JPH0369569A - Method for joining metal to ceramic - Google Patents

Method for joining metal to ceramic

Info

Publication number
JPH0369569A
JPH0369569A JP20753289A JP20753289A JPH0369569A JP H0369569 A JPH0369569 A JP H0369569A JP 20753289 A JP20753289 A JP 20753289A JP 20753289 A JP20753289 A JP 20753289A JP H0369569 A JPH0369569 A JP H0369569A
Authority
JP
Japan
Prior art keywords
pedestal
ceramic
alumina
copper
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20753289A
Other languages
Japanese (ja)
Other versions
JPH0550472B2 (en
Inventor
Naoyuki Kanehara
尚之 金原
Tetsuo Furuhata
降旗 哲夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Priority to JP20753289A priority Critical patent/JPH0369569A/en
Publication of JPH0369569A publication Critical patent/JPH0369569A/en
Publication of JPH0550472B2 publication Critical patent/JPH0550472B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To make it possible to stably join a metal sheet to a ceramic substrate by putting a laminate obtd. by superposing the ceramic substrate on the metal sheet on a pedestal coated with ceramic powder, joining the sheet to the substrate by heating to a high temp. in an inert atmosphere and removing the ceramic powder by acid treatment. CONSTITUTION:A ceramic substrate such as an alumina substrate is superposed on a metal sheet such as a Cu sheet. The resulting laminate is put on a pedestal coated with alumina powder and the metal sheet is joined to the ceramic substrate by holding at a high temp. in an inert atmosphere. The alumina powder melt-bonded to the metal sheet is then removed by acid treatment.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、セラミック基板に金属板を直接接合する方法
に関し、特にアルミナ粉末の使用により、接合金属板と
台座との溶着を巧妙に防止して工業的量産に適するよう
に改善された金属とセラミックとの接合方法に関するも
のである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for directly bonding a metal plate to a ceramic substrate, and in particular uses alumina powder to cleverly prevent welding between the bonded metal plate and the pedestal. The present invention relates to a method for joining metals and ceramics that has been improved to be suitable for industrial mass production.

[従来技術] 従来セラミック基板としてのアルミナ基板と、金属板で
ある銅板とを接合する方法としては、バインダーを含ん
だ銅ペーストをアルミナ基板上に塗布し、乾燥焼成して
アルミナ基板中のガラス形代物質と銅ペースト中のバイ
ンダーとを反応させ、かつその反応生成物を銅とも反応
させて接合する方法、あるいはアルミナ基板と銅板との
間に反応金属(ろう材)をはさみ込み、反応金属の融点
よりも高い温度で、アルミナ基板と反応金属、および銅
板と反応金属との間にそれぞれ拡散反応を起させて接合
する方法などが知られている。
[Prior Art] Conventionally, the method of joining an alumina substrate as a ceramic substrate and a copper plate as a metal plate is to apply a copper paste containing a binder onto the alumina substrate, dry and bake it, and form a glass shape in the alumina substrate. A method of bonding by reacting a substitute substance with a binder in a copper paste and also reacting the reaction product with copper, or a method of sandwiching a reactive metal (brazing material) between an alumina substrate and a copper plate, A known method is to cause a diffusion reaction between an alumina substrate and a reactive metal, and between a copper plate and a reactive metal, at a temperature higher than the melting point.

しかし最近、半導体装置は大電力化、高集積化およびモ
ジュール化の方向に進展しており、セラミック基板の高
放熱性化、半導体装の簡略化、高信頼化の要求に対応し
て、前述の銅ペーストやろう祠を用いないでアルミナ基
板上に銅回路板を直接接合する方法が用いられるように
なっている。
However, recently, semiconductor devices have been progressing toward higher power, higher integration, and modularization, and in response to the demands for higher heat dissipation of ceramic substrates, simplification of semiconductor devices, and higher reliability, the above-mentioned A method of directly bonding a copper circuit board onto an alumina substrate without using copper paste or braze is now being used.

