JPH037102B2 - - Google Patents

Info

Publication number
JPH037102B2
JPH037102B2 JP4934183A JP4934183A JPH037102B2 JP H037102 B2 JPH037102 B2 JP H037102B2 JP 4934183 A JP4934183 A JP 4934183A JP 4934183 A JP4934183 A JP 4934183A JP H037102 B2 JPH037102 B2 JP H037102B2
Authority
JP
Japan
Prior art keywords
layer
thin film
photosensitive
metal thin
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4934183A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59210443A (ja
Inventor
Takeo Morya
Toshio Yamagata
Masako Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP58049341A priority Critical patent/JPS59210443A/ja
Publication of JPS59210443A publication Critical patent/JPS59210443A/ja
Publication of JPH037102B2 publication Critical patent/JPH037102B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58049341A 1983-03-24 1983-03-24 感光性材料 Granted JPS59210443A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58049341A JPS59210443A (ja) 1983-03-24 1983-03-24 感光性材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58049341A JPS59210443A (ja) 1983-03-24 1983-03-24 感光性材料

Publications (2)

Publication Number Publication Date
JPS59210443A JPS59210443A (ja) 1984-11-29
JPH037102B2 true JPH037102B2 (instruction) 1991-01-31

Family

ID=12828295

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58049341A Granted JPS59210443A (ja) 1983-03-24 1983-03-24 感光性材料

Country Status (1)

Country Link
JP (1) JPS59210443A (instruction)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59191029A (ja) * 1983-04-13 1984-10-30 Kimoto & Co Ltd 金属画像形成材料

Also Published As

Publication number Publication date
JPS59210443A (ja) 1984-11-29

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