JPH0342186A - Electric resistance welding electrode - Google Patents
Electric resistance welding electrodeInfo
- Publication number
- JPH0342186A JPH0342186A JP17776089A JP17776089A JPH0342186A JP H0342186 A JPH0342186 A JP H0342186A JP 17776089 A JP17776089 A JP 17776089A JP 17776089 A JP17776089 A JP 17776089A JP H0342186 A JPH0342186 A JP H0342186A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- film
- welding
- metal
- pure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003466 welding Methods 0.000 title claims abstract description 37
- 229910052751 metal Inorganic materials 0.000 claims abstract description 39
- 239000002184 metal Substances 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 25
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 10
- 239000000956 alloy Substances 0.000 claims abstract description 10
- 230000009257 reactivity Effects 0.000 claims abstract description 10
- 229910001182 Mo alloy Inorganic materials 0.000 claims abstract description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 4
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 238000000034 method Methods 0.000 abstract description 4
- 229910001335 Galvanized steel Inorganic materials 0.000 abstract 2
- 239000008397 galvanized steel Substances 0.000 abstract 2
- 206010037660 Pyrexia Diseases 0.000 abstract 1
- 239000010953 base metal Substances 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 4
- 238000007750 plasma spraying Methods 0.000 description 4
- 238000005507 spraying Methods 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000007751 thermal spraying Methods 0.000 description 2
- 229910001106 Ho alloy Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000002470 thermal conductor Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、Ｚｎ、 Ｚｎ合金めっき鋼板用の電気抵抗
溶接用電極に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electrode for electric resistance welding for Zn or Zn alloy plated steel sheets.
スポント溶接等、電気抵抗）６接用電極は、被溶接物に
溶接電流を供給することと、その部分に必要な加圧力を
伝達することを目的とする。従って、前記電極において
は、溶接に必要な大電流を溶接個所に集中させる必要か
ら、これに耐える良導電性と形状および）容接中の加圧
力に対抗する高温硬さ、さらに先端の冷却を高める良熱
伝導性が必要である。The purpose of the grounding electrode (for spont welding, etc.) is to supply welding current to the object to be welded and to transmit the necessary pressing force to that part. Therefore, in order to concentrate the large current required for welding at the welding point, the electrode must have good conductivity and shape to withstand this, high temperature hardness to withstand the pressure during welding, and cooling of the tip. Good thermal conductivity is required.
第３図は、ＪＩＳに規格されたＣ型（円錐台型）電極に
よってスポント溶接を行なう場合の１例を示す説明図で
ある。図面において、２は電極、５は被溶接材である。FIG. 3 is an explanatory diagram showing an example of spot welding using a C-type (truncated cone-shaped) electrode standardized by JIS. In the drawings, 2 is an electrode, and 5 is a material to be welded.
このような電極材料には、電気および熱の良導体である
と同時に、高温において硬いことが要求されるが、両特
性は、一般に相反する性質があるので、用途によってそ
の材料は適宜選択されているが、一般に、Ｃｒ −Ｃｕ
合金、ＡｌｘＯｘ分散Ｃｕ合金等の、Ｃｕベースの金属
が使用されている。Such electrode materials are required to be good electrical and thermal conductors as well as being hard at high temperatures, but since these two properties are generally contradictory, the material must be selected appropriately depending on the application. However, in general, Cr-Cu
Cu-based metals have been used, such as alloys, AlxOx dispersed Cu alloys.
〔発明が解決しようとする課題］
上述したＣｕベースの電極を使用して、Ｚｎ、 Ｚｎ合
金めっき防錆鋼板（以下’Ｚｎめっき鋼板」という）を
電気抵抗溶接によって溶接する場合において、ＣｕとＺ
ｎの反応によって、電極先端の拡大、変形が生じ、溶接
品質の早期低下を招（問題がある。[Problems to be Solved by the Invention] When welding Zn and Zn alloy-plated anticorrosive steel sheets (hereinafter referred to as 'Zn-plated steel sheets') by electric resistance welding using the above-mentioned Cu-based electrode, Cu and Z
The reaction of n causes expansion and deformation of the electrode tip, leading to early deterioration of welding quality (problematic).