英国特許公報第761045号に記載されている銅とセ
ラミック基板との直接接合方法は、あらかじめ銅を強く
酸化し、その銅をアルミナ基板上に配置し、両者を1.
083℃(銅の融点)より高く、かつ酸化第1銅の融点
(約1.200°C)よりも低い温度で加熱するという
ものである。加熱サイクル中に酸化第2銅はほとんと酸
化第1銅に転化するのて銅板は融点に達し融解するが酸
化第1銅は融解されないで、アルミナ基板と銅との填界
領域には酸化第1銅層が存在することになると述べられ
ている。
The method of directly bonding copper and a ceramic substrate described in British Patent Publication No. 761045 involves strongly oxidizing copper in advance, placing the copper on an alumina substrate, and bonding the two together in a 1.
The process involves heating at a temperature higher than 0.83°C (the melting point of copper) and lower than the melting point of cuprous oxide (about 1.200°C). During the heating cycle, most of the cupric oxide is converted to cuprous oxide, so the copper plate reaches its melting point and melts, but the cuprous oxide is not melted, and the cuprous oxide remains in the interfacial region between the alumina substrate and the copper. It is stated that there will be one copper layer.

また特公昭60−43.54号により開示された「セラ
ミックからなる基体に銅部利を粘合する方法」には銅板
どセラミック基体とを接合配置する前に、予め銅部利表
面またはセラミック基体上に200〜5,000人の厚
さの銅酸化物層を形成し、次に銅部材とセラミック基体
とを重ね合わせて不活性雰囲気中に置き、銅部柵とセラ
ミック基体との界面に銅部祠と銅酸化物の亜共晶融体が
形成されるような温度すなイっち1,065°C(Cu
−0共晶温度)と1.083℃との間の温度に加熱した
後冷却することからなる直接接合方法が記載されている
In addition, in the "Method of bonding copper parts to a ceramic substrate" disclosed in Japanese Patent Publication No. 60-43.54, before bonding and arranging a copper plate or a ceramic substrate, the copper parts surface or the ceramic substrate must be bonded in advance. A copper oxide layer with a thickness of 200 to 5,000 is formed on top, and then the copper member and the ceramic substrate are stacked and placed in an inert atmosphere, and the copper part is deposited at the interface between the copper part rail and the ceramic substrate. The temperature at which a hypoeutectic melt of copper oxide and copper oxide is formed is 1,065°C (Cu
A direct bonding method is described that consists of heating to a temperature between -0 eutectic temperature) and 1.083°C followed by cooling.

更に本発明者による特開昭63−166774号「銅板
とアルミナ基板との接合体の製造方法」には、相互に接
触させた銅板とアルミナ基板とを不活性雰囲気中で、1
..083°Cよりも低い温度に加熱することにより、
接触部に銅と銅酸化物の共晶液相を形成させること無く
、銅とアルミナ基板表面のアルミナおよびガラス質形成
物質との化合物を形成させ、次いで冷却することからな
る直接接合方法が開示されている。この場合、直接接合
される銅板とアルミナ基板とをコンベア炉に搬入する際
、重ね合わせたものをSiC製の台座上に配置して1′
1動搬入し、コンベア炉内で接合のための加熱処理をし
ている。
Furthermore, in JP-A No. 63-166774 "Method for manufacturing a bonded body of a copper plate and an alumina substrate" written by the present inventor, a copper plate and an alumina substrate that are brought into contact with each other are brought into contact with each other in an inert atmosphere.
.. .. By heating to a temperature lower than 0.83°C,
A direct bonding method is disclosed in which a compound is formed between copper and alumina and a glass-forming substance on the surface of an alumina substrate without forming a eutectic liquid phase of copper and copper oxide at the contact portion, and then cooling. ing. In this case, when carrying the copper plate and alumina substrate to be directly bonded into a conveyor furnace, the stacked pieces are placed on a SiC pedestal.
The pieces are brought in and heat treated for bonding in a conveyor furnace.

[発明が解決しようとする課題] しかしながら上述の手段でSiC製の台座を使用する場
合、次のような問題点があることかわかった。
[Problems to be Solved by the Invention] However, it has been found that when using a pedestal made of SiC with the above-mentioned means, there are the following problems.

