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Priority to JP1985065651UpriorityCriticalpatent/JPH0348194Y2/ja
Publication of JPS61180140UpublicationCriticalpatent/JPS61180140U/ja
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Publication of JPH0348194Y2publicationCriticalpatent/JPH0348194Y2/ja
Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operation
Method for transporting at least one vaporous substance through the wall of a vacuum chamber and into the vacuum chamber and a device for executing and utilizing the method