JPH03291395A - Nickel plating method ensuring high corrosion resistance - Google Patents

Nickel plating method ensuring high corrosion resistance

Info

Publication number
JPH03291395A
JPH03291395A JP9227790A JP9227790A JPH03291395A JP H03291395 A JPH03291395 A JP H03291395A JP 9227790 A JP9227790 A JP 9227790A JP 9227790 A JP9227790 A JP 9227790A JP H03291395 A JPH03291395 A JP H03291395A
Authority
JP
Japan
Prior art keywords
plating
nickel
nickel plating
bright
corrosion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9227790A
Other languages
Japanese (ja)
Other versions
JPH07111000B2 (en
Inventor
Yutaka Yoshikawa
豊 吉川
Toshiaki Fukushima
敏明 福島
Tatsuhiko Hatanaka
竜彦 畑中
Atsuko Sato
敦子 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Udylite Co Ltd
Original Assignee
Ebara Udylite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Udylite Co Ltd filed Critical Ebara Udylite Co Ltd
Priority to JP2092277A priority Critical patent/JPH07111000B2/en
Publication of JPH03291395A publication Critical patent/JPH03291395A/en
Publication of JPH07111000B2 publication Critical patent/JPH07111000B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE:To form Ni plating layers having superior corrosion resistance and fine appearance by successively subjecting the surfaces of parts of an automobile, a motorcycle, etc., to Ni under plating, Ni alloy plating and finish Ni plating. CONSTITUTION:The surfaces of various metallic materials or Cu plated resin products, especially parts of an automobile, a motorcycle, etc., are subjected to Ni under-plating to form semimat or bright Ni plating layers in <10mum thickness and then Ni alloy plating layers whose potential is lower than that of the bright Ni plating layers by 0-50mV, e.g. Ni-Co, Ni-Fe, Ni-Zn or Ni-Mn alloy plating layers are formed in 0.1-1.0mum thickness. Finish Ni plating layers such as bright Ni, microporous bright Ni or microcracked bright Ni plating layers are further formed in <=6mum thickness. Triple Ni plating layers having superior corrosion resistance and fine appearance can be formed.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、高耐食ニッケルめっき方法に関し、更に詳細
には、高耐食性と優れた光沢外観を共に要求される自動
車、オートバイ等の部品に対する高耐食ニッケルめっき
方法に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a highly corrosion-resistant nickel plating method, and more particularly, to high corrosion-resistant nickel plating for parts of automobiles, motorcycles, etc. that require both high corrosion resistance and excellent glossy appearance. Regarding a corrosion-resistant nickel plating method.

[従来の技術] 屋外の風雨に晒される自動車、オートバイ等の部品には
、一般にその耐食性、優れた金属外観などの面からニッ
ケル・クロムめっきが採用されている。
[Prior Art] Nickel-chromium plating is generally used for parts of automobiles, motorcycles, etc. that are exposed to outdoor wind and rain due to its corrosion resistance and excellent metal appearance.

通常のニッケル・クロムめっきにおいては、最表面のク
ロム層の不働態化により防食しているが、クロム皮膜の
欠陥(クラック・ボア)の発生を完全に防ぐことはでき
ず、また、たとえ可能となっても、めっき後のスリキズ
等による欠陥の発生は防ぐことができないので、欠陥の
部分から腐食が開始する。そして、素地まで達した腐食
は、被めっき物の外観を著しく損ね、また、素地まで達
しない腐食であっても表面に近いニッケルの腐食が、被
めっき物の目立った外観の低下となり、商品価値を低下
させていた。
In normal nickel-chromium plating, corrosion is prevented by passivating the outermost chromium layer, but it is not possible to completely prevent defects (cracks and bores) in the chrome film, and even if it is possible, Even if this happens, it is not possible to prevent the occurrence of defects due to scratches and the like after plating, so corrosion starts from the defective parts. Corrosion that reaches the substrate significantly impairs the appearance of the object being plated, and even if corrosion does not reach the substrate, corrosion of nickel near the surface causes a noticeable deterioration in the appearance of the object that is to be plated, resulting in a decrease in commercial value. was decreasing.

このような問題を解決し、ニッケルめっきの膜厚を低下
させながら耐食性を持たせる高耐食ニッケルめっきプロ
セスとして、3重ニッケルプロセス及びマイクロポーラ
スクロムやマイクロクラッククロムプロセスがすでに開
発されている。
A triple nickel process and a microporous chromium or microcrack chromium process have already been developed as highly corrosion-resistant nickel plating processes that solve these problems and provide corrosion resistance while reducing the thickness of the nickel plating.

[発明が解決しようとする課題] 高耐食ニッケルめっきプロセスのうち、マイクロポーラ
スクロムあるいはマイクロクラッククロム法は、めっき
面の最表面のクロムに微孔や微細なりラック等の欠陥を
作成することにより、腐食電流密度を微小化し、腐食速
度を遅らせる方法であるが、いずれも初期の微細な腐食
孔も時間の経過とともに大きくなり、いわゆる「霜降り
」等の外観上目立った腐食孔となる欠点を有する。
[Problems to be Solved by the Invention] Among the highly corrosion-resistant nickel plating processes, the microporous chromium or microcrack chromium method creates defects such as micropores and fine racks in the outermost chromium of the plating surface. These methods reduce the corrosion current density and slow the corrosion rate, but they all have the disadvantage that the initially minute corrosion holes become larger over time, resulting in visually noticeable corrosion holes such as so-called "marbling".

