JPH0375633A - Photosensitive material for recording visible laser beams - Google Patents
Photosensitive material for recording visible laser beamsInfo
- Publication number
- JPH0375633A JPH0375633A JP1210652A JP21065289A JPH0375633A JP H0375633 A JPH0375633 A JP H0375633A JP 1210652 A JP1210652 A JP 1210652A JP 21065289 A JP21065289 A JP 21065289A JP H0375633 A JPH0375633 A JP H0375633A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- polymer
- beams
- visible laser
- photosensitive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 17
- 229920000642 polymer Polymers 0.000 claims abstract description 15
- -1 poly(p-hydroxy-styrene) Polymers 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 7
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 7
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims abstract description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 8
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 239000002253 acid Substances 0.000 abstract description 14
- 230000035945 sensitivity Effects 0.000 abstract description 9
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 6
- 125000000524 functional group Chemical group 0.000 abstract description 5
- 150000007513 acids Chemical class 0.000 abstract description 2
- 230000000903 blocking effect Effects 0.000 abstract description 2
- 125000006239 protecting group Chemical group 0.000 abstract description 2
- 238000002835 absorbance Methods 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- 238000005286 illumination Methods 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- BBEAQIROQSPTKN-UHFFFAOYSA-N pyrene Chemical compound C1=CC=C2C=CC3=CC=CC4=CC=C1C2=C43 BBEAQIROQSPTKN-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 4
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- GVEPBJHOBDJJJI-UHFFFAOYSA-N fluoranthrene Natural products C1=CC(C2=CC=CC=C22)=C3C2=CC=CC3=C1 GVEPBJHOBDJJJI-UHFFFAOYSA-N 0.000 description 3
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- GYSWUBQQCWKHAQ-UHFFFAOYSA-N 2-(4-ethenylphenoxy)ethyl-trimethylsilane Chemical compound C[Si](C)(C)CCOC1=CC=C(C=C)C=C1 GYSWUBQQCWKHAQ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000009972 noncorrosive effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
〔概 要］
可視レーザ記録用感光材料に関し、
可視レーザに高感度であり、かつ解像性、保存安定性お
よび非腐食性に優れた感光材料を提供することを目的と
し、
下記式（Ｉ）又は（ＩＩ）で表わされるポリマーと下記
式（ＩＩＩ）で表わされる鉄アレーン錯体とで構成する
。[Detailed Description of the Invention] [Summary] Regarding a photosensitive material for visible laser recording, the object is to provide a photosensitive material that is highly sensitive to visible laser and has excellent resolution, storage stability, and non-corrosion. It is composed of a polymer represented by the following formula (I) or (II) and an iron arene complex represented by the following formula (III).
６
（式中、ｐｌ、 ＲＺ、 Ｒ３，Ｒ４，Ｒ５及びＲ６は
それぞれ独立に水素原子、アルキル基、アルケニル基又
はフェニル基を示し、Ｒ７はアルキレン基を示し、ｎ及
びｍはそれぞれ独立に５〜５００の整数である。）Ｒ６
（式中、Ｒ１，Ｒ１，Ｒ３，Ｒ４，Ｒ％及びＲ＆はそれ
ぞれ独立に水素原子、アルキル基、アルケニル基又はフ
ェニル基を示し、Ｒ？はアルキレン基を示し、ｎ及びｍ
はそれぞれ独立に５〜５００の整数である。）（式中、
Ａは芳香族炭化水素基である。）〔産業上の利用分野〕
本発明は可視レーザ記録用感光材料に関する。6 (wherein, pl, RZ, R3, R4, R5 and R6 each independently represent a hydrogen atom, an alkyl group, an alkenyl group or a phenyl group, R7 represents an alkylene group, and n and m each independently represent 5 to is an integer of 500.) R6 (wherein R1, R1, R3, R4, R% and R& each independently represent a hydrogen atom, an alkyl group, an alkenyl group or a phenyl group, and R? represents an alkylene group, n and m
are each independently an integer from 5 to 500. ) (in the formula,
A is an aromatic hydrocarbon group. ) [Industrial Application Field] The present invention relates to a photosensitive material for visible laser recording.
可視レーザ記録用感光材料は凸版用、レリーフ像用およ
びフォトレジスト用などに広く適用されている。Photosensitive materials for visible laser recording are widely used for letterpress printing, relief images, photoresists, and the like.
