JPH0377395A - Formation of conductor via - Google Patents
Formation of conductor viaInfo
- Publication number
- JPH0377395A JPH0377395A JP21326989A JP21326989A JPH0377395A JP H0377395 A JPH0377395 A JP H0377395A JP 21326989 A JP21326989 A JP 21326989A JP 21326989 A JP21326989 A JP 21326989A JP H0377395 A JPH0377395 A JP H0377395A
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- conductor
- ceramic wiring
- forming
- formation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004020 conductor Substances 0.000 title claims abstract description 34
- 230000015572 biosynthetic process Effects 0.000 title abstract description 14
- 239000000919 ceramic Substances 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims description 26
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 4
- 238000010304 firing Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 102100023170 Nuclear receptor subfamily 1 group D member 1 Human genes 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000036581 peripheral resistance Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
[概 要〕
セラミンク配線板C2こ形成される導体ビアの形成方法
に関し、
セラG ツク配線板の板厚とは無関係に高品質の導体ビ
アの形成が可能なビア形成方法の提供を目的とし、
表面から裏面に貫通するビア形成孔が形成されてなるセ
ラミック配線板を気密容器に収容し、その後このセラミ
ック配線板の露出面に導体ペーストを塗布し、次に前記
気密容器の内部を減圧状態にしてビア形成孔内に導体ペ
ーストを吸い込ませて導体ビアを形成する構成を特徴と
する。[Detailed Description of the Invention] [Summary] Regarding the method for forming conductive vias formed on the ceramic wiring board C2, a via formation method that allows formation of high-quality conductive vias regardless of the thickness of the ceramic wiring board C2 is provided. In order to provide a method, a ceramic wiring board having via formation holes penetrating from the front surface to the back surface is housed in an airtight container, a conductive paste is applied to the exposed surface of the ceramic wiring board, and then the airtight It is characterized by a configuration in which conductive vias are formed by reducing the pressure inside the container and sucking the conductive paste into the via forming holes.
本発明は、セラ途ツク配線板に形成される導体ビアの形
成方法に関する。The present invention relates to a method for forming conductive vias in a ceramic wiring board.
第3図ialと山)と(C1は従来の導体ビアの形成方
法(以下ビア形成方法と称する)と導体ビアの一形成例
を示す要部側断面図であって、(alはセラミック配線
板の板厚が薄い場合を、、 (b)はその板厚が厚い場
合を、モし2て(e)は導体ごアの一形成例をそれぞれ
示している。FIG. 3 is a side cross-sectional view of a main part showing a conventional conductor via forming method (hereinafter referred to as a via forming method) and an example of forming a conductor via; (b) shows the case where the plate thickness is thick, and (e) shows an example of forming the conductor iron.
この導体ビアは第3図(a)と(b)に示すように、■
ビア形成孔10を備えたセラ鎚ンク配線板1を支持台6
0上に載置する。■そのセラミック配線板1の上から導
体ベース1−15を塗布する。■スキージ70を今一方
向に移動させてこの導体ペースト15をビア形成孔10
内に刷り込む。■表面に残留している導体ベース)i、
5を拭き取った後、これを焼成炉(図示せず)に収容、
加熱して導体ペースト15を固化する。といった方法で
形成されていた。。As shown in Figure 3(a) and (b), this conductor via is
A ceramic wiring board 1 equipped with via forming holes 10 is mounted on a support stand 6.
0. (2) Apply a conductor base 1-15 over the ceramic wiring board 1. ■Move the squeegee 70 in one direction to apply this conductive paste 15 to the via forming hole 10.
Imprint it inside. ■Conductor base remaining on the surface) i,
After wiping off 5, it is placed in a firing furnace (not shown).
The conductive paste 15 is solidified by heating. It was formed in such a way. .
(発明が解決しようεする課題〕
上記従来のビア形成方法は、セラミック配線板1の板厚
tが第3図(a)のように薄い場合は、スキージ70の
押圧力によって導体ペースト15がビア形成孔10の中
に無理無く充填されるため問題ないが、セラミック配線
板の板W−Tが第3図(t))に示すように厚くなる(
T>t)と、スキージ70の押圧力だけではビア形成孔
10内に導体ベース目5が充分行きわたらず、かつまた
ビア形成孔10内の空気の逃げ場所が無いこともあって
当該ビア形成孔10内に導体ペースト15の非充填部分
αを生じる。この非充填部分αを内包したままで焼成す
ると、第3図(C)に示すように導体ビア5内にこのα
が空洞となって残り、周部抵抗が増加してこの導体ビア
5が導通不良となる。(Problems to be Solved by the Invention) In the conventional via forming method described above, when the thickness t of the ceramic wiring board 1 is small as shown in FIG. There is no problem because the forming holes 10 are filled without any force, but the ceramic wiring board WT becomes thicker (as shown in FIG. 3(t)).
