JPH036568A - Photosensitive body coating device - Google Patents
Photosensitive body coating deviceInfo
- Publication number
- JPH036568A JPH036568A JP14199189A JP14199189A JPH036568A JP H036568 A JPH036568 A JP H036568A JP 14199189 A JP14199189 A JP 14199189A JP 14199189 A JP14199189 A JP 14199189A JP H036568 A JPH036568 A JP H036568A
- Authority
- JP
- Japan
- Prior art keywords
- coating
- stirring
- photoreceptor
- lid
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 73
- 239000011248 coating agent Substances 0.000 title claims abstract description 66
- 238000003756 stirring Methods 0.000 claims abstract description 43
- 108091008695 photoreceptors Proteins 0.000 claims description 42
- 239000000758 substrate Substances 0.000 claims description 25
- 239000007788 liquid Substances 0.000 abstract description 31
- 238000004062 sedimentation Methods 0.000 abstract description 6
- 239000000049 pigment Substances 0.000 abstract description 4
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 18
- 238000010586 diagram Methods 0.000 description 6
- 238000004220 aggregation Methods 0.000 description 5
- 230000002776 aggregation Effects 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
fal産業上の利用分野
この発明は電子写真複写機等に使用される感光体を製造
する装置に関し、特に感光体基体の表面に感光層を形成
させる感光体塗布装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to an apparatus for manufacturing photoreceptors used in electrophotographic copying machines and the like, and more particularly to a photoreceptor coating apparatus for forming a photoreceptor layer on the surface of a photoreceptor substrate. .
中)従来の技術
電子写真複写機等に使用される感光体は導電性の基体(
感光体基体)表面に感光jtl(電荷発生層、電荷輸送
層等)を形成させたものであり、その中でも前記感光層
が有機材料からなる有機感光体、無機材料からなる無機
感光体がある。前記有機感光体においては感光材料から
なる塗布液を満たした塗工槽中に感光体基体を浸漬する
ことによって感光体基体表面に感光層を形成する。例え
ば、感光体基体を塗布液中に通過させたり、漬は込み引
き上げを行うことによって感光体基体表面に感光層を形
成させることができる。(middle) Conventional technology Photoreceptors used in electrophotographic copying machines, etc. are conductive substrates (
A photoreceptor (substrate) has a photoreceptor (a charge generation layer, a charge transport layer, etc.) formed on its surface, and among these, there are organic photoreceptors in which the photoreceptor layer is made of an organic material, and inorganic photoreceptors in which the photoreceptor layer is made of an inorganic material. In the organic photoreceptor, a photosensitive layer is formed on the surface of the photoreceptor substrate by immersing the photoreceptor substrate in a coating tank filled with a coating liquid made of a photosensitive material. For example, a photosensitive layer can be formed on the surface of a photoreceptor substrate by passing the photoreceptor substrate through a coating liquid or by dipping and pulling up the photoreceptor substrate.
(C1発明が解決しようとする課題
ところで、感光体基体表面に形成する感光層の厚みは非
常に薄いものであり、例えば電荷発生層においては2μ
m以下(乾燥後)である。したがって塗布液は僅かづつ
しか消費されず、塗工槽中で塗布液が滞って顔料の2次
凝集、沈降などが発生することがあった。これらの凝集
物、沈降物が感光体基体表面に付着すると塗工欠陥とな
り、また2次凝集、沈降によって塗布液の濃度が変わっ
てしまうと形成される感光層の厚みにムラが生じてしま
う。(C1 Problem to be Solved by the Invention By the way, the thickness of the photosensitive layer formed on the surface of the photoreceptor substrate is very thin, for example, the thickness of the charge generation layer is 2μ.
m or less (after drying). Therefore, the coating liquid is consumed little by little, and the coating liquid sometimes stagnates in the coating tank, causing secondary aggregation and sedimentation of the pigment. When these aggregates and sediments adhere to the surface of the photoreceptor substrate, coating defects occur, and when the concentration of the coating solution changes due to secondary aggregation and sedimentation, the thickness of the photosensitive layer formed becomes uneven.