このため、Ｚｎとの反応性が小さく、しかも、前述した
良導体であるための低抵抗化および高温での高い硬さを
実現することができる電気抵抗溶接用電極が望まれてお
り、従来から、下記の電極が提案されている。For this reason, there is a demand for an electric resistance welding electrode that has low reactivity with Zn and can achieve low resistance and high hardness at high temperatures due to its good conductivity as described above. The following electrodes have been proposed.
■ Ｃｕベースの電極基材先端の表面に、Ｎｉ、 Ｃｏ
。■ Ni and Co are added to the surface of the tip of the Cu-based electrode base material.
.
Ｆｅを電気めっきすることによって、電極基材の表面を
コーティングした電極。An electrode whose surface is coated with an electrode base material by electroplating Fe.
この電極は、コーティングしたＮｉ、 Ｃｏ、 Ｆｃと
Ｚｎとの反応性がＣｕよりも小さいものの、全＜ Ｚｎ
と反応しないというわけではなく、また、高温での硬さ
も不足している問題がある。Although the reactivity of coated Ni, Co, and Fc with Zn is lower than that of Cu, total < Zn
This does not mean that it does not react with other materials, but it also has the problem of insufficient hardness at high temperatures.
■ Ｃｕヘースの電極基材先端の表面に、ＴｉＮ （
チタンナイトライド）等の低電気抵抗、且つ、高ｍでの
高い硬さを有するセラミックスをイオンブレーティング
等によってコーティングした電極。■ TiN (
An electrode coated with a ceramic material such as titanium nitride (titanium nitride) that has low electrical resistance and high hardness at high m by ion blating or the like.
この電極においては、コーティングされたセラミックス
は良導体であり、且つ、Ｚｎと反応しない。In this electrode, the coated ceramic is a good conductor and does not react with Zn.
しかしながらセラミックス材料は高価でありまた、イオ
ンブレーティング加工はコストが高く、しかも、セラミ
ックス皮膜は剥離しやすいという問題がある。However, there are problems in that ceramic materials are expensive, ion-blating processing is expensive, and the ceramic film is easy to peel off.
■ Ｚｎと反応しに＜＜、Ｆｅよりも電気抵抗の少ない
Ｗ、ＭｏあるいはＭｏを９８ｗ ｔ 、 Ｚ以上含有す
る１０合金（以下ｒＭｏ合金」という）等の金属を第４
図に示すように、Ｃｕベースの電極基材先端に埋設した
電極。第４図において、１は電極基材、６は埋設された
金属である。■ Metals such as W, Mo, or 10 alloys containing Z or more (hereinafter referred to as rMo alloys) containing 98 wt or more of Mo, which react with Zn and have lower electrical resistance than Fe, are used as the fourth metal.
As shown in the figure, an electrode embedded in the tip of a Cu-based electrode base material. In FIG. 4, 1 is an electrode base material, and 6 is a buried metal.
この電極においては、埋設された金属に厚みがあるので
、電気抵抗が大きくなり、連Ｖｔ溶接時に埋設された金
属と口板とが溶着する問題が生じる。In this electrode, since the buried metal is thick, the electrical resistance becomes large, causing a problem that the buried metal and the mouth plate are welded together during continuous Vt welding.
従って、この発明の目的は、Ｚｎめっき鋼板の溶接にお
いて、上述の問題点を解決し、さらに、低電気抵抗、且
つ、高温での高い硬さを有する、電気抵抗溶接用電極を
提供することにある。Therefore, an object of the present invention is to solve the above-mentioned problems in welding Zn-plated steel sheets, and to provide an electrode for electric resistance welding that has low electric resistance and high hardness at high temperatures. be.
この発明の要旨は、下記からなっている。 The gist of this invention consists of the following.
