JPH0350848A - Hard macro cell - Google Patents

Hard macro cell

Info

Publication number
JPH0350848A
JPH0350848A JP18480589A JP18480589A JPH0350848A JP H0350848 A JPH0350848 A JP H0350848A JP 18480589 A JP18480589 A JP 18480589A JP 18480589 A JP18480589 A JP 18480589A JP H0350848 A JPH0350848 A JP H0350848A
Authority
JP
Japan
Prior art keywords
wiring
hard
hard macro
macro cell
macro cells
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18480589A
Other languages
Japanese (ja)
Inventor
Takeo Niifuna
新舟 剛夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP18480589A priority Critical patent/JPH0350848A/en
Publication of JPH0350848A publication Critical patent/JPH0350848A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)

Abstract

PURPOSE:To effectively execute wiring and to sharply relax a restriction on a layout of a large-scale integrated circuit device by a method wherein a wiring region used for a wiring between other macro cells is formed inside a hard macro cell. CONSTITUTION:The following are laid out in advance on a semiconductor chip 1: a plurality of hard macro cells 2a, 2b to 2e; a hard macro cell 4 having a wiring region 3 used for wirings between other macro cells inside a cell. Parts between them are connected mutually by using wiring patterns 5 to constitute a large-scale integrated circuit device. The wiring patterns 5 which connect the hard macro cell 2a and the hard macro cells 2d, 2e mutually are interconnected and formed not only in a vacant region between the hard macro cells but also via the wiring region 3 on the hard macro cell 4. Thereby, a restriction on a layout can be relaxed sharply; a design itself of the wiring patterns can be made easy; a simulation of an overall circuit function can be executed simply and efficiently.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は半導体チップ上に組込まれて大規模集積回路装
置を実現するに好適なハードマクロセルに関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Field of Industrial Application) The present invention relates to a hard macro cell suitable for being incorporated on a semiconductor chip to realize a large-scale integrated circuit device.

(従来の技術) 近時、LSIの微細加工技術の進歩に伴い、1半導体チ
ップ上に集積可能な回路規模やその性能が飛躍的に向上
してきた。このような背景の下でのASIC技術の発展
に伴い、ユーザ仕様に基づく種々のカスタムLSIの製
作が行われるようになってきた。
(Prior Art) In recent years, with advances in LSI microfabrication technology, the scale and performance of circuits that can be integrated on one semiconductor chip have improved dramatically. With the development of ASIC technology against this background, various custom LSIs have been manufactured based on user specifications.

このようなカスタムLSIの製作技術の1つに予めライ
ブラリ化されているマクロセルを組合わせてユーザ仕様
に従う大規模集積回路装置を実現する技術がある。この
技術は半導体チップ上に回路仕様に応じた複数のマクロ
セルを組込み、これらのマクロセルを相互に配線して全
体的な回路機能をシミュレートしてユーザ仕様に応じた
大規模集積回路装置を開発するものである。
One of the techniques for manufacturing such a custom LSI is a technique for realizing a large-scale integrated circuit device according to user specifications by combining macrocells that have been prepared in a library in advance. This technology embeds multiple macrocells on a semiconductor chip according to circuit specifications, interconnects these macrocells, simulates the overall circuit function, and develops a large-scale integrated circuit device according to user specifications. It is something.

しかしてこのような半導体チップ上に組込まれて大規模
集積回路装置の実現に供せられるマクロセルには、マス
クパターンの形が固定されてその性能が保証されている
コンパクトなハードマクロセルと、柾々の半導体プロセ
スに対応でき、柔軟性に富むソフトマクロセルとがある
。然し乍ら、ソフトマクロセルはハードマクロセルに比
較してそのセル寸法が大きくなりがちであり、しかもそ
の実現手段(配線パターンの変化等)によって性能が変
化すると云う問題を有している。この為、大規模集積回
路装置の設計・開発に際して、複数のソフトマクロセル
間の配線パターン等を変更する都度、その性能(特性)
が変化してしまうので、その回路機能のシミュレーショ
ンを含む大規模集積回路装置の設計・開発を簡易に行う
ことができないと云う問題がある。
However, the macrocells that are incorporated on such semiconductor chips and used to realize large-scale integrated circuit devices include compact hard macrocells whose mask pattern shape is fixed and whose performance is guaranteed; There is a soft macro cell that is highly flexible and can be used in various semiconductor processes. However, soft macro cells tend to have larger cell dimensions than hard macro cells, and have the problem that their performance varies depending on the implementation means (changes in wiring patterns, etc.). For this reason, when designing and developing large-scale integrated circuit devices, each time the wiring pattern between multiple soft macro cells is changed, the performance (characteristics)
There is a problem in that it is not possible to easily design and develop a large-scale integrated circuit device including simulation of the circuit function.

