JPH03290917A - Mask holder - Google Patents

Mask holder

Info

Publication number
JPH03290917A
JPH03290917A JP2092018A JP9201890A JPH03290917A JP H03290917 A JPH03290917 A JP H03290917A JP 2092018 A JP2092018 A JP 2092018A JP 9201890 A JP9201890 A JP 9201890A JP H03290917 A JPH03290917 A JP H03290917A
Authority
JP
Japan
Prior art keywords
mask
pressing force
positioning
fingers
main body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2092018A
Other languages
Japanese (ja)
Inventor
Hidehiko Fujioka
秀彦 藤岡
Yuji Chiba
千葉 裕司
Nobutoshi Mizusawa
水澤 伸俊
Takuo Kariya
刈谷 卓夫
Shunichi Uzawa
鵜澤 俊一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2092018A priority Critical patent/JPH03290917A/en
Publication of JPH03290917A publication Critical patent/JPH03290917A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces

Abstract

PURPOSE:To control optimum pressing force, improve positioning accuracy and make positioning smooth by limiting an opening angle of fingers so that a claw is engaged in a groove on a mask side while the fingers are open. CONSTITUTION:When a mask 4 is positioned and mounted on a mask stage 8, the mask 4 is press-fitted to a V-block 9 with fingers 11 open. Since the mask 4 can freely move in parallel to a mask surface by a function of a parallel spring 19 at this time, movement along a V-groove is free and a pressing motion for smooth positioning is possible. A shaft 20a of a sucking member 20 is returned toward a main body 17 according to pressing force of the mash 4 against the V-block 7 so as to press a plate spring 22 to have it deformed, and a resistance value of a strain gage changes to allow the pressing force to be detected. Control of the pressing force wherein positioning pressure is feedback controlled or pressing force is weakened at the time of theta driving or sucking the mask is possible based on the detected pressing force.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は半導体露光装置に関し、特にX線マスク搬送機
構におけるマスク保持装置(マスクハント)に関するも
のである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor exposure apparatus, and particularly to a mask holding device (mask hunt) in an X-ray mask transport mechanism.

[従来の技術] 最近のIC,LSI、などの半導体素子製造用の露光装
置に於いては半導体素子の高集積化に伴ないより高分解
能の焼付か可能な例えば、波長1人〜150入程度のX
線を利用した露光装置が提案されている。この様なX線
露光装置においては、その露光光の特性から従来の露光
光として紫外線領域を利用する露光装置に用いられるガ
ラス等の材料を基板としていたマスクと大きく異なる構
造を持つ。具体的には、薄い膜の上にX線吸収体をもっ
てパターンを形威し、その膜を基板等で支持するという
構造のマスクか使用される。
[Prior Art] Recent exposure apparatuses for manufacturing semiconductor devices such as ICs and LSIs are capable of printing with higher resolution, for example, wavelengths of 1 to 150, as semiconductor devices become more highly integrated. X of
Exposure devices using lines have been proposed. Due to the characteristics of the exposure light, such an X-ray exposure apparatus has a structure that is significantly different from a mask whose substrate is made of a material such as glass used in a conventional exposure apparatus that uses ultraviolet light as the exposure light. Specifically, a mask is used in which a pattern is formed on a thin film using an X-ray absorber, and the film is supported by a substrate or the like.

一般に支持膜の厚さは、有機材料膜(例えばポリイミド
など)の場合、5〜10μmであり、無機材料膜(例え
ば、SiN、SiCなと)の場合は、2〜5μm程度で
ある。
Generally, the thickness of the support film is 5 to 10 μm in the case of an organic material film (eg, polyimide, etc.), and about 2 to 5 μm in the case of an inorganic material film (eg, SiN, SiC, etc.).

