JPH0334986A - Cephalosporin compound - Google Patents
Cephalosporin compoundInfo
- Publication number
- JPH0334986A JPH0334986A JP1170400A JP17040089A JPH0334986A JP H0334986 A JPH0334986 A JP H0334986A JP 1170400 A JP1170400 A JP 1170400A JP 17040089 A JP17040089 A JP 17040089A JP H0334986 A JPH0334986 A JP H0334986A
- Authority
- JP
- Japan
- Prior art keywords
- group
- compound
- acid
- formula
- salts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Cephalosporin compound Chemical class 0.000 title claims abstract description 46
- 229930186147 Cephalosporin Natural products 0.000 title claims description 7
- 229940124587 cephalosporin Drugs 0.000 title claims description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 35
- 239000003242 anti bacterial agent Substances 0.000 claims abstract description 8
- 125000004414 alkyl thio group Chemical group 0.000 claims abstract description 6
- 230000000269 nucleophilic effect Effects 0.000 claims abstract description 4
- 125000003545 alkoxy group Chemical group 0.000 claims abstract 2
- 150000003839 salts Chemical class 0.000 claims description 21
- 125000005843 halogen group Chemical group 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 10
- 150000002148 esters Chemical class 0.000 claims description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 5
- 239000004480 active ingredient Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 abstract description 4
- 150000002367 halogens Chemical class 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 3
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000002253 acid Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- 241000894006 Bacteria Species 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 9
- 125000006239 protecting group Chemical group 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical class CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 8
- 230000000844 anti-bacterial effect Effects 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 125000001309 chloro group Chemical group Cl* 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 238000003379 elimination reaction Methods 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 241000589517 Pseudomonas aeruginosa Species 0.000 description 3
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 150000001408 amides Chemical group 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- 108090000204 Dipeptidase 1 Proteins 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-ZSJDYOACSA-N Heavy water Chemical compound [2H]O[2H] XLYOFNOQVPJJNP-ZSJDYOACSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 description 2
- 229920000388 Polyphosphate Polymers 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 102000006635 beta-lactamase Human genes 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 150000001780 cephalosporins Chemical class 0.000 description 2
- 150000001782 cephems Chemical group 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 2
- 238000007429 general method Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 150000007530 organic bases Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- WLJVXDMOQOGPHL-UHFFFAOYSA-N phenylacetic acid Chemical compound OC(=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-UHFFFAOYSA-N 0.000 description 2
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 2
- 239000001205 polyphosphate Substances 0.000 description 2
- 235000011176 polyphosphates Nutrition 0.000 description 2
- 239000011736 potassium bicarbonate Substances 0.000 description 2
- 235000015497 potassium bicarbonate Nutrition 0.000 description 2
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 2
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 2
- 159000000001 potassium salts Chemical class 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 239000000829 suppository Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000001302 tertiary amino group Chemical group 0.000 description 2
- 150000003536 tetrazoles Chemical class 0.000 description 2
- 229940124597 therapeutic agent Drugs 0.000 description 2
- 150000007970 thio esters Chemical class 0.000 description 2
- 125000004149 thio group Chemical group *S* 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- BDNKZNFMNDZQMI-UHFFFAOYSA-N 1,3-diisopropylcarbodiimide Chemical compound CC(C)N=C=NC(C)C BDNKZNFMNDZQMI-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- LMDZBCPBFSXMTL-UHFFFAOYSA-N 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide Chemical compound CCN=C=NCCCN(C)C LMDZBCPBFSXMTL-UHFFFAOYSA-N 0.000 description 1
- KJUGUADJHNHALS-UHFFFAOYSA-N 1H-tetrazole Substances C=1N=NNN=1 KJUGUADJHNHALS-UHFFFAOYSA-N 0.000 description 1
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-M 2-methylbenzenesulfonate Chemical compound CC1=CC=CC=C1S([O-])(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-M 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 239000004475 Arginine Substances 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 1
- 101100460385 Caenorhabditis elegans nhx-2 gene Proteins 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 208000035473 Communicable disease Diseases 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- QXNVGIXVLWOKEQ-UHFFFAOYSA-N Disodium Chemical class [Na][Na] QXNVGIXVLWOKEQ-UHFFFAOYSA-N 0.000 description 1
- 241000237858 Gastropoda Species 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- AHLPHDHHMVZTML-BYPYZUCNSA-N L-Ornithine Chemical compound NCCC[C@H](N)C(O)=O AHLPHDHHMVZTML-BYPYZUCNSA-N 0.000 description 1
- ODKSFYDXXFIFQN-BYPYZUCNSA-P L-argininium(2+) Chemical compound NC(=[NH2+])NCCC[C@H]([NH3+])C(O)=O ODKSFYDXXFIFQN-BYPYZUCNSA-P 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- 239000004727 Noryl Substances 0.000 description 1
- 229920001207 Noryl Polymers 0.000 description 1
- AHLPHDHHMVZTML-UHFFFAOYSA-N Orn-delta-NH2 Natural products NCCCC(N)C(O)=O AHLPHDHHMVZTML-UHFFFAOYSA-N 0.000 description 1
- UTJLXEIPEHZYQJ-UHFFFAOYSA-N Ornithine Natural products OC(=O)C(C)CCCN UTJLXEIPEHZYQJ-UHFFFAOYSA-N 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 241000588769 Proteus <enterobacteria> Species 0.000 description 1
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 1
- 125000000066 S-methyl group Chemical group [H]C([H])([H])S* 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical class OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000002814 agar dilution Methods 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000005910 alkyl carbonate group Chemical group 0.000 description 1
- 125000006242 amine protecting group Chemical group 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- ODKSFYDXXFIFQN-UHFFFAOYSA-N arginine Natural products OC(=O)C(N)CCCNC(N)=N ODKSFYDXXFIFQN-UHFFFAOYSA-N 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 244000052616 bacterial pathogen Species 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-M benzenesulfonate Chemical compound [O-]S(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-M 0.000 description 1
- 229940077388 benzenesulfonate Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- KDPAWGWELVVRCH-UHFFFAOYSA-M bromoacetate Chemical compound [O-]C(=O)CBr KDPAWGWELVVRCH-UHFFFAOYSA-M 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001728 carbonyl compounds Chemical class 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- BGRWYRAHAFMIBJ-UHFFFAOYSA-N diisopropylcarbodiimide Natural products CC(C)NC(=O)NC(C)C BGRWYRAHAFMIBJ-UHFFFAOYSA-N 0.000 description 1
- 239000007884 disintegrant Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000002552 dosage form Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 150000002081 enamines Chemical class 0.000 description 1
- 150000002169 ethanolamines Chemical class 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N ethyl formate Chemical compound CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 235000013355 food flavoring agent Nutrition 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-O hydron;1,2-oxazole Chemical compound C=1C=[NH+]OC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-O 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 150000007529 inorganic bases Chemical class 0.000 description 1
- 239000007927 intramuscular injection Substances 0.000 description 1
- 238000010255 intramuscular injection Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- 150000002545 isoxazoles Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- CXHHBNMLPJOKQD-UHFFFAOYSA-M methyl carbonate Chemical compound COC([O-])=O CXHHBNMLPJOKQD-UHFFFAOYSA-M 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- CQDGTJPVBWZJAZ-UHFFFAOYSA-N monoethyl carbonate Chemical compound CCOC(O)=O CQDGTJPVBWZJAZ-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 229960003104 ornithine Drugs 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 150000004880 oxines Chemical group 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 229960003424 phenylacetic acid Drugs 0.000 description 1
- 239000003279 phenylacetic acid Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- 150000004892 pyridazines Chemical class 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- XHFLOLLMZOTPSM-UHFFFAOYSA-M sodium;hydrogen carbonate;hydrate Chemical compound [OH-].[Na+].OC(O)=O XHFLOLLMZOTPSM-UHFFFAOYSA-M 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical compound ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 208000024891 symptom Diseases 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Cephalosporin Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
(イ)産業上の利用分野
本発明は抗菌活性を有する新規なセファロスポリン系化
合物、その医薬として許容される塩又はエステル、それ
らを含有する抗菌剤、及びその製造法に関する。Detailed Description of the Invention (a) Industrial Application Field The present invention relates to novel cephalosporin compounds having antibacterial activity, pharmaceutically acceptable salts or esters thereof, antibacterial agents containing them, and the production thereof. Regarding the law.