これに対して上記ハードマクロセルはハードウェア的に
その実現構造が規定されているので、その性能(特性)
が予め既知となっており、ハードマクロセル間の配線パ
ターン等を変更する場合でもその性能を簡易にシミュレ
ートすることができる。しかし、逆にハードウェア的な
実現構造が定まっているので、配線パターンの変更に対
する融通性が非常に乏しいと云う不具合を持つ。具体的
には、半導体チップ上での配線領域が制限されるノで、
複数のハードマクロセルのレイアウトに大きな制限が加
わり、この結果、複数のハードマクロセル間での配線が
できなくなる場合も生じる。
On the other hand, the implementation structure of the above-mentioned hard macrocell is defined in terms of hardware, so its performance (characteristics)
is known in advance, and even if the wiring pattern between hard macro cells is changed, its performance can be easily simulated. However, since the hardware implementation structure is fixed, there is a problem in that there is very little flexibility in changing the wiring pattern. Specifically, since the wiring area on the semiconductor chip is limited,
A large restriction is placed on the layout of the plurality of hard macrocells, and as a result, wiring between the plurality of hard macrocells may not be possible.

(発明が解決しようとする課題) このように従来にあっては、半導体チップ上に複数のハ
ードマクロセルを組込んで大規模集積回路装置を実現す
る場合、ハードマクロセル間での配線領域が大きく制約
される為に、複数のハードマクロセルのレイアウト構造
に大きな制約が加わり、しかも場合によってはハードマ
クロセル間での配線ができなくなる事態も生じた。
(Problems to be Solved by the Invention) Conventionally, when a large-scale integrated circuit device is realized by incorporating a plurality of hard macro cells on a semiconductor chip, the wiring area between the hard macro cells is severely limited. This placed great restrictions on the layout structure of a plurality of hard macro cells, and in some cases, it became impossible to wire between the hard macro cells.

本発明はこのような事情を考慮してなされたちので、そ
の目的とするところは、複数のハードマクロセルのレイ
アウトに大きな制約を受けることなく、シかもマクロセ
ル間の配線を簡易に行うことを可能とする大規模集結回
路装置を設計・開発するに好適なハードマクロセルを提
供することにある。
The present invention has been developed with these circumstances in mind, and its purpose is to enable easy wiring between hard macro cells without being subject to major restrictions on the layout of a plurality of hard macro cells. An object of the present invention is to provide a hard macro cell suitable for designing and developing a large-scale integrated circuit device.

[発明の構成コ (課題を解決するだめの手段) 本発明に係るハードマクロセルは、予めそのマクロセル
の内部に、他のマクロセル間での配線に供する為の配線
領域を設けたことを特徴とするものである。
[Structure of the Invention (Means for Solving the Problem) The hard macrocell according to the present invention is characterized in that a wiring area for wiring between other macrocells is provided in advance inside the macrocell. It is something.

(作 用) 本発明によれば、ハードマクロセルの内部に、池のマク
ロセル間での配線に供する為の配線領域が設けられてい
るので、この種のハードマクロセルを半導体チップ上に
複数個組込んで大規模マクロセルを実現する場合であっ
ても、上記セル内部の配線領域を利用して他のマクロセ
ル間の配線を効果的に行うことが可能となる。
(Function) According to the present invention, a wiring area is provided inside the hard macrocell for wiring between the macrocells, so that a plurality of hard macrocells of this kind can be incorporated on a semiconductor chip. Even when realizing a large-scale macrocell, it is possible to effectively perform wiring between other macrocells by using the wiring area inside the cell.

またこのようにしてマクロセル間での配線を比較的自由
に行うことが可能となることから、半導体チップ上での
複数のハードマクロセルのレイアウトに関する制約も大
幅に緩和することができ、大規模集積回路装置の設計・
開発を容易に、効率良く行うことが可能となる。
In addition, since wiring between macrocells can be done relatively freely in this way, constraints on the layout of multiple hard macrocells on a semiconductor chip can be significantly relaxed, and large-scale integrated circuits Equipment design/
It becomes possible to carry out development easily and efficiently.

(実施例) 以下、図面を参照して本発明の一実施例に係ルハートマ
クロセルについて説明する。
(Embodiment) Hereinafter, a Lehart macrocell according to an embodiment of the present invention will be described with reference to the drawings.