一方、3重ニッケル(トリニッケル)プロセスは、電位
の責なニッケルめっき層(半光沢ニッケルめっき層)の
上に電位がこれより卑なニッケルめっき層(光沢ニッケ
ルめっき層)を施す二重ニッケルプロセスを改良したも
ので、半光沢ニッケル層と光沢ニッケル層の間に、イオ
ウ含量が高く、光沢ニッケル層より電位が卑なニッケル
めっき(以下、これを「トリニッケルめつき」という)
を施し、この電位が卑なトリニッケルめっき層を犠牲皮
膜として利用して光沢ニッケル層と素地の防蝕をおこな
うものである。
On the other hand, the triple nickel (tri-nickel) process is a double nickel process in which a nickel plating layer with a lower potential (bright nickel plating layer) is applied on top of a nickel plating layer with a lower potential (semi-bright nickel plating layer). This is an improved version of nickel plating, which has a higher sulfur content and a lower potential than the bright nickel layer between the semi-bright nickel layer and the bright nickel layer (hereinafter referred to as "tri-nickel plating").
This tri-nickel plating layer, which has a lower potential, is used as a sacrificial film to protect the bright nickel layer and the substrate from corrosion.

しかし、この方法も、−度この犠牲皮膜であるトリニッ
ケルめっき層に腐食が到達すると、トリニッケルめっき
層の腐食が早く、目立つ大きなビットが発生するという
問題があった。
However, this method also has the problem that once the corrosion reaches the tri-nickel plating layer, which is the sacrificial film, the tri-nickel plating layer corrodes quickly, resulting in noticeable large bits.

したがって、優れた耐食性を有し、仮に腐食が発生して
もめっき外観が低下しないニッケルめっきプロセスの開
発が望まれていた。
Therefore, it has been desired to develop a nickel plating process that has excellent corrosion resistance and does not deteriorate the appearance of the plating even if corrosion occurs.

[課題を解決するための手vL] 本発明者らは、上記課題を解決すべく、現在性なわれて
いる耐食めっき方法に関し再検討を行なった。そしてそ
の結果、大きなビットが発生するというトリニッケルプ
ロセスの欠点は、中間犠牲被膜であるトリニッケルめっ
き層の腐食が横方向に迅速に進むためであることに気づ
いた。 そこで、更に研究をおこない、中間犠牲被膜の
迅速な横方向の腐食は、被膜内部での腐食の分散により
防止しうろことに思い到った。
[Measures to Solve the Problems] In order to solve the above problems, the present inventors reexamined the currently available corrosion-resistant plating methods. As a result, they realized that the disadvantage of the tri-nickel process in that large bits occur is because the corrosion of the tri-nickel plating layer, which is an intermediate sacrificial coating, progresses quickly in the lateral direction. Therefore, after further research, it was concluded that the rapid lateral corrosion of the intermediate sacrificial coating could be prevented by dispersing the corrosion within the coating.

そしてまた、中間犠牲被膜内での腐食の分散は、中間犠
牲被膜として、その電位が両側のニッケルメッキ層より
卑であるニッケル合金めつきを採用することにより達成
できることを見出した。
It has also been found that dispersion of corrosion within the intermediate sacrificial coating can be achieved by using a nickel alloy plating whose potential is less base than the nickel plating layers on both sides as the intermediate sacrificial coating.

本発明は、これら知見に基いて完成されたものであり、
下地ニッケルめっき、ニッケル合金めつきおよび仕上げ
ニッケルめっきを順次施すことを特徴とする高耐食ニッ
ケルめっき方法を提供するものである。
The present invention was completed based on these findings,
The present invention provides a highly corrosion-resistant nickel plating method characterized by sequentially applying base nickel plating, nickel alloy plating, and final nickel plating.

本発明の高耐食ニッケルめっき方法を実施するには、ま
ず被めっき素材に下地ニッケルめっきを施すことが必要
である。
In order to carry out the highly corrosion-resistant nickel plating method of the present invention, it is first necessary to perform base nickel plating on the material to be plated.

本発明方法を実施することのできる被めっき素材には特
に制限はなく、鉄鋼、亜鉛、アルミニウム、銅、銅合金
その他の金属素地やABS樹脂その他のプラスチック素
地上に、通常の方法により前処理をしたのち、必要であ
れば、銅などの他種金属めっきを施したもののいずれを
も採用することができる。
There are no particular restrictions on the materials to be plated to which the method of the present invention can be applied, and metal substrates such as steel, zinc, aluminum, copper, copper alloys, and plastic substrates such as ABS resin are pretreated by a conventional method. After that, if necessary, it is possible to adopt any of those plated with other metals such as copper.

また、下地ニッケルめっきとしては半光沢ニッケルめっ
き、光沢ニッケルめっき、半光沢−光沢ニッケルめっき
(二重ニッケルめっき)等を採用することができる。
Further, as the base nickel plating, semi-bright nickel plating, bright nickel plating, semi-bright-bright nickel plating (double nickel plating), etc. can be employed.

