JPH03285376A - Excimer laser device - Google Patents
Excimer laser deviceInfo
- Publication number
- JPH03285376A JPH03285376A JP8794090A JP8794090A JPH03285376A JP H03285376 A JPH03285376 A JP H03285376A JP 8794090 A JP8794090 A JP 8794090A JP 8794090 A JP8794090 A JP 8794090A JP H03285376 A JPH03285376 A JP H03285376A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- tube
- leaked
- cover
- housing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims description 5
- 239000003085 diluting agent Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 description 58
- 230000010355 oscillation Effects 0.000 description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052743 krypton Inorganic materials 0.000 description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 2
- 238000001356 surgical procedure Methods 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000023597 hemostasis Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、工業用、医療用のエキシマレーザ装置に関す
る。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an excimer laser device for industrial and medical use.
従来の技術
近年、新しい産業用のレーザ光源としてエキシマレーザ
カく注目されている。エキシマレーザはレーザ媒質とし
てクリプトン(Kr)、キセノン(Xe)などの希ガス
とフッ素〈F)、塩素(CL’ )なとのハロゲンガス
を組み合わせることにより、353nmから193nm
の間のい(つかの波長で発振線を得ることができる紫外
レーザの一つである。エキシマレーザ装置では従来のレ
ーザ装置に比べて短い波長域で大きな出力が得られるの
で、微細加工、外科手術等の分野における新しい光源と
して期待されている。BACKGROUND OF THE INVENTION In recent years, excimer lasers have attracted much attention as a new industrial laser light source. Excimer lasers use a combination of rare gases such as krypton (Kr) and xenon (Xe) and halogen gases such as fluorine (F) and chlorine (CL') as laser media to produce wavelengths from 353 nm to 193 nm.
It is one of the ultraviolet lasers that can produce an oscillation line in a short wavelength range.Excimer laser devices can obtain large output in a short wavelength range compared to conventional laser devices, so they can be used for microfabrication, surgery, etc. It is expected to be a new light source in fields such as surgery.
特に医療分野においては、従来から用いられているCO
2レーザやY A Gレーザなどの赤外レーザが熱的効
果で切開、止血などを行うのに対し、エキシマレーザは
高いフォトンエネルギーによる光化学的効果を利用でき
、新しい治療分野を開く可能性を持っている。Especially in the medical field, CO
While infrared lasers such as 2 laser and YAG laser perform incisions and hemostasis using thermal effects, excimer lasers can utilize photochemical effects due to high photon energy and have the potential to open up new fields of treatment. ing.
以下に従来のエキシマレーザ装置について説明する。A conventional excimer laser device will be explained below.
第4図は従来のエキシマレ−゛ザ装置の構成図である。FIG. 4 is a block diagram of a conventional excimer laser device.
第4図において、1はレーザ発振器、2は発振管、3は
筐体、4は集合管、5〜9はガス供給、排出用のガス配
管、10は排気ポンプ、11はダクトである。エキシマ
レーザ装置においては、通常、レーザ媒質ガスと希釈ガ
スを混合したガスを発振管2に充填する。たとえば24
8nmの発振波長を持つフッ化クリプトン(K r F
)エキシマレーザでは、媒質ガスとしてクリプトン(
Kr)とフッ素(F)、希釈ガスとしてヘリウム(He
>、ネオン(Ne)などを用いる。これらのガスはレー
ザ装置の運転の都度、発振管2に数気圧の圧力で充填す
る。また一定期間の運転後には、発振管2中のガスを排
気ポンプ10によって排出し、混合ガスを新しいものに
交換する。エキシマレーザ装置には、媒質ガスの劣化に
よってレーザ出力が経時的に低下するという問題がある
ため、定期的にガスを交換して出力を維持する必要があ
る。In FIG. 4, 1 is a laser oscillator, 2 is an oscillation tube, 3 is a housing, 4 is a collecting pipe, 5 to 9 are gas piping for gas supply and exhaust, 10 is an exhaust pump, and 11 is a duct. In an excimer laser device, the oscillation tube 2 is usually filled with a mixture of laser medium gas and diluent gas. For example 24
Krypton fluoride (K r F
) In excimer lasers, krypton (
Kr) and fluorine (F), and helium (He) as a diluent gas.
