JPH03285170A - Automatic analyzer - Google Patents

Automatic analyzer

Info

Publication number
JPH03285170A
JPH03285170A JP8487790A JP8487790A JPH03285170A JP H03285170 A JPH03285170 A JP H03285170A JP 8487790 A JP8487790 A JP 8487790A JP 8487790 A JP8487790 A JP 8487790A JP H03285170 A JPH03285170 A JP H03285170A
Authority
JP
Japan
Prior art keywords
bases
reaction tank
sampling
stand
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8487790A
Other languages
Japanese (ja)
Inventor
Teruo Kato
輝雄 加藤
Hiroyasu Uchida
裕康 内田
Katsuaki Takahashi
克明 高橋
Osamu Ono
修 大野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8487790A priority Critical patent/JPH03285170A/en
Publication of JPH03285170A publication Critical patent/JPH03285170A/en
Pending legal-status Critical Current

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  • Automatic Analysis And Handling Materials Therefor (AREA)

Abstract

PURPOSE:To achieve the structural simplification and cost reduction of a large- scale machine by mounting a plurality of mechanism bases each having one reaction tank, a stirring member, a reagent nozzle moving means and a sampling means arranged thereon on one stand and horizontally projecting the reaction tanks by the up-and-down movement of the bases. CONSTITUTION:Two mechanism bases 2 having reaction tanks 7, turntables 6 and mechanism units mounted thereon are mounted on a stand 1 through base supports 3 equipped with vertical adjustment mechanisms. Since horizontal projection mechanisms are independent at every mechanism bases 2, even when the flatness of the stand 1 is bad to a certain degree, the bases 2 can sufficiently take a horizontal posture. Further, in order to keep the relative height of a separately arranged sample received test tube and the mechanism bases 2 constant, a place not changing a vertical position is provided at one point in the vicinity of a sampling mechanism. By this constitution, the structural simplification and cost reduction of a large-scale machine can be achieved.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は同一架台に複数個の反応槽を搭載した自動分析
装置および、その複数個の反応膜の水平を比す機構・方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an automatic analyzer having a plurality of reaction vessels mounted on the same pedestal, and a mechanism and method for comparing the horizontal levels of the plurality of reaction membranes.

〔従来の技術〕[Conventional technology]

従来の大型装置は、1台の架台にひとつの反応槽を搭載
した分析ユニットと呼ばれるものを複数個要求される処
理能力によって組み合わせひとつの装置として作り上げ
ている。この場合は1台の架台にひとつの反応槽である
ため架台のサイズは反応槽ひとつが乗る大きさで良いた
めその平面度は良いものが期待できる。又架台1台に対
しひとつの反応槽であることでその水平出しについては
特に問題となることはなかった。
Conventional large-scale equipment is constructed by combining multiple analysis units, each of which has one reaction tank mounted on one stand, depending on the processing capacity required. In this case, since one pedestal has one reaction tank, the pedestal only needs to be large enough to accommodate one reaction tank, so good flatness can be expected. Also, since there was one reaction tank for each mount, there was no particular problem in leveling the reactor.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術は前述のようにひとつの架台にひとつの反
応槽という構造であるため各々の反応槽の水平出し機構
は必要としないが、架台が反応槽の数、及びこれらのを
搭載する共通の架台とを合わせた数だけ必要とするため
構造の複雑化・製造価格の上昇を招いている。又、分析
ユニットと呼ばれる反応槽がひとつ乗った架台の集合体
として装置をまとめようとした背景には、まず第1に大
型の自動分析装置においてひとつの分析ユニットが故障
しても他のユニットがその部分をカバーして測定に支障
ないようにする事、そして故障したユニットだけを簡単
に交換できるようにする事がある。第2にシリーズ化設
計が共通部分を使って容易にできるようにする事が上げ
られる。しかしながら信頼性設計の進んだ現在では実際
に故障して分析ユニットだけを交換するような例はきわ
めてまれである事、又、シリーズ化設計とい言っても、
上位、下位の機種がラインアップされている現在では広
範囲にわたってシリーズ化する必要がなく上位の大型機
種の部分だけをシリーズ化すれば良い状況となっている
。このように大型機種のみシリーズ化するのであればひ
とつの架台に複数個の反応槽を搭載する必要が生じて来
ている。本発明は、ひとつの大きな架台(幅約2mX奥
行き約0.75m )に複数個(実施例では2個)搭載
する場合の各々の反応槽の水平出し機構およびその方法
を提供することにある。
As mentioned above, the above conventional technology has a structure in which one reaction tank is mounted on one pedestal, so a leveling mechanism for each reaction tank is not required. Since a total of the same number of frames are required as the total number of frames, the structure becomes complicated and the manufacturing price increases. Also, the reason behind the idea of organizing the equipment as an assembly of frames each carrying one reaction tank called an analysis unit is that, first of all, in a large automatic analyzer, even if one analysis unit breaks down, the other units will not work. The part is covered so that it does not interfere with measurement, and the failed unit can be easily replaced. Second, it is possible to easily design a series using common parts. However, in today's advanced reliability design, it is extremely rare for an analysis unit to actually be replaced due to failure, and even though it is a series design,
Nowadays, where there are high-end and low-end models in the lineup, there is no need to create a series over a wide range, and it is sufficient to create a series only for the large, high-end models. In this way, if only large models are to be made into a series, it becomes necessary to mount multiple reaction vessels on one mount. The present invention provides a mechanism and method for leveling each reaction tank when a plurality of reactors (two in the example) are mounted on one large pedestal (width: approximately 2 m x depth: approximately 0.75 m).