この発明は塗布液を攪拌する攪拌機を備えた感光体塗布
装置を提供するものであり、塗布液の2次凝集、沈降を
防止して感光層にムラのない感光体を製造することを目
的としている。The present invention provides a photoreceptor coating device equipped with a stirrer for stirring a coating solution, and aims to prevent secondary aggregation and sedimentation of the coating solution and to produce a photoreceptor with an even photosensitive layer. There is.
(d)課題を解決するための手段
この発明の感光体塗布装置は、感光体基体を塗布液を満
たした塗工槽中に浸漬することによって前記感光体基体
表面に感光層を形成する装置において、
前記塗布液を攪拌させる攪拌部材を水平面内で複数個備
えるとともに、この攪拌部材を水平面で移動可能に支持
したことを特徴とする。(d) Means for Solving the Problems The photoreceptor coating apparatus of the present invention is an apparatus for forming a photosensitive layer on the surface of a photoreceptor substrate by immersing the photoreceptor substrate in a coating tank filled with a coating liquid. The present invention is characterized in that a plurality of stirring members for stirring the coating liquid are provided in a horizontal plane, and the stirring members are supported movably in the horizontal plane.
(e)作用 第1図はこの発明の詳細な説明する図である。(e) Effect FIG. 1 is a diagram explaining the invention in detail.
図は塗工層の平面を示し、感光体基体は図中垂直方向に
塗布液中を通過する。攪拌部材には例えば攪拌羽根、超
音波振動子などが用いられ、図示するように複数箇所(
4箇所)に設けられてその周囲を攪拌する0通常の攪拌
装置はここまでのものであって、攪拌部材各々の周囲は
攪拌されるが槽全体を見ると濃度ムラなどが生じている
ことが多い。これに対しこの装置ではさらに攪拌部材が
水平面で移動するため(例えば矢印Aで示したような回
転をする。)槽全体においてムラなく攪拌することがで
きる。このように攪拌を行っていれば、顔料の2次凝集
、沈降が生じることがない。The figure shows the plane of the coating layer, and the photoreceptor substrate passes through the coating liquid in the vertical direction in the figure. For example, stirring blades, ultrasonic vibrators, etc. are used as the stirring member, and as shown in the figure, there are multiple locations (
A normal stirring device that is installed at 4 points) and stirs the surrounding area is up to this point, and although the area around each stirring member is stirred, if you look at the entire tank, you may notice uneven concentration. many. On the other hand, in this device, since the stirring member moves in a horizontal plane (for example, rotates as shown by arrow A), it is possible to stir evenly throughout the tank. If stirring is performed in this manner, secondary aggregation and sedimentation of the pigment will not occur.
(f)実施例 第2図は感光体塗布装置の構成例を示した図である。(f) Examples FIG. 2 is a diagram showing an example of the configuration of a photoreceptor coating device.
この装置は円筒状の感光体基体3の表面に感光層を形成
させるものである。塗布液1は円形の塗工槽2に満たさ
れている。塗工槽2の上端部には補給孔2aが形成され
、槽中の液量が少なくなるとここから補給される。塗工
槽2の底面の中心には感光体基体3の径より若干大きめ
の孔部2bが形成され、感光体基体3はこの孔部2bを
下から上へ通過して塗布液が塗布される。なお孔部2b
と感光体基体3との隙間はシール部材4でシールされて
いるので塗布液lが漏れてしまうことはない。This device forms a photosensitive layer on the surface of a cylindrical photoreceptor substrate 3. A circular coating tank 2 is filled with a coating liquid 1. A replenishment hole 2a is formed at the upper end of the coating tank 2, and when the amount of liquid in the tank decreases, it is replenished from there. A hole 2b slightly larger than the diameter of the photoreceptor substrate 3 is formed in the center of the bottom of the coating tank 2, and the photoreceptor substrate 3 passes through this hole 2b from bottom to top to be coated with the coating liquid. . Note that the hole 2b
Since the gap between the photoreceptor substrate 3 and the photoreceptor substrate 3 is sealed with a sealing member 4, the coating liquid l will not leak.