ます、SiC台座の製作そのもの、すなわちSiCの焼
結が難しいこと、またSiC粉の製造工程やその焼結時
に遊離Siや遊離Cが発生してこれらが台座に含まれて
いるため、この状態で台座」二に、銅板と重ねたアルミ
ナ基板を配置して不活性雰囲気中で接合処理を行うと適
切な雰囲気が維持てきなくなり、特に遊離Siが存在す
ると、銅板と遊離Siとが合金化して金色を呈する等の
問題点を有することが判明した。また、この合金化によ
り銅板とSiC台座とが溶着してしまうため、台座から
の取り外しが困難または不可能となり、たとえ取り外せ
たとしても得られた接合体は製品として市場に出せるも
のではなくなってl、まった。
First, the production of the SiC pedestal itself, that is, the sintering of SiC, is difficult, and free Si and free C are generated during the SiC powder manufacturing process and sintering, and these are contained in the pedestal. If an alumina substrate stacked with a copper plate is placed on the pedestal and the bonding process is performed in an inert atmosphere, an appropriate atmosphere cannot be maintained, and especially if free Si is present, the copper plate and free Si will alloy and become golden. It was found that there were problems such as: In addition, this alloying causes the copper plate and the SiC pedestal to be welded together, making it difficult or impossible to remove it from the pedestal, and even if it could be removed, the resulting bonded body would no longer be able to be marketed as a product. ,wait.

一方、遊離Cの存在は、銅板とアルミナム(板との接触
面の一部に局所的な範囲で還元雰囲気を生ずることとな
り、接合界面に形成されるべき酸化物の形成が阻害され
るため、この部分が非接合部分となりやすいことが判明
した。
On the other hand, the presence of free C creates a local reducing atmosphere at a part of the contact surface between the copper plate and the aluminum plate, inhibiting the formation of oxides that should be formed at the bonding interface. It was found that this part is likely to become a non-bonded part.

従って、この方法で、量産を計ろうとすれば、品質の低
下を防ぐための検査工程が大規模なものとなり、コスト
高の要因となるため、何らかの解決手段が求められてい
た。
Therefore, if this method were to be used for mass production, the inspection process to prevent quality deterioration would be large-scale, which would lead to high costs, so some kind of solution was needed.

[課題を解決するための手段] 本発明者等は斯る課題を解決するため鋭意研究していた
ところ、セラミック台座にアルミナ製のものを用いると
共に、該アルミナ製台座表面に更にアルミナ粉末を塗布
などにより配置して使用することにより」二連の課題を
全て解決できることを見い出し、本発明を達成すること
ができた。
[Means for Solving the Problems] The present inventors conducted intensive research to solve the problems, and found that they used alumina as the ceramic pedestal and further coated alumina powder on the surface of the alumina pedestal. The inventors have discovered that by arranging and using the invention, both problems can be solved, and the present invention has been achieved.

すなわち本発明は、その最も好ましい態様においては、
相互に接触させて重ね合わせた少なくども1枚の金属板
と少なくとも1枚のセラミック基板とからなる積層体を
不活性雰囲気中において接合させる方法であって、積層
体最下部の金属板を支持する台座としてアルミナ製の台
座を用い、更にその」二にアルミナ粉末を配置する第1
工程・上記アルミナ粉末上に相互に接触させた金属板と
セラミック基板との積層体を載せて不活性雰囲気中で接
合させるための加熱処理をする第2工程及び 積層体最下部の金属板に溶着したアルミナ粉末を酸処理
により溶解除去する第3工程;からなることを特徴とす
る金属とセラミックとの接合方法を提供するものである
。ただし、本発明は、セラミック台座上にセラミック粉
末を配置し、該セラミック粉末上に接合すべき積層体を
のせて加熱処理することにより積層体を接合体として得
た後、該接合体の金属表面に溶着したセラミック粉末を
金属表面の酸処理により除去することを特徴とする方法
を提供するものであるから、セラミック台座及びセラミ
ック粉末は、アルミナ製のものを用いることが好ましい
が、必ずしもアルミナに限定されるものではない。
That is, the present invention, in its most preferred embodiment,
A method of bonding a laminate consisting of at least one metal plate and at least one ceramic substrate stacked in contact with each other in an inert atmosphere, the metal plate at the bottom of the laminate being supported. An alumina pedestal is used as the pedestal, and alumina powder is placed on the first pedestal.
Process: A laminate of a metal plate and a ceramic substrate that are in contact with each other is placed on the alumina powder and heat treated to bond them in an inert atmosphere.The second step is welding to the metal plate at the bottom of the laminate. A third step of dissolving and removing the alumina powder obtained by the alumina powder by acid treatment is provided. However, in the present invention, after obtaining a laminate as a bonded body by placing ceramic powder on a ceramic pedestal, placing a laminate to be bonded on top of the ceramic powder and heat-treating, the metal surface of the bonded body is Since the present invention provides a method characterized in that ceramic powder welded to the metal surface is removed by acid treatment of the metal surface, it is preferable to use a ceramic base and ceramic powder made of alumina, but it is not necessarily limited to alumina. It is not something that will be done.

