JPH0340988A - Electrostatic floating furnace - Google Patents
Electrostatic floating furnaceInfo
- Publication number
- JPH0340988A JPH0340988A JP17622489A JP17622489A JPH0340988A JP H0340988 A JPH0340988 A JP H0340988A JP 17622489 A JP17622489 A JP 17622489A JP 17622489 A JP17622489 A JP 17622489A JP H0340988 A JPH0340988 A JP H0340988A
- Authority
- JP
- Japan
- Prior art keywords
- mirror
- spheroidal
- specimen
- sample body
- focal point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005339 levitation Methods 0.000 claims description 11
- 239000000463 material Substances 0.000 abstract description 4
- 230000005484 gravity Effects 0.000 abstract description 3
- 239000013078 crystal Substances 0.000 abstract description 2
- 230000005686 electrostatic field Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000012216 screening Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 10
- 238000001514 detection method Methods 0.000 description 6
- 230000005486 microgravity Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 241000448053 Toya Species 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/22—Heating of the molten zone by irradiation or electric discharge
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明け１例えば半導体材料などの結晶成長を宇宙で
行う微小重力材料製造実＃に使弔される静電浮遊炉の改
良に関するものである。[Detailed Description of the Invention] [Industrial Application Field] This invention relates to the improvement of an electrostatic levitation furnace used in the actual production of microgravity materials, such as crystal growth of semiconductor materials in space. .
Ｌ従来の技術〕
第６図は列えば米国特許公報に示された４５２１８５４
（Ｊ［ＴＮ 、 ４ 、１９８５＞ＣＬｎＢＥＤ Ｌ
ＯＯＰ ＥＩＪＣＴＲＯ８ＴＡＴ工〔ＩＪＶ工ＴＡＴ工
ＯＮ ＳＹＳＴＥＭに示された従来の静電浮遊炉を示す
構成ブロック図である５図において、（１）は下にへこ
んだ皿状のｄＬ桶で同じ物が対向して置かれる。（２）
は電極（１）の中間位置に１置かれた供試体。[Prior Art] Figure 6 shows the technique of 4521854 shown in the US Patent Publication.
(J[TN, 4, 1985>CLnBED L
OOP EIJCTRO8TAT Engineering [IJV Engineering TAT Engineering ON SYSTEM] In Figure 5, which is a block diagram showing the configuration of a conventional electrostatic levitation furnace shown in the OOP EIJCTRO8TAT Engineering [IJV Engineering TAT Engineering ON SYSTEM], (1) is a dish-shaped dL bucket that is concave at the bottom, with the same objects facing each other. be placed. (2)
is a specimen placed in the middle position of electrode (1).
（３）はこの供試体（２）Ｋ重心位置を計測するための
ＣＯＤカメラ、１４）はこのＣＯＤカメラに接続された
制御四路、 ｆ５１ｔｉこの制御回路、！−環極（【）
に接続された高圧電源である。(3) is a COD camera for measuring the position of the center of gravity of this specimen (2) K, 14) is a control circuit connected to this COD camera, f51ti is this control circuit,! -circumpolar ([)
A high voltage power supply connected to the
従来の静電浮遊炉は以上のように構成されていたので、
供試体のＭｌｔ検出は０ＣＤ７７メラの位置分解能とそ
の重心位置計電速度によって供試体の位置制御の安定性
が決１す、供試体の振動を引き起こす事になる。この事
は微小重力実験に於て致命的な欠陥となる。Conventional electrostatic levitation furnaces were configured as described above.
Mlt detection of the specimen causes vibration of the specimen, which determines the stability of the position control of the specimen by the position resolution of the 0CD77 camera and the electromagnetic velocity of its center of gravity position meter. This is a fatal flaw in microgravity experiments.
さらに、供試体の位置計測を画「象データは二値化で処
理するのであるが背景の影響を受は検出不能に々ると言
う重大な問題がある。Furthermore, although the image data used to measure the position of the specimen is processed by binarization, there is a serious problem in that it is often undetectable due to the influence of the background.
