JPH0368482A - Ultrasonic cleaning device - Google Patents
Ultrasonic cleaning deviceInfo
- Publication number
- JPH0368482A JPH0368482A JP20621289A JP20621289A JPH0368482A JP H0368482 A JPH0368482 A JP H0368482A JP 20621289 A JP20621289 A JP 20621289A JP 20621289 A JP20621289 A JP 20621289A JP H0368482 A JPH0368482 A JP H0368482A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- frequency
- vibrator
- tank
- float
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004506 ultrasonic cleaning Methods 0.000 title claims description 11
- 238000004140 cleaning Methods 0.000 claims abstract description 35
- 239000007788 liquid Substances 0.000 claims description 14
- 235000012431 wafers Nutrition 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体装置の製造工程で用いられる超音波洗浄
装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an ultrasonic cleaning device used in the manufacturing process of semiconductor devices.
従来、半導体装置の製造工程、特にウェハーの洗浄に用
いられる超音波洗浄装置は、単一周波方式または多周波
方式のものが使用されていた。Conventionally, ultrasonic cleaning apparatuses used in the manufacturing process of semiconductor devices, particularly for cleaning wafers, have been of a single frequency type or a multifrequency type.
上述した従来の超音波洗浄装置は、ウェハーの洗浄に使
用する場合、一定の枚数のウェハーを処理するため、単
一周波方式または、多周波方式を使用すれば良いとされ
ていたが、実際の半導体装置の製造過程におけるウェハ
ー洗浄の処理枚数はまちまちであり、洗浄槽を占めるウ
ェハーの容積及び洗浄液の液面は変化しているため、常
に最適な周波数の超音波を使用していることにならず、
洗浄効率が向上しないという欠点がある。When using the above-mentioned conventional ultrasonic cleaning equipment to clean wafers, it was thought that it would be sufficient to use a single frequency method or a multi-frequency method in order to process a fixed number of wafers, but in reality The number of wafers cleaned in the semiconductor device manufacturing process varies, and the volume of wafers occupying the cleaning tank and the level of the cleaning solution change, so it is important to always use ultrasonic waves at the optimal frequency. figure,
There is a drawback that cleaning efficiency is not improved.
このことは第3図に示すように、超音波洗浄装置の振動
子6と洗浄液2の液面の距離が1/4波長の奇数倍の時
に、振動子6から発射された音波の進行波と反射波が同
位相で干渉して定在波が発生し、この時に音圧変化が最
大となって音圧分布10が形成され、洗浄効率も最大に
なるということに基づくものである。As shown in Fig. 3, when the distance between the vibrator 6 of the ultrasonic cleaning device and the surface of the cleaning liquid 2 is an odd multiple of 1/4 wavelength, the traveling wave of the sound wave emitted from the vibrator 6 This is based on the fact that the reflected waves interfere in the same phase to generate a standing wave, and at this time, the change in sound pressure becomes maximum, forming the sound pressure distribution 10, and the cleaning efficiency also becomes maximum.
本発明の超音波洗浄装置は、洗浄槽と該洗浄槽の下部に
固定された振動子とを有する超音波洗浄装置において、
前記洗浄槽内の洗浄液の容積に応じて前記振動子の発生
する超音波の周波数を変化させる手段を設けたものであ
る。An ultrasonic cleaning device of the present invention includes a cleaning tank and a vibrator fixed to a lower part of the cleaning tank.
Means is provided for changing the frequency of the ultrasonic waves generated by the vibrator in accordance with the volume of the cleaning liquid in the cleaning tank.
次に本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は、本発明の第1の実施例の模式断面図である。FIG. 1 is a schematic cross-sectional view of a first embodiment of the present invention.
洗浄槽1に洗浄液2がはいっており、液面の変化を見る
ためにフロート3が浮かしである。フロート3は、可変
抵抗器4と接続しており、フロート3の動きに応じて可
変抵抗器4の抵抗値が変化するようになっている。A cleaning liquid 2 is contained in a cleaning tank 1, and a float 3 is used to float the cleaning liquid 2 in order to observe changes in the liquid level. The float 3 is connected to a variable resistor 4, and the resistance value of the variable resistor 4 changes according to the movement of the float 3.
コンバータ5は定電流供給回路と周波数変換回路等から
構成されており、可変抵抗器4の抵抗値が変化するとこ
の定電流供給回路の電圧は変化する0周波数変換回路は
この電圧変化を周波数変化に変換して振動子6に供給す
る。The converter 5 is composed of a constant current supply circuit, a frequency conversion circuit, etc. When the resistance value of the variable resistor 4 changes, the voltage of this constant current supply circuit changes.The frequency conversion circuit converts this voltage change into a frequency change. It is converted and supplied to the vibrator 6.
このように本第1の実施例によれば、洗浄液2の液面の
高さに応じた最適周波数の超音波を振動子5に発生させ
ることができるので洗浄効率は向上する。As described above, according to the first embodiment, the ultrasonic wave having the optimum frequency depending on the height of the cleaning liquid 2 can be generated in the vibrator 5, so that the cleaning efficiency is improved.