(ロ)従来の技術及び
発明が解決しようとする課題
セファロスポリン系抗生物質はダラム陽性菌、クラム陰
性菌に対し幅広い抗菌活性を示し、すでに種々の半合成
セファロスポリン系化合物が市販され、各種感染性疾病
の治療剤として臨床的に用いられている。しかしなから
、これらの化合物の中て緑膿菌や変形菌に対して抗菌活
性を示す治療剤は数少ない。またこれらの化合物の多く
は耐性菌により産生されるβ−ラクタマーゼに対して不
安定であり、現在臨床上問題とされているダラム陽性菌
、緑膿菌に対する抗菌活性が低い等の欠点かある(W、
E、Wick、”Cephalosporins an
d Pen1cillinsChemistry an
d Biology”、E、H,Flynn gAca
demic
Press、New York、N、Y、、1972.
第1I章)。(b) Problems to be Solved by the Prior Art and the Invention Cephalosporin antibiotics exhibit a wide range of antibacterial activity against Durum-positive bacteria and Clam-negative bacteria, and various semi-synthetic cephalosporin compounds are already commercially available. It is used clinically as a therapeutic agent for various infectious diseases. However, among these compounds, there are only a few therapeutic agents that exhibit antibacterial activity against Pseudomonas aeruginosa and Proteus. In addition, many of these compounds are unstable against β-lactamase produced by resistant bacteria, and have drawbacks such as low antibacterial activity against Durham-positive bacteria and Pseudomonas aeruginosa, which are currently clinical problems ( W,
E. Wick, “Cephalosporins an
d Pen1cillinsChemistry an
d Biology”, E, H, Flynn gAca
demic Press, New York, N.Y., 1972.
Chapter 1I).
セフェム化合物の7位の置換分として、式
を有する化合物が知られている(特開昭62−2705
89号、同昭63−99,077号参照)。A compound having the formula is known as a substituent at the 7-position of a cephem compound (JP-A-62-2705
No. 89, see No. 63-99,077).
(ハ)課題を解決するための手段
本願発明者らは既に特廓平1−106445号において
、セフェム環の7位におけろアミド側鎖の2−(2アミ
ノチアゾール−4−イル)−2−置換オキシイミノアセ
トアミドのオキノム置換の部分に3.4ヒドロキノ−2
,5−ジクロロベンジル基を有する新規セファロスポリ
ン誘導体が広範囲の病原菌に対し強い活性を有すること
を見出している。今回更に前者の3.4−ヒドロキノ−
25−ジクロロベンジル基の構造に着目し研究を発展さ
せた結果、式(])で示されろ新規セフェム化合物か、
ダラム陽性菌、及びダラム陰性菌に対し幅広く強力な抗
菌活性を有しており、特に緑膿菌に対し極めて強い抗菌
活性を示すこと、さらに種々のβ−ラクタマーゼ産生菌
に対しても強い抗菌活性を示すこと、しかし低毒性てよ
く吸収されること等を見いだして本発明を完成した。(c) Means for Solving the Problems The present inventors have already reported in Japanese Patent Application No. 1-106445 that the 2-(2-aminothiazol-4-yl)-2 of the amide side chain at the 7-position of the cephem ring -3.4hydroquino-2 at the oquinome substitution part of the substituted oxyiminoacetamide
, 5-dichlorobenzyl group has been found to have strong activity against a wide range of pathogenic bacteria. This time, the former 3,4-hydroquino-
As a result of focusing on the structure of the 25-dichlorobenzyl group and developing research, a new cephem compound shown by the formula (]) was discovered.
It has strong antibacterial activity against a wide range of Durham-positive and Durham-negative bacteria, and in particular shows extremely strong antibacterial activity against Pseudomonas aeruginosa, as well as strong antibacterial activity against various β-lactamase-producing bacteria. The present invention was completed by discovering that the compound exhibits the following properties, but has low toxicity and is well absorbed.
したがって本発明は、抗菌剤として有用な一般式(I)
[式中、X及びYは共にハロケン原子、又は何れか一方
がハロゲン原子て他方が水素原子を表す。Therefore, the present invention provides a general formula (I) useful as an antibacterial agent, wherein X and Y are both halogen atoms, or one of them is a halogen atom and the other is a hydrogen atom.
Zは水素原子、ハロゲン原子、ビニル基、置換ビニル基
、低級アルコキノ基、低級アルキルチオ基、又はCl−
12BC式中Bは水素原子又は求核性残基)を表ず。]
で示されるセファロスポリン系化合物及びその薬理学上
許容される塩又はエステル並びにそれらを有効成分とし
て含有する抗菌剤を提供するものである。Z is a hydrogen atom, a halogen atom, a vinyl group, a substituted vinyl group, a lower alkokino group, a lower alkylthio group, or a Cl-
In the 12BC formula, B does not represent a hydrogen atom or a nucleophilic residue. ]
The present invention provides a cephalosporin compound represented by the above formula, a pharmacologically acceptable salt or ester thereof, and an antibacterial agent containing the same as an active ingredient.
セフェム7位の側鎖中には不斉炭素原子があるので、ラ
セミ体、光学活性体が存在するが何れも本願発明に含ま
れろ。Since there is an asymmetric carbon atom in the side chain at position 7 of the cephem, racemic forms and optically active forms exist, but both are included in the present invention.