T > t), the conductor base 5 cannot be sufficiently spread inside the via forming hole 10 with only the pressing force of the squeegee 70, and there is also no place for the air inside the via forming hole 10 to escape, so the via forming is difficult. An unfilled portion α of the conductive paste 15 is created in the hole 10. When firing with this unfilled portion α inside, this α is formed inside the conductor via 5 as shown in FIG. 3(C).
remains as a cavity, and the peripheral resistance increases, resulting in poor conduction of the conductor via 5.
本発明は従来のビア形成方法におけるこれらの問題点を
解決するためになされたものである。The present invention has been made to solve these problems in conventional via forming methods.
本発明によるビア形成方法は、第1図に示すようなビア
形成装置を用い1かつ第2図に示すような形成工程によ
って導体ビアを形成する。即ち、表面から裏面に貫通ず
るビア形成孔10が形成されたセラQ7り配線板1を気
密容器20に収容し、その後このセラミック配線板1の
露出面、つまり上側の面に導体ペースト15を塗布し、
次に前記気密容器20の内部を減圧状態にして前記ビア
形成孔lO内に前記導体ペースト15を吸い込ませて導
体ビア5を形成する構成になっζいる。In the via forming method according to the present invention, conductive vias are formed using a via forming apparatus as shown in FIG. 1 and through forming steps as shown in FIG. That is, a ceramic wiring board 1 having via holes 10 extending through it from the front surface to the back surface is housed in an airtight container 20, and then a conductive paste 15 is applied to the exposed surface, that is, the upper surface, of the ceramic wiring board 1. death,
Next, the inside of the airtight container 20 is reduced in pressure, and the conductor paste 15 is sucked into the via formation hole 10 to form the conductor via 5.
本発明によるビア形成方法は、気密容器2oに収容され
たセラ逅ツタ配線板1の表面に塗布された導体ペースト
15が、気密容器20内を減圧状態にすることによって
ビア形成孔lo内に吸い込まれてそこに導体ビア5を形
成する構成になっていることから、導体ビア5の形成に
無理が無く、従ってビア形成孔10内に導体ペースト1
5の非充填部分αが形成される現象は的確に排除される
。In the via forming method according to the present invention, the conductive paste 15 applied to the surface of the ceramic wiring board 1 housed in the airtight container 2o is sucked into the via forming hole lo by reducing the pressure inside the airtight container 20. Since the structure is such that the conductive via 5 is formed there, there is no difficulty in forming the conductive via 5, and therefore, the conductive paste 1 is formed in the via forming hole 10.
The phenomenon of formation of the unfilled portion α of 5 is precisely eliminated.
以十実施例図に基づいて本発明の詳細な説明する。 Hereinafter, the present invention will be described in detail based on ten embodiment figures.
第1図(alと(b)と(C)は導体ビアの形成に用い
る装置のIjI威と導体ビアの一形成例を示す図であっ
て、(a)と山)は装置の全体構成を示す模式的側断面
図と斜視図、(C)はこの方法を用いて形成された導体
ビアの一例を示す要部側断面図である。但しこれらの図
において前記第3図と同一部分については同一符号を付
している。Figures 1 (al, b) and (c) are diagrams showing an example of the formation of conductor vias and the IJI power of the equipment used to form conductor vias, and (a) and crests) show the overall configuration of the equipment. A schematic side sectional view and a perspective view are shown, and (C) is a side sectional view of a main part showing an example of a conductive via formed using this method. However, in these figures, the same parts as in FIG. 3 are designated by the same reference numerals.
本発明によるビア形成方法は、第1図(a)とα))に
示すビア形成装置を用いて導体ビアを形成する。In the via forming method according to the present invention, conductive vias are formed using the via forming apparatus shown in FIGS. 1(a) and α)).
以下この装置の構成を説明する。このビア形成装置は、
セラミック配線板1を気密状態で保持する一対の保持治
具21と、該保持治具21を気密状態で収容する気密容
器20を装備するとともに、この気密容器20の内部を
減圧状態にする真空ポンプ50を装備している。図中、
22はセラミック配線板1と保持治具21間の気密を保
つガスケットであり、23は保持治具21と気密容器2
0間の気密を保つガスケットである。また、40は気密
容器20と真空ポンプ50間に配夏されたバルブである
。The configuration of this device will be explained below. This via forming device is
A vacuum pump is equipped with a pair of holding jigs 21 that hold the ceramic wiring board 1 in an airtight state, and an airtight container 20 that houses the holding jigs 21 in an airtight state, and also brings the inside of the airtight container 20 into a reduced pressure state. Equipped with 50. In the figure,
22 is a gasket that maintains airtightness between the ceramic wiring board 1 and the holding jig 21, and 23 is a gasket that maintains airtightness between the holding jig 21 and the airtight container 2.