[作 用] 本発明方法で使用する台座の材質としては、接合時の雰
囲気を阻害しない安定な物質、つまり高温下で分解や解
離をすることがなく、11つ工業的に安定したものであ
り、その」二に、接合処理後得られた接合体製品を容易
に取り外しできるものであればよい。
[Function] The material of the pedestal used in the method of the present invention is a stable material that does not disturb the atmosphere during bonding, that is, it does not decompose or dissociate at high temperatures, and is industrially stable. Second, any material may be used as long as the bonded product obtained after the bonding process can be easily removed.

高温で銅板と反応しないセラミック基板としては、非酸
化物系のセラミック材か適切であると考えられるが、実
際に試験してみると高温下で一部の分解、解離を生(7
るものが多く、また、原料粉を製造する段階やセラミッ
ク材の焼結体を製造する段階で遊離成分を発生すること
か多い。
Non-oxide ceramic materials are thought to be appropriate for ceramic substrates that do not react with the copper plate at high temperatures, but actual tests show that some decomposition and dissociation occur at high temperatures (7
In addition, free components are often generated during the production of raw material powder and the production of sintered bodies of ceramic materials.

本発明者等は、秤々の非酸化物系セラミック材を用いて
数多く実験を重ねたが、局所的な還元雰囲気が生じて使
用したタフピッチ銅が部分的に還元される場合が多いこ
とを確認した。そこで、非酸化物系セラミック材の使用
を断念し、酸化物系セラミック材の使用を検討すること
にした。
The inventors conducted numerous experiments using non-oxide ceramic materials, and found that in many cases, the tough pitch copper used was partially reduced due to the formation of a local reducing atmosphere. did. Therefore, we decided to abandon the use of non-oxide ceramic materials and consider using oxide ceramic materials.

しかし、酸化物系セラミック材は、適当な温度、雰囲気
条件下で鋼材と接合されてしまう。従って、これを台座
の祠料として用いると製品に台座がついてしまい、製品
にならない。しかも、その接着強度はかなり大きいため
、容易に分離できない。
However, oxide-based ceramic materials are bonded to steel materials under appropriate temperature and atmospheric conditions. Therefore, if this is used as an abrasive material for a pedestal, the pedestal will stick to the product and it will not become a product. Moreover, since the adhesive strength is quite high, it cannot be easily separated.

そこで本発明者等は、酸化物系セラミック材からなる台
座を用い、更に適当なセラミック粉末を金属板と接すべ
き台座表面に配置して使用すれば、台座と銅板とが直接
接合することを防止できると共に、銅板に接合されたア
ルミナ粉末は台座からは分離されているものであるため
、得られた接合体は容易に台座から離れるであろうと推
定して実験したところ、推定通りの効果が得られること
を確認したものである。
Therefore, the present inventors have found that by using a pedestal made of an oxide-based ceramic material and further placing appropriate ceramic powder on the surface of the pedestal that should be in contact with the metal plate, the pedestal and the copper plate can be directly bonded. In addition, since the alumina powder bonded to the copper plate is separated from the pedestal, we conducted an experiment assuming that the resulting bonded body would easily separate from the pedestal, and found that the effect was as expected. This has been confirmed to be possible.

