JPH0359106B2 - - Google Patents
Info
- Publication number
- JPH0359106B2 JPH0359106B2 JP60180131A JP18013185A JPH0359106B2 JP H0359106 B2 JPH0359106 B2 JP H0359106B2 JP 60180131 A JP60180131 A JP 60180131A JP 18013185 A JP18013185 A JP 18013185A JP H0359106 B2 JPH0359106 B2 JP H0359106B2
- Authority
- JP
- Japan
- Prior art keywords
- imide resin
- addition
- resin prepolymer
- type imide
- bis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920005989 resin Polymers 0.000 claims description 46
- 239000011347 resin Substances 0.000 claims description 46
- 150000003949 imides Chemical class 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 22
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 claims description 10
- 150000004985 diamines Chemical class 0.000 claims description 7
- 239000000463 material Substances 0.000 description 17
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 11
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 10
- 239000011976 maleic acid Substances 0.000 description 10
- 125000004432 carbon atom Chemical group C* 0.000 description 9
- 238000000465 moulding Methods 0.000 description 9
- 238000007792 addition Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002966 varnish Substances 0.000 description 7
- 239000002585 base Substances 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 6
- 239000004744 fabric Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 125000002947 alkylene group Chemical group 0.000 description 5
- 238000005553 drilling Methods 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- -1 N/N'-dimethylaniline Chemical compound 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 150000008064 anhydrides Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000691 measurement method Methods 0.000 description 3
- 239000012778 molding material Substances 0.000 description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- IYMZEPRSPLASMS-UHFFFAOYSA-N 3-phenylpyrrole-2,5-dione Chemical compound O=C1NC(=O)C(C=2C=CC=CC=2)=C1 IYMZEPRSPLASMS-UHFFFAOYSA-N 0.000 description 1
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- BLMSGSGJGUHKFW-UHFFFAOYSA-N 4-[(4-aminophenyl)-diphenylsilyl]aniline Chemical compound C1=CC(N)=CC=C1[Si](C=1C=CC(N)=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BLMSGSGJGUHKFW-UHFFFAOYSA-N 0.000 description 1
- KTZLSMUPEJXXBO-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylphosphoryl]aniline Chemical compound C1=CC(N)=CC=C1P(=O)(C=1C=CC(N)=CC=1)C1=CC=CC=C1 KTZLSMUPEJXXBO-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- YFBMJEBQWQBRQJ-UHFFFAOYSA-N 4-n-(4-aminophenyl)-4-n-phenylbenzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1N(C=1C=CC(N)=CC=1)C1=CC=CC=C1 YFBMJEBQWQBRQJ-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- HEHUZGFZNPSQMW-UHFFFAOYSA-N NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O Chemical compound NC1=CC=C(C=C1)C(C1=CC=C(C=C1)N)[PH2]=O HEHUZGFZNPSQMW-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- QMHAHUAQAJVBIW-UHFFFAOYSA-N [methyl(sulfamoyl)amino]methane Chemical compound CN(C)S(N)(=O)=O QMHAHUAQAJVBIW-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- IWZNWGDJJJKIOC-UHFFFAOYSA-N bis(3-aminophenyl)methyl-oxidophosphanium Chemical compound NC=1C=C(C=CC1)C(C1=CC(=CC=C1)N)[PH2]=O IWZNWGDJJJKIOC-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000002950 monocyclic group Chemical group 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- SFLGSKRGOWRGBR-UHFFFAOYSA-N phthalane Chemical compound C1=CC=C2COCC2=C1 SFLGSKRGOWRGBR-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- VHNQIURBCCNWDN-UHFFFAOYSA-N pyridine-2,6-diamine Chemical compound NC1=CC=CC(N)=N1 VHNQIURBCCNWDN-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
〔技術分野〕
この発明は、プリント配線板の製造等に使用さ
れる付加型イミド樹脂プレポリマーに関する。
〔背景技術〕
従来、多層プリント配線板製造用の樹脂とし
て、優れた接着性、耐薬品性、電気特性、機械特
性等を有するエポキシ樹脂材料が多く使用されて
きたが、高密度実装用の高多層プリント配線板に
使用した場合は、実装工程での耐熱性の問題、ま
たレジンスミアの厚み方向の熱膨張などによる導
通信頼性の低下が問題となる。
これらの問題点を材料面から解決するため、イ
ミド樹脂などの耐熱材料が開発され、実用化され
ている。特に、不飽和ビス−イミドとジアミンと
を反応させた付加型イミド樹脂は、高密度化す
るための細線化、微細孔あけなどの高精度加工が
可能である、厚み方向の熱膨張率が小さく、ス
ルーホールメツキによる導通信頼性が高い、ド
リル加工工程でのスミア発生がない、高温時の
導体密着力および硬度が高く、実装性が向上す
る、高温(200℃)での連続使用に耐える等の
特徴を有していることにより、多層プリント配線
板材料用途に多く使用されるようになつてきた。
しかしながら、近年、大型コンピユータ用等の
多層プリント板はより高密度実装化、高多層化さ
れる傾向にあり、このために回路の微細化、スル
ーホール穴径の縮小の要求が強い。この要求を実
現するために、従来よりさらに高いレベルの寸法
安定性、密着性が基板に要求される様になつた。
すなわち、基板の寸法変化は多層板の内、外層回
路の位置的なズレに直接影響し、多層板サイズを
大きくした場合には特に寸法変化のばらつきは極
小におさえねばならない。このため、基板作製に
際しては低い圧力で成形加工を行うことが好まし
い。高い圧力で成形を行うと寸法安定性が悪くな
るからである。
他方、密着性に関しては、回路の微細化によ
り、回路と樹脂との密着性は当然高くなければな
らないが、基板と樹脂との密着性も高くなければ
ならず、また、層と層の間の密着性も高くなけれ
ばならない。なぜならば、密着性が低いと、多層
板に穴開け加工を行う等の各種の加工工程におい
て基板と樹脂の間に微細な剥離が生じる、あるい
は、基板内部の層間に剥離が発生するといつた不
都合が生じるからである。
一般に知られている付加型イミド樹脂は、大型
コンピユータ用等の多層板レベルでみれば、基板
との密着性が不充分であるために、ドリル加工に
よる孔あけ工程で微細な剥離が生じやすい。ま
た、基板を作製するに際し、プリプレグを低圧力
で成形すればボイドが発生して均一な基板が得ら
れないので、必然的に高圧力で成形を行う必要が
ある。このために、基板の寸法安定性も不充分に
なる。
〔発明の目的〕
この発明は、電子部品の高密度実装を可能にす
る高密度高多層プリント板を得られることのでき
る付加型イミド樹脂プレポリマーを提供すること
を目的としている。
〔発明の開示〕
前記のような目的を達成するため、発明者ら
は、まず、一般に知られている付加型イミド樹脂
プレポリマーを用いて、回路−樹脂、基板−樹脂
の密着性が不充分になる原因について研究した。
その結果、一般の付加型イミド樹脂プレポリマー
が高分子量成分を多く含むことが主な原因である
ことがわかつた。
発明者らは、さらに研究を重ねた結果、高分子
量成分の絶対量が少ないことは好ましいが、絶対
量だけでなく、未反応原料との相対比も重要な要
因であることを見出し、以下の2つの発明を完成
した。
すなわち、第1の発明は、付加型イミド樹脂プ
レポリマーにN・N′−メチレンビス(N−フエ
ニルマレイミド)が添加されていることを特徴と
する付加型イミド樹脂プレポリマー組成物を要旨
とし、第2の発明は、付加型イミド樹脂プレポリ
マーにN・N′−メチレンビス(N−フエニルマ
レイミド)が4・4′−ジアミノジフエニルメタン
と併せて添加されていることを特徴とする付加型
イミド樹脂プレポリマー組成物を要旨としてい
る。
以下に、これらの発明を詳しく説明する。
これらの発明では、付加型イミド樹脂プレポリ