この下地ニッケルめっきのうち、半光沢ニッケルめっき
は、そのイオウ共析量が、例えば0.005%以下と極
めて少なく、電位が光沢ニッケルに比べ相対的に責なめ
っきである。半光沢ニッケルめっき浴組成としては、従
来から用いられる公知ニッケルめっき浴のいずれをも採
用することができる。また、半光沢ニッケル用の光沢剤
としては、抱水クロラール、ホルマリン、クマリン等を
挙げることができる。またこれらに代えて、例えば、N
2E、BTL (荏原ニーシライト■製)などの市販の
ものを利用することもできる。
Among these base nickel platings, the semi-bright nickel plating has a very small amount of sulfur eutectoid, for example, 0.005% or less, and has a relatively poor potential compared to bright nickel. As the composition of the semi-bright nickel plating bath, any conventionally used known nickel plating bath can be employed. Further, examples of brighteners for semi-bright nickel include chloral hydrate, formalin, and coumarin. Alternatively, for example, N
Commercially available products such as 2E and BTL (manufactured by Ebara Nishilight ■) can also be used.

また、下地ニッケルのうち光沢ニッケルめっきは、イオ
ウ含量が例えば0.02〜0.07〜程度で、電位が半
光沢ニッケルめっきより相対的に卑なめっきである。光
沢ニッケルめっき浴組成としても、従来から用いられる
公知のニッケルめっき浴のいずれをも採用することがで
き、光沢剤としても、公知の光沢剤、例えば−次光沢剤
として、1゜5−1.6−又は2.5−ナフタリンジス
ルホン酸ソーダ、1,3.6−ナフタリントリスルホン
酸ソーダ、ベンゼンスルホン酸ソーダ及びサッカリン酸
ソーダなどの芳香族スルホンイミド類、及びスルフィン
酸類が単独又は組み合わせて使用され、また、光沢・レ
ベリングを付与する目的で、1,4−ブチンジオールを
代表とするアセチレン系不飽和アルコール及びその誘導
体、及びビニルスルホン酸ソーダ、アリルスルホン酸ソ
ーダなどのエチレン系不飽和スルホン酸塩、あるいは、
ピリジン系スルホン酸ソーダ塩が使用される。 またこ
れらに代えて、“61、#63(荏原ニーシライト■製
)等の市販の光沢ニッケル用光沢剤を利用しても良い。
Furthermore, among the base nickel, bright nickel plating has a sulfur content of, for example, about 0.02 to 0.07, and has a relatively base potential than semi-bright nickel plating. As the composition of the bright nickel plating bath, any of the conventionally used known nickel plating baths can be employed, and as the brightening agent, a known brightening agent such as a 1°5-1. Aromatic sulfonimides such as sodium 6- or 2.5-naphthalene disulfonate, sodium 1,3,6-naphthalene trisulfonate, sodium benzenesulfonate and sodium saccharinate, and sulfinic acids are used alone or in combination. In addition, for the purpose of imparting gloss and leveling, acetylenically unsaturated alcohols and their derivatives such as 1,4-butynediol, and ethylenically unsaturated sulfonates such as sodium vinylsulfonate and sodium allylsulfonate are also used. ,or,
Pyridine-based sulfonic acid sodium salts are used. In place of these, commercially available brightening agents for bright nickel such as "61, #63 (manufactured by Ebara Nishilight ■) may be used.

この半光沢ニッケルおよび光沢ニッケルめっきの好まし
い条件は、次の第1表の通りである。
Preferred conditions for this semi-bright nickel plating and bright nickel plating are shown in Table 1 below.

(以下余白) 第 ■ 表 範 囲 最適値 NlSO4・68.0 100〜400  g/l  
  280 g/lNiCl2・6H203G〜 60
  g/l    45 g/IH3B03   20
〜60  g/l     40  g/l光沢剤  
 適量     適量 p H3,5〜5.5    4.2 めっき温度  40〜65℃    55℃陰極電流密
度 1〜IOA/da24 A/da2撹拌   空気
、機械 空気、機械 この下地ニッケル層の膜厚は、かなり薄くすることも可
能であるが、プラスチック素材へのめっきの場合には、
熱衝撃を緩和するために10μm以上とすることが望ま
しい。
(Left below) Part ■ Table Range Optimum Value NlSO4・68.0 100-400 g/l
280 g/lNiCl2・6H203G~ 60
g/l 45 g/IH3B03 20
~60 g/l 40 g/l brightener
Appropriate amount Appropriate amount pH 3.5~5.5 4.2 Plating temperature 40~65℃ 55℃ Cathode current density 1~IOA/da24 A/da2 Stirring Air, machine Air, machine The film thickness of this base nickel layer is quite thin. However, in the case of plating on plastic materials,
The thickness is preferably 10 μm or more in order to alleviate thermal shock.

次いで、ニッケル合金めっきを施す。Next, nickel alloy plating is applied.

本発明方法において行なわれるニッケル合金めつきは、
基本的にニッケルとコバルト、鉄、亜鉛、マンガン等の
、いわゆる腐食電位列においてニッケルより卑な電位を
有する金属との合金めっきであって、この合金メツキ被
膜の電位が光沢ニッケルメッキ被膜の電位より卑であれ
ば良く、2成分合金メツキであっても、それ以上の成分
からなる合金メツキであっても良い。
The nickel alloy plating performed in the method of the present invention is
Basically, it is an alloy plating of nickel and a metal such as cobalt, iron, zinc, or manganese, which has a potential less base than nickel in the so-called corrosion potential series, and the potential of this alloy plating film is higher than the potential of the bright nickel plating film. It only needs to be base, and it may be a two-component alloy plating or an alloy plating consisting of more components.