〔課題を解決するための手段〕[Means to solve the problem]

上記目的を達成するためにはその手段としてまず第1に
ひとつの架台に複数個の反応槽を搭載するため架台のサ
イズが大きくなり反応槽を搭載する面の平面度が悪くな
るおそれがあるため、各々の反応槽の水平出しを行う調
整機構を架台全体の水平出しを行う調整機構とは別に設
けたことが上げられる。
In order to achieve the above objective, the first step is to mount multiple reaction vessels on one pedestal, which increases the size of the pedestal and may deteriorate the flatness of the surface on which the reaction vessels are mounted. Another advantage is that the adjustment mechanism for leveling each reaction tank is provided separately from the adjustment mechanism for leveling the entire pedestal.

第2に反応槽の水平出しの実際の方法は、反応槽自体を
上下させるか、それが乗っている機構ベースを上下させ
るかの2通りの方法があるが、他のサンプリング機構や
撹拌機構も機構ベース上に乗っておりこれらとの上下位
置置係を変化させないようにする為に反応槽の乗った機
構ベース全体を上下させるようにした。
Second, there are two ways to actually level the reaction tank: by raising and lowering the reaction tank itself, or by raising and lowering the mechanism base on which it rests, but other sampling mechanisms and stirring mechanisms can also be used. It rests on the mechanism base, and in order to avoid changing its vertical position with these, the entire mechanism base on which the reaction tank is mounted can be moved up and down.

第3に実際に機構ベースを上下させる方法は架台にネジ
を切ったボスを溶接し、そのボスにボルトおよび袋ナツ
トをねじ込みこ九に接触している機構ベースがボルトお
よび袋ナツトの上下運動に係合して上下する方法を採用
したものである。
Thirdly, the method of actually moving the mechanism base up and down is to weld a threaded boss to the pedestal, screw the bolt and cap nut into the boss, and the mechanism base that is in contact with the bolt and cap nut will move up and down. This method employs a method of engaging and moving up and down.

〔作用〕[Effect]

各々の反応槽用に設けられた水平出し機構は、搭載する
架台の平面度がある程度悪くても、個々の反応槽(機構
テーブル)毎独立に水平出しを行う方式であるので十分
水平を取る事ができる。又架台全体の水平出し機構は1
組立時および据付時に装置全体の水平を出すものとして
使用する。又、機構ベース全体を上下させることは、ベ
ース上に乗っている反応槽、およびサンプリング機構・
撹拌機構等の機構ユニット同志の相対位置は変化しない
がサンプリングノズルと機構ベースとは別置きのサンプ
ルの入っている試験管との高さの位置関係が変わってし
まうおそれがあり、これはサンプル量のデッドボリュー
ムとしての不具合となる。
The leveling mechanism provided for each reaction tank is a system that levels each reaction tank (mechanism table) independently, so even if the flatness of the mounted pedestal is poor to some extent, it will ensure that it is sufficiently level. I can do it. Also, the leveling mechanism for the entire frame is 1
Used to level the entire device during assembly and installation. In addition, raising and lowering the entire mechanism base is necessary to move the reaction tank on the base and the sampling mechanism.
Although the relative positions of mechanical units such as the stirring mechanism do not change, the height positional relationship between the sampling nozzle and the test tube containing the sample, which is placed separately from the mechanism base, may change. This becomes a problem as a dead volume.

