JPH0349034A - Production of magnetic disk - Google Patents
Production of magnetic diskInfo
- Publication number
- JPH0349034A JPH0349034A JP18523989A JP18523989A JPH0349034A JP H0349034 A JPH0349034 A JP H0349034A JP 18523989 A JP18523989 A JP 18523989A JP 18523989 A JP18523989 A JP 18523989A JP H0349034 A JPH0349034 A JP H0349034A
- Authority
- JP
- Japan
- Prior art keywords
- film
- lubricating
- magnetic
- magnetic disk
- disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000000314 lubricant Substances 0.000 claims abstract description 22
- 230000001050 lubricating effect Effects 0.000 claims abstract description 20
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 12
- 230000001681 protective effect Effects 0.000 claims abstract description 12
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 10
- 239000011737 fluorine Substances 0.000 claims abstract description 10
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims description 25
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 10
- 229910021331 inorganic silicon compound Inorganic materials 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 6
- 229910052710 silicon Inorganic materials 0.000 abstract description 6
- 239000010703 silicon Substances 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 4
- 230000000052 comparative effect Effects 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 230000006378 damage Effects 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000005461 lubrication Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- UJPMYEOUBPIPHQ-UHFFFAOYSA-N 1,1,1-trifluoroethane Chemical compound CC(F)(F)F UJPMYEOUBPIPHQ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910020630 Co Ni Inorganic materials 0.000 description 1
- 229910002440 Co–Ni Inorganic materials 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 238000010669 acid-base reaction Methods 0.000 description 1
- -1 aminosilane compound Chemical class 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 210000001258 synovial membrane Anatomy 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は磁気記録装置に用いられる磁気ディスクなどの
磁気記録媒体の製造方法に関する。さらに詳しくは、磁
気ディスクの潤滑膜の形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a magnetic recording medium such as a magnetic disk used in a magnetic recording device. More specifically, the present invention relates to a method of forming a lubricating film on a magnetic disk.
［従来の技術］
従来の磁気ディスクの製造方法における磁気ディスクの
潤滑膜の形成方法としては、ザ・シンポジウム争オン・
メモリーψアンド・アドバンスト・レコーディング・チ
クノロシーズ（ＴｈｅＳｙｌＩｐｏｓｉｕｍ ｏｎ Ｍ
ｅｓｏｒｙ ａｎｄ Ａｄｖａｎｃｅｄ Ｒｅｃｏｒｄ
！ｒｕ：Ｔｃｃｂｎｏｌｏｇｆｅｓ） （サンノゼ、
カリフォルニア州、１０００年５月（ＳＡＮ ＪＯ８Ｅ
、 ＣＡＬＩＩ”０ＲＮＩＡ、 ＭＡＹ 。[Prior art] As a method for forming a lubricating film on a magnetic disk in a conventional magnetic disk manufacturing method, the method described in The Symposium on
Memory ψ and Advanced Recording Chinology (TheSylIposium on M
esory and Advanced Record
! ru:Tccbnologfes) (San Jose,
California, May 1000 (SAN JO8E
, CALII"0RNIA, MAY.
１９１１Ｇ））ノＭＳ−３−Ｃ−１および３−Ｃ−２ニ
記載ノコト＜、たとえば潤滑剤としてパーフロロアルキ
ルポリエーテルなどのフ・ライし炭素樹脂を用いるばあ
いに、その溶剤としてたとえばトリクロロトリフルオロ
エタン（商品名：フレオン、イー・アイ・デュポン社′
？ｉ）を使用し、非磁性基板」二に塗布、蒸着またはメ
ツキなどで形成した磁性層−トに、前記潤滑剤と溶剤と
からなる溶液を適当なスプレーガンなどを用いるスプレ
ー法、スピンコード法（回転塗布法）、デイツプ法（浸
漬法）により塗布する方法がある。1911G)) No MS-3-C-1 and 3-C-2, for example, when using a fried carbon resin such as perfluoroalkyl polyether as a lubricant, for example, trichloro as a solvent. Trifluoroethane (product name: Freon, EI DuPont)
? i), a solution consisting of the lubricant and solvent is applied to a magnetic layer formed by coating, vapor deposition or plating on a non-magnetic substrate by a spray method using an appropriate spray gun or the like, or a spin code method. There are two methods: (rotary coating method) and dip method (dipping method).
