JPH0328266A - Polyimide composition - Google Patents

Polyimide composition

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Publication number
JPH0328266A
JPH0328266A JP16435089A JP16435089A JPH0328266A JP H0328266 A JPH0328266 A JP H0328266A JP 16435089 A JP16435089 A JP 16435089A JP 16435089 A JP16435089 A JP 16435089A JP H0328266 A JPH0328266 A JP H0328266A
Authority
JP
Japan
Prior art keywords
polyimide
aromatic
polyimide composition
composition according
polyphosphate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16435089A
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Japanese (ja)
Other versions
JP2955712B2 (en
Inventor
Kosaku Nagano
広作 永野
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Kanegafuchi Chemical Industry Co Ltd
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Kanegafuchi Chemical Industry Co Ltd
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Priority to JP1164350A priority Critical patent/JP2955712B2/en
Publication of JPH0328266A publication Critical patent/JPH0328266A/en
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Publication of JP2955712B2 publication Critical patent/JP2955712B2/en
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Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To obtain a polyimide composition improved in heat deterioration resistance by incorporating an aromatic polyphosphate into a polyimide resin. CONSTITUTION:A polyimide resin, preferably a polyimide of formula I (wherein R01 is a tetravalent organic group: R02 is a divalent organic group), is mixed with an aromatic polyphosphate, preferably a compound of formula II (wherein R1 to R6 are each H or lower alkyl; (n) is a positive integer). The amount of the aromatic polyphosphate is preferably 0.01-10 pts.wt. based on 100 pts.wt. polyimide resin. A polyimide composition greatly improved in heat deterioration resistance both in molding and under high temperature conditions can be thus obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、耐熱性樹脂として有用なポリイミドに関する
.更に詳しくは、耐熱劣化性が改良されたポリイミド組
成物に関する. 〔従来技術と課題〕 ポリイミドは、従来より、耐熱性・耐薬品性・電気絶縁
性・機械的強度などにおいて優れた諸特性を有すること
が知られており、電気絶縁材料・断熱材料・宇宙航空機
材料などに広く利用されている. 更には、近年、電気電子産業の発展にともない、ポリイ
ミド樹脂に対しても尚一層の信頼性が要求されるように
なってきた.特に電気絶縁性及び破断強度などの機械的
特性の耐熱劣化安定性の一層の向上が要求されるように
なってきた.ボリイ2ドの耐熱劣化安定性を改善する試
みのうち、米国特許第3.714. 116号で開示さ
れている方法の一つに、ポリイξド樹脂に有機リン化合
物を添加する方法がある.しかし乍ら、ここに示されて
いる有機リン化合物は、低分子量の化合物であるか或い
は分子骨格に脂肪族結合を有する有機リン化合物であり
、いずれも熱分解温度が低かった.従って、上述の改質
法によるポリイミド組成物は約2 0 0 ’C以下程
度の比較的低温域での短時間の耐熱安定性には優れてい
るものの、高温長時間の条件にsnされた場合には、系
内の有機リン化合物は分解飛散してしまい、その改良効
果を発現できなかった. また、高耐熱性電気絶縁材料として有用な芳香族ポリイ
ミドは3 5 0 ’C以上の高温で戒型されるのが普
通である.このため、上記の如き有機リン化合物からな
る添加剤をこのような芳香族ボリイ且ドに適用しようと
する場合、該有機リン化合物は或型加工中に揮発飛散す
るか或いは分解飛散し、系内に残存させることができず
、従って、その効果を発現させることができなかった. 〔課題を解決するための千段』 上記の課題を解決するため、本発明者は鋭意検討の結果
、芳香族ボリフオスフエイト類を含有させることにより
、所期の目的が達成されることを見出し、本発明を完威
した. 即ち、本発明は、芳香族ポリフォスフェイト類を含有す
ることを特徴とするポリイミド組成物を内容とするもの
である. 本発明に用いられる芳香族ポリフォスフェイト類は、例
えば一般式(I) ?R,, R■R,R., l?s, R4は、各々水
素原子または低級アルキル基を示し、nは正の整数を示
す.)で表される化合物やこれと類似の化合物、例えば
、クレジル・レゾルシン・ポリフォスフエイト、フェニ
ル・クレジル・レゾルシン・ポリフォスフエイト、キシ
リル・レゾルシン・ポリフオスフエイト、フェニル・イ
ソプロビルフェニル・レゾルシン・ポリフォスフエイト
、クレジル・キシリル・レゾルシン・ポリフォスフエイ
ト、フエニル・イソブロビルフェニル・ジイソプ口ピル
フェニル・レゾルシン等がこれらの誘導体、これらに置
換基を導入したもの等が挙げられる.これらの化合物は
沸点及び分解温度がこれらの単量体であるフエニルフォ
スフエイト類の沸点及び分解温度よりも高温域に存在す
ることが重要である. これらの芳香族ポリフォスフェイト類の添加量はポリイ
ミド樹脂100重量部に対し、0.Ol〜10重量部が
望ましい.0.01重量%未満では充分な添加効果が得
られない.またlO重景%を越えると、生或するポリイ
ミド組威物からなる戒型体の機械的強度等の諸特性を損
