JPH0359493B2 - - Google Patents

Info

Publication number
JPH0359493B2
JPH0359493B2 JP60238927A JP23892785A JPH0359493B2 JP H0359493 B2 JPH0359493 B2 JP H0359493B2 JP 60238927 A JP60238927 A JP 60238927A JP 23892785 A JP23892785 A JP 23892785A JP H0359493 B2 JPH0359493 B2 JP H0359493B2
Authority
JP
Japan
Prior art keywords
recording
substrate
guide portion
guide
surface roughness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60238927A
Other languages
Japanese (ja)
Other versions
JPS6299930A (en
Inventor
Yasushi Myazono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60238927A priority Critical patent/JPS6299930A/en
Publication of JPS6299930A publication Critical patent/JPS6299930A/en
Publication of JPH0359493B2 publication Critical patent/JPH0359493B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、光学的に情報の記録、再生または消
去が可能な光情報記録媒体に関するものであり、
特に情報の記録、再生または消去を行う光のトラ
ツキングを容易にするためのガイド部を有する光
情報記録媒体に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an optical information recording medium on which information can be optically recorded, reproduced, or erased.
In particular, the present invention relates to an optical information recording medium having a guide portion for facilitating the tracking of light for recording, reproducing, or erasing information.

〔従来の技術〕[Conventional technology]

従来、この種の光情報記録媒体としては、例え
ば第5図に示すようなサンドイツチ構造の光情報
記録媒体があつた。なお、第5図aは断面図、同
図bは記録層を被着した部分の部分拡大断面図で
ある。
Conventionally, as this type of optical information recording medium, there has been an optical information recording medium having a Sanderch structure as shown in FIG. 5, for example. Note that FIG. 5a is a sectional view, and FIG. 5b is a partially enlarged sectional view of a portion covered with a recording layer.

この媒体は、記録層1,2を一主表面に被着し
た透光性基板3,4と、この透光性基板3,4を
所望する間隔に配設するリング状の内側スペーサ
5及び外側スペーサ6と、この内側スペーサ5及
び外側スペーサ6を透光性基板1,2にそれぞれ
固着する接着剤7とからなり、記録層1と記録層
2とが相対向しているサンドイツチ構造を基本構
造にしているものである。さらに、第5図bに示
すように、記録層1を被着した透光性基板3の表
面には凹凸部が設けられ(なお、透光性基板4も
同様であることから説明を省略する。)、その凸部
が情報を記録する記録層1を被着した記録部8
を、凹部がガイド部9をそれぞれ形成している。
そして、このの記録部8とガイド部9とは、同心
円状に交互に複数配設されている。このガイド部
9の深さは、図の矢印10で示す方向、すなわち
透光性基板3側からレーザ光を照射したとき、記
録部8の上面からの反射光の強度とガイド部9の
底面からの反射光の強度が、それぞれの照射光と
の干渉作用により、著しく異なるように設定され
ている(例えば、レーザ光の波長が830nmのとき
約800Åである。)。したがつて、従来の媒体は、
その照射する光の光路差から生ずる干渉作用によ
つて、記録部8からの反射光強度とガイド部9か
らの反射光強度との差を設けることにより、記録
部8とガイド部9とを識別した。
This medium consists of transparent substrates 3 and 4 having recording layers 1 and 2 adhered to one main surface, a ring-shaped inner spacer 5 that arranges the transparent substrates 3 and 4 at a desired distance, and an outer spacer. The basic structure is a sandwich structure consisting of a spacer 6 and an adhesive 7 that fixes the inner spacer 5 and the outer spacer 6 to the transparent substrates 1 and 2, respectively, and in which the recording layer 1 and the recording layer 2 face each other. This is what we do. Furthermore, as shown in FIG. 5b, the surface of the light-transmitting substrate 3 on which the recording layer 1 is attached is provided with uneven parts (note that the light-transmitting substrate 4 is also similar, so the description thereof will be omitted). ), a recording portion 8 whose convex portion is covered with a recording layer 1 for recording information.
The concave portions form guide portions 9, respectively.
A plurality of recording sections 8 and guide sections 9 are arranged concentrically and alternately. The depth of the guide section 9 is determined by the intensity of the reflected light from the top surface of the recording section 8 and the depth from the bottom surface of the guide section 9 when the laser beam is irradiated from the direction indicated by the arrow 10 in the figure, that is, from the side of the transparent substrate 3. The intensity of the reflected light is set to be significantly different due to interference with each irradiation light (for example, when the wavelength of the laser light is 830 nm, it is about 800 Å). Therefore, traditional media
The recording section 8 and the guide section 9 can be identified by creating a difference between the intensity of the reflected light from the recording section 8 and the intensity of the reflected light from the guide section 9 due to the interference effect caused by the optical path difference of the irradiated light. did.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、従来の光情報記録媒体は、前述
したように記録部8とガイド部9とを凹凸の関係
にして反射光強度に差を設けて識別していること
から、その差を大きくするため、例えば、反射光
強度比(反射光強度の大きい方を基準にしたとき
の比)を0.8以下にしようとすると、その深さを
λ/(8n)(但し、λは照射光の延長、nは基板
の屈折率である。)近傍の値とし、その精度を±
5%と高める必要があり、この範囲に凹部を形成
することは、非常に困難であつた。
However, as described above, in conventional optical information recording media, the recording section 8 and the guide section 9 are arranged in a concave-convex relationship for identification by providing a difference in reflected light intensity. For example, if you want the reflected light intensity ratio (ratio based on the larger reflected light intensity) to be 0.8 or less, the depth is λ/(8n) (where λ is the extension of the irradiated light and n is ) is the refractive index of the substrate), and its accuracy is ±
5%, and it was extremely difficult to form recesses in this range.

