JPH0376752A - Polyamide resin composition - Google Patents
Polyamide resin compositionInfo
- Publication number
- JPH0376752A JPH0376752A JP21215689A JP21215689A JPH0376752A JP H0376752 A JPH0376752 A JP H0376752A JP 21215689 A JP21215689 A JP 21215689A JP 21215689 A JP21215689 A JP 21215689A JP H0376752 A JPH0376752 A JP H0376752A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- triazole
- polyamide resin
- copper
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920006122 polyamide resin Polymers 0.000 title claims abstract description 27
- 239000011342 resin composition Substances 0.000 title claims description 13
- -1 copper (alloy) Chemical class 0.000 claims abstract description 43
- 229910052802 copper Inorganic materials 0.000 claims abstract description 25
- 239000010949 copper Substances 0.000 claims abstract description 25
- 229920000642 polymer Polymers 0.000 claims abstract description 6
- 239000003513 alkali Substances 0.000 claims description 9
- 150000004820 halides Chemical class 0.000 claims description 9
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- 239000000203 mixture Substances 0.000 abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 10
- 239000012964 benzotriazole Substances 0.000 abstract description 9
- 229920002302 Nylon 6,6 Polymers 0.000 abstract description 8
- 125000003277 amino group Chemical group 0.000 abstract description 6
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 3
- 229910045601 alloy Inorganic materials 0.000 abstract description 2
- 239000000956 alloy Substances 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 238000002156 mixing Methods 0.000 abstract description 2
- 229910001508 alkali metal halide Inorganic materials 0.000 abstract 2
- 150000008045 alkali metal halides Chemical class 0.000 abstract 2
- 150000002739 metals Chemical class 0.000 abstract 1
- 239000002253 acid Substances 0.000 description 13
- 238000006116 polymerization reaction Methods 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 239000004952 Polyamide Substances 0.000 description 11
- 229920002647 polyamide Polymers 0.000 description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 6
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 6
- 229910001369 Brass Inorganic materials 0.000 description 5
- 239000010951 brass Substances 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 4
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 4
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- YQUVCSBJEUQKSH-UHFFFAOYSA-N 3,4-dihydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C(O)=C1 YQUVCSBJEUQKSH-UHFFFAOYSA-N 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 229920002292 Nylon 6 Polymers 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Natural products OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 239000001361 adipic acid Substances 0.000 description 3
- 235000011037 adipic acid Nutrition 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 3
- QFGCFKJIPBRJGM-UHFFFAOYSA-N 12-[(2-methylpropan-2-yl)oxy]-12-oxododecanoic acid Chemical compound CC(C)(C)OC(=O)CCCCCCCCCCC(O)=O QFGCFKJIPBRJGM-UHFFFAOYSA-N 0.000 description 2
- PBLZLIFKVPJDCO-UHFFFAOYSA-N 12-aminododecanoic acid Chemical compound NCCCCCCCCCCCC(O)=O PBLZLIFKVPJDCO-UHFFFAOYSA-N 0.000 description 2
- XDOFQFKRPWOURC-UHFFFAOYSA-N 16-methylheptadecanoic acid Chemical compound CC(C)CCCCCCCCCCCCCCC(O)=O XDOFQFKRPWOURC-UHFFFAOYSA-N 0.000 description 2
- SYOANZBNGDEJFH-UHFFFAOYSA-N 2,5-dihydro-1h-triazole Chemical compound C1NNN=C1 SYOANZBNGDEJFH-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 150000001413 amino acids Chemical class 0.000 description 2
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- QTMDXZNDVAMKGV-UHFFFAOYSA-L copper(ii) bromide Chemical compound [Cu+2].[Br-].[Br-] QTMDXZNDVAMKGV-UHFFFAOYSA-L 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- XBZSBBLNHFMTEB-UHFFFAOYSA-N cyclohexane-1,3-dicarboxylic acid Chemical compound OC(=O)C1CCCC(C(O)=O)C1 XBZSBBLNHFMTEB-UHFFFAOYSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N decanoic acid Chemical compound CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- UKMSUNONTOPOIO-UHFFFAOYSA-N docosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCC(O)=O UKMSUNONTOPOIO-UHFFFAOYSA-N 0.000 description 2
- POULHZVOKOAJMA-UHFFFAOYSA-N dodecanoic acid Chemical compound CCCCCCCCCCCC(O)=O POULHZVOKOAJMA-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-MDZDMXLPSA-N elaidic acid Chemical compound CCCCCCCC\C=C\CCCCCCCC(O)=O ZQPPMHVWECSIRJ-MDZDMXLPSA-N 0.000 description 2
- QEWYKACRFQMRMB-UHFFFAOYSA-N fluoroacetic acid Chemical compound OC(=O)CF QEWYKACRFQMRMB-UHFFFAOYSA-N 0.000 description 2
- XMHIUKTWLZUKEX-UHFFFAOYSA-N hexacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O XMHIUKTWLZUKEX-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- ZHQLTKAVLJKSKR-UHFFFAOYSA-N homophthalic acid Chemical compound OC(=O)CC1=CC=CC=C1C(O)=O ZHQLTKAVLJKSKR-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- VKOBVWXKNCXXDE-UHFFFAOYSA-N icosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCC(O)=O VKOBVWXKNCXXDE-UHFFFAOYSA-N 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- 150000003951 lactams Chemical class 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 2
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 2
- UTOPWMOLSKOLTQ-UHFFFAOYSA-N octacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O UTOPWMOLSKOLTQ-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 230000003449 preventive effect Effects 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- ZDPHROOEEOARMN-UHFFFAOYSA-N undecanoic acid Chemical compound CCCCCCCCCCC(O)=O ZDPHROOEEOARMN-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- QBYIENPQHBMVBV-HFEGYEGKSA-N (2R)-2-hydroxy-2-phenylacetic acid Chemical compound O[C@@H](C(O)=O)c1ccccc1.O[C@@H](C(O)=O)c1ccccc1 QBYIENPQHBMVBV-HFEGYEGKSA-N 0.000 description 1
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 1
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- XLEDBLKSWOYHES-UHFFFAOYSA-N 1,2,3,5-thiatriazole Chemical compound C=1N=NSN=1 XLEDBLKSWOYHES-UHFFFAOYSA-N 0.000 description 1
- NHAZGSRLKBTDBF-UHFFFAOYSA-N 1,2,4-triazol-1-amine Chemical compound NN1C=NC=N1 NHAZGSRLKBTDBF-UHFFFAOYSA-N 0.000 description 1
- WYENVTYBQKCILL-UHFFFAOYSA-N 1,2,4-triazolidine-3,5-dithione Chemical compound S=C1NNC(=S)N1 WYENVTYBQKCILL-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- LVMHTARDQMFJFA-UHFFFAOYSA-N 1,5-diphenyltriazole Chemical compound C=1N=NN(C=2C=CC=CC=2)C=1C1=CC=CC=C1 LVMHTARDQMFJFA-UHFFFAOYSA-N 0.000 description 1
- JTVBHYOZWLONDB-UHFFFAOYSA-N 1-(5-methyl-2h-triazol-4-yl)ethanone Chemical compound CC(=O)C1=NNN=C1C JTVBHYOZWLONDB-UHFFFAOYSA-N 0.000 description 1
- PWMWNFMRSKOCEY-UHFFFAOYSA-N 1-Phenyl-1,2-ethanediol Chemical compound OCC(O)C1=CC=CC=C1 PWMWNFMRSKOCEY-UHFFFAOYSA-N 0.000 description 1
- VRDSRXVCRBMZOD-UHFFFAOYSA-N 1-benzyltriazole Chemical compound C1=CN=NN1CC1=CC=CC=C1 VRDSRXVCRBMZOD-UHFFFAOYSA-N 0.000 description 1