保持枠は、マスクブランクスの製造7去により異るが、
前記支持膜が無機材料の時は0.5〜3IIIIn厚の
St板を用いる。又、前記支持膜が、有機材料の時は、
例えば5mm程度のガラス、セラくツクス等が用いられ
る。いずれの場合も、X線吸収体の形成された支持膜の
張力を均等に印加し、局所的な歪みを最小限に抑える為
に、円環形状を基本としており、回転対称性を有する形
状としている。
The holding frame varies depending on the manufacturing process of the mask blank, but
When the support film is an inorganic material, an St plate having a thickness of 0.5 to 3IIIn is used. Further, when the support film is an organic material,
For example, glass, ceramics, etc. of about 5 mm are used. In either case, in order to apply tension evenly to the support film on which the X-ray absorber is formed and to minimize local distortion, the shape is basically annular and has rotational symmetry. There is.

更に、製造上(例えば、エツチングの簡便化の為)前記
保持枠が、非常に薄い(3mm以下とする)場合、剛性
、及び強度、補強の為1、前記保持枠に補強体を貼り付
ける事は、よく知られており、低膨張ガラス、石英ガラ
スなどが用いられる。
Furthermore, if the holding frame is very thin (3 mm or less) due to manufacturing reasons (for example, to simplify etching), a reinforcing body may be attached to the holding frame for rigidity, strength, and reinforcement. is well known, and low expansion glass, quartz glass, etc. are used.

[発明が解決しよう−とする課題] しかしながら、この様なX線露光装置で用いられるマス
クを装置内で自動搬送する際にはその特殊な構成から、
以下の様な問題があった。
[Problems to be Solved by the Invention] However, when the mask used in such an X-ray exposure device is automatically conveyed within the device, due to its special configuration,
There were the following problems.

従来、前記マスクを搬送する機構に於いては、一般には
機械的に把持されるが前記マスクが前述した如く円環形
状の為、側面を把持しようとする場合、把持可能な面積
は非常に少ない、又面積を増加する工夫を加えたとして
も前述した如く前記支持膜は、数μm以下の厚さであり
、非常に脆く、一定方向に大きな力を加え局所的な歪を
加えると変形または破損につながる可能性がある。
Conventionally, in the mechanism for conveying the mask, the mask is generally held mechanically, but as the mask has an annular shape as described above, when trying to hold the sides, the area that can be gripped is very small. Moreover, even if measures are taken to increase the area, as mentioned above, the support film is only a few micrometers thick or less, and is extremely brittle, and will deform or break if a large force is applied in a certain direction and local strain is applied. may lead to.

更にX線露光雰囲気は真空中もしくは、低圧He中であ
り、従来の真空吸着方式が使用できない。
Furthermore, the X-ray exposure atmosphere is in a vacuum or low-pressure He, making it impossible to use the conventional vacuum suction method.

したがって、搬送に伴う前記マスクへの外力に対してこ
れを保持するための把持力が、十分得られなく、高精度
な自動搬送が行なえなかった。
Therefore, sufficient gripping force to hold the mask against the external force applied to the mask during transportation could not be obtained, and highly accurate automatic transportation could not be performed.

また、円環形状のため回転方向の方位を定めるのがむず
かしくマスク搬送後マスク位置決めを行なう際、時間が
かかりスルーブツトの低下につながった。
Further, because of the annular shape, it was difficult to determine the direction of rotation, and it took time to position the mask after transporting the mask, leading to a reduction in throughput.

また、X線マスクを位置決めする場合、XY平面での位
置決めはマスクを位置決め用Vブロックに当接させて行
ない、さらに2@廻の回転(θ方向回転)の位置決めが
マスクステージのθステージの回転により行なわれる。
When positioning an X-ray mask, positioning on the XY plane is performed by bringing the mask into contact with the positioning V block, and positioning for 2 rotations (rotation in the θ direction) is performed by rotating the θ stage of the mask stage. This is done by