本発明は、この欠点を除去するためになされた
もので、その目的は、ガイド部と記録部とを凹凸
の関係にしなくても識別ができるようにした光情
報記録媒体を提供することである。
The present invention has been made to eliminate this drawback, and its purpose is to provide an optical information recording medium that can be identified without having an uneven relationship between the guide part and the recording part. .

〔問題点を解決するための手段〕[Means for solving problems]

前述した目的を達成するために、本発明の光情
報記録媒体は、基板と、前記基板上に形成される
と共に、前記基板よりドライエツチング耐性が小
さい薄膜と、前記薄膜上に形成された記録層とを
備え、前記薄膜における、同一平面内に位置する
表面をガイド部と記録部とに区分し、更に前記ガ
イド部及び前記記録部の少なくとも一方を粗面に
すると共に、前記ガイド部の表面粗さと前記記録
部の表面粗さとを異ならせ、前記記録部上に前記
記録層を被着したことを特徴とする。又、好まし
い態様としては、前述した特徴を有する光情報記
録媒体において、ガイド部の表面粗さが記録部の
表面粗さより粗いことを特徴とする。尚、本発明
の基板は、ガラス基板あるいはアルミニウム基板
のように単体から成るものはもとより、これらの
単体の基板上に、前記薄膜の付着性を向上させる
中間層を設けたものも含む。
In order to achieve the above-mentioned object, the optical information recording medium of the present invention comprises a substrate, a thin film formed on the substrate and having a lower dry etching resistance than the substrate, and a recording layer formed on the thin film. The surface of the thin film located in the same plane is divided into a guide part and a recording part, and at least one of the guide part and the recording part is made rough, and the surface of the guide part is roughened. and the surface roughness of the recording section is made different, and the recording layer is deposited on the recording section. Moreover, as a preferable embodiment, in the optical information recording medium having the above-mentioned characteristics, the surface roughness of the guide portion is rougher than the surface roughness of the recording portion. Note that the substrate of the present invention includes not only single substrates such as glass substrates or aluminum substrates, but also those in which an intermediate layer for improving the adhesion of the thin film is provided on these single substrates.