- MWZDIEIXRBWPLG-UHFFFAOYSA-N 1-methyl-1,2,4-triazole Chemical compound CN1C=NC=N1 MWZDIEIXRBWPLG-UHFFFAOYSA-N 0.000 description 1
- HXQHRUJXQJEGER-UHFFFAOYSA-N 1-methylbenzotriazole Chemical compound C1=CC=C2N(C)N=NC2=C1 HXQHRUJXQJEGER-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- PYVIJVFIVYJIBO-UHFFFAOYSA-N 1-methyltriazole-4,5-dicarboxylic acid Chemical compound CN1N=NC(C(O)=O)=C1C(O)=O PYVIJVFIVYJIBO-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- ACFQGTMTFLDFLP-UHFFFAOYSA-N 1-phenyl-1,2,4-triazole-3-carboxylic acid Chemical compound N1=C(C(=O)O)N=CN1C1=CC=CC=C1 ACFQGTMTFLDFLP-UHFFFAOYSA-N 0.000 description 1
- KINVSCCCUSCXTA-UHFFFAOYSA-N 1-phenyltriazole Chemical compound N1=NC=CN1C1=CC=CC=C1 KINVSCCCUSCXTA-UHFFFAOYSA-N 0.000 description 1
- IVDBIFHDJPMBFG-UHFFFAOYSA-N 1-phenyltriazole-4-carboxylic acid Chemical compound N1=NC(C(=O)O)=CN1C1=CC=CC=C1 IVDBIFHDJPMBFG-UHFFFAOYSA-N 0.000 description 1
- GUOSQNAUYHMCRU-UHFFFAOYSA-N 11-Aminoundecanoic acid Chemical compound NCCCCCCCCCCC(O)=O GUOSQNAUYHMCRU-UHFFFAOYSA-N 0.000 description 1
- QWENRTYMTSOGBR-UHFFFAOYSA-N 1H-1,2,3-Triazole Chemical compound C=1C=NNN=1 QWENRTYMTSOGBR-UHFFFAOYSA-N 0.000 description 1
- AFBBKYQYNPNMAT-UHFFFAOYSA-N 1h-1,2,4-triazol-1-ium-3-thiolate Chemical compound SC=1N=CNN=1 AFBBKYQYNPNMAT-UHFFFAOYSA-N 0.000 description 1
- GPUXECUHNGRYMC-UHFFFAOYSA-N 2,3-diphenyl-1h-1,2,4-triazole-5-thione Chemical compound C=1C=CC=CC=1N1NC(=S)N=C1C1=CC=CC=C1 GPUXECUHNGRYMC-UHFFFAOYSA-N 0.000 description 1
- MMEDJBFVJUFIDD-UHFFFAOYSA-N 2-[2-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC=C1CC(O)=O MMEDJBFVJUFIDD-UHFFFAOYSA-N 0.000 description 1
- GDYYIJNDPMFMTB-UHFFFAOYSA-N 2-[3-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=CC(CC(O)=O)=C1 GDYYIJNDPMFMTB-UHFFFAOYSA-N 0.000 description 1
- SLWIPPZWFZGHEU-UHFFFAOYSA-N 2-[4-(carboxymethyl)phenyl]acetic acid Chemical compound OC(=O)CC1=CC=C(CC(O)=O)C=C1 SLWIPPZWFZGHEU-UHFFFAOYSA-N 0.000 description 1
- IKCLCGXPQILATA-UHFFFAOYSA-N 2-chlorobenzoic acid Chemical compound OC(=O)C1=CC=CC=C1Cl IKCLCGXPQILATA-UHFFFAOYSA-N 0.000 description 1
- XDZMPRGFOOFSBL-UHFFFAOYSA-N 2-ethoxybenzoic acid Chemical compound CCOC1=CC=CC=C1C(O)=O XDZMPRGFOOFSBL-UHFFFAOYSA-N 0.000 description 1
- NGCXHCGUQHIOLZ-UHFFFAOYSA-N 2-methyltriazole Chemical compound CN1N=CC=N1 NGCXHCGUQHIOLZ-UHFFFAOYSA-N 0.000 description 1
- OJTPBFMSYXRIJE-UHFFFAOYSA-N 2-phenyl-1h-1,2,4-triazole-5-thione Chemical compound N1=C(S)N=CN1C1=CC=CC=C1 OJTPBFMSYXRIJE-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- XJRLKUOFBZMRBR-UHFFFAOYSA-N 2-phenylbenzotriazole Chemical compound C1=CC=CC=C1N1N=C2C=CC=CC2=N1 XJRLKUOFBZMRBR-UHFFFAOYSA-N 0.000 description 1
- FINVBUQPVHHJHQ-UHFFFAOYSA-N 2-phenyltriazole-4,5-dicarboxylic acid Chemical compound N1=C(C(O)=O)C(C(=O)O)=NN1C1=CC=CC=C1 FINVBUQPVHHJHQ-UHFFFAOYSA-N 0.000 description 1
- MXZFAZWAEXCZTR-UHFFFAOYSA-N 2-phenyltriazole-4-carboxylic acid Chemical compound N1=C(C(=O)O)C=NN1C1=CC=CC=C1 MXZFAZWAEXCZTR-UHFFFAOYSA-N 0.000 description 1
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 1
- GTODOEDLCNTSLG-UHFFFAOYSA-N 2h-triazole-4-carboxylic acid Chemical compound OC(=O)C1=CNN=N1 GTODOEDLCNTSLG-UHFFFAOYSA-N 0.000 description 1
- KPKQWXGFEKRQQA-UHFFFAOYSA-N 3,5-diphenyl-1h-1,2,4-triazole Chemical compound C1=CC=CC=C1C1=NNC(C=2C=CC=CC=2)=N1 KPKQWXGFEKRQQA-UHFFFAOYSA-N 0.000 description 1
- FUCABBOUCNJYAH-UHFFFAOYSA-N 3,5-diphenyltriazol-4-amine Chemical compound NC1=C(C=2C=CC=CC=2)N=NN1C1=CC=CC=C1 FUCABBOUCNJYAH-UHFFFAOYSA-N 0.000 description 1
- HNNQYHFROJDYHQ-UHFFFAOYSA-N 3-(4-ethylcyclohexyl)propanoic acid 3-(3-ethylcyclopentyl)propanoic acid Chemical compound CCC1CCC(CCC(O)=O)C1.CCC1CCC(CCC(O)=O)CC1 HNNQYHFROJDYHQ-UHFFFAOYSA-N 0.000 description 1
- MVRGLMCHDCMPKD-UHFFFAOYSA-N 3-amino-1h-1,2,4-triazole-5-carboxylic acid Chemical compound NC1=NNC(C(O)=O)=N1 MVRGLMCHDCMPKD-UHFFFAOYSA-N 0.000 description 1
- YRJBGGGQJOMUSK-UHFFFAOYSA-N 3-chloro-1-phenyl-1,2,4-triazole Chemical compound N1=C(Cl)N=CN1C1=CC=CC=C1 YRJBGGGQJOMUSK-UHFFFAOYSA-N 0.000 description 1
- HSTMKBRGFJVXKK-UHFFFAOYSA-N 3-chloro-4-methyl-1,2,4-triazole Chemical compound CN1C=NN=C1Cl HSTMKBRGFJVXKK-UHFFFAOYSA-N 0.000 description 1
- FCYYXNVAPBOINZ-UHFFFAOYSA-N 3-chloro-5-methyl-4-phenyl-1,2,4-triazole Chemical compound CC1=NN=C(Cl)N1C1=CC=CC=C1 FCYYXNVAPBOINZ-UHFFFAOYSA-N 0.000 description 1
- WGNBQRMKJSODLB-UHFFFAOYSA-N 3-phenyltriazole-4-carboxylic acid Chemical compound OC(=O)C1=CN=NN1C1=CC=CC=C1 WGNBQRMKJSODLB-UHFFFAOYSA-N 0.000 description 1
- UZXMIJNWMMWMBV-UHFFFAOYSA-N 4,5-dimethyl-2-phenyltriazole Chemical compound N1=C(C)C(C)=NN1C1=CC=CC=C1 UZXMIJNWMMWMBV-UHFFFAOYSA-N 0.000 description 1
- HXICLUNGKDYXRL-UHFFFAOYSA-N 4,5-dimethyl-2h-benzotriazole Chemical compound CC1=CC=C2NN=NC2=C1C HXICLUNGKDYXRL-UHFFFAOYSA-N 0.000 description 1
- VALUMXGSLBMNES-UHFFFAOYSA-N 4,5-dimethyl-2h-triazole Chemical compound CC=1N=NNC=1C VALUMXGSLBMNES-UHFFFAOYSA-N 0.000 description 1
- UKKDZCUPSSYZKY-UHFFFAOYSA-N 4,5-diphenyltriazol-1-amine Chemical compound NN1N=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 UKKDZCUPSSYZKY-UHFFFAOYSA-N 0.000 description 1
- JPKFMSXLYUZRBA-UHFFFAOYSA-N 4-amino-1,2,4-triazole-3,5-dicarboxylic acid Chemical compound NN1C(C(O)=O)=NN=C1C(O)=O JPKFMSXLYUZRBA-UHFFFAOYSA-N 0.000 description 1
- DLLBXBCKFUPBJE-UHFFFAOYSA-N 4-amino-1h-1,2,4-triazole-5-thione Chemical compound NN1C=NNC1=S DLLBXBCKFUPBJE-UHFFFAOYSA-N 0.000 description 1
- CEASQVCZPCGKPJ-UHFFFAOYSA-N 4-methyl-2-phenyltriazole Chemical compound N1=C(C)C=NN1C1=CC=CC=C1 CEASQVCZPCGKPJ-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- LUEYUHCBBXWTQT-UHFFFAOYSA-N 4-phenyl-2h-triazole Chemical compound C1=NNN=C1C1=CC=CC=C1 LUEYUHCBBXWTQT-UHFFFAOYSA-N 0.000 description 1
- RAOXPTJDYMBTGU-UHFFFAOYSA-N 4-phenyl-5-sulfanylidene-1,2,4-triazolidin-3-one Chemical compound O=C1NNC(=S)N1C1=CC=CC=C1 RAOXPTJDYMBTGU-UHFFFAOYSA-N 0.000 description 1
- ZFPXYLWYSNUYNG-UHFFFAOYSA-N 5-(4-aminophenyl)-1,2-dihydro-1,2,4-triazole-3-thione Chemical compound C1=CC(N)=CC=C1C1=NC(=S)NN1 ZFPXYLWYSNUYNG-UHFFFAOYSA-N 0.000 description 1
- UWSMKYBKUPAEJQ-UHFFFAOYSA-N 5-Chloro-2-(3,5-di-tert-butyl-2-hydroxyphenyl)-2H-benzotriazole Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O UWSMKYBKUPAEJQ-UHFFFAOYSA-N 0.000 description 1
- RXJQVZQJLCDQOH-UHFFFAOYSA-N 5-amino-1-phenyltriazole-4-carboxylic acid Chemical compound NC1=C(C(O)=O)N=NN1C1=CC=CC=C1 RXJQVZQJLCDQOH-UHFFFAOYSA-N 0.000 description 1
- KSCNOSBFEDSBOM-UHFFFAOYSA-N 5-iodo-1h-1,2,4-triazole Chemical compound IC1=NC=NN1 KSCNOSBFEDSBOM-UHFFFAOYSA-N 0.000 description 1
- VCFOEWURSYAGKP-UHFFFAOYSA-N 5-methyl-2h-triazole-4-carboxylic acid Chemical compound CC1=NNN=C1C(O)=O VCFOEWURSYAGKP-UHFFFAOYSA-N 0.000 description 1
- MBRGOFWKNLPACT-UHFFFAOYSA-N 5-methylnonane-1,9-diamine Chemical compound NCCCCC(C)CCCCN MBRGOFWKNLPACT-UHFFFAOYSA-N 0.000 description 1
- HCEKEODXLSQFDV-UHFFFAOYSA-N 5-methyltriazol-1-amine Chemical compound CC1=CN=NN1N HCEKEODXLSQFDV-UHFFFAOYSA-N 0.000 description 1