さらに、供試体の位／ｆをディジタルで計算するので部
品点数が増加しシステムの信頼性を下げることになろう
この発明は上記のような問題点を解決するためＫなされ
たものであり、上記ＣＯＤカメラの代わりにアナログ方
式の位１ｆ検出部（ＦＩＮＤ）を円いてアナログ信号で
高速に位Ｉｌｔ検出を行い、供試体の位置の安定度をき
わめて向上させ、供試体の表面の光源の投射を安定させ
、もって表面の温度分布を均一にする事を目的とする。Furthermore, since the order/f of the specimen is calculated digitally, the number of parts increases and the reliability of the system decreases.This invention was made to solve the above problems, and Instead of a COD camera, an analog type 1f detection unit (FIND) is used to perform high-speed position Ilt detection using analog signals, greatly improving the stability of the position of the specimen, and improving the projection of the light source on the surface of the specimen. The purpose is to stabilize the surface and make the temperature distribution uniform.
會た。この発明の別の発明は上記目的に加え光源を２個
用いた双回転ｉ胃円鏡イメージ加熱を行うことを目的と
する。We met. Another object of the present invention is to perform bi-rotating i-gastroscope image heating using two light sources in addition to the above object.
この発明ＶＣ係わる静電浮遊炉は回転楕円鏡の内’！ｌ
Ｋつくられた空洞共振器の中に卵形プラズマランプを費
き電波を注入してこれを発光させ１球形の焦点嗜の中に
供試体を入れ、これを′１１！極の関で浮遊させ、供試
体の位置側（２）をアナログ方式の位′ｆ＃出器で行う
ものであろう
〔作中〕
この発明においては、！［相］転清円鏡の第１焦点に置
かれた卵形プラズマランプが発光し、第２焦点に置かれ
た供試体に集光してη０熱するつ供試体の位置側柵はア
ナログ位Ｔ′Ｉｔ検出器で位置を検出しアナログ的に制
御を行い安定させる。The electrostatic levitation furnace related to this invention VC is inside a spheroidal mirror! l
An egg-shaped plasma lamp was used in the cavity resonator made, and radio waves were injected into it to cause it to emit light.The specimen was placed in a spherical focal point, and this was set to '11! In this invention, the specimen is suspended at the poles, and the position side (2) of the specimen is carried out using an analog type digitizer [under construction]. [Phase] The egg-shaped plasma lamp placed at the first focal point of the reversible circular mirror emits light, and the light is focused on the specimen placed at the second focal point, heating it by η0. The position is detected by the T'It detector and stabilized by analog control.
（’ｊＪ楕刊〕
以下、とや、″発明の一実楕四による静電浮遊炉を図に
ついて切間するう第１図はこの発明の一実施例を示す構
成ブロック図であり、（２）と１５１は上記従来装置と
１つたく同じである。('j J Oppan) Hereinafter, I will explain the electrostatic levitation furnace according to Toya, one of the inventions. Figure 1 is a block diagram showing an embodiment of this invention. ) and 151 are exactly the same as those in the conventional device.
図においてｔｅ’ｒは回転清円体の反射面を内側に有す
る同転楕円鏡、（７）はこの回転楕円鏡（６）の第１焦
ａＫｆｔｌかれた卵形プラズマランプ、（８）はこの卵
形プラズマランプ（７）を支持する支持具、 ＋９１Ｆ
ｉ回転濱円＠１６）の２ｇ１焦点菅１１！Ｉ ４部にお
いて、その内面に円周状の縁が接するように取りつけら
れた円盤状の電波遮蔽板、（ＩＱはこの電波遮蔽板（９
）と回転楕円鏡（６）とで形成されｆＣ，空洞共振器、
Ｉは卵型プラズマランプを収納する空洞共振器＋１０に
高周波電離を注入する高８波発信ｉ、ｆ１３は同心円状
の２個の１１ング型の導電板を２対対向して並べたリン
グ電極。In the figure, te'r is a rotary ellipsoidal mirror with a rotating ellipsoidal reflecting surface inside, (7) is an oval plasma lamp with the first focus aKftl of this spheroidal mirror (6), and (8) is this ellipsoidal mirror. Support for supporting oval plasma lamp (7), +91F
i rotation Hamaen @ 16) 2g1 focal point Suga 11! In part I 4, there is a disc-shaped radio wave shielding plate attached so that its inner surface is in contact with the circumferential edge (IQ is this radio wave shielding plate (9
) and a spheroidal mirror (6), fC, a cavity resonator,
I is a high-8 wave transmitter i that injects high-frequency ionization into the cavity resonator +10 that houses an egg-shaped plasma lamp, and f13 is a ring electrode made by arranging two pairs of concentric 11 ring-shaped conductive plates facing each other.
