．共通取出用配管１７を通すバッフ？タンク１９に貯溜
される。Next, air supply valve 5. Exhaust valve 10. The take-out valve 15 and the common take-out valve 18 are opened, and the other valves are closed. Compressed air is supplied through the air supply valve 5. It passes through the air supply pipe 7 and is supplied to the adsorption tank 2. In the adsorption tank 2, oxygen is adsorbed by the molecular sieve carbon 2A, and a low oxygen concentration gas is taken out. The low oxygen concentration gas is taken out from the adsorption tank 2 through piping 13. Take-out valve 15
．． Buffer for passing common extraction piping 17? It is stored in the tank 19.
また、一方、吸着槽３は排気用弁１ｏが開弁されている
ため、大気圧となり、分子ふるいカーボン３Ａに吸着さ
れていた′Ｖ素が脱着され、排気用弁１０．排気用配管
２５を通って外部に排気される。On the other hand, since the exhaust valve 1o of the adsorption tank 3 is open, the pressure becomes atmospheric, and the 'V element adsorbed on the molecular sieve carbon 3A is desorbed, and the exhaust valve 10. The air is exhausted to the outside through the exhaust pipe 25.
次に取出用弁１５．１６の両方を開弁し、他の弁を閉じ
、吸着槽２と吸着槽３とを取出用配管１３．１４を介し
て接続する。したがって、吸着槽２と＠着槽３とが均圧
な状態となり、＠＠ｌｔｌ ２から吸着槽３にガスが回
収され、吸着槽３の収率を向上させている。Next, both the take-out valves 15 and 16 are opened, the other valves are closed, and the adsorption tank 2 and the adsorption tank 3 are connected via the take-out pipes 13 and 14. Therefore, the adsorption tank 2 and the adsorption tank 3 are in a pressure-equalized state, and gas is recovered from the @ltl 2 to the adsorption tank 3, thereby improving the yield of the adsorption tank 3.
以上の４ステツプを１サイクルとして繰り返すことによ
り低酸素濃度ガスをＩＩＲ的に取り出すことができる。By repeating the above four steps as one cycle, low oxygen concentration gas can be extracted in an IIR manner.
なお、ｌＸ濃度はサイクル時間により制御されていて、
ＩＩｌ蟲濃度５％の低酸素濃度ガスを得るときにはサイ
クル時間を６００ （３）とし、！本濃度１％の低１県
濃度ガスを得るときにはサイクル時間を１８０（Ｓ）と
する。これは、時はが長くなるほど分子ふるいカーボン
２Ａ、３Ａがちつ素を吸着するため、サイクル時間が長
いほど相対的にＩｌｌ素ａｒｆＩは高くなるためである
。Note that the lX concentration is controlled by the cycle time,
IIl To obtain a low oxygen concentration gas with an insect concentration of 5%, the cycle time is set to 600 (3), and! When obtaining the low 1 prefecture concentration gas with the main concentration of 1%, the cycle time is set to 180 (S). This is because the molecular sieve carbons 2A and 3A adsorb the element as the cycle time becomes longer, so that the longer the cycle time, the higher the Ill element arfI becomes.
ここで、酸素濃度５％運転時から酸素濃度１％で運転し
ようとする場合には、まず、濃度設定スイッチ２９をＩ
ｌｌ索濃度１％側に設定する。ｔｓｍ回路２８は濃度設
定スイッチ２９の切替動作に応じてサイクルｌ？周を６
００ （Ｓ ）から１８０ （Ｓ ）とすると共に還流
用弁２２を開弁する。Here, if you want to operate at an oxygen concentration of 1% from when operating at an oxygen concentration of 5%, first turn the concentration setting switch 29 to I.
Set the concentration to 1%. The tsm circuit 28 performs a cycle l? according to the switching operation of the concentration setting switch 29. 6 laps
00 (S) to 180 (S), and the reflux valve 22 is opened.
還流用弁２２が開弁するとバッフ戸タンク１９内の低酸
素濃度ガスは逆止弁１１又は１２を介して＠看槽２又は
３に供給される。低酸Ｘ１度ガスの還流圧は絞り弁２１
により調整され、コンプレッサ１からの圧縮空気圧より
小さく大気圧より大きい鎗とされている。このため、低
酸素濃度ガスは逆止弁１１．１２の働きにより還流圧よ
り低い気圧となる再生中の吸着槽２又は３のどちらかに
還流される。When the reflux valve 22 is opened, the low oxygen concentration gas in the buff tank 19 is supplied to the @tank 2 or 3 via the check valve 11 or 12. The reflux pressure of low acid X1 degree gas is controlled by the throttle valve 21.
