JPH0353252A - Engraving method for precision printing - Google Patents
Engraving method for precision printingInfo
- Publication number
- JPH0353252A JPH0353252A JP1188450A JP18845089A JPH0353252A JP H0353252 A JPH0353252 A JP H0353252A JP 1188450 A JP1188450 A JP 1188450A JP 18845089 A JP18845089 A JP 18845089A JP H0353252 A JPH0353252 A JP H0353252A
- Authority
- JP
- Japan
- Prior art keywords
- plate
- absorber
- printing
- rays
- casing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 17
- 239000011521 glass Substances 0.000 claims abstract description 15
- 239000006096 absorbing agent Substances 0.000 claims abstract description 14
- 239000012530 fluid Substances 0.000 claims abstract description 14
- 230000003287 optical effect Effects 0.000 claims abstract description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 239000004973 liquid crystal related substance Substances 0.000 claims description 4
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 4
- 239000000463 material Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 238000002508 contact lithography Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000003086 colorant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、液晶カラーディスプレイのカラーフィルタ
ーなどの精密印刷体を印刷する精密印刷の刷版を製版す
る方法の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an improvement in a method for making a precision printing plate for printing precision printing materials such as color filters for liquid crystal color displays.
(従来の技術〉
前記したような製版方法としては、一般に写真製版技術
が採用され、精細パターンを右するマスター版の直下に
正合する位置にフォトレジスト層を設けた金属板(銅板
〉を配置し、露光光源からの露光光線をマスター版を通
して刷版となる金属板に照射し、所要の露光焼付けを行
ない、現像処理、腐蝕処理を経て製版する方法が行なわ
れている。(Prior art) As the above-mentioned plate-making method, photolithography is generally adopted, and a metal plate (copper plate) on which a photoresist layer is provided is placed directly under and directly under a master plate on which a fine pattern will be formed. However, a method is used in which a metal plate serving as a printing plate is irradiated with exposure light from an exposure light source through a master plate, the required exposure and baking is performed, and the plate is made after undergoing development treatment and corrosion treatment.
(発明が解決しようとする課題)
前記製版方法においては、露光光源に水銀灯が使用され
、水銀灯の照%1による熱線の作用で、金属板は、加熱
され、室温よりも約3〜5℃程度、高い温度に加熱され
、金属板に銅板を使用する場合には、そのような加熱に
よって膨脹し、銅板に形成される精細パターンの精度が
低下する問題点がある。特に、液晶カラーディスプレイ
のカラーフィルターのように、精細パターンがRGBの
三原色の超微細なストライブパターン〈ストライプ幅が
約100μm〉により構成される場合、銅板が温度上昇
によって膨脹すると、マスター版と寸分違わぬ精細パタ
ーンの再現は、朋持できず、精細パターンの印刷に適す
る刷版としては、不適格なものとならざるを得ない。(Problems to be Solved by the Invention) In the above plate-making method, a mercury lamp is used as an exposure light source, and the metal plate is heated by the action of the hot rays of the mercury lamp to a temperature of about 3 to 5 degrees Celsius above room temperature. When a copper plate is used as a metal plate that is heated to a high temperature, there is a problem that the copper plate expands due to such heating and the precision of the fine pattern formed on the copper plate decreases. In particular, when the fine pattern is composed of an ultra-fine stripe pattern (stripe width of about 100 μm) in the three primary colors of RGB, such as the color filter of a liquid crystal color display, when the copper plate expands due to temperature rise, it may become smaller than the master plate. It is impossible to reproduce exactly the same fine pattern, and the printing plate is unsuitable for printing fine patterns.