本発明の式(I)で示される化合物の薬理学上許容され
る塩としては、慣用の非毒性塩、例えばナトリウム塩、
カリウム塩等のアルカリ金属塩、カルンウム塩、マクネ
ンウム塩等のアルカリ土類金属塩、アンモニウム塩、有
機塩基との塩類、例えばトリエチルアミン塩、ピリジン
塩、エタノールアミン塩、トリエタノールアミン塩、ジ
シクロヘキノルアミン塩等の有機アミン塩及びリジン、
オルニチン、アルギニンのような塩基性アミノ酸塩が挙
げられる。Pharmaceutically acceptable salts of the compound represented by formula (I) of the present invention include conventional non-toxic salts, such as sodium salts,
Alkali metal salts such as potassium salts, alkaline earth metal salts such as carunium salts and machinum salts, ammonium salts, salts with organic bases, such as triethylamine salts, pyridine salts, ethanolamine salts, triethanolamine salts, dicyclohexynolamine Organic amine salts such as salts and lysine,
Examples include basic amino acid salts such as ornithine and arginine.
上記一般式(I)において、XとYおよびZにおけるハ
ロゲン原子とは、塩素原子、臭素原子、フッ素原子など
が挙げられる。好ましくは、塩素原子又はフッ素原子で
ある。より好ましくは塩素原子である。XとYは、とも
にハロゲン原子であるか、何れか一方がハロケン原子て
他方が水素原子てあり、とらに塩素原子であるか、また
は一方が塩素原子で他方か水素原子であるのが好ましい
。In the above general formula (I), examples of the halogen atoms in X, Y, and Z include a chlorine atom, a bromine atom, and a fluorine atom. Preferably it is a chlorine atom or a fluorine atom. More preferred is a chlorine atom. It is preferable that X and Y are both halogen atoms, one is a halogen atom and the other is a hydrogen atom, and both are chlorine atoms, or one is a chlorine atom and the other is a hydrogen atom.
基Zにおける置換ビニル基としてはメヂルヒニル基、ハ
ロゲンメヂルヒニル基、低級アルコキンビニル基、低級
アルコキシメチルビニル基などが挙げられる。Examples of the substituted vinyl group for the group Z include a medylhinyl group, a halogen medylhinyl group, a lower alkoxyvinyl group, and a lower alkoxymethylvinyl group.
基Zにおける低級アルコキン基としてはメトキン、エト
キン、プロポキシ、イソプロポキン、ブトキノおよびイ
ソブトキン基か挙げられる。また基Zにおける低級アル
キルチオ基としては、メチルチオ、エチルチオ、プロピ
ルチオ、イソプロピルチオ、メチルチオおよびイソメチ
ルチオ基が挙げられる。Lower alkokyne groups in the group Z include methquine, ethquine, propoxy, isopropoquine, butoquino and isobutquine groups. Examples of the lower alkylthio group in the group Z include methylthio, ethylthio, propylthio, isopropylthio, methylthio and isomethylthio groups.
基CH2BのBにおける求核性残基には、アセトキン基
、カルバモイルオキン基、ハロゲン原子、任意に置換さ
れていてもよい芳香族複素環チオ基、低級アルキルチオ
基、低級アルコキノ基、1級、2級らしくは3級アミノ
基、又は少なくとも1つの窒素原子を含有しかつ窒素原
子を介してメチレン基に結合ずろ複素環基か含まれる。The nucleophilic residue in B of the group CH2B includes an acetoquine group, a carbamoyl oxine group, a halogen atom, an optionally substituted aromatic heterocyclic thio group, a lower alkylthio group, a lower alkokino group, a primary, Examples of secondary groups include tertiary amino groups, or heterocyclic groups containing at least one nitrogen atom and bonded to the methylene group via the nitrogen atom.
ハロゲン原子は、X、Yにおけるハロケン原子と同様な
ものか挙げられる。任意に置換されていてもよい芳香族
複素環チオ基における芳香族複素環基は、窒素原子、硫
黄原子及び酸素原子の少なくとも1つの異原子を含有す
る5員環又は6員環が含まれる。Examples of the halogen atom include those similar to the halokene atoms in X and Y. The aromatic heterocyclic group in the optionally substituted aromatic heterocyclic thio group includes a 5-membered ring or a 6-membered ring containing at least one heteroatom of a nitrogen atom, a sulfur atom, and an oxygen atom.
より具体的には、チアゾール、イソチアゾール、チアノ
アゾール、トリアゾール、テトラゾール、ビリノン、ピ
リミジン、ピリダジノ、オキサゾール、イミダゾール、
ピラゾール、オキサジアゾール、イソオキサゾール、ピ
リダジン、トリアジノなどが含まれる。これらの芳香族
複素環基の置換置としては、メチル、エチル、プロピル
のような低級アルキル基、塩素、臭素、フッ素のような
ハロゲン原子、アミノ基、ンアノ基、カルボキンメチル
基なとが挙げられる。低級アルキルチオ基には、メチル
チオ、エチルチオ、プロピルチオなどが含まれる。低級
アルコキノ基には、メトキン、エトキノ、プロポキノな
どが含まれる。1級、2級らしくは3級アミノ基には、
低級アルキル基らしくはヘンノルのようなアラルキル基
がl flU及至3個置換され7こアミノ基、例えばメ
ヂルアミノ、エヂルアミノ、ソメヂルアミノ、トリエチ
ルアミン、メチルヘンノルアミノなとか含まれる。少な
くとも1つの窒素原子を含有しかつ窒素原子を介してメ
チレン基と結合する複素環基としては、上記の芳香族複
素環の例示中の窒素原子を含有するものが挙げられる。More specifically, thiazole, isothiazole, thianoazole, triazole, tetrazole, birinone, pyrimidine, pyridazino, oxazole, imidazole,
Includes pyrazoles, oxadiazoles, isoxazoles, pyridazines, triazinos, etc. Substituents for these aromatic heterocyclic groups include lower alkyl groups such as methyl, ethyl, and propyl, halogen atoms such as chlorine, bromine, and fluorine, amino groups, anano groups, and carboxyl methyl groups. It will be done. Lower alkylthio groups include methylthio, ethylthio, propylthio, and the like. Lower alkokino groups include metquino, ethoquino, propochino, and the like. Primary, secondary, and tertiary amino groups are
Examples of lower alkyl groups include aralkyl groups such as hennol, lflU, and 7-substituted amino groups, such as medylamino, edylamino, somedylamino, triethylamine, and methylhennolamino. Examples of the heterocyclic group containing at least one nitrogen atom and bonding to a methylene group via the nitrogen atom include those containing a nitrogen atom in the above-mentioned examples of aromatic heterocycles.