マーにN・N′−メチレンビス(N−フエニルマ
レイミド)を単独で、または、4・4′−ジアミノ
ジフエニルメタンと併せて添加していることが特
徴である。
それらの添加量は下記の範囲に選ばれる必要が
ある。すなわち、添加される付加型イミド樹脂プ
レポリマー100重量部(以下、部と略す)に対し、
XT=XBMI+XDDM 〔部〕 …
とすれば、N・N′−メチレンビス(N−フエニ
ルマレイミド)を単独で添加する場合、
5≦XT=XBMI≦60 〔部〕 …
であり、4・4′−ジアミノジフエニルメタンと併
せて添加する場合には、
5≦XT≦150 〔部〕 …
である。そして、N・N′−メチレンビス(N−
フエニルマレイミド)と4・4′−ジアミノジフエ
ニルメタンを併用する場合には、両者の配合割合
の好ましい範囲は、
XM=XBMI/MBMI/Xbbn/MMbM=1.1〜10.0 …
である。ここで、
XT:添加物総量(部数)
XBMI:N・N′−メチレンビス(N・フエニルマ
レイミドの添加量(部数)
XDDM:4・4′−ジアミノジフエニルメタンとの添
加量(部数)
XM:添加物のモル比
XBMI:N・N′−メチレンビス(N−フエニルマ
レイミド)の分子量
MBMI≒358
MDDM:4・4′−ジアミノジフエニルメタンの分
子量
MDDM≒198
である。すなわち、N・N′−メチレンビス(N
−フエニルマレイミド)を単独で添加する場合に
は、式の関係を満たしていることが好ましく、
4・4′−ジアミノジフエニルメタンと併せて添加
する場合には、式および式の関係を同時に満
たしていることが好ましい。
なお、式または式において、XTが5より
小さな領域では、添加した効果が認められないお
それがある。式においてXTが60より大きな領
域、または、式においてXTが150より大きな領
域では未反応分が増えすぎて溶液で保存する場合
沈でんが析出しやすくなるおそれがある。XMが
1.1より小さい場合は、硬化までの時間が短くな
り取り扱いにくくなり、XMが10.0を越えると不
飽和ビスイミド成分〔特に、N・N′−メチレン
ビス(N−フエニルマレイミド)〕が多く残存し
やすくなり、プレポリマー組成物を溶液で保存す
る場合、沈でんが析出しやすくなるおそれがあ
る。すなわち、均一に基板に含浸させにくくな
る。
付加型イミド樹脂プレポリマーにN・N′−メ
チレンビス(N−フエニルマレイミド)を単独
で、または、4・4′−ジアミノジフエニルメタン
と併せて添加する時機については特に限定されな
いが、次の2つのやり方が好ましい。
(a) 粉末付加型イミド樹脂プレポリマーに所定量
添加し、溶媒で溶解して完全混合する。
(b) 粉末付加型イミド樹脂プレポリマーを溶媒に
溶解し、希釈としてワニスとし、これに所定量
の添加物を加える。
さらに、上記(a)、(b)の操作を行つた後、溶液を
たとえば80℃程度に加温し、0.5〜2時間熟成を
行つても良い。また、得られたプレポリマー組成
物溶液を粉末化して、成形材料等の用途に用いる
こともできる。
上記溶媒は、付加型イミド樹脂プレポリマーを
完全に溶解するものであれば特に限定はしない
が、N−メチルピロリドン、ジメチルアセトアミ
ド、ジメチルホルムアミド、ジメチルスルホアミ
ド等の極性溶媒が好ましい。溶解する際の溶媒量
については特に限定しない。
この発明において用いられている付加型イミド
樹脂プレポリマーは、下記の式()であらわさ
れる不飽和ビスイミドと、下記の式()であら
わされるジアミンとを反応させてなるものであ
る。
(式中Dは炭素−炭素間と二重結合を含む2価の
基を表し、Aは少なくとも2個の炭素原子を含む
2価の基を表す)
H2N−B−NH2 …()
(式中Bは30個以下の炭素原子を有する2価の基
である)
記号のAおよびBは、同一かまたは異なること
ができ、それぞれ、13個よりも少ない炭素原子を
持つている直鎖のまたは分岐したアルキレン基
か、環の中に5個または6個の炭素原子を持つて
いる環状アルキレン基か、O、NおよびS原子の
少なくとも1個を含む異種環状基か、もしくは、
フエニレンまたは多環状芳香族基にすることもで
きる。これらの種々の基は、反応条件のもとで不
必要な副反応を与えない置換基を持つていてもよ
い。
記号のAおよびBはまた、たくさんのフエニレ
ン基か、または脂環状の基を表すこともできる。
この場合において、となりあうフエニレン基また
は脂環状基は、直接に結合されるほか、酸素また
は硫黄などの2価の原子を介して結合されるか、
もしくは、炭素原子1個から3個のアルキレン群
または以下に示すの群のうちの1つの群を介して
結合されることがある。これらの原子または群が
複数存在する場合には、それぞれが同じであつて
もよく、異なつていてもよい。
−NR4−,−P(O)R3−、−N=N−,
[Technical Field] The present invention relates to addition-type imide resin prepolymers used for manufacturing printed wiring boards and the like. [Background technology] Conventionally, epoxy resin materials with excellent adhesive properties, chemical resistance, electrical properties, mechanical properties, etc. have often been used as resins for manufacturing multilayer printed wiring boards. When used in a multilayer printed wiring board, there are problems with heat resistance during the mounting process and a decrease in continuity reliability due to thermal expansion in the thickness direction of the resin smear. In order to solve these problems from a material perspective, heat-resistant materials such as imide resins have been developed and put into practical use. In particular, addition-type imide resin, which is made by reacting unsaturated bis-imide with diamine, has a small coefficient of thermal expansion in the thickness direction, making it possible to perform high-precision processing such as thinning wires for high density and drilling micro holes. , high conductivity reliability due to through-hole plating, no smearing during the drilling process, high conductor adhesion and hardness at high temperatures, improving mounting performance, withstands continuous use at high temperatures (200℃), etc. Due to these characteristics, it has come to be widely used as a material for multilayer printed wiring boards. However, in recent years, multilayer printed circuit boards for large computers and the like are becoming more densely packaged and more multilayered, and there is therefore a strong demand for miniaturization of circuits and reduction in the diameter of through holes. In order to meet this requirement, substrates are now required to have even higher levels of dimensional stability and adhesion than before.
That is, the dimensional change of the board directly affects the positional deviation of the circuits in the outer layers of the multilayer board, and when the multilayer board size is increased, the variation in the dimensional change must be kept to a minimum, especially when the multilayer board size is increased. For this reason, when manufacturing the substrate, it is preferable to perform the molding process at low pressure. This is because dimensional stability deteriorates when molding is performed under high pressure. On the other hand, with regard to adhesion, with the miniaturization of circuits, the adhesion between the circuit and the resin must naturally be high, but the adhesion between the substrate and the resin must also be high, and the bond between the layers must also be high. Adhesion must also be high. This is because if the adhesion is low, minute peeling may occur between the substrate and resin during various processing steps such as drilling holes in a multilayer board, or separation may occur between layers inside the substrate. This is because Generally known addition-type imide resins have insufficient adhesion to substrates when viewed at the level of multilayer boards for large-scale computers, etc., so minute peeling tends to occur during the drilling process. Furthermore, when producing a substrate, if the prepreg is molded at low pressure, voids will occur and a uniform substrate cannot be obtained, so molding must necessarily be performed at high pressure. This also results in insufficient dimensional stability of the substrate. [Object of the Invention] The object of the present invention is to provide an addition-type imide resin prepolymer that can produce a high-density, high-multilayer printed board that enables high-density mounting of electronic components. [Disclosure of the Invention] In order to achieve the above object, the inventors first used a generally known addition-type imide resin prepolymer to solve the problem of insufficient adhesion between the circuit and the resin and between the substrate and the resin. We researched the causes of this.