■ Ｃｕ系合金からなる電極基材先端の表面に、高温で
の硬さが高く、しかも、Ｚｎとの反応性が小さい金属か
らなる皮膜が形成されていることを特徴とする電気抵抗
）６接用電極。■Electrical resistance) 6 contact, characterized by the fact that a film made of a metal that is highly hard at high temperatures and has low reactivity with Zn is formed on the surface of the tip of the electrode base material made of a Cu-based alloy. electrode.
■ Ｃｕ系金属からなる′：ｒＬ極基材先、瑞の表面に
、純Ｃｕからなる皮膜が形成され、さらに、前記純Ｃｕ
からなる皮膜の表面に、：質屋での硬さが高く、しかも
、Ｚｎとの反応性が小さい金属からなる皮膜が形成され
ていることを特徴とする電気抵抗溶接用電極。■ A film made of pure Cu is formed on the tip of the rL electrode base material made of Cu-based metal, and on the surface of the rust, and furthermore, the pure Cu
An electric resistance welding electrode characterized in that a film made of a metal having high hardness at a pawn shop and low reactivity with Zn is formed on the surface of the film.
次に、この発明を図面を参照しながら説明する。Next, the present invention will be explained with reference to the drawings.
第１図は、第１の発明を示す断面図である。第１図に示
すように、Ｃｕ系金属からなる電ｐｉ 基材１の先端の
表面には、金属皮膜３が形成されている。FIG. 1 is a sectional view showing the first invention. As shown in FIG. 1, a metal film 3 is formed on the surface of the tip of an electric pi base material 1 made of a Cu-based metal.
金属皮膜３としては、高温での硬さが著しく高く、且つ
、Ｚｎとの反応性が・ＩＸさい金属、即ち、Ｗ、Ｍ。As the metal film 3, metals having extremely high hardness at high temperatures and low reactivity with Zn, ie, W and M, are used.
またはＭｏ含有量が９８ｗｔ、％以上のＨＯ合金を使用
する。Alternatively, an HO alloy with a Mo content of 98 wt.% or more is used.
Ｗ、ＭｏおよびＭｏ合金は、いずれも電気めっきを施す
ことが不可能な金属なので、これらの金属皮膜３はプラ
ズマ溶射によって形成される。Ｗ、Ｍ。Since W, Mo, and Mo alloy are all metals that cannot be electroplated, the metal coating 3 of these is formed by plasma spraying. W,M.
および旧合金は、その導電性がＣｕよりは悪いものの、
Ｆｅよりは良好である。従って、金冗皮１］莫３の厚み
を適当に薄くすることにより、溶接性Ｊ、９ ：３化す
るまでに導電性が悪化することはない。たた５、形成さ
れる金属皮膜３の厚さが５００μｍを超えると、金属皮
膜３中において熱が発生し１．・星りよよ）Ｉ率が大き
くなる。一方、金属皮膜３の厚さが、５Ｑ、、、ｍ未満
で：よ、前記皮膜に割れが入る。従って、金属皮膜３の
厚さは５０〜５００＝ｖの■フ囲が好ま５い。Although the conductivity of the old alloy and the old alloy is worse than that of Cu,
It is better than Fe. Therefore, by appropriately reducing the thickness of the metal layer, the conductivity will not deteriorate until the weldability J is 9:3. 5. If the thickness of the metal film 3 to be formed exceeds 500 μm, heat will be generated in the metal film 3.・Star Riyoyo) I rate increases. On the other hand, if the thickness of the metal film 3 is less than 5Q, the film cracks. Therefore, the thickness of the metal film 3 is preferably 50 to 500=v.
金属皮膜３を形成するためのプラズマ’ｔ８ Ｉｔ方法
としては、低圧プラズマ溶射が、緻密で、且つ、密着力
が高い皮膜を形成することができるので好ましい。ただ
し、常圧プラズマ溶射であっても皮膜形成は可能である
。As the plasma 't8 It method for forming the metal film 3, low-pressure plasma spraying is preferred because it can form a dense film with high adhesion. However, film formation is possible even with normal pressure plasma spraying.