〔作 用〕[Effect]

本発明の光情報記録媒体は、基板よりドライエ
ツチング耐性が小さい薄膜における、同一平面内
に位置する表面をガイド部と記録部との区分して
いることから、前記薄膜のガイド部及び記録部の
少なくとも一方の表面を、容易且つ均一に所定の
表面粗さとなるように粗面にすることができる。
又、ガイド部の表面を記録部の表面よりも粗く、
又は記録部の表面をガイド部の表面よりも粗くし
たことから、記録部表面とガイド部表面からの反
射光強度を異ならせることができる。
In the optical information recording medium of the present invention, the surfaces of the thin film having lower dry etching resistance than the substrate are divided into the guide portion and the recording portion, which are located in the same plane. At least one surface can be easily and uniformly roughened to a predetermined surface roughness.
In addition, the surface of the guide section is made rougher than the surface of the recording section,
Alternatively, since the surface of the recording section is made rougher than the surface of the guide section, the intensity of reflected light from the surface of the recording section and the surface of the guide section can be made different.

〔実施例〕〔Example〕

本発明の光情報記録媒体の一実施例を第1図及
び第2図に基づき詳細に説明する。なお、本例の
光情報記録媒体の基本構造は前述した第5図aに
示したものと同様であるのでその説明は省略し、
従来の媒体と異なる基板の形状について詳述す
る。また、第1図は、従来の記録層1を被着した
透光性基板3に対応する、記録層16を被着した
記録層支持基台11を示す部分拡大断面図であ
り、第2図はその記録層支持基台11にガイド部
と記録部とを形成する工程を示す部分拡大断面図
である。
An embodiment of the optical information recording medium of the present invention will be described in detail with reference to FIGS. 1 and 2. The basic structure of the optical information recording medium of this example is the same as that shown in FIG. 5a above, so the explanation thereof will be omitted.
The shape of the substrate, which is different from conventional media, will be explained in detail. Further, FIG. 1 is a partially enlarged sectional view showing a recording layer support base 11 having a recording layer 16 deposited thereon, which corresponds to a conventional light-transmitting substrate 3 having a recording layer 1 deposited thereon, and FIG. 1 is a partially enlarged sectional view showing a process of forming a guide portion and a recording portion on the recording layer support base 11. FIG.

先ず、本例の記録層支持基台11は、第1図に
示すように、外径130mm、内径15mm、厚さ1.2mmの
中心に貫通孔を有する円板状のガラス基板12
(例えば、ソーダライムガラス)と、このガラス
基板12上に被着した酸化シリコン膜13(膜
厚:1000Å)とからなる。そして、この酸化シリ
コン膜13は、図示するように同一平面内に位置
する表面を備えている。尚、本発明の基板は本実
施例においてはガラス基板12に相当し、このガ
ラス基板12よりエツチング耐性が小さな薄膜と
は酸化シリコン膜13に相当する。この透光性基
板11の酸化シリコン膜13の表面には、その一
部を粗面(表面最大粗さ:300Å,その粗面の凹
と凹又は凸と凸との平均間隔:2000Å)として形
成されたガイド部14と、このガイド部14と比
して表面最大粗さが小さい表面(表面最大粗さ:
20Å)として形成された記録部15とを備えてい
る。そして、記録部15上には、追記型記録材料
であるTeからなる記録部16(膜厚:200Å)が
被着され、ガイド部14にもTe膜17が被着し
ている。また、ガイド部14の巾は1μmであり、
記録部15の巾は2μmであり、それぞれ同心円
状に交互に複数形成されている。
First, as shown in FIG. 1, the recording layer support base 11 of this example includes a disk-shaped glass substrate 12 having an outer diameter of 130 mm, an inner diameter of 15 mm, and a thickness of 1.2 mm and having a through hole in the center.
(for example, soda lime glass) and a silicon oxide film 13 (film thickness: 1000 Å) deposited on this glass substrate 12. This silicon oxide film 13 has surfaces located in the same plane as shown in the figure. The substrate of the present invention corresponds to the glass substrate 12 in this embodiment, and the thin film having lower etching resistance than the glass substrate 12 corresponds to the silicon oxide film 13. A part of the surface of the silicon oxide film 13 of the light-transmitting substrate 11 is formed as a rough surface (maximum surface roughness: 300 Å, average distance between concave and concave or convex and convex portions of the rough surface: 2000 Å). A surface with a smaller maximum surface roughness than that of the guide portion 14 (maximum surface roughness:
20 Å). A recording portion 16 (thickness: 200 Å) made of Te, which is a write-once recording material, is deposited on the recording portion 15, and a Te film 17 is also deposited on the guide portion 14. Further, the width of the guide portion 14 is 1 μm,
The width of the recording portions 15 is 2 μm, and a plurality of recording portions 15 are formed alternately in concentric circles.