>, neon (Ne), etc. are used. Each time the laser device is operated, the oscillation tube 2 is filled with these gases at a pressure of several atmospheres. After a certain period of operation, the gas in the oscillation tube 2 is exhausted by the exhaust pump 10, and the mixed gas is replaced with a new one. Excimer laser devices have a problem in that the laser output decreases over time due to deterioration of the medium gas, so it is necessary to periodically replace the gas to maintain the output.
発明が解決しようとする課題
しかしながら上記の従来の構成では、発振管およびガス
配管に大気圧以上のガス圧がかかるため、レーザ装置を
使用する室内が媒質ガス、特に有毒なフッ素ガスあるい
は塩素ガスの漏洩による事故の危険性にさらされるとい
う課題があった。Problems to be Solved by the Invention However, in the conventional configuration described above, gas pressure higher than atmospheric pressure is applied to the oscillation tube and gas piping, so the room where the laser device is used is exposed to medium gas, especially toxic fluorine gas or chlorine gas. There was a problem of being exposed to the risk of accidents due to leakage.
なお、発振管からのガス漏れに対しては、発振管をおお
うレーザ装置筐体にダクトを接続し、筐体内部の空気を
室外へ排気することによって室内へのガス漏洩を防止し
ている。Additionally, in order to prevent gas leakage from the oscillation tube, a duct is connected to the laser device housing that covers the oscillation tube, and the air inside the housing is exhausted to the outside to prevent gas leakage into the room.
本発明は上記従来の課題を解決するもので、ガス配管部
からガスがもれても安全に排出できるエキシマレーザ装
置を提供することを目的とする。The present invention solves the above-mentioned conventional problems, and aims to provide an excimer laser device that can safely discharge gas even if it leaks from a gas piping section.
課題を解決するための手段
この目的を達成するために本発明のエキシマレーザ装置
は、レーザ発振器と、レーザ発振器にレーザ媒質ガスお
よび希釈ガスを供給するガス配管とを只備し、ガス配管
を配管カバー中に設置し、配管カバーの一端をレーザ発
振器の筐体に接続して、レーザ発振器筐体内および配管
カバー中を減圧排気するように構成したものである。Means for Solving the Problems To achieve this object, the excimer laser device of the present invention is equipped with a laser oscillator and a gas pipe for supplying a laser medium gas and a diluent gas to the laser oscillator. The piping cover is installed in the cover, one end of the piping cover is connected to the housing of the laser oscillator, and the inside of the laser oscillator housing and the inside of the piping cover are depressurized and exhausted.
作用
この構成により、ガス配管からガスの漏洩があっても、
ガス配管を覆う配管カバー中は室内より減圧されている
ので、ガスが外部に漏れることはない。また漏洩ガスは
直ちに排出されるので、漏れ出たガスによる汚染の範囲
は最小限度に止めることかできる。Effect: With this configuration, even if there is a gas leak from the gas piping,
The pressure inside the pipe cover covering the gas pipes is reduced from indoors, so gas will not leak to the outside. Furthermore, since the leaked gas is immediately exhausted, the scope of contamination caused by the leaked gas can be kept to a minimum.
実施例
以下本発明の一実施例について、図面を参照しながら説
明する。EXAMPLE An example of the present invention will be described below with reference to the drawings.