As a result, it was found that the main cause was that general addition-type imide resin prepolymers contained a large amount of high molecular weight components. As a result of further research, the inventors discovered that although it is preferable for the absolute amount of high molecular weight components to be small, not only the absolute amount but also the relative ratio to the unreacted raw material is an important factor. Completed two inventions. That is, the gist of the first invention is an addition-type imide resin prepolymer composition characterized in that N.N'-methylenebis (N-phenylmaleimide) is added to the addition-type imide resin prepolymer. The second invention is an addition-type imide resin prepolymer characterized in that N.N'-methylenebis (N-phenylmaleimide) is added together with 4,4'-diaminodiphenylmethane. The gist is imide resin prepolymer compositions. These inventions will be explained in detail below. These inventions are characterized in that N・N′-methylenebis(N-phenylmaleimide) is added to the addition-type imide resin prepolymer alone or in combination with 4・4′-diaminodiphenylmethane. It is. The amount of these additions needs to be selected within the following range. That is , for 100 parts by weight of addition-type imide resin prepolymer (hereinafter abbreviated as parts), X T = When adding maleimide ) alone, 5≦ XT = Department]... is. And N・N′-methylenebis(N-
When using phenylmaleimide ) and 4,4'-diaminodiphenylmethane in combination, the preferred range of the blending ratio of both is : be. Where , X T :Total amount of additives (number of parts) (number of parts) X M : molar ratio of additives That is, N・N′-methylenebis(N
- phenylmaleimide) is added alone, it is preferable that the relationship of the formula is satisfied,
When added together with 4,4'-diaminodiphenylmethane, it is preferable that the formula and the relationship of the formula are satisfied at the same time. Note that in the formula or formula, in a region where X T is smaller than 5, the effect of addition may not be observed. In a region where X T is greater than 60 in the formula, or in a region where X T is greater than 150 in the formula, there is a risk that unreacted components will increase too much and precipitate will easily precipitate when stored in solution. X M
If it is smaller than 1.1, the time to cure will be shortened and it will be difficult to handle, and if X M exceeds 10.0, a large amount of unsaturated bisimide components [especially N・N′-methylenebis(N-phenylmaleimide)] will likely remain. Therefore, when the prepolymer composition is stored as a solution, there is a possibility that precipitates are likely to precipitate. That is, it becomes difficult to uniformly impregnate the substrate. There are no particular restrictions on the timing of adding N・N′-methylenebis(N-phenylmaleimide) to the addition type imide resin prepolymer alone or in combination with 4・4′-diaminodiphenylmethane, but the following Two methods are preferred. (a) Add a specified amount to the powder addition type imide resin prepolymer, dissolve in a solvent, and mix thoroughly. (b) Powdered addition type imide resin prepolymer is dissolved in a solvent, diluted to form a varnish, and a predetermined amount of additives are added to this. Further, after performing the operations (a) and (b) above, the solution may be heated to, for example, about 80°C and aged for 0.5 to 2 hours. Moreover, the obtained prepolymer composition solution can be powdered and used for applications such as molding materials. The above solvent is not particularly limited as long as it completely dissolves the addition type imide resin prepolymer, but polar solvents such as N-methylpyrrolidone, dimethylacetamide, dimethylformamide, and dimethylsulfamide are preferred. The amount of solvent used for dissolution is not particularly limited. The addition type imide resin prepolymer used in this invention is obtained by reacting an unsaturated bisimide represented by the following formula () with a diamine represented by the following formula (). (In the formula, D represents a divalent group containing carbon-carbon and double bonds, and A represents a divalent group containing at least two carbon atoms.) H 2 N-B-NH 2 ...() (wherein B is a divalent group having up to 30 carbon atoms) The symbols A and B can be the same or different and each has a straight chain with less than 13 carbon atoms. a branched or branched alkylene group, a cyclic alkylene group having 5 or 6 carbon atoms in the ring, a heterocyclic group containing at least one of O, N and S atoms, or
It can also be a phenylene or polycyclic aromatic group. These various groups may have substituents that do not give rise to unnecessary side reactions under the reaction conditions. The symbols A and B can also represent a number of phenylene groups or alicyclic groups.