これらの複素環基は、メチル、エチルのような低級アル
キル基、塩素、臭素、フッ素のようなハロゲン原子、ア
ミノ基、ソアノ基などで置換されていてらよい。These heterocyclic groups may be substituted with a lower alkyl group such as methyl or ethyl, a halogen atom such as chlorine, bromine, or fluorine, an amino group, a soano group, or the like.
本発明の化合物(I)は次に示す方法によって製造する
ことかできる。Compound (I) of the present invention can be produced by the method shown below.
すなわち次式(II)
(式中、R3は水素原子又はカルホキノル基の保護基、
Zは式(I)における定義と同し)、て=8
示される化合物もしくはそれらのアミノ基における反応
性誘導体又はそれらの塩に、次式(ll’l)[式中、
R3はヒドロキノ保護基、、R2は水素原子又はアミノ
基の保護基;x、YおよびR3は前記の定義と同一]て
示される化合物もしくはそのカルホキノル基における反
応性誘導体又はそれらの塩を反応せしめることによって
製造てきる。That is, the following formula (II) (wherein, R3 is a hydrogen atom or a protective group for a carfoquinol group,
Z is the same as defined in formula (I)), te=8 The compound shown or a reactive derivative thereof at the amino group or a salt thereof is substituted with the following formula (ll'l) [wherein,
R3 is a hydroquino-protecting group; R2 is a hydrogen atom or an amino group-protecting group; Manufactured by
化合物(II)のアミノ基における反応性誘導体の適当
な例としては、化合物(It)とアルデヒド、ケトンな
どのようなカルボニル化合物との反応によって生成した
ンッフ塩基型のイミノ又はその互変異性であるエナミン
型異性体1化合物(II)とビス(トリメチルシリル)
アセトアミドなどのようなソリル誘導体1化合物(n)
と三塩化リン又はホスゲンとの反応によって生成した誘
導体などが挙げられる。A suitable example of a reactive derivative at the amino group of compound (II) is a Nuch base-type imino or its tautomer formed by the reaction of compound (It) with a carbonyl compound such as an aldehyde, ketone, etc. Enamine type isomer 1 compound (II) and bis(trimethylsilyl)
Solyl derivative 1 compound (n) such as acetamide etc.
Examples include derivatives produced by the reaction of phosphorus trichloride or phosgene.
化合物(II)および(II)の適当な塩としては、有
機酸との塩(たとえば酢酸、マレイノ酸塩、層石酸塩、
ベンゼンスルホン酸塩、トルエンスルポン酸塩など)又
は無機酸との塩(7コとえば塩酸塩、臭化水素酸塩、硫
酸塩、リン酸塩なと)のような酸付加塩1アルカリ金属
塩またはアルカリ土類金属塩(たとえばナトリウム塩、
カリウム塩、カルシウム塩、マグネノウム塩なと)のよ
うな金属塩アンモニウム塩、有機アミン塩(たとえばト
リエチルアミン塩、ジノクロヘキンルアミン塩なと)な
どが挙げられる。Suitable salts of compounds (II) and (II) include salts with organic acids such as acetic acid, maleinate, layerite,
Acid addition salts such as benzene sulfonate, toluene sulfonate, etc.) or salts with inorganic acids (e.g. hydrochloride, hydrobromide, sulfate, phosphate, etc.) 1 Alkali metal salts or alkaline earth metal salts (e.g. sodium salts,
Examples include metal salts such as ammonium salts (such as potassium salts, calcium salts, and magnenoum salts), and organic amine salts (such as triethylamine salts and dinochlorohequinylamine salts).
化合物(III)のカルボキシル基における反応性誘導
体の適当な例としては、酸ハロゲン化物、酸アジド、酸
無水物、活性アミド、活性エステルなとがあげられ、さ
らに詳細には、酸塩化物、酸臭化物、置換リン酸(たと
えばノアルキルリン酸、ジヘンノルリン酸、ハロケン化
リン酸など)、ンアルキル亜リン酸、亜硫酸、チオ硫酸
、硫酸、炭酸アルキル(たとえば炭酸メチル、炭酸エチ
ルなと)、IQ
脂肪層カルボン酸(たとえばピバリン酸、吉草酸、イソ
吉草酸、2−エチル酢酸、トリクロロ酢酸など)又は芳
香族カルボン酸(たとえば安息香酸なと)のような酸と
の混合酸無水物、イミダゾール、ジメチルピラゾール、
トリアゾール又はテトラゾールとの活性アミド:又は活
性エステル(たとえばノアノメチルエステル、メトキシ
メチルエステル、ノンチルイミノメチル[(CH3)2
N=CH−コニステル、ビニルエステル、プロパギルエ
ステル、p−ニトロフェニルエステル、2.4−ジニト
ロフェニルエステル、トリクロロフェニルエステル、ペ
ンタクロロフェニルエステル、メノルフェニルエステル
、フェニルアゾフェニルエステル、フェニルチオエステ
ル、p−ニトロフェニルチオエステル、p−タレジルチ
オエステル、カルボキノメチルチオエステル、ピラニル
エステル、ピリジルエステル、ピペリジルエステル、8
−キノリルヂオエステルなど)、もしくはN−ヒドロキ
ン化合物(たとえば、N、N−ジメチルヒドロキンアミ
ン、1−ヒドロキノ−2−(IH)−ピリドン、N−ヒ
ドロキノフタルイミド、N−ヒドロキノフタルイミド、
1−ヒドロキノ−6−クロロIH−ヘンシトリアゾール
など)とのエステルなどが挙げられる。これらの反応性
誘導体は使用すべき反応剤化合物(III)の種類によ
って適宜選択される。Suitable examples of reactive derivatives at the carboxyl group of compound (III) include acid halides, acid azides, acid anhydrides, active amides, and active esters; more specifically, acid chlorides, acid anhydrides, and the like. Bromide, substituted phosphoric acid (e.g., noalkyl phosphoric acid, dihenenophosphoric acid, halokenated phosphoric acid, etc.), alkyl phosphorous acid, sulfite, thiosulfuric acid, sulfuric acid, alkyl carbonate (e.g., methyl carbonate, ethyl carbonate, etc.), IQ fatty layer carboxylic acid (e.g. pivalic acid, valeric acid, isovaleric acid, 2-ethyl acetic acid, trichloroacetic acid, etc.) or mixed acid anhydrides with acids such as aromatic carboxylic acids (e.g. benzoic acid), imidazole, dimethylpyrazole,
Active amides with triazoles or tetrazoles: or active esters (e.g. noanomethyl ester, methoxymethyl ester, nonthyliminomethyl [(CH3)2
N=CH-conistere, vinyl ester, propargyl ester, p-nitrophenyl ester, 2,4-dinitrophenyl ester, trichlorophenyl ester, pentachlorophenyl ester, menorphenyl ester, phenylazophenyl ester, phenylthio ester, p- Nitrophenyl thioester, p-talesyl thioester, carboquinomethyl thioester, pyranyl ester, pyridyl ester, piperidyl ester, 8
-quinolyldioester, etc.), or N-hydroquine compounds (e.g., N,N-dimethylhydroquinamine, 1-hydroquino-2-(IH)-pyridone, N-hydroquinophthalimide, N-hydroquinophthalimide,
1-hydroquino-6-chloro IH-hensitriazole, etc.). These reactive derivatives are appropriately selected depending on the type of reactant compound (III) to be used.