次に、本例の記録層支持基台11にガイド部1
4と記録部15を形成する工程を第2図に基づき
説明する。
Next, the guide section 1 is attached to the recording layer support base 11 of this example.
4 and the recording section 15 will be explained based on FIG.

先ず、主表面を精密研摩したガラス基板12
(表面最大粗さ:20Å)上に電子ビーム蒸着法に
より酸化シリコン膜13を被着して記録層支持基
台11を製作し、次に、この酸化シリコン膜13
上にフオトレジスト膜18(例えばヘキスト社製
のポジ型レジストであるAZ−1350を希釈したも
のであり、その膜厚は1000Åである。)を塗布し、
次にこのフオトレジスト膜18をプレベークし
(温度90℃、時間30分)、次にガイド部14となる
位置に、Arレーザ19を用いてフオトレジスト
膜18を露光する(同図a)。次に、フオトレジ
スト膜18をAZデイベロツパ(ヘキスト社製)
により現像し、ポストベークし(温度100℃、時
間30分)、フオトレジストパターン20を形成し
た(同図b)。次に、このフオトレジストパター
ン20をマスクとして、酸化シリコン膜13を
CF4ガスでドライエツチングし、酸化シリコン膜
13の表面にガイド部14を形成した(同図c)。
なお、このエツチング条件は、ガス流量30スタ
ンダード センチメータ キユービツク パー
ミニツツ(SCCM)、全圧0.3Torr、高周波電力密
度0.3W/cm2である。このエツチング条件で、ガ
ラス基板12にドライエツチングを施したとして
も、ガラス基板12表面を粗面にすることはもと
より、損傷すら受けない。つまり、本実施例にお
いては、ガラス基板12上に、ガラス基板12よ
りエツチング耐性の小さい酸化シリコン膜13を
設けていることから、ガイド部14を容易に粗面
にすることができる。酸素ガスによつて、フオト
レジストパターン20を除去し、記録部15を露
出させる(同図d)。次に、真空蒸着法により、
酸化シリコン膜13上にTeを被着し、記録層1
6を記録部15上に積層する(同図e)。このと
きには、ガイド部14にもTe膜17が被着され
る。
First, a glass substrate 12 whose main surface is precisely polished is
(Surface maximum roughness: 20 Å) A silicon oxide film 13 is deposited thereon by electron beam evaporation to produce the recording layer support base 11. Next, this silicon oxide film 13
A photoresist film 18 (for example, a diluted version of AZ-1350, a positive resist manufactured by Hoechst Co., Ltd., and its film thickness is 1000 Å) is applied on top, and
Next, this photoresist film 18 is prebaked (temperature: 90° C., time: 30 minutes), and then the photoresist film 18 is exposed to light using an Ar laser 19 at a position that will become the guide portion 14 (FIG. 3(a)). Next, the photoresist film 18 was coated with an AZ developer (manufactured by Hoechst).
The photoresist pattern 20 was formed by developing and post-baking (temperature: 100° C., time: 30 minutes) (FIG. 2(b)). Next, using this photoresist pattern 20 as a mask, a silicon oxide film 13 is deposited.
Dry etching was performed using CF 4 gas to form a guide portion 14 on the surface of the silicon oxide film 13 (FIG. 3(c)).
Note that this etching condition is based on a gas flow rate of 30 standard cm
Minitsutsu (SCCM), total pressure 0.3Torr, high frequency power density 0.3W/ cm2 . Even if dry etching is performed on the glass substrate 12 under these etching conditions, the surface of the glass substrate 12 will not only be roughened but also not damaged. That is, in this embodiment, since the silicon oxide film 13 having lower etching resistance than the glass substrate 12 is provided on the glass substrate 12, the guide portion 14 can be easily roughened. The photoresist pattern 20 is removed using oxygen gas to expose the recording section 15 (d in the same figure). Next, by vacuum evaporation method,
Te is deposited on the silicon oxide film 13 to form the recording layer 1.
6 is stacked on the recording section 15 (e in the figure). At this time, the Te film 17 is also deposited on the guide portion 14.

