JPH0359363U - - Google Patents

Info

Publication number
JPH0359363U
JPH0359363U JP1989118931U JP11893189U JPH0359363U JP H0359363 U JPH0359363 U JP H0359363U JP 1989118931 U JP1989118931 U JP 1989118931U JP 11893189 U JP11893189 U JP 11893189U JP H0359363 U JPH0359363 U JP H0359363U
Authority
JP
Japan
Prior art keywords
vapor deposition
filament
deposition apparatus
intermediate member
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1989118931U
Other languages
English (en)
Other versions
JPH0754285Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989118931U priority Critical patent/JPH0754285Y2/ja
Priority to US07/515,016 priority patent/US4986212A/en
Publication of JPH0359363U publication Critical patent/JPH0359363U/ja
Application granted granted Critical
Publication of JPH0754285Y2 publication Critical patent/JPH0754285Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/26—Vacuum evaporation by resistance or inductive heating of the source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Description

【図面の簡単な説明】
第１図及び第２図は本考案の実施例としての蒸
着装置の要部の各々拡散分解斜視図、及び平断面
図、第３図は第２図に関する−線断面図、第
４図は第２図及び第３図に関する−矢視図、
第５図及び第６図は従来の蒸着装置の各々斜視図
及び縦断面図、第７図及び第８図は第５図及び第
６図に示した蒸着装置の要部の拡大図である。 主要部分の符号の説明、１…基台、２…ハウジ
ング、５…光デイスク基板、６…デイスクホルダ
、８…給電支柱、９…蒸着用金属、１０…フイラ
メント、１６…押圧ねじ、２１…支持部材、２３
…中間部材。

Claims (1)

  1. 【実用新案登録請求の範囲】 (1) 密閉容器内において電極間に架設されて被
    蒸着体に蒸着さるべき蒸着用金属を加熱するフイ
    ラメントの端部を前記電極に固定する固定手段を
    含み、前記固定手段は前記電極に固定されて前記
    電極側に前記フイラメントが挿通され得る凹部を
    有する支持部材と、前記支持部材に螺合して先端
    にて前記フイラメントを押圧する押圧ねじとを有
    する蒸着装置であつて、前記凹部内において前記
    フイラメントと前記押圧ねじとの間に介装され且
    つ前記フイラメントに外嵌する嵌合溝を有する中
    間部材を有することを特徴とする蒸着装置。 (2) 前記中間部材には前記支持部材の外側面に
    沿つて張出する張出部が設けられていることを特
    徴とする請求項１記載の蒸着装置。 (3) 前記中間部材を前記押圧ねじの回転中心軸
    に並行に案内する案内手段を有することを特徴と
    する請求項１又は２記載の蒸着装置。 (4) 前記押圧ねじ及び前記中間部材が互いに枢
    着されていることを特徴とする請求項１ないし３
    のうちいずれか１記載の蒸着装置。
JP1989118931U 1989-10-11 1989-10-11 蒸着装置 Expired - Lifetime JPH0754285Y2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1989118931U JPH0754285Y2 (ja) 1989-10-11 1989-10-11 蒸着装置
US07/515,016 US4986212A (en) 1989-10-11 1990-04-26 Metallizing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989118931U JPH0754285Y2 (ja) 1989-10-11 1989-10-11 蒸着装置

Publications (2)

Publication Number Publication Date
JPH0359363U true JPH0359363U (ja) 1991-06-11
JPH0754285Y2 JPH0754285Y2 (ja) 1995-12-18

Family

ID=14748759

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989118931U Expired - Lifetime JPH0754285Y2 (ja) 1989-10-11 1989-10-11 蒸着装置

Country Status (2)

Country Link
US (1) US4986212A (ja)
JP (1) JPH0754285Y2 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0736611A1 (en) * 1995-04-04 1996-10-09 Sony DADC Austria AG Heater for evaporation and evaporation equipment
CN102031485B (zh) * 2009-09-25 2013-09-25 深圳富泰宏精密工业有限公司 蒸发源及使用该蒸发源的蒸镀装置
DE102010032591A1 (de) * 2010-07-23 2012-01-26 Leybold Optics Gmbh Vorrichtung und Verfahren zur Vakuumbeschichtung
KR20120096788A (ko) * 2011-02-23 2012-08-31 삼성전자주식회사 외관 기구물의 표면 코팅 방법 및 표면 코팅 장치

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5842161U (ja) * 1981-09-16 1983-03-19 日東電工株式会社 線状ヒ−タの保持構造
JPS6120558U (ja) * 1984-07-10 1986-02-06 日立マクセル株式会社 真空蒸着装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3274372A (en) * 1964-07-27 1966-09-20 Electro Optical Systems Inc Solid vaporization
US3517161A (en) * 1967-09-13 1970-06-23 Bendix Corp Sublimation unit and system
NL6713713A (ja) * 1967-10-10 1969-04-14

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5842161U (ja) * 1981-09-16 1983-03-19 日東電工株式会社 線状ヒ−タの保持構造
JPS6120558U (ja) * 1984-07-10 1986-02-06 日立マクセル株式会社 真空蒸着装置

Also Published As

Publication number Publication date
JPH0754285Y2 (ja) 1995-12-18
US4986212A (en) 1991-01-22

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