ａ３は供試体（２）Ｋ対向して回転楕円鏡（６）に設け
られた観測窓ｒｉ４を通して供試体（２）の位・４を計
測する位電喰出器、 ６ｃＪはこの位置検出器α３と高
圧電源（５）に接続される制御回路である。、第３１Ｊ
はリング電極ａａと供試体（２）の関係を示す図で、
（＋２！ｌ）と（１２ｃ）は外側のリング電極、
（＋２ｂ）と（＋２ｄ）は内側のリング電極、でこれら
の間に供試体（２）が浮遊されろう第３図は位置検出器
０と制御回路０９の構成を示すブロック図で、シリコン
半導体でｐｎ接合を形成した５ｃＲ角ぐらいの板状の位
＃１検出器（＋３の２辺からＸとＹ方向の位）端信号が
位置検出回路（１５９）に接続される。この位置信号を
入出力インタフェース（＋５’ｂ）経由計箆機（１５ｃ
）Ｉｃ送り込む。a3 is a potential detector that measures the position of the specimen (2) through an observation window ri4 provided in the spheroidal mirror (6) facing the specimen (2) K, and 6cJ is this position detector α3. and a control circuit connected to the high voltage power supply (5). , 31st J
is a diagram showing the relationship between ring electrode aa and specimen (2),
(+2!l) and (12c) are the outer ring electrodes,
(+2b) and (+2d) are inner ring electrodes, between which the specimen (2) will be floated. A plate-shaped position #1 detector (position in the X and Y directions from the two sides of +3) with a pn junction formed therein is connected to a position detection circuit (159). This position signal is sent to the measuring machine (15c) via the input/output interface (+5'b).
) Send Ic.
上記のように構成された静電浮遊炉において。In an electrostatic levitation furnace configured as described above.
供試体（２）が加もされる前は規定の位！ｉＩに遣いて
卵形プラズマランプ（７）で７ＪＯ熱し５００度程度１
／（すつたらリングＭ ［ａ３ Ｋ高圧電源１５）から
電圧を与え静電界で供試体（２）を浮遊させろうこの原
理は第４図に於てリング′ｌｊ極０２が谷型の電界を作
りその谷間に供試体（２）をクーロン力で浮遊させる。Before specimen (2) was added, it was at the specified level! Heat 7JO with an egg-shaped plasma lamp (7) to about 500 degrees 1
/(Sutara ring M [a3 K high-voltage power supply 15) to apply a voltage to levitate the specimen (2) in an electrostatic field.This principle is based on the principle shown in Fig. 4 that the ring 'lj pole 02 generates a valley-shaped electric field. The specimen (2) is suspended in the valley by Coulomb force.
この様にして浮遊すると位置を位置検出回路３が検出し
アナログ信号で制御回路６４９に送信する。ここで制御
演口を行い制（２）量を高圧電源１５）へ送出する。When floating in this manner, the position detection circuit 3 detects the position and transmits it to the control circuit 649 as an analog signal. Here, a control port is performed and the control (2) amount is sent to the high voltage power source 15).
さて、この発明は以上説明した通り、一つの回転楕円鏡
（６）を用いているが、第５図の別の発明のように第２
の回転楕円鏡ＩＩをその長軸方向に第２焦点を共有して
取り付け、第２の回転楕円鏡ａＧの端部に卵形プラズマ
ランプ（７）と支持具（８）、及び電波鴻蔽板（９）を
とりつける、双方の卵形プラズマランプ（７）の発した
光が供試体（２）の全表面に均等に照射されるので、さ
らに良い効果を得ることが出来る。Now, as explained above, this invention uses one spheroidal mirror (6), but as in another invention shown in FIG.
A spheroidal mirror II is installed with the second focal point shared in the long axis direction, and an oval plasma lamp (7), a support (8), and a radio wave shielding plate are attached to the end of the second spheroidal mirror aG. Since the light emitted from both oval plasma lamps (7) to which (9) is attached is evenly irradiated onto the entire surface of the specimen (2), even better effects can be obtained.
以上のように、この発明によれば供試体の位置をＣＯＤ
を弔いた場合に比べてｔｏｏｏ倍もの高速で検出でき、
（＃試体の振動をなくシ、安定した浮遊を得ることが出
来るつまた。供試体の位置が安定するから卵形プラズマ
ランプによる加熱も均一に行え、供試体の表面の温度を
均一に出来る。As described above, according to the present invention, the position of the specimen is
It can be detected too much faster than when the
(# This also eliminates vibrations of the specimen and allows stable floating. Since the position of the specimen is stable, heating by the egg-shaped plasma lamp can be done evenly, making the temperature of the surface of the specimen uniform.