［発明が解決しようとする課題］
しかしながら、前記従来の製造法によって作製される磁
気ディスクは以上のごとき構成であるので、えられる潤
滑膜が比較的厚く、かつ均一性が不充分であった。この
ために磁気ディスク面が磁気ヘッドと摺動摩擦した際に
余分な潤滑剤が次第に磁気ヘッドに堆積し、これが原因
となって装置の動作中においては浮上が不安定となった
り、また装置の動作停止中においては磁気ヘッドと磁気
ディスク面とが吸着して動作不能となったりする問題が
ある。さらに、このような状態で磁気ディスクの回転を
続行すると、磁気ヘッドおよび磁気ディスク間に異常な
応力が加わり、磁気ディスク表面上の磁性膜を損傷する
のみならず、ばあいによっては、磁気ヘッドおよび磁気
デスクの双方が変形あるいは、破損するに到るという障
害を生ずることがあった。[Problems to be Solved by the Invention] However, since the magnetic disk manufactured by the conventional manufacturing method has the above-mentioned structure, the resulting lubricating film is relatively thick and has insufficient uniformity. For this reason, when the magnetic disk surface comes into sliding friction with the magnetic head, excess lubricant gradually accumulates on the magnetic head, causing unstable levitation during device operation, and the device's operation. While the magnetic head is stopped, there is a problem in that the magnetic head and the magnetic disk surface are attracted to each other and become inoperable. Furthermore, if the magnetic disk continues to rotate under such conditions, abnormal stress will be applied between the magnetic head and the magnetic disk, which will not only damage the magnetic film on the surface of the magnetic disk, but may also damage the magnetic head and the magnetic disk. Problems may occur in which both sides of the magnetic disk become deformed or damaged.
本発明は、前記従来の磁気ディスクの製造方法における
問題点を解消するためになされたもので、結合力が強く
、余剰の潤滑剤が残留していない均一な膜厚の潤滑膜か
えられる磁気ディスクの製造方法を提供することを目的
とする。The present invention was made in order to solve the problems in the conventional magnetic disk manufacturing method, and is a magnetic disk capable of changing a lubricating film with a strong bonding force and a uniform thickness without residual lubricant. The purpose is to provide a manufacturing method for.
［課題を解決するための手段］
本発明の磁気ディスクの製造方法は、磁性膜表面に保護
膜として無機シリコン化合物膜を形成し、ついでその表
面に潤滑膜として該無機シリコン化合物膜との結合力の
強いシランカップリング剤およびカルボキシル基含有フ
ッ素系潤滑剤を塗布し、さらに潤滑膜形成後にフロン系
溶液に浸漬するものである。[Means for Solving the Problems] The magnetic disk manufacturing method of the present invention includes forming an inorganic silicon compound film as a protective film on the surface of the magnetic film, and then forming a lubricating film on the surface of the inorganic silicon compound film to increase bonding strength with the inorganic silicon compound film. A strong silane coupling agent and a carboxyl group-containing fluorine-based lubricant are applied, and after a lubricating film is formed, the material is immersed in a fluorocarbon solution.
［作 用］
本発明の磁気ディスクの製造方法においては、無機シリ
コン化合物からなる保護膜が形成された磁気ディスク表
面に、該表面との結合力の強い〜たとえばアミノ変成シ
ランカップリング剤などのシランカップリング剤および
カルボキシル基含有フッ素系潤滑剤が塗布され、そのの
ち、フロン系溶液中に浸漬されるので、均一でディスク
面との結合力の強い潤滑膜を形成することができ、それ
により、磁気ディスクの耐Ｃ８Ｓ特性がきわめて高くな
り、信頼性が向上せしめられる。[Function] In the method for manufacturing a magnetic disk of the present invention, a silane having a strong bonding force with the surface, such as an amino-modified silane coupling agent, is applied to the surface of the magnetic disk on which a protective film made of an inorganic silicon compound is formed. A coupling agent and a carboxyl group-containing fluorine-based lubricant are applied and then immersed in a fluorocarbon-based solution, making it possible to form a uniform lubricating film with strong bonding strength to the disk surface. The C8S resistance of the magnetic disk becomes extremely high, and reliability is improved.
［実施例］
本発明の磁気ディスクの製造方法によれば、たとえば非
磁性基板上などに、所望により下地層などを介して形成
された磁性膜表面に、特定の保護膜が形成され、さらに
該保護膜表面に特定の潤滑膜が形成される。[Example] According to the method for manufacturing a magnetic disk of the present invention, a specific protective film is formed on the surface of a magnetic film formed, for example, on a non-magnetic substrate, optionally with an underlayer etc. A specific lubricant film is formed on the surface of the protective film.
