JPH03290965A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH03290965A JPH03290965A JP9171590A JP9171590A JPH03290965A JP H03290965 A JPH03290965 A JP H03290965A JP 9171590 A JP9171590 A JP 9171590A JP 9171590 A JP9171590 A JP 9171590A JP H03290965 A JPH03290965 A JP H03290965A
- Authority
- JP
- Japan
- Prior art keywords
- support plate
- contact
- electrode body
- pressure
- columnar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 28
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 230000002093 peripheral effect Effects 0.000 claims abstract 3
- 239000000463 material Substances 0.000 claims description 9
- 239000004020 conductor Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 13
- 238000003825 pressing Methods 0.000 abstract description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Thyristors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体基板の一方の面に半導体材料に熱膨脹
係数の近位した材料からなる支持板が固着され、半導体
基板の他方の面および支持板の一面にそれぞれ電極体が
外方からの力で直接または間接に加圧接触する半導体装
置に関する。Detailed Description of the Invention [Industrial Application Field] The present invention is characterized in that a supporting plate made of a material having a coefficient of thermal expansion close to that of the semiconductor material is fixed to one surface of a semiconductor substrate, and The present invention relates to a semiconductor device in which electrode bodies are brought into direct or indirect pressure contact with one surface of a support plate by an external force.
ダイオード、サイリスタ、ゲートターンオフ(GTO)
サイリスクなどの電力用半導体装置において、電気、熱
の良導体である銅などの材料からなる部分を有する容器
中に半導体基板を収納する際、シリコンなどの半導体材
料と良導性材料との熱膨脹係数の差による応力が半導体
基板に加わらないよう、半導体基板に容器の一部をなす
銅などからなる電極体を外方からの力で接触させる加圧
接触構造が採用されることはよく知られている。Diode, thyristor, gate turn-off (GTO)
In power semiconductor devices such as Cyrisk, when storing a semiconductor substrate in a container that has a part made of a material such as copper, which is a good conductor of electricity and heat, it is necessary to It is well known that a pressure contact structure is used in which an electrode body made of copper or the like, which forms part of the container, is brought into contact with the semiconductor substrate by external force in order to prevent the stress caused by the difference from being applied to the semiconductor substrate. .
しかし、半導体基板は取扱いの際に破損をしやすいため
、予め、例えばシリコンからなる半導体基板とモリブデ
ン、タングステンなどシリコンと熱膨脹係数の近位した
材料からなる支持板とを合金化接着させてエレメントと
することが通常行われる。However, since semiconductor substrates are easily damaged during handling, the semiconductor substrate made of, for example, silicon is alloyed and bonded with a support plate made of a material with a coefficient of thermal expansion close to that of silicon, such as molybdenum or tungsten, to form an element. It is usually done.
第2図は従来のGTOサイリスクを示し、−面にカソー
ド電極2が設けられたSi基板lはMo支持板3の上に
Mを用いての合金化により固着されており、セラミック
外筒4とそれに可撓部5を介して気密に結合されたカソ
ード電極体6および7ノ一ド銅電極体7からなる容器中
に収容されている。容器外からの圧力によりカソード銅
電極体6はMoからなる接触板8を介してカソード電極
2と、アノード銅電極体7は支持板3と加圧接触する。FIG. 2 shows a conventional GTO Sirisk, in which a Si substrate 1 with a cathode electrode 2 provided on the negative side is fixed on a Mo support plate 3 by alloying with M, and a ceramic outer cylinder 4 and The cathode electrode body 6 and the seven-node copper electrode body 7 are housed in a container which is airtightly connected to the cathode electrode body 6 through a flexible portion 5. Due to pressure from outside the container, the cathode copper electrode body 6 is brought into pressure contact with the cathode electrode 2 via the contact plate 8 made of Mo, and the anode copper electrode body 7 is brought into pressure contact with the support plate 3.
しかし、例えばSiとMeの熱膨脹係数は完全には等し
くないため、厚さ0.65鵬の33基板1と厚さ2■の
Mo支持板3を合金カソード接着すると、得られたエレ
メントに図示のようにMo側が凹面となるそりが生ずる
。この傾向は、エレメントが大面積化するほど顕著であ
り、例えば直径60mのエレメントでは約0.1簡のそ
りが生ずる。このようなそりの状態はエレメント1個ず
つで異なり、そりのあるエレメントをはさんで両側の電
極体6.7間を例えば最大3tの力で加圧しても、エレ
メントと電極体間の圧力を均一にすることは困難である
。However, for example, the thermal expansion coefficients of Si and Me are not completely equal, so when the 33 substrate 1 with a thickness of 0.65 mm and the Mo support plate 3 with a thickness of 2 mm are bonded with an alloy cathode, the resulting element has the shape shown in the figure. Warpage occurs in which the Mo side becomes a concave surface. This tendency becomes more pronounced as the area of the element becomes larger; for example, in an element with a diameter of 60 m, a warp of about 0.1 length occurs. The state of such warpage differs from element to element, and even if a force of up to 3 tons is applied between the electrode bodies 6 and 7 on both sides of an element with warpage, the pressure between the element and the electrode body will not be reduced. It is difficult to make it uniform.