この事は微小重力実験を行う上ではきわめて重要であり
、外乱の無い理想的な材料の微小重力処理が可能と慶る
。This is extremely important when conducting microgravity experiments, and we are glad that microgravity processing of ideal materials without disturbance is possible.
第１図はこの発明の一実施列による静電浮遊炉の嘴或図
、第２−図はリング電極と供試体の関係を示す図、第３
図は位置Ｎ１出器と制御回路と高圧電源の構成ブロック
図８第４図は供試体の浮遊原理を説明する図、第５図は
別の発明の静電浮遊炉の構成図、第６図は従来の静電浮
遊炉の構成ブロック図である。図において、（りは電ｍ
、 ＋２）は供試体。
（３）ばｃａｎカメラ、（４）は制御回路、（５）は高
圧電源。
（６）は回転楕円鏡、（７）は卵形プラズマランプ、（
８）は支持具、（９）は電波遮蔽板、０１は空洞共振器
、αｌは高周波発信器、ａｚはリング電極、 （１２
！Ｉ）と（１２ｃ）は外側のリング電極、 （＋２ｂ
）と（＋２ｄ）は内側のリング電俸、０１は位置検出器
、ａ４は観測窓、 １１５け側聞ｑ路、（１５う）は位
置検出回路、 （＋５ｂ）は入出力インタフェース、
（＋５ｃ）は計篤機、α９は第２の回転楕円鏡であ
る。
なお、ワ中同−符号は同一またけ相当部分を示すつFig. 1 is a diagram of the beak of an electrostatic levitation furnace according to one embodiment of the present invention, Fig. 2 is a diagram showing the relationship between the ring electrode and the specimen, and Fig. 3 is a diagram showing the relationship between the ring electrode and the specimen.
Figure 8 is a block diagram of the configuration of the position N1 output device, control circuit, and high-voltage power supply. Figure 4 is a diagram explaining the floating principle of the specimen. Figure 5 is a diagram of the configuration of an electrostatic levitation furnace of another invention. Figure 6. is a block diagram of a conventional electrostatic levitation furnace. In the figure, (ri is electric m
, +2) is the specimen. (3) Bacan camera, (4) control circuit, and (5) high voltage power supply. (6) is a spheroidal mirror, (7) is an oval plasma lamp, (
8) is a support, (9) is a radio wave shielding plate, 01 is a cavity resonator, αl is a high frequency oscillator, az is a ring electrode, (12
! I) and (12c) are outer ring electrodes, (+2b
) and (+2d) are the inner ring cables, 01 is the position detector, a4 is the observation window, 115 side listening q path, (15u) is the position detection circuit, (+5b) is the input/output interface,
(+5c) is a diagnostic device, and α9 is a second spheroidal mirror. Note that the same symbol in the middle indicates the part corresponding to the same span.
Claims (2)
、この回転楕円鏡の第１焦点に置かれた卵形のプラズマ
ランプと、この卵形プラズマランプを支持する支持具と
、回転楕円鏡の第１焦点側端部において、その内面に円
周状の縁が接するように取り付けられた円盤状の電波遮
蔽板と、この電波遮蔽板と回転楕円鏡とで形成された空
洞共振器に卵型プラズマランプを収納し、この空洞共振
器に高周波電流を注入する高周波発信器を備え、上記回
転楕円鏡の第２焦点に置かれた供試体と、この供試体を
中心にして対象に置かれた２対のリング電極と、このリ
ング電極に接続される高圧電源と、上記供試体に対向し
た位置に置かれた位置検出器と、これら高圧電源と位置
検出器に接続される制御回路を備えた事を特徴とする静
電浮遊炉。(1) A spheroidal mirror having a spheroidal reflecting surface inside, an oval-shaped plasma lamp placed at the first focal point of the spheroidal mirror, a support for supporting the oval-shaped plasma lamp, and a rotating ellipsoidal mirror. A disc-shaped radio wave shielding plate attached to the first focal point side end of the elliptical mirror so that its circumferential edge touches the inner surface of the disc-shaped radio wave shielding plate, and a cavity resonator formed by the radio wave shielding plate and the spheroidal mirror. An egg-shaped plasma lamp is housed in the cavity, and a high-frequency oscillator is installed to inject a high-frequency current into this cavity resonator. Two pairs of ring electrodes placed, a high-voltage power supply connected to the ring electrodes, a position detector placed opposite the specimen, and a control circuit connected to these high-voltage power supplies and the position detector. An electrostatic levitation furnace characterized by:
円鏡と、この第１の回転楕円鏡の第２焦点を共有する第
２の回転楕円鏡と、双方の第１焦点に置かれた卵形のプ
ラズマランプと、これらの卵形プラズマランプを支持す
る支持具と、双方の回転楕円鏡の第１焦点側端部におい
て、その内面に円周状の縁が接するように取り付けられ