従来のマスク搬送機構におけるマスクハンドは、マスク
に加わる外力の検知手段をもたないため、ある程度以上
の強い力でマスクを位置決め用Vブロックに押し付けて
XY力方向位置決めをし、この状態でθ駆動やマスク吸
着動作を行なっていた。したがって、適正な押圧力の制
御ができず、マスクとVブロック間の摺動摩擦による塵
埃の発生やパターン歪のバラツキ、あるいはVブロック
の摩耗損傷による位置決め精度の低下等の問題があった
The mask hand in the conventional mask transport mechanism does not have a means for detecting the external force applied to the mask, so it presses the mask against the positioning V block with a certain amount of strong force to position it in the XY force direction, and in this state it performs θ drive. It was also performing a mask suction operation. Therefore, it is not possible to properly control the pressing force, and there are problems such as generation of dust and variation in pattern distortion due to sliding friction between the mask and the V block, and a decrease in positioning accuracy due to wear and tear of the V block.

また、従来のマスクハンドは位置決めの際の動きの自由
度が充分でなく円滑な位置決め動作ができなかった。
Further, the conventional mask hand does not have a sufficient degree of freedom of movement during positioning, and cannot perform smooth positioning operations.

また位置決め動作中あるいは搬送中にハントが開きマス
クが落下することがあった。
In addition, during positioning or transportation, the hunt may open and the mask may fall.

本発明は、上記従来技術の欠点に鑑みなされたものであ
って、適正な押圧力制御が可能で位置決め精度を向上さ
せ、位置決め動作の動きを円滑にするとともにマスクを
確実に保持して落下の危険をなくしたマスク保持装置の
提供を目的とする。
The present invention has been made in view of the above-mentioned shortcomings of the prior art, and enables appropriate pressing force control, improves positioning accuracy, smoothes the movement of positioning operations, and securely holds the mask to prevent it from falling. The purpose is to provide a mask holding device that eliminates danger.

[課題を解決するための手段] 前記目的を達成するため、本発明に係るマスク保持装置
は、本体と、該本体の両側に設けた開閉可能な2本の指
部と、該指部の先端部分に設けた保持すべきマスク側面
の溝に係合するための爪と、マスクを保持した状態でマ
スクに対しマスク先端部側から本体側に付与される外力
の検知手段と、マスク面と平行に該マスクを本体に対し
移動可能に保持する弾性支持手段とを具備し、前記2本
の指部が開いた状態で前記爪がマスク側面の溝内に係合
した状態であるように指部の開き角度が制限されている
[Means for Solving the Problems] In order to achieve the above object, a mask holding device according to the present invention includes a main body, two fingers provided on both sides of the main body that can be opened and closed, and tips of the fingers. A claw for engaging with a groove on the side surface of the mask to be held, a means for detecting an external force applied to the mask from the mask tip side to the main body side while the mask is being held, and a hook parallel to the mask surface. and elastic support means for movably holding the mask relative to the main body, and the finger portions are arranged such that the claws are engaged in grooves on the sides of the mask when the two finger portions are open. The opening angle is limited.

[作用] マスク位置決め時のVブロックへの押し付は力は検知手
段により検出される。このVブロックへの押し付は時に
、マスクの搬送方向に垂直でマスク面に平行な面内でマ
スクは自由に移動でき、■ブロック面に沿って円滑に摺
動する。また、2木の指部が開いても爪はマスクと係合
状態を保ちマスクは外れない。
[Operation] The force applied to the V block during mask positioning is detected by the detection means. When pressed against the V block, the mask can move freely in a plane perpendicular to the mask transport direction and parallel to the mask surface, and (1) slide smoothly along the block surface. Furthermore, even if the fingers of the second tree open, the claws remain engaged with the mask and the mask does not come off.