- UFFRSDWQMJYQNE-UHFFFAOYSA-N 6-azaniumylhexylazanium;hexanedioate Chemical compound [NH3+]CCCCCC[NH3+].[O-]C(=O)CCCCC([O-])=O UFFRSDWQMJYQNE-UHFFFAOYSA-N 0.000 description 1
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 1
- GVNWZKBFMFUVNX-UHFFFAOYSA-N Adipamide Chemical compound NC(=O)CCCCC(N)=O GVNWZKBFMFUVNX-UHFFFAOYSA-N 0.000 description 1
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical compound NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 235000021357 Behenic acid Nutrition 0.000 description 1
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical group NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 1
- OENBTXDPXUQDFQ-UHFFFAOYSA-N CC1=NN(N=C1C)N Chemical compound CC1=NN(N=C1C)N OENBTXDPXUQDFQ-UHFFFAOYSA-N 0.000 description 1
- 239000005632 Capric acid (CAS 334-48-5) Substances 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 229910021593 Copper(I) fluoride Inorganic materials 0.000 description 1
- 229910021590 Copper(II) bromide Inorganic materials 0.000 description 1
- 229910021594 Copper(II) fluoride Inorganic materials 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000005639 Lauric acid Substances 0.000 description 1
- 235000021353 Lignoceric acid Nutrition 0.000 description 1
- CQXMAMUUWHYSIY-UHFFFAOYSA-N Lignoceric acid Natural products CCCCCCCCCCCCCCCCCCCCCCCC(=O)OCCC1=CC=C(O)C=C1 CQXMAMUUWHYSIY-UHFFFAOYSA-N 0.000 description 1
- KLELCYGASVJSGB-UHFFFAOYSA-N N-methyl-3-phenyltriazol-4-amine Chemical compound CNc1cnnn1-c1ccccc1 KLELCYGASVJSGB-UHFFFAOYSA-N 0.000 description 1
- 229910003202 NH4 Inorganic materials 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920003189 Nylon 4,6 Polymers 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- 239000005642 Oleic acid Substances 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 239000005643 Pelargonic acid Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- IWYDHOAUDWTVEP-UHFFFAOYSA-N R-2-phenyl-2-hydroxyacetic acid Natural products OC(=O)C(O)C1=CC=CC=C1 IWYDHOAUDWTVEP-UHFFFAOYSA-N 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- XZAHJRZBUWYCBM-UHFFFAOYSA-N [1-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1(CN)CCCCC1 XZAHJRZBUWYCBM-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229940116226 behenic acid Drugs 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- ZKIBBIKDPHAFLN-UHFFFAOYSA-N boronium Chemical compound [H][B+]([H])([H])[H] ZKIBBIKDPHAFLN-UHFFFAOYSA-N 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-N bromoacetic acid Chemical compound OC(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- GWFAVIIMQDUCRA-UHFFFAOYSA-L copper(ii) fluoride Chemical compound [F-].[F-].[Cu+2] GWFAVIIMQDUCRA-UHFFFAOYSA-L 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 239000003484 crystal nucleating agent Substances 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 229940045803 cuprous chloride Drugs 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 150000001990 dicarboxylic acid derivatives Chemical class 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- QFTYSVGGYOXFRQ-UHFFFAOYSA-N dodecane-1,12-diamine Chemical compound NCCCCCCCCCCCCN QFTYSVGGYOXFRQ-UHFFFAOYSA-N 0.000 description 1
- FARYTWBWLZAXNK-WAYWQWQTSA-N ethyl (z)-3-(methylamino)but-2-enoate Chemical compound CCOC(=O)\C=C(\C)NC FARYTWBWLZAXNK-WAYWQWQTSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229960002510 mandelic acid Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229920006139 poly(hexamethylene adipamide-co-hexamethylene terephthalamide) Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- MPSUGQWRVNRJEE-UHFFFAOYSA-N triazol-1-amine Chemical compound NN1C=CN=N1 MPSUGQWRVNRJEE-UHFFFAOYSA-N 0.000 description 1
- KLNPWTHGTVSSEU-UHFFFAOYSA-N undecane-1,11-diamine Chemical compound NCCCCCCCCCCCN KLNPWTHGTVSSEU-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- WKOLLVMJNQIZCI-UHFFFAOYSA-N vanillic acid Chemical compound COC1=CC(C(O)=O)=CC=C1O WKOLLVMJNQIZCI-UHFFFAOYSA-N 0.000 description 1
- TUUBOHWZSQXCSW-UHFFFAOYSA-N vanillic acid Natural products COC1=CC(O)=CC(C(O)=O)=C1 TUUBOHWZSQXCSW-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は耐熱性に優れ、着色の改善されたポリアミド樹
脂組成物に関する。さらに詳しくは高温の環境下で使用
されるポリアミド樹脂成形体およびそれと共存する金属
材料に対して優れた防錆効果を有する着色の改善された
耐熱性ポリアミド樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a polyamide resin composition having excellent heat resistance and improved coloration. More specifically, the present invention relates to a heat-resistant polyamide resin composition with improved coloring and excellent antirust effect on polyamide resin molded bodies used in high-temperature environments and metal materials coexisting therewith.
〈従来の技術〉
ポリアミド樹脂は機械的特性、成形加工性、耐薬品性が
良好であることを利用して自動車部品、機械部品など種
々な分野で使用されている。<Prior Art> Polyamide resins are used in various fields such as automobile parts and mechanical parts due to their good mechanical properties, moldability, and chemical resistance.
このうち、自動車分野において使用されている電気・電
子部品においては、例えばエンジンルーム内のコネクタ
ーのように使われる環境が高温であることがしばしばで
あり、耐熱性が要求される。Among these, electric and electronic parts used in the automobile field are often used in high-temperature environments, such as connectors in engine compartments, and are therefore required to have heat resistance.
ポリアミド樹脂の耐熱性を改善する目的でハロゲン化銅
、ハロゲン化カリウムを添加することは公知である(例
えば特開昭49−53944号、特開昭50−1484
61号、特開昭56−4651号)。It is known to add copper halides and potassium halides for the purpose of improving the heat resistance of polyamide resins (for example, JP-A-49-53944, JP-A-50-1484).
No. 61, JP-A-56-4651).
また、ヒンダードフェノール化合物を添加することも知
られている(例えば特開昭50−87447号)、別の
目的でトリアゾール化合物を添加することも公知である
(例えば特開昭51−66342号)。It is also known to add a hindered phenol compound (e.g., JP-A-50-87447), and it is also known to add a triazole compound for another purpose (e.g., JP-A-51-66342). .
〈発明が解決しようとする課題〉
しかしながら、ハロゲン化銅、ハロゲン化カリウムを添
加した従来の耐熱性ポリアミド樹脂を自動車用電気・電
子部品の1つであるコネクター用材料として使用すると
き、その使用環境が高温であるときには、コネクターと
対で用いられる金属材料、特に銅および調合金製の接続
端子が、ポリアミド樹脂より発生する腐食性ガスにより
腐食され、接触不良を引起すばかりでなく、端子の寿命
を著しく短くすることが明らかとなった。高度に電子制
御機器の発達した現在、接触不良による誤表示、誤動作
は、こと自動車用途においては安全上極めて重大な問題
である。<Problem to be solved by the invention> However, when using conventional heat-resistant polyamide resin to which copper halide and potassium halide are added as a material for connectors, which are one of the electrical and electronic parts for automobiles, the environment in which it is used is When the connector is at high temperature, the metal materials used in the connector and pair, especially the connection terminals made of copper and prepared alloys, are corroded by the corrosive gas generated by the polyamide resin, which not only causes poor contact but also shortens the life of the terminals. It has been found that the length can be significantly shortened. Nowadays, electronic control equipment is highly developed, and erroneous display and malfunction due to poor contact are extremely serious safety problems especially in automobile applications.
