JPH033280A - 強誘電体薄膜 - Google Patents
強誘電体薄膜Info
- Publication number
- JPH033280A JPH033280A JP1136884A JP13688489A JPH033280A JP H033280 A JPH033280 A JP H033280A JP 1136884 A JP1136884 A JP 1136884A JP 13688489 A JP13688489 A JP 13688489A JP H033280 A JPH033280 A JP H033280A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- ferroelectric
- lead
- glass
- piezoelectricity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims abstract description 47
- 239000011521 glass Substances 0.000 claims abstract description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000000463 material Substances 0.000 claims abstract description 13
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 10
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 31
- 239000013078 crystal Substances 0.000 claims description 14
- 238000002425 crystallisation Methods 0.000 claims description 7
- 230000008025 crystallization Effects 0.000 claims description 7
- 229910002113 barium titanate Inorganic materials 0.000 claims description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 4
- XKENYNILAAWPFQ-UHFFFAOYSA-N dioxido(oxo)germane;lead(2+) Chemical compound [Pb+2].[O-][Ge]([O-])=O XKENYNILAAWPFQ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 4
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 8
- 239000000919 ceramic Substances 0.000 abstract description 2
- 239000002075 main ingredient Substances 0.000 abstract 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000000034 method Methods 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 230000010287 polarization Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N15/00—Thermoelectric devices without a junction of dissimilar materials; Thermomagnetic devices, e.g. using the Nernst-Ettingshausen effect
- H10N15/10—Thermoelectric devices using thermal change of the dielectric constant, e.g. working above and below the Curie point
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8536—Alkaline earth metal based oxides, e.g. barium titanates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Inorganic Insulating Materials (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1136884A JPH033280A (ja) | 1989-05-30 | 1989-05-30 | 強誘電体薄膜 |
DE4017409A DE4017409A1 (de) | 1989-05-30 | 1990-05-30 | Ferroelektrischer duennfilm |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1136884A JPH033280A (ja) | 1989-05-30 | 1989-05-30 | 強誘電体薄膜 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH033280A true JPH033280A (ja) | 1991-01-09 |
Family
ID=15185802
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1136884A Pending JPH033280A (ja) | 1989-05-30 | 1989-05-30 | 強誘電体薄膜 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH033280A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
DE (1) | DE4017409A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5866238A (en) * | 1994-05-05 | 1999-02-02 | Minolta Co., Ltd. | Ferroelectric thin film device and its process |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS557554A (en) * | 1978-06-30 | 1980-01-19 | Murata Mfg Co Ltd | Dielectric thin film |
-
1989
- 1989-05-30 JP JP1136884A patent/JPH033280A/ja active Pending
-
1990
- 1990-05-30 DE DE4017409A patent/DE4017409A1/de active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5866238A (en) * | 1994-05-05 | 1999-02-02 | Minolta Co., Ltd. | Ferroelectric thin film device and its process |
Also Published As
Publication number | Publication date |
---|---|
DE4017409C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-12-17 |
DE4017409A1 (de) | 1990-12-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Kanno | Piezoelectric MEMS: Ferroelectric thin films for MEMS applications | |
CN101981718B (zh) | 压电薄膜及其制造方法、角速度传感器和角速度的测定方法、压电发电元件和发电方法 | |
US4354130A (en) | Surface acoustic wave device using a multi-layer substrate including α2 O3, SiO and ZnO | |
US9620703B2 (en) | Piezoelectric thin-film element, piezoelectric sensor and vibration generator | |
US6248394B1 (en) | Process for fabricating device comprising lead zirconate titanate | |
Fawzy et al. | Piezoelectric thin film materials for acoustic mems devices | |
Toyama et al. | Characterization of piezoelectric properties of PZT thin films deposited on Si by ECR sputtering | |
Rittenmyer | Electrostrictive ceramics for underwater transducer applications | |
WO2020054779A1 (ja) | 誘電性薄膜、誘電性薄膜素子、圧電アクチュエータ、圧電センサ、ヘッドアセンブリ、ヘッドスタックアセンブリ、ハードディスクドライブ、プリンタヘッド、及びインクジェットプリンタ装置 | |
US4523119A (en) | Application of lithium tetraborate to saw devices | |
JPH07106658A (ja) | 薄膜材料 | |
JPH033280A (ja) | 強誘電体薄膜 | |
Sayer et al. | Integrated piezoelectric and pyroelectric devices from thin film ferroelectrics | |
JPH045874A (ja) | 強誘電体薄膜およびその製造方法 | |
JP2003212545A (ja) | Pzt系膜体及びpzt系膜体の製造方法 | |
JPH10215008A (ja) | 圧電体セラミックス薄膜デバイス | |
JPH0244169B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | ||
Uchino | Applied aspects of piezoelectricity | |
JP5011140B2 (ja) | 圧電磁器組成物及びその製造方法並びに圧電素子 | |
JP3198300B2 (ja) | KNbO3圧電素子 | |
Kanno | Fundamentals of piezoelectric thin films for microelectromechanical systems | |
JP2568505B2 (ja) | 強誘電体薄膜素子 | |
JPH0551222A (ja) | 圧電磁器材料 | |
Palshikar et al. | Review on Piezoelectric Materials as Thin Films with their Applications | |
WO2025182412A1 (ja) | 圧電薄膜、及び圧電薄膜素子 |