第2図は本発明の第2の実施例の模式断面図である。FIG. 2 is a schematic sectional view of a second embodiment of the invention.
洗浄槽(内槽〉1内の洗浄液2はオーバーフローして外
槽3で貯液されるように構成されている。そしてこの洗
浄液2は、ポンプ4とフィルター5を経て洗浄槽1内に
循環供給される。The cleaning liquid 2 in the cleaning tank (inner tank) 1 overflows and is stored in an outer tank 3.The cleaning liquid 2 is then circulated and supplied into the cleaning tank 1 via a pump 4 and a filter 5. be done.
この第2の実施例では、洗浄液2の液面が常に一定に保
たれるため、一定の周波数の電圧を振動子6に供給する
ことにより、効率の良い超音波洗浄を行なうことができ
る。さらにフィルター5により、洗浄液中の粒子を除去
することにより、被洗浄物への粒子の再付着を低減させ
ることが可能である。In this second embodiment, since the liquid level of the cleaning liquid 2 is always kept constant, efficient ultrasonic cleaning can be performed by supplying a voltage of a constant frequency to the vibrator 6. Furthermore, by removing particles in the cleaning liquid using the filter 5, it is possible to reduce re-adhesion of particles to the object to be cleaned.
以上説明したように本発明は、超音波洗浄装置に洗浄液
の容積に応じて振動子の発生する超音波の周波数を変化
させる手段を設けることにより、効率の良い洗浄を行な
うことができるという効果がある。As explained above, the present invention has the effect that efficient cleaning can be performed by providing an ultrasonic cleaning device with means for changing the frequency of the ultrasonic waves generated by the vibrator according to the volume of the cleaning liquid. be.
第1図及び第2図は本発明の第1及び第2の実施例の模
式断面図、第3図は従来の超音波洗浄装置の模式断面図
である。
l・・・洗浄槽、2・・・洗浄液、3・・・フロート、
4・・・可変抵抗器、5・・・コンバーター 6・・・
振動子、7・・・ポンプ、8・・・フィルター 9・・
・外槽、10・・・音圧分布。
1:罠〉↑糟
2:ン著□ンコ;3珂貰二
3 : フロート
4:可を亀花罷
5:フンl\′−クー
ロ : ゴ不ご芽刀手1 and 2 are schematic sectional views of first and second embodiments of the present invention, and FIG. 3 is a schematic sectional view of a conventional ultrasonic cleaning device. l...Cleaning tank, 2...Cleaning liquid, 3...Float,
4... Variable resistor, 5... Converter 6...
Vibrator, 7...Pump, 8...Filter 9...
・Outer tank, 10...Sound pressure distribution. 1: Trap〉↑糟2: Written by N□Nko;3Kenji 3: Float 4: Kawo Kamehana 5: Hunl\'-Curo: Gofugome Sword Hand
Claims (1)
超音波洗浄装置において、前記洗浄槽内の洗浄液の容積
に応じて前記振動子の発生する超音波の周波数を変化さ
せる手段を設けたことを特徴とする超音波洗浄装置。In an ultrasonic cleaning device having a cleaning tank and a vibrator fixed to a lower part of the cleaning tank, means is provided for changing the frequency of the ultrasonic waves generated by the vibrator according to the volume of cleaning liquid in the cleaning tank. An ultrasonic cleaning device characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20621289A JPH0368482A (en) | 1989-08-08 | 1989-08-08 | Ultrasonic cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20621289A JPH0368482A (en) | 1989-08-08 | 1989-08-08 | Ultrasonic cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0368482A true JPH0368482A (en) | 1991-03-25 |
Family
ID=16519626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20621289A Pending JPH0368482A (en) | 1989-08-08 | 1989-08-08 | Ultrasonic cleaning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0368482A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018040044A1 (en) * | 2016-08-31 | 2018-03-08 | 平江县威派云母绝缘材料有限公司 | Mica sheet screening and cleaning device used in mica paper production process |
CN108339803A (en) * | 2018-02-06 | 2018-07-31 | 深圳市佳源达科技有限公司 | Ultrasonic cleaning equipment |
-
1989
- 1989-08-08 JP JP20621289A patent/JPH0368482A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2018040044A1 (en) * | 2016-08-31 | 2018-03-08 | 平江县威派云母绝缘材料有限公司 | Mica sheet screening and cleaning device used in mica paper production process |
GB2568330A (en) * | 2016-08-31 | 2019-05-15 | Pingjiang Vpi Mica Insulating Mat Co Ltd | Mica sheet screening and cleaning device used in mica paper production process |
GB2568330B (en) * | 2016-08-31 | 2021-11-24 | Pingjiang Vpi Mica Insulating Mat Co Ltd | Mica sheet screening and cleaning device used in mica paper production process |
CN108339803A (en) * | 2018-02-06 | 2018-07-31 | 深圳市佳源达科技有限公司 | Ultrasonic cleaning equipment |
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