なう傾向がある。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to polyimide useful as a heat-resistant resin. More specifically, it relates to a polyimide composition with improved heat deterioration resistance. [Prior art and issues] Polyimide has long been known to have excellent properties such as heat resistance, chemical resistance, electrical insulation, and mechanical strength, and is used as an electrical insulation material, heat insulation material, and spacecraft material. It is widely used as a material. Furthermore, in recent years, with the development of the electrical and electronic industry, polyimide resins have come to be required to be even more reliable. In particular, it has become necessary to further improve the thermal deterioration stability of mechanical properties such as electrical insulation and breaking strength. Among attempts to improve the thermal deterioration stability of Boli2D, US Patent No. 3.714. One of the methods disclosed in No. 116 is a method of adding an organic phosphorus compound to polyide ξ resin. However, the organic phosphorus compounds shown here are low molecular weight compounds or organic phosphorus compounds having aliphatic bonds in their molecular skeletons, and both have low thermal decomposition temperatures. Therefore, although the polyimide composition obtained by the above-mentioned modification method has excellent short-term heat stability at relatively low temperatures of about 200'C or less, it has poor thermal stability when subjected to high-temperature and long-term conditions. In this case, the organic phosphorus compound in the system was decomposed and scattered, and the improvement effect could not be realized. Furthermore, aromatic polyimides useful as highly heat-resistant electrical insulating materials are usually molded at high temperatures of 350'C or higher. Therefore, when an additive made of the above-mentioned organic phosphorus compound is applied to such an aromatic bolide, the organic phosphorus compound will volatilize and scatter during certain mold processing, or decompose and scatter, and will be released into the system. Therefore, the effect could not be expressed. [A Thousand Steps to Solving the Problems] In order to solve the above problems, the inventors of the present invention have conducted intensive studies and found that the intended purpose can be achieved by incorporating aromatic borifosphates. Heading, this invention has been completed. That is, the present invention includes a polyimide composition characterized by containing an aromatic polyphosphate. The aromatic polyphosphates used in the present invention are, for example, those of the general formula (I)? R,, R■R,R. , l? s and R4 each represent a hydrogen atom or a lower alkyl group, and n represents a positive integer. ) and similar compounds, such as cresyl resorcin polyphosphate, phenyl cresyl resorcin polyphosphate, xylyl resorcin polyphosphate, phenyl isopropylphenyl resorcin. Examples include polyphosphate, cresyl xylyl resorcinol polyphosphate, phenyl isobrobylphenyl diisopropylphenyl resorcinol, derivatives of these, and those into which substituents have been introduced. It is important that these compounds have boiling points and decomposition temperatures higher than those of their monomers, phenyl phosphates. The amount of these aromatic polyphosphates added is 0.00 parts by weight per 100 parts by weight of the polyimide resin. It is preferable to use 10 parts by weight. If the amount is less than 0.01% by weight, a sufficient effect cannot be obtained. Moreover, if it exceeds 10%, there is a tendency for the mechanical strength and other properties of the molded body made of the raw polyimide composite to be impaired.