た円盤状の電波遮蔽板と、この電波遮蔽板と回転楕円鏡
とで形成された空洞共振器に卵型プラズマランプを収納
し、これら双方の空洞共振器に高周波電流を注入する高
周波発信器を備え、上記回転楕円鏡の第２焦点に置かれ
た供試体と、この供試体を中心にして対象に置かれた２
対のリング電極と、このリング電極に接続される高圧電
源と、上記供試体に対向した位置に置かれた位置検出器
と、これら高圧電源と位置検出器に接続される制御回路
を備えた事を特徴とする静電浮遊炉。(2) A first spheroidal mirror that has a spheroidal reflecting surface inside, and a second spheroidal mirror that shares the second focal point of the first spheroidal mirror, and a second spheroidal mirror that is placed at the first focal point of both. The oval-shaped plasma lamps and the support for supporting these oval-shaped plasma lamps are attached so that the circumferential edges thereof are in contact with the inner surfaces of the spheroidal mirrors at the first focal point side ends of both of the spheroidal mirrors. An egg-shaped plasma lamp is housed in a cavity resonator formed by a disc-shaped radio wave shielding plate and a spheroidal mirror, and a high-frequency oscillator is installed to inject a high-frequency current into both of these cavity resonators. A specimen placed at the second focal point of the spheroidal mirror, and two specimens placed at the target with this specimen as the center.
It is equipped with a pair of ring electrodes, a high-voltage power supply connected to the ring electrodes, a position detector placed opposite the specimen, and a control circuit connected to these high-voltage power supplies and the position detector. An electrostatic levitation furnace featuring:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17622489A JPH06102586B2 (en) | 1989-07-07 | 1989-07-07 | Electrostatic levitation furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17622489A JPH06102586B2 (en) | 1989-07-07 | 1989-07-07 | Electrostatic levitation furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0340988A true JPH0340988A (en) | 1991-02-21 |
| JPH06102586B2 JPH06102586B2 (en) | 1994-12-14 |
Family
ID=16009800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17622489A Expired - Lifetime JPH06102586B2 (en) | 1989-07-07 | 1989-07-07 | Electrostatic levitation furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06102586B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5558837A (en) * | 1994-04-05 | 1996-09-24 | Mitsubishi Denki Kabushiki Kaisha | Droplet floating apparatus |
| CN109561523A (en) * | 2018-10-11 | 2019-04-02 | 东莞材料基因高等理工研究院 | A kind of high-temperature heating equipment based on double combined reflected covers |
| CN109561522A (en) * | 2018-10-11 | 2019-04-02 | 东莞材料基因高等理工研究院 | A kind of high-temperature heating equipment based on three combined reflected covers |
-
1989
- 1989-07-07 JP JP17622489A patent/JPH06102586B2/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5558837A (en) * | 1994-04-05 | 1996-09-24 | Mitsubishi Denki Kabushiki Kaisha | Droplet floating apparatus |
| CN109561523A (en) * | 2018-10-11 | 2019-04-02 | 东莞材料基因高等理工研究院 | A kind of high-temperature heating equipment based on double combined reflected covers |
| CN109561522A (en) * | 2018-10-11 | 2019-04-02 | 东莞材料基因高等理工研究院 | A kind of high-temperature heating equipment based on three combined reflected covers |
| CN109561522B (en) * | 2018-10-11 | 2022-01-25 | 东莞材料基因高等理工研究院 | High-temperature heating device based on three combination bowl |
| CN109561523B (en) * | 2018-10-11 | 2022-06-07 | 东莞材料基因高等理工研究院 | High-temperature heating device based on double-combination reflecting cover |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06102586B2 (en) | 1994-12-14 |
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