本発明方法で用いるセラミック粉末として実施例ではア
ルミナ粉末を用いたが、これは、(1)安価である、(
2)アルミナ粉末を塗布する台座と同じ材質であるため
同じ熱容量を持ち、接合体の昇温時における温度コント
ロールが行いやすい、(3)アルミナ材は高温下で安定
であり、還元性雰囲気を作らない、等の理由による。ま
た、アルミナ粉末を塗布する台座としてアルミナ材の台
座を用いた理由も、上記(1)〜(3)と実質的に同じ
である。
In the examples, alumina powder was used as the ceramic powder used in the method of the present invention, which is (1) inexpensive;
2) Since it is made of the same material as the pedestal on which the alumina powder is applied, it has the same heat capacity, making it easy to control the temperature when the temperature of the bonded body increases. (3) Alumina material is stable at high temperatures and creates a reducing atmosphere. Due to reasons such as no. Furthermore, the reason for using an alumina pedestal as the pedestal on which the alumina powder is applied is substantially the same as in (1) to (3) above.

上記アルミナ粉末としては粒径数1.(bzm〜数〃m
の物を用いるのが好ましいことを実験等で確認している
The above alumina powder has a particle size of 1. (bzm ~ number m
It has been confirmed through experiments that it is preferable to use

接合のための加熱処理により、台座上にセラミック粉末
を介して配置された積層体中の銅板とアルミナ基板との
直接接合が行われると共に、台座上に配置されたアルミ
ナ粉末も銅板の一部と接合する。しかし、アルミナ製台
座そのものはその」二に敷かれたアルミナ粉末とは接合
せず、またアルミナ粉末を介して接している鋼材とも接
合しないことが確認された。このため台座から接合体を
分離することは容易であった。
Through the heat treatment for bonding, the copper plate in the laminate placed on the pedestal via the ceramic powder and the alumina substrate are directly bonded, and the alumina powder placed on the pedestal also becomes part of the copper plate. Join. However, it was confirmed that the alumina pedestal itself did not bond with the alumina powder spread on it, nor did it bond with the steel material that was in contact with it through the alumina powder. Therefore, it was easy to separate the joined body from the pedestal.

] 0 銅板に接合されたアルミナ粉末を除去する方法としては
、研磨や振動などの機械的除去法もあるが、これらの方
法では、接合体に衝撃を与えるため好ましくなく、また
銅板の表面に傷が生じて製品として不適当なものとなり
易い。そこで本発明者等は、銅板が酸によりエツチング
される性質を利用して、接合体全体を酸溶7皮中に浸漬
して銅表面全体を溶解し、アルミナ粉末を除去すること
を考えたのである。
] 0 There are mechanical removal methods such as polishing and vibration to remove the alumina powder bonded to the copper plate, but these methods are undesirable because they give a shock to the bonded body, and they also cause scratches on the surface of the copper plate. This tends to result in unsuitable products. Therefore, the inventors of the present invention took advantage of the property that copper plates are etched by acid and thought of immersing the entire bonded body in an acid solution to dissolve the entire copper surface and remove the alumina powder. be.

この場合、アルミナ粉末と銅板とは点接触の状態で接合
されているため、酸溶液中に接合体を浸漬すると、酸が
点接合部周辺から短時間で廻り込んで銅を溶解し、これ
によって点接合したアルミナ粉末を容易に除去すること
ができた。
In this case, the alumina powder and the copper plate are joined in a point contact state, so when the joined body is immersed in an acid solution, the acid quickly circulates from around the point joint and dissolves the copper. The point-bonded alumina powder could be easily removed.

アルミナ粉末と点接合している部分は、その周囲部分に
比ベエッチング溶液と接する時間が短くなるが、点接合
していた部分に製品として問題となるような痕跡は残ら
ないことを確認した。本発明方法で採用される接合温度
領域下では、アルミナ粉末が焼結されることはなく、ま
た銅板に接合されたアルミナ粉末のうちには広い接触面
をもって面接合しているためにエツチングによる除去が
困難というものはなかった。
Although the part that was point-bonded to the alumina powder was in contact with the etching solution for a shorter time than the surrounding area, it was confirmed that no traces that would pose a problem as a product remained in the spot-bonded part. Under the bonding temperature range adopted in the method of the present invention, the alumina powder is not sintered, and some of the alumina powder bonded to the copper plate has a wide contact surface and is removed by etching. There was nothing difficult about it.

以下、実施例により詳細に説明する。Hereinafter, it will be explained in detail using examples.