第1図は実施例に係るハードマクロセルを用いて設計・
開発される大規模集結回路装置のレイアウト構成例を示
す図である。この第1図において1は半導体チップであ
り、この半導体チップl上ニ複数のハードマクロセル2
a、2b、〜2eと、セル内部に配線領域3を持つハー
ドマクロセル4とがレイアウトされる。そしてこれらの
マクロセル2a。
Figure 1 shows the design and design using the hard macrocell according to the example.
1 is a diagram showing an example of a layout configuration of a large-scale integrated circuit device to be developed; FIG. In FIG. 1, 1 is a semiconductor chip, and a plurality of hard macro cells 2 are provided on this semiconductor chip.
A, 2b, to 2e, and a hard macro cell 4 having a wiring region 3 inside the cell are laid out. And these macro cells 2a.

2b、〜2e、3間を配線パターン5を用いて相互に接
続して大規模集積回路装置が実現される。
A large-scale integrated circuit device is realized by interconnecting the wiring patterns 2b, 2e, and 3 using the wiring pattern 5.

しかして前記各ハードマクロセル2a、2b、〜2e、
4はそれぞれ所定の回路機能を備えたもので、回路仕様
に応じて半導体チップl上に組込まれて用いられる。こ
こでこの大規模集積回路装置が特徴とするところは、前
記ハードマクロセル4のセルF’1部に、予め他のマク
ロセル間での配線に供せられる配線領域3が設けられて
いる点であり、ノ1−ドマクロセル2a、2b、〜2e
間の配線パターン5の一部が上記配線領域3を介してな
されている点にある。
Therefore, each of the hard macro cells 2a, 2b, to 2e,
4 each has a predetermined circuit function, and is used by being incorporated on the semiconductor chip l according to the circuit specifications. The feature of this large-scale integrated circuit device is that a wiring area 3 is provided in advance in the cell F'1 portion of the hard macrocell 4, which is used for wiring between other macrocells. , node macrocells 2a, 2b, ~2e
A part of the wiring pattern 5 between them is formed through the wiring area 3.

具体的には、ハードマクロセル2aとハードマクロセル
2d 、 2eとを相互に接続する配線パターン5をハ
ードマクロセル間の空き領域のみならず、/’% −ド
マクロセル3上の配線領域4を介して配線形成している
点にある。
Specifically, the wiring pattern 5 that interconnects the hard macrocell 2a and the hard macrocells 2d and 2e is formed not only in the free space between the hard macrocells but also through the wiring area 4 on the /'% -domain macrocell 3. The point is that it is.

かくしてこのように、セル内部に配線領域3を持つハー
ドマクロセル4を用いて設計・開発される大規模集積回
路装置によれば、/%−ドマクロセル間の空き6n域の
みならすハードマクロセル4上のセル内部の配線領域3
をも有効に活用してノ飄−ドマクロセル2a、2b、〜
2e、4間の配線パターン5を配設形成することが可能
となるので、各ノ\−ドマクロセル2a、2b、〜2e
、4のレイアウトに対する制約を大幅に緩和し得ること
のみならず、配線バタン設計自体を容易に行うことが可
能となる。
Thus, according to the large-scale integrated circuit device designed and developed using the hard macro cell 4 having the wiring area 3 inside the cell, the cells on the hard macro cell 4 are only in the empty 6n area between the /%-domain macro cells. Internal wiring area 3
By effectively utilizing the
Since it becomes possible to arrange and form the wiring pattern 5 between 2e and 4, each node macrocell 2a, 2b, to 2e
, 4 can be significantly relaxed, and the wiring batten design itself can be easily performed.

またこのようなセル内部に配線領域3を持つノ1トマク
ロセル4を用いれば、各ハードマクロセル2a、2b、
〜2e、4の性能(特性)が予め既知であることから、
その全体的な性能を容易に求めることができるので、そ
の全体的な回路機能のンミュレトを簡易に効率良く行う
ことが可能となる。つまりソフトマクロセルを用いる場
合のように、その都度、回路性能を計算し直すことなく
、複数のハードマクロセルに対するレイアウト変更と配
線パターンの修正・変更とにより、所望とする回路仕様
を満たす大規模集積回路装置を効率的に開発・設計する
ことか可能となる。
Furthermore, if such a hard macro cell 4 having a wiring area 3 inside the cell is used, each hard macro cell 2a, 2b,
~2e, Since the performance (characteristics) of 4 is known in advance,
Since its overall performance can be easily determined, its overall circuit function can be easily and efficiently simulated. In other words, you can create a large-scale integrated circuit that meets desired circuit specifications by changing the layout of multiple hard macrocells and modifying/changing wiring patterns without having to recalculate the circuit performance each time, as is the case when using soft macrocells. It becomes possible to efficiently develop and design devices.

尚、本発明は上述した実施例に限定されるものではない
。例えばハードマクロセルの内部に設けられる配線領域
の大きさ、形状、その形成位置。
Note that the present invention is not limited to the embodiments described above. For example, the size, shape, and formation position of the wiring area provided inside the hard macrocell.