塗工槽2には!5が設けられている。蓋5の中心には、
感光体基体3が下から上へ通過してゆくための孔部5b
が形成されている。l!5には、孔部5bを中心として
4方に攪拌羽根6が回転自在に支持されている。攪拌羽
根6の先端は塗布液1中に入っている。攪拌羽根6は例
えば二股棒状のような気泡を巻き込みにくいものが望ま
しい。攪拌羽根6はモータM2によって回転し、その周
囲を攪拌する。攪拌羽根6は複数箇所、例えば90度ご
とに4箇所程度備えられている。In coating tank 2! 5 is provided. In the center of the lid 5,
Hole 5b through which the photoreceptor base 3 passes from bottom to top
is formed. l! 5, stirring blades 6 are rotatably supported in four directions around the hole 5b. The tip of the stirring blade 6 is placed in the coating liquid 1. It is preferable that the stirring blade 6 is shaped like a bifurcated rod, for example, and is difficult to entrain air bubbles. The stirring blade 6 is rotated by a motor M2 and stirs the surrounding area. The stirring blades 6 are provided at a plurality of locations, for example, about four locations at every 90 degrees.
15の周面にはギアが切られ、その横にギア7が配置さ
れている。ギア7はモータM、によって回転し、その回
転が蓋5に伝達されて蓋5が回転する。塗工槽2と蓋5
との間には図中右上部に拡大して示したように、ローラ
8が設けられている、ローラ8は例えばフッ素樹脂など
の耐溶剤性材料からなり、その軸8aは蓋5の中心から
の放射線と一致する。ローラ8は例えば90度ごとに4
箇所程度設ければよく、これにより蓋5はスムーズに回
転できる。なお、M5をスムーズに回転させるためには
、ベアリングを用いたり、塗工槽2の上面と蓋5の下面
に摩擦係数の小さいフィルムやフッ素樹脂をコーティン
グする方法もある。蓋5が回転すれば蓋に取り付けられ
ている攪拌羽根6も回転し、塗工槽全体の攪拌が行われ
る。A gear is cut on the circumferential surface of 15, and a gear 7 is placed next to it. The gear 7 is rotated by a motor M, and the rotation is transmitted to the lid 5, causing the lid 5 to rotate. Coating tank 2 and lid 5
As shown enlarged in the upper right corner of the figure, a roller 8 is provided between the rollers 8 and 8. The roller 8 is made of a solvent-resistant material such as fluororesin, and its shaft 8a extends from the center of the lid 5. corresponds to the radiation of For example, the roller 8 rotates 4 times every 90 degrees.
It is only necessary to provide the lid 5 at a certain number of places, and the lid 5 can be rotated smoothly. In order to rotate the M5 smoothly, there are methods such as using a bearing or coating the upper surface of the coating tank 2 and the lower surface of the lid 5 with a film or fluororesin having a small coefficient of friction. When the lid 5 rotates, the stirring blade 6 attached to the lid also rotates, and the entire coating tank is stirred.
感光体基体3はスペーサ9,9に支持され、スピンドル
10によって上方に押し上げられる。スピンドル10に
はセンサ11が設けられている。The photoreceptor base 3 is supported by spacers 9, 9 and pushed upward by a spindle 10. A sensor 11 is provided on the spindle 10.
塗工槽2の下部にセンサ12が設けられ、さらにそれよ
り感光体基体のほぼ1本分下側にセンサ13が設けられ
ている。センサ12.13はスピンドルlOに備えられ
たセンサ11と対応し、スピンドル10の位置を検出す
る。A sensor 12 is provided at the bottom of the coating tank 2, and a sensor 13 is further provided approximately one length below the coating tank 2. Sensors 12, 13 correspond to sensors 11 provided on spindle IO and detect the position of spindle 10.
以下、感光層の塗工工程を簡単に説明する。The coating process for the photosensitive layer will be briefly explained below.
前回の塗工処理が終わった時点ではスピンドル10がセ
ンサ12の位置にあってスペーサ9が塗工槽の孔部2b
を塞いでいる。この状態でスペーサ9は図示しない保持
具で保持され、引き続いて感光体基体3が上方に引き出
されるとともにスピンドルlOが下側に下げられる。ス
ピンドル10はセンサ13の位置まで下げられ、上方の
スペーサ9とスピンドル10との間に新たな感光体基体
とスペーサが填め込まれる。そしてスピンドル10が感
光体基体を押し上げて塗工処理を行う。At the end of the previous coating process, the spindle 10 is in the position of the sensor 12, and the spacer 9 is in the hole 2b of the coating tank.
is blocking the In this state, the spacer 9 is held by a holder (not shown), and then the photoreceptor base 3 is pulled upward and the spindle 1O is lowered downward. The spindle 10 is lowered to the position of the sensor 13, and a new photoreceptor substrate and spacer are inserted between the upper spacer 9 and the spindle 10. Then, the spindle 10 pushes up the photoreceptor substrate to perform the coating process.