In this case, the adjacent phenylene groups or alicyclic groups may be bonded directly, or may be bonded via a divalent atom such as oxygen or sulfur, or
Alternatively, it may be bonded through an alkylene group of 1 to 3 carbon atoms or one of the groups shown below. When a plurality of these atoms or groups exist, they may be the same or different. −NR 4 −, −P(O)R 3 −, −N=N−,
【式】−CO−O−,−SO2−,
−SiR3R4−,−CONH−,−NY−CO−X−CO−
NY−,−O−CO−X−CO−O−,[Formula] -CO-O-, -SO 2 -, -SiR 3 R 4 -, -CONH-, -NY-CO-X-CO-
NY-, -O-CO-X-CO-O-,
【式】【formula】
【式】および
上記式中R3、R4およびYは、おのおの、炭素
原子1個から4個のアルキル基、環中に5個また
は6個の炭素原子を持つ環状アルキル基、もしく
は、フエニル基または多環状芳香族基を表し、X
は、13個よりも少ない炭素原子を持つている直鎖
または分岐したアルキレン基、環中に5個または
6個の炭素原子をもつている環状アルキレン基、
もしくは、単環または多環状アリレン基を表す。
基Dは式:
のエチレン系無水物(不飽和ジカルボン酸無水物
など)から誘導されるもので、たとえばマレイン
酸無水物、シトラコン酸無水物、テトラヒドロフ
タル酸無水物、イタコン酸無水物、およびシクロ
ジエンとこれ等の無水物の1つの間に起こるデイ
ールスアルダー反応の生成物を表すこともでき
る。
式()であらわされる不飽和ビスイミドの好
ましい例には、次のものが挙げられる。マレイン
酸N・N′−エチレン−ビス−イミド、マレイン
酸N・N′−ヘキサメチレン−ビス−イミド、マ
レイン酸N・N′−メタフエニレン−ビス−イミ
ド、マレイン酸N・N′−パラフエニレン−ビス
−イミド、マレイン酸N・N′−4・4′−ジフエニ
ルメタン−ビス−イミド〔N・N′−メチレンビ
ス(N−フエニルマレイミド)とも言う〕、マレ
イン酸N・N′−4・4′−ジフエニルエーテル−ビ
ス−イミド、マレイン酸N・N′−4・4′−ジフエ
ニルスルフオン−ビス−イミド、マレイン酸N・
N′−4・4′−ジシクロヘキシルメタン−ビス−イ
ミド、マレイン酸N・N′−α・α′−4・4′−ジメ
チレンシクロヘキサン−ビス−イミド、マレイン
酸N・N′−メタキシリレン−ビス−イミド、お
よびマレイン酸N・N′−ジフエニルシクロヘキ
サン−ビス−イミド。
式()であらわされるジアミンの好ましい実
例には、次のものがある。4・4′−ジアミノジシ
クロヘキシルメタン、1・4′−ジアミノシクロヘ
キサン、2・6−ジアミノピリジン、メタフエニ
レンジアミン、パラフエニレンジアミン、4・
4′−ジアミノ−ジフエニルメタン、2・2−ビス
−(4−アミノフエニル)プロパン、ベンジジン、
4・4′−ジアミノフエニルオキサイド、4・4′−
ジアミノジフエニルサルフアイド、4・4′−ジア
ミノジフエニルスルフオン、ビス−(4−アミノ
フエニル)ジフエニルシラン、ビス−(4−アミ
ノフエニル)メチルフオスフインオキサイド、ビ
ス−(3−アミノフエニル)メチルフオスフイン
オキサイド、ビス−(4−アミノフエニル)−フエ
ニルフオスフインオキサイド、ビス−(4−アミ
ノフエニル)フエニラミン、1・5−ジアミノナ
フタレン、メタキシリレンジアミン、パラキシリ
レンジアミン、1・1−ビス−(パライミノフエ
ニル)フタランおよびヘキサメチレンジアミン。
上記2つの発明で用いられる付加型イミド樹脂
プレポリマーは、前記のような不飽和ビスイミド
とジアミンを、そのまま反応させたもの、加熱溶
融反応させたもの、あるいは、極性溶媒中で反応
させたもの、さらには反応触媒の存在下で反応さ
せたものなどが含まれる。反応は通常、50〜200
℃の温度範囲で行われる。ここで触媒は、使用す
る極性溶媒中でプロトン供与体となりマイケル付
加を促進させるものが好ましい。触媒の例を次に
示す。
触媒の例
トリエチルアミン、トリプロピルアミン、トリ
ブチルアミン、N・N−テトラメチルエチレンジ
アミン、N・N−テトラメチル−1・3−ブタン
ジアミン、トリエチレンジアミン、N−メチルモ
ルホリン、ピリジン、α−ピコリン、キノリン、
N・N′−ジメチルアニリン、N・N′−ジエチル
アニリン、ジメチルベンジルアミン等の第三級ア
ミン、
ギ酸、酢酸、プロピオン酸、シユウ酸、マロン
酸、コハク酸、安息香酸、フタル酸、イソフタル
酸、テレフタル酸等の有機酸、
および水。
なお、市販の付加型イミド樹脂プレポリマーを
用いることも可能である。市販品を次に例示す
る。
Kerimid 601(フランス、ローヌ・プーラン社
製)。
これは、不飽和ビスイミドとジアミンを加熱溶
融反応したプレポリマーであり、広く市販されて
いるものである。
Compimid X183(西ドイツ、テクノケミ社製)
MS−2040(三菱油化(株)製)
これらは、無水マレイン酸とポリアミンとを反
応させたポリマレイミド類である。
なお、以上の市販品の変性品を用いることも可
能である。
付加型イミド樹脂プレポリマーの分子量分布に
ついては、特に限定はないが、分子量15000を越
える成分が7%以上含まれていても、プレポリマ
ー組成物の粘度が高くなりすぎることがなく、硬
化時間が短くなりすぎて可使時間が短くなること
がないなど不都合が生じない。また、分子量
15000を越える成分が7%以上含まれるよう合成
すると、それ以下の分子量で、溶解性が良好で活
性度が高く、基材と良好な密着性を示す成分の占
める割合が高くなり、基材との密着性、溶解性な
どの点で好ましい。
ここで、分子量分布は、たとえば、DMF溶媒
を使用し、分離カラムとして昭和電工製AD−
803/S(8.0×250mm、理論段数6000段)を2本装
着したゲル浸透クロマトグラフ(東洋ソーダ製
HLC−803D)により測定した。分子量の計算は、
5種類の単分散ポリエチレングリコールおよびエ
チレングリコールモノマーのリテンシヨンタイム
と分子量の常用対数から、3次式の回帰曲線を求
め、これを試料に適用し、試料のリテンシヨンタ
イムから逆に分子量を求めるという方法で行つ
た。また、各成分の割合(%)は、示差屈折計
(128×10-8RI単位)を用い、試料濃度を0.5±0.2
%、試料注入量を100μとして測定し、屈折計
出力0〜1V、記録計への出力0〜10mV、チヤ
ート速度5mm/分として得られたクロマトグラム
を、必要な分子量区分に分け、切りぬき重量法に
より、それぞれの比率を求めた。
第1および第2の発明にかかるプレポリマー組
成物は、N−メチルピロリドンやジメチルアセト
アミド等の極性溶媒に溶解してワニスを調整した
場合、ワニス中に未反応原料の沈澱や高分子量不
溶解物を含まないクリアーなワニスとなり、ま
た、ワニスの硬化までの時間が長いため、ワニス
の可使時間も長くなつている。
上記2つの発明の付加型イミド樹脂プレポリマ
ーは、プリント配線板用積層板のほか、各種充填
材との組合わせにより、半導体封止材料、高強度
高弾性率電気機器用構造材料、電磁波シールド材
料等の成形材料、半導体素子のダイボンド用およ
びチツプ部品搭載用等の接着材および回路印刷用
ペースト等の広範な電気用途に使用することが可
能であり、これらに用いることにより高耐熱性、
高密着性、可撓性の良好な成形体を得ることが可
能となる。また、低圧成形が可能である。
上記2つの発明の付加型イミド樹脂プレポリマ
ー組成物をそれぞれ基材に含浸させ、半硬化させ
てプリプレグを作製する場合、付加型イミド樹脂
プレポリマー組成物を含浸させる基材の種類は特
に限定されない。通常は、ガラスクロス等が用い
られる。この他、石英繊維布等の無機繊維布、ア
ラミド樹脂(ケブラーなど)布等の高耐熱性有機
繊維布などが用いられてもよい。これらの基材は
通常カツプリング剤等で表面処理を施して用いら
れる。
半硬化させるときの温度は130〜155℃で行うの
が好ましい。155℃を越えると分子量15000を越え
る成分の生成が促進され、130℃未満では効率よ
くプリプレグを生産することができない。分子量
15000を越える成分が多くなりすぎると、樹脂の