電極基材Ｉとしては、前述したように、Ｃｕ系金属を使
用するが、金属皮膜３を溶射するときに、前記基材が高
温になるので、Ｍ２Ｏ３分散Ｃｕを使用することが好ま
しい。ただし、Ｃｒ −Ｃｕ合金等、熱処理強化合金を
使用することも可能である。この場合には、金属皮膜３
を形成後、もう−度再熱処理強化を行なうことが必要で
ある。As the electrode base material I, Cu-based metal is used as described above, but since the base material becomes high temperature when the metal coating 3 is thermally sprayed, it is preferable to use M2O3 dispersed Cu. However, it is also possible to use heat-treated strengthened alloys such as Cr-Cu alloys. In this case, the metal film 3
After forming, it is necessary to perform another heat treatment for strengthening.
第２図は、第２の発明を示す断面図である。第２図に示
すように、Ｃｕ系金属からなる電極基材ｌの先端の表面
には、純Ｃｕからなる純Ｃｕ皮膜４が形成されている。FIG. 2 is a sectional view showing the second invention. As shown in FIG. 2, a pure Cu film 4 made of pure Cu is formed on the surface of the tip of an electrode base material l made of Cu-based metal.
さらに、純Ｃｕ皮膜４の表面シこは、第１の発明に使用
された金属皮膜３、即ち、Ｗ。Furthermore, the surface roughness of the pure Cu film 4 is the same as that of the metal film 3 used in the first invention, that is, W.
３ｏまたはＭｏ合金からなる金属皮膜が形成されている
。純Ｃｕ皮膜４は、溶射およびめっきのいずれの方法に
よっても形成することができる。A metal film made of 3o or Mo alloy is formed. The pure Cu film 4 can be formed by either thermal spraying or plating.
溶接初期の電極先端形状自己安定化のためには、電極先
端の表面はある程度の変形態によって形成されることが
好ましい。そこで、純Ｃｕ皮膜４を金属皮膜３と基材１
との間に形成させることにより、溶接初期の電極形状自
己安定化を図ることができる。純Ｃｕは基材１、金属皮
膜３よりも著しく軟かいからである。ただし、純Ｃｕ皮
膜４の厚さが５０μｍ未満では、薄すぎて所望の変形が
得られない。In order to self-stabilize the shape of the electrode tip at the initial stage of welding, it is preferable that the surface of the electrode tip be formed with some degree of deformation. Therefore, pure Cu film 4 is combined with metal film 3 and base material 1.
By forming the electrode between the two electrodes, it is possible to achieve self-stabilization of the electrode shape at the initial stage of welding. This is because pure Cu is significantly softer than the base material 1 and the metal film 3. However, if the thickness of the pure Cu film 4 is less than 50 μm, it is too thin and the desired deformation cannot be obtained.
方、純Ｃｕ皮膜４の厚さが５００−を超えると、溶接初
期の加圧により、潰れた純Ｃｕの形状異常拡大によって
、電流密度の低下を招来する。従って、純Ｃｕ皮膜４の
厚さは、５０〜５００ｎの範囲に限定することが好まし
い。On the other hand, if the thickness of the pure Cu film 4 exceeds 500 mm, the current density will decrease due to the expansion of the crushed pure Cu due to the pressurization at the initial stage of welding. Therefore, the thickness of the pure Cu film 4 is preferably limited to a range of 50 to 500 nm.
次に、この発明を実施例によって更に詳細に説明する。 Next, the present invention will be explained in more detail with reference to examples.
下記からなる電極作成法によって、本発明電極Ｎ（Ｌ
１〜４、および、比較電極Ｎα１〜４を製造した。The electrode of the present invention N (L
1 to 4 and comparative electrodes Nα1 to 4 were manufactured.