前記磁性膜の材料としては、とくに限定はなく、その具
体例としてはＣｏ−Ｎｉ 、 Ｇｏ−Ｐｔ 、 Ｇｏ−
Ｎｌ−Ｚｒなどがあげられる。The material of the magnetic film is not particularly limited, and specific examples include Co-Ni, Go-Pt, Go-
Examples include Nl-Zr.
磁性膜の厚さおよび形成方法にもとくに限定はなく、た
とえば２０１）〜ＪＯＯＤＡの厚さおよびスパッタリン
グ法、蒸着法、イオンブレーティング法などの形成方法
が具体例としてあげられる。There are no particular limitations on the thickness and formation method of the magnetic film, and specific examples include thicknesses of 201) to JOODA and formation methods such as sputtering, vapor deposition, and ion blating.
前記保護膜は無機シリコン化合物からなる保護膜である
。この無機シリコン化合物の具体例としては５１０２、
ＳＩＯ、５ｉｄｅ、 Ｓａｃなどがあげられる。The protective film is a protective film made of an inorganic silicon compound. Specific examples of this inorganic silicon compound include 5102,
Examples include SIO, 5ide, and Sac.
保護膜の厚さおよび形成方法にもとくに限定はなく、た
とえば２００〜１０００人の厚さ、スパッタリング法、
蒸召法、イオンビーム法、イオンブレーティング法など
の形成方法が具体例としてあげられる。There are no particular limitations on the thickness and formation method of the protective film, for example, a thickness of 200 to 1000, a sputtering method,
Specific examples include forming methods such as a steaming method, an ion beam method, and an ion blating method.
前記潤滑膜は、シランカップリング剤およびカルボキシ
ル基含有フッ素系潤滑剤を塗布して形成される。The lubricating film is formed by applying a silane coupling agent and a carboxyl group-containing fluorine-based lubricant.
前記シランカップリング剤の具体例としては、そのうえ
に塗布されるカルボキシル基含有フッ素系潤滑剤との結
合力が強いアミノ変成シランカップリング剤、エポキシ
変成シランカップリング剤などが好ましい。Preferred examples of the silane coupling agent include amino-modified silane coupling agents and epoxy-modified silane coupling agents, which have a strong bonding force with the carboxyl group-containing fluorine-based lubricant coated thereon.
前記カルボキシル基含有フッ素系潤滑剤の具体例として
は、カル、ホキシル基を有するパーフロロポリエーテル
類などがあげられる。Specific examples of the carboxyl group-containing fluorine-based lubricant include perfluoropolyethers having carboxyl and phoxyl groups.
前記シランカップリング剤およびカルボキシル基含有フ
ッ素系潤滑剤の塗布方法としては、たとえば前者をデイ
ツプ法などにより塗布し大気雰囲気中、温度３０〜１５
０℃で０．２〜１時間焼成乾燥したのち、後者をデイツ
プ法などにより塗布し大気雰囲気中、温度３０〜１５０
℃で０．２〜１時間焼成乾燥する方法などがあげられる
。As a method for applying the silane coupling agent and the carboxyl group-containing fluorine-based lubricant, for example, the former is applied by a dip method, etc., and heated at a temperature of 30 to 15 ℃ in an air atmosphere.
After baking and drying at 0°C for 0.2 to 1 hour, the latter was applied by a dip method or the like and heated at a temperature of 30 to 150°C in an air atmosphere.
Examples include a method of baking and drying at a temperature of 0.2 to 1 hour.
本発明の製造方法によれば、前記潤滑膜が形成された磁
気ディスクはフロン系溶液に浸漬される。According to the manufacturing method of the present invention, the magnetic disk on which the lubricating film is formed is immersed in a fluorocarbon solution.
前記フロン系溶液の具体例としては、フロリナ−） Ｆ
ｅ１２ （住友スリーエム■製）などがあげられる。Specific examples of the fluorocarbon-based solution include Florina) F
Examples include e12 (manufactured by Sumitomo 3M ■).
また、前記浸漬１１！ｊの温度および時間にもとくに限
定はなく、２０〜４０℃の温度で１〜２０分間などの条
件が採用されうる。Also, the above-mentioned immersion 11! The temperature and time of j are not particularly limited, and conditions such as a temperature of 20 to 40°C for 1 to 20 minutes may be adopted.
浸漬後の磁気ディスクは、たとえば大気中、３０〜１０
０℃の２５Ｘ Ｉｌｊで０．２〜１時間乾燥せしめられ
る。After immersion, the magnetic disk is exposed to a temperature of 30 to 10
Dry in 25X Ilj at 0°C for 0.2-1 hour.