このような可視レーザ記録用感光材料の保持すべき特性
としては、（１）高感度であること、（２）高解像度を
有すること、（３）保存安定性に優れていること、（４
）アルカリ現像が可能なこと、及び（５）非腐食性に優
れていることなどが要求される。The characteristics that such a photosensitive material for visible laser recording should maintain are (1) high sensitivity, (2) high resolution, (3) excellent storage stability, and (4)
) It is required to be capable of alkaline development, and (5) to be excellent in non-corrosion.
ここで用いるレーザは安定して高い出力が得られ、コヒ
ーレント長に優れたガスレーザであるＡｒイオンレーザ
（波長７４５８．４８Ｂ及び５１４ｎｍ ）が望ましい
。The laser used here is preferably an Ar ion laser (wavelength: 7458.48B and 514 nm), which is a gas laser that can stably produce high output and has an excellent coherence length.
可視レーザ記録用感光材料としては、可視光に対して十
分な感度を持つことが必要である。従来より、可視レー
ザ記録用感光材料の感度を増大させるために光重合開始
剤系について多くの研究がなされている。このような光
重合開始剤としてはベンゾイン及びその誘導体、置換又
は非置換の多核率ノン類などの多くの物質が既に知られ
ているが、特に可視光において十分な感度や解像性を有
するものは未だ知られていない。A photosensitive material for visible laser recording must have sufficient sensitivity to visible light. Conventionally, many studies have been conducted on photopolymerization initiator systems in order to increase the sensitivity of photosensitive materials for visible laser recording. Many substances are already known as such photopolymerization initiators, such as benzoin and its derivatives, substituted or unsubstituted polynuclear compounds, etc., but those that have sufficient sensitivity and resolution, especially in visible light. is still unknown.
また、例えばＮ−フェニルグリシンのようなＮ−アリー
ル−α−デア５ノ酸各種の光吸収性化合物とを組み合わ
せた材料が知られている（例えば時開５７−８３５０１
号公報など参照）、シかしながら、この材料も感度や解
像性が十分ではなく、保存安定性も劣るなどの問題点が
ある。Furthermore, materials are known in which N-aryl-α-dea-pentaenoic acids such as N-phenylglycine are combined with various light-absorbing compounds (for example, Jikai 57-83501
However, this material also has problems such as insufficient sensitivity and resolution, and poor storage stability.
そこで、レーザ照射で鉄アレーン錯体から発生した酸に
より、ブロック″した官能基をはずしてアルカリ可溶性
とする方法が開発されている（例えば特願昭６３−１３
８００号出願など参照）。鉄アレーン錯体のアニオンと
してＢＦ、−１ＰＦｔｈ−１ＡＳＦ＆−又はＳｂＦ、−
が用いられている。しかしながら、ハロゲンである弗素
やりん、砒素及びアンチモンなどは金属への腐食性が高
く、このような腐食性が高い酸発生剤を用いると金属基
板や配線などを腐食する恐れがある。Therefore, a method has been developed to make the iron arene complex soluble by removing the blocked functional groups using acid generated from the iron arene complex by laser irradiation (for example, Japanese Patent Application No. 1983-13).
(See Application No. 800, etc.) BF, -1PFth-1ASF&- or SbF, - as anion of iron arene complex
is used. However, halogens such as fluorine, phosphorus, arsenic, and antimony are highly corrosive to metals, and if such highly corrosive acid generators are used, there is a risk of corroding metal substrates, wiring, and the like.
（発明が解決しようとする課題）
従って、本発明は、前記した従来技術の問題点を解決し
て、可視レーザに高感度であり、かつ解像性、保存安定
性及び耐腐食性に優れたアルカリ現像型の感光材料を提
供することを目的とする。(Problems to be Solved by the Invention) Therefore, the present invention solves the problems of the prior art described above, and provides a system that is highly sensitive to visible lasers and has excellent resolution, storage stability, and corrosion resistance. The purpose of the present invention is to provide an alkali-developable photosensitive material.