そこで、本発明者らは耐熱安定性に優れ、かつ高温環境
下での使用条件であっても金属材料、特に銅および銅合
金を腐食しない耐熱性ポリアミド樹脂を得るべく鋭意検
討した結果、特定の有機化合物をハロゲン化銅、ハロゲ
ン化アルカリと併用添加することにより上記の目的が遠
戚されることを見出し本発明に到達した。Therefore, the present inventors conducted intensive studies to obtain a heat-resistant polyamide resin that has excellent heat resistance stability and does not corrode metal materials, especially copper and copper alloys, even when used in high-temperature environments. The present invention has been achieved by discovering that the above object can be achieved by adding an organic compound in combination with copper halide and alkali halide.
く課題を解決するための手段〉
すなわち本発明は、
(a)アミノ末端基濃度が6X10−5(モル7gポリ
マ)より小さいポリアミド樹脂100重量部に対し、
(b)ハロゲン化銅01OO1〜1重量部、(c)ハロ
ゲン化アルカリ0.01〜5重量部、および
(d)トリアゾール化合物をO,OO5〜5重量部含有
してなるポリアミド樹脂組成物を提供することにある。Means for Solving the Problems> That is, the present invention provides (a) for 100 parts by weight of a polyamide resin whose amino end group concentration is smaller than 6X10-5 (mol 7g polymer), (b) from 1 to 1 weight part of copper halide 01OO. (c) 0.01 to 5 parts by weight of an alkali halide; and (d) a triazole compound in an amount of 5 to 5 parts by weight of O, OO.
本発明で用いられるポリアミドはアミノ酸、ラクタムあ
るいはジアミンとジカルボン酸を主たる構成成分とする
ポリアミドである。構成成分の具体例を挙げるとε−カ
グロラクタム、エナントラクタム、ω−ラウロラクタム
などのラクタム、ε−アミツカグロン酸、11−アミノ
ウンデカン酸、12−アミノドデカン酸などのアミノ酸
、テトラメチレンジアミン、ヘキサメチレンジアミン、
ウンデカメチレンジアミン、ドデカメチレンジアミン、
2.2.4−/2,4.4−トリメチルへキサメチレン
ジアミン、5−メチルノナメチレンジアミン、m−キシ
リレンジアミン、p−キシリレンジアミン、1.3−ビ
スアミノメチルシクロヘキサン、1.4−ビスアミノメ
チルシクロヘキサン、ビス−p−アミノシクロヘキシル
メタン、ビス−p−アミノシクロへキシルプロパン、イ
ンホロンジアミンなどのジアミン、アジピン酸、スペリ
ン酸、アゼライン酸、セバシン酸、ドデカン2酸、1.
4−シクロヘキサンジカルボン酸、1.3−シクロヘキ
サンジカルボン酸、テレフタル酸、イソフタル酸、ナフ
タレンジカルボン酸、ダイマー酸などのジカルボン酸が
ある。これらの構成成分は単独あるいは2種以上の混合
物の形で重合に供され、そうして得られるポリアミドホ
モポリマ、コポリマいずれも本発明で用いることができ
る。特に本発明で有用に用いられるポリアミドはポリカ
プラミド(ナイロン6)、ポリへキサメチレンアジパミ
ド(ナイロン66)、ポリテトラメチレンアジパミド(
ナイロン46〉、ポリへキサメチレンアジパミド(ナイ
ロン610)、ポリウンデカンアミド(ナイロン11)
、ポリドデカンアミド(ナイロン12)、ポリヘキサメ
チレンアジパミド/ヘキサメチレンテレフタルアミド共
重合体(ナイロン66/6T) 、ポリカブラミド/ポ
リへキサメチレンアジパミド共重合体(ナイロン6/6
6 )そしてこれらポリアミドの混合物である。The polyamide used in the present invention is a polyamide whose main components are an amino acid, a lactam or a diamine, and a dicarboxylic acid. Specific examples of constituent components include lactams such as ε-caglolactam, enantlactam, and ω-laurolactam, amino acids such as ε-amitsukagulonic acid, 11-aminoundecanoic acid, and 12-aminododecanoic acid, tetramethylene diamine, hexamethylene diamine. ,
undecamethylene diamine, dodecamethylene diamine,
2.2.4-/2,4.4-trimethylhexamethylenediamine, 5-methylnonamethylenediamine, m-xylylenediamine, p-xylylenediamine, 1.3-bisaminomethylcyclohexane, 1.4 -Diamines such as bis-aminomethylcyclohexane, bis-p-aminocyclohexylmethane, bis-p-aminocyclohexylpropane, inphorondiamine, adipic acid, superric acid, azelaic acid, sebacic acid, dodecanedioic acid, 1.
Dicarboxylic acids include 4-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, terephthalic acid, isophthalic acid, naphthalene dicarboxylic acid, and dimer acid. These components are subjected to polymerization either alone or in the form of a mixture of two or more, and both the polyamide homopolymer and copolymer thus obtained can be used in the present invention. Polyamides particularly useful in the present invention include polycapramide (nylon 6), polyhexamethylene adipamide (nylon 66), and polytetramethylene adipamide (nylon 66).
Nylon 46>, polyhexamethylene adipamide (nylon 610), polyundecaneamide (nylon 11)
, polydodecaneamide (nylon 12), polyhexamethylene adipamide/hexamethylene terephthalamide copolymer (nylon 66/6T), polycabramide/polyhexamethylene adipamide copolymer (nylon 6/6)
6) and a mixture of these polyamides.
ここで用いられるポリアミドの重合度については特に制
限はなく、1%濃硫酸溶液の25℃における相対粘度が
1.5〜5.0の範囲内にあるものを任意に用いること
ができる。また、これらのポリアミドの末端アミノ基濃
度は6X10−5(モル7gポリマ)より小さいことが
望ましい、特開昭51−66342号には、末端アミノ
基濃度が6X10−5(モル7gポリマ)以上である場
合について記載されており、着色したポリアミド樹脂を
得るための方法が記載されている。There is no particular restriction on the degree of polymerization of the polyamide used here, and any polyamide having a relative viscosity of 1% concentrated sulfuric acid solution at 25° C. within the range of 1.5 to 5.0 can be used. Furthermore, it is desirable that the terminal amino group concentration of these polyamides is less than 6X10-5 (mol 7g polymer), and JP-A-51-66342 states that the terminal amino group concentration is 6X10-5 (mol 7g polymer) or more. Certain cases are described and methods for obtaining colored polyamide resins are described.
用途においては着色したポリアミド樹脂は、著しく商品
価値を低下させることになり好ましくない、ポリアミド
の末端アミノ基濃度を6×1O−5(モル7gポリマ〉
より小さくし着色を改善するためには、必要であればモ
ノカルボン酸化合物および/またはジカルボン酸化合物
の1種以上を任意の段階でポリアミドに添加することに
より容易に得ることができる。カルボン酸化合物として
、次のものが例示できる。In applications, colored polyamide resin is undesirable because it significantly reduces the commercial value.
In order to reduce the size and improve the coloration, if necessary, one or more monocarboxylic acid compounds and/or dicarboxylic acid compounds can be easily added to the polyamide at any stage. Examples of carboxylic acid compounds include the following.
#酸、プロピオン酸、酪酸、イソ酪酸、吉草酸、カプロ
ン酸、カプリル酸、カプリン酸、ラウリン酸、パルミチ
ン酸、ステアリン酸、イソステアリン酸、ペラルゴン酸
、ウンデカン酸、ミリスチン酸、アラキン酸、ベヘン酸
、クロトン酸、リグノセリン酸、オレイン酸、エライジ
ン酸、リノール酸、リルン酸、モノクロル酢酸、セロチ
ン酸、モンタン酸、メリシン酸、安息香酸、シュウ酸、
マロン酸、コハク酸、マレイン酸、グルタル酸、アジピ
ン酸、ピメリン酸、スペリン酸、アゼライン酸、セバシ
ン酸、クエン酸、ドデカン2酸、1.4−シクロヘキサ
ンジカルボン酸、1,3−シクロヘキサンジカルボン酸
、テレフタル酸、イソフタル酸、ヘミメリット酸、トリ
メリット酸、ホモフタル酸、o、mおよびp−フェニレ
ンジ酢酸、0−フェニレン酢酸−−プロピオン酸、ナフ
タレンジカルボン酸、ダイマー酸、モノブロム酢酸、モ
ノフロロ酢酸、グリコール酸、乳酸、ピルビン酸、シュ
ウ酸、リンゴ酸、酒石酸、キラコラ酸、ナフテン酸、ト
ルイル酸、フェニル酢酸、p−t−ブチル安息香酸、桂
皮酸、クロル安息香酸、ブロム安息香酸、エトキシ安息
vP酸、マンデル酸、プロトカテキュ−酸、バニリン酸
、レゾルシン酸、ナフトエ酸、ピロメリット酸などのカ
ルボン酸などが用いられる。#Acid, propionic acid, butyric acid, isobutyric acid, valeric acid, caproic acid, caprylic acid, capric acid, lauric acid, palmitic acid, stearic acid, isostearic acid, pelargonic acid, undecanoic acid, myristic acid, arachidic acid, behenic acid, Crotonic acid, lignoceric acid, oleic acid, elaidic acid, linoleic acid, linuric acid, monochloroacetic acid, cerotic acid, montanic acid, melisic acid, benzoic acid, oxalic acid,
Malonic acid, succinic acid, maleic acid, glutaric acid, adipic acid, pimelic acid, speric acid, azelaic acid, sebacic acid, citric acid, dodecanedioic acid, 1,4-cyclohexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, Terephthalic acid, isophthalic acid, hemimellitic acid, trimellitic acid, homophthalic acid, o, m and p-phenylene diacetic acid, 0-phenylene acetic acid-propionic acid, naphthalene dicarboxylic acid, dimer acid, monobromoacetic acid, monofluoroacetic acid, glycol Acid, lactic acid, pyruvic acid, oxalic acid, malic acid, tartaric acid, chiracolaic acid, naphthenic acid, toluic acid, phenylacetic acid, pt-butylbenzoic acid, cinnamic acid, chlorobenzoic acid, brombenzoic acid, ethoxybenzoic acid vP acid , mandelic acid, protocatechuic acid, vanillic acid, resorcinic acid, naphthoic acid, pyromellitic acid, and other carboxylic acids.