(課題を解決するための手段〉
そこで、この弁明は、精密印刷、特に、マスター版の精
細パターンを忠実に再現した刷版を得ることを目的とす
る製版方法を提供するものであって、この目的達或の手
段として、液晶カラーディスプレイのカラーフィルター
などの精密印刷体を印刷する精密印刷の刷版を製版する
方法において、マスター版を通して金属板の刷版に精細
パターンを焼付ける露光光線の照剣光路中に露光光線の
赤外線、遠赤外線等の長波長域である熱線成分を吸収す
る吸収体を介在させて露光焼付けを行なう点を課題解決
の手段とする。(Means for Solving the Problem) Therefore, this defense provides a plate-making method for precision printing, particularly for obtaining a printing plate that faithfully reproduces the fine pattern of a master plate. As a means to achieve this goal, in a method of making precision printing plates for printing precision printing materials such as color filters for liquid crystal color displays, exposure light is used to print a fine pattern on a metal plate through a master plate. A means to solve the problem is to perform exposure printing by interposing an absorber that absorbs heat ray components in the long wavelength range such as infrared rays and far infrared rays of the exposure beam in the optical path of the sword.
(発明の作用)
この発明によれば、露光光線の光路中に介在する吸収体
により、露光光線の赤外線、遠赤外線等の長波長域であ
る熱線成分を吸収し、露光焼付けの対象となる金属板の
刷版の温度上品を防ぎ、刷版の熱膨脹作用を抑止して、
刷版に形成される精細パターンの再現精度を向上する。(Operation of the Invention) According to the present invention, the absorber interposed in the optical path of the exposure light absorbs heat ray components in the long wavelength range such as infrared rays and far infrared rays, and the metal to be exposed and baked Prevents the temperature of the printing plate on the plate, suppresses the thermal expansion of the printing plate,
To improve the reproduction accuracy of fine patterns formed on printing plates.
(実施例)
この発明を図示の実施例により詳細に説明すると、水銀
灯を露光光源1とし、マスター版2、フォトレジスト層
を施した刷版(銅板)3の類で露光光源1に対面させ、
反射板11を備えた露光光源1からの露光光線をマスタ
ー版2を通して刷版3へ照銅し、露光、現像を行なう工
程を経て、腐蝕の工程後、刷版を製版する点は、従来の
工程と同じ工程を経るものであるが、この発明において
は、前記露光光源1とマスター版2の中間に露光光線の
熱線或分の吸収体4を配直している。また前記露光光源
1は純水が通る流路12に囲まれている。そしてマスタ
ー版2および刷版3は周囲にフィルム5を掛けこれを密
着焼枠6に設けたバキューム孔7から吸引して密着焼枠
6に固定している。(Embodiment) To explain this invention in detail with reference to the illustrated embodiment, a mercury lamp is used as the exposure light source 1, and a master plate 2 and a printing plate (copper plate) 3 coated with a photoresist layer are placed facing the exposure light source 1.
The point that the exposure light from an exposure light source 1 equipped with a reflector plate 11 is illuminated onto the printing plate 3 through the master plate 2, and the printing plate is made through the steps of exposure and development, and after the etching process is different from the conventional method. Although the process is the same as the above process, in this invention, an absorber 4 for a certain amount of the heat rays of the exposure light is rearranged between the exposure light source 1 and the master plate 2. Further, the exposure light source 1 is surrounded by a channel 12 through which pure water passes. A film 5 is placed around the master plate 2 and the printing plate 3, and the film is sucked through a vacuum hole 7 provided in the contact printing frame 6 and fixed to the contact printing frame 6.
吸収体4は、石英ガラスなどの耐熱ガラスからなるガラ
スケーシング41と、このガラスケーシング41の内部
を流動づる流休とからなり、ガラスケーシング41は、
焼き枠全面にqる平面寸法と、比較的低い高さ勺法を有
した内部が中空の構造であって、流体の流入口42と排
出口43が下部側と上部側それぞれに設けられ、下部側
に形成された流入口から注入された流体は、上部側の排
出口からフローされることで、ガラスケーシングの内部
に気泡が入らず、全面にわたり流体が流れ、ガラスケー
シングを通過する露光光線の光路を流体が完全に遮るよ
うに構成されている。The absorber 4 consists of a glass casing 41 made of heat-resistant glass such as quartz glass, and a fluid flowing inside the glass casing 41.