第3図は同塗布装置の要部ブロック図である。FIG. 3 is a block diagram of the main parts of the coating device.
装置全体はCPU21で制御される。CPU21はスピ
ンドル位置を検出するセンサ12,13や塗工槽内の液
量を検出するセンサ(不図示)等からの信号を受けて、
塗工制御部22.液供給制御部23.モータMl、Mz
等へ動作信号を出力する。塗工制御部22はスピンドル
IOや感光体基体の着脱装置などの塗工工程の装置を制
御し、液供給制御部23は塗工槽2中の塗布液量を調整
する。また、モータM + 、 M zは前述したよう
に塗布液を攪拌するためのモータである。The entire device is controlled by a CPU 21. The CPU 21 receives signals from sensors 12 and 13 that detect the spindle position, a sensor (not shown) that detects the amount of liquid in the coating tank, etc.
Coating control section 22. Liquid supply control section 23. Motor Ml, Mz
Outputs operation signals to etc. The coating control section 22 controls devices for the coating process such as the spindle IO and the photoreceptor substrate attachment/detachment device, and the liquid supply control section 23 adjusts the amount of coating liquid in the coating tank 2 . Further, the motors M + and M z are motors for stirring the coating liquid, as described above.
第4図は攪拌処理に係る処理手順を示したフローチャー
トである。FIG. 4 is a flowchart showing a processing procedure related to stirring processing.
を工処理が終了するとセンサ12がオンする。When the machining process is completed, the sensor 12 is turned on.
するとモータM、;’yx、がオンして塗工槽2内を攪
拌する(nl−n2)。またこの時、塗布液補給の必要
があれば液補給を行う(n3−n4)。n2〜n4にお
いて攪拌、液補給を行っている間にスピンドル10が下
げられてゆく。そしてセンサ13がスピンドル10を検
出すれば液補給、攪拌を停止する(n 5−=n 6−
=n 7)。この後、新たな感光体基体が装着されて塗
工処理が行われるようになる。Then, the motor M;'yx is turned on to stir the inside of the coating tank 2 (nl-n2). At this time, if there is a need to replenish the coating liquid, the liquid is replenished (n3-n4). The spindle 10 is lowered while stirring and liquid replenishment are being performed in steps n2 to n4. When the sensor 13 detects the spindle 10, liquid replenishment and stirring are stopped (n 5-=n 6-
=n7). After this, a new photoreceptor substrate is mounted and coating processing begins.
このようにスピンドル10を下げるとき(塗工処理と塗
工処理との間)に液補給や攪拌を行えば以下のような利
点がある。すなわち液補給によって生じる一時的な濃度
ムラが塗工処理に悪影響を与えるのを防止するとともに
、攪拌によって生じる液面の乱れからも塗工処理への影
響を防止することができる。このようにして塗工処理を
行ったところ円周方向、軸方向の両方において均一な層
厚の感光体を得ることができるとともに、凝集物、沈降
物等による塗工欠陥も生じなかった。また感光層が塗布
された感光体を複写機に装着して像形成を行なったとこ
ろ、横ムラ、白筋等の塗工欠陥に起因する画像欠陥が発
生せず、良好な像を得ることができた。If the liquid is replenished and stirred when the spindle 10 is lowered (between coating processes) in this way, there are the following advantages. That is, it is possible to prevent temporary density unevenness caused by liquid replenishment from adversely affecting the coating process, and also to prevent disturbances in the liquid level caused by stirring from affecting the coating process. When the coating treatment was carried out in this manner, a photoreceptor having a uniform layer thickness in both the circumferential direction and the axial direction could be obtained, and no coating defects due to aggregates, sediments, etc. occurred. Furthermore, when the photoreceptor coated with the photosensitive layer was installed in a copying machine and image formation was performed, no image defects caused by coating defects such as horizontal unevenness or white streaks occurred, and a good image was obtained. did it.