粘度が高くなりすぎる。そのため、低圧成形する
とボイドが発生する。また、硬化までの時間が短
か過ぎ、大きい積層板(成形板)を得るのが困難
になる。
第1および第2の発明にかかるプレポリマー組
成物の少なくとも一方を使用したプリプレグは、
ワニスの硬化までの時間が長く、充分に乾燥で
き、プリプレグ中に残存する揮発分が少なくな
る。また樹脂の溶融粘度が低くなるため、このプ
リプレグを低圧で成形してもカスレが発生しない
等、大きいサイズの積層板を成形に適している。
積層板は、たとえば、上記のプリプレグを所定
枚積層成形して、または、必要に応じて銅・ニツ
ケル等の金属箔あるいは回路形成された内層材と
共に上記のプリプレグを積層成形して作られる。
上記プリプレグは、上記2つの発明のプレポリマ
ー組成物の少なくとも一方を用いているので、ボ
イドを発生させることなく低圧成形することがで
きる。このため、この積層板は、非常に寸法の安
定したものとすることができる。また、この積層
板は、上記2つの発明にかかるプレポリマー組成
物の少なくとも一方が用いられているので、樹脂
と基材との密着性、回路と樹脂との密着性、層と
層との間の密着性が高い。したがつて、この積層
板を用いれば、高密度多層プリント板を得ること
が可能となる。
つぎに、第1および第2の発明の実施例、比較
例について説明する。
実施例1〜14および比較例1〜3
実施例1〜14および比較例1〜3では、第1表
に示される配合のプレポリマー組成物溶液を調製
した。各プレポリマー組成物溶液の160℃におけ
るゲル化時間〔分〕および室温保存での沈でんの
生成をそれぞれ調べ、第1表に併せて示した。な
お、第1表にしめすBMI−DDM反応物はつぎの
ように調製した。
(BMI−DDM反応物の調製)
電熱器で充分加熱したステンレス容器に加熱を
続けならがN・N′−メチレンビス(N−フエニ
ルマレイミド)と4・4′−ジアミノジフエニルメ
タンをモル比(BMI/DDM)2.5で所定量ずつ投
入した。次に、内容物の溶融に伴つて撹拌し、
160℃で8分間保つた。この後、充分冷やした広
い鉄板上に広げ冷却し黄色固体のBMI−DDM反
応物を得た。[expression] and In the above formula, R 3 , R 4 and Y are each an alkyl group having 1 to 4 carbon atoms, a cyclic alkyl group having 5 or 6 carbon atoms in the ring, a phenyl group, or a polycyclic aromatic group. Represents a group group, X
is a straight-chain or branched alkylene group having fewer than 13 carbon atoms, a cyclic alkylene group having 5 or 6 carbon atoms in the ring,
Alternatively, it represents a monocyclic or polycyclic arylene group. The group D has the formula: derived from ethylenic anhydrides (such as unsaturated dicarboxylic anhydrides), such as maleic anhydride, citraconic anhydride, tetrahydrophthalic anhydride, itaconic anhydride, and cyclodienes and their anhydrides. It can also represent the product of a Diels-Alder reaction that occurs between one of the following: Preferred examples of the unsaturated bisimide represented by formula () include the following. Maleic acid N・N′-ethylene-bis-imide, maleic acid N・N′-hexamethylene-bis-imide, maleic acid N・N′-metaphenylene-bis-imide, maleic acid N・N′-paraphenylene-bis-imide -imide, maleic acid N・N′-4・4′-diphenylmethane-bis-imide [also called N・N′-methylenebis (N-phenylmaleimide)], maleic acid N・N′-4・4′- Diphenyl ether-bis-imide, maleic acid N・N′-4・4′-diphenylsulfon-bis-imide, maleic acid N・
N'-4,4'-dicyclohexylmethane-bis-imide, maleic acid N, N'-α, α'-4,4'-dimethylenecyclohexane-bis-imide, maleic acid N, N'-methaxylylene-bis-imide -imide, and N.N'-diphenylcyclohexane-bis-imide maleate. Preferred examples of diamines represented by formula () include the following. 4,4'-diaminodicyclohexylmethane, 1,4'-diaminocyclohexane, 2,6-diaminopyridine, metaphenylenediamine, paraphenylenediamine, 4,
4'-diamino-diphenylmethane, 2,2-bis-(4-aminophenyl)propane, benzidine,
4,4'-diaminophenyl oxide, 4,4'-
Diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, bis-(4-aminophenyl) diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis-(3-aminophenyl)methylphosphine oxide, Bis-(4-aminophenyl)-phenylphosphine oxide, bis-(4-aminophenyl) phenylamine, 1,5-diaminonaphthalene, metaxylylene diamine, paraxylylene diamine, 1,1-bis-(paraiminophenyl) ) Phthalane and hexamethylene diamine. The addition-type imide resin prepolymer used in the above two inventions is one obtained by reacting the above-mentioned unsaturated bisimide and diamine as is, heated and melted, or reacted in a polar solvent. Furthermore, it includes those reacted in the presence of a reaction catalyst. Reactions typically range from 50 to 200
It is carried out in a temperature range of ℃. Here, the catalyst is preferably one that acts as a proton donor in the polar solvent used and promotes Michael addition. Examples of catalysts are shown below. Examples of catalysts triethylamine, tripropylamine, tributylamine, N/N-tetramethylethylenediamine, N/N-tetramethyl-1,3-butanediamine, triethylenediamine, N-methylmorpholine, pyridine, α-picoline, quinoline,
