JPH0333059Y2 - - Google Patents

Info

Publication number
JPH0333059Y2
JPH0333059Y2 JP1985057516U JP5751685U JPH0333059Y2 JP H0333059 Y2 JPH0333059 Y2 JP H0333059Y2 JP 1985057516 U JP1985057516 U JP 1985057516U JP 5751685 U JP5751685 U JP 5751685U JP H0333059 Y2 JPH0333059 Y2 JP H0333059Y2
Authority
JP
Japan
Prior art keywords
support
crucible
thermocouple
heater
molecular beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985057516U
Other languages
Japanese (ja)
Other versions
JPS61174740U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985057516U priority Critical patent/JPH0333059Y2/ja
Publication of JPS61174740U publication Critical patent/JPS61174740U/ja
Application granted granted Critical
Publication of JPH0333059Y2 publication Critical patent/JPH0333059Y2/ja
Expired legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Measuring Temperature Or Quantity Of Heat (AREA)

Description

【考案の詳細な説明】 〔考案の利用分野〕 本考案は分子線源に関するものである。[Detailed explanation of the idea] [Field of application of invention] The present invention relates to a molecular beam source.

〔考案の背景〕[Background of the idea]

例えば分子線エピタキシーに用いられる分子線
源については、高橋清編著、「分子線エピタキシ
ー技術」、(株)工業調査会、昭和59年1月20日発行、
68頁に記載されているが、しかし、ルツボの温度
を検出する熱電対の支持の仕方に関する記載は見
当らない。
For example, regarding the molecular beam source used in molecular beam epitaxy, see Kiyoshi Takahashi (ed.), "Molecular Beam Epitaxy Technology", Industrial Research Association Co., Ltd., published January 20, 1980.
However, there is no description on how to support the thermocouple that detects the temperature of the crucible.

〔考案の目的〕[Purpose of invention]

本考案の目的はルツボの温度を熱電対により安
定に検出するができる分子線源を提供することに
ある。
The purpose of the present invention is to provide a molecular beam source that can stably detect the temperature of a crucible using a thermocouple.

〔考案の概要〕[Summary of the idea]

本考案は、ルツボ、ヒータ、絶縁体、熱シール
ドのこれらを支持する第1の支持台と、ルツボの
底部の温度を検出する熱電対とからなる分子線源
において、第1の支持台から支持された第2の支
持台と、第1および第2の支持台を貫通し熱電対
を内部に通して支持する碍管と、第1および第2
の支持台の間に設けらられるとともに、第1の支
持台の方向に押圧するバネを介して第2の支持台
に取り付けられ碍管の長手方向位置を調整支持可
能なクリツプとを具備したことを特徴とするもの
で、ルツボの底部に安定して、かつ、再現性良く
熱電対の検出端を押付け保持することで、ルツボ
の温度を熱電対により安定に検出できるようにし
たものである。
The present invention provides a molecular beam source consisting of a first support that supports a crucible, a heater, an insulator, and a heat shield, and a thermocouple that detects the temperature at the bottom of the crucible. an insulator tube that passes through the first and second support bases and supports the thermocouple therein;
and a clip that is provided between the support stands and is attached to the second support stand via a spring that presses in the direction of the first support stand, so that the longitudinal position of the insulator tube can be adjusted and supported. The feature is that the temperature of the crucible can be stably detected by the thermocouple by pressing and holding the detection end of the thermocouple against the bottom of the crucible stably and with good reproducibility.

〔考案の実施例〕[Example of idea]

以下、本考案の一実施例を第1図、第2図によ
り説明する。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

第1図に示す如く、支持台6と支持台2とを支
柱9で連接し、支持台2にヒータサポート4を組
合わせ、さらにヒータサポート4にヒータ3を配
設し、中心に熱シールド板10を挿入したのち、
ルツボ5をヒータ3の内部に組込んで、蒸発源を
構成する、支持台6,2並びに熱シールド板10
の中心部に、碍管1に組込まれた熱電対11を通
す穴を設けてあり、熱電対11を支持台6側より
熱電対11の検出端がルツボ5の底部に接触する
ように挿入するが、この時、第2図に示す如く碍
管1にクリツプ8を組合わせてネジ12とナツト
13により任意の位置に固着できるようにした。
さらに、碍管1が貫通できる穴を両端に設けたU
字形の板バネ7を支持台6とクリツプ8との間に
組込んで、クリツプ8を介して熱電対11の検出
端をルツボ5の底部に押し付けるようにした。こ
こで、クリツプ8の位置を変えることによつて、
熱電対11の検出端をルツボ5の底部へ押しつけ
る力を変えることができる。
As shown in FIG. 1, the support base 6 and the support base 2 are connected by a column 9, a heater support 4 is combined with the support base 2, a heater 3 is arranged on the heater support 4, and a heat shield plate is provided in the center. After inserting 10,
The crucible 5 is assembled inside the heater 3, and supports 6, 2 and a heat shield plate 10 constitute an evaporation source.
A hole is provided in the center of the insulator tube 1 to pass through the thermocouple 11, and the thermocouple 11 is inserted from the support stand 6 side so that the detection end of the thermocouple 11 contacts the bottom of the crucible 5. At this time, as shown in FIG. 2, a clip 8 was combined with the insulator tube 1 so that it could be fixed at any desired position with screws 12 and nuts 13.
Furthermore, a U with holes provided at both ends through which the insulator tube 1 can pass through.
A letter-shaped leaf spring 7 is installed between the support base 6 and the clip 8, so that the detection end of the thermocouple 11 is pressed against the bottom of the crucible 5 via the clip 8. Here, by changing the position of clip 8,
The force with which the detection end of the thermocouple 11 is pressed against the bottom of the crucible 5 can be changed.