以上のようにして形成されたガイド部14と記
録部15との反射率をガラス基板12側から照射
したレーザ光(波長は830nmであり、第5図bに
示す矢印方向と同方向から照射する。)について
測定すると、ガイド部14の反射率は約25%であ
り、一方記録部15の反射率は約40%であるか
ら、反射光強度比は約0.6となり、十分にガイド
部14と記録部15とを識別することができた。
ここで、反射率とガイド部14の表面粗さとの関
係を調べると第3図の曲線Aとなる。すなわち、
記録部15(表面粗さ:20Å)の反射率40%に対
して反射光強度比が0.8以下となるのは、150Å以
上の表面粗さのときであり、またガラス基板12
そのものの反射率5%程度となつて、ガラス基板
12からの反射と識別ができなくなる1000Åまで
の範囲の粗さであれば、十分に識別できる。すな
わち、表面粗さの下限は、記録部の表面粗さによ
つて反射光強度比が変化することから一定ではな
いが、上限の1000Åは、基板12がガラスであれ
ばほぼ一定である。また、ガイド部14の凹と凹
又は凸と凸との間、すなわち表面粗さの平均間隔
と反射率との関係は第4図の曲線Bに示すとおり
であり、5000Å以下であれば反射光強度比は0.8
以下となる。本実施例においては、粗面にする層
を、酸化シリコン膜のような、ガラス基板よりド
ライエツチング耐性の小さな薄膜としているの
で、上述したような所定の範囲内の表面粗さに容
易且つ均一にすることができる。
The reflectance of the guide portion 14 and recording portion 15 formed as described above is measured by laser light (wavelength is 830 nm, irradiated from the same direction as the arrow shown in FIG. 5b) from the glass substrate 12 side. ), the reflectance of the guide section 14 is about 25%, while the reflectance of the recording section 15 is about 40%, so the reflected light intensity ratio is about 0.6, which is sufficient for the guide section 14 and the recording section. part 15 could be identified.
Here, when the relationship between the reflectance and the surface roughness of the guide portion 14 is examined, it becomes curve A in FIG. 3. That is,
The reflected light intensity ratio is 0.8 or less with respect to the reflectance of 40% of the recording part 15 (surface roughness: 20 Å) when the surface roughness is 150 Å or more.
As long as the roughness is within the range of 1000 Å, at which the reflectance of the material is about 5% and the reflection from the glass substrate 12 becomes indistinguishable, it can be sufficiently identified. That is, the lower limit of the surface roughness is not constant because the reflected light intensity ratio changes depending on the surface roughness of the recording section, but the upper limit of 1000 Å is approximately constant if the substrate 12 is made of glass. Furthermore, the relationship between the concavity and concavity or convexity and convexity of the guide part 14, that is, the relationship between the average spacing of the surface roughness and the reflectance, is as shown in curve B in Figure 4, and if it is 5000 Å or less, the reflected light The intensity ratio is 0.8
The following is true. In this example, the layer to be roughened is a thin film such as a silicon oxide film, which has lower dry etching resistance than the glass substrate, so that the surface roughness can be easily and uniformly within the predetermined range described above. can do.

以上、本発明は、前記実施例に限らず、次のよ
うなものであつてもよい。
As described above, the present invention is not limited to the above-mentioned embodiments, but may be as follows.