本発明の芳香族ボリイ旦ド組成物を得る方法、即ち、芳
香族ポリフォスフェイト類をポリイミド樹脂に混合する
方法の例について説明する.(A)ポリイξド樹脂が不
溶不融の場合ポリイミドの前駆体であるボリアミド酸溶
液に芳香族ポリフォスフェイト類を混合し、然る後に、
熱的あるいは化学的に脱水閉環イξド化し、本発明のポ
リイξド組成物を得る。
An example of a method for obtaining the aromatic solidified composition of the present invention, that is, a method for mixing an aromatic polyphosphate with a polyimide resin, will be explained. (A) When the polyide ξ resin is insoluble and infusible, an aromatic polyphosphate is mixed with a polyamic acid solution, which is a precursor of polyimide, and then,
The polyamide ξ-ide composition of the present invention is obtained by thermally or chemically dehydrating and ring-closing ξ-ide.

(B)ポリイミド樹脂が溶媒可溶性の場合ポリイミド溶
液中に芳香族ポリフォスフェイト類を混合した後に、溶
媒を除去し本発明のボリイミド組成物を得る. (C)ポリイミド樹脂が熱可塑性の場合熔融したポリイ
ミド樹脂に芳香族ボリフォスフェイ11を混合したのち
、これを冷却し、本発明のボリイ〔ド組威物を得る。
(B) When the polyimide resin is solvent soluble: After mixing the aromatic polyphosphate into the polyimide solution, the solvent is removed to obtain the polyimide composition of the present invention. (C) When the polyimide resin is thermoplastic Aromatic polyphosphor 11 is mixed with the molten polyimide resin and then cooled to obtain the polyimide composite of the present invention.

(D)ポリイミド樹脂がイミドオリゴマーの硬化物であ
る場合 イミドオリゴマー中に芳香族ポリフォスフエイト類を混
合した後、熱あるいは光などの工不ルギ一により反応硬
化させ、本発明のボリイごド組威物を得る。
(D) When the polyimide resin is a cured product of an imide oligomer, the aromatic polyphosphates are mixed into the imide oligomer, and then reacted and cured by a process such as heat or light. Obtain prestige.

次に、本発明に用いられるポリイミド樹脂について説明
する.本発明は所謂ポリイミド系樹脂やポリエーテルイ
ミド等の熱可塑性樹脂や反応性イξドオリゴマー等に適
用することが可能である.特に、或型温度が高いか、あ
るいは高温域で使用されるポリイミド系樹脂に適用した
場合にその特徴 が充分に活かされる。特に、一般式(It)OO (Ra+は4価の有機基、ROfは2価の有機基を示す
.) で表される構造を有するものに好適に適用される。
Next, the polyimide resin used in the present invention will be explained. The present invention can be applied to so-called polyimide resins, thermoplastic resins such as polyetherimide, reactive ξ-dooligomers, etc. In particular, its characteristics are fully utilized when applied to polyimide resins that have a high mold temperature or are used in a high temperature range. In particular, it is suitably applied to those having a structure represented by the general formula (It)OO (Ra+ represents a tetravalent organic group, and ROf represents a divalent organic group).