好ましいニッケル合金メッキ被膜は、そのキャス溶液中
における腐食電位が光沢ニッケル被膜よりO〜50mV
卑なものである。
A preferable nickel alloy plating film has a corrosion potential in a Cath solution that is 0 to 50 mV lower than that of a bright nickel film.
It's vulgar.

そして、このようなニッケル合金めっき被膜は、例えば
、ニッケルとコバルト、鉄、亜鉛、マンガン等の金属の
合金メツキにより得ることができる。
Such a nickel alloy plating film can be obtained, for example, by plating an alloy of nickel and metals such as cobalt, iron, zinc, and manganese.

例えば、Ni−Co合金めつきを利用し、ニッケル合金
めっき被膜を形成する場合は、コバルト含量が5〜60
%の範囲であるニッケル合金めっき浴(工業的に利用さ
れるニッケル金属やニッケル塩には、数%のコバルトが
含まれており、ニッケルめっき被膜中にもコバルトが共
析するが、本明細書においては、このようなニッケルめ
っき被膜を100%ニッケル被誤と被膜)が使用される
For example, when forming a nickel alloy plating film using Ni-Co alloy plating, the cobalt content is 5 to 60.
% range (nickel metals and nickel salts used industrially contain several % cobalt, and cobalt is also eutectoid in the nickel plating film, but in this specification In this case, such a nickel plating film is used as a 100% nickel plating film.

また、Ni−Fe合金めっきを利用し、ニッケル合金め
っき被膜を形成せしめる場合は、鉄の含量が1〜30%
となるニッケルー鉄合金めっき浴が使用される。
In addition, when using Ni-Fe alloy plating to form a nickel alloy plating film, the iron content is 1 to 30%.
A nickel-iron alloy plating bath is used.

本発明において使用しろるニッケル合金めっき浴は、基
本的にニッケルと上記条件を満たす金属を共析しうるニ
ッケル合金めっき浴であれば良く、従って、公知のニッ
ケルめっき浴をベースとして構成しつる。
The nickel alloy plating bath used in the present invention may basically be any nickel alloy plating bath capable of eutectoiding nickel and a metal that satisfies the above conditions, and therefore is constructed based on a known nickel plating bath.

本発明において利用されうる、ワットタイプのニッケル
浴をベースとしたニッケル合金めっき浴の一例を、第2
表に示すが、本発明で使用しうるニッケル合金浴がこれ
に限定されるものでないことはもちろんで、ある。
An example of a nickel alloy plating bath based on a Watt type nickel bath that can be used in the present invention is shown in the second example.
Although shown in the table, it goes without saying that the nickel alloy bath that can be used in the present invention is not limited thereto.

本発明において、ニッケル合金めっきの膜厚には、特に
制限はないが、0.1〜1μm程度の膜厚とすることで
本発明の目的を達成することができる。
In the present invention, the film thickness of the nickel alloy plating is not particularly limited, but the object of the present invention can be achieved by setting the film thickness to about 0.1 to 1 μm.

本発明方法における仕上げニッケルめっきとしては、光
沢ニッケルめっき、光沢ニッケルーマイクロポーラスめ
っき、光沢ニッケルーマイクロクラックめっき等が挙げ
られる。
Examples of the finishing nickel plating in the method of the present invention include bright nickel plating, bright nickel-microporous plating, bright nickel-microcrack plating, and the like.

この仕上げめっきのうち光沢ニッケルは、下地ニッケル
めっきで説明したのと同様な浴組成、条件および光沢剤
により実施することができる。
Of this finish plating, bright nickel can be performed using the same bath composition, conditions, and brightener as those described for base nickel plating.

また、光沢ニッケルめっきの上に施すマイクロポーラス
めっき、マイクロクラックめっきも公知の組成、条件に
従い実施することができる。
Further, microporous plating and microcrack plating applied on bright nickel plating can also be performed according to known compositions and conditions.

仕上げめっきの膜厚は、被めっき物に所望の光沢が与え
られる膜厚であればとくに制限はないが、−aには6μ
m程度以上である。
The thickness of the final plating is not particularly limited as long as it gives the desired gloss to the plated object, but -a is 6 μm.
It is about m or more.

本発明方法により高耐食ニッケルめっきが施された被め
っき素材は、更に必要に応じ最終めっきが施される。
The material to be plated which has been subjected to highly corrosion-resistant nickel plating by the method of the present invention is further subjected to final plating if necessary.

最終めっきは、屋外使用部品の場合一般にはクロムであ
るが、これのみに限定されず、他の金属、例えば金、金
合金等を採用することも可能である。
The final plating is generally chromium in the case of parts for outdoor use, but is not limited to this, and other metals such as gold, gold alloys, etc. can also be used.

〔作  用  〕[For creation]

本発明方法により優れた耐食性が得られる理由は未だ明
確ではないが、次のように推定される。
Although the reason why excellent corrosion resistance is obtained by the method of the present invention is not yet clear, it is presumed as follows.

