JPH0363573U - - Google Patents

Info

Publication number
JPH0363573U
JPH0363573U JP12338189U JP12338189U JPH0363573U JP H0363573 U JPH0363573 U JP H0363573U JP 12338189 U JP12338189 U JP 12338189U JP 12338189 U JP12338189 U JP 12338189U JP H0363573 U JPH0363573 U JP H0363573U
Authority
JP
Japan
Prior art keywords
shutter
reaction chamber
entrance
exit
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12338189U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0627651Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12338189U priority Critical patent/JPH0627651Y2/ja
Publication of JPH0363573U publication Critical patent/JPH0363573U/ja
Application granted granted Critical
Publication of JPH0627651Y2 publication Critical patent/JPH0627651Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP12338189U 1989-10-20 1989-10-20 膜形成用反応装置 Expired - Lifetime JPH0627651Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12338189U JPH0627651Y2 (ja) 1989-10-20 1989-10-20 膜形成用反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12338189U JPH0627651Y2 (ja) 1989-10-20 1989-10-20 膜形成用反応装置

Publications (2)

Publication Number Publication Date
JPH0363573U true JPH0363573U (US06623731-20030923-C00052.png) 1991-06-20
JPH0627651Y2 JPH0627651Y2 (ja) 1994-07-27

Family

ID=31671362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12338189U Expired - Lifetime JPH0627651Y2 (ja) 1989-10-20 1989-10-20 膜形成用反応装置

Country Status (1)

Country Link
JP (1) JPH0627651Y2 (US06623731-20030923-C00052.png)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013539209A (ja) * 2010-08-02 2013-10-17 ビーコ・インストゥルメンツ・インコーポレイテッド Ｃｖｄ反応器用の排気システム
US9388493B2 (en) 2013-01-08 2016-07-12 Veeco Instruments Inc. Self-cleaning shutter for CVD reactor
US9938621B2 (en) 2010-12-30 2018-04-10 Veeco Instruments Inc. Methods of wafer processing with carrier extension

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013539209A (ja) * 2010-08-02 2013-10-17 ビーコ・インストゥルメンツ・インコーポレイテッド Ｃｖｄ反応器用の排気システム
US9938621B2 (en) 2010-12-30 2018-04-10 Veeco Instruments Inc. Methods of wafer processing with carrier extension
US10167554B2 (en) 2010-12-30 2019-01-01 Veeco Instruments Inc. Wafer processing with carrier extension
US9388493B2 (en) 2013-01-08 2016-07-12 Veeco Instruments Inc. Self-cleaning shutter for CVD reactor

Also Published As

Publication number Publication date
JPH0627651Y2 (ja) 1994-07-27

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