また上記一般式(II)において、Rotが4価の芳香
族基、Ilozが2価の有機基であるポリイミドに特に
好適である. ポリイミド系樹脂は通常、ジアミン類とジ酸無水物類を
有機極性溶媒中で反応して得られる。本発明に用いられ
るポリイミドを構威するジアミン類の一部を列挙すると
、芳香族ジアミン戒分としては,,例えばバラフエニレ
ンジアミン、3.3′ジメトキシ−4 4′−ジアξノ
ビフエニル、3.3′−ジメチル−4.4′−ジアミノ
ビフエニル、3,3′−ジクロロー4,4′−ジアミノ
ビフェニル、4.4’ −ジアミノパラターフエニル、
4.4’−ビス(4−アξノフエノキシ)ビフ五ニル、
4 4′−ジア旦ノジフエニルスルフォン、3.3′−
ジア旦ノジフエニルスルフォン、ビス(4−(4−アミ
ノフエノキシ)フェニル〕スルフォン、ビス(4−(3
−アミノフェノキシ)フェニル〕スルフォン、ビス(1
−(2−アミノフェノキシ)フエニル〕スルフォン、1
.4ビス(4−アミノフェノキン)ヘンゼン、1,3−
ビス(4−アミノフエノキシ)ベンゼン、l,3−ビス
(3−アミノフェノキシ)ベンゼン、l,4−ビス(4
−アミノフェノキン)ベンゼン、ビス(1−(4−アミ
ノフェノキシ)フエニル〕エーテル、4.4’−ジアξ
ノジフエニルメタン、ビス(3−エチル−4−アミノフ
エニル)メタン、ビス(3−メチル−4−アミノフェニ
ル)メタン、ビス(3−クロロー4−アミノフエニル)
メタン、3,3′−ジアミノジフエニルスルフォン、4
4′−ジアミノジフエニルスルフォン、2 2′5,5
′−テトラク口ロー4,4′−ジアミノビフエニル、4
 4′−ジア砧ノジフエニルスルフィド、4.4’ −
ジアごノジフェニルエーテル、3,3′−ジアミノジフ
エニルエーテル、3.4ジアミノジフエニルエーテル、
4.4′−ジアミノジフェニルメタン、4.4′−ジア
ミノビフェニル、4 4′−ジアミノオクタフルオ口ビ
フエニル、2.4’−ジアミノトルエン、メタフェニレ
ンジアξン、2.2−ビス(4−(4−アミノフェノキ
シ)フェニル〕プロパン、2.2ビス(4−(4−アξ
ノフェノキシ)フエニル〕ヘキサフルオロプロパン、2
,2−ビス(4−ヤミノフエニル)プロパン、2.2−
ビス(4−アミノフェニル)へキサフルオ口プロパン、
2.2−ビス(3−ヒドロキシ−4−アミノフヱニル)
プロパン、2.2−ビス(3−ヒドロキジ−4一アミノ
フェニル)へキサフルオ口プロパン、99−ビス(4−
アξノフエニル)−10−ヒドロアン1・ラセン、オル
トトリジンスルフオン等が挙げられる.これらの化合物
は単独もしくは2種類以上を組み合わせて用いても良い
。更には、3,3’.4.4’−ビフエニルテトラアミ
ン、3.3’  4.4’−テトラアミノジフエニルエ
ーテル等の多価アξン化合物の一部使用も可能である.
また、他方の成分であるジ酸無水物の例を列挙すると、
芳香族テトラカルボン酸二無水物の例としては、ピロメ
リット酸二無水物、3.3’.4.4′−ビフェニルテ
トラカルボン酸二無水物、3.3’.4.4’一ベンゾ
フェノンテトラカルボン酸二無水物、ナフタレン−1.
2,5.6−テトラカルボン酸二無水物等が挙げられる
.尚、ここでは芳香族ポリイミドの構威例について述べ
たが、本発明は脂肪族ポリイミド等にも適用が可能であ
る.また本発明に使用されるイミドオリゴマーの例とし
ては、ビスマレイξドやナジック酸末端オリゴマーや、
アセチレン末端オリゴマー等が例示できる. また、ポリイミド&ll$.物を成型して得られる形態
としては、通常の戒型体、シート、フィルム、積層物等
が例示できるが、本発明の効果を最も有効に利用するた
めにはフィルム状の形態が望ましい.その理由は、一般
にフィルム状の物は、比表面積が大きく、空気中での熱
劣化を受けやすく、従って、芳香族ポリフォスフエイト
類の添加効果が顕著にあらわれるのみならず、薄いフィ
ルム状物などの場合、微小な欠陥の存在が破断強度の低
下を招きやすく、しばしば深刻な問題となることが多い
ためである。
Further, in the above general formula (II), Rot is a tetravalent aromatic group and Iloz is a divalent organic group, which is particularly suitable for polyimides. Polyimide resins are usually obtained by reacting diamines and diacid anhydrides in an organic polar solvent. Listing some of the diamines that make up the polyimide used in the present invention, aromatic diamines include, for example, paraphenyl diamine, 3.3'dimethoxy-44'-diaξnobiphenyl, 3. 3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dichloro-4,4'-diaminobiphenyl, 4,4'-diaminoparaterphenyl,
4.4'-bis(4-aξnophenoxy)bifpenyl,
4 4'-Diatanodiphenylsulfone, 3.3'-
Diadanodiphenylsulfone, bis(4-(4-aminophenoxy)phenyl)sulfone, bis(4-(3