すなわち、金属表面欠陥からの腐食がニッケル合金めっ
き層に達した時、まず、ニッケル以外の共析金属の選択
的腐食が生じ、腐食が分散される。従来のトリニッケル
めっきにおいては、犠牲層が単一層であるため、腐食が
均一に進行し、ある大きさに達すると腐食生成物により
上層被膜が押し上げられ、早期に腐食フクレを生じるが
、本発明の場合は、ニッケル合金層の一部が腐食溶解す
るのみであるため、腐食フクレを形成する力は生じない
。更に、選択的腐食の絣了した合金めっき層中のニッケ
ルは光沢ニッケルと同一な性質をもち、かつ、微細なポ
ーラスを有する被膜となる。この不均一な被膜が腐食の
基点を与え、続く腐食を誘導、分散させることにより優
れた耐食性が得られるものと考えられる。
That is, when corrosion from metal surface defects reaches the nickel alloy plating layer, selective corrosion of eutectoid metals other than nickel occurs, and the corrosion is dispersed. In conventional tri-nickel plating, since the sacrificial layer is a single layer, corrosion progresses uniformly, and when it reaches a certain size, the upper layer is pushed up by the corrosion products, causing corrosion blisters at an early stage. In this case, only a portion of the nickel alloy layer corrodes and dissolves, so no force is generated to form corrosion blisters. Furthermore, the nickel in the alloy plating layer that has undergone selective corrosion has the same properties as bright nickel, and forms a finely porous film. It is thought that this non-uniform coating provides a starting point for corrosion, induces and disperses subsequent corrosion, and thereby provides excellent corrosion resistance.

[発明の効果] 本発明方法によれば、後記実施例に示す如く優れた耐食
性を有するニッケルめっき被膜が得られるので、屋外の
厳しい条件下で使用される物品の耐食めっき方法として
優れたものである。
[Effects of the Invention] According to the method of the present invention, a nickel plating film having excellent corrosion resistance can be obtained as shown in the examples below, so it is an excellent method for corrosion-resistant plating of articles used under harsh outdoor conditions. be.

特に、本発明方法は、腐食をめっき被膜内部に保持する
ため、長期間にわたり腐食欠陥がめつき表面に発生せず
、素材腐食はもとより表面腐食についても外観の変化と
して許容されない自動車外装部品のような高耐食性を要
求される部品に良好に採用できる。
In particular, since the method of the present invention retains corrosion inside the plating film, corrosion defects do not occur on the plating surface for a long period of time, and it is suitable for use in automotive exterior parts where not only material corrosion but also surface corrosion is not acceptable as a change in appearance. Can be well used in parts that require high corrosion resistance.

[実施例] 次に実施例を挙げ、本発明を更に具体的に説明するが、
本発明はこれら実施例に何ら制約されるものではない。
[Example] Next, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited to these examples in any way.

実施例 1゜ 常法により電導化処理後、銅めっきしたABS樹脂板(
10C11X 5 cm )をテスト板として用い、半
光沢ニッケルめっき(12μm)、Ni−Co合金めつ
き(Co含量20wt%;1μm)、光沢ニッケルめっ
き(12μm)およびクロムめっき(0,5μm)を順
次はどこし、耐食性試験片を得た。この試験片について
CASS試M (JIS 0201)をおこない、その
耐食性を評価した。この結果、CASS試験1試験1問
0 面にはなんら腐食欠陥はなく、テスト前と同様の外観を
示していた。
Example 1 A copper-plated ABS resin plate (
10C11X 5 cm) was used as a test plate, semi-bright nickel plating (12 μm), Ni-Co alloy plating (Co content 20 wt%; 1 μm), bright nickel plating (12 μm), and chrome plating (0.5 μm) were sequentially applied. A corrosion resistance test piece was then obtained. CASS test M (JIS 0201) was performed on this test piece to evaluate its corrosion resistance. As a result, the surface had no corrosion defects and had the same appearance as before the test.

なお、用いた各ニッケルめっき浴組成及び条件を第3表
に、ニッケル合金めっき浴組成を第4表に、クロムめっ
き浴組成を第5表にそれぞれ示す。
The composition and conditions of each nickel plating bath used are shown in Table 3, the composition of the nickel alloy plating bath is shown in Table 4, and the composition of the chromium plating bath is shown in Table 5.

ニッケルめっき浴組成およびめっき条件:第   3 
  表 半光沢ニッケル浴 光沢ニッケル浴 N15O,・6H1O NiC1*15HmO 00g71 45g/1 00g71 75g/l 光IR剤、添加 剤及び使用量 (0,1g/l) (2−Og/1) 2−1チン−1゜ 4−ジオール 温度 撹  拌 #極電流密度 55℃ N2  気 4^/da” 55℃ 空 気 4^/ds” ニッケル合金めっき浴組成およびめっき条件: 第    4 表 条 件 N i S O<・6 H2O N i C1z・6 H2O Co S O4・77H2 O300/1 45g/1 12.5g/l 光沢剤、添加 サッカリン (2,0g/l) H 温   度 撹   拌 陰極電流密度 3.0 55℃ クー   A「 エ   ヌ〜 4  A/da2 クロムめっき浴およびめっき条件: 第 表 条 件 無水クロム酸(Cry’)    250 g/l三価
クロム(Cr”)     2.0 g/l硫    
酸          2.5g/l温    度  
          45 ℃陰極電流密度     
 15 A/da”実施例2 Ni−Co合金めっきをCo含量60%で、膜厚6μm
のものに変え、光沢ニッケルの膜厚を6μmとする以外
は実施例1と同様にしてめっきを行ない、耐食性試料片
を得た。
Nickel plating bath composition and plating conditions: 3rd
Surface semi-bright nickel bath Bright nickel bath N15O, 6H1O NiC1*15HmO 00g71 45g/1 00g71 75g/l Photo-IR agent, additives and amount used (0.1g/l) (2-Og/1) 2-1 tin -1゜4-Diol Temperature Stirring # Pole Current Density 55℃ N2 Air 4^/da" 55℃ Air 4^/ds" Nickel Alloy Plating Bath Composition and Plating Conditions: Table 4 Conditions N i SO <・6 H2O N i C1z・6 H2O Co S O4・77H2 O300/1 45g/1 12.5g/l Brightener, added saccharin (2.0g/l) H Temperature stirring Stirring cathode current density 3.0 55℃ Cool A 4 A/da2 Chromium plating bath and plating conditions: Conditions Chromic anhydride (Cry') 250 g/l Trivalent chromium (Cr") 2.0 g/l sulfur
Acid 2.5g/l Temperature
45℃ cathode current density
15 A/da" Example 2 Ni-Co alloy plating with a Co content of 60% and a film thickness of 6 μm
Plating was carried out in the same manner as in Example 1 except that the thickness of the bright nickel was changed to 6 μm to obtain a corrosion-resistant sample piece.