This is a gasket that maintains airtightness between 0 and 0. Further, 40 is a valve installed between the airtight container 20 and the vacuum pump 50.
前記保持治具21はL字型の断面形状を持つ無終端型の
リング状部材であり、ガスケット22と23は例えば台
底ゴム等で構成された無終端型のバッキング部材、つま
りOリングである。従って当該気密容器20に収容され
た時のセラ多ツタ配線板1は、ビア形成孔10を介して
のみ、気密容器20内外間の空気流通を持つことになる
。The holding jig 21 is an endless ring-shaped member having an L-shaped cross section, and the gaskets 22 and 23 are endless backing members made of, for example, bottom rubber, or O-rings. . Therefore, when housed in the airtight container 20, the ceramic wiring board 1 has air circulation between the inside and outside of the airtight container 20 only through the via forming holes 10.
第2図は本発明による導体ビアの形成工程を説明する図
である。FIG. 2 is a diagram illustrating the process of forming a conductor via according to the present invention.
以下第1図と第2図を用いて導体ビアの形成工程を説明
する。The process of forming conductor vias will be described below with reference to FIGS. 1 and 2.
■1表裏に貫通するビア形成孔10を備えたセラミック
配線板lを一対の保持治具21で挟持した状態でこれを
気密容器20内に収容する。この時、セラミック配線板
1と保持治具21間1そして保持治具21と気密容器2
0間には、ガスケット22と23が第1図(a)に示す
如く配置される。(1) A ceramic wiring board l having via holes 10 penetrating the front and back sides is housed in an airtight container 20 while being held between a pair of holding jigs 21. At this time, between the ceramic wiring board 1 and the holding jig 21, and between the holding jig 21 and the airtight container 2,
0, gaskets 22 and 23 are arranged as shown in FIG. 1(a).
■、セラaツク配線板1の露出側の面に、銅粉と有機バ
インダーとを煉り合わせて製造した導体ベース口5が第
1図(a)に示すように塗布される。(2) A conductor base opening 5 made by kneading copper powder and an organic binder is applied to the exposed surface of the ceramic wiring board 1 as shown in FIG. 1(a).
■、真空ポンプ50を作動させて(或いはバルブ40を
開いて)気密容器20内を減圧状態にする。気密容器2
0の内部が減圧されたことによってセラミック配線板1
上に塗布された導体ペースト15はビア形成孔10内に
吸い込まれる形となってその中に充填される。なお、こ
の時、ビア形成孔10内には空気の滞留が無いので、こ
の充填は極めてスムーズに行われる。(2) Operate the vacuum pump 50 (or open the valve 40) to bring the inside of the airtight container 20 into a reduced pressure state. Airtight container 2
Ceramic wiring board 1
The conductive paste 15 applied thereon is sucked into the via forming hole 10 and filled therein. Note that at this time, since no air remains in the via forming hole 10, this filling is performed extremely smoothly.
■、導体ペースト15がビア形成孔lO内に充填され終
わった時点で真空ポンプ50を停止させる(或いはバル
ブ40を閉じる)。(2) Stop the vacuum pump 50 (or close the valve 40) when the conductor paste 15 is completely filled into the via formation hole IO.
■、気密容器20からセラミック配線板1を取りだし、
表裏両面に付着している導体ベース)15を拭き取る。■Take out the ceramic wiring board 1 from the airtight container 20,
Wipe off the conductor base (15) adhering to both the front and back surfaces.
■、その後、この迦ラミック配線板1を焼成炉に収容し
て導体ペースト15を固化する。(2) Thereafter, this ceramic wiring board 1 is placed in a firing furnace to solidify the conductive paste 15.
第1図(C)は本発明方式を用いて形成された導体ビア
5の一形成例を示す図である。この図によって明らかな
如(、本方式によって形成された導体ビア5は非充填部
分αが存在しない良質のものとなる。なお、このビア形
成方法は、ビア形成孔10丙の空気の流通性が良いため
、セラミック配線板lの板厚Tが如何に厚くてもビア形
成孔10内に導体ペースト15の非充填部分αが生しる
ようなことは無い。FIG. 1(C) is a diagram showing an example of the formation of conductive vias 5 formed using the method of the present invention. As is clear from this figure, the conductor vias 5 formed by this method are of good quality with no unfilled portions α.This via formation method also improves the air circulation in the via formation holes 10. Therefore, no matter how thick the ceramic wiring board l is, no unfilled portion α of the conductive paste 15 will be formed in the via forming hole 10.