特にGTOサイリスクのようにSi基板の一面のカソー
ド電極2が、例えば直径60簡の基板で1000〜20
00本に細分化されているようなエレメントでは、不均
一な加圧ではニレメト上の一部のカソード電橋と接触板
8との電気的接触が悪くなり、半導体装置としての性能
が低下するという問題があった。In particular, the cathode electrode 2 on one side of the Si substrate, such as GTO Sirisk, has a diameter of 1,000 to 20,000
In an element that is subdivided into 00 pieces, uneven pressure will cause poor electrical contact between some of the cathode bridges on the niremet and the contact plate 8, resulting in a decline in the performance of the semiconductor device. There was a problem.
本発明の目的は、支持板と半導体基板とを固着したエレ
メントの両面と電極体との加圧接触が均一に行われる半
導体装置を提供することにある。An object of the present invention is to provide a semiconductor device in which both sides of an element to which a support plate and a semiconductor substrate are fixed are brought into uniform pressure contact with an electrode body.
上記の目的を達成するために、本発明は半導体基板の一
方の面が半導体材料に近似した熱膨脹係数をもつ材料か
らなる支持板上に固着され、良導性材料からなる電極体
と半導体基板の他方の面および支持板のそれぞれとの電
気的接続が外部からの圧力による加圧接触で行われる半
導体装置において、一つの!掻体は、支持板の外径より
小さい外径をもち、端面が支持板と接触する内側柱状部
とその柱状部より大きい外径をもつ外側柱状部とからな
り、外側柱状部の内側に生ずる段差面と支持板面との間
に支持板外周部を加圧するばね部材を備えたものとする
。In order to achieve the above object, the present invention provides that one side of a semiconductor substrate is fixed on a support plate made of a material having a coefficient of thermal expansion similar to that of the semiconductor material, and an electrode body made of a highly conductive material and the semiconductor substrate are bonded to each other. In a semiconductor device in which the electrical connection with the other surface and the support plate is made by pressure contact using external pressure, one! The scraping body consists of an inner columnar part having an outer diameter smaller than the outer diameter of the support plate and whose end surface is in contact with the support plate, and an outer columnar part having an outer diameter larger than that columnar part, and is formed inside the outer columnar part. A spring member is provided between the step surface and the support plate surface to press the outer circumference of the support plate.
支持板外周部をばね部材が加圧することにより、支持板
と半導体基板との固着によりそりが矯正され、外部から
の圧力が加わらない状態においても、両型掻体と半導体
基板面あるいは支持板面との直接あるいは間接的な接触
が全面で行われているため、外部からの圧力により均一
な加圧接触が行われる。By applying pressure to the outer periphery of the support plate by the spring member, warpage is corrected by fixation between the support plate and the semiconductor substrate, and even when no external pressure is applied, both types of scrapers and the semiconductor substrate surface or the support plate surface are Since direct or indirect contact is made over the entire surface, uniform pressurized contact is achieved by external pressure.
第1図は本発明の一実施例のGTOサイリスタを禾し、
第2図と共通の部分には同一の符号が付されている。こ
のGTOサイリスタでは、アノード銅電極体7の断面は
径の異なる二つの柱状部が連結された凸形であり、外径
の小さい端面71側で直径67nのエレメントのMo支
持板3に接触する。FIG. 1 shows a GTO thyristor according to an embodiment of the present invention,
Components common to those in FIG. 2 are given the same reference numerals. In this GTO thyristor, the anode copper electrode body 7 has a convex cross section in which two columnar parts with different diameters are connected, and contacts the Mo support plate 3 of the element with a diameter of 67n on the end face 71 side having a small outer diameter.
アノード銅電極体7の外径が50鶴で断面積の小さい柱
状部の周囲のMo支持板3とアノード銅電極体7の外径
が65mで断面積の大きい柱状部との間に存在する幅7
.5論の空間に、環状ばね9が配置されており、このば
ね9がMo支持板3の外周部に約100に、の圧力を加
える。この圧力により% Si基板1およびMo支持板
3からなるエレメントのそりは矯正されて多数のカソー
ド銅電極2はMo接触板8と、Mo支持板3はアノード
銅電極体7の端面71と、外部からの圧力が加わらない
ときにも全面で接触する。従って、外部からの圧力が加
わったときのカソード銅電極体6の接触板8を介しての
カソード電極2との加圧接触、アノード銅電極体7のM
。The width that exists between the Mo support plate 3 around the columnar part of the anode copper electrode body 7 with an outer diameter of 50 m and a small cross-sectional area and the columnar part of the anode copper electrode body 7 with an outer diameter of 65 m and a large cross-sectional area. 7
.. An annular spring 9 is arranged in the space of 5, and this spring 9 applies a pressure of about 100 mm to the outer circumference of the Mo support plate 3. Due to this pressure, the warpage of the element consisting of the Si substrate 1 and the Mo support plate 3 is corrected. The entire surface is in contact even when no pressure is applied. Therefore, when external pressure is applied, the cathode copper electrode body 6 is brought into pressure contact with the cathode electrode 2 via the contact plate 8, and the anode copper electrode body 7 is
.