Tertiary amines such as N/N'-dimethylaniline, N/N'-diethylaniline, dimethylbenzylamine, formic acid, acetic acid, propionic acid, oxalic acid, malonic acid, succinic acid, benzoic acid, phthalic acid, isophthalic acid , organic acids such as terephthalic acid, and water. Note that it is also possible to use a commercially available addition type imide resin prepolymer. Examples of commercially available products are listed below. Kerimid 601 (manufactured by Rhône-Poulenc, France). This is a prepolymer obtained by heat-melting reaction of unsaturated bisimide and diamine, and is widely commercially available. Compimid X183 (manufactured by Technochem, West Germany)
MS-2040 (manufactured by Mitsubishi Yuka Co., Ltd.) These are polymaleimides made by reacting maleic anhydride with a polyamine. Note that it is also possible to use modified products of the above commercial products. There are no particular limitations on the molecular weight distribution of the addition-type imide resin prepolymer, but even if it contains 7% or more of components with a molecular weight exceeding 15,000, the viscosity of the prepolymer composition will not become too high and the curing time will be shortened. There are no inconveniences such as no shortening of the pot life due to the shortening. Also, the molecular weight
When synthesized to contain 7% or more of components exceeding 15,000, the proportion of components with lower molecular weights, good solubility, high activity, and good adhesion to the base material increases, and it becomes difficult to bond with the base material. preferred in terms of adhesion, solubility, etc. Here, the molecular weight distribution is determined using, for example, a DMF solvent and a separation column manufactured by Showa Denko AD-
Gel permeation chromatograph (manufactured by Toyo Soda) equipped with two 803/S (8.0 x 250 mm, 6000 theoretical plates)
HLC-803D). Calculation of molecular weight is
A cubic regression curve is obtained from the common logarithm of the retention time and molecular weight of five types of monodisperse polyethylene glycol and ethylene glycol monomer, and this is applied to the sample, and the molecular weight is calculated inversely from the retention time of the sample. I went by method. In addition, the ratio (%) of each component was determined using a differential refractometer (128 × 10 -8 RI unit), and the sample concentration was determined to be 0.5±0.2.
%, the sample injection amount was 100 μ, the refractometer output was 0 to 1 V, the recorder output was 0 to 10 mV, and the chart speed was 5 mm/min. The respective ratios were determined. When the prepolymer compositions according to the first and second inventions are dissolved in a polar solvent such as N-methylpyrrolidone or dimethylacetamide to prepare a varnish, precipitation of unreacted raw materials and high-molecular-weight undissolved substances occur in the varnish. It is a clear varnish that does not contain any substances, and since it takes a long time for the varnish to harden, the pot life of the varnish is also extended. The addition-type imide resin prepolymers of the above two inventions can be used not only for printed wiring board laminates, but also for semiconductor encapsulation materials, high-strength, high-modulus structural materials for electrical equipment, and electromagnetic shielding materials when combined with various fillers. It can be used in a wide range of electrical applications such as molding materials such as molding materials, adhesives for die bonding of semiconductor elements and mounting of chip parts, and pastes for circuit printing.