板バネは接触面、すなわち支持面が広いので碍
管1の姿勢を安定に支持できるので、熱電対11
の検出端が安定し、温度検出の安定化に有効であ
る。このように、ルツボ5の温度を安定して検出
できるため、分子線の蒸発源の温度抑制が安定
し、分子線源の性能が向上する。
Since the leaf spring has a wide contact surface, that is, a support surface, it can stably support the posture of the insulator tube 1, so the thermocouple 11
The detection end is stable, which is effective for stabilizing temperature detection. In this way, since the temperature of the crucible 5 can be detected stably, the temperature control of the molecular beam evaporation source is stabilized, and the performance of the molecular beam source is improved.

〔考案の効果〕[Effect of idea]

本考案は、以上説明したように熱電対の姿勢が
安定し、検出端を定位置に押付け保持できるの
で、ルツボの温度を熱電対により安定に検出でき
るという効果がある。
As explained above, the present invention has the advantage that the thermocouple can maintain a stable posture and the detection end can be pressed and held in a fixed position, so that the temperature of the crucible can be stably detected by the thermocouple.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案による分子線源の一実施例を示
す要部縦断面図、第2図は第1図の熱電対とバネ
の関係の詳細を示す斜視図である。 1……碍管、2,6……支持台、3……ヒー
タ、5……ルツボ、7……板バネ、8……クリツ
プ、9……支柱、10……熱シールド板、11…
…熱電対、12……ネジ、13……ナツト。
FIG. 1 is a vertical cross-sectional view of a main part showing an embodiment of a molecular beam source according to the present invention, and FIG. 2 is a perspective view showing details of the relationship between the thermocouple and the spring shown in FIG. 1. 1... Insulator tube, 2, 6... Support stand, 3... Heater, 5... Crucible, 7... Leaf spring, 8... Clip, 9... Support column, 10... Heat shield plate, 11...
...thermocouple, 12...screw, 13...nut.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 分子線の原料を装填するルツボと、該ルツボの
外側に設けられ前記原料を加熱するヒータと、該
ヒータを支持する絶縁体と、前記ヒータによる加
熱の熱が外部に逃げるのを防止する熱シールド
と、これらを支持する第1の支持台と、該第1の
支持台を貫通し前記ルツボの底部の温度を検出す
る熱電対とからなる分子線源において、前記第1
の支持台から支持された第2の支持台と、前記第
1および第2の支持台を貫通し前記熱電対を内部
に通して支持する碍管と、前記第1および第2の
支持台の間に設けられるとともに、前記第1の支
持台の方向に押圧するバネを介して前記第2の支
持台に取り付けられ前記碍管の長手方向位置を調
整支持可能なクリツプとを具備したことを特徴と
する分子線源。
A crucible into which molecular beam raw material is loaded, a heater provided outside the crucible to heat the raw material, an insulator that supports the heater, and a heat shield that prevents heat generated by the heater from escaping to the outside. , a first support stand that supports these, and a thermocouple that penetrates the first support stand and detects the temperature at the bottom of the crucible.
a second support stand supported from the support stand; an insulator tube that passes through the first and second support stands and supports the thermocouple therein; and between the first and second support stands; and a clip that is attached to the second support base via a spring that presses in the direction of the first support base and is capable of adjusting and supporting the longitudinal position of the insulator tube. Molecular beam source.
JP1985057516U 1985-04-19 1985-04-19 Expired JPH0333059Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985057516U JPH0333059Y2 (en) 1985-04-19 1985-04-19

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985057516U JPH0333059Y2 (en) 1985-04-19 1985-04-19

Publications (2)

Publication Number Publication Date
JPS61174740U JPS61174740U (en) 1986-10-30
JPH0333059Y2 true JPH0333059Y2 (en) 1991-07-12

Family

ID=30582120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985057516U Expired JPH0333059Y2 (en) 1985-04-19 1985-04-19

Country Status (1)

Country Link
JP (1) JPH0333059Y2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725733B2 (en) * 1979-02-09 1982-05-31
JPS5842224A (en) * 1981-09-07 1983-03-11 Mitsubishi Electric Corp Vacuum evaporation cell

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725733U (en) * 1980-07-18 1982-02-10

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5725733B2 (en) * 1979-02-09 1982-05-31
JPS5842224A (en) * 1981-09-07 1983-03-11 Mitsubishi Electric Corp Vacuum evaporation cell

Also Published As

Publication number Publication date
JPS61174740U (en) 1986-10-30

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