The compressed air pressure from the compressor 1 is lower than the atmospheric pressure and the pressure is higher than the atmospheric pressure. Therefore, the low oxygen concentration gas is refluxed to either the adsorption tank 2 or 3 during regeneration, where the pressure is lower than the reflux pressure by the action of the check valves 11, 12.
低１１ｉ１１度ガスが還流された吸着槽２又は３では低
酸Ｘ１度ガスにより分子ふるいカーボン２Ａ又は３Ａに
吸着されていた酸素の脱着が効率よく行なわれる。還流
用弁２２は酸素セン＋Ｊ２６及び酸素濃度計２７により
計測された酸素濃度が１％になると制御回路２８により
閉じられ１通常の運転が行なわれる。したがって、再生
時間が短くなっても十分な酸素の脱着を行なうことがで
き、設定されたｌＸｌ１度である１％に到達するまでの
時間が第２図１．ｆｆに示すように本実施例の装置でパ
ージを行なわないものの３５分に比し、１０分と短い時
間で済む。本実施例では酸素濃度５％から１％にする場
合について説明したが、これに限ることなく要は所定の
濃度から他の濃度とする場合であればよく、例えば濃度
１％から５％など、低いＳ度から高い１１度へ変更する
場合も考えられる。In the adsorption tank 2 or 3 in which the low 11i11 degree gas is refluxed, the oxygen adsorbed on the molecular sieve carbon 2A or 3A is efficiently desorbed by the low acid X1 degree gas. The reflux valve 22 is closed by the control circuit 28 when the oxygen concentration measured by the oxygen sensor +J 26 and the oxygen concentration meter 27 reaches 1%, and 1 normal operation is performed. Therefore, even if the regeneration time is shortened, sufficient oxygen can be desorbed, and the time it takes to reach the set lXl1 degree, 1%, is shown in Figure 2.1. As shown in ff, it takes only 10 minutes, compared to 35 minutes when the apparatus of this embodiment does not perform purging. In this embodiment, the case where the oxygen concentration is changed from 5% to 1% has been explained, but the case is not limited to this, and the point is that the case where the oxygen concentration is changed from a predetermined concentration to another concentration may be used. For example, the concentration may be changed from 1% to 5%, etc. It is also possible to change from a low degree S to a high degree 11 degrees.
なお、本実施例では酸素濃度のυ制御をサイクルｖｔ間
の制御により行ったが、これに限ることはなく、例えば
、圧縮空気の圧力を変更することによっても制御は可能
である。また、還流時間の設定も酸素センサ２６及び酸
素濃度計２７により酸素濃度を目測して、その目測結果
に応じて行っているが、予め設定しておいた時間だけ還
流を行なう構成としてもよい。さらに、本実施例では一
の気体を酸素としたが、これに限ることはなく他の気体
とすることも可能である。In this embodiment, the oxygen concentration υ control was performed by controlling between cycles vt, but the control is not limited to this, and the control can also be performed by changing the pressure of compressed air, for example. Further, the reflux time is also set by visually measuring the oxygen concentration using the oxygen sensor 26 and the oxygen concentration meter 27, and is performed according to the result of the visual measurement, but the reflux time may be configured to be refluxed for a preset time. Further, in this embodiment, one gas is oxygen, but the present invention is not limited to this, and other gases may be used.
発明の効果
上述の如く、本発明によれば、吸着剤を用いて気体の濃
厚を変える装置で、現在得ている濃度から他のａ度とす
る際に吸着剤から気体を１１＠する工程時に吸着槽より
得た気体を＠看槽に還流することにより吸着剤の脱着を
より効率的に行なうことができるため、現る・得ている
濃度から他の濃度に素早く移行させることができる等の
特長を有する。Effects of the Invention As described above, according to the present invention, in the device for changing the concentration of gas using an adsorbent, in the process of removing gas from the adsorbent when changing the concentration from the currently obtained concentration to another degree a. By refluxing the gas obtained from the adsorption tank to the tank, the adsorbent can be desorbed more efficiently. It has characteristics.