[実施例コ 本発明が通用されるマスク搬送装置の一例の構成を第5
図に示す。マスク搬送装置1はガイド部2とマスクハン
ド3からなる。4はX線マスク、5は連結部、6はリニ
アガイド、7は駆動ベルトである。マスクハンド3は、
後述のように、マスク4を把持し、リニアガイド6に沿
って矢印Aのように摺動する。8はマスクステージ、9
はVブロック、10はマスク吸着部である。マスクハン
ド3に把持されたマスク4は、マスクステージ8のVブ
ロック9に押し付けられて位置決めされ、ざらにθ方向
位置決めがされた後、マスクステージ8上に吸着固定保
持される。
[Example 5] The configuration of an example of a mask conveying device to which the present invention is applied is shown in the fifth example.
As shown in the figure. The mask transport device 1 includes a guide section 2 and a mask hand 3. 4 is an X-ray mask, 5 is a connecting portion, 6 is a linear guide, and 7 is a drive belt. Mask hand 3 is
As will be described later, the mask 4 is held and slid along the linear guide 6 in the direction of arrow A. 8 is the mask stage, 9
1 is a V block, and 10 is a mask suction section. The mask 4 held by the mask hand 3 is pressed against the V-block 9 of the mask stage 8 for positioning, and after being roughly positioned in the θ direction, the mask 4 is fixedly held on the mask stage 8 by suction.

本発明の実施例に係るマスクハンドの詳細を第1図に示
す。11は指、12はワイヤからなる爪、13は指11
の支点、14はマスク4の側面に形成した溝である。溝
14はマスク4の円周側面の全周に環状じ形成し・ても
よいし、あるいは図のように対向する2か所または複数
箇所に平行な直線溝として形成してもよい。15はソレ
ノイド、16は圧縮ばね、17はハンド本体、18はセ
ンター吸着部、19は平行板ばね、20は吸着部材、2
1は中間部材、22は押し付は力検知用板ばね、23は
歪ゲージ、24はマスク4の側面に埋設された磁性体で
ある。指11は本体17の両側に支点13を中心に開閉
可能に装着されている。開閉動作はソレノイド15によ
り行なわれる。圧縮はね16は指11を常に閉方向に付
勢する。
FIG. 1 shows details of a mask hand according to an embodiment of the present invention. 11 is a finger, 12 is a nail made of wire, 13 is a finger 11
The fulcrum 14 is a groove formed on the side surface of the mask 4. The grooves 14 may be formed in an annular shape all around the circumferential side surface of the mask 4, or may be formed as parallel straight grooves at two or more opposing locations as shown in the figure. 15 is a solenoid, 16 is a compression spring, 17 is a hand body, 18 is a center suction part, 19 is a parallel plate spring, 20 is a suction member, 2
Reference numeral 1 designates an intermediate member, 22 a force-detecting plate spring for pressing, 23 a strain gauge, and 24 a magnetic material embedded in the side surface of the mask 4. The fingers 11 are attached to both sides of the main body 17 so that they can be opened and closed about a fulcrum 13. The opening/closing operation is performed by a solenoid 15. The compression spring 16 always urges the finger 11 in the closing direction.

指11の先端部に設けた爪12は第4図に示すように、
マスク4の両側の溝14内に係合してマスク4を保持す
る。指11の開閉状態を第3図に示す。(b)図は閉状
態を示し、(a)図は開状態を示す。(a)図に示すよ
うに、指11を開いた状態において、両側の爪12間の
距離はマスク4の直径より小さく、従って爪12はマス
ク4の溝14から外れない。この場合、マスク4の着脱
はハンドの先端部側から行なう。
The claw 12 provided at the tip of the finger 11 is as shown in FIG.
The mask 4 is held by engaging in the grooves 14 on both sides of the mask 4. FIG. 3 shows the opened and closed states of the finger 11. The figure (b) shows the closed state, and the figure (a) shows the open state. (a) As shown in the figure, when the fingers 11 are opened, the distance between the claws 12 on both sides is smaller than the diameter of the mask 4, so the claws 12 do not come off the grooves 14 of the mask 4. In this case, the mask 4 is attached and detached from the tip side of the hand.