数等はマクロセル仕様に応じて定めれば良いものである
。また配線領域の形成手段等についても、例えばハード
マクロセル自体を多層化半導体構造としておき、その最
上部層に配線領域を形成する等、特に限定されるもので
はない。要するに本発明はその要旨を逸脱しない範囲で
種々変形して実施することができる。
The number etc. may be determined according to the macro cell specifications. Furthermore, the means for forming the wiring region is not particularly limited, and may be such that the hard macrocell itself has a multilayered semiconductor structure and the wiring region is formed in the uppermost layer thereof. In short, the present invention can be implemented with various modifications without departing from the gist thereof.

[発明の効果] 以上説明したように本発明によれば、ハードセルの内部
に他のマクロセル間での配線に洪せられる配線領域が設
けられているので、その性能が既知なる種々のハードマ
クロセルを用い、これらのレイアウトを比較的自由に設
定しながら、且つこれらの間の配線を容易に行って所望
とする回路仕様の大規模集積回路装置を容易に開発・設
計することが可能となる。しかもその機能シミュレトを
容易に行うことかできる等の実用上多大なる効果か奏せ
られる。
[Effects of the Invention] As explained above, according to the present invention, a wiring area is provided inside a hard cell that is covered by wiring between other macro cells, so that it is possible to connect various hard macro cells whose performance is known. It becomes possible to easily develop and design a large-scale integrated circuit device with desired circuit specifications by using the above-mentioned method, setting the layout of these components relatively freely, and easily wiring between them. Moreover, it has great practical effects, such as being able to easily simulate its functions.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実、進例に係る/X−ドマクロセル
を用いて実現される大規模集積回路装置のレイアラh 
RJ造例を示す図である。 1・・・半導体チップ、2a、2b、〜2e・・・/X
−ドマクロセル、3・・・ハードセル内部に形成される
配線領域、4・・セル内部に配線領域を持つノ\−ドマ
クロセル、5・・配線パターン。
FIG. 1 shows one embodiment of the present invention, a layerer h of a large-scale integrated circuit device realized using an advanced /X-domain macro cell.
It is a figure showing an example of RJ construction. 1... Semiconductor chip, 2a, 2b, ~2e.../X
- Domain macro cell, 3... Wiring area formed inside the hard cell, 4... Node macro cell having a wiring area inside the cell, 5... Wiring pattern.

Claims (1)

【特許請求の範囲】 半導体チップ上に組込まれて大規模集積回路装置の実現
に供せられるハードマクロセルにおいて、 予めマクロセルの内部に、他のマクロセル間での配線に
供する為の配線領域を設けたことを特徴とするハードマ
クロセル。
[Claims] In a hard macro cell that is incorporated on a semiconductor chip and used to realize a large-scale integrated circuit device, a wiring area is provided in advance inside the macro cell for wiring between other macro cells. A hard macro cell characterized by:
JP18480589A 1989-07-19 1989-07-19 Hard macro cell Pending JPH0350848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18480589A JPH0350848A (en) 1989-07-19 1989-07-19 Hard macro cell

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18480589A JPH0350848A (en) 1989-07-19 1989-07-19 Hard macro cell

Publications (1)

Publication Number Publication Date
JPH0350848A true JPH0350848A (en) 1991-03-05

Family

ID=16159603

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18480589A Pending JPH0350848A (en) 1989-07-19 1989-07-19 Hard macro cell

Country Status (1)

Country Link
JP (1) JPH0350848A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03151652A (en) * 1989-11-08 1991-06-27 Mitsubishi Electric Corp Semiconductor integrated circuit device
US6134704A (en) * 1998-04-03 2000-10-17 International Business Machines Corporation Integrated circuit macro apparatus
US6543040B1 (en) 2000-03-15 2003-04-01 International Business Machines Corporation Macro design techniques to accommodate chip level wiring and circuit placement across the macro
US8651867B2 (en) 2001-04-17 2014-02-18 Uri-Dent Ltd. Dental crowns

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03151652A (en) * 1989-11-08 1991-06-27 Mitsubishi Electric Corp Semiconductor integrated circuit device
US6134704A (en) * 1998-04-03 2000-10-17 International Business Machines Corporation Integrated circuit macro apparatus
US6543040B1 (en) 2000-03-15 2003-04-01 International Business Machines Corporation Macro design techniques to accommodate chip level wiring and circuit placement across the macro
US6883155B2 (en) 2000-03-15 2005-04-19 International Business Machines Corporation Macro design techniques to accommodate chip level wiring and circuit placement across the macro
US7096436B2 (en) 2000-03-15 2006-08-22 International Business Machines Corporation Macro design techniques to accommodate chip level wiring and circuit placement across the macro
US8651867B2 (en) 2001-04-17 2014-02-18 Uri-Dent Ltd. Dental crowns

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