-aminophenoxy)phenyl]sulfone, bis(1
-(2-aminophenoxy)phenyl]sulfone, 1
.. 4bis(4-aminophenoquine)Hensen, 1,3-
Bis(4-aminophenoxy)benzene, l,3-bis(3-aminophenoxy)benzene, l,4-bis(4
-aminophenoquine)benzene, bis(1-(4-aminophenoxy)phenyl]ether, 4,4'-diaξ
Nodiphenylmethane, bis(3-ethyl-4-aminophenyl)methane, bis(3-methyl-4-aminophenyl)methane, bis(3-chloro4-aminophenyl)
Methane, 3,3'-diaminodiphenylsulfone, 4
4'-diaminodiphenylsulfone, 2 2'5,5
4,4'-diaminobiphenyl, 4
4'-Diakinodiphenyl sulfide, 4.4'-
diagonodiphenyl ether, 3,3'-diaminodiphenyl ether, 3.4 diaminodiphenyl ether,
4.4'-diaminodiphenylmethane, 4.4'-diaminobiphenyl, 44'-diaminoctafluorobiphenyl, 2.4'-diaminotoluene, metaphenylenedia ξane, 2.2-bis(4-(4 -aminophenoxy)phenyl]propane, 2.2bis(4-(4-aξ
nophenoxy)phenyl]hexafluoropropane, 2
, 2-bis(4-yaminophenyl)propane, 2.2-
bis(4-aminophenyl)hexafluoropropane,
2.2-bis(3-hydroxy-4-aminophenyl)
Propane, 2,2-bis(3-hydroxy-4-aminophenyl)hexafluoropropane, 99-bis(4-
Examples include (ξnophenyl)-10-hydroane 1.hracene, orthotolidine sulfone, and the like. These compounds may be used alone or in combination of two or more. Furthermore, 3,3'. It is also possible to use some polyvalent amine compounds such as 4.4'-biphenyltetraamine and 3.3'4.4'-tetraaminodiphenyl ether.
In addition, examples of the other component, diacid anhydride, are listed as follows:
Examples of aromatic tetracarboxylic dianhydrides include pyromellitic dianhydride, 3.3'. 4.4'-biphenyltetracarboxylic dianhydride, 3.3'. 4.4'-benzophenonetetracarboxylic dianhydride, naphthalene-1.
Examples include 2,5,6-tetracarboxylic dianhydride. Although an example of the structure of aromatic polyimide has been described here, the present invention can also be applied to aliphatic polyimide and the like. Examples of imide oligomers used in the present invention include bismaleide and nadic acid-terminated oligomers,
Examples include acetylene-terminated oligomers. Also, polyimide&ll$. Examples of forms obtained by molding objects include ordinary molded objects, sheets, films, and laminates, but in order to utilize the effects of the present invention most effectively, film-like forms are preferable. The reason for this is that film-like materials generally have a large specific surface area and are susceptible to thermal deterioration in the air. In this case, the presence of minute defects tends to lead to a decrease in breaking strength, which often becomes a serious problem.