[実施例]−] 互いに接合させるための銅板およびアルミナ基板として
、厚さ0 、3mm、サイズ28mmX 40mmのタ
フピッチ銅と厚さ0.635mm、サイズ30mmX4
2mmの96%アルミナ基板とを準備した。
[Example]-] As a copper plate and an alumina substrate to be bonded to each other, tough pitch copper with a thickness of 0.3 mm and a size of 28 mm x 40 mm and a tough pitch copper with a thickness of 0.635 mm and a size of 30 mm x 4 are used.
A 2 mm 96% alumina substrate was prepared.

台座として50mmX50mmXO,[135mm’の
96%アルミナ板からなるものを用い、第1図に示すよ
うに、該台座4の表面」二に粒径2〜lOμm以内のア
ルミナ粉末3を塗布しく第1工程)、次いでこの台座上
に第1図に示すように下から銅板22、アルミナ基板1
、銅板21の順に重ね合わせた積層体を載せてコンベア
炉内に搬入し、酸素濃度to ppmの窒素ガスからな
る不活性雰囲気下で、1..063°C11,067℃
、1,075℃の各温度にそれぞれ制御した接合条件の
下で接合を行なわせた(第2工程)。
As a pedestal, a 96% alumina plate measuring 50 mm x 50 mm x 135 mm is used, and as shown in Fig. 1, the surface of the pedestal 4 is coated with alumina powder 3 having a particle size of 2 to 10 μm. ), then a copper plate 22 and an alumina substrate 1 are placed on this pedestal from below as shown in FIG.
, the copper plates 21 stacked one on top of the other in the order of 1. .. 063°C11,067°C
, 1,075° C. (second step).

得られた接合体を冷却後、大気中に取り出して−1 接合体と台座との接合状態について調べた結果を第1表
に示す。
After the obtained joined body was cooled, it was taken out into the atmosphere and the bonding state between the -1 joined body and the pedestal was examined. Table 1 shows the results.

この場合の接合状態についての評価は、試料として各2
0個を用いて加熱処理後、台座を90°回転させて積層
体との接触面が鉛直になるように立てたときに、接合さ
れた積層体が自然に、台座から離れたものの個数を「台
座と接合なし」の欄に記し、それ以外のものを「台座と
接合した」の欄に記した。
In this case, the bonding condition was evaluated using two samples each.
After heat treatment using 0 pieces, when the pedestal is rotated 90 degrees and stood up so that the contact surface with the laminate is vertical, the number of pieces that the bonded laminate naturally separates from the pedestal is `` Items other than those listed are listed in the column ``Not joined to the pedestal'' and other items are recorded in the column ``Joined to the pedestal.''

第1表 第1表より接合の完了した積層体と台座との接合は全く
なかったことが理解できる。
From Table 1, it can be seen that there was no bonding between the laminate and the pedestal after the bonding was completed.

第2工程で得られた接合体はその断面構造が第2図に示
すようなものであり、板厚0.835 mm’の2 アルミナ基板1の両面に0.8 mm’の銅板21およ
び22が接合されている。
The cross-sectional structure of the bonded body obtained in the second step is as shown in FIG. are joined.

図中22の銅板は、本発明法において台座上に配置され
たものであり、該銅板には台座」二のアルミナ粉末3が
点接合状態で付着している。
The copper plate 22 in the figure is placed on a pedestal in the method of the present invention, and the alumina powder 3 of the pedestal 2 is attached to the copper plate in a point-bonded state.

次いでこの点接合されたアルミナ粉末3を50%硝酸酸
性溶戚中に一定時間保持して溶解除去した(第3工程)
。この場合、適切な液中保持時間を定めるため液中保持
時間を種々変えてみたところ、30秒以上保持すれば銅
板22の表面に残存するアルミナ粉末は完全になくなり
、銅板表面は健全なものとなることがわかった。
Next, the point-bonded alumina powder 3 was held in a 50% nitric acid solution for a certain period of time to dissolve and remove it (third step).
. In this case, we tried varying the retention time in the liquid to determine the appropriate retention time, and found that if the retention time was kept for 30 seconds or more, the alumina powder remaining on the surface of the copper plate 22 would be completely gone, and the surface of the copper plate would be healthy. I found out that it will happen.

