JPH0358467A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPH0358467A JPH0358467A JP1194945A JP19494589A JPH0358467A JP H0358467 A JPH0358467 A JP H0358467A JP 1194945 A JP1194945 A JP 1194945A JP 19494589 A JP19494589 A JP 19494589A JP H0358467 A JPH0358467 A JP H0358467A
- Authority
- JP
- Japan
- Prior art keywords
- element region
- bonding pad
- outside
- semiconductor chip
- integrated circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000009792 diffusion process Methods 0.000 abstract description 5
- 239000000969 carrier Substances 0.000 abstract description 3
- 230000004888 barrier function Effects 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract description 2
- 230000001681 protective effect Effects 0.000 abstract 6
- 238000000034 method Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体集積回路に関し、特に入力保護素子を有
する半導体集積回路に関する.〔従来の技術〕
従来の半導体集積回路は、第3図に示す様に半導体チッ
プ1の中央部に内部素子領域6を設け、内部素子領域の
外側に入力保護素子の一部又は全部を配置した入力保護
素子領域7を設け、入力保護素子領域7の外側で且つ半
導体チップ1の周縁部近傍にボンディングパッド3を配
置して設けていた.
通常、内部素子領域6と入力保護素子領域7との間には
、入力保護素子から半導体基板中に注入されるキャリア
が内部素子に達するのを防ぐ為に、電源電位あるいは接
地電位の拡散層又はウェルが形戒されていた。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor integrated circuit, and particularly to a semiconductor integrated circuit having an input protection element. [Prior Art] In a conventional semiconductor integrated circuit, as shown in FIG. 3, an internal element region 6 is provided in the center of a semiconductor chip 1, and a part or all of an input protection element is arranged outside the internal element region. An input protection element region 7 is provided, and bonding pads 3 are arranged outside the input protection element region 7 and near the peripheral edge of the semiconductor chip 1. Usually, between the internal element region 6 and the input protection element region 7, there is a diffusion layer or Well was being disciplined.
上述した従来の半導体集積回路は、入力保護素子の一部
あるいは全ての部分が、ボンディングパッドと内部素子
領域の間に配置されていたので、入力電圧の急激な変化
や大電圧の入力により入力保護領域で発生するキャリア
が内部素子に達しやすく、ラッチアップや、メモリセル
のデータ破壊などの原因となる事があった。又、これを
防ぐ為に、入力保護領域と内部素子領域との間に電源電
位あるいは接地電位の拡散層又はウェルを形成する為に
半導体チップ内に分離領域を確保せねばならず、半導体
チップの寸法の増大を招くという欠点があった。In the conventional semiconductor integrated circuit described above, a part or all of the input protection element is placed between the bonding pad and the internal element area, so input protection is difficult due to sudden changes in input voltage or input of large voltage. Carriers generated in this region easily reach internal elements, causing latch-up and data corruption in memory cells. In addition, to prevent this, it is necessary to secure an isolation region within the semiconductor chip in order to form a diffusion layer or well at power supply potential or ground potential between the input protection region and the internal element region. This had the disadvantage of causing an increase in size.
本発明の半導体集積回路は、半導体チップの中央部に設
けた内部素子領域と、前記内部素子領域の外側に設けた
ボンディングパッドと、前記ボンディングパッドの外側
の前記半導体チップの周縁部近傍に入力保護素子の全て
を配置して設けた入力保護素子領域とを有する。The semiconductor integrated circuit of the present invention includes an internal element area provided in the center of a semiconductor chip, a bonding pad provided outside the internal element area, and input protection provided near the periphery of the semiconductor chip outside the bonding pad. It has an input protection element area in which all of the elements are arranged.
次に、本発明について図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
第1図は本発明の第1の実施例を示すレイアウト図であ
る.
第l図に示すように、半導体チップ1の中央部に内部素
子領域6を設け、内部素子領域6の外側に隣接してボン
ディングパッド3を設け、ボンディングパッド3の外側
の半導体チップlの周縁部近傍に入力保護素子の全てを
配置した入力保護素子領域7を設けている。FIG. 1 is a layout diagram showing a first embodiment of the present invention. As shown in FIG. 1, an internal element area 6 is provided in the center of the semiconductor chip 1, a bonding pad 3 is provided adjacent to the outside of the internal element area 6, and a peripheral edge of the semiconductor chip 1 outside the bonding pad 3 is provided. An input protection element region 7 in which all input protection elements are arranged is provided nearby.