このものについてCASS試験を行なったが、160時
間経過後も実施例1と同様優れた光沢、外観を維持して
いた。
A CASS test was conducted on this product, and the same excellent gloss and appearance as in Example 1 were maintained even after 160 hours.

実施例3 Ni−Co合金めつきを下記組成浴によるNi−Fe合
金めっきに変える以外は実施例1と同様にしてめっきを
行ない、耐食性試料片を得た。
Example 3 Plating was carried out in the same manner as in Example 1 except that Ni--Co alloy plating was changed to Ni--Fe alloy plating using the following composition bath to obtain a corrosion-resistant sample piece.

このものについてCASS試験を行なったが、160時
間経過後も実施例1と同様優れた光沢、外観を維持して
いた。
A CASS test was conducted on this product, and the same excellent gloss and appearance as in Example 1 were maintained even after 160 hours.

(以下余白) 第 6 表 条 件 N i S 04・6 H2O NiC1,・6H20 F e S O4・7 HzO 105g/1 60g/1 2.0  g/l 錯化剤    20g/l サッカリン        2.0 g/lアリルスル
フォン酸ソーダ  5.0 g/lH 温   度 撹   拌 陰極電流密度 3.3 60℃ 空気 4 A/d■2 実施例4 Ni−Co合金めつきを下記組成浴によるNi−Fe−
Co三元合金めっきに変える以外は実施例1と同様にし
てめっきを行ない耐食性試験片を得た。
(Left below) Table 6 Conditions N i S 04.6 H2O NiC1,.6H20 F e S O4.7 HzO 105g/1 60g/1 2.0 g/l Complexing agent 20g/l Saccharin 2.0 g/l Sodium allylsulfonate 5.0 g/lH Temperature stirring Stirring cathode current density 3.3 60°C Air 4 A/d 2 Example 4 Ni-Co alloy plating was performed using the following composition bath for Ni-Fe-
Plating was carried out in the same manner as in Example 1 except that Co ternary alloy plating was used to obtain a corrosion resistance test piece.

このものについてCASS試験を行なったが、160時
間経過後も実施例1と同様優れた光沢、外観を維持して
いた。
A CASS test was conducted on this product, and the same excellent gloss and appearance as in Example 1 were maintained even after 160 hours.

(以下余白) 第    7 表 条 件 N15O,・6H2O NiC12・6H20 COS o、・7 H2O Fe5O4=’yH,0 05 0 9,5 2,0 g/1 g/1 g/1 g/l 鉛   化   剤           20g/l
サッカリン       2.0 g/lアリルスルフ
ォン酸ソーダ  5.0 g/lH 温   度 撹   拌 陰極電流密度 3.3 60℃ 空気 4 A/ds+2 実施例5 Ni−Co合金めつきを下記組成浴によるNi−Zn合
金めつきに変える以外は実施例1と同様にしてめっきを
行ない耐食性試験片を得た。
(Leaves below) Table 7 Conditions N15O, ・6H2O NiC12・6H20 COS o, ・7 H2O Fe5O4='yH, 0 05 0 9,5 2,0 g/1 g/1 g/1 g/l Leading agent 20g/l
Saccharin 2.0 g/l Sodium allylsulfonate 5.0 g/lH Temperature stirring Stirring cathode current density 3.3 60°C Air 4 A/ds+2 Example 5 Ni-Co alloy plating was performed using the following composition bath. Plating was carried out in the same manner as in Example 1 except that Zn alloy plating was used to obtain a corrosion resistance test piece.

このものについてCASS試験を行なったが、160時
間経過後も実施例1と同様優れた光沢、外観を維持して
いた。
A CASS test was conducted on this product, and the same excellent gloss and appearance as in Example 1 were maintained even after 160 hours.