先ず、前記実施例では、ガイド部を記録部と比
して表面粗さを粗くしたが、逆であつても識別す
ることができる。しかし、記録部の方をより粗面
にする場合、その反射率と記録部の表面粗さの記
録感度への影響とを考慮する必要が生じ、その両
者の兼ね合いにより表面粗さを決定しなければな
らなくなる。したがつて、望ましくは表面粗さか
ら生じる反射率と記録感度の両者を分離して取り
扱うことが可能なガイド部を記録部よりも粗面と
して用いる方がよい。さらに、ガラス基板と、ガ
イド部及び記録部を形成する薄膜との間に、その
薄膜の付着力を向上させるための中間層(例えば
周期律表の族、族、族の元素、化合物又は
これらの酸化物、窒化物等)を介在せしめて基板
としてもよい。また、これら薄膜、中間層の厚さ
は特に限定されるものではない。したがつて、ガ
イド部又は記録部の粗面が、例えば前記実施例の
ようにガラス基板に薄膜を被着したもののとき、
薄膜とガラス基板の両方にわたつてもよい。さら
に、基板よりドライエツチング耐性の小さい薄膜
としては、周期律表の族,族,族の元素、
化合物又はこれらの酸化物、窒化物等でもよい。
First, in the embodiment described above, the surface roughness of the guide portion is made rougher than that of the recording portion, but it is possible to identify the guide portion even if the surface roughness is reversed. However, if the surface of the recording area is made rougher, it becomes necessary to consider the reflectance and the influence of the surface roughness of the recording area on the recording sensitivity, and the surface roughness must be determined based on the balance between the two. It will stop happening. Therefore, it is preferable to use a guide section with a rough surface rather than a recording section, which can desirably handle both reflectance and recording sensitivity caused by surface roughness separately. Further, between the glass substrate and the thin film forming the guide section and the recording section, an intermediate layer (for example, an element, a compound, or a compound of a group, group, or group of the periodic table) is provided to improve the adhesion of the thin film. The substrate may be formed by interposing a material (oxide, nitride, etc.). Furthermore, the thicknesses of these thin films and intermediate layers are not particularly limited. Therefore, when the rough surface of the guide part or the recording part is formed by coating a glass substrate with a thin film, for example, as in the above embodiment,
It may be applied to both thin films and glass substrates. Furthermore, thin films with lower dry etching resistance than the substrate include elements of groups, groups, groups of the periodic table,
It may be a compound or an oxide or nitride thereof.

また、前記実施例では、ガラス基板としてソー
ダライムガラスを用いたが、他のガラス、例えば
石英ガラスやアルミノシリケートガラス、アルミ
ノボロシリケートガラス当の多成分ガラスまたは
セラミツクを用いてもよく、またイオン交換処理
を施したガラスであつてもよい。また、光情報記
録媒体の基本構造は、サンドイツチ構造に限定さ
れず、記録材料、記録方法等により適宜決定する
ことができる。また、光情報記録媒体の基本構造
がサンドイツチ構造ではなく、一枚の基板上に記
録層を被着し、この記録層に透光性の保護膜又は
ガラス等からなる透光性の封止材を被着し、この
保護膜側から情報を記録、再生または消去をする
光を照射するときは、基板はアルミニウム等の透
光性でない材質であつてもよい。
Further, in the above embodiments, soda lime glass was used as the glass substrate, but other glasses such as multi-component glasses such as quartz glass, aluminosilicate glass, aluminoborosilicate glass, or ceramics may also be used. It may also be treated glass. Furthermore, the basic structure of the optical information recording medium is not limited to the Sandermanch structure, and can be appropriately determined depending on the recording material, recording method, etc. In addition, the basic structure of the optical information recording medium is not a sandwich structure, but a recording layer is deposited on a single substrate, and this recording layer is coated with a transparent protective film or a transparent sealing material made of glass or the like. When applying light for recording, reproducing, or erasing information from the protective film side, the substrate may be made of a non-transparent material such as aluminum.