ここで、入力保護素子領域7は内部素子領域6に対して
、ボンディングパッド3を介在させて外側に配置されで
おり、内部素子まで数百ノtITIの距離を有する為、
入力保護素子部で発生し、半導体基板内に注入されたキ
ャリアは、拡散層やウェルによる障壁あるいはトラップ
を用いなくとも、内部素子に達することを防止できラッ
チアップやメモリセルのデータ破壊を防止できる.
第2図は本発明の第2の実施例を示すレイアウト図であ
る。Here, the input protection element region 7 is arranged outside the internal element region 6 with the bonding pad 3 interposed therebetween, and has a distance of several hundred knots to the internal element.
Carriers generated in the input protection element section and injected into the semiconductor substrate can be prevented from reaching internal elements without using barriers or traps such as diffusion layers or wells, preventing latch-up and data corruption in memory cells. .. FIG. 2 is a layout diagram showing a second embodiment of the present invention.
第2図に示すように、半導体チップ1の中央部に設けた
内部素子領域6の全周囲にボンディングパッド3を配置
して設け、ボンディングパッド3の外周の半導体チップ
の周縁部近傍に入力保護領域7を設けた以外は第1の実
施例と同様の横或を有している.
〔発明の効果〕
以上説明した様に本発明は、入力保護素子の全てをボン
ディングパッドの外側の半導体チップの周縁部近傍に配
置する事により、従来では必要であった入力保護部と内
部素子との間のラッチアップ対策用の拡散層又はウェル
を設けずに済み、従来と同等以下の専有面積でラッチア
ップ耐性の高い半導体集積回路が得られるという効果を
有する。As shown in FIG. 2, bonding pads 3 are arranged around the entire periphery of an internal element region 6 provided in the center of a semiconductor chip 1, and an input protection area is provided near the periphery of the semiconductor chip on the outer periphery of the bonding pads 3. This embodiment has the same width as that of the first embodiment except that 7 is provided. [Effects of the Invention] As explained above, the present invention arranges all of the input protection elements near the peripheral edge of the semiconductor chip outside the bonding pads, thereby eliminating the need for input protection parts and internal elements that were conventionally necessary. There is no need to provide a diffusion layer or well for latch-up countermeasures between the two, and a semiconductor integrated circuit with high latch-up resistance can be obtained with an occupied area equal to or smaller than the conventional one.
第1図及び第2図は本発明の第1及び第2の実施例を示
すレイアウト図、第3図は従来の半導体集積回路の一例
を示すレイアウト図である。1 and 2 are layout diagrams showing first and second embodiments of the present invention, and FIG. 3 is a layout diagram showing an example of a conventional semiconductor integrated circuit.
Claims (1)
部素子領域の外側に設けたボンディングパッドと、前記
ボンディングパッドの外側の前記半導体チップの周縁部
近傍に入力保護素子の全てを配置して設けた入力保護素
子領域とを有することを特徴とする半導体集積回路。An internal element area provided in the center of the semiconductor chip, a bonding pad provided outside the internal element area, and an input protection element all arranged near the peripheral edge of the semiconductor chip outside the bonding pad. What is claimed is: 1. A semiconductor integrated circuit comprising: an input protection element region;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1194945A JPH0358467A (en) | 1989-07-26 | 1989-07-26 | Semiconductor integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1194945A JPH0358467A (en) | 1989-07-26 | 1989-07-26 | Semiconductor integrated circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0358467A true JPH0358467A (en) | 1991-03-13 |
Family
ID=16332946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1194945A Pending JPH0358467A (en) | 1989-07-26 | 1989-07-26 | Semiconductor integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0358467A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014064028A (en) * | 2013-12-03 | 2014-04-10 | Toshiba Corp | Semiconductor device |
USRE47390E1 (en) | 2009-06-24 | 2019-05-14 | Kabushiki Kaisha Toshiba | Semiconductor device with a protection diode |
-
1989
- 1989-07-26 JP JP1194945A patent/JPH0358467A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE47390E1 (en) | 2009-06-24 | 2019-05-14 | Kabushiki Kaisha Toshiba | Semiconductor device with a protection diode |
JP2014064028A (en) * | 2013-12-03 | 2014-04-10 | Toshiba Corp | Semiconductor device |
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