本発明で用いられるハロゲン化銅としては、ヨウ化鋼、
臭化第1#l、臭化第2銅、塩化第1銅、塩化第2銅、
フッ化第1銅、フッ化第2銅などが好ましく用いられる
。これらハロゲン化銅は単独で用いてもよく、2種以上
を混合して用いてもよい、ハロゲン化銅の添加量はポリ
アミド樹脂100重量部に対し0.001〜1重量部、
好ましくはO,OO5〜0.5重量部である。The copper halide used in the present invention includes iodized steel,
#1 bromide, cupric bromide, cuprous chloride, cupric chloride,
Cuprous fluoride, cupric fluoride, and the like are preferably used. These copper halides may be used alone or in combination of two or more, and the amount of copper halides added is 0.001 to 1 part by weight per 100 parts by weight of the polyamide resin.
Preferably it is 5 to 0.5 parts by weight of O, OO.
添加量が0.001重量部に満たない場合には耐熱効果
が不十分となり好ましくなく、添加量が1重量部より多
くしても得られるポリアミド樹脂組成物の耐熱性がより
改善されることはない。If the amount added is less than 0.001 part by weight, the heat resistance effect will be insufficient, which is undesirable, and even if the amount added is more than 1 part by weight, the heat resistance of the resulting polyamide resin composition will not be further improved. do not have.
本発明で用いられるハロゲン化アルカリとしてはNH4
、la、Tl’aの金属元素、mb、la、■a、Va
、Viaの両性金属元素とハロゲン元素との化合物であ
り、NH4,カリウム、カルシウム、ストロンチウム、
セシウム、ナトリウム、バリウム、ベリリウム、マグネ
シウム、リチウム、ルビジウム、亜鉛、アルミニウム、
ガリ→ム、インジウム、タリウム、ゲルマニウム、アン
チモン、ビスマス、ボロニウム、鉛の塩化物、ヨウ化物
、フッ化物、臭化物などが好ましく用いられる。これら
ハロゲン化アルカリは単独で用いてもよく、2種以上を
混合して用いてもよい、ハロゲン化アルカリの添加量は
0.01〜5重量部、好ましくは0.05〜3重量部で
ある。添加量がo、oi重量部に満たない場合にはハロ
ゲン化鋼との相乗効果による耐熱効果が不十分となり好
ましくなく、添加量が5垂J1部より多くしても得られ
るポリアミド樹脂組成物の耐熱性がより改善されること
はない。The alkali halide used in the present invention is NH4
, la, metal elements of Tl'a, mb, la, ■a, Va
, Via is a compound of an amphoteric metal element and a halogen element, and contains NH4, potassium, calcium, strontium,
Cesium, sodium, barium, beryllium, magnesium, lithium, rubidium, zinc, aluminum,
Chloride, iodide, fluoride, bromide, etc. of gallium, indium, thallium, germanium, antimony, bismuth, boronium, and lead are preferably used. These alkali halides may be used alone or in combination of two or more.The amount of alkali halides added is 0.01 to 5 parts by weight, preferably 0.05 to 3 parts by weight. . If the amount added is less than O or Oi parts by weight, the heat resistance effect due to the synergistic effect with the halogenated steel will be insufficient, which is undesirable. Heat resistance is not further improved.
本発明で用いられるトリアゾール化合物としては1.2
.3−トリアゾール、2 H−1,2,3−トリアゾー
ル、4H−1,2,4−1リアゾール、IH−1,2,
4−トリアゾール、1.2.3.4−オキサトリアゾー
ル、1.2.4.5−オキサトリアゾール、1、2.3
.4−チアトリアゾール、1,2,4.5−チアトリア
ゾール、下記、一般式■、Olo、0で示されるトリア
ゾール化合物
〔式中R−1R″、R”はH,7/l/#/l/基、シ
クロアルキル基、アリールアルキル基、フェニル基、ヒ
ドロキシル基、アミノ基、イミノ基、ベンズアミド基、
アニリノ基、カルボキシル基、メルカプト基、アシル基
、ハロゲン(アルキル基、フェニル基は他の基で置換さ
れていてもよい)などより選ばれる基であり、R”、R
″R”は同じ基であってもよく、別々に選ばれた基であ
ってもよい〕
弐〇、■、で示される化合物の例としては、1−メチル
−1,2,3−)リアゾール、2−メチル−1,2,3
−トリアゾール、4−メチル−1,2゜3−トリアゾー
ル、4.5−ジメチル−1,2,3−トリアゾール、1
−フェニル−1,2,3−トリアゾール、2−7エニル
ー1.2.3−トリアゾール、4−フェニル−1,2,
3−トリアゾール、4−メチル−2−フェニル−1,2
,3−トリアゾール、1−ベンジル−1,2,3−トリ
アゾール、4.5−ジメチル−2−フェニル−1,2,
3−トリアゾール、1.5−ジフェニル−1,2,3−
トリアゾール、2.4.5−トリフェニル−1,2,3
−)リアゾール、4−オキシ−1,2,3−トリアゾー
ル、5−オキシ−1−7エニルー1.2.3−トリアゾ
ール、5−オキシ−4−メチル−1−フェニル−1,2
,3−トリアゾール、5−オキシ−1,4−ジフェニル
−1,2,3−トリアゾール、1−フェニル−1゜2、
3− トリアゾール−4−イルカルビノール、1−アミ
ノ−1,2,3−トリアゾール、1−アミノ−5−メチ
ル−1,2,3−トリアゾール、1−ベンズアミド−4
−メチル−1,2,3−トリアゾール、1−ベンザルア
ミノ−4−メチル−1,2゜3−トリアゾール、2−ア
ミノ−4,5−ジメチル−1,2,3−トリアゾール、
1−アミノ−4,5−ジフェニル−1,2,3−トリア
ゾール、5−アミノ−1−7エニルー1.2.3−)リ
アゾール、5−メチルアミノ−1−フェニル−1,2,
3−トリアゾール、5−アミノ−1,4−ジフェニル−
1,2,3−トリアゾール、1.2.3−トリアゾール
−4−イルエチルアミン、4−アセチル−5−メチル−
1,2,3−トリアゾール、4−アセチル−5−オキシ
−1,2,3−)リアゾール、1,2.3−トリアゾー
ル−4−カルボン酸、2−メチル−1,2,3−)リア
ゾール−4−カルボン酸、1−メチル−1,2,3−)
リアゾール−5−カルボン酸、5−メチル−1,2,3
−トリアゾール−4−カルボン酸、2−エチル−5−メ
チル−1,2゜3−トリアゾール−4−カルボン酸、1
−フェニル−1,2,3−トリアゾール−4−カルボン
酸、2−フェニル−1,2,3−トリアゾール−4−カ
ルボン酸、1−フェニル−1,2,3−トリアゾール−
5−カルボン酸、1.5−ジフェニル−1,2゜3−ト
リアゾール−4−カルボン酸、1.2.3−トリアゾー
ル−4,5−ジカルボン酸、1−メチル−1,2,3−
トリアゾール−4,5−ジカルボン酸、1−フェニル−
1,2,3−)リアゾール−4゜5−ジカルボン酸、2
−フェニル−1,2,3−トリアゾール−4,5−ジカ
ルボン酸、4−オキシ−1,2,3−トリアゾール−5
−カルボン酸、5−オキシ−1,2,3−トリアゾール
−4−カルボン酸アミド、5−オキシ−1−メチル−1
,2,3−トリアゾール−4−カルボン酸エステル、5
−オキシ−1,2,3−1リアゾール−1−イル酢酸、
5−オキシ−1−フェニル−1,2,3−1リアゾール
−4−カルボン酸、1−オキシ−1,2゜3−トリアゾ
ール−4,5−ジカルボン酸、5−アミノ−1−フェニ
ル−1,2,3−トリアゾール−4−カルボン酸、5−
アニリノ−1,2,3−トリアゾール−4−カルボン酸
エチル、1−メチル−1,2,4−トリアゾール、3−
メチル−1,2゜4−トリアゾール、3.5−ジメチル
−1,2,4−トリアゾール、3.5−ジエチル−1,
2,4−トリアゾール、1−フェニル−1,2,4−)
リアゾール、3−フェニル−1,2,4−1リアゾール
、1゜5−ジフェニル−1,2,4−トリアゾール、1
,3−ジフェニル−1,2,4−)リアゾール、3,5
−ジフェニル−1,2,4−トリアゾール、1.3.5
−トリフェニル−1,2,4−トリアゾール、3−りロ
ル−3−ブロムおよび3−ヨード−1,2,4−トリア
ゾール、3−クロル−1−フェニル−1,2,4−トリ
アゾール、3−クロル−4−メチル−1,2,4−トリ
アゾール、5−クロル−3−メチル−4−フェニル−1
,2,4−トリアゾール、1−アミノ−1,2,4−ト
リアゾール、3−アミノ−1,2,4−トリアゾール、
5−アミノ−3−メチル−1,2,4−)リアゾール、
4−アミノ−1,2,4−)リアゾール、4−アミノ−
3,5−ジメチル−1,2,4−)リアゾール、3−(
β−アミノエチル)−1,2,4−トリアゾール、3−
メルカプト−1,2,4−トリアゾール、4−エチル−
3−メルカプト−1,2,4−)リアゾール、3−メル
カプト−1−フェニル−1,2,4−トリアゾール、5
−メルカプト−1−フェニル−1,2゜4−トリアゾー
ル、4−アミノ−3−メルカプト−1,2,4−トリア
ゾール、3−メルカプト−1,5−ジフェニル−1,2