本発明の原料物質である式(III)の化合物、例えば
その代表例として下式(A)
で示される1(2−トリチルアミノデアゾール4−イル
)−2(Z)−ジフェニルメチルオキノカルボニル(3
,4−ジアセトキン−2,5−ジクロロフェニル)メチ
ルオキンイミノ酢酸は次のような方法で合成することが
てきる。The compound of formula (III) which is the raw material of the present invention, for example, as a representative example thereof, 1(2-tritylaminodeazol-4-yl)-2(Z)-diphenylmethyloquinocarbonyl ( 3
, 4-diacetoquine-2,5-dichlorophenyl)methyloquiniminoacetic acid can be synthesized by the following method.
マス、3.4−ジヒドロキンフェニル酢酸に、塩化スル
フリルを反応させて3.4−ジヒドロキン−2,5ジク
ロロフエニル酢酸(a)を生成させ、次にこの(a)に
無水酢酸を反応させて3./I−ジアセトキン2.5−
ジクロロフェニル酢酸(b)を得る。得られた(b)に
Pct、の存在下臭素を反応させて、(3,4ジアセト
キン−2,5−ジクロロフェニル)ブロモ酢酸(C)と
する。次いで(c)にジフェニルンアゾメタンを反応さ
せて、3.4−ジアセトキノ−25−ジクロロフェニル
)ブロモ酢酸ノフェニルメチル(d)とする。次にこの
(d)にDMF中に2Co、の存在下、(21−ジチル
アミノチアゾール−4−イル)ヒドロキノイミノ酢酸ア
リルを反応さけて2−(2−トリチルアミノチアゾール
−4−イル)−2(Z)−ンフェニルメチルオキノカル
ポニル(34−’)アセトキノ−2,5−ジクロロフェ
ニル)メチルオキンイミノ酢酸アリル(e)を得る。次
いで(e)をPd[(csHa)+p]によって脱アリ
ル化させて、上記式(A)の化合物が得られる。Mass, 3,4-dihydroquine phenylacetic acid is reacted with sulfuryl chloride to produce 3,4-dihydroquine-2,5 dichlorophenylacetic acid (a), and then this (a) is reacted with acetic anhydride. 3. /I-Diacetquin 2.5-
Dichlorophenylacetic acid (b) is obtained. The obtained (b) is reacted with bromine in the presence of Pct to give (3,4 diacetoquine-2,5-dichlorophenyl)bromoacetic acid (C). Next, (c) is reacted with diphenylon azomethane to give nophenylmethyl 3,4-diacetoquino-25-dichlorophenyl)bromoacetate (d). Next, to this (d), in the presence of 2Co in DMF, allyl (21-ditylaminothiazol-4-yl)hydroquiniminoacetate was reacted with 2-(2-tritylaminothiazol-4-yl)- Allyl 2(Z)-phenylmethyloquinocarponyl(34-')acetoquino-2,5-dichlorophenyl)methyloquiniminoacetate (e) is obtained. Then, (e) is deallylated with Pd[(csHa)+p] to obtain the compound of formula (A) above.
化合物(n)と(III)との反応は、通常、水、アセ
トン、ジオキサン、アセトニトリル、クロロホルム、塩
化メチレン、テトラヒドロフラン、酢酸エチル、N、N
−ノメチルホルムアミト、ビリノンのような慣用mW又
はこの反応に悪影響を巧えない他の有機溶媒中で行われ
る。これらの溶媒は水と混合して使用してもよい。The reaction between compound (n) and (III) is usually carried out using water, acetone, dioxane, acetonitrile, chloroform, methylene chloride, tetrahydrofuran, ethyl acetate, N, N
-Nomethylformamide, birinone, or other organic solvents that do not adversely affect the reaction. These solvents may be used in combination with water.
この反応に於いて、化合物(III)を遊離酸の形又は
塩の形で使用する場合、縮合剤としては、たとえばN、
N′−ジノクロへキノルカルボジイミドN−ノクロへキ
ンルーN′−モルホリノエチルカルボノイミト、N−ク
ロロへキンルーN”(4ノエチルアミノンクロヘキソル
)カルホノイミト:N、N′−ノエチルカルボノイミト
N N′ジイソプロピルカルボジイミド N−エチ
ルN′−(3−ジメチルアミノプロピル)カルボジイミ
ド;N、N−カルボニルビス(2−ステルイミダゾール
)、ペンタメチレンケテン−N−ソクロヘキンルイミン
:ジフェニルケテンーN−ノクロヘキノルイミン;エト
キノアセチレン 1−アルコキノ−■−クロロエチレン
、亜リン酸トリアルキル、ポリリン酸エヂル、ポリリン
酸イソプロピル、オキソ塩化リン、酸塩化リン、塩化チ
オニル塩化オキザリル:トリフェニルホスフィン、2エ
チル−7−ヒトロキノベンズイツキザゾリウム塩、2−
エチル−5−(m〜スルホフェニル)イソキザゾリウム
ヒドロキノド分子内塩、1クロロベンゼンスルホニルオ
キン)−6−クロロ−IH−ベンゾトリアゾール、ジメ
チルホルムアミドと塩化チオニル、ホスゲン、オキン塩
化リンなどとの反応によって得られるいわゆるヴイルス
マイヤー試薬などが挙げられる。In this reaction, when compound (III) is used in the form of free acid or salt, the condensing agent may be, for example, N,
N'-dinochlorohequinolcarbodiimide N-nochlorohequinru N'-morpholinoethylcarbonoimite, N-chlorohequinru N'' (4noethylaminone clohexol) carbonoimite: N,N'-noethylcarbonoimit N N'diisopropylcarbodiimide N-ethyl N'-(3-dimethylaminopropyl)carbodiimide; N,N-carbonylbis(2-sterimidazole), pentamethyleneketene-N-sochlorohekynylimine: diphenylketene-N-nocro Hequinolimine; Ethoquinoacetylene 1-alcoquino-■-chloroethylene, trialkyl phosphite, edyl polyphosphate, isopropyl polyphosphate, oxophosphorus chloride, phosphorus acid chloride, thionyl chloride oxalyl chloride: triphenylphosphine, 2-ethyl- 7-Hydroquinobenzitsuquizazolium salt, 2-
Ethyl-5-(m~sulfophenyl)isoxazolium hydroquinode inner salt, 1chlorobenzenesulfonyloquine)-6-chloro-IH-benzotriazole, dimethylformamide with thionyl chloride, phosgene, ochine phosphorus chloride, etc. Examples include the so-called Wilsmeier reagent obtained by reaction.
