JPH033723A - Continuous polishing machine for belt plate - Google Patents

Abstract

PURPOSE:To continuously apply uniform polishing to even a wide belt plate having a large area for a short time by installing a nozzle for continuously supplying electrolyte between an electrode and, a polishing head and the belt plate which make the electrode contact with the polished face of abrasive, and arranging a revolution shaft different from a rotation shaft at the polishing head. CONSTITUTION:Grinding oil such as, e.g. water soluble cutting oil, etc is supplied onto a belt plate from a nozzle 10. For example, one of grindstones 5A is rotated clockwise and the other 5B is counterclockwise by means of drive motors 8A, 8B. Moreover, a revolution shaft P is provided at the center of a frame 6, a drive motor 8C is connected to this shaft P to be intended to be rotated thereby, and Revolution movement round the shaft P in addition to rotation is applied to the grindstones to perform uniform polishing.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a continuous polishing device that is advantageous for use when polishing the surface of a band plate such as a metal strip, particularly to a mirror surface.

Aiming to improve the paintability, chemical conversion treatment properties, or reactivity of metal plate surfaces, we clean them by removing dirt and oxides from the surface.
The surface of the strip is used for the purpose of activating, obtaining a uniform appearance, improving surface gloss, reducing surface roughness, and improving surface properties such as workability and friction properties. Polishing is performed.

(Prior Art) Hough polishing is often used to finish the surface of a band plate such as a stainless steel plate to a mirror finish, for example. However, puff polishing requires skill, and is not suitable for mass production because the shape accuracy and finish are not consistent, resulting in many variations in quality, and it also generates a large amount of dust, deteriorating the working environment.

Regarding an electrolytic puff polishing method that can solve these problems, Japanese Patent Application Laid-Open No. 13290/1983 describes a process in which a large-area object to be polished is electrolytically oxidized, and the passivating oxide film formed on the surface is rubbed. It is disclosed that when removing and finishing to a mirror surface by doing this, the appropriate range of electrolytic conditions is an applied voltage of 5 to 12 V and a current density of 0.5 to 2.5 Δ/cm 2 between the electrode and the object to be polished.

Although this method is effective in increasing the processing speed, polishing a wide strip plate causes uneven polishing, so in practice the polishing speed must be slowed down. That is, since the periphery and center of a disc-shaped abrasive material have different rates of rubbing against the surface to be polished, uneven polishing becomes noticeable when the area of the abrasive material is increased in order to increase the polishing speed. In order to prevent this uneven polishing, conventionally the tool was polished while being gradually moved in the width or length direction. Therefore, polishing a wide band plate requires a long time and is uneconomical.

Furthermore, by chemically removing oxides on the surface of the strip or mechanically polishing irregularities, the surface of the strip is polished to a roughness of several μm.
x, and these tasks are often carried out in separate locations, making continuous processing impossible.
Further, it required a long transportation time, a long processing time, and it was also necessary to change the process due to surface defects (pinholes, scratches, etc.) on the material to be polished.

(Problems to be Solved by the Invention) The present invention aims to provide a continuous polishing device that can polish a band plate having a particularly large area to a mirror finish at high speed, without polishing unevenness, and economically. .

(Means for Solving the Problems) The inventors conducted a detailed investigation on the polishing unevenness that occurs when the electrolytic puff polishing described above is applied to a strip having a particularly large area, and found that the relative position of the abrasive to the polishing surface It was discovered that the speed increases as the distance from the rotation axis increases, and that polishing unevenness increases in accordance with this speed difference. Therefore, by arranging a plurality of polishing heads on a strip plate and rotating each polishing head around its own axis and revolving around a different axis, it was found that a polished surface with very little polishing unevenness could be obtained in a short time.

Furthermore, when the circumferential surface of the roll extending across the width of the strip was covered with an abrasive material through which an electrolytic solution could permeate and subjected to electrolytic polishing, a polished surface with very little polishing unevenness was similarly obtained in a short time.

This invention is derived from the above knowledge.

That is, the present invention provides a grinding zone for mechanically grinding the surface of the strip, a polishing zone for electrolytically polishing the surface of the strip after grinding, and a cleaning zone for washing and drying the polished strip. It is a continuous polishing device with zones arranged in order, and the polishing zone is equipped with a polishing head with an electrode in contact with the surface to be polished of the polishing material and a nozzle that continuously supplies electrolyte between the strip and the electrode. Furthermore, the polishing head is a continuous polishing device for a strip plate having an axis of rotation and a rotation axis separate from this.

