JPH0345817B2 - - Google Patents

Info

Publication number
JPH0345817B2
JPH0345817B2 JP2938982A JP2938982A JPH0345817B2 JP H0345817 B2 JPH0345817 B2 JP H0345817B2 JP 2938982 A JP2938982 A JP 2938982A JP 2938982 A JP2938982 A JP 2938982A JP H0345817 B2 JPH0345817 B2 JP H0345817B2
Authority
JP
Japan
Prior art keywords
halftone
halftone dots
auxiliary
force
reducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2938982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58145939A (ja
Inventor
Takeo Kodaira
Yoshasu Ito
Takao Taguchi
Koji Kumagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP2938982A priority Critical patent/JPS58145939A/ja
Publication of JPS58145939A publication Critical patent/JPS58145939A/ja
Publication of JPH0345817B2 publication Critical patent/JPH0345817B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0952—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer comprising silver halide or silver salt based image forming systems, e.g. for camera speed exposure

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
JP2938982A 1982-02-25 1982-02-25 減力方法 Granted JPS58145939A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2938982A JPS58145939A (ja) 1982-02-25 1982-02-25 減力方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2938982A JPS58145939A (ja) 1982-02-25 1982-02-25 減力方法

Publications (2)

Publication Number Publication Date
JPS58145939A JPS58145939A (ja) 1983-08-31
JPH0345817B2 true JPH0345817B2 (enExample) 1991-07-12

Family

ID=12274778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2938982A Granted JPS58145939A (ja) 1982-02-25 1982-02-25 減力方法

Country Status (1)

Country Link
JP (1) JPS58145939A (enExample)

Also Published As

Publication number Publication date
JPS58145939A (ja) 1983-08-31

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