,4−トリアゾール、5−(p−アミノフェニル)−3
−メルカプト−1,2,4−トリアゾール、1.2.4
−トリアゾール−3(5)−カルボン酸、1−フェニル
−1,2,4−トリアゾール−3−カルボン酸、5−メ
チル−1−7エニルー1.2.4−トリアゾール−3−
カルボン酸、1.2.4−トリアゾール−1−イル酢酸
、1.2.4−トリアゾール−3−イル酢酸、1−フェ
ニル−1,2,4−1リアゾール−3,5−ジカルボン
酸、1−(p−アミノフェニル)−5−オキシ−1,2
,4−トリアゾール−3−カルボン酸エチル、5−アミ
ノ−1,2,4−トリアゾール−3−カルボン酸、4−
アミノ−1,2,4−トリアゾール−3,5−ジカルボ
ン酸、5−アミノ−1,2,4−トリアゾリル−3−チ
オン、3−メルカプト−4−フェニル−1,2,4−ト
リアゾール−5−オン、3.5−ジメルカプト−1,2
,4−トリアゾール、3.5−ジメルカプト−1−フェ
ニル−1,2,4−)リアゾール、3.5−ジメルカプ
ト−1,4−ジフェニル−1,2,4−トリアゾール、
3,5−ジイミノ−1,2,4−)リアゾール、4−ア
ミノ−3,5−ジイミノ−1,2,4−トリアゾールな
どが挙げられる。The triazole compound used in the present invention is 1.2
.. 3-triazole, 2H-1,2,3-triazole, 4H-1,2,4-1 riazole, IH-1,2,
4-triazole, 1.2.3.4-oxatriazole, 1.2.4.5-oxatriazole, 1,2.3
.. 4-thiatriazole, 1,2,4.5-thiatriazole, a triazole compound represented by the following general formula (■), Olo, 0 [wherein R-1R'', R'' is H, 7/l/#/l / group, cycloalkyl group, arylalkyl group, phenyl group, hydroxyl group, amino group, imino group, benzamide group,
A group selected from anilino group, carboxyl group, mercapto group, acyl group, halogen (alkyl group and phenyl group may be substituted with other groups), etc., and R'', R
"R" may be the same group or groups selected separately. Examples of compounds represented by 2〇, ■ include 1-methyl-1,2,3-) lyazole , 2-methyl-1,2,3
-triazole, 4-methyl-1,2゜3-triazole, 4,5-dimethyl-1,2,3-triazole, 1
-phenyl-1,2,3-triazole, 2-7enyl-1,2,3-triazole, 4-phenyl-1,2,
3-triazole, 4-methyl-2-phenyl-1,2
, 3-triazole, 1-benzyl-1,2,3-triazole, 4,5-dimethyl-2-phenyl-1,2,
3-triazole, 1,5-diphenyl-1,2,3-
Triazole, 2.4.5-triphenyl-1,2,3
-) Riazole, 4-oxy-1,2,3-triazole, 5-oxy-1-7enyl-1,2,3-triazole, 5-oxy-4-methyl-1-phenyl-1,2
, 3-triazole, 5-oxy-1,4-diphenyl-1,2,3-triazole, 1-phenyl-1゜2,
3-triazol-4-ylcarbinol, 1-amino-1,2,3-triazole, 1-amino-5-methyl-1,2,3-triazole, 1-benzamide-4
-Methyl-1,2,3-triazole, 1-benzalamino-4-methyl-1,2°3-triazole, 2-amino-4,5-dimethyl-1,2,3-triazole,
1-amino-4,5-diphenyl-1,2,3-triazole, 5-amino-1-7enyl-1.2.3-)riazole, 5-methylamino-1-phenyl-1,2,
3-triazole, 5-amino-1,4-diphenyl-
1,2,3-triazole, 1.2.3-triazol-4-ylethylamine, 4-acetyl-5-methyl-
1,2,3-triazole, 4-acetyl-5-oxy-1,2,3-)lyazole, 1,2,3-triazole-4-carboxylic acid, 2-methyl-1,2,3-)lyazole -4-carboxylic acid, 1-methyl-1,2,3-)
Riazole-5-carboxylic acid, 5-methyl-1,2,3
-triazole-4-carboxylic acid, 2-ethyl-5-methyl-1,2゜3-triazole-4-carboxylic acid, 1
-Phenyl-1,2,3-triazole-4-carboxylic acid, 2-phenyl-1,2,3-triazole-4-carboxylic acid, 1-phenyl-1,2,3-triazole-
5-carboxylic acid, 1.5-diphenyl-1,2゜3-triazole-4-carboxylic acid, 1.2.3-triazole-4,5-dicarboxylic acid, 1-methyl-1,2,3-
Triazole-4,5-dicarboxylic acid, 1-phenyl-
1,2,3-) Riazole-4゜5-dicarboxylic acid, 2
-Phenyl-1,2,3-triazole-4,5-dicarboxylic acid, 4-oxy-1,2,3-triazole-5
-carboxylic acid, 5-oxy-1,2,3-triazole-4-carboxylic acid amide, 5-oxy-1-methyl-1
, 2,3-triazole-4-carboxylic acid ester, 5
-oxy-1,2,3-1 lyazol-1-yl acetic acid,
5-oxy-1-phenyl-1,2,3-1 riazole-4-carboxylic acid, 1-oxy-1,2゜3-triazole-4,5-dicarboxylic acid, 5-amino-1-phenyl-1 , 2,3-triazole-4-carboxylic acid, 5-
Ethyl anilino-1,2,3-triazole-4-carboxylate, 1-methyl-1,2,4-triazole, 3-
Methyl-1,2゜4-triazole, 3.5-dimethyl-1,2,4-triazole, 3.5-diethyl-1,
2,4-triazole, 1-phenyl-1,2,4-)
Riazole, 3-phenyl-1,2,4-1 riazole, 1゜5-diphenyl-1,2,4-triazole, 1
,3-diphenyl-1,2,4-)riazole,3,5
-diphenyl-1,2,4-triazole, 1.3.5
-triphenyl-1,2,4-triazole, 3-lylor-3-bromo and 3-iodo-1,2,4-triazole, 3-chloro-1-phenyl-1,2,4-triazole, 3 -chloro-4-methyl-1,2,4-triazole, 5-chloro-3-methyl-4-phenyl-1
, 2,4-triazole, 1-amino-1,2,4-triazole, 3-amino-1,2,4-triazole,
5-amino-3-methyl-1,2,4-) lyazole,
4-amino-1,2,4-) lyazole, 4-amino-
3,5-dimethyl-1,2,4-)riazole, 3-(
β-aminoethyl)-1,2,4-triazole, 3-
Mercapto-1,2,4-triazole, 4-ethyl-
3-mercapto-1,2,4-)riazole, 3-mercapto-1-phenyl-1,2,4-triazole, 5
-Mercapto-1-phenyl-1,2゜4-triazole, 4-amino-3-mercapto-1,2,4-triazole, 3-mercapto-1,5-diphenyl-1,2
, 4-triazole, 5-(p-aminophenyl)-3
-Mercapto-1,2,4-triazole, 1.2.4
-triazole-3(5)-carboxylic acid, 1-phenyl-1,2,4-triazole-3-carboxylic acid, 5-methyl-1-7enyl-1,2,4-triazole-3-
Carboxylic acid, 1.2.4-triazol-1-yl acetic acid, 1.2.4-triazol-3-yl acetic acid, 1-phenyl-1,2,4-1 riazole-3,5-dicarboxylic acid, 1 -(p-aminophenyl)-5-oxy-1,2
, ethyl 4-triazole-3-carboxylate, 5-amino-1,2,4-triazole-3-carboxylic acid, 4-
Amino-1,2,4-triazole-3,5-dicarboxylic acid, 5-amino-1,2,4-triazolyl-3-thione, 3-mercapto-4-phenyl-1,2,4-triazole-5 -one, 3,5-dimercapto-1,2
, 4-triazole, 3.5-dimercapto-1-phenyl-1,2,4-)riazole, 3.5-dimercapto-1,4-diphenyl-1,2,4-triazole,
Examples include 3,5-diimino-1,2,4-)riazole and 4-amino-3,5-diimino-1,2,4-triazole.