第１＠ｌは本発明の一実施例の概略構成図、第２図は従
来及び、本発明の・一実施例の応答特性図である。
１・・・コンプレッサ、２．３・・・吸着槽、２Ａ。
３Ａ−・・分子ふるいカーボン、１１．１２・・・逆止
弁、１５．１６・・・取出用弁、２１・・・還流用絞り
弁、２２・・・環流用弁、２６・・・酸素センサ、２７
・・・酸素濃度計、２８・・・ｗ４１９＠路、２９・・
・酸素濃度設定スイッチ。
第１図1 is a schematic configuration diagram of an embodiment of the present invention, and FIG. 2 is a response characteristic diagram of a conventional system and an embodiment of the present invention. 1...Compressor, 2.3...Adsorption tank, 2A. 3A-...Molecular sieve carbon, 11.12...Check valve, 15.16...Take-out valve, 21...Recirculation throttle valve, 22...Recirculation valve, 26...Oxygen sensor, 27
...Oxygen concentration meter, 28...w419@road, 29...
・Oxygen concentration setting switch. Figure 1
Claims (1)
に該一の気体を含む混合気体を供給し、該一の気体を該
吸着剤に吸着する吸着工程と、前記吸着剤に吸着した前
記一の気体を前記吸着剤より脱着する脱着工程とをくり
返えすことにより前記吸着槽から前記一の気体の濃度が
前記吸着工程を行なう前の前記混合気体中に占める前記
一の気体の濃度と異なる一定の濃度の混合気体を得る気
体生成装置において、 前記吸着槽より得た気体を前記吸着槽に還流する還流手
段を設け、前記一の気体の濃度を所定の濃度から他の濃
度に変更する際、前記脱着工程時に前記還流手段により
前記吸着槽より得た気体の一部を前記吸着槽に還流する
ことを特徴とする気体生成装置。[Scope of Claims] An adsorption step of supplying a mixed gas containing the one gas to an adsorption tank filled with an adsorbent that adsorbs the one gas, and adsorbing the one gas to the adsorbent; By repeating a desorption step in which the first gas adsorbed on the adsorbent is desorbed from the adsorbent, the concentration of the first gas from the adsorption tank is increased to the concentration in the mixed gas before the adsorption step. In a gas generation device for obtaining a mixed gas having a constant concentration different from the concentration of the first gas, a reflux means is provided for refluxing the gas obtained from the adsorption tank to the adsorption tank, and the concentration of the first gas is adjusted to a predetermined concentration. 1. A gas generation device characterized in that when changing the concentration from 1 to 2, a part of the gas obtained from the adsorption tank is refluxed to the adsorption tank by the reflux means during the desorption step.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1213159A JPH0691927B2 (en) | 1989-08-18 | 1989-08-18 | Gas generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1213159A JPH0691927B2 (en) | 1989-08-18 | 1989-08-18 | Gas generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0377617A true JPH0377617A (en) | 1991-04-03 |
| JPH0691927B2 JPH0691927B2 (en) | 1994-11-16 |
Family
ID=16634545
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1213159A Expired - Fee Related JPH0691927B2 (en) | 1989-08-18 | 1989-08-18 | Gas generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0691927B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995003873A1 (en) * | 1993-07-27 | 1995-02-09 | Sumitomo Seika Chemicals Co., Ltd. | Method and apparatus for separating nitrogen-rich gas |
| US6314161B1 (en) | 1999-08-10 | 2001-11-06 | Kabushiki Kaisha Toshiba | Rotary anode type x-ray tube and x-ray tube apparatus provided with x-ray tube |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58189022A (en) * | 1982-04-19 | 1983-11-04 | カルゴン・カ−ボン・コ−ポレ−シヨン | Pressure swinging type adsorbing system |
-
1989
- 1989-08-18 JP JP1213159A patent/JPH0691927B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58189022A (en) * | 1982-04-19 | 1983-11-04 | カルゴン・カ−ボン・コ−ポレ−シヨン | Pressure swinging type adsorbing system |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1995003873A1 (en) * | 1993-07-27 | 1995-02-09 | Sumitomo Seika Chemicals Co., Ltd. | Method and apparatus for separating nitrogen-rich gas |
| US5505765A (en) * | 1993-07-27 | 1996-04-09 | Sumitomo Seika Chemicals Co., Ltd. | Method and apparatus for separating nitrogen-enriched gas |
| US6314161B1 (en) | 1999-08-10 | 2001-11-06 | Kabushiki Kaisha Toshiba | Rotary anode type x-ray tube and x-ray tube apparatus provided with x-ray tube |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0691927B2 (en) | 1994-11-16 |
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