上記の目的は、本発明によれば、下記式（１）又は（Ｉ
Ｉ）で表わされるポリマーと下記式（ｎＩ）で表わされ
る鉄アレーン錯体とからなる可視レーザ記録用感光材料
によって達成される。According to the present invention, the above object can be achieved by the following formula (1) or (I
This is achieved by a photosensitive material for visible laser recording comprising a polymer represented by I) and an iron arene complex represented by the following formula (nI).
６
（式中、Ｒ１，ｉｐ、 Ｒ３，Ｒ４，Ｒ’５及びＲ６は
それぞれ独立に水素原子、アルキル基（好ましくは炭素
数１〜５のアルキル基）、アルケニル基（好ましくは炭
素数２〜６のアルケニル基）又はフェニル基を示し、Ｒ
７はアルキレン基（好ましくは炭素数１〜ｌＯのアルキ
レン基）を示し、ｎ及びｍはそれぞれ独立に５〜５００
の整数である。）
ｅ
Ａ
（式中、Ａは芳香族炭化水素基である。）式（１）又は
（ＩＩ）で表されるポリマーは、例えばポリ（ｐ−ヒド
ロキシスチレン）の水酸基をトリオルガノシリル基又は
アルキレントリオルガノシリル基などによりブロックす
ることによって得られるポリマーである。6 (wherein R1, ip, R3, R4, R'5 and R6 each independently represent a hydrogen atom, an alkyl group (preferably an alkyl group having 1 to 5 carbon atoms), an alkenyl group (preferably an alkyl group having 2 to 6 carbon atoms) alkenyl group) or phenyl group, R
7 represents an alkylene group (preferably an alkylene group having 1 to 10 carbon atoms), and n and m each independently represent 5 to 500
is an integer. ) e A (In the formula, A is an aromatic hydrocarbon group.) The polymer represented by formula (1) or (II) is, for example, a poly(p-hydroxystyrene) hydroxyl group replaced with a triorganosilyl group or an alkylene group. It is a polymer obtained by blocking with triorganosilyl groups or the like.
式（Ｉ［［）の鉄アレーン錯体は、３００〜５００ｎ＋
１の可視光を吸収して酸を発生する酸発生剤として作用
する。式（ＩＩＩ）中、Ａの芳香族炭化水素基としては
、例えば、ベンゼン、ナフタレン、ナフタセン、ピレン
およびナフタビレンなどの縮合芳香族環が好ましい。The iron arene complex of the formula (I[[) has 300 to 500n+
Acts as an acid generator that absorbs visible light of 1 and generates acid. In formula (III), the aromatic hydrocarbon group of A is preferably a fused aromatic ring such as benzene, naphthalene, naphthacene, pyrene, and naphthabilene.
本発明では、ポリマー中の特定の官能基を保護しておき
、これを可視レーザ照射で発生した酸によりはずして元
の官能基に戻す機構を利用する。The present invention utilizes a mechanism in which a specific functional group in a polymer is protected and then removed by an acid generated by visible laser irradiation to restore the original functional group.
すなわち、可視光の吸収能が大きい式（Ｉ［［）の鉄ア
レーン錯体が光を吸収して酸を発生し、式（１）または
式（ＩＩ）のポリマーのブロックされた置換基がはずれ
て、アルカリ可溶性のポリ（Ｐヒドロキシスチレン）と
なる。アルカリ現像により露光部が溶解しポジパターン
が得られる。In other words, the iron arene complex of formula (I [ , resulting in alkali-soluble poly(P-hydroxystyrene). The exposed areas are dissolved by alkaline development and a positive pattern is obtained.
この機能を、式（Ｉ）のポリマーを用いた場合について
示すと下記のとおりである。This function is shown below when using the polymer of formula (I).
３
次に、この右辺のポリマーがアルカリ現像によって溶解
する。3 Next, this polymer on the right side is dissolved by alkaline development.
保護基として用いるトリオルガノシリル基とアルキレン
トリオルガノシリル基は酸を触媒とする開裂速度が速く
、かつ酸が存在しない場合、即ち、露光しない限り極め
て安定である。また、酸発生剤のアニオンは腐食性が非
常に低い。このため、本発明の可視レーザ記録用感光材
料によれば、高感度、高解像度、高保存安定性及び非腐
食性が同時に得られる。Triorganosilyl groups and alkylenetriorganosilyl groups used as protecting groups have a high rate of acid-catalyzed cleavage and are extremely stable in the absence of acid, that is, unless exposed to light. Furthermore, the anion of the acid generator has very low corrosivity. Therefore, according to the photosensitive material for visible laser recording of the present invention, high sensitivity, high resolution, high storage stability, and non-corrosion can be obtained at the same time.