It becomes possible to obtain a molded article with high adhesion and good flexibility. Furthermore, low pressure molding is possible. When producing a prepreg by impregnating a base material with the addition-type imide resin prepolymer composition of the above two inventions and semi-curing each, the type of base material impregnated with the addition-type imide resin prepolymer composition is not particularly limited. . Usually, glass cloth or the like is used. In addition, inorganic fiber cloth such as quartz fiber cloth, highly heat-resistant organic fiber cloth such as aramid resin (Kevlar etc.) cloth, etc. may be used. These base materials are usually used after surface treatment with a coupling agent or the like. The temperature during semi-curing is preferably 130 to 155°C. When the temperature exceeds 155°C, the production of components with a molecular weight exceeding 15,000 is promoted, and when the temperature is below 130°C, prepreg cannot be efficiently produced. molecular weight
If there are too many components exceeding 15,000, the viscosity of the resin will become too high. Therefore, voids occur during low-pressure molding. Furthermore, the time required for curing is too short, making it difficult to obtain large laminates (molded plates). A prepreg using at least one of the prepolymer compositions according to the first and second inventions includes:
It takes a long time for the varnish to harden, allowing sufficient drying, and less volatile matter remains in the prepreg. Furthermore, since the melt viscosity of the resin is low, this prepreg does not cause fading even when molded at low pressure, making it suitable for molding large-sized laminates. The laminate is made, for example, by laminating and molding a predetermined number of the above prepregs, or by laminating and molding the above prepregs together with a metal foil such as copper or nickel, or an inner layer material having a circuit formed thereon, if necessary.
Since the prepreg uses at least one of the prepolymer compositions of the two inventions described above, it can be molded at low pressure without generating voids. Therefore, this laminate can be made very dimensionally stable. In addition, since this laminate uses at least one of the prepolymer compositions according to the above two inventions, it also has good adhesion between the resin and the base material, adhesion between the circuit and the resin, and an excellent relationship between the layers. High adhesion. Therefore, by using this laminate, it is possible to obtain a high-density multilayer printed board. Next, examples and comparative examples of the first and second inventions will be described. Examples 1 to 14 and Comparative Examples 1 to 3 In Examples 1 to 14 and Comparative Examples 1 to 3, prepolymer composition solutions having the formulations shown in Table 1 were prepared. The gelation time (minutes) at 160° C. and the formation of precipitate during storage at room temperature were investigated for each prepolymer composition solution, and the results are also shown in Table 1. The BMI-DDM reactants shown in Table 1 were prepared as follows. (Preparation of BMI-DDM reactant) In a stainless steel container that has been sufficiently heated with an electric heater, the molar ratio of N・N′-methylenebis(N-phenylmaleimide) and 4・4′-diaminodiphenylmethane ( BMI/DDM) 2.5 was added in the prescribed amount. Next, stir as the contents melt,
It was kept at 160°C for 8 minutes. Thereafter, the mixture was spread on a sufficiently cooled wide iron plate and cooled to obtain a yellow solid BMI-DDM reaction product.
【表】【table】
【表】
(プリプレグの作製)
つぎに、実施例1〜14および比較例1〜3の各
プレポリマー組成物溶液を、それぞれ、表面処理
を施したガラスクロス(105g/cm2)に含浸させ、
150℃で乾燥してレジンコンテント48〜50%のプ
リプレグを得た。
第2表に各プリプレグの170℃におけるゲル化
時間〔秒〕を示した。
(積層板の作製)
先に得たプリプレグを30cm×30cmの大きさに
し、これを4枚重ね、これらの両面に表面処理を
行つた同サイズの1/2オンスft2の銅箔を置いて積
層体とした。これを1.6mm厚の金型にはさみ、蒸
気プレスを用いて5Kg/cm2の加圧を行いつつ直ち
に130℃まで加熱し、20分間保持した。この後、
圧力を第2表に示す圧力に設定するとともに170
℃に加熱し、90分後に圧力をかけたままで室温ま
で冷却して、両面銅張りの積層板を得た。このも
のを、200℃、120分間の温度条件でアフターキユ
アーを行つた。
得られた各積層板の引きはがし強度および寸法
変化のばらつきをそれぞれ第2表に併せて示し
た。なお、引きはがし強度は、積層成形されたプ
リプレグ間の値である。寸法変化は測定間隔200
mmでタテ方向の収縮量を見た。測定方法をつぎに
示す。
(寸法変化の測定法)
25cm×25cmのプリプレグ1枚と、これと同寸法
で1オンス/ft2の銅箔2枚を用いたほかは上記
と同様にして両面銅張り積層板1次成形物を得
た。このものに、約200mm間隔で基準点穴を開け
た後、穴間の寸法を正確に測定し、その両面の銅
箔を常法に基づきエツチング除去した。つぎに、
これ(内層材)の片面に前記と同寸法のプリプレ
グ2枚、同寸法で1オンス/ft2の銅箔1枚を積
層するとともに、その反対面にも同様にプリプレ
グ2枚と銅箔1枚を積層し、上記と同様にして成
形したのち、200℃、120分でアフターキユアーし
て積層板(多層板)を得た。この積層板の内層材
の基準点穴上の銅箔を機械的に除去し、寸法を計
測したときの内層板の寸法変化を測定した。この
測定方法に基づき、以上の測定を10回行つた。こ
のときの寸法変化のばらつき(3δ)〔%〕を第2
表に併せて示した。[Table] (Preparation of prepreg) Next, surface-treated glass cloth (105 g/cm 2 ) was impregnated with each of the prepolymer composition solutions of Examples 1 to 14 and Comparative Examples 1 to 3, and
A prepreg with a resin content of 48-50% was obtained by drying at 150°C. Table 2 shows the gelation time (seconds) of each prepreg at 170°C. (Preparation of laminate board) The prepreg obtained earlier was made into a size of 30cm x 30cm, and 4 sheets were stacked, and 1/2 oz ft 2 copper foil of the same size with surface treatment was placed on both sides. It was made into a laminate. This was placed in a 1.6 mm thick mold, and while applying a pressure of 5 kg/cm 2 using a steam press, it was immediately heated to 130° C. and held for 20 minutes. After this,
Set the pressure to the pressure shown in Table 2 and 170
℃, and after 90 minutes was cooled to room temperature while keeping the pressure applied to obtain a double-sided copper-clad laminate. This material was subjected to after-cure at a temperature of 200°C for 120 minutes. The variation in peel strength and dimensional change of each of the obtained laminates is also shown in Table 2. Note that the peel strength is a value between laminated prepregs. Dimensional changes are measured at measurement intervals of 200
The amount of shrinkage in the vertical direction was measured in mm. The measurement method is shown below. (Measurement method of dimensional change) A primary molded double-sided copper-clad laminate was prepared in the same manner as above except that one prepreg sheet of 25 cm x 25 cm and two sheets of 1 oz/ft 2 copper foil of the same size were used. I got it. After drilling reference point holes in this material at intervals of approximately 200 mm, the dimensions between the holes were accurately measured, and the copper foil on both sides was etched away using a conventional method. next,
On one side of this (inner layer material), two sheets of prepreg with the same dimensions as above and one sheet of copper foil of 1 oz/ft 2 with the same size are laminated, and on the other side, two sheets of prepreg and one sheet of copper foil are laminated. were laminated and molded in the same manner as above, followed by after-curing at 200°C for 120 minutes to obtain a laminate (multilayer board). The copper foil on the reference point hole of the inner layer material of this laminate was mechanically removed and the dimensions were measured, and the dimensional change of the inner layer was measured. Based on this measurement method, the above measurements were performed 10 times. The variation in dimensional change (3δ) [%] at this time is
It is also shown in the table.