It has a hollow structure with a planar dimension extending over the entire surface of the baking frame and a relatively low height, and a fluid inlet 42 and an outlet 43 are provided on the lower and upper sides, respectively. The fluid injected from the inlet formed on the side flows from the outlet on the upper side, preventing air bubbles from entering the inside of the glass casing, allowing the fluid to flow over the entire surface, and preventing the exposure light beam passing through the glass casing. The structure is such that the optical path is completely blocked by the fluid.
前記流入口42から排出口43への流体流路を流れる流
体は、水、チオ尿素のような双極子モーメントが大きく
、露光光線の赤外線、遠赤外線等の長波長域である熱線
或分を吸収する特性を有し、しかも、露光光線の感光焼
付けに関与する紫外線成分を透過する流体であり、この
ような流体が流入口42から供給され、ガラスケーシン
グ41内を適宜の流速をもって排出口43へ流され、露
光焼付け工程中においては、ガラスケーシング41の内
部を流れる流体は、常時ランニングの状態にある。なお
、流体の供給は、適宜の供給源からポンプで前記流入口
へ供給し、前記排出口から再度、前記流入口へ循環させ
ても、所謂、垂れ流しでもよい。The fluid flowing through the fluid flow path from the inlet 42 to the outlet 43 has a large dipole moment, such as water or thiourea, and absorbs some of the heat rays in the long wavelength region such as infrared rays and far infrared rays of exposure light. It is a fluid that has the property of transmitting ultraviolet light components involved in photosensitive printing of exposure light, and is supplied from the inlet 42 and flows through the glass casing 41 to the outlet 43 at an appropriate flow rate. During the exposure and printing process, the fluid flowing inside the glass casing 41 is constantly in a running state. The fluid may be supplied from an appropriate supply source to the inlet by a pump and then circulated from the outlet to the inlet again, or by a so-called dripping method.
前記のような熱線成分の吸収休4の存在下において、刷
版に対する露光、焼付けを行なえば、水銀灯からなる露
光光源1からの露光光線は、まず、吸収休4を通過した
後、マスター版2に当り、ついで刷版3へ照則され、マ
スター版2の精細パターンが刷版へ焼付けられ、腐蝕の
後工程を経て刷版が製版されるものとなるが、露光光線
は、前記吸収体を通過することによって、その赤外線、
遠赤外線等の長波艮域である熱線成分が吸収され、マス
ター版2、刷版3への加熱作用が激減され、これらの熱
膨脹作用を抑止する。マスター版は、通常、熱膨脹係数
の小さなガラス板で構成されているので、前記熱膨脹作
用の抑制は、主として銅板のように熱膨脹係数の大きな
刷版に顕著な効果があり、前記吸収体による熱線成分吸
収作用によって、露光、焼句けの工程中、刷版は、ほぼ
室温と同じ温度に保たれ、露光、焼付けられる精細パタ
ーンは、マスター版に忠実なものであって、精細パター
ンの精度に狂いが生ずるおそれは皆無となり、精密印刷
に適性な刷版が賀版される。When exposure and printing are performed on a printing plate in the presence of the heat ray component absorption block 4 as described above, the exposure light from the exposure light source 1 consisting of a mercury lamp first passes through the absorption block 4 and then passes through the master plate 2. The exposure light beam is then directed onto the printing plate 3, the fine pattern of the master plate 2 is printed onto the printing plate, and the printing plate is made through the post-etching process. By passing through the infrared rays,
Heat ray components in the long wave range such as far infrared rays are absorbed, and the heating effect on the master plate 2 and printing plate 3 is drastically reduced, suppressing their thermal expansion effects. Since the master plate is usually composed of a glass plate with a small coefficient of thermal expansion, the suppression of the thermal expansion effect is particularly effective for printing plates with a large coefficient of thermal expansion, such as copper plates, and the heat ray component due to the absorber is Due to the absorption effect, the printing plate is kept at approximately the same temperature as room temperature during the exposure and printing processes, and the fine pattern exposed and printed is faithful to the master plate, and the accuracy of the fine pattern is not distorted. There is no risk of this occurring, and a printing plate suitable for precision printing is produced.