なお攪拌羽根を用いて攪拌を行う場合、攪拌羽根の形状
1回転数等は塗エタクト、塗布液粘度等に基づいて決定
される0例えばこの実施例では塗布液の粘度が7cPで
あって、攪拌羽根に二股棒状のものを用い、その回転数
を1100rp、liの回転数を5〜10rpmとして
いる。これにより30秒程度の攪拌を行えば塗工槽中の
塗布液を十分に攪拌することができる。Note that when stirring is performed using a stirring blade, the shape of the stirring blade and the number of rotations per rotation are determined based on the coating etch rate, the viscosity of the coating liquid, etc. For example, in this example, the viscosity of the coating liquid is 7 cP, and the stirring blade is A bifurcated rod-shaped blade is used, and the rotation speed of the blade is 1100 rpm, and the rotation speed of the li is 5 to 10 rpm. As a result, the coating liquid in the coating tank can be sufficiently stirred by stirring for about 30 seconds.
なお、この実施例では攪拌を行うために攪拌羽根を用い
ているが、超音波振動子、マグネチフクスターラ等を用
いて攪拌を行ってもよい。その場合もそれら自身を自転
させるとともに公転させることによって十分な攪拌を行
うことができる。Note that although a stirring blade is used for stirring in this embodiment, stirring may be performed using an ultrasonic vibrator, a magnetic stirrer, or the like. In that case as well, sufficient stirring can be achieved by rotating and revolving them themselves.
(g)発明の効果
この発明によれば、塗工槽中の塗布液が十分に攪拌され
るので顔料の2次凝集、沈降が生じることがなく感光層
の塗工欠陥1層厚ムラが発生することがない。すなわち
、品質の良い感光体を製造することができる。(g) Effects of the invention According to this invention, the coating liquid in the coating tank is sufficiently stirred, so that secondary aggregation and sedimentation of pigments do not occur, and coating defects in the photosensitive layer occur due to single layer thickness unevenness. There's nothing to do. That is, a photoreceptor of good quality can be manufactured.
第1図はこの発明の詳細な説明する図、第2図は発明の
実施例である感光層塗布装置の構成を示す図、第3図は
同装置の要部ブロック図、第4図は攪拌時の処理手順を
示すフローチャートである1−塗布液、
2−塗工槽、
3−感光体基体、
4−シール部材、
5−M、
6−fi拌羽根、
M、、M!−モータ。Fig. 1 is a diagram explaining the invention in detail, Fig. 2 is a diagram showing the configuration of a photosensitive layer coating device which is an embodiment of the invention, Fig. 3 is a block diagram of the main parts of the same device, and Fig. 4 is a stirring 1-Coating liquid, 2-Coating tank, 3-Photoreceptor substrate, 4-Sealing member, 5-M, 6-Fi stirring blade, M,,M! -Motor.
Claims (1)
ることによって前記感光体基体表面に感光層を形成する
感光体塗布装置において、 前記塗布液を攪拌させる撹拌部材を水平面内で複数個備
えるとともに、この撹拌部材を水平面で移動可能に支持
したことを特徴とする感光体塗布装置。(1) In a photoconductor coating device that forms a photosensitive layer on the surface of the photoconductor substrate by immersing the photoconductor substrate in a coating tank filled with a coating solution, a stirring member for stirring the coating solution is moved in a horizontal plane. A photoreceptor coating device comprising a plurality of agitating members and supporting the agitating member movably on a horizontal plane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14199189A JPH036568A (en) | 1989-06-02 | 1989-06-02 | Photosensitive body coating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14199189A JPH036568A (en) | 1989-06-02 | 1989-06-02 | Photosensitive body coating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH036568A true JPH036568A (en) | 1991-01-14 |
Family
ID=15304854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14199189A Pending JPH036568A (en) | 1989-06-02 | 1989-06-02 | Photosensitive body coating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH036568A (en) |
-
1989
- 1989-06-02 JP JP14199189A patent/JPH036568A/en active Pending
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