30秒液中に浸漬した接合体(銅板2]とアルミナ基板
1と銅板22の一体になったもの)の板厚をマイクロメ
ーターで測定したところ、浸漬前の板厚に比べ約2I1
m薄くなったたけて、接合体製品の寸法としては何ら問
題なかった。
When the thickness of the bonded body (copper plate 2, alumina substrate 1, and copper plate 22 integrated) immersed in the liquid for 30 seconds was measured with a micrometer, it was approximately 2I1 compared to the thickness before immersion.
Although it was made thinner, there were no problems with the dimensions of the joined product.

また、酸性溶酸として50%硝酸水溶波を用いたが、ア
ルミナ基板は優れた耐酸化性を有する物質であるため、
アルミナ基板そのものが溶出するこ3 4 とはなかった。
In addition, although 50% nitric acid solution was used as the acid solution, since the alumina substrate is a material with excellent oxidation resistance,
There was no possibility that the alumina substrate itself would be eluted.

[実施例2] 実施例1と同様に96%アルミナ材からなる台座を用い
て、該台座上に塗布するのに適したセラミック粉末を調
べる実験を行った。使用したセラミック粉末は、2〜t
OIIm粒径のA、ll’ 203 、A、12 N。
[Example 2] As in Example 1, an experiment was conducted using a pedestal made of 96% alumina material to investigate ceramic powder suitable for coating on the pedestal. The ceramic powder used was 2 to t.
OIIm particle size A, ll' 203 , A, 12 N.

SiC,BN、Si2 N4の5種類であるが、特にS
iCについては市販されている3社の製品を用いたので
SiCにA、B、Cの記号を付記して区別した。これら
の台座上に塗布したセラミック粉末上に実施例1と同様
の銅板とアルミナ基板の積層体を配置して接合体を得る
試験を行った結果を第2表に示した。得られた接合体の
評価は、銅板とアルミナ基板とが健全に接合されている
ものを「O」、銅板とアルミナ基板とか健全に接合され
ていないものを「X」とした。
There are five types: SiC, BN, and Si2N4, but especially S
As for the iC, commercially available products from three companies were used, so the symbols A, B, and C were added to the SiC to distinguish them. Table 2 shows the results of a test in which a laminate of a copper plate and an alumina substrate similar to that in Example 1 was placed on the ceramic powder coated on these pedestals to obtain a bonded body. The obtained joined body was evaluated as "O" if the copper plate and alumina substrate were soundly joined, and "X" if the copper plate and alumina board were not joined soundly.

(以下余白) 第2表 この時接合されなかった銅板の結晶粒界は、接合された
銅板の結晶粒界に比べ、粒界rlJが小さくこれを光学
顕微鏡で観察したところタフピッチ銅中に存在するはず
のCu2O相が見られなかった。
(Left below) Table 2 The grain boundaries of the copper sheets that were not joined at this time had smaller grain boundaries rlJ than those of the joined copper sheets, and when observed with an optical microscope, it was found that they exist in tough pitch copper. The expected Cu2O phase was not observed.

これは、アルミナ台座に塗布したSiCC%AJ7 N
、BN、S i3N4等のセラミック粉末の解離、分解
によりタフピッチ銅が脱酸されたことによるものと考え
られる。このことからもセラミック粉末としてA、Q2
03粉末を使用するのみな5 6 らず台座の月質としてもアルミナ材を用いると接合時に
安定な雰囲気が形成されることがわかる。
This is SiCC%AJ7N coated on an alumina pedestal.
This is thought to be due to deoxidation of tough pitch copper due to dissociation and decomposition of ceramic powders such as , BN, Si3N4, etc. From this, A, Q2 as ceramic powder
It can be seen that not only the use of 03 powder but also the use of alumina material as the material of the pedestal creates a stable atmosphere during bonding.

これはアルミナ材が非常に安定な物質であることによる
ものである。
This is because alumina material is a very stable substance.