(発明の効果)
前記のように、この発明によれば、露光光線の光路中に
介在する吸収体により、露光光線の赤外線、遠赤外線等
の長波長域である熱線成分を吸収し、露光焼付けの対象
となる金属板の刷版の温度上昇を防ぎ、刷版の熱膨脹を
抑止して、刷版に形成される1?i細パターンの再現粘
度を向上し、精密印刷が厳格な精度をちって行なえる刷
版を製版できる。(Effects of the Invention) As described above, according to the present invention, the absorber interposed in the optical path of the exposure light absorbs heat ray components in the long wavelength range such as infrared rays and far infrared rays, thereby improving exposure printing. 1? prevents the temperature rise of the metal plate printing plate, which is the object of It is possible to make a printing plate that improves the reproduction viscosity of fine patterns and allows precision printing to be performed with strict precision.
第1図は、この発明の製版方法の一例を説明した概略説
明図である。
1・・・・・・露光光源 2・・・・・・マスタ
ー版3・・・・・・刷版 4・・・・・・吸
収体41・・・・・・ガラスケーシングFIG. 1 is a schematic diagram illustrating an example of the plate making method of the present invention. 1... Exposure light source 2... Master plate 3... Printing plate 4... Absorber 41... Glass casing
Claims (3)
の精密印刷体を印刷する精密印刷の刷版を製版する方法
において、マスター版を通して金属板の刷版に精細パタ
ーンを焼付ける露光光線の照射光路中に露光光線の赤外
線、遠赤外線等の長波長域である熱線成分を吸収する吸
収体を配置して露光焼付けを行なう精密印刷の製版方法
。(1) In a method of making precision printing plates for printing precision printing materials such as color filters for liquid crystal color displays, exposure is made in the optical path of exposure light that prints a fine pattern on a metal plate through a master plate. A precision printing plate-making method that performs exposure printing by arranging an absorber that absorbs heat ray components in the long wavelength range such as infrared and far infrared rays.
つて、露光光源とマスター版との中間である特許請求の
範囲第1項の精密印刷の製版方法。(2) The plate-making method for precision printing according to claim 1, wherein the absorber is arranged in the optical path of the exposure light beam, and is intermediate between the exposure light source and the master plate.
なるガラスケーシングで構成され、該ガラスケーシング
内に、水、チオ尿素などの前記熱線成分を吸収する双極
子モーメントの大きい流体を循環流動させて、前記吸収
体を通過する露光光線の前記熱線成分を吸収させること
を特徴とする特許請求の範囲第1項の精密印刷の製版方
法。(3) The absorber is composed of a glass casing made of heat-resistant glass such as quartz glass, and a fluid with a large dipole moment that absorbs the heat ray component, such as water or thiourea, is circulated in the glass casing. 2. The plate-making method for precision printing according to claim 1, wherein the heat ray component of the exposure light passing through the absorber is absorbed.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1188450A JPH0353252A (en) | 1989-07-20 | 1989-07-20 | Engraving method for precision printing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1188450A JPH0353252A (en) | 1989-07-20 | 1989-07-20 | Engraving method for precision printing |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0353252A true JPH0353252A (en) | 1991-03-07 |
Family
ID=16223909
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1188450A Pending JPH0353252A (en) | 1989-07-20 | 1989-07-20 | Engraving method for precision printing |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0353252A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63242913A (en) * | 1987-03-31 | 1988-10-07 | Mizusawa Ind Chem Ltd | Amorphous silica and production thereof |
-
1989
- 1989-07-20 JP JP1188450A patent/JPH0353252A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63242913A (en) * | 1987-03-31 | 1988-10-07 | Mizusawa Ind Chem Ltd | Amorphous silica and production thereof |
JPH0466810B2 (en) * | 1987-03-31 | 1992-10-26 | Mizusawa Industrial Chem |
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