また、前記実施例では、平滑な酸化シリコン膜
を粗面にしてガイド部を形成したが、逆に粗面を
平滑な面にして記録部を形成してもよい。すなわ
ち例えば、前記実施例の基板のときは、酸化シリ
コン膜を先ず300Åの表面粗さを有する粗面にし、
次にその表面にポジ型のフオトレジスト膜を塗布
し、次に記録部となるところをArレーザでフオ
トレジスト膜を露光し、現像する。次に、露出さ
れた粗面を、CF4ガスを用い、ガス流量
30SCCM、全圧0.2Torr、高周波電力密度0.2W/
cm2の条件でエツチングして平滑な表面の記録部を
形成する。そしてフオトレジスト膜を除去して前
記実施例と同様の基板を製作する。
Further, in the above embodiment, the guide portion is formed by using a smooth silicon oxide film as a rough surface, but conversely, the recording portion may be formed by using a smooth surface as a rough surface. For example, in the case of the substrate of the above embodiment, the silicon oxide film is first roughened to have a surface roughness of 300 Å,
Next, a positive type photoresist film is applied to the surface, and then the photoresist film is exposed to light using an Ar laser in the area that will become the recording area, and then developed. Next, the exposed rough surface was treated with CF4 gas at a gas flow rate.
30SCCM, total pressure 0.2Torr, high frequency power density 0.2W/
Etch under cm 2 conditions to form a recording part with a smooth surface. Then, the photoresist film is removed to produce a substrate similar to that of the previous embodiment.

また、前記実施例では、ガイド部にも記録部と
同様の膜が被着している。しかし、ガイド部には
必ずしも記録層と同様の膜を被着させる必要もな
く、他の材料のものでもよく、また膜を被着させ
なくてもよい。
Furthermore, in the embodiment described above, the same film as that on the recording section is also coated on the guide section. However, the guide portion does not necessarily need to be coated with a film similar to the recording layer, and may be made of other materials, or may not be coated with a film.

また、前記実施例では、記録層として追記型記
録材料であるTeを用いたが、他の材質、例えば、
Se,GeTe<TeC等や、書換型記録材料である
TbFe,GdTbFeであつてもよく、さらに光吸収
材を添加した有機物等であつてもよい。また、記
録層は複層であつてもよい。さらに、前記実施例
では同心円状のガイド部(プレグループ)であつ
たが、螺施状のプレグループやトラツク番号、セ
クター及びセクター番号等のガイド部に対しても
同様の効果がある。
Further, in the above embodiment, Te, which is a write-once recording material, was used as the recording layer, but other materials, such as
Se, GeTe<TeC, etc., and rewritable recording materials.
It may be TbFe, GdTbFe, or it may be an organic material to which a light absorbing material is added. Further, the recording layer may be multilayer. Further, although the above embodiment uses a concentric guide portion (pregroup), the same effect can be obtained with a spiral pregroup, a track number, a sector, a sector number, and other guide portions.

〔発明の効果〕〔Effect of the invention〕

以上のとおり、本発明の光情報記録媒体によれ
ば、基板よりドライエツチング耐性の小さな薄膜
におけるガイド部及び記録部の少なくとも一方の
表面を粗面にし、かつ、ガイド部の表面粗さと記
録部の表面粗さとを異ならせていることから、ガ
イド部と記録部とを、それらの反射光強度の相違
によつて、識別することができる。しかも、粗面
の形成に際して、粗面を基板よりドライエツチン
グ耐性の小さな薄膜に形成しているので、所定の
表面粗さの粗面を容易且つ均一に形成することが
できる。
As described above, according to the optical information recording medium of the present invention, the surface of at least one of the guide section and the recording section in the thin film having lower dry etching resistance than the substrate is roughened, and the surface roughness of the guide section and the recording section are made rough. Since the surface roughness is different, the guide part and the recording part can be identified by the difference in the intensity of reflected light. Moreover, since the rough surface is formed as a thin film having lower dry etching resistance than the substrate, the rough surface with a predetermined surface roughness can be easily and uniformly formed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の光情報記録媒体の一実施例を
示す部分拡大断面図、第2図は本発明の一実施例
の製造工程を示す部分拡大断面図、第3図はガイ
ド部の表面粗さと反射率との関係を示す特性図及
び第4図はガイド部の表面粗さの平均間隔と反射
率との関係を示す特性図である。第5図は従来の
光情報記録媒体を示す図であり、同図aは断面
図、同図bは部分拡大断面図である。 11……記録層支持基台、12……ガラス基
板、13……酸化シリコン膜、14……ガイド
部、15……記録部、16……記録層。
FIG. 1 is a partially enlarged cross-sectional view showing an embodiment of the optical information recording medium of the present invention, FIG. 2 is a partially enlarged cross-sectional view showing the manufacturing process of an embodiment of the present invention, and FIG. 3 is a surface of a guide portion. FIG. 4 is a characteristic diagram showing the relationship between roughness and reflectance, and FIG. 4 is a characteristic diagram showing the relationship between average interval of surface roughness of the guide portion and reflectance. FIG. 5 is a diagram showing a conventional optical information recording medium, in which FIG. 5A is a sectional view and FIG. 5B is a partially enlarged sectional view. DESCRIPTION OF SYMBOLS 11... Recording layer support base, 12... Glass substrate, 13... Silicon oxide film, 14... Guide part, 15... Recording part, 16... Recording layer.