第1図は本発明の一実施例におけるエキシマレーザ装置
の構成である。なお、第4図に示す従来例と同一箇所に
は同一符号を付し、詳細説明を省略した。12はガス配
管5〜9を覆った配管カバーである。ガス配管5〜8は
レーザ発振器1内の集合管4に接続され、発振管2の媒
質ガスおよび希釈ガスを供給する。また排気ポンプ10
は発振管2内に充填されたガスをガス配管9を経て排出
する目的で使用される。配管カバー12はガス配管5〜
8を覆い、その末端はレーザ発振器1の筐体3に接続さ
れている。配管カバー12内と筐体3内の空気はダクト
11によって連続的に室外へ排出されており、その内部
圧力は大気圧以下となっている。FIG. 1 shows the configuration of an excimer laser device in one embodiment of the present invention. Note that the same parts as in the conventional example shown in FIG. 4 are given the same reference numerals, and detailed explanations are omitted. 12 is a piping cover that covers the gas piping 5 to 9. Gas pipes 5 to 8 are connected to a collecting pipe 4 in the laser oscillator 1 and supply medium gas and dilution gas to the oscillation pipe 2. Also exhaust pump 10
is used for the purpose of discharging the gas filled in the oscillation tube 2 via the gas pipe 9. The piping cover 12 covers the gas piping 5~
8, and its end is connected to the housing 3 of the laser oscillator 1. The air inside the piping cover 12 and the housing 3 is continuously discharged to the outside through the duct 11, and the internal pressure thereof is below atmospheric pressure.
次に本発明の一実施例によるエキシマレーザ装置におけ
るガスの流れについて説明する。運転開始時にはまず、
排気ポンプ10で発振管2中の古いガスを排出する。続
いてガス配管5〜8を通して発振管2にガスを充填する
。このとき、発振管2には通常、2ないし3気圧のガス
を充填するため、ガス配管5〜8に4気圧以上の圧力を
かけることになる。このため、ガス配管5〜8からのガ
ス漏洩の危険が生じるが、万一、ガス配管5〜8から漏
洩があってもガスは室内より減圧された配管カベ−12
内に漏れ出るため、室内を汚染することはない。しかも
、漏れ出たガスは直ちにレーザ発振器1の筐体3を経て
、ダクト11から室外へ排出される。レーザ装置運転中
には発振管2からのガス漏洩が懸念されるが、そのよう
な場合もダクト11によって漏洩ガスは室外へ排出され
るため、室内へ漏れ出る危険はない。Next, gas flow in an excimer laser device according to an embodiment of the present invention will be explained. When starting operation, first
The old gas in the oscillation tube 2 is exhausted by the exhaust pump 10. Subsequently, the oscillation tube 2 is filled with gas through the gas pipes 5 to 8. At this time, since the oscillation tube 2 is normally filled with gas at 2 to 3 atmospheres, a pressure of 4 atmospheres or more is applied to the gas pipes 5 to 8. Therefore, there is a risk of gas leakage from the gas pipes 5 to 8, but even if there is a leak from the gas pipes 5 to 8, the gas will be transferred to the pipe cabinet 12, which is depressurized from the room.
Since it leaks into the room, it does not contaminate the room. Moreover, the leaked gas immediately passes through the housing 3 of the laser oscillator 1 and is discharged to the outside from the duct 11. There is a concern that gas may leak from the oscillation tube 2 while the laser device is in operation, but even in such a case, the leaked gas is exhausted to the outside by the duct 11, so there is no danger of it leaking into the room.
また第2図は配管カバー12とレーザ発振器1との接続
方法を示す断面図である。ガス配管5〜8は接続管13
によってレーザ発振器1内の集合管4と連結されている
。配管カバー12はレーザ発振器1の筐体3に接続され
る一方、筐体3の数ヶ所に通気抗14が設けてあり、配
管カバ−12内部の空気が筐体3へ流れ込めるようにし
である。この工夫によって、筐体3の内部および配管カ
バー12の内部の漏洩ガスをダクト11を通して室外へ
直ちに排出できるようになっている。Further, FIG. 2 is a sectional view showing a method of connecting the piping cover 12 and the laser oscillator 1. Gas pipes 5 to 8 are connecting pipes 13
It is connected to the collector pipe 4 in the laser oscillator 1 by. The piping cover 12 is connected to the casing 3 of the laser oscillator 1, and ventilation holes 14 are provided at several places on the casing 3 so that the air inside the piping cover 12 can flow into the casing 3. . With this device, leaked gas inside the housing 3 and inside the piping cover 12 can be immediately discharged to the outside through the duct 11.