以下、本発明の実施例を図に基づいて説明する。Embodiments of the present invention will be described below based on the drawings.
実施例１
第１図は、本発明の方法の一実施例により作製された磁
気ディスクの部分断面図である。第１図において、（１
）は非磁性基板、（２は非磁性基板（１）上にＮＩ−Ｐ
めっきを１５論被覆した下地硬化膜である。Example 1 FIG. 1 is a partial cross-sectional view of a magnetic disk manufactured by an example of the method of the present invention. In Figure 1, (1
) is a non-magnetic substrate, (2 is NI-P on the non-magnetic substrate (1)
This is a cured base film coated with plating.
さらに、これを所定の粗さに研摩したのち、厚さ２００
０人の下地クロム膜（３）を形成し、ひき続いて、スパ
ッタ法によりＣｏ−Ｎ１−Ｃｒ合金磁性膜（４）を連続
的に形成した。さらにひき続いて、イオンビーム法によ
り５ＩＯＣからなる無機シリコン化合物膜（保護ＩＩ！
） １５）を５００人の厚さに形成した。つぎに、無
機シリコン・化合物膜（５）のうえに、アミノ変成シラ
ンカップリング剤およびカルボキシル基含有フッ素系潤
滑剤を用いて以下のとおりの形成条件にて、１力滑膜（
６）を形成した。Furthermore, after polishing this to a predetermined roughness, it was polished to a thickness of 200 mm.
A base chromium film (3) was formed, and then a Co--N1--Cr alloy magnetic film (4) was continuously formed by sputtering. Furthermore, an inorganic silicon compound film (Protection II!
) 15) was formed to a thickness of 500 people. Next, on top of the inorganic silicon/compound film (5), a single-force synovial membrane (
6) was formed.
まず、前記無機シリコン化合物膜（５目二に、１４１文
０゜Ｌｇ／ｇ（溶媒：エタノール）のアミノ変成シラン
カップリング剤をデイツプ法により塗布し、そののち、
１００°Ｃ１０，２時間で焼成乾燥（乾燥後膜厚：約２
０人）させ、ひき続き、濃度１ｇ／Ω （溶謀フロリナ
ートＦＣ７２、住人スリーエム沖製）のカルボキシル基
含有フッ素系潤滑剤をデイツプ法により塗布し、そのの
ち、１００℃、１時間で焼成乾燥（乾燥後潤滑膜合計膜
厚：約３０〜４０人）させた。First, an amino-modified silane coupling agent of 141% 0°Lg/g (solvent: ethanol) was applied to the inorganic silicon compound film (5th layer and 2nd layer) by a dip method, and then,
Baked and dried at 100°C for 10.2 hours (film thickness after drying: approx. 2
0 people), and then a carboxyl group-containing fluorine lubricant with a concentration of 1 g/Ω (Fususei Fluorinert FC72, manufactured by Jujutsu 3M Oki) was applied by the dip method, and then baked and dried at 100°C for 1 hour ( Total thickness of lubricating film after drying: about 30 to 40 people).
さらにひき続き、フロン系溶媒（フロリナ−１・ＰＣ？
２、住人スリーエム沖製）中に浸漬して余剰の潤滑剤を
除去したのち、１００℃、１時間で焼成乾燥させた。Furthermore, fluorocarbon-based solvent (Florina-1/PC?
2. After removing the excess lubricant by immersing it in 3M Oki Co., Ltd.), it was fired and dried at 100°C for 1 hour.
比較例１〜４
実施例１と同様に磁性膜を形成したディスク」−に、実
施例１とは異なる保護・潤滑処理を施し、比較例１〜４
の磁気ディスクを作成した。Comparative Examples 1 to 4 A disk on which a magnetic film was formed in the same manner as in Example 1 was subjected to protection and lubrication treatment different from that in Example 1, and Comparative Examples 1 to 4 were obtained.
created a magnetic disk.
比較例１〜４に施した保護・潤滑処理を実施例っぎに、
実施例１および比較例１〜４の５種類の磁気ディスクそ
れぞれ５枚ずつについて、ＣＳＳテスターで検証実験を
行なった。The protection and lubrication treatment applied to Comparative Examples 1 to 4 was applied to the example.
A verification experiment was conducted using a CSS tester for five magnetic disks each of five types of Example 1 and Comparative Examples 1 to 4.