【表】【table】
【表】【table】
第1および第2の発明にかかる付加型イミド樹
脂プレポリマー組成物は、以上にみてきたような
ものであるので、これらを用いることにより、高
密着性の成形体を得ることができ、低圧成形が可
能なので、高寸法安定性の成形体を得ることがで
きる。このため、これらを用いれば、高密度高多
層プリント板を得ることが可能になる。
The addition-type imide resin prepolymer compositions according to the first and second inventions are as described above, so by using them, molded products with high adhesion can be obtained and low-pressure molding is possible. This makes it possible to obtain a molded article with high dimensional stability. Therefore, by using these, it becomes possible to obtain a high-density, high-multilayer printed board.
Claims (1)
なる付加型イミド樹脂プレポリマー100重量部に、
N・N′−メチレンビス(N−フエニルマレイミ
ド)が5〜60重量部の割合で添加されている付加
型イミド樹脂プレポリマー組成物。 2 付加型イミド樹脂プレポリマーが、分子量
15000を越える成分を7%以上含む特許請求の範
囲第1項記載の付加型イミド樹脂プレポリマー組
成物。」 3 不飽和ビスイミドとジアミンとを反応させて
なる付加型イミド樹脂プレポリマー100重量部に、
N・N′−メチレンビス(N−フエニルマレイミ
ド)および4・4′−ジアミノジフエニルメタンが
合計5〜150重量部の割合で添加されている付加
型イミド樹脂プレポリマー組成物。 4 付加型イミド樹脂プレポリマーが、分子量
15000を越える成分を7%以上含む特許請求の範
囲第3項記載の付加型イミド樹脂プレポリマー組
成物。[Claims] 1. 100 parts by weight of an addition type imide resin prepolymer made by reacting an unsaturated bisimide with a diamine,
An addition type imide resin prepolymer composition containing 5 to 60 parts by weight of N.N'-methylenebis(N-phenylmaleimide). 2 The addition type imide resin prepolymer has a molecular weight of
The addition type imide resin prepolymer composition according to claim 1, which contains 7% or more of a component exceeding 15,000. 3. To 100 parts by weight of an addition-type imide resin prepolymer made by reacting unsaturated bisimide and diamine,
An addition type imide resin prepolymer composition containing N.N'-methylenebis(N-phenylmaleimide) and 4.4'-diaminodiphenylmethane in a total amount of 5 to 150 parts by weight. 4 The addition type imide resin prepolymer has a molecular weight of
The addition type imide resin prepolymer composition according to claim 3, which contains 7% or more of a component exceeding 15,000.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18013185A JPS6241262A (en) | 1985-08-15 | 1985-08-15 | Addition type imide resin prepolymer composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18013185A JPS6241262A (en) | 1985-08-15 | 1985-08-15 | Addition type imide resin prepolymer composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6241262A JPS6241262A (en) | 1987-02-23 |
JPH0359106B2 true JPH0359106B2 (en) | 1991-09-09 |
Family
ID=16077953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18013185A Granted JPS6241262A (en) | 1985-08-15 | 1985-08-15 | Addition type imide resin prepolymer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6241262A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498573A (en) * | 1972-05-16 | 1974-01-25 | ||
JPS5092797A (en) * | 1973-12-17 | 1975-07-24 | ||
JPS569938A (en) * | 1979-07-03 | 1981-01-31 | Mitsubishi Electric Corp | Dust remover for cathode-ray tube |
JPS5856383A (en) * | 1981-09-29 | 1983-04-04 | 日立化成工業株式会社 | Method of producing printed circuit board |
JPS5856375A (en) * | 1981-09-30 | 1983-04-04 | Toshiba Corp | Oxide piezo-electric material |
-
1985
- 1985-08-15 JP JP18013185A patent/JPS6241262A/en active Granted
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS498573A (en) * | 1972-05-16 | 1974-01-25 | ||
JPS5092797A (en) * | 1973-12-17 | 1975-07-24 | ||
JPS569938A (en) * | 1979-07-03 | 1981-01-31 | Mitsubishi Electric Corp | Dust remover for cathode-ray tube |
JPS5856383A (en) * | 1981-09-29 | 1983-04-04 | 日立化成工業株式会社 | Method of producing printed circuit board |
JPS5856375A (en) * | 1981-09-30 | 1983-04-04 | Toshiba Corp | Oxide piezo-electric material |
Also Published As
Publication number | Publication date |
---|---|
JPS6241262A (en) | 1987-02-23 |
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