(以下余白) 第    8 表 条 件 N i S O4・6 H2O N i Cl 2・6H20 ZnSO4・7H20 50g71 45g/1 1.1g/l #63J” 15ml/1 H 温   度 撹   拌 陰極電流密度 4.0 55℃ 空気 3  A/d置装 実施例6 Ni−Co合金めっきを下記組成浴によるN i −M
 n合金めっきに変える以外は実施例1と同様にしてめ
っきを行ない耐食性試験片を得た。
(Leaving space below) Table 8 Conditions N i S O4・6 H2O N i Cl 2・6H20 ZnSO4・7H20 50g71 45g/1 1.1g/l #63J” 15ml/1H Temperature stirring Stirring cathode current density 4.0 55°C Air 3 A/d equipment Example 6 Ni-Co alloy plating was performed using Ni-M using the following composition bath.
Plating was carried out in the same manner as in Example 1 except that n-alloy plating was used to obtain a corrosion resistance test piece.

このものについてCASS試験を行なったが、160時
間経過後も実施例1と同様優れた光沢、外観を維持して
いた。
A CASS test was conducted on this product, and the same excellent gloss and appearance as in Example 1 were maintained even after 160 hours.

(以下余白) 第    9 表 条 件 N15O,・6H2O N i Cl 2・6 N20 M n S O4・4〜6 H20 50g71 5g71 25g/l サッカリン 0.5g/l H 温   度 撹   拌 陰極電流密度 4.0 55℃ 空  気 5 A/d@” 比較例 1 実施例1と同様に銅めっきをほどこしたテスト片に半光
沢ニッケルめっき(12μm)、光沢ニッケルめっき(
13μm)およびクロムめっき(0,5μm)を順次は
どこし、耐食性試験片を得た。
(Left below) Table 9 Conditions N15O, 6H2O Ni Cl 2 6 N20 M n S O4 4~6 H20 50g71 5g71 25g/l Saccharin 0.5g/l H Temperature stirring Stirring cathode current density 4.0 55°C Air 5 A/d@” Comparative Example 1 A test piece plated with copper in the same manner as in Example 1 was coated with semi-bright nickel plating (12 μm) and bright nickel plating (
13 μm) and chromium plating (0.5 μm) were sequentially applied to obtain a corrosion resistance test piece.

このものについてCASS試験を行なったところ、80
時間経過後にはすでに好ましくない腐食ビットが発生し
た。また、素材腐食は生じないものの、光沢、外観が著
しく損なわれた。
When I conducted a CASS test on this item, I found that it was 80.
After a period of time, undesirable corroded bits had already formed. Further, although material corrosion did not occur, the gloss and appearance were significantly impaired.

比較例2 Ni−Co合金めっきを第9表に示すトリニッケルめっ
きに変える以外は実施例1と同様にして耐食性試験片を
得た。
Comparative Example 2 A corrosion resistance test piece was obtained in the same manner as in Example 1 except that the Ni-Co alloy plating was changed to the tri-nickel plating shown in Table 9.

このものは、CASS試験80時間経過後において既に
腐食フクレを生じ、光沢、外観が著しく損なわれた。
After 80 hours of the CASS test, this product had already developed corrosion and blistering, and its gloss and appearance were significantly impaired.

(以下余白)(Margin below)

Claims (8)

【特許請求の範囲】[Claims] (1)下地ニッケルめっき、ニッケル合金めっきおよび
仕上げニッケルめっきを順次 施すことを特徴とする高耐食ニッケルめ っき方法。
(1) A highly corrosion-resistant nickel plating method characterized by sequentially applying base nickel plating, nickel alloy plating, and final nickel plating.
(2)ニッケル合金めっきにより形成される合金めっき
被膜の電位が、光沢ニッケル めっき被膜電位より0〜50mV卑であ る請求項第1項記載の高耐食ニッケルめ っき方法。
(2) The highly corrosion-resistant nickel plating method according to claim 1, wherein the potential of the alloy plating film formed by nickel alloy plating is 0 to 50 mV less base than the potential of the bright nickel plating film.
(3)ニッケル合金めっきが、ニッケルとコバルト、鉄
、亜鉛およびマンガンから選 ばれる金属の一種以上とからなるもので ある請求項第1項または第2項記載の高 耐食ニッケルめっき方法。
(3) The highly corrosion-resistant nickel plating method according to claim 1 or 2, wherein the nickel alloy plating consists of nickel and one or more metals selected from cobalt, iron, zinc, and manganese.
(4)下地ニッケルめっきが半光沢ニッケルであり、仕
上げニッケルめっきが光沢ニ ッケルめっきである請求項第1項ないし 第3項のいずれかの項記載の高耐食ニッ ケルめっき方法。
(4) The highly corrosion-resistant nickel plating method according to any one of claims 1 to 3, wherein the base nickel plating is semi-bright nickel and the finishing nickel plating is bright nickel plating.
(5)下地ニッケルめっきが二重ニッケルであり、仕上
げニッケルめっきが光沢ニッ ケルめっきである請求項第1項ないし第 3項のいずれかの項記載の高耐食ニッケ ルめっき方法。
(5) The highly corrosion-resistant nickel plating method according to any one of claims 1 to 3, wherein the base nickel plating is double nickel plating and the finishing nickel plating is bright nickel plating.
(6)下地ニッケルめっきおよび仕上げニッケルめっき
がいずれも光沢ニッケルめっ きである請求項第1項ないし第3項のい ずれかの項記載の高耐食ニッケルめっき 方法。
(6) The highly corrosion-resistant nickel plating method according to any one of claims 1 to 3, wherein both the base nickel plating and the finish nickel plating are bright nickel plating.
(7)仕上げニッケルめっきが光沢ニッケル−マイクロ
ポーラスニッケルめっきであ る請求項第1項ないし第3項のいずれか の項記載の高耐食ニッケルめっき方法。
(7) The highly corrosion-resistant nickel plating method according to any one of claims 1 to 3, wherein the final nickel plating is bright nickel-microporous nickel plating.
(8)仕上げニッケルめっきが光沢ニッケル−マイクロ
クラックニッケルめつきであ る請求項第1項ないし第3項のいずれか の項記載の高耐食ニッケルめっき方法。
(8) The highly corrosion-resistant nickel plating method according to any one of claims 1 to 3, wherein the final nickel plating is bright nickel-microcrack nickel plating.
JP2092277A 1990-04-09 1990-04-09 High corrosion resistance nickel plating method Expired - Fee Related JPH07111000B2 (en)