ハ
〔式中nは0〜4の整数を示し、R,、R2はH、アル
キル基、シクロアルキル基、アリールアルキル基、フェ
ニル基、ヒドロキシル基、アミノ基、アニリノ基、ハロ
ゲン(アルキル基、フェニル基は他の基で置換されてい
てもよい)などより選ばれた基であり、R1、R2はお
なし基であってもよく、別々に選ばれた基であってもよ
い〕
式■、式Oで示される化合物の例としては、ベンゾトリ
アゾール、1−メチル−ベンゾトリアゾール、5.6−
シメチルベンゾトリアゾール、2−フェニルベンゾトリ
アゾール、■−オキシベンゾトリアゾール、1−オキシ
メチルベンゾトリアゾールなどが挙げられる。[In the formula, n represents an integer of 0 to 4, R, R2 is H, alkyl group, cycloalkyl group, arylalkyl group, phenyl group, hydroxyl group, amino group, anilino group, halogen (alkyl group, phenyl The group may be substituted with another group), and R1 and R2 may be an atom group or may be groups selected separately.] Formula ■, Formula Examples of compounds represented by O include benzotriazole, 1-methyl-benzotriazole, 5.6-
Examples include dimethylbenzotriazole, 2-phenylbenzotriazole, -oxybenzotriazole, and 1-oxymethylbenzotriazole.
さらに、2−(2−−ヒドロキシ−5″−メチルフェニ
ル)−ベンゾトリアゾール、2−〔2−−ヒドロキシ−
3−−(3” 、4” 、5.6″−テトラヒドロフタ
ルイミドメチル〉−5−−メチルフェニル〕ベンゾトリ
アゾール、2−(2°−ヒドロキシ−3−t−ブチル−
5−メチルフェニル)−5−クロロベンゾトリアゾール
、2−(2−−ヒドロキシ−3−15−t−ブチルフェ
ニル〉−ベンゾトリアゾール、2− (2”−ヒドロキ
シ−5−−t−オクチルフェニル〉ベンゾトリアゾール
、トリルトリアゾールのカリウム、リチウム、ナトリウ
ム、マグネシウム、カルシウム、バリウム、ストロンチ
ウム、亜鉛などの塩類、2−〔2−ヒドロキシ−3,5
−ビス(α、α−ジメチルベンジル)フェニルツー2H
−ベンゾトリアゾール、2−(3,5−ジ−t−ブチル
−2−ヒドロキシフェニル)−5−クロロベンゾトリア
ゾール、メチル−3−[3−t−ブチル−5−(2H−
ベンシトリアゾール−2−イル)−4−4ヒドロキシフ
エニル〕プロピオネート−ポリエチレングリコール(分
子量300)との縮合物などが好ましく用いられる。特
に好ましくは、ベンゾトリアゾール誘導体である。これ
らのトリアゾール化合物は単独で用いてもよく、2N以
上を混合して用いてもよい、トリアゾール化合物の添加
量はO,OO5〜5重量部、好ましくは0.05〜3重
量部である。添加量が0.005重量部に満たない場合
には金属材料、特に銅および銅合金の防錆効果が不十分
となり好ましくなく、添加量が5重量部より多くても得
られる防錆効果は改善されることはない。Additionally, 2-(2-hydroxy-5″-methylphenyl)-benzotriazole, 2-[2-hydroxy-
3-(3", 4", 5.6"-tetrahydrophthalimidomethyl>-5-methylphenyl)benzotriazole, 2-(2°-hydroxy-3-t-butyl-
5-methylphenyl)-5-chlorobenzotriazole, 2-(2-hydroxy-3-15-t-butylphenyl>-benzotriazole, 2-(2″-hydroxy-5-t-octylphenyl)benzo Triazole, salts of tolyltriazole such as potassium, lithium, sodium, magnesium, calcium, barium, strontium, zinc, etc., 2-[2-hydroxy-3,5
-bis(α,α-dimethylbenzyl)phenyl2H
-benzotriazole, 2-(3,5-di-t-butyl-2-hydroxyphenyl)-5-chlorobenzotriazole, methyl-3-[3-t-butyl-5-(2H-
A condensate of bencytriazol-2-yl)-4-4hydroxyphenyl propionate with polyethylene glycol (molecular weight 300) is preferably used. Particularly preferred are benzotriazole derivatives. These triazole compounds may be used alone or in a mixture of 2N or more.The amount of triazole compound added is 5 to 5 parts by weight of O, OO, preferably 0.05 to 3 parts by weight. If the amount added is less than 0.005 parts by weight, the rust preventive effect on metal materials, especially copper and copper alloys, will be insufficient, which is undesirable, and even if the amount added is more than 5 parts by weight, the rust preventive effect obtained will be improved. It will not be done.
本発明のハロゲン化銅、ハロゲン化アルカリ、およびト
リアゾール化合物はそのままでポリアミド樹脂に添加す
ることができる。また、ハロゲン化銅はトリアゾール化
合物を予め錯塩を形成させたあとで添加することもでき
、ハロゲン化銅とトリアゾール化合物の錯塩と、錯塩形
成に用いたトリアゾール化合物および他のトリアゾール
化合物とを併用すること、さらに別の耐熱剤(例えばフ
ェノール誘導体〉を添加することは本発明の好ましい実
施R様に含まれる。The copper halide, alkali halide, and triazole compound of the present invention can be added to the polyamide resin as they are. Copper halide can also be added after forming a complex salt with a triazole compound in advance, and a complex salt of copper halide and a triazole compound can be used in combination with the triazole compound used to form the complex salt and other triazole compounds. , and further adding another heat-resistant agent (for example, a phenol derivative) is included in the preferred embodiment R of the present invention.
ハロゲン化銅、ハロゲン化アルカリおよびトリアゾール
化合物の添加時期については特に制限されるものではな
い、すなわち重合前、重合中、重合後の任意の時期に添
加することができる0重合後の添加方法としてはトライ
ブレンド、押出機による溶融混練が効果的に利用できる
。There are no particular restrictions on the timing of addition of copper halide, alkali halide, and triazole compound, i.e., they can be added at any time before, during, or after polymerization. Tri-blending and melt-kneading using an extruder can be effectively used.
それぞれの添加剤は同時に任意の段階で添加してもよく
、別々に任意の段階で添加してもよい。Each additive may be added at the same time at any stage, or may be added separately at any stage.
また、本発明のポリアミド樹脂組成物には、本発明の効
果を著しく損なわない程度に他の添加剤、すなわち滑剤
、帯電防止剤、着色剤、結晶核剤、充填剤、補強剤、耐
熱剤、耐光剤などを適量、任意の段階で添加することが
できる。In addition, the polyamide resin composition of the present invention may contain other additives to the extent that the effects of the present invention are not significantly impaired, such as lubricants, antistatic agents, colorants, crystal nucleating agents, fillers, reinforcing agents, heat resistant agents, A suitable amount of a light stabilizer etc. can be added at any stage.
〈実施例〉
次に実施例および比較例を挙げて本発明の詳細な説明す
る。<Examples> Next, the present invention will be explained in detail by giving Examples and Comparative Examples.
比較例1
ヘキサメチレンジアミン・アジピン酸塩100重量部、
水25重量部、ヨウ化銅0.03重量部、ヨウ化カリウ
ム0.5重量部からなる混合物を重合釜にいれ窒素置換
後、通常の重合方法に従って重合を行い、重合釜よりス
トランド状に紡出してカッターで切断しベレット状のポ
リアミド樹脂組成物を得た。このベレットを80〜10
0℃で16時間以上真空乾燥した。乾燥ベレット20g
を50m1共栓付き三角フラスコに入れ、そのベレット
の上に表面を脱脂した銅板および黄銅板を置いて密栓し
た。この三角フラスコを150℃にコントロールされて
いるギアーオーブン中に入れ、300時間3!!続で加
熱処理した後取出し、未処理の銅板および黄銅板と表面
状態を比較し第1表に示ず結果を得た。Comparative Example 1 100 parts by weight of hexamethylenediamine adipate,
A mixture consisting of 25 parts by weight of water, 0.03 parts by weight of copper iodide, and 0.5 parts by weight of potassium iodide was placed in a polymerization kettle, the atmosphere was replaced with nitrogen, the polymerization was carried out according to the usual polymerization method, and the mixture was spun into strands from the polymerization kettle. It was taken out and cut with a cutter to obtain a pellet-shaped polyamide resin composition. This beret is 80-10
Vacuum drying was performed at 0° C. for 16 hours or more. 20g dried beret
was placed in a 50 ml Erlenmeyer flask with a stopper, and a copper plate and a brass plate with degreased surfaces were placed on top of the pellet, and the flask was sealed tightly. Place this Erlenmeyer flask in a gear oven controlled at 150℃ for 300 hours! ! Subsequently, after heat treatment, the sample was taken out and the surface condition was compared with that of an untreated copper plate and a brass plate, and results not shown in Table 1 were obtained.