[発明の効果] 以上述べたように本発明によれば、銅板とアルミナ基板
とを安定な雰囲気下で加熱・接合することができる。ま
た、使用する台座として安価なアルミナ材を用いること
ができるばかりでなく、台座と銅板との接合を防止する
目的にもセラミック粉末の使用という簡単な手段を有効
に利用しているに過ぎないため、製造コストの低下をも
たらすことができる。
[Effects of the Invention] As described above, according to the present invention, a copper plate and an alumina substrate can be heated and bonded in a stable atmosphere. In addition, not only can inexpensive alumina material be used as the pedestal, but the simple method of using ceramic powder is effectively used to prevent the pedestal from joining with the copper plate. , can bring about a reduction in manufacturing costs.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、炉内投入前の銅板とアルミナ基板の積層体の
台座上配置例を示す断面図である。 第2図は、銅板とアルミナ基板の接合体の一例を示す断
面図である。 第3図は、第2図に示した接合体を酸浸漬した後の銅板
表面の溶解状態を示す模式断面図である。 符号の説明 1・・・・アルミナ基板 2(・・・・銅板 22・・・・銅板 3・・・・アルミナ粉 4・・・・アルミナ台座
FIG. 1 is a sectional view showing an example of the arrangement of a laminate of a copper plate and an alumina substrate on a pedestal before being put into a furnace. FIG. 2 is a sectional view showing an example of a bonded body of a copper plate and an alumina substrate. FIG. 3 is a schematic cross-sectional view showing the dissolved state of the surface of the copper plate after the bonded body shown in FIG. 2 is immersed in acid. Explanation of symbols 1...Alumina substrate 2 (...Copper plate 22...Copper plate 3...Alumina powder 4...Alumina pedestal

Claims (3)

【特許請求の範囲】[Claims] (1)交互に重ね合わせた少なくとも1枚の金属板と少
なくとも1枚のセラミック基板とからなる積層体を不活
性雰囲気中に高温で保持して接合させる方法であって、 積層体最下部の金属板と接触させてこれを支持するため
の台座上にセラミック粉末を配置する第1工程; 上記セラミック粉末上に金属板とセラミック基板との積
層体を載せて不活性雰囲気中に高温で保持して金属板と
セラミック基板とを接合させる第2工程;および 積層体最下部の金属板に溶着したセラミック粉末を金属
板表面の酸処理により溶解除去する第3工程; からなることを特徴とする金属とセラミックとの接合方
法。
(1) A method in which a laminate consisting of at least one metal plate and at least one ceramic substrate stacked alternately is held at high temperature in an inert atmosphere and bonded, the metal at the bottom of the laminate being bonded. The first step is to place the ceramic powder on a pedestal for contacting and supporting the plate; placing the laminate of the metal plate and the ceramic substrate on the ceramic powder and holding it at high temperature in an inert atmosphere; A second step of joining the metal plate and the ceramic substrate; and a third step of dissolving and removing the ceramic powder welded to the metal plate at the bottom of the laminate by acid treatment of the surface of the metal plate. How to join with ceramic.
(2)上記第2工程における不活性雰囲気が、1%以下
の酸素を含む不活性雰囲気であることを特徴とする請求
項1記載の金属とセラミックとの接合方法。
(2) The method for joining metal and ceramic according to claim 1, wherein the inert atmosphere in the second step is an inert atmosphere containing 1% or less oxygen.
(3)前記台座がアルミナ製台座であり、前記セラミッ
ク粉末がアルミナ粉末である請求項1または2記載の方
法。
(3) The method according to claim 1 or 2, wherein the pedestal is an alumina pedestal, and the ceramic powder is alumina powder.
JP20753289A 1989-08-10 1989-08-10 Method for joining metal to ceramic Granted JPH0369569A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20753289A JPH0369569A (en) 1989-08-10 1989-08-10 Method for joining metal to ceramic

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20753289A JPH0369569A (en) 1989-08-10 1989-08-10 Method for joining metal to ceramic

Publications (2)

Publication Number Publication Date
JPH0369569A true JPH0369569A (en) 1991-03-25
JPH0550472B2 JPH0550472B2 (en) 1993-07-29

Family

ID=16541286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20753289A Granted JPH0369569A (en) 1989-08-10 1989-08-10 Method for joining metal to ceramic

Country Status (1)

Country Link
JP (1) JPH0369569A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010093001A (en) * 2008-10-07 2010-04-22 Curamik Electronics Gmbh Method of manufacturing metal-ceramic substrate or copper-ceramic substrate, and base used for the method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010093001A (en) * 2008-10-07 2010-04-22 Curamik Electronics Gmbh Method of manufacturing metal-ceramic substrate or copper-ceramic substrate, and base used for the method

Also Published As

Publication number Publication date
JPH0550472B2 (en) 1993-07-29

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