本体17に対し、平行板ばね19を介して中間部材21
が装着される。この中間部材に対し、吸着部材20か軸
20aを介して摺動可能に装着される。吸着部材20に
はソレノイドからなるセンター吸着部18が固定されて
いる。このセンター吸着部18によりマスク4側の磁性
体24を吸着し吸着部材20とマスク4とが一体化する
The intermediate member 21 is connected to the main body 17 via the parallel leaf spring 19.
is installed. The adsorption member 20 is slidably attached to this intermediate member via a shaft 20a. A center suction portion 18 made of a solenoid is fixed to the suction member 20 . The center attraction portion 18 attracts the magnetic body 24 on the mask 4 side, and the attraction member 20 and the mask 4 are integrated.

中間部材21には板ばね22が固定され、この板ばね2
2に歪ゲージ23が貼付される。板はね22は吸着部材
20の軸20aの先端に当接する。
A leaf spring 22 is fixed to the intermediate member 21, and this leaf spring 2
A strain gauge 23 is attached to 2. The plate spring 22 comes into contact with the tip of the shaft 20a of the suction member 20.

このような構成において、マスク4をマスクステージ8
(第5図)上に位置決めして搭載する場合、指11を開
いた状態でマスク4を■ブロック9に圧接させる。この
とき、平行ばね19の作用により、マスク4はマスク面
と平行に自由に移動できるため■溝に沿った動きが自互
となり円滑な位置決め押圧動作が達成される。
In such a configuration, the mask 4 is placed on the mask stage 8.
(FIG. 5) When positioning and mounting the mask 4 on the top, press the mask 4 against the block 9 with the fingers 11 open. At this time, due to the action of the parallel spring 19, the mask 4 can freely move parallel to the mask surface, so that the movement along the grooves is mutual and a smooth positioning and pressing operation is achieved.

また、マスク4のVブロックに対する押圧力に応して吸
着部材20の軸20aが本体17側に押し戻され板ばね
22を押圧して変形させるため、歪ケージの抵抗値か変
化しブリッジ回路等を介して押圧力が検出される。この
ようにして検出した押圧力に基づいて、位置決め押し付
は圧力をフィードバック制御したりθ駆動時やマスク吸
着時に押圧力を弱める等の押圧力制御が可能とンよる。
In addition, since the shaft 20a of the adsorption member 20 is pushed back toward the main body 17 side in response to the pressing force of the mask 4 against the V-block and presses the leaf spring 22 to deform it, the resistance value of the strain cage changes and the bridge circuit etc. The pressing force is detected through the sensor. Based on the pressing force detected in this manner, it is possible to control the positioning pressing force by feedback controlling the pressure or weakening the pressing force during θ driving or mask adsorption.

第2図は、本発明の別の実施例の平面図である。この実
施例においては、指11の回転軸として、第1図の支点
13に代えて弾性を有する薄肉ヒンジ25を用い、ソレ
ノイド16に代えてエアシリンダ26を用い、また、板
ばね19.22に代えてそれぞれ薄肉ヒンジに支持され
た弾性片28および薄肉ヒンジ27を用いたものである
FIG. 2 is a plan view of another embodiment of the invention. In this embodiment, as the rotation axis of the finger 11, an elastic thin hinge 25 is used in place of the fulcrum 13 in FIG. Instead, an elastic piece 28 and a thin hinge 27 each supported by a thin hinge are used.

その他の構成、作用効果は前記実施例と同様である。The other configurations and effects are the same as those of the previous embodiment.