〔作用〕[Effect]

従来、ポリイミド系樹脂の耐熱劣化安定剤として有機リ
ン系化合物が添加剤として用いられた例はあるが、前述
のように、この添加剤そのものの熱分解温度あるいは沸
点が低く、そのため樹脂戒型中に飛散してしまうか、又
は或型体が高温に曝された際に該添加剤が系外に飛散し
てしまい系内に残留させることができず、従って、その
効果を充分に利用することができなかった. これに対し、本発明は、かかる有機リン系化合物からな
る添加剤を高分子量化し、更に芳香族骨格を導入するこ
とにより、該添加剤そのものの熱安定性を改良すること
に成功した.この結果、該安定化剤は樹脂成型過程にお
いても、更に、かかる威型体が高温に長時間曝された場
合にも長く系内に滞留し、その効果を維持することがで
きる.かくして、従来不可能であった高温成型ポリイ4
ド樹脂の耐熱劣化安定性を大幅に改善することができる
ようになったのみならず、高温長時間の過酷な条件下で
のポリイミド系樹脂の耐熱劣化安定性を改良することを
可能としたものである.〔実施例〕 以下、実施例により本発明を具体的に説明するが、本発
明はこれらにより何ら制限を受けるものではない. 比較例1 ジメチルアセトアミド溶媒中、4.4′−ジアξノジフ
エニルメタンと3.3’.4.4″一ベンゾフェノンテ
トラカルボン酸二無水物とを常法により反応させ、ポリ
アξド酸の15%ジメチルアセトア竃ド溶液を得た. これに脱水剤として無水酢酸を、脱水触媒としてβ−ピ
コリンを加え、支持体上にキャストし、約100゜Cの
熱風オーブン中で約5分間加熱乾燥し、自己支持性のフ
ィルムを得た.これを支持体から引き剥し、支持枠に固
定した後、高温熱風オ一ブンにて280℃まで徐々に加
熱乾燥した.空気中にて放冷後、支持枠から取り外し、
厚さ約50μmのポリイ且ドフィルムを得た. このフィルムを250゜Cの熱風乾燥機中に1000時
間エージングした.エージング前後の絶縁破壊電圧及び
引っ張り破断時伸び率を測定し、その保持率を計算した
.結果を第l表に示す.比較例2 脱水剤及び脱水触媒とともにTPA (低分子量芳香族
フォスフエイト類)を、生威するポリイミド樹脂100
重量部に対して0. 5重量部添加した以外は比較例l
と同様の方法にてフィルムを作威し、測定評価した.結
果を第1表に示す.実施例1〜9 脱水剤及び脱水触媒とともに所定の芳香族ボリフォスフ
ェイトIfを所定量添加した以外は比較例1と同様の方
法にてフィルムを作成し、測定評価した.結果を第1表
に示す. 比較例3 ジメチルフォルムアミド溶媒中、4,4′−ジアミノジ
フヱニルエーテルとピロメリント酸二無水物とを常法に
より反応させ、ポリアミド酸の15%ジメチルフォルム
アミド溶液を得た。
In the past, organic phosphorus compounds have been used as additives to stabilize polyimide resins against heat deterioration, but as mentioned above, the thermal decomposition temperature or boiling point of these additives themselves is low, and as a result, they have been used as additives to stabilize polyimide resins. or when a certain mold is exposed to high temperature, the additive scatters out of the system and cannot be left in the system, so its effect cannot be fully utilized. I couldn't do it. In contrast, the present invention succeeded in improving the thermal stability of the additive itself by increasing the molecular weight of the additive made of such an organic phosphorus compound and further introducing an aromatic skeleton. As a result, the stabilizer remains in the system for a long time and maintains its effect during the resin molding process and even when the molded body is exposed to high temperatures for a long time. In this way, high-temperature molding polyethylene 4
This not only makes it possible to significantly improve the heat resistance and deterioration stability of polyimide resins, but also makes it possible to improve the heat deterioration stability of polyimide resins under harsh conditions of high temperatures and long periods of time. It is. [Examples] Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited in any way by these. Comparative Example 1 4.4′-diaξnodiphenylmethane and 3.3′. in dimethylacetamide solvent. 4.4"-benzophenonetetracarboxylic dianhydride was reacted in a conventional manner to obtain a 15% dimethylacetate solution of poly(ξ)doic acid. Acetic anhydride was added as a dehydrating agent and β as a dehydrating catalyst. - Added picoline, casted onto a support, and heated and dried in a hot air oven at about 100°C for about 5 minutes to obtain a self-supporting film. This was peeled off from the support and fixed to a support frame. After that, it was gradually heated and dried in a high-temperature hot air oven to 280°C. After being left to cool in the air, it was removed from the support frame.
A polyamide film with a thickness of approximately 50 μm was obtained. This film was aged in a hot air dryer at 250°C for 1000 hours. The dielectric breakdown voltage and tensile elongation at break before and after aging were measured, and the retention rate was calculated. The results are shown in Table I. Comparative Example 2 Polyimide resin 100 containing TPA (low molecular weight aromatic phosphates) along with a dehydrating agent and a dehydrating catalyst
0.0% by weight. Comparative Example 1 except that 5 parts by weight was added
Films were prepared and measured and evaluated using the same method. The results are shown in Table 1. Examples 1 to 9 Films were prepared and measured and evaluated in the same manner as in Comparative Example 1, except that a predetermined amount of aromatic polyphosphate If was added together with a dehydrating agent and a dehydrating catalyst. The results are shown in Table 1. Comparative Example 3 4,4'-diaminodiphenyl ether and pyromellitic dianhydride were reacted in a dimethylformamide solvent by a conventional method to obtain a 15% dimethylformamide solution of polyamic acid.

