JPH0336131U - - Google Patents
Info
- Publication number
- JPH0336131U JPH0336131U JP9830289U JP9830289U JPH0336131U JP H0336131 U JPH0336131 U JP H0336131U JP 9830289 U JP9830289 U JP 9830289U JP 9830289 U JP9830289 U JP 9830289U JP H0336131 U JPH0336131 U JP H0336131U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- tiltable
- wet processing
- semiconductor
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 8
- 238000010586 diagram Methods 0.000 description 1
Description
第１図は本考案の一実施例に係るウエツト処理
装置の全体構成を示す概略説明図、第２図は同実
施例に使用されるウエーハホルダと駆動機構を示
す斜視図、第３図は第２図ウエーハ支持部の−
線に沿つた断面図、第４図及び第５図は何れも
ウエーハホルダの他例を示す断面図、第６図は従
来のウエツト処理装置の断面図である。
Ｗ……半導体ウエーハ、１……ウエーハ供給手
段、１１……ウエーハ収容治具、２……ウエーハ
ホルダ、３……液処理槽、５……ウエーハ取出手
段、
FIG. 1 is a schematic explanatory diagram showing the overall configuration of a wet processing apparatus according to an embodiment of the present invention, FIG. 2 is a perspective view showing a wafer holder and drive mechanism used in the embodiment, and FIG. Figure 2 - of wafer support part
4 and 5 are sectional views taken along the line, and FIGS. 4 and 5 are sectional views showing other examples of wafer holders, and FIG. 6 is a sectional view of a conventional wet processing apparatus. W... semiconductor wafer, 1... wafer supply means, 11... wafer storage jig, 2... wafer holder, 3... liquid processing tank, 5... wafer removal means,
Claims (1)
つ供給するウエーハ供給手段と、 上記ウエーハ収容治具から供給される半導体ウ
エーハの周縁部を支持し、水平方向への移動及び
上下方向への移動自在となつた可傾式ウエーハホ
ルダと、 上記可傾式ウエーハホルダを直立状態として該
ウエーハホルダに支持した半導体ウエーハを浸漬
してウエツト処理を施す少なくとも１箇所の液処
理槽と、 ウエツト処理後の半導体ウエーハを取り出すウ
エーハ取出手段とを含むことを特徴とするウエツ
ト処理装置。[Claims for Utility Model Registration] A wafer supply means for supplying semiconductor wafers one by one from a wafer storage jig; a tiltable wafer holder that is movable in the vertical direction; and at least one liquid treatment tank in which a semiconductor wafer supported by the tiltable wafer holder in an upright state is immersed and subjected to wet treatment. A wet processing apparatus comprising: wafer take-out means for taking out a semiconductor wafer after wet processing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9830289U JPH0336131U (en) | 1989-08-22 | 1989-08-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9830289U JPH0336131U (en) | 1989-08-22 | 1989-08-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0336131U true JPH0336131U (en) | 1991-04-09 |
Family
ID=31647408
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9830289U Pending JPH0336131U (en) | 1989-08-22 | 1989-08-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0336131U (en) |
-
1989
- 1989-08-22 JP JP9830289U patent/JPH0336131U/ja active Pending
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