In addition, the present invention provides, instead of the polishing head of the above-mentioned device,
This is a continuous strip polishing device in which a polishing roll having an abrasive material that can be permeated with an electrolytic solution is installed around the circumference of a rotating shaft that can be energized.

(Function) The polishing device according to the present invention polishes the strip surface in stages until it becomes a mirror surface by passing the strip through a grinding zone, a polishing zone, and a cleaning zone arranged in the conveyance path of the strip. This makes it possible to achieve continuous polishing processing.

Furthermore, polishing in the polishing zone is a combination of electrolytic polishing and mechanical polishing, making it possible to achieve a mirror finish in a short processing time. In particular, since the polishing head has an axis of rotation and an axis of revolution, polishing proceeds in a so-called planetary motion, achieving even polishing.

Even if a polishing roll is installed, even polishing can be achieved in the same way.

(Example) Next, embodiments of the present invention will be specifically described.

FIG. 1 shows a continuous polishing device according to the present invention, in which a grinding zone 2, a polishing zone 3, and a cleaning zone 4 are arranged in order on the conveyance path of a strip 1. The grinding zone 2 has a disc-shaped grindstone. Grinding wheels 5A and 5B are responsible for surface grinding of the strip plate 1, and as shown in FIG.

7B is supported and the drive motor 8 is fixed to the frame 6.
For example, by A and 8B, the grindstone 58 rotates clockwise.
B is rotated counterclockwise. Furthermore, a revolution axis 9 is provided at the center of the frame 6, and a drive motor 8C is directly connected to this axis 9 and rotated, thereby measuring the rotation of the frame 6. It is also possible to apply orbital motion, achieving even grinding.

In this example, there are two whetstones, but there is no limit to the number as long as there is more than one. If the number is even, half will be clockwise and half will be counterclockwise, and if the number is odd, the number will be in the opposite direction. It is preferable to set it so that there are many things around it. The grindstone used may be one containing abrasive grains with a roughness of #200 to #800. Note that 10 in the figure is a nozzle that supplies the grinding fluid.

To perform grinding in the above grinding zone, first use nozzle 10.
From there, a grinding fluid such as a water-soluble cutting fluid is continuously supplied onto the band plate, and the grinding wheels 5A and 5B are rotated and revolved around the belt. The rotational speed of the grindstones 5A and 5B varies somewhat depending on the material of the grindstone, etc., but if it is slow, the grinding efficiency is poor, while if it is fast, it may cause scratches, so it is preferably in the range of 100 to 200 rpm. Note that a nozzle for supplying the grinding fluid may be installed on each grindstone.

Next, the polishing zone 3 is responsible for polishing the surface of the strip 1 after grinding by the disk-shaped polishing head, and the polishing heads 11A to 110
As shown in FIG. 3, the rotation axes 12A to 12D are supported at each arm end of a cross-shaped frame 13 having four radially extending wooden arms, and a drive motor 14 fixed to each arm.
A-140, e.g. polishing heads 118 and II
B is rotated clockwise, and 11C and 110 are rotated counterclockwise. Further, a revolution shaft 15 is provided at the center of the frame 13, and a drive motor 14E is directly connected to this shaft 15 and rotated, thereby measuring the rotation of the frame 13. Note that the drive motor 14E is fixed with an arm or the like for making the polishing head make one return movement on the strip. By rotating the frame 13 in this way, the polishing head II
A to LID can be given not only rotation but also rotational motion about the revolution axis 15, thereby achieving even polishing.

In this example, the number of polishing heads is four, but there is no limit to the number as long as there are more than one.If the number is even, half will be clockwise and half will be counterclockwise, and if the number is odd, the rotation direction will be the same. It is preferable to set it so that the number of rotations in the opposite direction increases.

Furthermore, as shown in FIG. 1(b), the polishing heads IIA to 110 are composed of an electrode 168 and an abrasive material 16B attached to the lower surface of the electrode 16A, and a negative voltage is applied to the electrode 16A via a brush 17. be done.