この反応は、また無機塩基又は有機塩基の存在下に行な
ってもよく、このような塩基の例としては、炭酸水素ア
ルカリ金属(たとえば炭酸水素ナトリウム、炭酸水素カ
リウムなど)、炭酸アルカリ土類金属(たとえば炭酸カ
ルシウムなど)、トリ(低級)アルキルアミン(たとえ
ばトリエチルアミン、トリメチルアミンなど)、ビリノ
ン、N(低級)アルキルモルホリン、N、N−ノ(低級
)−アルキルベンノルアミンなとか挙げられる。This reaction may also be carried out in the presence of an inorganic or organic base, examples of such bases being alkali metal bicarbonates (e.g. sodium bicarbonate, potassium bicarbonate, etc.), alkaline earth metal carbonates (e.g. sodium bicarbonate, potassium bicarbonate, etc.). Examples include calcium carbonate, etc.), tri(lower)alkylamines (eg, triethylamine, trimethylamine, etc.), birinone, N(lower)alkylmorpholine, and N,N-no(lower)-alkylbennoramine.
反応温度は特に限定されず、反応は通常、冶却(p 下ないし加温下に行われる。The reaction temperature is not particularly limited, and the reaction is usually carried out at It is carried out under heat.
又一般式(IV)
[式中、; X、Y、R1,Rv、Ro、およびZは前
記定義と同一]で示される化合物に求核性化合物を反応
せしめ、次いで必要てあれば保護基を除去することによ
っても、一般式(])の化合物を製造することが可能で
ある。またZ基がアセトキシメチル基の場合、後で複素
環メルカプタンと反応させて複素環チオメチル誘導体に
変えてもよい。Alternatively, a compound represented by the general formula (IV) [wherein; It is also possible to produce the compound of general formula (]) by removing. Further, when the Z group is an acetoxymethyl group, it may be converted into a heterocyclic thiomethyl derivative by later reacting with a heterocyclic mercaptan.
これらの方法により得られる生成物は、本発明の目的化
合物(I)であるか、又は目的化合物(I)のアミノ基
、カルボキシル基並びにフェノール性の水酸基の保護体
であり、従って必要により常法にてそれぞれの保護基の
除去を行なう。カルボキンル保護基及びアミン保護基の
除去の方法は脱離される保護基の種類により適宜選択さ
れる。アミノ保護基の脱離反応には加水分解、還元及び
保護基カアノル基である化合物に灯してはイミノハロゲ
ン化剤、次いてイミノエーテル化剤を作用させた後、必
要に応して加水分解する方法等の慣用される任意の方法
を適用てきる。酸を用いた加水分解の方法は一般的な方
法に−っであり、たとえばアルコキノカルボニル基、ホ
ルミル基、トリチル基等の基の脱離に適用される。また
使用される酸としては、ギ酸、トリフルオロ酢酸、塩酸
等がアミノ保護基の種類に応じて適宜選択される。反応
は無溶媒下又は水、親水性有機溶媒もしくはそれらの混
合溶媒の存在下のいずれでも行なうことがてきる。また
トリフルオロ酢酸を用いる場合はアニソールの存在下に
反応を行ってもよい。カルボキンル保護基の脱離反応に
は加水分解、還元等慣用される任意の方法を適用できる
。酸を用いた加水分解は一般的方法の一つであり、たと
えばノリル基、p−メトギシベンジル基、ジフェニルメ
チ1フ
ル基等の脱離に適用される。フェノール性の水酸基の保
護基の脱離反応についても加水分解、還元等慣用される
任意の方法が適用できる。酸あるいは塩基を用いた加水
分解は一般的方法の一つであり、例えばp−メトキンヘ
ンンル乱、ノフェニルメチル基等の脱離には酸が、アセ
チル基、ヘンジイル基等のアンル基の脱離に塩基が適用
される。The products obtained by these methods are the target compound (I) of the present invention, or are protected forms of the amino group, carboxyl group, and phenolic hydroxyl group of the target compound (I), and therefore, if necessary, conventional methods can be used. Removal of each protecting group is carried out in . The method for removing the carboquine protecting group and the amine protecting group is appropriately selected depending on the type of the protecting group to be removed. The elimination reaction of the amino protecting group involves hydrolysis, reduction, and the reaction of an iminohalogenating agent and then an iminoetherifying agent on the compound that is the protective group Kaanol group, followed by hydrolysis if necessary. Any commonly used method can be applied. The method of hydrolysis using an acid is a general method, and is applied, for example, to the elimination of groups such as alkoxycarbonyl groups, formyl groups, and trityl groups. Further, as the acid used, formic acid, trifluoroacetic acid, hydrochloric acid, etc. are appropriately selected depending on the type of amino protecting group. The reaction can be carried out either in the absence of a solvent or in the presence of water, a hydrophilic organic solvent, or a mixed solvent thereof. Furthermore, when trifluoroacetic acid is used, the reaction may be carried out in the presence of anisole. Any commonly used method such as hydrolysis or reduction can be applied to the elimination reaction of the carboquine protecting group. Hydrolysis using an acid is one of the general methods and is applied, for example, to eliminate a noryl group, a p-methoxybenzyl group, a diphenylmethybenzyl group, and the like. Any commonly used methods such as hydrolysis and reduction can also be applied to the elimination reaction of the protecting group of the phenolic hydroxyl group. Hydrolysis using an acid or a base is one of the common methods. Base is applied.
以上のようにして得られた一般式(I)の化合物は反応
廃合物中より常法により採取される。The compound of general formula (I) obtained as described above is collected from the reaction waste by a conventional method.
例えば、アンバーライトIAI)−2(ロームアンドハ
ース社製)、ダイアイオントIP−20又はセパピーズ
5P207 (三菱化成(株)製)等の吸着製レンジに
よる精製、比殿広、結晶化法等を適宜組合せることによ
り遠戚される。For example, purification using an adsorption oven such as Amberlite IAI)-2 (manufactured by Rohm and Haas), Diaiont IP-20 or Sepapes 5P207 (manufactured by Mitsubishi Kasei Corporation), Hidenohiro, crystallization method, etc. Distant relatives can be obtained by combining them appropriately.
一般式(Dで示される化合物又はその塩を主成分として
含有する抗菌剤は、主として静圧、筋注等の注射剤、カ
プセル剤、錠剤、散剤等の経口剤もしくは直腸投与剤、
油脂性座薬、水溶性座薬等の種りの剤形で使用される。Antibacterial agents containing a compound represented by the general formula (D) or a salt thereof as a main component are mainly injectables such as static pressure and intramuscular injections, oral or rectal preparations such as capsules, tablets, and powders,
It is used in various dosage forms such as oil-based suppositories and water-soluble suppositories.