以下に、実施例によって、本発明を更に詳しく説明する
が、本発明の範囲をこれらの実施例に限定するものでは
ないことはいうまでもない。EXAMPLES The present invention will be explained in more detail below with reference to Examples, but it goes without saying that the scope of the present invention is not limited to these Examples.
〔実施例］
２！Ｊｕ！１Ｌ
（Ｉ）のポリマー：ポリ（ｐ−１リオルガノメチルシロ
キシスチレン）１０ｇ
酸発生剤：炭酸水素化（η６ナフタレン）（η５シクロ
ペンタジェニル） 鉄（ＩＩ ） ０．５ｇ？容斉り
：モノクロベンゼン ４０ｇメチルイソ
ブチルケトン ４０ｇテトラヒドロフラン
４０ｇこの組成の感光液をシリコン基板上に
スピンコートシて乾燥後の膜厚５μｍの感光板を形成し
た。[Example] 2! Ju! 1L Polymer (I): Poly(p-1 liorganomethylsiloxystyrene) 10g Acid generator: Hydrocarbonated (η6 naphthalene) (η5 cyclopentagenyl) Iron (II) 0.5g? Appearance: Monochlorobenzene 40g Methyl isobutyl ketone 40g Tetrahydrofuran
40g of the photosensitive solution having this composition was spin-coated onto a silicon substrate to form a photosensitive plate having a film thickness of 5 μm after drying.
得られた感光板を、Ａｒレーザを用いてフォトマスクを
通して露光し、現像液としてテトラメチルアンモニウム
ヒドロキシドを用いて、ポジ型のパターンを形成した。The obtained photosensitive plate was exposed to light using an Ar laser through a photomask, and a positive pattern was formed using tetramethylammonium hydroxide as a developer.
その結果、２５ ｍＪ／ｃｌで１０ｕｍラインの再現を
確認した。As a result, it was confirmed that the 10 um line could be reproduced at 25 mJ/cl.
ｌ動艷え
（Ｉ）のポリマー：ポリ （ｐ−トリオルガノメチルシ
ロキシスチレン）１０ｇ
酸発生剤：炭酸水素化（η６ピレン）
（η５シクロペンタジェニル）鉄（ＩＩ） ０．５ｇ
溶剤：モノクロルベンゼン ４０ｇメチル
イソブチルケトン ４０ｇテトラヒドロフラン
４０ｇ以下、実施例１と同様にしてポジ
型パターン形成したところ、１０ ｍＪ／ｃｉで１０μ
ｍラインの再現を確認した。1 Polymer of moving part (I): Poly (p-triorganomethylsiloxystyrene) 10 g Acid generator: Hydrogenated carbonate (η6 pyrene) (η5 cyclopentadienyl) iron (II) 0.5 g
Solvent: Monochlorobenzene 40g Methyl isobutyl ketone 40g Tetrahydrofuran 40g or less A positive pattern was formed in the same manner as in Example 1, and 10μ at 10 mJ/ci
The reproduction of the m line was confirmed.
実Ｉｕ組よ
（ｎ）のポリマー：ポリ（ｐ−トリメチルシリルメトキ
シスチレン）１２ｇ
酸発生剤：炭酸水素化（ηｂピレン）
（η５シクロペンタジェニル）＆（ＩＩ） ０．５ｇ
溶剤：モノクロルベンゼン ４０ｇメチル
イソブチルケトン ４０ｇテトラヒドロフラン
４０ｇ以下、実施例１と同様にしてポジ
型パターンを形成し、２０ ｍＪ／ｃｆｆｌで１０ＩＩ
Ｉ１１ラインの再現を確認した。Real Iu group (n) polymer: poly(p-trimethylsilylmethoxystyrene) 12 g Acid generator: hydrogen carbonate (ηb pyrene) (η5 cyclopentadienyl) & (II) 0.5 g
Solvent: Monochlorobenzene 40g Methyl isobutyl ketone 40g Tetrahydrofuran 40g or less, a positive pattern was formed in the same manner as in Example 1, and 10II was applied at 20 mJ/cffl.