これに脱水剤として無水酢酸を、脱水触媒としてβ−ピ
コリンを加え、支持体上にキャストし、約100゜Cの
熱風オーブン中で約5分間加熱乾燥し、自己支持性のフ
ィルムを得た.これを支持体から引き剥し、支持枠に固
定した後、高温熱風オーブンにて、450゜Cまで、徐
々に加熱乾燥した後、空気中にて放冷後、支持枠から取
り外し、厚さ約50μmのポリイミドフィルムを得た。
Acetic anhydride was added as a dehydrating agent and β-picoline was added as a dehydrating catalyst, and the mixture was cast onto a support and dried by heating in a hot air oven at about 100°C for about 5 minutes to obtain a self-supporting film. After peeling it off from the support and fixing it on the support frame, it was gradually heated and dried in a high-temperature hot air oven up to 450°C, then left to cool in the air, and then removed from the support frame to a thickness of about 50 μm. A polyimide film was obtained.

このフィルムを300゜Cの熱風乾燥機中にl000時
間エージングした。エージング前後の絶縁破壊電圧及び
引っ張り破断時伸び率を測定・し、その保持率を計算し
た。結果を第2表に示す。
The film was aged in a hot air dryer at 300°C for 1000 hours. The dielectric breakdown voltage and tensile elongation at break before and after aging were measured, and the retention rate was calculated. The results are shown in Table 2.

比較例4 脱水剤及び脱水触媒とともにTPA (低分子量芳香族
フォスフエイト類)を、生戒するポリイミド樹脂100
重量部に対して0.5重量部添加した以外は比較例lと
同様の方法にてフィルムを作或し、測定評価した。結果
を第2表に示す。
Comparative Example 4 Polyimide resin 100 containing TPA (low molecular weight aromatic phosphates) along with a dehydrating agent and a dehydrating catalyst
A film was prepared and measured and evaluated in the same manner as in Comparative Example 1, except that 0.5 part by weight was added. The results are shown in Table 2.

実施例10−19 脱水剤及び脱水触媒とともに所定の芳香族ポリフォスフ
ェイト類を所定量添加した以外は比較例3と同様の方法
にてフィルムを作威し、測定評価した。結果を第2表に
示す. (表中の添加剤の略称の説明) PFR :フェニル・レゾルシン・ポリフオスフエイト CRP:クレジル・レゾルシン・ポリフオスフエイト PCRP :フェニル・クレジル・レゾルシン・ポリフ
ォスフエイト XRP:キシリル・レゾルシン・ポリフオスフエイト PIRP:フェニル・イソプロビルフエニル・レゾルシ
ン・ポリフォスフエイト CXRP :クレジル・キシリル・レゾルシン・ポリフ
ォスフエイト PDRP :フェニル・イソブロビルフェニル・ジイソ
ブロピルフェニル・レゾルシン・ポリフォスフエイト TPP:}リフェニルフォスフェイト(低分子量有機リ
ン系化合物) 〔発明の効果〕 本発明によれば、成型加工中の熱劣化性及び高温条件下
での熱劣化性が飛躍的に改良されたポリイミド組成物が
提供される。
Examples 10-19 A film was prepared and measured and evaluated in the same manner as in Comparative Example 3, except that a predetermined amount of a predetermined aromatic polyphosphate was added together with a dehydrating agent and a dehydrating catalyst. The results are shown in Table 2. (Explanation of abbreviations of additives in the table) PFR: Phenyl resorcinol polyphosphite CRP: Cresyl resorcinol polyphosphate PCRP: Phenyl cresyl resorcinol polyphosphate XRP: Xylyl resorcinol polyphosphate Phate PIRP: Phenyl, isopropylphenyl, resorcin, polyphosphate CXRP: Cresyl, xylyl, resorcin, polyphosphate PDRP: Phenyl, isobrobylphenyl, diisobropylphenyl, resorcin, polyphosphate TPP: }Riphenyl Phosphate (Low Molecular Weight Organic Phosphorus Compound) [Effects of the Invention] According to the present invention, a polyimide composition is provided which has dramatically improved thermal deterioration properties during molding and under high temperature conditions. Ru.