そして、製造した各電極を使用して、被溶接材に対して
連続溶接を行ない、電極の寿命を試験し、その結果を第
１表に示した。被溶接材、溶接条件及び電極寿命の試験
方法は下記に示す通りである。Using each of the manufactured electrodes, continuous welding was performed on materials to be welded, and the life of the electrodes was tested. The results are shown in Table 1. The materials to be welded, welding conditions, and electrode life test methods are as shown below.
（１） 電極作成法
コーティング原料：第１表に示す、
原ギ４粒径：２０〜１００ハ、
溶！ｌ↑法：低圧プラズマ溶射法、
溶射条件：
溶射雰囲気圧； ８０Ｔｏｒｒ、
溶射入熱； ６０ＫＷ、
フ゛ラズマガス；Ａｒ＋ｌＯえ）（２
プラズマガス流量： ２０ ？、 ／ｌｉｎ溶射厚；第
１表に示す、
基 材；第１表に示す、
純Ｃｕ皮膜：ｊ７さ１００μｉ。(1) Electrode production method Coating raw materials: Shown in Table 1, raw wood 4 Particle size: 20-100cm, melted! l↑ method: Low pressure plasma spraying method, Spraying conditions: Spraying atmosphere pressure: 80Torr, Spraying heat input: 60KW, Plasma gas: Ar+IO) (2 Plasma gas flow rate: 20?, /lin Spraying thickness: As shown in Table 1. Material: as shown in Table 1 Pure Cu film: j7 thickness 100μi.
（２） 彼苓接材 電気亜鉛めっきｚｔ′Ｉ板： 淳さ； ０．８ｍｍＸ ２枚重ね、 奸ｉ（″ｉ付着里；４０ｇ／＋Ｔｆ。(2) Herei welding material Electrogalvanized zt'I plate: Junsa; 0.8mmX 2 sheets stacked, 40g/+Tf.
（３） 冷接条件
電 ｊ″ｉｉ：
形 状；Ｃ型（ＪＩＳ Ｃ９３０４）、先端径； ４．
７ｍｍ、
加圧力；２００ｋｇ、
通電時間： １０１５０秒、
溶接速度＝１点／秒、
溶接電流： １２ＫＡ。(3) Cold welding conditions Electricity j″ii: Shape: C type (JIS C9304), tip diameter; 4.
7mm, Pressure force: 200kg, Current application time: 10150 seconds, Welding speed = 1 point/second, Welding current: 12KA.
（４） 試験方法
連続溶接を行ない、２００点毎に溶接された箇所の引張
剪断試験片を作製し、ＪＩＳ Ｚ ３１３６に規定され
た引張剪断試験を行ない、引張剪断強さを求めた。そし
て、その強さが３００ｋｇ以下となるまでの溶接点数を
求め、その点数を電極の寿命とした。(4) Test method Continuous welding was performed, and tensile shear test pieces were prepared at every 200 welded points, and a tensile shear test specified in JIS Z 3136 was conducted to determine the tensile shear strength. Then, the number of welding points until the strength became 300 kg or less was determined, and the number of welding points was determined as the life of the electrode.
第
１
表
第１表から明らかなように、本発明型Ｂｉ Ｎｏ、 １
〜４は、いずれも８０００点以上と長寿命を示した。Table 1 As is clear from Table 1, the present invention type Bi No. 1
-4 all showed a long life of 8000 points or more.
一方、電極先端の表面にｒ′Ｉｏからなるコーティング
を施した比較電ｔＥｉＮｌｌｌは、その溶射厚が５００
−を超える７００μｍであったために、寿命が短かかっ
た。On the other hand, the comparison electrode tEiNlll, which has a coating made of r'Io on the surface of the electrode tip, has a thermal spraying thickness of 500 mm.
- 700 μm, which exceeded 700 μm, so the life span was short.