支持板3との加圧接触は均一に行われる。従って、多数
のカソード電極の全てに均一な電気的接続が行われる。Pressure contact with the support plate 3 is made uniform. Therefore, uniform electrical connections are made to all of the large number of cathode electrodes.
以上の実施例はGTOサイリスタについて述べたが、ダ
イオード、通常のサイリスタ、逆導通サイリスクなど他
の加圧接触構造の電力用半導体装置にもそのまま適用で
きる。また、Mo接触板8を用いない半導体装置、ある
いはその代わりに銀などからなる可滑動性中間板を用い
た半導体装置にも適用できる。Although the above embodiments have been described with respect to a GTO thyristor, they can also be applied to other power semiconductor devices having a pressure contact structure, such as diodes, ordinary thyristors, and reverse conduction thyristors. Further, the present invention can also be applied to a semiconductor device that does not use the Mo contact plate 8 or a semiconductor device that uses a movable intermediate plate made of silver or the like instead.
本発明によれば、半導体基板を支持板に同社する際、熱
膨脹係数の相違によって生ずるそりを支持板の外周部を
ばね材で加圧して矯正することにより、エレメントの両
面に電極体あるいは介在する接触板を平面的に接触させ
ることができる。この結果、画電極体に圧力を加えて使
用する際、エレメントの電極あるいは支持板との全面で
の均一な電気的接続が可能となり、不均一接触による電
流の偏りの問題がなくなり、例えばGTOサイリスタの
遮断電流特性の向上が達せられた。According to the present invention, when a semiconductor substrate is mounted on a support plate, the warpage caused by the difference in coefficient of thermal expansion is corrected by applying pressure to the outer periphery of the support plate with a spring material. The contact plates can be brought into contact in a two-dimensional manner. As a result, when applying pressure to the picture electrode body, it is possible to make a uniform electrical connection over the entire surface of the element with the electrode or supporting plate, eliminating the problem of current imbalance due to uneven contact. An improvement in the breaking current characteristics was achieved.
第1図は本発明の一実施例のGTOサイリスタの断面図
、第2図は従来のGTOサイリスタの断面図である。
1:シリコン基板、2:カソード電極、3:MO支持板
、6:カソード銅ti体、7;アノード綱電極体、8:
Mo接触板、9:環状ばね。
第1図
第2図FIG. 1 is a sectional view of a GTO thyristor according to an embodiment of the present invention, and FIG. 2 is a sectional view of a conventional GTO thyristor. 1: Silicon substrate, 2: Cathode electrode, 3: MO support plate, 6: Cathode copper Ti body, 7: Anode electrode body, 8:
Mo contact plate, 9: annular spring. Figure 1 Figure 2
Claims (1)
脹係数をもつ材料からなる支持板上に固着され、良導性
材料からなる電極体と半導体基板の他方の面および支持
板のそれぞれとの電気的接続が外部からの圧力による加
圧接触で行われるものにおいて、一つの電極体は、支持
板の外径より小さい外径をもち、端面が支持板と接触す
る内側柱状部とその柱状部より大きい外径をもつ外側柱
状部とからなり、外側柱状部の内側に生ずる段差面と支
持板面との間に支持板外周部を加圧するばね部材を備え
たことを特徴とする半導体装置。1) One surface of the semiconductor substrate is fixed on a support plate made of a material with a thermal expansion coefficient similar to that of the semiconductor material, and an electrode body made of a highly conductive material is connected to the other surface of the semiconductor substrate and the support plate, respectively. In the case where the electrical connection is made by pressurized contact by external pressure, one electrode body has an outer diameter smaller than the outer diameter of the support plate, and an inner columnar part whose end surface is in contact with the support plate, and the columnar part. What is claimed is: 1. A semiconductor device comprising: an outer columnar portion having a larger outer diameter, and comprising a spring member for pressurizing the outer peripheral portion of the support plate between a step surface formed inside the outer columnar portion and the support plate surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9171590A JPH03290965A (en) | 1990-04-06 | 1990-04-06 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9171590A JPH03290965A (en) | 1990-04-06 | 1990-04-06 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03290965A true JPH03290965A (en) | 1991-12-20 |
Family
ID=14034208
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9171590A Pending JPH03290965A (en) | 1990-04-06 | 1990-04-06 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03290965A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6130258B2 (en) * | 1974-12-27 | 1986-07-12 | Canon Kk |
-
1990
- 1990-04-06 JP JP9171590A patent/JPH03290965A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6130258B2 (en) * | 1974-12-27 | 1986-07-12 | Canon Kk |
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