Claims (1)

【特許請求の範囲】 1 基板と、 前記基板上に形成されると共に、前記基板より
ドライエツチング耐性が小さい薄膜と、 前記薄膜上に形成された記録層とを備え、 前記薄膜における、同一平面内に位置する表面
をガイド部と記録部とに区分し、更に前記ガイド
部及び前記記録部の少なくとも一方を粗面にする
と共に、前記ガイド部の表面粗さと前記記録部の
表面粗さとを異ならせ、 前記記録部上に前記記録層を被着したことを特
徴とする光情報記録媒体。 2 ガイド部の表面粗さが、記録部の表面粗さよ
り粗いことを特徴とする特許請求の範囲第1項記
載の光情報記録媒体。
[Scope of Claims] 1. A substrate, a thin film formed on the substrate and having a lower dry etching resistance than the substrate, and a recording layer formed on the thin film, the thin film being formed within the same plane. The surface located at the guide portion is divided into a guide portion and a recording portion, and at least one of the guide portion and the recording portion is made a rough surface, and the surface roughness of the guide portion and the surface roughness of the recording portion are made different. . An optical information recording medium, characterized in that the recording layer is deposited on the recording section. 2. The optical information recording medium according to claim 1, wherein the guide portion has a rougher surface than the recording portion.
JP60238927A 1985-10-25 1985-10-25 Optical information recording medium Granted JPS6299930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60238927A JPS6299930A (en) 1985-10-25 1985-10-25 Optical information recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60238927A JPS6299930A (en) 1985-10-25 1985-10-25 Optical information recording medium

Publications (2)

Publication Number Publication Date
JPS6299930A JPS6299930A (en) 1987-05-09
JPH0359493B2 true JPH0359493B2 (en) 1991-09-10

Family

ID=17037343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60238927A Granted JPS6299930A (en) 1985-10-25 1985-10-25 Optical information recording medium

Country Status (1)

Country Link
JP (1) JPS6299930A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2508788B2 (en) * 1988-03-09 1996-06-19 凸版印刷株式会社 Optical recording medium and manufacturing method thereof
WO1997036293A1 (en) * 1996-03-27 1997-10-02 Dai Nippon Printing Co., Ltd. Optical card

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5352104A (en) * 1976-10-22 1978-05-12 Fuji Photo Film Co Ltd Production of disc recording disc
JPS53143203A (en) * 1977-05-11 1978-12-13 Mitsubishi Electric Corp Information signal recording carrier
JPS5424603A (en) * 1977-07-27 1979-02-24 Teac Corp Method of producing optical reproducer information recording medium
JPS5424602A (en) * 1977-07-27 1979-02-24 Teac Corp Method of producing information recording medium
JPS593731A (en) * 1982-06-29 1984-01-10 Fujitsu Ltd Manufacture of information disk

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5352104A (en) * 1976-10-22 1978-05-12 Fuji Photo Film Co Ltd Production of disc recording disc
JPS53143203A (en) * 1977-05-11 1978-12-13 Mitsubishi Electric Corp Information signal recording carrier
JPS5424603A (en) * 1977-07-27 1979-02-24 Teac Corp Method of producing optical reproducer information recording medium
JPS5424602A (en) * 1977-07-27 1979-02-24 Teac Corp Method of producing information recording medium
JPS593731A (en) * 1982-06-29 1984-01-10 Fujitsu Ltd Manufacture of information disk

Also Published As

Publication number Publication date
JPS6299930A (en) 1987-05-09

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