電極先端の表面にコーティングを施さない比較電極Ｎα
２，３．および、Ｎｉめっきを施した比較電極Ｎｏ、
４は、本発明電極Ｎｏ、 １〜４と比べて寿命が短かか
った。Reference electrode Nα without coating on the surface of the electrode tip
2,3. and comparison electrode No. with Ni plating,
Electrode No. 4 had a shorter lifespan than electrode No. 1 to 4 of the present invention.
以上説明したように、この発明によれば、Ｚｎめっき鋼
板を溶接する場合において、極めて長寿命を示す電気抵
抗溶接用電極を得ることができる。卒業上有用な効果が
得られる。As explained above, according to the present invention, it is possible to obtain an electric resistance welding electrode that exhibits an extremely long life when welding Zn-plated steel sheets. A useful effect on graduation can be obtained.
第１図は第１の発明を示す断面図、第２ｉ２１は第２の
発明を示す断面図、第３図はスボッ）？８接を行なう場
合の１例を示す説明図、第４図は従来の電極の１例を示
す断面図である。図面において、ｌ・・・電極基材、
２・・・電極、３・・・金属皮膜、 ４・・・
純Ｃｕ皮膜、５・・・被溶接材、 ６・・・埋設金
属。Fig. 1 is a sectional view showing the first invention, No. 2i21 is a sectional view showing the second invention, and Fig. 3 is a sectional view showing the second invention. FIG. 4 is an explanatory diagram showing an example of a case where 8 contacts are made, and FIG. 4 is a sectional view showing an example of a conventional electrode. In the drawings, l...electrode base material,
2... Electrode, 3... Metal film, 4...
Pure Cu film, 5... Material to be welded, 6... Buried metal.
Claims (1)
の硬さが高く、しかも、Ｚｎとの反応性が小さい金属か
らなる皮膜が形成されていることを特徴とする電気抵抗
溶接用電極。 ２ 前記金属は、Ｗ、Ｍｏ、Ｍｏ合金のうちのいずれか
１つであり、前記金属皮膜の厚さは５０〜５００μｍで
ある請求項１記載の電気抵抗溶接用電極。 ３ Ｃｕ系金属からなる電極基材先端の表面に、純Ｃｕ
からなる皮膜が形成され、さらに、前記純Ｃｕからなる
皮膜の表面に、高温での硬さが高く、しかも、Ｚｎとの
反応性が小さい金属からなる皮膜が形成されていること
を特徴とする電気抵抗溶接用電極。[Claims] 1. A coating made of a metal that has high hardness at high temperatures and has low reactivity with Zn is formed on the surface of the tip of an electrode base material made of a Cu-based alloy. Electrode for electric resistance welding. 2. The electric resistance welding electrode according to claim 1, wherein the metal is any one of W, Mo, and Mo alloy, and the metal film has a thickness of 50 to 500 μm. 3 Pure Cu is applied to the surface of the tip of the electrode base material made of Cu-based metal.
Further, a film made of a metal having high hardness at high temperatures and low reactivity with Zn is formed on the surface of the pure Cu film. Electrode for electric resistance welding.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17776089A JPH0342186A (en) | 1989-07-10 | 1989-07-10 | Electric resistance welding electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17776089A JPH0342186A (en) | 1989-07-10 | 1989-07-10 | Electric resistance welding electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0342186A true JPH0342186A (en) | 1991-02-22 |
Family
ID=16036650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17776089A Pending JPH0342186A (en) | 1989-07-10 | 1989-07-10 | Electric resistance welding electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0342186A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5736073A (en) * | 1980-07-15 | 1982-02-26 | Hitachi Ltd | Safety device of welding robot |
| JPS60227997A (en) * | 1984-04-26 | 1985-11-13 | Sumitomo Electric Ind Ltd | Electrode material for welding |
-
1989
- 1989-07-10 JP JP17776089A patent/JPH0342186A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5736073A (en) * | 1980-07-15 | 1982-02-26 | Hitachi Ltd | Safety device of welding robot |
| JPS60227997A (en) * | 1984-04-26 | 1985-11-13 | Sumitomo Electric Ind Ltd | Electrode material for welding |
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