これを避けるために本方式においてはサンプリング機構
の近くに基準点として上下位置を変化させない場所を一
点設けている。これによってサンプリング先端と試験管
の乗るサンプラとの高さ関係は一定の高さを保持するこ
とができる。機構ベースを実際に上下する支点としては
前述の点を基準点として他の2点を上下の調節点にして
計3点によって水平を決定するので容易に水平を出す事
ができる。その他の数ケ所の支持点は出された機構ベー
スの水平面に合わせる恰好となる。尚この調整作業にお
いては機構ベース自体の平面度のくるいを除去するため
実際の機構ベースとは違って厚みの厚い平面度が良く出
されているものを使い、機構ベースの乗る調整ボルト、
ベース受はナツトの高さを規定する。
In order to avoid this, in this method, one point is provided near the sampling mechanism as a reference point where the vertical position does not change. Thereby, the height relationship between the sampling tip and the sampler on which the test tube is placed can be maintained at a constant height. As the fulcrum for actually raising and lowering the mechanism base, the above-mentioned point is used as the reference point, and the other two points are used as the adjustment points for raising and lowering the mechanism.The leveling is determined by a total of three points, so that the leveling can be easily achieved. The other several support points should be aligned with the horizontal plane of the mechanism base. In addition, in this adjustment work, in order to remove any problems with the flatness of the mechanism base itself, use a thicker and more flat one than the actual mechanism base, and use the adjustment bolts on which the mechanism base rests.
The base holder defines the height of the nut.

〔実施例〕〔Example〕

以下、本発明の実施例を第1図〜第6図により説明する
。第1図は本実施例の全体図を示すもので反応槽7.タ
ーンテーブル6、機構系のユニットの乗っている機構ベ
ース2が架台1上に2ユニット上下調整機構を備えてい
るベース支え3を介して搭載されている。第2図は第1
図の平面図(この場合調整用機構ベース20のみ架台1
に乗っている。)を表わしている。試験管21はラック
19に差し込まれサンプラ18上を移動しサンプリング
機構5の位置でサンプルが採取される。
Embodiments of the present invention will be described below with reference to FIGS. 1 to 6. FIG. 1 shows an overall view of this embodiment, showing the reaction tank 7. A mechanism base 2 on which a turntable 6 and mechanical units are mounted is mounted on a pedestal 1 via a base support 3 having a two-unit vertical adjustment mechanism. Figure 2 is the first
A plan view of the figure (in this case, only the adjustment mechanism base 20 is
riding on. ). The test tube 21 is inserted into the rack 19, moves on the sampler 18, and a sample is taken at the position of the sampling mechanism 5.

調整用機構ベース20内に表示されているA、B。A and B displayed inside the adjustment mechanism base 20.

CおよびDの英字はベース支え3の構造を表わし各々、
第3図、第4図、第S図、および第6図の図象に対応し
ている。A点はサンプリング機構5近くの基準点であり
この点を支点として上下の位置調節を行う。B点および
0点は機構ベース2の水平出しのための調節点である。
The letters C and D represent the structure of the base support 3, respectively.
This corresponds to the symbols in FIGS. 3, 4, S, and 6. Point A is a reference point near the sampling mechanism 5, and the vertical position is adjusted using this point as a fulcrum. Point B and point 0 are adjustment points for leveling the mechanism base 2.

ボスBは架台1に溶接されており、これにねじ込まれて
いるボルトB13.ボルトC14が回転することにより
上下する。ナツト12はボルトB、Cのゆるみ止めの働
きをする。尚、A点と0点においてはボスAIO,ボル
トC14の先端が機構ベース2の穴と勘合し機構ベース
=2の前後・左右の位置決めを行なっている。残りのD
点は第6図の構造になっておりボスC15は架台1に溶
接されておりこれにメネジの切っであるベース受はナツ
ト16が押しバネ17を介在させてねじ込まれている。
Boss B is welded to frame 1, and bolt B13 is screwed into this. It moves up and down as the bolt C14 rotates. Nut 12 functions to prevent bolts B and C from loosening. At points A and 0, the tips of the boss AIO and the bolt C14 fit into the holes in the mechanism base 2, thereby positioning the mechanism base 2 in the front, rear, left and right directions. remaining D
The structure shown in FIG. 6 is such that the boss C15 is welded to the pedestal 1, and the base holder, which is a female thread, is screwed into the base holder with a nut 16 interposed by a push spring 17.