Claims (1)

【特許請求の範囲】 1、芳香族ポリフォスフェイト類を含有することを特徴
とするポリイミド組成物。 2、芳香族ポリフォスフェイト類の含有量が、ポリイミ
ド樹脂100重量部に対し0.01〜10重量部である
請求項1記載のポリイミド組成物。 3、芳香族ポリフォスフェイト類が、一般式( I ) ▲数式、化学式、表等があります▼ (R_1、R_2、R_3、R_4、R_5、R_6は
、各々水素原子または低級アルキル基を示し、nは正の
整数を示す。)で表される構造を有する化合物を成分と
する組成物である請求項1記載のポリイミド組成物。 4、一般式( I )において、nが1〜3の整数である
請求項3記載のポリイミド組成物。 5、ポリイミドが、一般式(II) ▲数式、化学式、表等があります▼ (R_0_1は4価の有機基、R_0_2は2価の有機
基を示す。) で表される構造を有する請求項1記載のポリイミド組成
物。 6、一般式(II)において、R_0_1が4価の芳香族
基、R_0_2が2価の芳香族基である請求項5記載の
ポリイミド組成物。 7、ポリイミドがポリイミドフィルムである請求項1記
載のポリイミド組成物。 8、ポリイミドが末端官能基を有するイミドオリゴマー
の硬化物である請求項1記載のポリイミド組成物。
[Scope of Claims] 1. A polyimide composition containing an aromatic polyphosphate. 2. The polyimide composition according to claim 1, wherein the content of the aromatic polyphosphate is 0.01 to 10 parts by weight based on 100 parts by weight of the polyimide resin. 3. Aromatic polyphosphates have the general formula (I) ▲ Numerical formulas, chemical formulas, tables, etc. ▼ (R_1, R_2, R_3, R_4, R_5, R_6 each represent a hydrogen atom or a lower alkyl group, n 2. The polyimide composition according to claim 1, which is a composition comprising a compound having a structure represented by the formula (indicates a positive integer). 4. The polyimide composition according to claim 3, wherein in the general formula (I), n is an integer of 1 to 3. 5. Claim 1 in which the polyimide has a structure represented by general formula (II) ▲Mathematical formula, chemical formula, table, etc.▼ (R_0_1 represents a tetravalent organic group, R_0_2 represents a divalent organic group) The polyimide composition described. 6. The polyimide composition according to claim 5, wherein in general formula (II), R_0_1 is a tetravalent aromatic group and R_0_2 is a divalent aromatic group. 7. The polyimide composition according to claim 1, wherein the polyimide is a polyimide film. 8. The polyimide composition according to claim 1, wherein the polyimide is a cured product of an imide oligomer having a terminal functional group.
JP1164350A 1989-06-27 1989-06-27 Polyimide composition Expired - Lifetime JP2955712B2 (en)

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Application Number Priority Date Filing Date Title
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JPH0328266A true JPH0328266A (en) 1991-02-06
JP2955712B2 JP2955712B2 (en) 1999-10-04

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Country Link
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5282955A (en) * 1975-12-29 1977-07-11 Toyobo Co Ltd Flame resistance compositions
JPS5412325A (en) * 1977-06-29 1979-01-30 M & T Chemicals Inc Phosphur compound and combustion inhibiting composition containing same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5282955A (en) * 1975-12-29 1977-07-11 Toyobo Co Ltd Flame resistance compositions
JPS5412325A (en) * 1977-06-29 1979-01-30 M & T Chemicals Inc Phosphur compound and combustion inhibiting composition containing same

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Publication number Publication date
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