[発明の効果コ 以上説明したように、本発明においては、マスクに対す
る外力の検出手段を有し、マスクをマスク面と平行に自
由に移動可能とし、またマスクハントの開状態でもハン
ドの爪かマスク側面の溝から外れない構成としているた
め、マスク位置決め時に適正な押圧力制御かてき、摩擦
による塵埃発生の防止や位置決め精度の向上およびVブ
ロック面の保護等が図られる。また位置決め動作が円滑
に行われ信頼性が高まる。また、位置決め時あるいは搬
送時のマスクの落下事故等が防止される。
[Effects of the Invention] As explained above, the present invention has means for detecting external force on the mask, allows the mask to move freely parallel to the mask surface, and also allows the mask to be moved freely in parallel with the mask surface, and even in the open state of the mask hunt, the claw of the hand does not touch the mask. Since it is configured so that it does not come off from the groove on the side surface of the mask, it is possible to appropriately control the pressing force when positioning the mask, prevent the generation of dust due to friction, improve positioning accuracy, and protect the V block surface. In addition, positioning operations are performed smoothly and reliability is increased. Further, accidents such as falling of the mask during positioning or transportation are prevented.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例の平面図、 第2図は本発明の別の実施例の平面図、第3図(a)、
(b)は各々マスクハンドの指が開いた状態および閉じ
た状態の説明図、第4図はマスク保持部の一部断面斜視
図、第5図は本発明が通用されるマスク搬送装置の構成
図である9 3 : 8 : 1 7 2 マスクハンド、4:マスク、 マスクステージ、9:vブロック、 :指、12:爪、14:溝、 二本体、19:平行ばね、 ;板ばね、23:歪ゲージ。
Fig. 1 is a plan view of an embodiment of the present invention, Fig. 2 is a plan view of another embodiment of the invention, Fig. 3(a),
(b) is an explanatory diagram of the open and closed fingers of the mask hand, respectively, FIG. 4 is a partially cross-sectional perspective view of the mask holding part, and FIG. 5 is the configuration of a mask conveying device to which the present invention is applicable. Figure 9 3: 8: 1 7 2 Mask hand, 4: Mask, Mask stage, 9: V block, : Finger, 12: Claw, 14: Groove, 2 bodies, 19: Parallel spring, ; Leaf spring, 23 : Strain gauge.

Claims (2)

【特許請求の範囲】[Claims] (1)本体と、該本体の両側に設けた開閉可能な2本の
指部と、該指部の先端部分に設けた保持すべきマスク側
面の溝に係合するための爪と、マスクを保持した状態で
マスクに対しマスク先端部側から本体側に付与される外
力の検知手段と、マスク面と平行に該マスクを本体に対
し移動可能に保持する弾性支持手段とを具備し、前記2
本の指部が開いた状態で前記爪がマスク側面の溝内に係
合した状態であるように指部の開き角度が制限されたこ
とを特徴とするマスク保持装置。
(1) A main body, two fingers provided on both sides of the main body that can be opened and closed, claws provided at the tips of the fingers for engaging with grooves on the side of the mask to be held, and a mask. The method further comprises a detection means for detecting an external force applied to the mask from the mask tip side to the main body side in a held state, and an elastic support means for holding the mask movably with respect to the main body parallel to the mask surface,
A mask holding device characterized in that the opening angle of the finger portion is limited so that the claw is engaged in a groove on a side surface of the mask when the finger portion is opened.
(2)前記外力の検知手段は、本体側に設けた外力によ
り変形する弾性部材とこの弾性部材に設けた歪ゲージか
らなることを特徴とする特許請求の範囲第1項記載のマ
スク保持装置。
(2) The mask holding device according to claim 1, wherein the external force detection means comprises an elastic member provided on the main body side that is deformed by the external force, and a strain gauge provided on the elastic member.
JP2092018A 1990-04-09 1990-04-09 Mask holder Pending JPH03290917A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2092018A JPH03290917A (en) 1990-04-09 1990-04-09 Mask holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2092018A JPH03290917A (en) 1990-04-09 1990-04-09 Mask holder

Publications (1)

Publication Number Publication Date
JPH03290917A true JPH03290917A (en) 1991-12-20

Family

ID=14042794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2092018A Pending JPH03290917A (en) 1990-04-09 1990-04-09 Mask holder

Country Status (1)

Country Link
JP (1) JPH03290917A (en)

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