ベース受はナツト=16にはスリ割り溝が切ってあり機
構ベース2を乗せた状態で−ドライバにて高さの調整が
可能な状態になっている。押しバネ17は調節後、機構
ベース2を乗せる迄の間ベース受はナツト16がゆるん
で位置が変わってしまうのを防ぐ働きをしている。
The base holder has a slit groove cut into the nut 16 so that the height can be adjusted with a screwdriver when the mechanism base 2 is placed on it. After adjustment, the push spring 17 serves to prevent the base holder from loosening and changing the position of the nut 16 until the mechanism base 2 is placed on it.

〔発明の効果〕〔Effect of the invention〕

本発明は1以上説明したように構成されているので以下
に記載されているような効果を奏する。
The present invention is constructed as described in one or more ways and provides the advantages described below.

ひとつの架台に複数個の反応槽を搭載することは大型の
自動分析装置を構成する場合、装置をより軽便に、それ
に伴って原価を低く押えるためにどうしても必要となっ
てくることであるが、本発明はこうした要求に対して各
反応槽に上下調節機構を設けることにより実現可能とし
た。これはただ単に反応槽の水平出し機構の発明にとど
まるのではなく大型機の構造の簡略化および原価低減ま
で含めた効果をもたらすものである。
Mounting multiple reaction vessels on a single mount is absolutely necessary when constructing a large automatic analyzer to make the device more convenient and to keep costs down. The present invention has made it possible to meet these demands by providing a vertical adjustment mechanism in each reaction tank. This invention is not limited to simply inventing a mechanism for leveling a reaction tank, but also has effects including simplifying the structure of large machines and reducing costs.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は本発明の一実施例の全体および平
面図、第3図〜第6図は第2図のベース支え点A、B、
CおよびD点の構造の縦断面図である。
FIGS. 1 and 2 are overall and plan views of an embodiment of the present invention, and FIGS. 3 to 6 are base support points A and B in FIG.
FIG. 3 is a longitudinal cross-sectional view of the structure at points C and D.

Claims (1)

【特許請求の範囲】 1、ひとつの反応槽と、撹拌機構・試薬ノズル移動機構
・サンプリング機構等の機構ユニットが設置された機構
ベースが、同一の架台に複数個搭載された事を特徴とす
る自動分析装置。 2、請求項1記載において機構ベース全体を上下させる
事で反応槽の水平出しを行うようにしたことを特徴とす
る自動分析装置。 3、請求項2記載の水平出しにおいて、水平出しの基準
点をサンプリングノズル近傍の一ケ所に設けた事および
、その他の機構ベース支え部をネジ構造により上下させ
るようにした事を特徴とする自動分析装置。
[Claims] 1. A reaction tank and a plurality of mechanism bases on which mechanical units such as a stirring mechanism, a reagent nozzle moving mechanism, and a sampling mechanism are installed are mounted on the same pedestal. Automatic analyzer. 2. The automatic analyzer according to claim 1, characterized in that the reaction tank is leveled by raising and lowering the entire mechanism base. 3. The automatic leveling according to claim 2, characterized in that the reference point for leveling is provided at one location near the sampling nozzle, and the other mechanism base support parts are raised and lowered by a screw structure. Analysis equipment.
JP8487790A 1990-04-02 1990-04-02 Automatic analyzer Pending JPH03285170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8487790A JPH03285170A (en) 1990-04-02 1990-04-02 Automatic analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8487790A JPH03285170A (en) 1990-04-02 1990-04-02 Automatic analyzer

Publications (1)

Publication Number Publication Date
JPH03285170A true JPH03285170A (en) 1991-12-16

Family

ID=13843016

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8487790A Pending JPH03285170A (en) 1990-04-02 1990-04-02 Automatic analyzer

Country Status (1)

Country Link
JP (1) JPH03285170A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021053858A1 (en) * 2019-09-19 2021-03-25 株式会社日立ハイテク Automated analysis device and method for leveling same
WO2023002761A1 (en) * 2021-07-20 2023-01-26 株式会社日立ハイテク Automatic analysis device and method for adjusting inclination thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021053858A1 (en) * 2019-09-19 2021-03-25 株式会社日立ハイテク Automated analysis device and method for leveling same
JPWO2021053858A1 (en) * 2019-09-19 2021-03-25
WO2023002761A1 (en) * 2021-07-20 2023-01-26 株式会社日立ハイテク Automatic analysis device and method for adjusting inclination thereof

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