これらの@種製剤は通常用いられている賦形剤、増量剤
、結合剤、湿8
間化剤、崩壊剤、表面活性剤、滑沢剤、分散剤、緩衝剤
、保存剤、溶解補助剤、防腐剤、矯味矯臭剤、無庸化剤
等を用いて常法により製造することができる。製剤法の
具体例は後記の実施例によってさらに詳述に説明する。These @species preparations contain commonly used excipients, fillers, binders, wetting agents, disintegrants, surfactants, lubricants, dispersants, buffers, preservatives, and solubilizing agents. , a preservative, a flavoring agent, a neutralizing agent, etc., and can be manufactured by a conventional method. Specific examples of the formulation method will be explained in more detail in the Examples below.
投与量は症状や年令、性別等を考慮して、個々の場合に
応じて適宜決定されるが、通常成人1日あたり250〜
3000胛2であり、これを1日1−4回に分けて投与
する。The dosage is determined on a case-by-case basis, taking into account symptoms, age, gender, etc., but it is usually 250 to 250 mg per day for adults.
The dose is 3,000 snails, which is divided into 1 to 4 doses per day.
(ニ)実施例
本発明は、更に以下の参考例及び実施例で詳しく説明さ
れるか、これらは本発明を限定するものてはなく、本発
明の範囲を逸脱しない範囲で種々の変形及び修正か可能
であることは言うまでも無い。(D) Examples The present invention will be further explained in detail in the following Reference Examples and Examples, but these do not limit the present invention, and various modifications and modifications may be made without departing from the scope of the present invention. Needless to say, it is possible.
なお、実施例中のN M Rデータは断りのない限り9
0MHzを用い、重水中の場合は、水のピークをδ値4
82とした時のδ値を示し、他の重溶媒の場合には、T
MSを基準とした時のδ値を示した。Note that the NMR data in the examples are 9 unless otherwise specified.
When using 0MHz, in the case of heavy water, the water peak is set to a δ value of 4.
82, and in the case of other heavy solvents, T
The δ value is shown based on MS.
9
実施例−1
’l−[i (2−1−ジチルアミノチアゾール−4イ
ル)−2(Z)−ノフェニルステルオキノカルボニル(
34−ジアセトキノ−2,5−ノクロロフェニル)ステ
ルオキンイミノアセトアミト]−3(I,2,3−デア
ジアゾール−5−イル)チオメチル3−セフェム−4−
カルボン酸−p−メトキノヘンシルエステルの合成
1(2−)リチルアミノチアゾールー4−イル)2(Z
)−ノフェニルステルオキノカルボニル(3,4−ジア
セトキシ−2,5−ジクロロフエニル)メチルオキソイ
ミノ酢酸400mg及び7−アミノ−3([,2,3−
チアノアゾール−5−イル)チオメチル−3−セフェム
−4−カルボン酸−p−メトキノヘンノルエステル29
0朽を塩化メチレン20mQに0
加え溶解し一20℃に冷却する。この溶液にピリノン2
00mgを加え、更にオキノ塩化リン84 mgを加え
一■5℃て2時間反応する。反応終了後、酢酸エテル1
ooxfフ15
合溶媒中に注ぎ、冷却下7%炭酸水素ナトリウム水でp
Hを7,0に調整ずろ。有機層を分取し更に15%食
塩水て洗浄する。無水MgSO4で乾燥し減圧下溶媒を
留去する。残虐をカラムクロマトグラフィ(和光ゲルC
−300 100g展開溶媒CHCI3−MeO11
・30:1)で精製し表題の化合物のノアステレオマ−
1 1の鹿合物を得る。9 Example-1 'l-[i (2-1-ditylaminothiazol-4yl)-2(Z)-nophenylsterooquinocarbonyl (
34-Diacetoquino-2,5-nochlorophenyl)steroquiniminoacetamito]-3(I,2,3-deadiazol-5-yl)thiomethyl 3-cephem-4-
Synthesis of carboxylic acid p-methoquinohensyl ester 1(2-)lytylaminothiazol-4-yl)2(Z
)-nophenylsteroquinocarbonyl (3,4-diacetoxy-2,5-dichlorophenyl)methyloxoiminoacetic acid 400 mg and 7-amino-3([,2,3-
Thianoazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid-p-methquinohene norester 29
Add 0% to 20mQ of methylene chloride, dissolve and cool to -20°C. Add pyrinone 2 to this solution.
Then, 84 mg of phosphorous ochinochloride was added and reacted at 15°C for 2 hours. After the reaction is complete, add 1 ethyl acetate
ooxf 15 Pour into a mixed solvent, and add 7% sodium bicarbonate water under cooling.
Adjust H to 7.0. The organic layer is separated and further washed with 15% brine. It was dried over anhydrous MgSO4 and the solvent was distilled off under reduced pressure. Column chromatography (Wako Gel C)
-300 100g developing solvent CHCI3-MeO11
・30:1) to produce the noastereomer of the title compound
1 Obtain 1 Shikaaimono.
r R (nujol) 3300.1780cmNM
R (CDCl2,δ)
2、15−2.25(I2H.sx4,0Acx4)、
3.10−3.35(4H,m2位Ct12x2) 3
.80(6h s,0C1i3x2)、3.8−3.9
,4.254 、 4 0 (ABq X 2 、 3
位Cl2X 2)、4.90.4.95(2H.dX
2,J=5Hz. 1l−6x 2) 、 5.80(
2H.d,d x 2 、 J−5. 9tlzj+−
7 X 2)6、05.6.15(21(、sX 2
CHX 2)、6.80−7.40(58H,mPh.
NHx 2,CPh, x 2,チアゾール環プロトン
×2)8、10(2H.dX 2,J:8Hz,C0N
HX 2)、8.40.8.45(2H.sX2デアジ
アゾール環プロトン)
実施例−2
?− [2− (2−アミノチアゾール−4−イル)2
(Z)−カルボキノ(3.4−ノヒトロキノー2.5ノ
クロロフェニル)メチルオキンイミノアセトアミドコ−
3−(I.、2.3−チアンアゾール−5−イル)チオ
メチル−3−セフェム−4−カルボン酸の合成I
実施例−1で得られた化合物200Mをアニソール0、
5岬に溶解し水冷する。これにトリフロロ酢酸2mQを
加え、水冷下1時間撹拌する。反応終了後、イソプロピ
ルエーテル50叶を加え、析出する表題化合物のトリフ
ロロ酢酸塩を濾取し乾燥する。このものを水1x(7に
懸濁し水冷下7%炭酸水素ナトリウム溶液てp Hを7
.2に調整し溶液とする。この溶液をI P − 2
0のカラムクロマトグラフィ(溶離液、水、5%メタノ
ール水)で精製し溶出液を減圧下農縮しメタノールを除
去する。得られた水溶族を凍結乾燥し表題の化合物をジ
ナトリウム塩として58mgを得る。r R (nujol) 3300.1780cmNM
R (CDCl2, δ) 2, 15-2.25 (I2H.sx4,0Acx4),
3.10-3.35 (4H, m2 position Ct12x2) 3
.. 80 (6h s, 0C1i3x2), 3.8-3.9
, 4.254 , 4 0 (ABq X 2 , 3
position Cl2X 2), 4.90.4.95 (2H.dX
2, J=5Hz. 1l-6x 2), 5.80(
2H. d, d x 2, J-5. 9tlzz+-
7 X 2)6, 05.6.15(21(,sX 2)
CHX 2), 6.80-7.40 (58H, mPh.