The reproduction of the I11 line was confirmed.
夫旌班土
（ＩＩ）のポリマー：ポリ （ｐ−トリメチルシリルエ
トキシスチレン） １２ｇ酸発
生剤：炭酸水素化（η６ピレン）
（η５シクロペンタジェニル）＆（ＩＩ） ０．５ｇ
ン容剤：モノクロルベンゼン ４０ｇメチ
ルイソブチルケトン ４０ｇテトラヒドロフラ
ン ４０ｇ以下、実施例１と同様にしてポ
ジ型パターンを形成し、１５ ｍＪ／ｃＪで１０μｍラ
インの再現を確認した。Polymer of Fuchengbanto (II): Poly (p-trimethylsilylethoxystyrene) 12g Acid generator: Hydrocarbonated (η6pyrene) (η5cyclopentadienyl) & (II) 0.5g
A positive pattern was formed in the same manner as in Example 1 using 40 g of monochlorobenzene, 40 g of methyl isobutyl ketone, and 40 g of tetrahydrofuran, and the reproduction of a 10 μm line was confirmed at 15 mJ/cJ.
以上説明したように、本発明の可視レーザ記録用感光材
料は、可視光領域において従来の感光材料よりも高い感
度および解像度でパターンを形成することができ、かつ
実用的に十分な保存安定性および非腐食性を有する。As explained above, the photosensitive material for visible laser recording of the present invention can form a pattern with higher sensitivity and resolution than conventional photosensitive materials in the visible light region, and has practically sufficient storage stability and Non-corrosive.
Claims (1)
下記式（III）で表わされる鉄アレーン錯体とからなる
可視レーザ記録用感光材料。 ▲数式、化学式、表等があります▼（ I ） ▲数式、化学式、表等があります▼（II） （式中、Ｒ＾１、Ｒ＾２、Ｒ＾３、Ｒ＾４、Ｒ＾５及び
Ｒ＾６はそれぞれ独立に水素原子、アルキル基、アルケ
ニル基又はフェニル基を示し、Ｒ＾７はアルキレン基を
示し、ｎ及びｍはそれぞれ独立に５〜５００の整数であ
る。） ▲数式、化学式、表等があります▼（III） （式中、Ａは芳香族炭化水素基である。）[Claims] 1. A photosensitive material for visible laser recording comprising a polymer represented by the following formula (I) or (II) and an iron arene complex represented by the following formula (III). ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, R^1, R^2, R^3, R^4, R^5 and R^6 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, or a phenyl group, R^7 represents an alkylene group, and n and m each independently represent an integer from 5 to 500.) ▲ Numerical formula, chemical formula , tables, etc.▼(III) (In the formula, A is an aromatic hydrocarbon group.)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1210652A JPH0375633A (en) | 1989-08-17 | 1989-08-17 | Photosensitive material for recording visible laser beams |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1210652A JPH0375633A (en) | 1989-08-17 | 1989-08-17 | Photosensitive material for recording visible laser beams |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0375633A true JPH0375633A (en) | 1991-03-29 |
Family
ID=16592856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1210652A Pending JPH0375633A (en) | 1989-08-17 | 1989-08-17 | Photosensitive material for recording visible laser beams |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0375633A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2145765A1 (en) * | 2008-07-18 | 2010-01-20 | FUJIFILM Corporation | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving. relief printing plate, and method of producing relief printing plate |
| US8273520B2 (en) | 2008-01-29 | 2012-09-25 | Fujifilm Corporation | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
| US8278387B2 (en) | 2008-03-28 | 2012-10-02 | Fujifilm Corporation | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate |
-
1989
- 1989-08-17 JP JP1210652A patent/JPH0375633A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8273520B2 (en) | 2008-01-29 | 2012-09-25 | Fujifilm Corporation | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
| US8278387B2 (en) | 2008-03-28 | 2012-10-02 | Fujifilm Corporation | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate |
| EP2145765A1 (en) * | 2008-07-18 | 2010-01-20 | FUJIFILM Corporation | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving. relief printing plate, and method of producing relief printing plate |
| US8367300B2 (en) | 2008-07-18 | 2013-02-05 | Fujifilm Corporation | Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of producing relief printing plate |
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