Priority Applications (1)

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Application Number Priority Date Filing Date Title
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JPH03291395A true JPH03291395A (en) 1991-12-20
JPH07111000B2 JPH07111000B2 (en) 1995-11-29

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007270276A (en) * 2006-03-31 2007-10-18 Shimano Inc Parts for outdoor use
JP2008031555A (en) * 2006-07-05 2008-02-14 Kakihara Kogyo Kk Process for production of decoratively plated article by utilizing the impartation of electroconductivity to resin by sputtering, and hanging jig for fixing of resin molding
JP2008050673A (en) * 2006-08-28 2008-03-06 Toyota Motor Corp Plating method and method of manufacturing fine pitch wiring board
JP2009074147A (en) * 2007-09-21 2009-04-09 Kakihara Kogyo Kk Method for preventing problems associated with microporous plating
JP2009074170A (en) * 2007-08-30 2009-04-09 Nissan Motor Co Ltd Chrome-plated part and manufacturing method of the same
JP2009074168A (en) * 2007-08-30 2009-04-09 Nissan Motor Co Ltd Chrome-plated part and manufacturing method of the same
JP2012149331A (en) * 2011-01-21 2012-08-09 Nippon Steel Corp Plated steel excellent in corrosion resistance and workability, and method for manufacturing the same
CN103160868A (en) * 2011-12-17 2013-06-19 鞍钢重型机械有限责任公司 Electrolyte for producing active nickel with sulfur and use method thereof
WO2013094766A1 (en) * 2011-12-22 2013-06-27 オーエム産業株式会社 Plated article and manufacturing method therefor
WO2020184289A1 (en) * 2019-03-12 2020-09-17 株式会社Jcu Microporous plating solution and method of using this plating solution to perform microporous plating on object to be plated

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5550488A (en) * 1978-10-05 1980-04-12 C Uyemura & Co Ltd Corrosion-resistant plating method
JPS5681695A (en) * 1979-12-05 1981-07-03 C Uyemura & Co Ltd Plating method to provide corrosion resistance
JPS59100283A (en) * 1982-11-12 1984-06-09 スト−ク・スクリ−ンス・ビ−・ブイ・ Metal products and manufacture

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5550488A (en) * 1978-10-05 1980-04-12 C Uyemura & Co Ltd Corrosion-resistant plating method
JPS5681695A (en) * 1979-12-05 1981-07-03 C Uyemura & Co Ltd Plating method to provide corrosion resistance
JPS59100283A (en) * 1982-11-12 1984-06-09 スト−ク・スクリ−ンス・ビ−・ブイ・ Metal products and manufacture

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007270276A (en) * 2006-03-31 2007-10-18 Shimano Inc Parts for outdoor use
JP2008031555A (en) * 2006-07-05 2008-02-14 Kakihara Kogyo Kk Process for production of decoratively plated article by utilizing the impartation of electroconductivity to resin by sputtering, and hanging jig for fixing of resin molding
JP2008050673A (en) * 2006-08-28 2008-03-06 Toyota Motor Corp Plating method and method of manufacturing fine pitch wiring board
US9650722B2 (en) 2007-08-30 2017-05-16 Nissan Motor Co., Ltd. Chrome-plated part and manufacturing method of the same
JP2009074170A (en) * 2007-08-30 2009-04-09 Nissan Motor Co Ltd Chrome-plated part and manufacturing method of the same
JP2009074168A (en) * 2007-08-30 2009-04-09 Nissan Motor Co Ltd Chrome-plated part and manufacturing method of the same
JP2009074147A (en) * 2007-09-21 2009-04-09 Kakihara Kogyo Kk Method for preventing problems associated with microporous plating
JP2012149331A (en) * 2011-01-21 2012-08-09 Nippon Steel Corp Plated steel excellent in corrosion resistance and workability, and method for manufacturing the same
CN103160868A (en) * 2011-12-17 2013-06-19 鞍钢重型机械有限责任公司 Electrolyte for producing active nickel with sulfur and use method thereof
WO2013094766A1 (en) * 2011-12-22 2013-06-27 オーエム産業株式会社 Plated article and manufacturing method therefor
JPWO2013094766A1 (en) * 2011-12-22 2015-04-27 オーエム産業株式会社 Plating product and manufacturing method thereof
WO2020184289A1 (en) * 2019-03-12 2020-09-17 株式会社Jcu Microporous plating solution and method of using this plating solution to perform microporous plating on object to be plated
CN113557325A (en) * 2019-03-12 2021-10-26 株式会社杰希优 Micropore plating solution and micropore plating method for plated object using the same

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