NHx 2, CPh, x 2, thiazole ring proton x 2) 8, 10 (2H.dX 2, J: 8Hz, C0N
HX 2), 8.40.8.45 (2H.sX2 deadiazole ring proton) Example-2? - [2- (2-aminothiazol-4-yl)2
(Z)-Carboquino(3,4-nohytoquino-2.5-chlorophenyl)methyloquiniminoacetamidoco-
Synthesis I of 3-(I.,2.3-thianazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid 200M of the compound obtained in Example-1 was mixed with anisole 0,
5. Dissolve in cape and cool with water. Add 2 mQ of trifluoroacetic acid to this and stir for 1 hour while cooling with water. After the reaction is complete, 50 g of isopropyl ether is added, and the precipitated trifluoroacetate of the title compound is collected by filtration and dried. Suspend this in 1x water (7%) and adjust the pH to 7 with 7% sodium hydrogen carbonate solution while cooling with water.
.. 2 and use it as a solution. This solution was mixed with IP-2
Purification was performed by column chromatography (eluent: water, 5% methanol/water) at 0.0 and the eluate was condensed under reduced pressure to remove methanol. The resulting water-soluble group was freeze-dried to obtain 58 mg of the title compound as a disodium salt.
! R(nujol) 33001770cmNMr(
(D20.δ)
3、+5.3.58(4)1.ABQX 2.2位CH
2X2)、3.90−3.954.25−4.40(4
H,ABQX 2.3位CH2X2)、5.05(2H
dX2 +16x 2)、5.42(2H,sx 2.
Cl1x 2)、5.65(2H,dX 2.H−7x
2)6.90−7.10(4H,sx 4.チアゾー
ル環プロトン×2環プロトンx 2)、8.75(2H
,sX 2.チアジアゾール環プロトン)
上記実施例2の化合物のダラム陽性菌およびダラム陰性
菌に対する最小発育阻止濃度を測定(寒天希釈法)した
結果を第1表に示す。! R(nujol) 33001770cmNMr(
(D20.δ) 3, +5.3.58 (4) 1. ABQX 2.2nd place CH
2X2), 3.90-3.95 4.25-4.40 (4
H, ABQX 2.3rd CH2X2), 5.05 (2H
dX2 +16x 2), 5.42 (2H, sx 2.
Cl1x 2), 5.65(2H, dX 2.H-7x
2) 6.90-7.10 (4H, sx 4. Thiazole ring proton x 2 ring proton x 2), 8.75 (2H
,sX 2. Thiadiazole Ring Proton) Table 1 shows the results of measuring the minimum inhibitory concentration of the compound of Example 2 against Durum-positive bacteria and Durum-negative bacteria (agar dilution method).
(以下余白)
第1表 最小発育阻止濃度(MIC)
試験細菌 MIC
3t、aureus Sm1th(I) 0
.20St、epidermidis
O,39ATCC14990
B、5ubtilis 1.58AT
CC6833
E、coli NIIIJ JC−20,20P、m1
rabilis GN310 0.05に、p
neumoniae GN118 0.05S
、typhimurium LT−20,10E、cl
oacae G−00050,39S、marcesc
ens GN629 0.39P、aerug
inosa GN10857 0.78P、a
eruginosa M−01480,39(ホ)発明
の効果
この発明によれば、ダラム陽性及び陰性菌に対して優れ
た抗菌性を有する抗生物質が得られる。(Left below) Table 1 Minimum inhibitory concentration (MIC) Test bacteria MIC 3t, aureus Smlth (I) 0
.. 20St, epidermidis
O, 39ATCC14990 B, 5ubtilis 1.58AT
CC6833 E, coli NIIIJ JC-20, 20P, m1
labilis GN310 0.05, p
pneumoniae GN118 0.05S
, typhimurium LT-20,10E, cl
oacae G-00050, 39S, marcesc
ens GN629 0.39P, aerug
inosa GN10857 0.78P, a
eruginosa M-01480, 39 (E) Effects of the Invention According to the present invention, an antibiotic having excellent antibacterial properties against Durham-positive and -negative bacteria can be obtained.
Claims (1)
がハロゲン原子で他方が水素原子を表す。 ;Zは水素原子、ハロゲン原子、ビニル基、置換ビニル
基、低級アルコキシ基、低級アルキルチオ基、又はCH
_2B(式中Bは水素原子又は求核性残基)を表す。]
で示されるセファロスポリン系化合物及びその薬理学上
許容される塩又はエステル。 2、請求項1に記載の化合物を有効成分として含有する
ことからなる抗菌剤。[Claims] 1. The following formula (I) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I) [In the formula, both X and Y are halogen atoms, or one of them is a halogen atom and the other is a hydrogen atom represents. ;Z is a hydrogen atom, a halogen atom, a vinyl group, a substituted vinyl group, a lower alkoxy group, a lower alkylthio group, or a CH
_2B (in the formula, B is a hydrogen atom or a nucleophilic residue). ]
A cephalosporin compound and a pharmacologically acceptable salt or ester thereof. 2. An antibacterial agent containing the compound according to claim 1 as an active ingredient.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1170400A JPH0334986A (en) | 1989-06-29 | 1989-06-29 | Cephalosporin compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1170400A JPH0334986A (en) | 1989-06-29 | 1989-06-29 | Cephalosporin compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0334986A true JPH0334986A (en) | 1991-02-14 |
Family
ID=15904226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1170400A Pending JPH0334986A (en) | 1989-06-29 | 1989-06-29 | Cephalosporin compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0334986A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1016646A1 (en) * | 1991-12-12 | 2000-07-05 | Hoechst Marion Roussel | Intermediates for the preparation of cephalosporines containing on the 7-position a substituted benzyloximino radical |
-
1989
- 1989-06-29 JP JP1170400A patent/JPH0334986A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1016646A1 (en) * | 1991-12-12 | 2000-07-05 | Hoechst Marion Roussel | Intermediates for the preparation of cephalosporines containing on the 7-position a substituted benzyloximino radical |
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