Here, the abrasive material 5B may be any material as long as it has conductivity, and its shape may be arbitrary, such as a brush shape, but it is advantageous to use an elastic material containing abrasive grains and having a Shore hardness of 70 or less. . That is, by using an elastic abrasive material, it is not necessary to adjust the pressing force on the polishing surface, so that it is possible to easily obtain a uniform polishing surface. Specifically, polyurethane containing abrasive grains is suitable; by using polyurethane, there is no mixing of abrasive grains with different roughness, which is always a problem when using free abrasive grains, resulting in a finished surface with fewer defects.

Now, when performing polishing with the above-mentioned composite polishing apparatus, first, an electrolytic solution that also serves as a polishing liquid, such as sodium nitrate or a neutral halide aqueous solution, is applied from the nozzle 10 disposed below the revolution axis 15 of the frame 13. The polishing heads IA to ID are continuously supplied onto the strip, and the polishing heads IA to ID are rotated and revolved.

The rotation speed of the polishing heads IIA-110 varies somewhat depending on the nature of the polishing material, etc., but if it is slow, the polishing efficiency is poor, while if it is fast, it may cause scratches, so it is preferably in the range of 100 to 2000 rpm.

Incidentally, in the case of polyurethane, 800 rpm is appropriate. Note that a nozzle for supplying the electrolytic solution may be installed in each polishing head.

Further, a polishing roll shown in FIG. 4 may be used in the polishing zone 3. The polishing roll includes an abrasive material (for example, polyurethane) 19 that can be penetrated by an electrolytic solution on the circumferential surface of a rotating shaft 18 made of an electrically conductive material such as metal.

Note that the abrasive material preferably takes the form of a nonwoven fabric or a brush. Furthermore, this polishing roll is covered with a cover 20, and an electrolytic solution is supplied into the cover 20 through a nozzle 21 opened at the top of the cover 20. Further, the rotating wheel 18 is energized by bringing a carbon brush or the like into contact with the shaft end.

The strip plate 1, which has been mirror-polished through the grinding zone 2 and the polishing zone 3 as described above, is washed with water and dried in the cleaning zone 4. As shown in FIG. 1, the cleaning zone 4 includes a rinsing tank 23 equipped with a rinsing spray 22 and a drying oven 24 such as a hot air dryer. Since the strip 1 that has passed through the cleaning zone 4 has no polishing debris or electrolyte attached to its surface, surface scratches and rust can be avoided regardless of the handling during subsequent transportation.

(Effects of the Invention) By using the continuous polishing apparatus of the present invention, even wide band plates with large areas can be polished continuously in a short period of time, and an economical mirror finish can be achieved.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram showing a continuous polishing apparatus according to the present invention, FIG. 2(a) is a top view of the grinding zone, FIG. 2(b) is a sectional view taken along the line A-A in FIG. 4(a) is a top view of the polishing zone, FIG. 4(b) is a sectional view taken along line BB in FIG. 4(a), and FIG. 4 is a schematic diagram of the polishing roll. 1...Strip plate 2-Grinding zone 3--Polishing zone 4--Cleaning zone 5A, 5B -=Whetstone 6.13-Frame 78, 7B, 12A
~120- Rotation axis 88~8C, 14A~140・-Drive motor 9.15・・Revolution axis 10.21・
- Nozzles 118 to 11D - Polishing head 168 - Electrode 16B, 19 - Abrasive material 17 - Brush 18
-Rotating wheel 20-Cover 22-Washing spray 23-Washing tank 24...Drying oven l-#-ri

Claims (1)

[Claims] 1. A grinding zone for mechanically grinding the surface of the strip, a polishing zone for electropolishing the surface of the strip after grinding, and a polishing zone for washing the strip after polishing with water, in the conveyance path of the strip. A continuous polishing device in which cleaning zones for drying are arranged in order, and the polishing zone continuously supplies an electrolyte between the electrode and the polishing head and strip, which have an electrode in contact with the surface to be polished of the polishing material. This is a continuous strip polishing device that has a nozzle installed, and a polishing head that has an axis of rotation and a separate axis of revolution. 2. A continuous strip polishing device according to claim 1, which comprises, in place of the polishing head, a polishing roll having an abrasive material permeable to an electrolytic solution around a rotating shaft that can be energized.