実施例1
比較例1の組成に、さらにベンゾトリアゾール0.1重
量部を添加して比較例1と同様の操作で重合および評価
を行い第1表に示す結果を得た。比較例に比べて著しく
銅および黄銅の腐食性が改善された。Example 1 0.1 part by weight of benzotriazole was further added to the composition of Comparative Example 1, and polymerization and evaluation were carried out in the same manner as in Comparative Example 1, and the results shown in Table 1 were obtained. The corrosion resistance of copper and brass was significantly improved compared to the comparative example.
実施例2
実施例1のベンゾトリアゾールの添加量を0゜3fiJ
1部とした以外は比較例1と同様の操作で重合および評
価を行い第1表の結果を得た。Example 2 The amount of benzotriazole added in Example 1 was changed to 0°3fiJ.
Polymerization and evaluation were carried out in the same manner as in Comparative Example 1, except that 1 part was used, and the results shown in Table 1 were obtained.
実施例3〜5
実施例1の組成に末端アミノ基濃度調整剤として安息香
酸、アジピン酸、セバシン酸を添加した以外は比較例1
と同様の操作で重合および評価を行い第1表の結果を得
た。Examples 3 to 5 Comparative Example 1 except that benzoic acid, adipic acid, and sebacic acid were added as terminal amino group concentration adjusting agents to the composition of Example 1.
Polymerization and evaluation were carried out in the same manner as above, and the results shown in Table 1 were obtained.
実施S6〜20
第2表に示した組成に調製した混合物を重合釜に入れ比
較例1と同様の操作で重合および評価を行い第2表に示
す結果を得た。比較例に比べて著しく銅および黄銅の腐
食性が改善され、これらのポリアミド樹脂組成物はいず
れも高い防錆効果を有していることが分った。Implementation S6-20 A mixture prepared to have the composition shown in Table 2 was placed in a polymerization pot and polymerized and evaluated in the same manner as in Comparative Example 1, and the results shown in Table 2 were obtained. It was found that the corrosion resistance of copper and brass was significantly improved compared to the comparative example, and all of these polyamide resin compositions had a high rust prevention effect.
実施例21〜25
第3表に示した組成に調製した混合物を重合釜に入れ比
較例工と同様の操作で重合および評価を行い第3表に示
す結果を得た。いずれも銅および黄銅に対し、高い防錆
効果を有していた。Examples 21 to 25 Mixtures prepared to have the compositions shown in Table 3 were placed in a polymerization kettle, and polymerization and evaluation were carried out in the same manner as in the comparative examples, and the results shown in Table 3 were obtained. Both had high antirust effects on copper and brass.
実施例26〜29
比較例lで得たポリアミド樹脂組成物に第4表に示した
トリアゾール化合物をトライブレンドおよび溶融混練で
添加し、比較例1と同様に評価を行い第4表に示す結果
を得た。Examples 26 to 29 The triazole compounds shown in Table 4 were added to the polyamide resin composition obtained in Comparative Example 1 by triblending and melt-kneading, and evaluation was performed in the same manner as in Comparative Example 1, and the results shown in Table 4 were obtained. Obtained.
〈発明の効果〉
本発明のようにアミノ末端基濃度を6×1O−5(モル
7gポリマ)より小さくしたポリアミド、ハロゲン化銅
、ハロゲン化アルカリからなるポリアミド組成物に、ト
ゾアゾール化合物の1種以上を添加することにより得ら
れたポリアミド樹脂組成物は、特に高温での使用環境に
おいて該ポリアミド樹脂組成物により成形された成形体
と共存する金属材料、特に銅および銅合金に対して優れ
た防錆効果を有する耐熱性の良好な着色の改善されたポ
リアミド樹脂組成物が得られることが可能となった。<Effects of the Invention> One or more tozoazole compounds are added to the polyamide composition of the present invention, which consists of a polyamide with an amino end group concentration of less than 6 x 1 O-5 (mol 7 g polymer), a copper halide, and an alkali halide. The polyamide resin composition obtained by adding the polyamide resin composition has excellent rust prevention against metal materials, especially copper and copper alloys, which coexist with the molded article formed by the polyamide resin composition, especially in high-temperature usage environments. It has now become possible to obtain a polyamide resin composition with good heat resistance and improved coloration.
特許出願大東し株式会社Patent application Daitoshi Co., Ltd.
Claims (1)
ポリマ)より小さいポリアミド樹脂100重量部に対し
、 (b)ハロゲン化銅0.001〜1重量部、 (c)ハロゲン化アルカリ0.01〜5重量部、および (d)トリアゾール化合物を0.005〜5重量部含有
してなるポリアミド樹脂組成物。[Scope of Claims] (a) Amino terminal group concentration is 6×10^-^5 (mol/g
(b) 0.001 to 1 part by weight of copper halide, (c) 0.01 to 5 parts by weight of alkali halide, and (d) 0.005 parts by weight of a triazole compound to 100 parts by weight of a polyamide resin smaller than the polymer. -5 parts by weight of a polyamide resin composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1212156A JP2541314B2 (en) | 1989-08-17 | 1989-08-17 | Polyamide resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1212156A JP2541314B2 (en) | 1989-08-17 | 1989-08-17 | Polyamide resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0376752A true JPH0376752A (en) | 1991-04-02 |
JP2541314B2 JP2541314B2 (en) | 1996-10-09 |
Family
ID=16617825
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JP1212156A Expired - Fee Related JP2541314B2 (en) | 1989-08-17 | 1989-08-17 | Polyamide resin composition |
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JP (1) | JP2541314B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1270208A1 (en) | 2000-02-10 | 2003-01-02 | Daikin Industries, Ltd. | Laminated resin |
JP2005320546A (en) * | 2004-05-10 | 2005-11-17 | Ems-Chemie Ag | Thermoplastic polyamide molding composition |
JP2006273945A (en) * | 2005-03-28 | 2006-10-12 | Asahi Kasei Chemicals Corp | Production method for polyamide resin composition |
CN103342684A (en) * | 2013-07-30 | 2013-10-09 | 重庆大学 | 2-(2'-hydroxyl-ethoxyl-ethoxyl)-2H-benzotriazole as well as synthesis and corrosion inhibition application thereof |
JPWO2018092686A1 (en) * | 2016-11-15 | 2018-11-22 | 東レ株式会社 | Polyamide resin composition and molded article containing the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61236828A (en) * | 1985-04-15 | 1986-10-22 | Mitsubishi Chem Ind Ltd | Underhood member for use in automobile |
JPS63105057A (en) * | 1986-10-21 | 1988-05-10 | Mitsui Petrochem Ind Ltd | Polyamide composition |
JPS63205353A (en) * | 1987-02-19 | 1988-08-24 | バイエル・アクチエンゲゼルシヤフト | Glass fiber reinforced polyamide molding compound increased in salt resistance and weatherability |
-
1989
- 1989-08-17 JP JP1212156A patent/JP2541314B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61236828A (en) * | 1985-04-15 | 1986-10-22 | Mitsubishi Chem Ind Ltd | Underhood member for use in automobile |
JPS63105057A (en) * | 1986-10-21 | 1988-05-10 | Mitsui Petrochem Ind Ltd | Polyamide composition |
JPS63205353A (en) * | 1987-02-19 | 1988-08-24 | バイエル・アクチエンゲゼルシヤフト | Glass fiber reinforced polyamide molding compound increased in salt resistance and weatherability |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1270208A1 (en) | 2000-02-10 | 2003-01-02 | Daikin Industries, Ltd. | Laminated resin |
JP2006306105A (en) * | 2000-02-10 | 2006-11-09 | Daikin Ind Ltd | Multi-layer molded article |
EP2617562A2 (en) | 2000-02-10 | 2013-07-24 | Daikin Industries, Ltd. | Laminated resin |
JP2005320546A (en) * | 2004-05-10 | 2005-11-17 | Ems-Chemie Ag | Thermoplastic polyamide molding composition |
JP4577508B2 (en) * | 2004-05-10 | 2010-11-10 | エーエムエス−ケミー アーゲー | Thermoplastic polyamide molding composition |
JP2006273945A (en) * | 2005-03-28 | 2006-10-12 | Asahi Kasei Chemicals Corp | Production method for polyamide resin composition |
CN103342684A (en) * | 2013-07-30 | 2013-10-09 | 重庆大学 | 2-(2'-hydroxyl-ethoxyl-ethoxyl)-2H-benzotriazole as well as synthesis and corrosion inhibition application thereof |
JPWO2018092686A1 (en) * | 2016-11-15 | 2018-11-22 | 東レ株式会社 | Polyamide resin composition and molded article containing the same |
Also Published As
Publication number | Publication date |
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JP2541314B2 (en) | 1996-10-09 |
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