また第3図は本発明の他の実施例における構成図である
。第3図の実施例においては、ガス配管5〜9の内、有
毒ガスであるフッ素(F)あるいは塩素(Ce)を供給
する配管5だけに配管カバー12を設けている以外は、
第1図で説明したエキシマレーザ装置の構成1機能と異
なるところはない。本実施例においては、配管カバー1
2内に収めるガス配管を限定することによってガス配管
5〜9の保守2点検を容易にしている。Moreover, FIG. 3 is a block diagram of another embodiment of the present invention. In the embodiment shown in FIG. 3, of the gas pipes 5 to 9, only the pipe 5 that supplies fluorine (F) or chlorine (Ce), which is a toxic gas, is provided with a pipe cover 12.
There is no difference in function from configuration 1 of the excimer laser device explained in FIG. In this embodiment, the piping cover 1
By limiting the number of gas pipes that can be accommodated within 2, maintenance and inspection of the gas pipes 5 to 9 is facilitated.
なお、配管カバー12と筐体3の接続方法、あるいは配
管カバー12の内部と筐体3の内部の排気方法は、本実
施例で説明した以外の方法であっても両者の内部を減圧
、排気し、漏洩ガスを室外へ排出できるような構成であ
ればよい。Note that even if the method of connecting the piping cover 12 and the housing 3 or the method of exhausting the inside of the piping cover 12 and the inside of the housing 3 is other than that described in this embodiment, the insides of both can be depressurized and evacuated. However, any structure may be used as long as the leaked gas can be discharged outside.
発明の詳細
な説明したようにガス配管上に配管カバーを設け、配管
カバー内部を減圧、排気することにより、有毒なフッ素
(F)ガスあるいは塩素(Ce )ガスの室内への漏洩
がなく、医療用、加工用としてきわめて安全性の高いエ
キシマレーザ装置を実現できるものである。As described in the detailed description of the invention, by providing a piping cover over the gas piping and depressurizing and exhausting the inside of the piping cover, there is no leakage of toxic fluorine (F) gas or chlorine (Ce) gas into the room, making it suitable for medical treatment. This makes it possible to realize an extremely safe excimer laser device for industrial and processing purposes.
第1図は本発明の一実施例におけるエキシマレーザ装置
の概略構成図、第2図は同エキシマレーザ装置の接続方
法を示す断面図、第3図は同エキシマレーザ装置の他の
実施例における概略構成図、第4図は従来のエキシマレ
ーザ装置の概略構成図である。Fig. 1 is a schematic configuration diagram of an excimer laser device according to an embodiment of the present invention, Fig. 2 is a sectional view showing a connection method of the excimer laser device, and Fig. 3 is a schematic diagram of another embodiment of the excimer laser device. FIG. 4 is a schematic diagram of a conventional excimer laser device.
Claims (1)
よび希釈ガスを供給するガス配管とを具備し、前記ガス
配管を配管カバー中に配置し、前記配管カバーの一端を
前記レーザ発振器の筐体に接続して、前記レーザ発振器
筐体内および前記配管カバー中を減圧排気するエキシマ
レーザ装置。The method includes a laser oscillator and a gas pipe for supplying a laser medium gas and a diluent gas to the laser oscillator, the gas pipe is arranged in a piping cover, and one end of the piping cover is connected to a housing of the laser oscillator. an excimer laser device that evacuates the interior of the laser oscillator housing and the piping cover;
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8794090A JPH03285376A (en) | 1990-04-02 | 1990-04-02 | Excimer laser device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8794090A JPH03285376A (en) | 1990-04-02 | 1990-04-02 | Excimer laser device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH03285376A true JPH03285376A (en) | 1991-12-16 |
Family
ID=13928899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8794090A Pending JPH03285376A (en) | 1990-04-02 | 1990-04-02 | Excimer laser device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH03285376A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000150387A (en) * | 1998-11-18 | 2000-05-30 | Applied Materials Inc | Piping structure and piping unit |
-
1990
- 1990-04-02 JP JP8794090A patent/JPH03285376A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000150387A (en) * | 1998-11-18 | 2000-05-30 | Applied Materials Inc | Piping structure and piping unit |
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