このように、本発明によるビア形成方法は、導体ペース
ト15が極めて0然な形でビア形成孔10内に吸い込ま
れて導体ビア5を形成する構成になっていることから、
スキージ方式等による従来のビア形成方式に比して著し
く信頼性の高い導体ビアが得られる。As described above, the via forming method according to the present invention is configured such that the conductive paste 15 is sucked into the via forming hole 10 in a very natural manner to form the conductive via 5.
Conductor vias can be obtained that are significantly more reliable than conventional via formation methods such as the squeegee method.
以上の説明から明らかなように、本発明によるビア形成
方法は、導体ペーストが自然な状態でビア形成孔内に吸
い込まれる構成になっていることから、極めて良質の導
体ビアを形成することができる。As is clear from the above explanation, the via forming method according to the present invention is configured such that the conductive paste is sucked into the via forming hole in a natural state, so that extremely high quality conductive vias can be formed. .
【図面の簡単な説明】
第1図(a)と(b)と(C)は本発明に用いるビア形
成装置の構成とこれによって得られる導体ビアの一形成
例を示す模式的要部側断面図ε斜視図、
第2図は本発明による導体ビアの形成工程を示す工程図
、
第3図(a)と(b)と(C1は従来のビア形成方法と
導体ビアの一形成例を示す要部側断面図である。
図において、1はセラミック配線板、
5は導体ビア、
10はビア形成孔、
15は導体ペースト、
20は気密容器、
21は保持治具、
22と23はガスケット、
40はバルブ、
50は真空ポンプ、
αは非充填部分、
Tとtはセラミック配線板の板厚、
をそれぞれ示す。
(Q)
(b)
((J
ビY判八へ覆の饋賎゛Y孟仔モ了の一形ハσJzネr闇
添項5g耳1;Fシ2停ビアのD賎′I千i会末7間第
2図[BRIEF DESCRIPTION OF THE DRAWINGS] FIGS. 1(a), (b), and (C) are schematic side cross-sectional views of main parts showing the configuration of a via forming apparatus used in the present invention and an example of forming conductive vias obtained thereby. Figure ε is a perspective view, Figure 2 is a process diagram showing the process of forming a conductor via according to the present invention, Figure 3 (a), (b) and (C1 shows a conventional via forming method and an example of forming a conductor via). This is a side sectional view of the main parts. In the figure, 1 is a ceramic wiring board, 5 is a conductor via, 10 is a via forming hole, 15 is a conductor paste, 20 is an airtight container, 21 is a holding jig, 22 and 23 are gaskets, 40 is the valve, 50 is the vacuum pump, α is the unfilled part, T and t are the thickness of the ceramic wiring board, respectively. (Q) (b) Mengzi Moryou's first form σJzner darkness part 5g ear 1;
Claims (1)
の形成方法であって、 表面から裏面に貫通するビア形成孔(10)が形成され
てなるセラミック配線板(1)を気密容器(20)に収
容し、その後このセラミック配線板(1)の露出面に導
体ペースト(15)を塗布し、次に前記気密容器(20
)の内部を減圧状態にして前記ビア形成孔(10)内に
前記導体ペースト(15)を吸い込ませて導体ビア(5
)を形成する構成を特徴とする導体ビアの形成方法。[Claims] Conductor via (5) formed in ceramic wiring board (1)
A method of forming a ceramic wiring board (1) in which a via forming hole (10) penetrating from the front surface to the back surface is formed is housed in an airtight container (20), and then the ceramic wiring board (1) is exposed. Apply a conductive paste (15) to the surface, and then apply the airtight container (20).
) by reducing the pressure inside the conductive paste (15) and sucking the conductive paste (15) into the via forming hole (10).
) A method for forming a conductive via, characterized by a configuration that forms a
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21326989A JPH0377395A (en) | 1989-08-19 | 1989-08-19 | Formation of conductor via |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21326989A JPH0377395A (en) | 1989-08-19 | 1989-08-19 | Formation of conductor via |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0377395A true JPH0377395A (en) | 1991-04-02 |
Family
ID=16636305
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21326989A Pending JPH0377395A (en) | 1989-08-19 | 1989-08-19 | Formation of conductor via |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0377395A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0906006A2 (en) * | 1997-09-24 | 1999-03-31 | Robert Bosch Gmbh | Process for manufacturing pressure-tight via connections |
-
1989
- 1989-08-19 JP JP21326989A patent/JPH0377395A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0906006A2 (en) * | 1997-09-24 | 1999-03-31 | Robert Bosch Gmbh | Process for manufacturing pressure-tight via connections |
EP0906006A3 (en) * | 1997-09-24 | 2000-06-14 | Robert Bosch Gmbh | Process for manufacturing pressure-tight via connections |
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