その結果を第２表に示す。第２表中、Ｏは良好、第２表
かられかるように、実施例１の磁気ディスクは、初期摩
擦係数が０．１５〜０．２と小さく、Ｃ８Ｓ ５万回後
の摩擦係数も０．２０〜０．２５と小さく安定していた
。またＣ３９５万回後のディスク表面のヘッド走行部分
はキズなどの異常もみられず、５日間のヘッド放置によ
る吸着試験においても吸着は発生しなかった。The results are shown in Table 2. In Table 2, O is good. As can be seen from Table 2, the magnetic disk of Example 1 has a small initial friction coefficient of 0.15 to 0.2, and the friction coefficient after 50,000 cycles of C8S is also 0. It was small and stable at .20 to 0.25. Further, after 3.95 million cycles of C, no abnormalities such as scratches were observed on the disk surface where the head ran, and no adsorption occurred in an adsorption test in which the head was left for 5 days.
これに対して、比較例１〜４の磁気ディスクは、初期摩
擦係数は０．１５〜０．２０と小さく安定していたが、
Ｃ９Ｓ ５万回後の摩擦係数の増大や、Ｃ８Ｓによるデ
ィスク上のキズやヘッド吸着が発生した。On the other hand, the magnetic disks of Comparative Examples 1 to 4 had a small and stable initial friction coefficient of 0.15 to 0.20, but
C9S After 50,000 cycles, the friction coefficient increased, and C8S caused scratches on the disk and head adsorption.
［発明の効果］
以上のように、本発明によれば磁気ディスク上の無機シ
リコン膜にたとえばアミノシラン化合物を結合し、さら
に、カルボキシル基含有フッ素系潤滑剤を酸塩基反応に
より化学結合させて潤滑膜を形成し、さらにフロン系溶
媒に浸漬して余剰の潤滑剤を除去することによって、膜
厚が均一で磁気ディスク表面と強固に結合した潤滑膜を
うろことができる。同時に、該潤滑膜は化学的安定性が
増し、潤滑剤劣化による潤滑性能の低下を抑さえること
ができる。[Effects of the Invention] As described above, according to the present invention, an aminosilane compound, for example, is bonded to an inorganic silicon film on a magnetic disk, and a fluorine-based lubricant containing a carboxyl group is further chemically bonded by an acid-base reaction to form a lubricating film. By forming a lubricant film and then immersing it in a fluorocarbon solvent to remove excess lubricant, a lubricant film with a uniform thickness and firmly bonded to the magnetic disk surface can be formed. At the same time, the chemical stability of the lubricating film is increased, and a decrease in lubricating performance due to deterioration of the lubricant can be suppressed.
したがって、ヘッドと磁気ディスク間の摩耗を少なくし
、ヘッドの衝突による破壊、損傷を抑えることができる
とともに、ヘッド停止時のヘッド−円板間の吸着も抑え
ることができるため、長期間にわたり信頼性の高い磁気
ディスクの走行を行なうことができる計り点がある。Therefore, it is possible to reduce wear between the head and the magnetic disk, suppress destruction and damage caused by head collisions, and also suppress adhesion between the head and the disk when the head is stopped, ensuring long-term reliability. There is a measuring point that can perform a high magnetic disk run.
第１図は本発明の方法の一実施例により作製された磁気
ディスクの部分断面図である。
（図面の主要符号）
（４）：磁性膜
（５）：保護膜
（６）：潤滑膜FIG. 1 is a partial sectional view of a magnetic disk manufactured by an embodiment of the method of the present invention. (Main symbols in the drawing) (4): Magnetic film (5): Protective film (6): Lubricating film
Claims (1)
膜を形成し、該保護膜の表面に潤滑膜としてシランカッ
プリング剤およびカルボキシル基含有フッ素系潤滑剤を
塗布したのち、フロン系溶液に浸漬することを特徴とす
る磁気ディスクの製造方法。(1) Form a protective film made of an inorganic silicon compound on the surface of the magnetic film, apply a silane coupling agent and a fluorine-based lubricant containing a carboxyl group to the surface of the protective film as a lubricating film, and then immerse it in a fluorocarbon solution. A method for manufacturing a magnetic disk, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18523989A JPH0349034A (en) | 1989-07-17 | 1989-07-17 | Production of magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18523989A JPH0349034A (en) | 1989-07-17 | 1989-07-17 | Production of magnetic disk |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0349034A true JPH0349034A (en) | 1991-03-01 |
Family
ID=16167325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18523989A Pending JPH0349034A (en) | 1989-07-17 | 1989-07-17 | Production of magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0349034A (en) |
-
1989
- 1989-07-17 JP JP18523989A patent/JPH0349034A/en active Pending
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